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1
Carson, Emma. "Spin coating of passive electroactive ceramic devices." Thesis, University of Ulster, 2001. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.369951.
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Haas, Dylan. "Predicting the Uniformity of Two-Component, Spin Deposited Films." Diss., The University of Arizona, 2006. http://hdl.handle.net/10150/195952.
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Various physical parameters of solvents within two component, PMMA + Solvent films are analyzed for their impact upon the coating uniformity of spin deposited PMMA films. Towards this end, a model is presented for describing the surface behavior of spin-on films during the latter stages of deposition, correlating the tendency of a film toward non-uniform deposition to physical characteristics of the spin-on solution. A finite difference solution to this model is presented for two-component, spin-on films that is shown to effectively predict the uniformity of the resulting thin-film layers. The model is then used to determine the impact of specific film parameters upon the predicted spin-on uniformity of the film. Based upon these results, the interdependency between evaporation rate, solvent viscosity, surface tension and rotation rate in determining the uniformity of the spin-on film is evaluated by comparing the model predictions against those found in actual spin-on, two component films. The results from this model are used to provide a physical explanation for why certain surface non-uniformities begin to develop during spin coating.
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Han, Sangjun 1972. "Optimization of process variables in extrusion-spin coating." Thesis, Massachusetts Institute of Technology, 1997. http://hdl.handle.net/1721.1/43576.
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Lombe, Mubanga. "Spin coating of Newtonian and non-Newtonian fluids." Doctoral thesis, University of Cape Town, 2006. http://hdl.handle.net/11427/4904.
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Derksen, James Stephen. "A new coating method for semiconductor lithography : fluid layer overlap in extrusion-spin coating." Thesis, Massachusetts Institute of Technology, 1997. http://hdl.handle.net/1721.1/43575.
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Ganeshamurugan, Subramaniam. "Synthesis and evaluation of novel buffer/hole-injecting oligo(9-aminoanthracene)(s) in aluminium quinolate organic electroluminescent devices (OELDs)." Thesis, London South Bank University, 2002. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.271761.
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Han, Sangjun 1972. "Modeling and analysis of extrusion-spin coating : an efficient and deterministic photoresist coating method in microlithography." Thesis, Massachusetts Institute of Technology, 2001. http://hdl.handle.net/1721.1/8694.
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Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 2001.Includes bibliographical references (p. 173-178).
In the fabrication of microelectronic chips, microlithography is used to transfer a pattern of circuit geometry from mask to semiconductor wafer. An important step in this process is the deposition of a thin and uniform layer of photoresist (often called resist) on which the lithographic image is exposed. Typical photoresist layers are less than 1 pum thick with a variation of 5 [angstroms] for advanced chips. Spin coating is the prevalent coating method to produce the required thickness and uniformity, but it typically wastes over 90% of the photoresist applied. A more efficient method needs to be developed for two reasons. The first is that 80% of the photoresist is an environmentally hazardous solvent. The second is the cost increase of photoresist. As the target of semiconductor industry moves toward the fabrication of smaller devices with larger capacity, the trend in photoresist shifts from i-line to deep UV resists, which allow for narrower linewidths on a chip. The price of this new resist is four to ten times higher than that of i-line resists. Reducing photoresist waste is desirable for both environmental and economical reasons. The current spin coating method has another problem in addition to low coating efficiency. Results from spin coating are unpredictable. The relationships between the inputs (process variables) and outputs (coating thickness and uniformity) can only be obtained by trial and error. Thus, a number of experiments have to be conducted to attain a certain coating thickness and uniformity. A more effective method would yield the predictable coating thicknesses and uniformities for given inputs.
(cont.) Both the cost and time required for process development can be reduced this way. Extrusion-spin coating achieves high coating efficiency with predictable coating results. This new method uses an efficient extrusion coating technique to apply a thin film of resist to a wafer before spinning. spinning. This initial layer of photoresist eliminates the spreading phase, the most inefficient step of spin coating. The initial layer also provides the existing spin coating models with determined initial conditions and thereby renders its results predictable. A prototype extrusion-spin coater has been designed and fabricated. Initial experiments have been conducted to determine, test and optimize process variables. One variable, the solvent concentration degree in the environment, is most critical. As the initial coating layer deposited by extrusion coating is only 20-40 [mu]m, solvent contained in the photoresist evaporates rapidly at the absence of a solvent concentration in the environment. Evaporation causes the viscosity of photoresist to be nonuniform over the wafer. The outcome of the spin coating process becomes less uniform. Experimental results are compared with Emslie et al.'s predictive models of spin coating. A solvent concentration of 80% or higher in the environment was found to be necessary to attain a predictable coating thickness with 5 [angstrom] uniformity. With optimized process variables, mean coating thickness matches theoretical predictions with a variation of 0.01 [mu]m. Defect-free coating results with coating efficiencies as high as 40% were achieved.
by Sangjun Han.
Ph.D.
8
Hoggan, Erik Nebeker. "Spin Coating and Photolithography Using Liquid and Supercritical Carbon Dioxide." NCSU, 2002. http://www.lib.ncsu.edu/theses/available/etd-09232002-125551/.
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This thesis details work on the utilization of dense phase carbon dioxide (CO2) in semiconductor processing. In particular, work is presented on the formulation of CO2 soluble photoresists and the spin coating of those photoresists using only liquid CO2 as a solvent. As part of this spin coating work, a novel high-pressure CO2 spin coater was designed and constructed, and the theoretical equations governing its performance were derived. Also discussed in this thesis are 248 and 193 nm exposures of these CO2 spun films and subsequent development in supercritical CO2. Resist stripping was also performed in CO2. In short, this thesis details the first steps towards a complete replacement of all aqueous and organic solvents in the conventional photolithographic processes of spin coating, developing, and resist stripping. This change not only confers significant environmental advantages, but opens up many new avenues in resist chemistry and promises improvements in large scale film uniformity, elimination of feature collapse, elimination of extraneous processing steps, and improved control of the lithographic process.
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FARIAS, Bruno Veríssimo de Miranda. "Preparação por sol-gel de filmes granulados de CoCr2O4." Universidade Federal de Pernambuco, 2015. https://repositorio.ufpe.br/handle/123456789/20045.
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Neste trabalho foi feito um estudo das propriedades estruturais e magnéticas de filmes granulares de cromita de cobalto sobre substrato de silicio. Aqui os filmes foram fabricados a partir do método químico sol‐gel, técnica de centrifugação spincoating e Tratamento térmico apropriado. Toda família de filmes foi fabricada sobre substrato de silício (100) e submetida a tratamento termico. A diferença de um filme para outro esta na quantidade de material depositado. Isto possibilitou o estudo das propriedades supracitadas em função da quantidade de material depositado para fabricação do filme. A cristalinidade de todas as amostras obtidas foi confirmada por difração de raios-X (XRD). A microscopia eletrônica de varredura (MEV) mostrou filmes granulares com boa homogeneidade e que a espessura de todas as amostras aumenta com a quantidade de gotas depositadas durante o spin‐coating. As propriedades magnéticas foram medidas usando magnetometria de amostra vibrante (VSM). O campo aplicado durante a medicao foi orientado paralelo ao plano do filme e observou‐se uma alta coercividade e que esta diminui quase linearmente com o aumento de temperatura.
In this work we have made a study of the structural and magnetic properties of cobalt chromite granular films over silicon substrate. Here the films were fabricated by the chemical method sol‐gel, spin coating technique and ppropriate heat treatment. The entire Family was deposited over silicon substrate (100) and submitted to heat treatment. The difference between a film to another is the quantity of deposited Material. This allowed the study of the above properties as a function of the deposited material. The crystallinity of all samples obtained was confirmed by X‐ray diffraction (XRD). The scanning electron microscopy (SEM) showed granular films with good homogeneity and the thickness of all samples increases when the number of drops increases during spin‐coating. The magnetic properties were measured using vibrating sample magnetometry (VSM). The applied field during the measurement was Oriented parallel to the film plane and observed a high coercivity and that decreases pproximately linearly with increasing temperature.
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Van, fraeyenhoven Paulien. "Comparing morphology in dip-coated and spin-coated polyfluorene:fullerene films." Thesis, Karlstads universitet, Institutionen för ingenjörs- och kemivetenskaper, 2016. http://urn.kb.se/resolve?urn=urn:nbn:se:kau:diva-42576.
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Unsustainable energy sources are running out and global warming is getting worse. Therefore the need for renewable energy sources is growing. Solar cells are a popular options used as an energy source. Most popular are the inorganic photovoltaic cells. With their high efficiency and long lifetime, they make a very good energy source. Unfortunately the costs for inorganic solar cells are rather high. Organic solar cells can make a good replacement for inorganic photovoltaic. They are easy to make, light and rather cheap. In this thesis, the morphology of a model system of the active layer of organic solar cells will be discussed, using dip coating as well as spin coating as a technique to prepare the films. The films consist of a blend of poly(9,9-dioctylfluorenyl-2,7-diyl) and [6,6]-phenyl C61-butyric acid methyl ester in different ratios and different solvents. The films that were made were prepared by spin coating or dip coating a glass substrate. After analysing the samples using atomic force microscopy, fluorescence spectroscopy and absorption spectroscopy it was clear that the morphology, as well as the position of the polymer chains can be influenced by using different dipping speeds, ratios or solvents.
