Relevant bibliographies by topics / TaAlN coating

Academic literature on the topic 'TaAlN coating'

Author: Grafiati
Published: 14 March 2023

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Journal articles on the topic "TaAlN coating"

1

Koller, C. M., R. Hollerweger, C. Sabitzer, R. Rachbauer, S. Kolozsvári, J. Paulitsch, and P. H. Mayrhofer. "Thermal stability and oxidation resistance of arc evaporated TiAlN, TaAlN, TiAlTaN, and TiAlN/TaAlN coatings." Surface and Coatings Technology 259 (November 2014): 599–607. http://dx.doi.org/10.1016/j.surfcoat.2014.10.024.

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2

Kumar, D. Dinesh, Revati Rani, Niranjan Kumar, Kalpataru Panda, A. M. Kamalan Kirubaharan, P. Kuppusami, and R. Baskaran. "Tribochemistry of TaN, TiAlN and TaAlN coatings under ambient atmosphere and high-vacuum sliding conditions." Applied Surface Science 499 (January 2020): 143989. http://dx.doi.org/10.1016/j.apsusc.2019.143989.

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3

OKANO, Yukiko, Shuichi TAJIRI, Takashi AOZONO, Akio OKAMOTO, Soichi OGAWA, and Hiroshi MIMA. "Fabrication of High TCR TaAl-N Thin Film by Reactive Sputtering Method." Shinku 50, no. 3 (2007): 173–74. http://dx.doi.org/10.3131/jvsj.50.173.

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4

Schalk, Nina, Christian Saringer, Alexander Fian, Velislava L. Terziyska, Jaakko Julin, and Michael Tkadletz. "Evolution of the microstructure of sputter deposited TaAlON thin films with increasing oxygen partial pressure." Surface and Coatings Technology 418 (July 2021): 127237. http://dx.doi.org/10.1016/j.surfcoat.2021.127237.

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5

Coss, Brian, Hyun-Chul Kim, Francisco S. Aguirre-Tostado, Robert M. Wallace, and Jiyoung Kim. "Role of lanthanum in the gate stack: Co-sputtered TaLaN metal gates on Hf-based dielectrics." Microelectronic Engineering 86, no. 3 (March 2009): 235–39. http://dx.doi.org/10.1016/j.mee.2008.05.027.

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6

OKANO, Yukiko, Shuichi TAJIRI, Takashi AOZONO, Akio OKAMOTO, Soichi OGAWA, and Hiroshi MIMA. "Deposition of TaAl-N Thin Film on the Polyimide Film-Discussion for the New Vacuum Sensor in a Wide Range-." Shinku 49, no. 3 (2006): 162–64. http://dx.doi.org/10.3131/jvsj.49.162.

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