Journal articles on the topic 'STED lithography'
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Lee, Won-Sup, Hyunmin Cho, and Won-Seok Chang. "Analytical Description of Digital Mask Based STED Lithography." Journal of the Korean Society for Precision Engineering 39, no. 11 (November 30, 2022): 863–68. http://dx.doi.org/10.7736/jkspe.022.072.
Full textKlar, Thomas A., Richard Wollhofen, and Jaroslaw Jacak. "Sub-Abbe resolution: from STED microscopy to STED lithography." Physica Scripta T162 (September 1, 2014): 014049. http://dx.doi.org/10.1088/0031-8949/2014/t162/014049.
Full textKlar, Thomas A., Richard Wollhofen, Johannes Kreutzer, Bianca Buchegger, Christine Eder, and Jaroslaw Jacak. "Sub-Diffraction STED Lithography using Orthogonally Functionalized Resins." Biophysical Journal 112, no. 3 (February 2017): 157a. http://dx.doi.org/10.1016/j.bpj.2016.11.864.
Full textPuthukodan, Sujitha, Eljesa Murtezi, Jaroslaw Jacak, and Thomas A. Klar. "Localization STED (LocSTED) microscopy with 15 nm resolution." Nanophotonics 9, no. 4 (February 28, 2020): 783–92. http://dx.doi.org/10.1515/nanoph-2019-0398.
Full textMüller, Patrick, Rouven Müller, Larissa Hammer, Christopher Barner-Kowollik, Martin Wegener, and Eva Blasco. "STED-Inspired Laser Lithography Based on Photoswitchable Spirothiopyran Moieties." Chemistry of Materials 31, no. 6 (January 15, 2019): 1966–72. http://dx.doi.org/10.1021/acs.chemmater.8b04696.
Full textGlubokov, D. A., V. V. Sychev, Alexey G. Vitukhnovsky, and A. E. Korol'kov. "Photonic crystal fibre-based light source for STED lithography." Quantum Electronics 43, no. 6 (June 30, 2013): 588–90. http://dx.doi.org/10.1070/qe2013v043n06abeh015059.
Full textWiesbauer, Moritz, Richard Wollhofen, Borislav Vasic, Kurt Schilcher, Jaroslaw Jacak, and Thomas A. Klar. "Nano-Anchors with Single Protein Capacity Produced with STED Lithography." Nano Letters 13, no. 11 (October 16, 2013): 5672–78. http://dx.doi.org/10.1021/nl4033523.
Full textWollhofen, Richard, Julia Katzmann, Calin Hrelescu, Jaroslaw Jacak, and Thomas A. Klar. "120 nm resolution and 55 nm structure size in STED-lithography." Optics Express 21, no. 9 (April 25, 2013): 10831. http://dx.doi.org/10.1364/oe.21.010831.
Full textKaschke, Johannes, and Martin Wegener. "Gold triple-helix mid-infrared metamaterial by STED-inspired laser lithography." Optics Letters 40, no. 17 (August 20, 2015): 3986. http://dx.doi.org/10.1364/ol.40.003986.
Full textВитухновский, А. Г., Р. Д. Звагельский, Д. А. Колымагин, А. В. Писаренко, and Д. А. Чубич. "Двухволновая лазерная стереолитография для создания ИК сенсоров для поверхностно-усиленной спектроскопии-=SUP=-*-=/SUP=-." Журнал технической физики 126, no. 1 (2019): 63. http://dx.doi.org/10.21883/os.2019.01.47055.271-18.
Full textElmeranta, Marjukka, Giuseppe Vicidomini, Martí Duocastella, Alberto Diaspro, and Gustavo de Miguel. "Characterization of nanostructures fabricated with two-beam DLW lithography using STED microscopy." Optical Materials Express 6, no. 10 (September 19, 2016): 3169. http://dx.doi.org/10.1364/ome.6.003169.
Full textYuan, Chenyu, Jukun Liu, Tianqing Jia, Kan Zhou, Hongxin Zhang, Jia Pan, Donghai Feng, and Zhenrong Sun. "Super resolution direct laser writing in ITX resist inspired by STED microscopy." Journal of Nonlinear Optical Physics & Materials 23, no. 02 (June 2014): 1450015. http://dx.doi.org/10.1142/s0218863514500155.