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Krishnan, Sriram 1978 May. "On the manufacture of very thin elastomeric films by spin-coating." Thesis, Massachusetts Institute of Technology, 2007. http://hdl.handle.net/1721.1/42291.
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Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 2007.Includes bibliographical references (p. [167]-172).
I present a process for manufacturing poly-dimethylsiloxane (PDMS) films of thicknesses down to 50 microns. PDMS films are currently fabricated by spin-coating the polymer on a wafer and then manually peeling the film after curing. This is labor-intensive and suffers from low yield, dimensional inaccuracies, tearing and wrinkling. I apply manufacturing principles to the preparation of PDMS to enable more accurate, efficient, and reliable manufacturing. Difficulties in the preparation of PDMS films occur for two reasons: a) the material properties of PDMS are hard to characterize and b) process steps are hard to characterize. In analyzing the functional steps in PDMS manufacture, I first examine the spin-coating process. There has been surprisingly little work on thickness control, and I show how unlike with photoresist, the thickness of the coat can be controlled quite robustly by a judicious choice of process parameters. I also show how second-order variations can be controlled by using an inexpensive interferometric technique developed by our collaborators. I then analyze the physics of peeling and show why initiation, beading and tearing are difficult issues. Furthermore the line of separation of between the film and the wafer is difficult to advance without dynamic effects and micro-slippage. In order to prevent these problems, I introduce two new process concepts. First, I introduce a thin 'scaffold', incorporated in situ between the PDMS film and the substrate during spin-coating, which can start the peel front, eliminate the bead, as well as support the film as it is peeled. I then introduce the use of an adhesive roller actuator with a compressive pre-load which helps peel the film while controlling the peel-front. I show how, by using a ferro-magnetic material, the scaffold can be separated and handled by magnetic attachment. I show how the scaffolding can also incorporate a kinematic coupling for subsequent registration in layering. Finally, I will present experimental results showing thickness metrology, model verification and peeling success.
by Sriram Krishnan.
Ph.D.
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Vitorino, Ana Raquel Alonso Martins. "Estudo de técnicas de deposição de filmes finos poliméricos à base de silanos." Master's thesis, Faculdade de Ciências e Tecnologia, 2011. http://hdl.handle.net/10362/6632.
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Dissertação para obtenção do Grau de Mestre em
Engenharia de MateriaisEste trabalho foi desenvolvido na Magpower, uma empresa de produção e montagem de concentradores solares fotovoltaicos, em conjunto com a Faculdade de Ciências e Tecnologia da Universidade Nova de Lisboa e o CENIMAT. Com este trabalho pretendeu-se estudar técnicas alternativas à deposição de um filme fino polimérico promotor de adesão, na superfície das células solares. As técnicas estudadas foram: pulverização com e sem aquecimento das células, spin coating e dip coating. Foram também realizados pré-tratamentos de plasma de oxigénio de modo a melhorar a adesão do filme à célula. Os filmes obtidos foram caracterizados ao nível da sua uniformidade e espessura, através de microscopia óptica e perfilometria. Para os filmes produzidos em substrato de vidro, determinou-se também a sua transmitância. Por último, de modo a avaliar a qualidade dos filmes como promotores de adesão, foram escolhidas as melhores amostras de cada técnica e testadas segundo os padrões de teste de adesão da empresa.
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Mårtensson, Niklas. "Optical Properties of Silica-Copper Oxide Thin Films Prepared by Spin Coating." Thesis, Linköpings universitet, Tillämpad optik, 2011. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-71188.
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Optical properties of copper oxide nanoparticles in a silica matrix thin film have been investigated. Films were prepared on Si substrates from a sol-gel by spin coating. Four samples with different thicknesses, from 14,5-109 nm, were fabricated. Optical properties were measured with Variable Angle Spectroscopic Ellipsometry. The aim of the project was to gain further understanding of these films that are interesting in applications for solar absorbers as solar selective coatings. Ellipsometricangles Ψ and Δ were measured in the wavelength range from 250-1700 nm. A dispersion model was developed and fitted to experimental data with acceptable results.
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Siegert, Uwe. "Silber(I)- und Kupfer(I) – Precursoren für CVD, ALD und Spin-Coating Prozesse." Doctoral thesis, Universitätsbibliothek Chemnitz, 2010. http://nbn-resolving.de/urn:nbn:de:bsz:ch1-201000265.
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Die vorliegende Arbeit beschäftigt sich mit der Synthese von Phosphan-Kupfer(I)- und Silber(I)-Thiocarboxylaten der Art [(nBu3P)mMSC(O)R] (m = 2, 3; M = Cu, Ag; R = Me, Ph). Die Verbindungen wurden in Hinsicht auf ihr Potential zur thermischen Abscheidung dünner Schichten untersucht.
Weiterhin befasst sich diese Arbeit mit der Darstellung von Silber(I)- und Kupfer(I)-Carboxylaten, die im organischen Rest mindestens eine zusätzliche Donorfunktion besitzen ([(nBu3P)mMO2CR]; m = 1, 2; M = Ag, Cu; R = ungesättigter organischer Rest, CH2O(CH2)2OCH3). Das thermische Verhalten und die Anwendbarkeit dieser Komplexe zur Abscheidung dünner Metallschichten mittels CVD-Verfahren wurden untersucht.
Das Verhalten von Phosphan-Silber und -Kupfer-Verbindungen in Lösung wurde mittels dynamischer NMR-Spektroskopie untersucht. Dazu wurden phosphankoordinierte Silber(I)- und Kupfer(I)-Acetate als Modellsystem benutzt und mit einem ausgewählten Vertreter der ungesättigten Carboxylate verglichen.
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Bengtsson, Linda. "Spin-coatade dispersioner på glasytor : en studie av aggregationen mellan latex och DoTAB med AFM." Thesis, Karlstads universitet, Fakulteten för teknik- och naturvetenskap, 2012. http://urn.kb.se/resolve?urn=urn:nbn:se:kau:diva-14568.
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Sjölander, Joel. "Spin-coated antimony- and nickel-doped tin dioxide electrodes foranodic ozone evolution." Thesis, Mittuniversitetet, Avdelningen för naturvetenskap, 2015. http://urn.kb.se/resolve?urn=urn:nbn:se:miun:diva-25077.
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This work have served as a preliminary work for a more extensiveresearch on antimony- and nickel-doped tin dioxide electrodes used forozone generation in electrolytic reactions. The target has been to test themanufacturing process of Sb/Ni-doped SnO2 with spin-coating techniqueand succeed to make electrodes for anodic ozone evolution and tocharacterize them. Electrode manufacturing was made using sol-gelfrom chloride salts of tin, antimony and nickel, which were applied to atitanium substrate through spin-coating. The substrates were spun todifferent thickness followed by drying and baking of the substrate. A setof electrodes with three layers were made just with spin-coating, additionallya set of electrodes with twenty layers were made with bothspin-coating and dip-coating. To characterize physical properties of theelectrodes, x-ray diffraction, scanning electron microscopy and transmissionelectron microscopy were conducted. Electrochemical measurementswere made in open beakers with a platinum cathode andsulphuric acid electrolyte using a galvanostatic measurement with afixed current. To measure the ozone evolution the optical absorbancedifference from the electrolyte compared to a clean electrolyte wasmeasured, this however only measures the amount of aqueous ozonepresent. Assembling of SnO2 electrodes for ozone evolution was successful.For the three-layered electrodes the absorbance readings wereinconclusive but with the twenty-layered electrodes there was a smell ofozone present within the electrolyte and absorbance reading of the dipcoatedelectrode presented a clear peak for ozone.
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Lang, Christopher Ilic. "Dielectric spin coating characterization, modeling, and planarization using fill patterns for advanced packaging technologies." Thesis, Massachusetts Institute of Technology, 2017. http://hdl.handle.net/1721.1/113137.
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Thesis: M. Eng., Massachusetts Institute of Technology, Department of Electrical Engineering and Computer Science, 2017.This electronic version was submitted by the student author. The certified thesis is available in the Institute Archives and Special Collections.
Cataloged from student-submitted PDF version of thesis.
Includes bibliographical references (pages 97-99).
Redistribution layers (RDLs) are separate packaging layers dedicated to connecting dies with each other, and to external I/O ports in advanced 2.5D packaging technologies. These layers can be made smaller than the bulky metal traces in conventional substrate packaging, reducing electrical delay and power consumption. Currently, the damascene process is the most common method to create the copper traces in RDLs. However, due to the required inclusion of chemical mechanical polishing (CMP), this process is significantly more expensive than semi-additive electrochemical plating (ECP) and dielectric spin-coating (DSC) processes. The semi-additive techniques are typically avoided as, without CMP, they suffer from thickness variations following the fabrication of each layer. As multiple layers are fabricated, these variations compound, and can result in a structure with significant topographical and electrical performance concerns. In this thesis, we model and predict the surface non-uniformities resulting from the DSC process applied to underlying topographies, and propose dummy fill and cheesing patterns which control the variations of the DSC process. We first design test vehicles (TVs) which represent topographies common in RDLs, most notably the copper lines and vias, and use these to experimentally determine the thickness variations caused by each process. We then develop empirical models based on these results. The DSC process is modeled as a convolution between the underlying topography (typically the copper lines) and an appropriately chosen impulse response. Finally, we present dummy fill and cheesing patterns that have the potential to control the variations of both processes for any arbitrary layout.
by Christopher Ilic Lang.
