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Books on the topic 'Thin film depositions'

Author: Grafiati

Published: 9 March 2023

Last updated: 10 March 2023

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1

A, Hopwood Jeffrey, ed. Ionized physical vapor deposition. San Diego: Academic Press, 2000.

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2

Jaworek, Anatol. Electrospray technology for thin-film devices deposition. Hauppauge, N.Y: Nova Science, 2010.

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3

Konuma, Mitsuharu. Film Deposition by Plasma Techniques. Berlin, Heidelberg: Springer Berlin Heidelberg, 1992.

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4

Ionized-cluster beam deposition and epitaxy. Park Ridge, N.J., U.S.A: Noyes Publications, 1988.

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5

Konuma, Mitsuharu. Plasma techniques for film deposition. Harrow, U.K: Alpha Science International, 2005.

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6

1950-, Konuma Mitsuharu, ed. Film deposition by plasma techniques. Berlin: Springer-Verlag, 1992.

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7

Photochemical vapor deposition. New York: Wiley, 1992.

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8

Moroșanu, C. E. Thin films by chemical vapour deposition. Amsterdam: Elsevier, 1990.

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9

Thin-film deposition: Principles and practice. New York: McGraw-Hill, 1995.

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10

Krishna, Seshan, ed. Handbook of thin-film deposition processes and techniques: Principles, methods, equipment, and applications. Park Ridge, N.J: Noyes Publications, 2000.

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11

Physical vapor deposition of thin films. New York: John Wiley & Sons, 2000.

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12

Principles of physical vapor deposition of thin films. Amsterdam: Elsevier, 2006.

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13

Simon, Tsuo Y., ed. Hydrogenated amorphous silicon alloy deposition processes. New York: M. Dekker, 1993.

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14

B, Chrisey Douglas, and Hubler G. K, eds. Pulsed laser deposition of thin films. New York: J. Wiley, 1994.

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15

Moran, Robert. Thin layer deposition: Highlighting PVD. Norwalk, CT: Business Communications Co., 2000.

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16

J, Mazumder, North Atlantic Treaty Organization. Scientific Affairs Division., and NATO Advanced Study Institute on "Laser Processing: Surface Treatment and Film Deposition" (1994 : Sezimbra, Portugal), eds. Laser processing: Surface treatment and film deposition. Dordrecht: Kluwer Academic Publishers, 1996.

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17

Eason, Robert, ed. Pulsed Laser Deposition of Thin Films. Hoboken, NJ, USA: John Wiley & Sons, Inc., 2006. http://dx.doi.org/10.1002/0470052120.

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18

Hawkeye, Matthew M., Michael T. Taschuk, and Michael J. Brett. Glancing Angle Deposition of Thin Films. Chichester, UK: John Wiley & Sons, Ltd, 2014. http://dx.doi.org/10.1002/9781118847510.

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19

Eason, Robert. Pulsed Laser Deposition of Thin Films. New York: John Wiley & Sons, Ltd., 2006.

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20

1943-, Lu T. M., ed. Evolution of thin film morphology: Modeling and simulations. New York: Springer, 2008.

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21

L, Smith Donald. Thin-film deposition and applications: Principles and practice. Maidenhead: McGraw-Hill, 1994.

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22

W, Rubloff G., and American Institute of Physics, eds. Deposition and growth: Limits for microelectronics, Anaheim, CA, 1987. New York: American Institute of Physics, 1988.

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23

Amorphous silicon carbide thin films: Deposition, characterization, etching, and piezoresistive sensors applications. Hauppauge, N.Y: Nova Science Publishers, 2011.

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24

Kromann, Rasmus. Deposition, characterization, and electronic applications of YBa2Cu3O7 thin films. Roskilde: Risø National Laboratory, 1992.

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25

Schuegraf, Klaus K. Handbook of Thin Film Deposition Processes and Techniques: Principles, Methods, Equipment and Applications. Burlington: Elsevier, 2001.

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26

Moutinho, Helio R. Mechanisms of growth of nanocrystalline silicon deposited by hot-wire chemical vapor deposition. Golden, Colo: National Renewable Energy Laboratory, 2005.

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27

United States. National Aeronautics and Space Administration., ed. Analysis of hard thin film coating: Final report for NASA-UAH contract NAS8-38609, D.O. 59 : funding level, $19,000 (total). [Washington, DC: National Aeronautics and Space Administration, 1998.

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28

Materials science of thin films: Deposition and structure. 2nd ed. San Diego, CA: Academic Press, 2002.

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29

Thin-film organic photonics: Molecular layer deposition and applications. Boca Raton: Taylor & Francis, 2011.

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30

Seshan, Krishna, and Dominic Schepis. Handbook of Thin Film Deposition. Elsevier, 2024.

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31

Handbook of Thin Film Deposition. Elsevier Science & Technology Books, 2012.

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32

Seshan, Krishna, and Dominic Schepis. Handbook of Thin Film Deposition. Elsevier Science & Technology Books, 2018.

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33

Seshan, Krishna. Handbook of Thin Film Deposition. Elsevier Science & Technology Books, 2012.

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34

Seshan, Krishna, and Dominic Schepis. Handbook of Thin Film Deposition. Elsevier Science & Technology Books, 2018.

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35

Powell, Ronald, and Abraham Ulman. Ionized Physical Vapor Deposition. Elsevier Science & Technology Books, 1999.

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36

Jacobson, Michael Roy. Optical Thin Film Deposition. Mcgraw-Hill (Tx), 1992.

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37

Lin, Yuan. Advanced Nano Deposition Methods. Wiley & Sons, Incorporated, John, 2016.

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38

Lin, Yuan. Advanced Nano Deposition Methods. Wiley-VCH Verlag GmbH, 2016.

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39

Lin, Yuan. Advanced Nano Deposition Methods. Wiley & Sons, Incorporated, John, 2016.

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40

Lin, Yuan. Advanced Nano Deposition Methods. Wiley & Sons, Limited, John, 2016.

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41

Lin, Yuan. Advanced Nano Deposition Methods. Wiley & Sons, Incorporated, John, 2016.

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42

Maurice H. Francombe (Series Editor) and John L. Vossen (Series Editor), eds. Plasma Sources for Thin Film Deposition and Etching (Physics of Thin Films Volume 18). Academic Press, 1994.

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43

Seshan, Krishna. Handbook of Thin Film Deposition Techniques. 2nd ed. Noyes Publications, 2001.

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44

Takagi, Toshinori. Ionized-Cluster Beam Deposition and Epitaxy. Elsevier Science & Technology Books, 1989.

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45

Plasma Techniques for Film Deposition. Alpha Science International, Ltd, 2006.

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46

Depla, Diederik, and Stijn Mahieu. Reactive Sputter Deposition. Springer, 2010.

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47

Handbook of Thin Film Deposition. Elsevier, 2012. http://dx.doi.org/10.1016/c2009-0-64359-2.

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48

Handbook of Thin Film Deposition. Elsevier, 2018. http://dx.doi.org/10.1016/c2016-0-03243-6.

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49

Gould, Phillip. Deposition and Characterization of Thin Films. Springer London, Limited, 1999.

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50

Shah, S., D. Glocker, and L. Vescan. Handbook of Thin Film Process Technology 99/1 Substrate Preparation for Thin Film Deposition. Taylor & Francis Group, 2000.

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