Full textLiu, Fan, Guo Dong Gu, Chun Hong Zeng, Hai Jun Li, Wei Wang, Bao Shun Zhang, and Jin She Yuan. "Fabrication of 50nm T-Gate on GaN Substrate." Advanced Materials Research 482-484 (February 2012): 2341–44. http://dx.doi.org/10.4028/www.scientific.net/amr.482-484.2341.
Full textFang, Bin, Jiafeng Feng, Hongxiang Wei, Xiufeng Han, Baoshun Zhang, and Zhongming Zeng. "Fabrication of Spin-Transfer Nano-Oscillator by Colloidal Lithography." Journal of Nanomaterials 2015 (2015): 1–6. http://dx.doi.org/10.1155/2015/973957.
Full textShamsuddin, Liyana, Khairudin Mohamed, and Alsadat Rad Maryam. "The Investigation of Microstructures Fabrication on Quartz Substrate Employing Electron Beam Lithography (EBL) and ICP-RIE Process." Advanced Materials Research 980 (June 2014): 69–73. http://dx.doi.org/10.4028/www.scientific.net/amr.980.69.
Full textLiu Jiahong, 刘佳红, 张方 Zhang Fang, and 黄惠杰 Huang Huijie. "步进扫描投影光刻机照明系统技术研究进展." Laser & Optoelectronics Progress 59, no. 9 (2022): 0922011. http://dx.doi.org/10.3788/lop202259.0922011.
Full textFan, Xi Qiu. "Nanoimprint Lithography: A Promising Candidate for Next-Generation Lithography." Advanced Materials Research 139-141 (October 2010): 1558–61. http://dx.doi.org/10.4028/www.scientific.net/amr.139-141.1558.
Full textLee, Jae Jong, Seung Woo Lee, Hyun Taek Cho, Gee Hong Kim, and Kee Bong Choi. "Single-Step UV Nanoimprinting Lithography with Multi-Head Imprinting System and Its Applications." Key Engineering Materials 326-328 (December 2006): 441–44. http://dx.doi.org/10.4028/www.scientific.net/kem.326-328.441.
Full textResnick, Douglas J., S. V. Sreenivasan, and C. Grant Willson. "Step & flash imprint lithography." Materials Today 8, no. 2 (February 2005): 34–42. http://dx.doi.org/10.1016/s1369-7021(05)00700-5.
Full textAcevedo, Diego F., Evelina Frontera, Martín F. Broglia, Frank Mücklich, María C. Miras, and César A. Barbero. "One Step Lithography of Polypyrrole." Advanced Engineering Materials 13, no. 5 (January 20, 2011): 405–10. http://dx.doi.org/10.1002/adem.201000295.
Full textJiang, Youwei, Bingqing Luo, and Xing Cheng. "Enhanced Thermal Stability of Thermoplastic Polymer Nanostructures for Nanoimprint Lithography." Materials 12, no. 3 (February 12, 2019): 545. http://dx.doi.org/10.3390/ma12030545.
Full textKIGAMI, Hiroshi, Noriyuki UNNO, Yuta SHINONAGA, Tatsuya HAYASHI, and Jun TANIGUCHI. "1305 Fabrication of Silicon Mold for Eight-step Diffractive Optical Element using Liquid Transfer Imprint Lithography." Proceedings of International Conference on Leading Edge Manufacturing in 21st century : LEM21 2015.8 (2015): _1305–1_—_1305–4_. http://dx.doi.org/10.1299/jsmelem.2015.8._1305-1_.
Full textLeong, Eunice Sok Ping, Jie Deng, Eng Huat Khoo, Siji Wu, Wee Kee Phua, and Yan Jun Liu. "Fabrication of suspended, three-dimensional chiral plasmonic nanostructures with single-step electron-beam lithography." RSC Advances 5, no. 117 (2015): 96366–71. http://dx.doi.org/10.1039/c5ra17705g.
Full textSEWELL, HARRY. "250nm Lithography with Step and Scan." Journal of Photopolymer Science and Technology 6, no. 1 (1993): 161–70. http://dx.doi.org/10.2494/photopolymer.6.161.
Full textEdwards, C., and J. Sawicki. "Step out of the light [lithography]." Engineering & Technology 5, no. 17 (November 13, 2010): 34–35. http://dx.doi.org/10.1049/et.2010.1720.