M. Eng.
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Ces?rio, Moises R?molos. "Desenvolvimento de componentes nanom?tricos para aplica??o em c?lulas a combust?vel ? base de s?lidos estruturados e filmes finos." Universidade Federal do Rio Grande do Norte, 2009. http://repositorio.ufrn.br:8080/jspui/handle/123456789/17611.
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Previous issue date: 2009-02-04Coordena??o de Aperfei?oamento de Pessoal de N?vel Superior
The present work aims the preparation of filmes of strontium-doped lanthanum manganite (perovskita) yttria-stabilized zirconia (LSM-SDC) films deposited on substrate of YSZ by means of spin coating technique having as principal objective their application to solid oxide fuel cells of intermediate temperature. La0,8Sr0,2MnO3 and Ce0,8Sm0,2O1,9 were obtained by modified Pechini method by use of gelatin which act as polymerization agent. The powders obtained were characterized by Xray fluorescence, X ray diffraction, electronic scanning microscopy and the superficial area by BET method. The results obtained by X-ray fluorescence showed that the route adopted for obtention of powders was effective in the obtention of the compositions with close values to the stoichiometrics. Ethyl cellulose was used as pore-forming agent and mixed with the LSM-SDC powders in weight proportions of 1:24, 2:23 and 1:9. The films were sintered at 1150 ?C for 4 h and characterized by X-ray diffraction and scanning electron microscopy technique (SEM) and atomic force. The phases quantification of the precursory powders and of the obtained films was carried through Rietveld method. According with the analysis of SEM, as the content of ethyl cellulose was increased, the pore distribution in films become more uniform and the pore size reduced. The methodology used for the obtention of the films was very efficient, considering a material was obtained with characteristics that were proper to the application as electrolyte/cathode system to solid oxide fuel cells
O trabalho trata da prepara??o de filmes de manganita de lant?nio dopado com estr?ncio (perovskita) c?ria dopada com sam?rio (LSM-SDC) sobre substrato de zirc?nia estabilizada com ?tria (YSZ) pela t?cnica spin coating, para utiliza??o em c?lulas a combust?vel de ?xido s?lido de temperatura intermedi?ria. Neste trabalho, La0,8Sr0,2MnO3 e Ce0,8Sm0,2O1,9 foram obtidos pelo m?todo Pechini modificado pelo uso de gelatina que atua como agente polimerizante e quelante. Os p?s obtidos foram caracterizados por fluoresc?ncia de raios-X, difra??o de raios-X, microscopia eletr?nica de varredura e determina??o da ?rea superficial pelo m?todo BET. Os resultados obtidos por fluoresc?ncia de raios-X mostraram que a rota adotada para obten??o dos p?s foi eficaz na obten??o da composi??o com valores pr?ximos ao estequiom?trico. A etilcelulose foi usada como agente formador de poros e foi misturada ao p?s de LSM-SDC em propor??es m?ssicas de 1:24, 2:23 e 1:9. Os filmes foram tratados termicamente a 1150 ?C por quatro horas e caracterizados estruturalmente pela t?cnica de difra??o de raios X e morfologicamente pelas t?cnicas de microscopia eletr?nica de varredura e for?a at?mica. A quantifica??o das fases dos p?s precursores e dos filmes obtidos foi realizada atrav?s do refinamento Rietveld. De acordo com a an?lise de MEV, quando a quantidade de etilcelulose foi aumentada, a distribui??o dos poros nos filmes tornou-se mais uniformes e o tamanho de poros reduzidos. A metodologia empregada para a obten??o dos filmes mostrou-se satisfat?ria, considerando que foi obtido um material com caracter?sticas apropriadas para a aplica??o como sistema eletrodo/eletr?lito em c?lulas a combust?vel de ?xido s?lido (SOFC)
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Wang, Xueyuan. "Control and Characterization of Textured, Hydrophobic Ionomer Surfaces." University of Akron / OhioLINK, 2012. http://rave.ohiolink.edu/etdc/view?acc_num=akron1341290657.
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Lima, Bruno Henrique Ramos de. "Análise estrutural de filmes finos de hematita produzidos por spin-coating para geração de hidrogênio." Universidade Federal de São Carlos, 2010. https://repositorio.ufscar.br/handle/ufscar/830.
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Previous issue date: 2010-08-06Universidade Federal de Minas Gerais
Water photolysis at semiconductors is a clean and renewable method for solar energy conversion into hydrogen fuel. Hematite (-Fe2O3) thin films have been presented as a promissory material for water photolysis due to it s abundance, chemical stability, environmental compatibility and appropriate band gap energy to absorb a large part of the solar spectrum and for the water photooxidation process. In this work the influence of synthesis and deposition parameters on the microstructure and photoelectrochemical properties were studied. The films were produced on FTO substrates by spin-coating deposition of Fe+3 polymeric resin prepared by complex polymerization method using ethanol as a solvent. Doped films were prepared by addition of tetraethylortosilicate (TEOS) in Fe+3 resin. Characterizations were made by xrays diffraction, UV-Visible spectroscopy and scanning electronic microscopy. Photoelectrochemical properties were measured in a three-electrode standard electrochemical cell, with the film as a work electrode, platinum as a counter electrode and Ag/AgCl in KCl satured solution as reference electrode. Results have shown that substrate-film interface is responsible for the formation of three regions with distinct morphologies and have shown that just a small percentage of the films are in direct contact with the substrate and contributes with photocurrent. The better silicon incorporation in hematite structure using ethanol as a solvent was also observed. The best photocurrent density were obtained by one layer silicon doped films, at 0,6 V in 1M NaOH electrolyte.
A fotólise da água em semicondutores é um método limpo e renovável para a conversão de energia solar em hidrogênio combustível. Filmes finos de hematita (-Fe2O3) têm sido apresentados como um material promissor para a fotólise de água devido sua abundância, estabilidade química, compatibilidade ambiental e banda proibida de energia adequada para absorção de grande parte do espectro solar e para o processo de fotooxidação da água. Nesse trabalho foi estudada influência dos parâmetros de síntese e deposição sobre a microestrutura e propriedades fotoeletroquímicas dos filmes. Os filmes foram produzidos por spin-coating através da deposição em substrato de óxido de estanho dopado com flúor (Fluorine Tin Oxide FTO) de resina polimérica contendo Fe+3 preparada pelo método de polimerização de complexos usando etanol como solvente. Os filmes dopados com silício foram preparados com a adição de tetraetilortosilicato (TEOS) na solução de Fe+3. A caracterização dos filmes foi feita através de difração de raios-x, espectroscopia UV-Visível e microscopia eletrônica de varredura. A propriedade fotoeletroquímica foi medida em uma célula eletroquímica padrão com três eletrodos, sendo o filme o eletrodo de trabalho, platina o contra-eletrodo e Ag/AgCl em KCl saturado o eletrodo de referência. Os resultados mostraram que a interface substrato-filme é responsável pela formação de três regiões com morfologias diferentes e que apenas uma pequena porcentagem do filme está de fato em contato direto com o substrato e contribui para a fotocorrente. Também se observou que o uso de etanol como solvente melhora a incorporação do silício pela rede da hematita. Os melhores resultados de densidade de fotocorrente foram obtidos pelos filmes de uma camada dopados com silício, medidos a 0.6 V e em eletrólito de1M NaOH.
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Garcia, Laurenia Martins Pereira. "Estudo da atividade fotocatal?tica dos filmes finos de TiO2/ In2O3 obtidos por spin coating." PROGRAMA DE P?S-GRADUA??O EM CI?NCIA E ENGENHARIA DE MATERIAIS, 2016. https://repositorio.ufrn.br/jspui/handle/123456789/21415.
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Conselho Nacional de Desenvolvimento Cient?fico e Tecnol?gico (CNPq)
Nas ?ltimas d?cadas tem se observado um enorme interesse no estudo de materiais cer?micos nanoestruturados com propriedades fotocatal?ticas e fotoluminescentes. Um dos precursores ? o di?xido de tit?nio (TiO2) que possui propriedades ?pticas, por?m apresenta alto valor de band gap (3.2 eV), combinando-o com outros ?xidos como o ?xido de ?ndio (In2O3) intensificar? suas propriedades, j? que o In2O3 possui menor band gap (2,8 eV), al?m de apresentar absor??o no vis?vel sendo eficaz para aumentar a absor??o do TiO2. Neste trabalho o m?todo de spin-coating foi utilizado na deposi??o de filmes finos multicamadas de TiO2/In2O3. Na prepara??o dos filmes, foram utilizadas resinas obtidas pelo m?todo de polimeriza??o de complexos (MCP), as quais tiveram sua viscosidade ajustada em 20cps. As resinas foram depositadas sobre o substrato de sil?cio (Si) variando em 4, 8 e 16 camadas, logo ap?s, foram cristalizadas em diferentes temperaturas 300?C, 500?C e 700?C. A caracteriza??o dos filmes foi feita por meio de difra??o de Raios-X (DRX), microscopia eletr?nica de varredura com emiss?o de campo (MEV-FEG), microscopia de for?a at?mica (AFM), espectroscopia na regi?o do UV-V?sivel (UV-Vis) e medidas de fotoluminesc?ncia (FL). Os resultados de difra??o de Raios-X confirmaram a forma??o do TiO2 com fase anatase e do In2O3, n?o havendo intera??o qu?mica entre os ?xidos dos filmes. As imagens obtidas por microscopia de for?a at?mica mostraram filmes bem densificados com tamanho m?dio de gr?o variando de 15 a 35 nm. As imagens da se??o transversal dos filmes de TiO2/In2O3 cristalizados a 700?C indicam espessuras bem uniformes variando de 262 a 708nm entre amostras. A atividade fotocatal?tica dos filmes foi avaliada atrav?s da degada??o do corante azul de metileno, os resultados indicaram que os filmes conferiram boa atividade fotocatal?tica na decomposi??o do azul de metileno. Os espectros de fotoluminesc?ncia apresentaram emiss?es correspondentes na regi?o do azul, resultado confirmado atrav?s do diagrama de cromaticidade.
In recent decades it has seen a huge interest in the study of nanostructured ceramic materials with photocatalytic and photoluminescent properties. A precursor is titanium dioxide (TiO2) having optical properties but has a high value of band gap (3.2 eV), combining them with other oxides such as indium oxide (In2O3) intensify their properties, as the In2O3 it has a smaller band gap (2.8 eV), and presents the visible absorption being effective to increase the absorption of the TiO2. In this work the spin-coating method was used in the deposition of multilayer thin films of TiO2 / In2O3. In the preparation of films, resins used were obtained by the complex polymerization method (CPM) which had a viscosity of 20cps adjusted. The resins were deposited on the silicon substrate (Si) ranging in 4, 8 and 16 layers there upon were crystallized at different temperatures 300?C, 500?C and 700?C. The characterization of the films was made by diffraction of X-rays (XRD), scanning electron microscopy, field emission (SEM-FEG), atomic force microscopy (AFM), spectroscopy in the UV-Visible region (UV- Vis) and photoluminescence measurements (PL). The results of X-ray diffraction confirmed the formation of anatase TiO2 with and In2O3 phase, there is no chemical interaction between the oxides of the films. The images obtained by atomic force microscopy showed well densified film with average grain size ranging from 15 to 35 nm. The images of the cross section of the film TiO2/In2O3 crystallized at 700?C indicated a uniform thickness ranging from 262 to 708nm between samples. The photocatalytic activity of the films was evaluated by the degradation of methylene blue dye, the results indicated that the film gave good photocatalytic activity in the decomposition of methylene blue, and increasing the number of layers had no significant influence on the increase in activity photocatalytic. The films were recycled and reused for three cycles photobleaching. The results were quite significant, as demonstrated the feasibility of reuse of thin films in the dye photobleaching. The photoluminescent properties of the films was studied at room temperature using excitation wavelength of 350 nm. The thin films studied had broadband issue. A high photoluminescent intensity was observed for the films annealed at 700 ? C in the different variations of the layer numbers. From the results obtained it was observed the feasibility of using the thin film as a photocatalytic material.
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Zrikem, Khawla. "Influence du traitement UV et du dopage au lithium sur les propriétés électrochromes de couches minces d'oxyde de nickel préparées par sol-gel." Thesis, Bordeaux, 2019. http://www.theses.fr/2019BORD0072.
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L'oxyde de nickel est l'un des matériaux électrochromes les plus utilisés dans le domainedes fenêtres intelligentes qui contrôlent la lumière et la chaleur provenant de l'extérieur versl'intérieur des bâtiments. Il est important de mentionner que l’oxyde de nickelstoechiométrique est un isolant à température ambiante. Les propriétés microstructurales,chimiques, optiques et électrochromes des couches minces dépendent fortement du procédéde préparation et traitement final. En outre, l’un des principaux défis consiste à fabriquer lescouches minces sur des substrats souples afin de fabriquer des fenêtres électrochromes degrande taille ce qui demande un traitement à T ambiante. A cet égard peu d’étudesbibliographiques ont évalué l’effet du traitement par les rayonnements UV sur les propriétésdes couches électrochromes. Dans ce travail, des couches minces d'oxyde de nickel (NiO) ontété préparées par la méthode Sol-Gel associée aux techniques de dépôts par centrifugation(spin-coating) et par trempage-retrait (dip-coating). L’ajustement des paramètresexpérimentaux relatifs à ce procédé (la concentration du précurseur, la nature du solvant et dustabilisant, le nombre de couches déposées et le type des traitement final (calcinationà 300 °C ou traitements UV) a permis d’optimiser les conditions de préparation des couchesminces et par la suite de contrôler les caractéristiques chimiques, microstructurales et optiquesdes couches développées. Cette étude a montré qu'une concentration de 0,3 M d'acétate denickel, le méthanol comme solvant et le triton X-100 en tant que stabilisant conduisent à unecouche mince NiO avec les meilleures performances optiques. Les caractérisations par lestechniques (DRX, ATG, FT-IR, XPS et GDOES) ont particulièrement mis en évidence le rôledes conditions de traitement final sur la composition et la morphologie des couches d’oxydede nickel élaborées. La DRX a montré qu’elles sont faiblement cristallisées et que la structuredevient plus amorphe avec le traitement UV. La spectrométrie UV-visible et les CV ont révéléque les couches traitées par UV en utilisant une lampe de 30 W pendant 5 h (UV-30W-5h)possèdent le contraste optique le plus élevé et la meilleure stabilité électrochimique. L'analysemorphologique a montré que les couches minces déposées par la technique de spin coatingsouffrent de la formation de fissures et d’une hétérogénéisation de la surface. Pour résoudre ceproblème, le procédé de spin-coating a été remplacé par la technique dip-coating tout enconservant les paramètres optimisés précédemment. Cette technique a permis de produire descouches minces plus homogènes et moins fissurées. D'autre part, pour continuer à améliorerles propriétés électrochromes, ces couches ont été dopées par le lithium. Les résultats obtenusont montré l’importance de l’addition de Li sur l’amélioration des propriétés électrochromesde Li : NiO cyclé dans KOH comme électrolyte. En effet, une variation de la transmittanceΔT de 70% (à 450 nm) a été obtenue dans les couches minces 8 % Li: NiO. Le résultat quiressort des caractérisations FT-IR et ATG, porte sur le fait que les couches calcinéescontiennent moins de composés organiques, à l’inverse de celles traitées par UV riches enmatière organique. L'analyse XPS a montré que la teneur en Ni2+ est plus élevée dans lescouches dopées. L’analyse GDOES a montré une distribution homogène de Li dans toutel’épaisseur de la couche. Toutefois, les couches minces de 8% de Li: NiO traitées par UV-30W-5h souffrent d’une dégradation de leurs performances électrochromes dans le KOHaprès quelques cycles, pour cette raison, elles ont été cyclées dans d’autres électrolytesliquides ioniques, tels que le LiTFSI-EMITFSI, le NaTFSI-EMITFSI et le KTFSI-EMITFSI.Les meilleures propriétés électrochromiques ont été obtenues avec l'électrolyte KTFSIEMITFSI.Ce résultat important représente une bonne perspective pour l'avenirNickel oxide is one of the most widely used electrochromic materials in the field of smartwindows that control light and heat from the outside to the inside of buildings. It is importantto mention that stoichiometric nickel oxide is an insulator at room temperature. Themicrostructural, chemical, optical and electrochromic properties of the films are highlydependent on the process of preparation and final treatment. In addition, one of the mainchallenges is the elaboration of thin films on flexible substrates suitable for electrochromicapplications which requires treatment at ambient T. In this respect, in literature, few studieshave reported the effect of UV treatment on the properties of electrochromic layers. In thiswork, thin films of nickel oxide (NiO) were prepared by the Sol-Gel method associated withspin-coating and dip-coating techniques. The adjustment of the experimental parametersrelating to this process (the concentration of the precursor, the nature of the solvent and thestabilizer, the number of deposited layers and the type of final treatment (calcination at300 °C or UV treatments) made it possible to optimize conditions for the preparation of thinlayers and subsequently to control their chemical, microstructural and optical characteristics.This study showed that a concentration of 0.3 M nickel acetate, methanol as solvent and triton100-X as a stabilizer lead to NiO thin film with the highest optical properties. The techniquesof characterizations (DRX, ATG, FT-IR, XPS and GDEOS) have particularly highlighted therole of the final treatment conditions on the composition and the morphology of the preparednickel oxide thin films. The XRD results showed that they are weakly crystallized and thestructure becomes even more amorphous for UV treated samples. UV-visible spectrometryand cyclic voltammetry revealed that UV-treated thin films using a lamp of 30 W for 5 h(UV-30W-5h) have the highest optical contrast and the highest electrochemical stability.Morphological analysis (SEM) indicated that the thin films deposited by the spin-coatingtechnique suffer from crack formation and surface heterogenization. To solve this issue, thespin-coating process has been replaced by the dip-coating technique while retaining thepreviously optimized parameters. This technique has made it possible to produce thin filmsthat are more homogeneous and less cracked. On the other hand, to continue to improve theelectrochromic properties, these thin films were doped with lithium. The results showed theimportance of the addition of Li on the improvement of the electrochromic properties ofLi : NiO cycled in KOH as electrolyte. Indeed, a variation of the ΔT transmittance of 70 %was reached for the thin films 8 % Li : NiO. The result of the FT-IR and ATGcharacterizations showed that the calcined thin films contain lesser amount of organiccompounds compared to those treated by UV which still contains large amount of organicmatter. XPS analysis has shown that the Ni2+ content is higher in the doped layers. GDOESanalysis showed a homogeneous distribution of Li along the thickness of the thin film.However, 8% Li: NiO thin films treated with UV-30W-5h suffer from a degradation of theirelectrochromic performances in KOH after a few cycles. For this reason, their cyclingproperties have been investigated in a large range of electrolytes, based on ionic liquidincluding LiTFSI-EMITFSI, NaTFSI-EMITFSI and KTFSI-EMITFSI. The highestelectrochromic properties were obtained with KTFSI-EMITFSI as an electrolyte. Thisimportant result presents a good prospect for the future
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Magubane, Siphesihle Siphamandla. "Metal assisted chemically etched silicon nanowires for application in a hybrid solar cell." University of the Western Cape, 2018. http://hdl.handle.net/11394/6733.