Full textJiang, Nan, Gary Hembree, and John C. H. Spence. "Electron Lithography In Glasses by STEM." Microscopy and Microanalysis 9, S02 (July 19, 2003): 300–301. http://dx.doi.org/10.1017/s1431927603441500.
Full textLi, Chunyu, Xixian Wang, Jian Xu, and Bo Ma. "One-step liquid molding based modular microfluidic circuits." Analyst 145, no. 21 (2020): 6813–20. http://dx.doi.org/10.1039/d0an01134g.
Full textJun Cheng, Jun Cheng, and Nan Yan Nan Yan. "Three-step lithography to the fabrication of vertically coupled micro-ring resonators in amorphous silicon-on-insulator." Chinese Optics Letters 13, no. 8 (2015): 082201–82205. http://dx.doi.org/10.3788/col201513.082201.
Full textLaun, Joachim, Yana De Smet, Emma Van de Reydt, Alexander Krivcov, Vanessa Trouillet, Alexander Welle, Hildegard Möbius, Christopher Barner-Kowollik, and Tanja Junkers. "2D laser lithography on silicon substrates via photoinduced copper-mediated radical polymerization." Chemical Communications 54, no. 7 (2018): 751–54. http://dx.doi.org/10.1039/c7cc08444g.
Full textYesilkoy, F., V. Flauraud, M. Rüegg, B. J. Kim, and J. Brugger. "3D nanostructures fabricated by advanced stencil lithography." Nanoscale 8, no. 9 (2016): 4945–50. http://dx.doi.org/10.1039/c5nr08444j.
Full textZhang, W., M. P. Tullier, K. Patel, A. Carranza, J. A. Pojman, and A. D. Radadia. "Microfluidics using a thiol–acrylate resin for fluorescence-based pathogen detection assays." Lab on a Chip 15, no. 21 (2015): 4227–31. http://dx.doi.org/10.1039/c5lc00971e.
Full textXin, Zheng Hang, Chong Wang, Feng Qiu, Rong Fei Wang, Chen Li, and Yu Yang. "Advance in the Fabrication of Ordered Ge/Si Nanostructure Array on Si Patterned Substrate by Nanosphere Lithography." Materials Science Forum 852 (April 2016): 283–92. http://dx.doi.org/10.4028/www.scientific.net/msf.852.283.
Full textZhang, Kui, Zhimin Chen, Jingsong Wei, Tao Wei, Youyong Geng, Yang Wang, and Yiqun Wu. "A study on one-step laser nanopatterning onto copper–hydrazone-complex thin films and its mechanism." Physical Chemistry Chemical Physics 19, no. 20 (2017): 13272–80. http://dx.doi.org/10.1039/c7cp00477j.
Full textJiang, Zheng, Hao Zhu, Qingqing Sun, and Davidwei Zhang. "Step Coverage and Dry Etching Process Improvement of Amorphous Carbon Hard Mask." Electronics 10, no. 20 (October 15, 2021): 2512. http://dx.doi.org/10.3390/electronics10202512.
Full textDai, Jian Feng, Qing Wang, Wei Xue Li, Yong Fu Cui, Feng Zhang, and Henry I. Smith. "The Fabrication of 2-D Global Fiducial Grid with High Resolution for Spatial Phase Locked e-Beam Lithography." Materials Science Forum 575-578 (April 2008): 1252–57. http://dx.doi.org/10.4028/www.scientific.net/msf.575-578.1252.
Full textLai, Chung-Jui, Hui-Ping Tsai, Ju-Yu Chen, Mei-Xuan Wu, You-Jie Chen, Kun-Yi Lin, and Hong-Ta Yang. "Single-Step Fabrication of Longtail Glasswing Butterfly-Inspired Omnidirectional Antireflective Structures." Nanomaterials 12, no. 11 (May 29, 2022): 1856. http://dx.doi.org/10.3390/nano12111856.
Full textJun Cheng, Jun Cheng, and Duk-Yong Choi Duk-Yong Choi. "Three-step lithography to the fabrication of vertically coupled micro-ring resonators in amorphous silicon-on-insulator-corrigendum." Chinese Optics Letters 14, no. 4 (2016): 043501–43501. http://dx.doi.org/10.3788/col201614.043501.