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>Magister Scientiae - MScPhotovoltaic (PV) devices based on inorganic-organic hybrid active layers have been extensively studied for over a decade now. However, photoactive hybrid layers of material combinations such as rr-P3HT and SiNWs still require further exploration as candidates for solar cell (SC) fabrication, due to favourable optical absorption and charge carrier mobility associated with them respectively. The ultimate goal of the study is to fabricate ITO/PEDOT:PSS/rr-P3HT:SiNWs/Al SCs with different SiNWs content and investigate the different parameters or factors influencing the performance of these cells. The vertically aligned SiNW arrays on a Si wafer were synthesised via metal assisted chemical etching (MACE) and a method of chemically detaching these wires was developed. The average length and the diameter of the SiNWs obtained were 4.5 μm and 0.2 μm, respectively. Different weight ratios of as-synthesised SiNWs were then incorporated within rr-P3HT to form different hybrid solutions, i.e. rr-P3HT: 0.3 wt% SiNWs, rr-P3HT: 0.7 wt% SiNWs and rr-P3HT: 1.3 wt% SiNWs. In addition, a pure rr- P3HT solution was made for reference purposes. SEM characterisation shows that the SiNWs are randomly distributed across the active area, and that the film becomes progressively inhomogeneous upon addition of SiNWs, whereas the TEM characterisation revealed that there is no chemical interaction between the rr-P3HT and SiNWs. The UV-Vis and PL spectra suggest that there are changes in absorption and emission characteristics upon SiNW incorporation into the rr-P3HT matrix, which may have impacted the charge transfer .The electrical properties of the different hybrid films were probed using Hall Effect measurements, which revealed that the conductivity increases with the increase in the concentration of nanowires (NWs). The increase in conductivity upon the addition of SiNWs in the rr-P3HT matrix was related to an increase of the mobility (μ) of charge carriers in the hybrid films.
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Fan, Winston Chi Hang 1975. "A study of solvent-rich environments for evaporation rate control in the extrusion spin coating process." Thesis, Massachusetts Institute of Technology, 1998. http://hdl.handle.net/1721.1/32761.
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Thesis (S.B.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 1998.Includes bibliographical references (p. 44).
Microlithography is a process used in microchip fabrication to transfer a circuitry pattern onto a silicon wafer. An important step in the process is the deposition of a thin coating of photoresist from which the lithographic mask is made. The photoresist layer is typically 1 [micro]m thick with a thickness variation of less than 25[angstroms] (within 3[sigma]). The current industrial process of spin coating can achieve these specifications. However, these standards are achieved at the cost of wasting 95% of the photoresist applied. Extrusion-spin coating is a new coating method that has the potential of wasting as little as 50% of the photoresist applied. Before extrusion-spin coating can be used effectively, however, the coating uniformity must be improved through the reduction of solvent evaporation from the wafer surface. This research project evaluates improvements in coating uniformity resulting from the application of a low to moderate solvent concentration environment. At low dispense volumes of approximately 0.5ml, the standard deviation from the mean of the coating thickness was reduced from 335[angstroms] to 56[angstroms] with the application of a low solvent concentration environment. At the highest solvent concentration level that can be achieved by the experimental apparatus, the extrusion-spin coating had a deviation comparable to the high dispense volume, traditional spin coating technique. In addition, the extrusion-spin coating also had an efficiency that was more than a magnitude higher than that of the spin coating. This study indicates that extrusion-spin coating in a solvent-rich environment is a viable replacement for the spin coating process.
by Winston C. Fan.
S.B.
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Winarski, David J. "Synthesis and Characterization of Transparent Conductive Zinc Oxide Thin Films by Sol-gel Spin Coating Method." Bowling Green State University / OhioLINK, 2015. http://rave.ohiolink.edu/etdc/view?acc_num=bgsu1434124579.
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Cobo, Fernanda Nardo. "Preparação e caracterização de filmes microporosos de triacetato de celulose utilizando a técnica de spin coating." Universidade Estadual de Londrina. Centro de Ciências Exatas. Programa de Pós-Graduação em Química, 2016. http://www.bibliotecadigital.uel.br/document/?code=vtls000206593.
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O presente trabalho apresenta a produção e caracterização de filmes microporosos de triacetato de celulose. O triacetato de celulose foi obtido a partir da acetilação homogênea da celulose extraída da madeira, por um eficiente método totalmente livre de cloro. Os filmes microporosos foram produzidos através da técnica breath figure via spin coating e caracterizados por Microscopia Óptica, Microscopia Eletrônica de Varredura e Microscopia de Força Atômica. O efeito do solvente, concentração da solução polimérica, massa molar do polímero e velocidade de rotação do spin coater foram investigados na formação e morfologia dos poros. Os poros observados apresentaram morfologia arredondada e o diâmetro médio variou de 0,1 - 0,4 µm. Foi observado que os solventes utilizados (CHCl3 e CH2Cl2) produziram diferentes densidades de poros na superfície dos filmes. A concentração da solução polimérica e a massa molar do polímero tiveram efeito no tamanho dos poros. O aumento da velocidade de rotação do spin coater resultou na formação de poros com menor dispersão de tamanho. Os filmes microporosos de triacetato de celulose foram recobertos com nanopartículas de prata e utilizados como substratos em Espectroscopia Raman intensificada por superfície (SERS) para detecção de L-cisteína.This work reports the production and characterization of microporous films of cellulose triacetate. The cellulose triacetate was obtained from homogeneous acetylation of cellulose extracted from wood by an effective method totally free of chlorine. The microporous films were produced using the breath figure technique via spin coating and characterized by Optical Microscopy, Scanning Electron Microscopy and Atomic Force Microscopy. Microporous films of cellulose triacetate showed pores with rounded morphology and average pore diameter was 0.1 to 0.4 µm. The effect of the solvent, concentration of the polymer solution, the polymer molar mass and spin coater speed of rotation were investigated on the formation and morphology of the pores. It was observed that the used solvents (CHCl3 and CH2Cl2) yielded different densities of pores on the surface film. The concentration of the polymer solution and the molecular weight of the polymer had an effect on the pore size. Increasing the spin coater rotating speed resulted in formation of pores with less dispersion in size. The microporous films of cellulose triacetate were coated with silver nanoparticles and used as substrates for surface enhanced Raman spectroscopy (SERS) for L-cysteine detection.
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COSTA, Anderson Stojan. "Obtenção de filmes finos do sistema ZnO:Co depositados em substratos de vidro e safira via Spin Coating." Universidade Federal de Alfenas, 2014. https://bdtd.unifal-mg.edu.br:8443/handle/tede/539.
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Os filmes finos dos óxidos de ZnO dopados com Co, preparados via método Pechini, são semicondutores magnéticos diluídos com grande potencial para serem empregados na fabricação de dispositivos spintrônicos. Filmes com concentrações nominais de 1, 3 e 5 %, em mol, de Co foram depositados por spin-coating sobre substratos de vidro e safira. Os filmes finos preparados foram caracterizados por difração de raios X, microscopia eletrônica de varredura, analise de EDS e absorção de raios X. Padrões de difração de raios X indicam que os filmes dopados com Co sobre substrato de vidro tem fase cristalina com a estrutura wurtzite. Espectros EXAFS sugerem que nos filmes com concentrações de 5% os átomos de cobalto não estão ocupando somente os sítios dos íons Zn2+ dentro da rede cristalina do ZnO. As espessuras dos filmes usando imagens de microscopia eletrônica de varredura ficaram entre os valores de 160 nm e 800 nm. Os procedimentos empregados no trabalho produziram filmes espessos e bem distribuídos pelas superfícies dos vidros. Os filmes depositados em substratos de safira não recobriram de forma uniforme a superfície dos substratos.Co-Doped ZnO thin films, a diluted magnetic semiconductor with great potential to be used in the manufacture of spintronic devices, were prepared via Pechini method. Films with nominal concentrations of 1, 3 and 5 mols % of Co were depositions by spin-coating on glass and sapphire substrates. The prepared thin films were characterized by X-ray diffraction, scanning electron microscopy, EDS analysis and X-ray absorption. X-ray diffraction patterns indicated that the films doped with Co on the glass substrate has a crystalline phase with wurtzite structure. EXAFS spectra suggest that in thin films with concentrations of 5 mol% of Co, these atoms are not only occupying the Zn2 + ionic sites within the ZnO crystal lattice. The thicknesses of the films measured using images from scanning electron microscopy were between the values of 160 nm and 800 nm. The method and procedures employed in the work produced good films on glass substrates, thick and well distributed across the surface of the substrate one. The films deposited on sapphire substrates not uniformly covered the surface of the substrate.
Coordenação de Aperfeiçoamento de Pessoal de Nível Superior - CAPES
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Chen, Cheng-Chung, and 陳正忠. "Spin Coating of LCD." Thesis, 2003. http://ndltd.ncl.edu.tw/handle/31740037299248872231.
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Wang, Zhi Da, and 王志達. "The study of spin coating." Thesis, 1995. http://ndltd.ncl.edu.tw/handle/342tmq.
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"Two Coating Problems: Thin Film Rupture and Spin Coating." Diss., 2009. http://hdl.handle.net/10161/1087.
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Froehlich, Mihaela. "Two Coating Problems: Thin Film Rupture and Spin Coating." Diss., 2009. http://hdl.handle.net/10161/1087.
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In this work we study two fluid dynamics problems which are of particular interest in industries where thin film coating is a part of a production process, like optical coating, insulating layers in micro-circuitry, adhesives and painting. Experiments show that for very thin films of viscous liquids van der Waals intermolecular forces can produce instabilities leading to film ruptures. We consider this problem of thin film rupture driven by van der Waals forces and look for axisymmetric steady state solutions. Small perturbations from these solutions will lead to finite-time rupture. Using different numerical approaches we look for the solutions close to rupture. We obtain more solutions via shooting method and show that finite difference schemes on uniform grids are inferior to shooting for this problem. The second problem comes from a process called spin coating, one of the methods used to coat uniform thin films in variety of industrial applications such as manufacturing magnetic and optical discs. In spin coating a drop of liquid spreads radially due to centrifugal effects from spinning and eventually yields a thin film of uniform thickness formed on the solid surface. In experiments fingering instabilities at the expanding front of the fluid layer have been observed. This has renewed interest in the study of the nonlinear dynamics of such problems. We derive the evolution equation for thin films in rotating polar coordinates. We solve the axisymmetric problem and give numerical and analytical results for steady states. For large fluid volumes in rotating cylinders, we show that when centrifugal and gravity forces dominate, steady state solution free-surface profiles are parabolas for the angular velocity less then the critical velocity, and for higher velocities film ruptures, producing truncated parabolic profiles with circular contact lines. We find the similar results for the steady state case when centrifugal and surface tension forces are dominant. FInally, we study the dynamics of the spin coating again considering three cases, as weill as including the influence of van der Waals and Marangoni forces.
Dissertation
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Chen, Chung-Tsien, and 陳崇憲. "The Theoretical Analysis of Spin Coating Process." Thesis, 1998. http://ndltd.ncl.edu.tw/handle/46815783541558073179.
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碩士國立臺灣大學
化學工程學系研究所
86
Spin coating is a widely used process for applying a thin uniform filmto a flat substrate or wafer disc. This technique is used in the electronics industry to coat photoresist on silicon wafers for integrated circuits,for magnetic storage disks, and for coating color television scseens andoptical devices. During the process of spin coating a small quantity of liquid, which is usually in solution with some volatile solvents, is initially applied onto a slowly spinning disk, forming a liquid film to wet the whole disk, and the spinning disk is then accelerated to higher rotating speed. In this thesis the dynamic properties and uniformity of the spin-coated film are considered. At first the dynamic film thickness, coating processing time, skin formation phenomena, dynamic shear stress and max. shear stressin the film are discussed. We set up a mathematical model of the spin coating system which includes the governing equations of dynamic film thickness, fluid continuity, convective/diffusion solvent mass fraction in the film, fluid momentum and solvent mass transfer in the free surface with the Garlerkin finite element method dealing with space and solvent mass fraction variables and finite difference method dealing!with time variable. In the results the film thickness and coating processing time are functions of spinning speed, initial solvent mass fraction of coating solution, initial solvent mass fraction in the gas phase, operating pressure, operating temperature, material rheological properties, in itial solution viscosity and initial film thickness. The relation between the film properties and operation variables is found. The skin formation phenomena is the function of mass transfer rate, the solvent property of the coating solution, spinning speed,operation temperature and initial film thickness. Finally , the max. shear stress depends on spinning speed, initial film thickness and the radius of substrate. The expression of max. shear stress of spin-coated film isalso found. Next the uniformity of spin-coated film for the Newtonian fluid and non-Newtonian fluid (power law fluid and truncated power law fluid) is considered.To study the uniformity of spin-coated film, we consider the continuity equation, equations of motion, average solvent mass fraction in the film,dynamic film thickness and solvent mass transfer in the free surface and usethe central difference method dealing with space variable and average solventmass fraction variable and 4th order Runge-Kutta method dealing with the ordinary differential equations. In the results the degree of uniformity of the spin-coated film of Newtonian fluid is over 99.5 % with ioitial linear film non-uniformity. Therefore initial wave type film non-uniformityresults in the worse film uniformity and the degree of film uniformitydecreases with time increasing. For spin-coated film of non-Newtonian fluid,the degree of film uniformity can only reach 92 % but the film thickness and degree of film uniformity does not depend upon the initial film non-uniformity.
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Hussain, Syeda. "Shear alignment of particles during spin coating." 2007. http://hdl.rutgers.edu/1782.2/rucore10001600001.ETD.16097.
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Huang, Kuo-Hsin, and 黃國鑫. "Reduction of Amount of Dye during Spin Coating." Thesis, 2007. http://ndltd.ncl.edu.tw/handle/78698223180454742871.
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博士國立中央大學
機械工程研究所
95
Reducing the amount of dye used in the spin-coating process for compact disc-recordable (CD-R) is essential for cost reduction and environmental consideration. The results of flow visualization show that, compared with that on a smooth substrate, the patterned roughness on the pregrooved substrate does affect the fingering instability and the amount of time needed for fully coating the substrate. The airshear flow above the disc will affect the injection of dye onto the disc, particularly in an area of larger radius. Therefore, a higher disc rotation speed in the stage of dye injection is not necessarily better than a slower one. The range of nozzle-moving speed V, which can be used for fully coating the substrate, is wider at 300 rpm than that at 500 rpm. The regime maps for injection rate Q, nozzle-moving speed V, and injection volume show that by choosing appropriate Q and V, the amount of dye used was reduced to 0.05 mL. The study investigates how the method of liquid dispensing, including released drop, centered injection and spiral injection, affects the coating efficiency during spin coating processes. The flow visualization indicates that the method of liquid dispensing has a significant effect on the time needed to fully coat the wafer, the minimum liquid volume required for fully coating, and the maximum attainable radius of liquid front Rmax. Compared with the released drop and the spiral injection, the centered injection takes the longest time to fully coat the wafer mainly due to its very small critical radius Rc. Under a constant Bond number Bo, Rmax for the spiral injection is slightly smaller than those for the released drop and centered injection in the region of high rotational Reynolds number Rew, while the Rmax for the spiral injection becomes the largest in the region of low Rew.
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Lin, Zi-Chen, and 林子程. "The study of dense layer of QDSSC prepared by dip coating and spin coating." Thesis, 2017. http://ndltd.ncl.edu.tw/handle/31505879005340023008.
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碩士國立中興大學
物理學系所
105
Compact layers of Quantum dot sensitized solar cell are prepared by spin-coating or dip-coating. The efficiencies of the cells are obtained by measuring I-V curves. The morphology and the thickness of the compact layers are investigated by SEM and AFM. The compact film thickness is 50nm for spin-coating method, the best efficiency of the cells prepared by is 1.55%. It is 350nm for film prepared by dip-coating and the best efficiency of the cell is 0.91%. The morphologies of the films after heat treatment are different dramatically. Film prepared by spin-coating shows tangled branch-like structure with small aggregated particles on the branches, while it is small particles compact aggregation structure for dip-coating prepared layer. According to the results of impedance measurements, the electron diffusion lengths within TiO2 particles increase with the increasing of heating rate, but decrease as the durations of heat treatment time at 450oC increase.
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Hsiao, Po-Yin, and 蕭博尹. "Control Fingering Instability of Magnetic Fluid in Spin Coating." Thesis, 2006. http://ndltd.ncl.edu.tw/handle/58199481299472827666.