Full textDell'Anna, Rossana, Cecilia Masciullo, Erica Iacob, Mario Barozzi, Damiano Giubertoni, Roman Böttger, Marco Cecchini, and Giancarlo Pepponi. "Multiscale structured germanium nanoripples as templates for bioactive surfaces." RSC Advances 7, no. 15 (2017): 9024–30. http://dx.doi.org/10.1039/c6ra28531g.
Full textHamidovic, Medina, and Ferenc Ender. "A Novel Method for Fabricating Microfluidic Devices Containing Immobilized Biological Specimens." Periodica Polytechnica Electrical Engineering and Computer Science 63, no. 2 (March 28, 2019): 85–93. http://dx.doi.org/10.3311/ppee.13523.
Full textColson, Pierre, Catherine Henrist, and Rudi Cloots. "Nanosphere Lithography: A Powerful Method for the Controlled Manufacturing of Nanomaterials." Journal of Nanomaterials 2013 (2013): 1–19. http://dx.doi.org/10.1155/2013/948510.
Full textNiepel, Marcus S., Bhavya K. Ekambaram, Christian E. H. Schmelzer, and Thomas Groth. "Polyelectrolyte multilayers of poly (l-lysine) and hyaluronic acid on nanostructured surfaces affect stem cell response." Nanoscale 11, no. 6 (2019): 2878–91. http://dx.doi.org/10.1039/c8nr05529g.
Full textHermosa, Javier, Aurelio Hierro-Rodríguez, Carlos Quirós, María Vélez, Andrea Sorrentino, Lucía Aballe, Eva Pereiro, Salvador Ferrer, and José I. Martín. "Two-Step Resist Deposition of E-Beam Patterned Thick Py Nanostructures for X-ray Microscopy." Micromachines 13, no. 2 (January 28, 2022): 204. http://dx.doi.org/10.3390/mi13020204.
Full textMontero-Pancera, Sabrina, Vanessa Trouillet, Andre Petershans, Dagmar Fichtner, Andrey Lyapin, Michael Bruns, Thomas Schimmel, et al. "Design of Chemically Activated Polymer Microwells by One-Step UV-Lithography for Stem Cell Adhesion." Langmuir 26, no. 3 (February 2, 2010): 2050–56. http://dx.doi.org/10.1021/la902563d.
Full textJohnson, Stephen C. "Nanofabrication with step and flash imprint lithography." Journal of Micro/Nanolithography, MEMS, and MOEMS 4, no. 1 (January 1, 2005): 011002. http://dx.doi.org/10.1117/1.1862650.
Full textLiu, H. Z., Bing Heng Lu, Y. C. Ding, D. C. Li, Yi Ping Tang, and T. Jin. "A Measurement System for Step Imprint Lithography." Key Engineering Materials 295-296 (October 2005): 107–12. http://dx.doi.org/10.4028/www.scientific.net/kem.295-296.107.
Full textBuckley, Jere D. "Step-and-scan lithography using reduction optics." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 7, no. 6 (November 1989): 1607. http://dx.doi.org/10.1116/1.584499.
Full textSpence, J. C. H., and U. Weierstall. "Tomographic Diffractive Imaging. STEM Lithography for Nanorings." Microscopy and Microanalysis 9, S02 (August 2003): 6–7. http://dx.doi.org/10.1017/s1431927603440671.
Full textBailey, T., B. Smith, B. J. Choi, M. Colburn, M. Meissl, S. V. Sreenivasan, J. G. Ekerdt, and C. G. Willson. "Step and flash imprint lithography: Defect analysis." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 19, no. 6 (2001): 2806. http://dx.doi.org/10.1116/1.1420203.
Full textHuang, XuHai, Karina Torres-Castro, Walter Varhue, Armita Salahi, Ahmed Rasin, Carlos Honrado, Audrey Brown, Jennifer Guler, and Nathan S. Swami. "Self-aligned sequential lateral field non-uniformities over channel depth for high throughput dielectrophoretic cell deflection." Lab on a Chip 21, no. 5 (2021): 835–43. http://dx.doi.org/10.1039/d0lc01211d.
Full textShahin Shahidan, Muhammad Faris, Jingchao Song, Timothy D. James, and Ann Roberts. "Multilevel nanoimprint lithography with a binary mould for plasmonic colour printing." Nanoscale Advances 2, no. 5 (2020): 2177–84. http://dx.doi.org/10.1039/d0na00038h.
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