Full textAbstract:
碩士國立中央大學
機械工程研究所
94
In spin coating, the instability fingers would arise at the wave front of continuous liquid film. Study the magnetic fluid in spin coating submitted to a perpendicular magnetic field. It produces the phenomenon breakup in peaks that the static magnetic fluid is influenced by the perpendicular magnetic field, the magnetization will increase as increasing the intensity of magnetic field and decrease as increasing the viscosity. We compare the trend of no magnetic field, start magnetic field at the same time and magnetic field before rotation, the maximum radius of no magnetic field is greater than the others. In starting magnetic field before rotation, can fix regular number of fingers, fingering is thicker to cause maximum radius diminish. In order to control fingering instability by starting the magnetic field at the same time and before critical radius. Both of them show the similar fingering phenomena. Additionally, with high rotational speed and strong magnetic field exerted, the number of fingers will decrease. While rotating in low rotational speed, the number of fingers will increase. Comparing with the result of no magnetic field and the presence of a magnetic field, we can summary the influence that magnetic field make coating radius and fingering change.
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Wang, Ming-Wen, and 王明文. "The experimental study of photoresist reduction for spin coating." Thesis, 1997. http://ndltd.ncl.edu.tw/handle/60594891802113220314.
Full textAbstract:
碩士國立中央大學
機械工程學系
85
Spin coating is a process utilized by microelectroincs industry to from athin uniform film of photoresist or polyimide on silicon wafers.Since boththe prices of photoresist and polyimide are rather high, controlling thequantity of liquid and the dispensation rate in the spin coating process is a critical work. This project is aimed to reduce the quality of liquidwhile keeping the stable uniform film without resulting in the so-called instability fingers. In this project an experimental equipment to simulatethe process of spin coating is constructed. We first measure the viscosityand surface tension force of liquids used in such process.Then the qualitiesand the dispensation rate of these liquids are varied to analyze theireffects in spin coating process. Here a high speed camera is used to recordall the proceedings. We deduce an experience diagram no matter with or without instability fingers characteristics in spin coating processbase on the experimental data. Such a formulation is utilized to search the least quantities of the coating liquid to form a stable uniform film without resulting in the instability fingers.
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Wong, Wai-Mun, and 黃偉民. "Numerical Analysis of Wind Shear Effect in Spin Coating." Thesis, 1997. http://ndltd.ncl.edu.tw/handle/39668584916337359438.
Full textAbstract:
碩士國立中央大學
機械工程學系
85
The process of spin coating has been extensively studied. However,to our knowledge, all studies related has either neglected or just appliedCochran's solution for the shear stress at the interface between the over-lying gas and the film surface. It is suitable when applied to a spin coaterunder free space and an infinite disk. However, for a real model where thereis an enclosure or a hub and a finite radius is taken into account, shearstress may differ from that of Cochran's solution. This study intends to in-investigate the effect of the enclosure, as well as, a hub on the shear stress . Results show the distribution of shear stress along the disk may not alike that of Cochran's solution, and may have to be re-evaluated.
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Su, Yi-Wen, and 蘇怡雯. "Carbon nanotube back-light field emission cathodeby spin coating." Thesis, 2011. http://ndltd.ncl.edu.tw/handle/42200285802677914516.
Full textAbstract:
碩士清雲科技大學
電子工程所
99
The purpose of this study was to replace the current common processes, such as chemical vapor deposition direct growth, screen printing and electrophoresis process for the fabrication of carbon nanotube (CNT) field emission illumination device. This process has many advantages, such as the process is easy, transparent cathode plate, high stability, good field emission, uniform coating with good properties, and achieve a good field emission fluorescent anode plate and to send light the reflected light of light transmission from the cathode plate can also have a uniform and high brightness. In this thesis, we fabricate inverse-type CNT field emission illumination device cathode by spin coating method. The first use of different concentrations of surfactant sodium dodecyl sulfate (SDS) and CNTs were blended into a solution, supplemented by ultraviolet spectroscopy (UV-vis) of the dispersion. The indium tin oxide (ITO) substrates and pattern ITO substrates were spin coated into the solution, the production of field emission cathodes and field emission characteristics, and light the uniformity of field emission. The CNT of the substrate effects of different heat treatment were characteristics. Finally, adhesion and uniformity through the improvement the stability of field emission light, the research already has a good coating uniformity and to achieve a good field emission effect, and then CNTs distribution of the coated layer were observed with field emission electron microscope (FE-SEM). The field emission properties of the prepared cathodes were evaluated with the field emission pattern and J-E curve test.
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Li, Yi-Rung, and 李益榮. "Analysis of IGZO Thin Films by Spin-Coating Technology." Thesis, 2014. http://ndltd.ncl.edu.tw/handle/6myju6.
Full textAbstract:
碩士國立虎尾科技大學
光電與材料科技研究所
102
Indium Gallium Zinc Oxide(IGZO) Thin Films was prepared by spin-coating technology in this thesis. The solution composed of zinc acetate, Zinc Chloride, gallium trichloride, Indium chloride is used as the coating, which spins on the glass substrate uniformly. The IGZO film will form on the substrate after baking in furnace system. The effects of zinc acetate, Zinc Chloride, gallium trichloride, Indium chloride ,and baking temperature were investigated in this thesis through the transmittance in visual range, Hall, atomic force microscope (AFM) images, scan electron microscope (SEM) images and X-ray diffraction(XRD). The optimal concentration of zinc acetate is 0.02M, concentration of Indium chloride is 0.01M. The best baking temperature is about 300 ℃under vacuum condition. The transmittance of IGZO film are 90 %, under the optimal condition, The bulk concentration is -3.04E+18 and mobility is 1.99cm2 /Vs , under the optimal condition。 As the film with high transmittance and high electrical conductivity, we can use the IGZO thin films in TFT transparent conductive film in the future.
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Chen, Chih-Chem, and 陳芝君. "Preparation of Zinc Oxide Films by Spin-Coating Techology." Thesis, 2014. http://ndltd.ncl.edu.tw/handle/5zxsbe.
Full textAbstract:
碩士國立虎尾科技大學
光電與材料科技研究所在職專班
102
Zinc oxide (ZnO) thin film was prepared by spin-coating technology in this thesis. The solution composed of zinc acetate and sodium hydroxide is used as the coating, which spins on the silicon and glass substrate uniformly. The ZnO film will form on the substrate after baking in furnace or rapid thermal annealing system. The effects of zinc acetate concentration, sodium hydroxide concentration, and baking temperature were investigated in this thesis through the intensity and full width at half maximum (FWHM) of photoluminescence (PL), transmittance in visual range, atomic force microscope (AFM) images, scan electron microscope (SEM) images, and Raman scattering. The optimal concentration of zinc acetate and sodium hydroxide are 0.02M and 1M, respectively. The best baking temperature is about 200 oC under vacuum condition. The transmittance and root-mean-square (RMS) roughness of ZnO film are 90 % and 10.831nm, respectively under the optimal condition. The peak position and FWHM of PL spectrum at optimal condition are 379 nm and 20 nm, respectively. With introducing the silver nano-particles in the ZnO thin film can bring in the surface plasmon effect, which can apply to the optoelectronics to enhance the efficiency.
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Zhang, Sheng-Yu, and 張勝聿. "Investigation of coating uniformity in spin-on-dopant process." Thesis, 2019. http://ndltd.ncl.edu.tw/handle/rgpp58.
Full textAbstract:
碩士國立中央大學
材料科學與工程研究所
107
In this experiment, we have developed a spin-on dopant (SOD) diffusion technique for fabrication of n-type passivated emitter and rear cell (PERC) solar cells. Compared with traditional diffusion of gases dopant (BBr3 or POCl3), SOD technique could lower the manufacturing cost and improve production efficiency. Furthermore, it is not toxic which can raise safety on production line. We first adjusted component ratio of dopant source, which can be spreaded on a small-sized substrate uniformly. Then we explore the rotation speed of spin coating to achieve uniformity of sheet resistance on 5x5 cm2 and investigate the parameters of diffusion such as atmosphere, time, concentration and temperature to get low sheet-resistance and high lifetime. Finally, we fabricated monocrystalline N-type silicon solar cell base on optimized conditions and the electro-optical convertion efficiency = 12.8 % ; the open-circuit voltage (Voc) = 579.99 mV, short-circuit current density (Jsc) = 34.53 mA/cm2 and the fill factor (FF) = 63.9 %.
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M, A. Somashekara, and Raja Banerjee. "Numerical Simulation of Spin Coating Process for Circular Disc." Thesis, 2011. http://raiith.iith.ac.in/740/1/ME09G010.pdf.
Full textAbstract:
The process of applying a uniform thin film on a horizontal substrate is
called spin coating. Spin coating relatively used in several industrial and
scientific applications. In this study an attempted was made to numerically
study the various factors affecting the spin coating process.
CFD simulations were performed on 2D axisymetric geometry, VOF
multiphase model was used to its work the liquid/gas interface, results from
isothermal CFD simulation were first validated against theoretical values.
Subsequently, CFD simulations were performed to determine the effects of
flow important parameters. Parametric study was a alone to see the effect of
spin, thermo viscosity and thermo capillary on spin coating process.
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Munir, Rahim. "Hybrid Perovskite Thin Film Formation: From Lab Scale Spin Coating to Large Area Blade Coating." Diss., 2017. http://hdl.handle.net/10754/627190.
Full textAbstract:
Our reliance on semiconductors is on the rise with the ever growing use of electronics in our daily life. Organic-inorganic hybrid lead halide perovskites have emerged as a prime alternative to current standard and expensive semiconductors because of its use of abundant elements and the ease of solution processing.
This thesis has shed light on the ink-to-solid conversion during the one-step solution process of hybrid perovskite formulations from DMF. We utilize a suite of in situ diagnostic probes including high speed optical microscopy, optical reflectance and absorbance, and grazing incidence wide angle x-ray scattering (GIWAXS), all performed during spin coating, to monitor the solution thinning behavior, changes in optical absorbance, and nucleation and growth of crystalline phases of the precursor and perovskite. The starting formulation experiences solvent-solute interactions within seconds of casting, leading to the formation of a wet gel with nanoscale features visible by in situ GIWAXS. The wet gel subsequently gives way to the formation of ordered precursor solvates (equimolar iodide and chloride solutions) or disordered precursor solvates (equimolar bromide or 3:1 chloride), depending upon the halide and MAI content. The ordered precursor solute phases are stable and retain the solvent for long durations, resulting in consistent conversion behavior to the perovskite phase and solar-cell performance. In this thesis, we develop a firm understanding of the solvent engineering process in which an anti-solvent is used during the coating process through the solvent mixture of GBL and DMSO in different ratios. It has been shown that solvent engineering produce pin hole-free films, justifying its wide adoption across the field. We then translate our learnings from the lab scale spin coating process to the industrial friendly blade coating process. Here we compare the ink solidification and film formation mechanisms of CH3NH3PbI3 in solutions we used to understand the key scientific insights through spin coating. We observe high-quality film formation for T > 100oC, namely in conditions which inhibit the formation of the crystalline intermediate complex phases. In doing so, we achieve fast and direct formation of the perovskite phase with solar cells yielding PCE > 17%.
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Kubo, Hidenori, and 久保英規. "The Study Of Solar Cell Active Layer Fabricated By Dip Coating And Spin Coating Process." Thesis, 2013. http://ndltd.ncl.edu.tw/handle/68167034105998324646.
Full textAbstract:
碩士義守大學
材料科學與工程學系碩士在職專班
100
It is set to Poly (3-hexyltiophene) (P3HT) and fullerene derivative (PCBM), in a bulk hetero-junction type organic material thin film solar cell I made the Dip coating method and Spin coating sample and treated (Routine Thermal Erasing Procedure, RTEP 290℃) Or, Annealing (70℃；100℃；104℃). Observation and its thickness were measured for morphology by SEM and AFM. Then, Absorption and intensity were measured and the capability as a solar cell was measured. Furthermore, Diffraction was measured in order to check crystalline. In this study, spin coating and dip coating comparison, you can find the dip coating in the stretching rate 165mm/min RTEP process can replace the spin coating has RTEP process. SEM images of dip coating stretching rate 165mm/min RTEP, with the spin coating film the RTEP fairly smooth surface, can serve as a future roll-to-roll process on.
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Lin, Jiann-Houng, and 林建宏. "2-D Analytical Solution of Film Planarization for Spin Coating." Thesis, 2006. http://ndltd.ncl.edu.tw/handle/z4e8yt.
Full textAbstract:
碩士國立中央大學
機械工程研究所
94
This thesis is the first one to present “a 2-D analytical solution of film planarization for spin coating”. This analytical solution is used for predicting the degree of planarization (abbreviated as DOP), and describing the film distribution. Among semiconductor manufacturing process, utilizing spin coating can obtain the micro-thick film, and help other process to produce the elements. Thus, for the demand of design, quality, and productivity, understanding more about the mechanism of spin coating is required. This thesis can account more parameters than 1-D can. Hence, it won’t only describe the DOP of the very narrow feature, and the film profile. Due to the limit the symbolic computation application program, this thesis proposes an alternative approach for getting the DOP and film profile. The DOP is almost consistent with the former research, but inconsistent in film profile. We find that the square type feature is little of varied on arbitrary position. The DOP of the narrow rectangular feature will behave as that of longer rectangular one in lower angular position while its angular position becomes higher. On the contrast, when the longer rectangular feature raises its position, its DOP will be similar with that of the narrow rectangular one. This is because of the length of the distance across which the film flows. The DOP of the narrow feature is worse than that of the longer feature under the same condition of the ratio of centrifugal force to surface tension. This shows that the longer active length of surface tension can makes it more flatten. On certain position, the DOP becomes the same for various features. This means the angular position will effects the synthetic performance of the centrifugal force, wall effects, and surface tension, and make them the same. Those phenomena can help semiconductor industry for their pattern design and the arrangements, and resolve the problem of the miss alignment. To sum up, this thesis successfully illustrates the exploring of the feasibility of 2-D analytical solution. Moreover, it shows that there exists a mathematical physical approach to understand the mechanics of spin coating. Hence, offering a base for its relative applications.
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Fawei, Huang, and 黃發威. "The effects of Coriolis Force and Prewetting during spin coating." Thesis, 2002. http://ndltd.ncl.edu.tw/handle/28118332390605252795.
Full textAbstract:
碩士國立中央大學
機械工程研究所
90
Spin coating is utilized widely in the microelectronics industry to form thin uniform films of photoresist, spin-on-glass, polyimide, and low dielectric constant materials on silicon wafers. This coating technique is quick and efficient. But, liquids such as photoresist are very expensive. During coating process, the maximum radius that can be coated is limited by a contact line instability, leading to the formation of rivulets or “fingers” at the leading edge. The onset of fingering instability makes the coating process inefficient and significantly affects whether a wafer can be fully coated. One of the most critical roles for spin coating systems is to properly cast a thin film of photoresist on the surface of a silicon wafer. In this project, a new spin coating process is proposed to overcome the problem of partially coated especially for large size wafer such as the wafer with diameter 300 mm or even 450 mm. The perwetting spin coating decreases the rotational speed of the wafer, thus preventing the wind shear effect. And experimental results show that coriolis force broadens the width of fingers. We can utilize the results to find a new spin coating technique so that a uniform film can be obtained.
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Hu, Deng-Kai, and 胡登凱. "The Experimental Study of Photo Resist Reduction for Spin Coating." Thesis, 2014. http://ndltd.ncl.edu.tw/handle/3wf3mk.
Full textAbstract:
碩士中原大學
機械工程研究所
103
In order to reduces photoresist waste rate and costs in this technical papers. Because research plan and appear Finger-like instability、poor coating and discolor condition. Both are reduction photoresist endures one. On the other hand, and thereby reducing environmental pollution waste photoresist. Study is carried out for the negative photoresist decrement green layer, and chance coating condition in the process. Precoating solvent (OK73) do spin speed 1000 rpm/sec and use spin speed 40 rpm/sec slowly coating photoresist from the center out 3 cm distance, and final use spin speed 1250 rpm/sec throw off photoresist. In process add OK73 coating steps on the wafer surface. The first, can improvement condition on wafer surface, second avoid result photo resist poor coating and discolor one. In conclusion, execute film thickness trace on wafer surface. In experiment four, use solvent precoating、spin speed 1250 rpm/sec and volume 4.0ml conditions. The average film thickness data 9319.16 and range 385.65 of the standard (STD), and design of experiments (DOE) data 9317.15, range 831.17 both close. STD and DOE standard deviation both near. We are knows experiment result stable in experiment four. (STD standard deviation average film thickness data 16.05 and range 14.15；DOE standard deviation data 18.44 and range 12.94). The final, use glass wafer traces transmittance. STD transmittance data 92.98 %；DOE use three glasses wafer trace experiment four condition and stable, and transmittance data are 93.17 %、92.79 % and 92.97 %.
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Hsiao, Yu-chang, and 蕭裕璋. "2-D analytical solution of film planarizatsion for spin coating." Thesis, 2008. http://ndltd.ncl.edu.tw/handle/80560764227680642193.
Full textAbstract:
碩士國立中央大學
機械工程研究所
96
This thesis is the first one to present “a 2-D analytical solution of film planarizatsion for spin coating”. This analytical solution is used for predicting the degree of planarization (abbreviated as DOP), and describing the film distribution. Among semiconductor manufacturing process, utilizing spin coating can obtain the micro-thick film, and help other process to produce the elements. The thin film on the wafer which has period structures is coated by spin coating. We can describe the phenomenon by four order partial differential equation. And it can be used to solve out the symbolic solution by linearizing the partial differential equation at four subregions which is the part of the period structure. We describe the DOP by using the governing dimensionless parameter at different conditions. The represents the ratio of centrifugal force to surface tension force during spin coating. When approach to infinite, surface tension is zero, and the film is always conformal. When approach to zero, surface tension is infinite, and the film is planar The DOP of narrow rectangular or square feature decreases with decrease of the space between two features on X direction. A comparison shows that DOP will increase with decrease of the space between two features on Y direction. And for height of the feature, DOP changes slightly with increase of the .Finally, for the most conditions, no matter how the features and parameters change, at high , DOP will steady at -25% and not change with any more.
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Lai, Chih-Yen, and 賴志彥. "Electrical Properties of Insitu-Growth CNTFET and Spin-Coating CNTFET." Thesis, 2005. http://ndltd.ncl.edu.tw/handle/59132324612657061448.
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