Relevant bibliographies by topics / Spin coating

Academic literature on the topic 'Spin coating'

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Published: 4 June 2021
Last updated: 7 July 2024

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Journal articles on the topic "Spin coating"

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Kelso, Meagan V., Naveen K. Mahenderkar, Qingzhi Chen, John Z. Tubbesing, and Jay A. Switzer. "Spin coating epitaxial films." Science 364, no. 6436 (April 12, 2019): 166–69. http://dx.doi.org/10.1126/science.aaw6184.

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Epitaxial films through spin coating A simple way to coat a surface with a uniform film is by spin coating. The substrate is spun at high speed, and a droplet of solution containing the coating is added at the center, spreads out, and evaporates. This method is used to make polycrystalline inorganic coatings and amorphous films, such as polymers used in lithography. Kelso et al. performed spin coating with single-crystal substrates, carefully controlling the thickness of the spreading solution on the basis of its viscosity and the rotation rate. In this way, they achieved epitaxial growth—in which the crystallites are oriented by the substrate—for perovskites, zinc oxide, and sodium chloride. Science , this issue p. 166
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Shen, Shih-Jyun, Demei Lee, Yu-Chen Wu, and Shih-Jung Liu. "Binary Self-Assembly of Nanocolloidal Arrays using Concurrent and Sequential Spin Coating Techniques." Materials 14, no. 2 (January 7, 2021): 274. http://dx.doi.org/10.3390/ma14020274.

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This paper reports the binary colloid assembly of nanospheres using spin coating techniques. Polystyrene spheres with sizes of 900 and 100 nm were assembled on top of silicon substrates utilizing a spin coater. Two different spin coating processes, namely concurrent and sequential coatings, were employed. For the concurrent spin coating, 900 and 100 nm colloidal nanospheres of latex were first mixed and then simultaneously spin coated onto the silicon substrate. On the other hand, the sequential coating process first created a monolayer of a 900 nm nanosphere array on the silicon substrate, followed by the spin coating of another layer of a 100 nm colloidal array on top of the 900 nm array. The influence of the processing parameters, including the type of surfactant, spin speed, and spin time, on the self-assembly of the binary colloidal array were explored. The empirical outcomes show that by employing the optimal processing conditions, binary colloidal arrays can be achieved by both the concurrent and sequential spin coating processes.
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Shen, Shih-Jyun, Demei Lee, Yu-Chen Wu, and Shih-Jung Liu. "Binary Self-Assembly of Nanocolloidal Arrays using Concurrent and Sequential Spin Coating Techniques." Materials 14, no. 2 (January 7, 2021): 274. http://dx.doi.org/10.3390/ma14020274.

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This paper reports the binary colloid assembly of nanospheres using spin coating techniques. Polystyrene spheres with sizes of 900 and 100 nm were assembled on top of silicon substrates utilizing a spin coater. Two different spin coating processes, namely concurrent and sequential coatings, were employed. For the concurrent spin coating, 900 and 100 nm colloidal nanospheres of latex were first mixed and then simultaneously spin coated onto the silicon substrate. On the other hand, the sequential coating process first created a monolayer of a 900 nm nanosphere array on the silicon substrate, followed by the spin coating of another layer of a 100 nm colloidal array on top of the 900 nm array. The influence of the processing parameters, including the type of surfactant, spin speed, and spin time, on the self-assembly of the binary colloidal array were explored. The empirical outcomes show that by employing the optimal processing conditions, binary colloidal arrays can be achieved by both the concurrent and sequential spin coating processes.
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Powojska, Anna, Arkadiusz Mystkowski, Edison Gundabattini, and Joanna Mystkowska. "Spin-Coating Fabrication Method of PDMS/NdFeB Composites Using Chitosan/PCL Coating." Materials 17, no. 9 (April 24, 2024): 1973. http://dx.doi.org/10.3390/ma17091973.

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This paper verified the possibility of applying chitosan and/or ferulic acid or polycaprolactone (PCL)-based coatings to polydimethylsiloxane/neodymium–iron–boron (PDMS/NdFeB) composites using the spin-coating method. The surface modification of magnetic composites by biofunctional layers allows for the preparation of materials for biomedical applications. Biofunctional layered magnetic composites were obtained in three steps. The spin-coating method with various parameters (time and spin speed) was used to apply different substances to the surface of the composites. Scanning electron microscopy (SEM) and confocal laser scanning microscopy (CLSM) were used to analyze the thickness and surface topography. The contact angle of the obtained surfaces was tested. Increasing spin speed and increasing process time for the same speed resulted in decreasing the composite’s thickness. The linear and surface roughness for the prepared coatings were approximately 0.2 μm and 0.01 μm, respectively, which are desirable values in the context of biocompatibility. The contact angle test results showed that both the addition of chitosan and PCL to PDMS have reduced the contact angle θ from 105° for non-coated composite to θ~59–88° depending on the coating. The performed modifications gave promising results mainly due to making the surface hydrophilic, which is a desirable feature of projected biomaterials.
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Adamson, Steven J., James Klocke, and Gareth De Sanctis. "A Review of Wafer Coating Methods for 3D Packaging." Additional Conferences (Device Packaging, HiTEC, HiTEN, and CICMT) 2010, DPC (January 1, 2010): 002153–88. http://dx.doi.org/10.4071/2010dpc-tha16.

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For many years, Front End of Line (FEOL) wafer fabrication, has used spin coating as the method of choice for photoresist application. Today, 3D packaging requires coatings applied to the non-active side of the wafer. Popular applications for back side coatings are, temporary adhesives to hold wafers to carriers during Through Silicon Via (TSV) fabrication, applying die / wafer bonding materials, and dielectric layers. Spin coating of wafers can be used to apply a number of materials for backside coatings. Although this application method is quite fast, it has a number of drawbacks which include high material waste and its limitation to low viscosity materials. Wafer Backside Coating (WBC) adhesives applied prior to dicing poses some unique challenges due to their filler loadings, and therefore the formulations can be limited by the spinning process. Today, most companies using spin coating to apply WBC materials have to lower the viscosity of the fluid with solvents, which creates other problems. Screen or stencil printing to apply WBC adhesives is a proven method and is currently in production at manufacturing sites. Screen printing gives good print uniformity, but requires a formulation that self-levels after printing. Stencil printing can be used with almost any formulation or filler loading, but is highly dependent on the tooling accuracy to maintain the coating thickness uniformity. Both methods are limited to coating thicknesses in the 25–100 micron range. There exists a need for a wafer coating methodology that can overcome the aforementioned restrictions. The ability to apply materials of varying rheologies, with low material waste and yet provide high quality, uniform coatings is required. This paper will review the current methods of applying WBC coatings. The authors will also present results from a newly developed spray coating process developed to process high viscosity fluids such as WBC coatings.
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Villarreal, Iván, Miguel Aldás, Victor Hugo Guerrero-Barragan, Nelly María Rosas-Laverde, and Alexis Debut. "CaO stabilized ZrO2 coating intended to reduce corrosion on steel and aluminum substrates." Superficies y Vacío 30, no. 2 (June 15, 2017): 14–20. http://dx.doi.org/10.47566/2017_syv30_1-020014.

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In this work, we studied the anticorrosive properties of sol-gel nanostructured calcium stabilized zirconia coatings, deposited onto 304 stainless steel and commercial aluminum substrates by dip-coating and spin-coating. During the ceramic oxide synthesis, zirconium oxychloride octahydrate was used as precursor and calcium acetate monohydrate was used as stabilizer of the cubic zirconia structure, in a precursor/stabilizer molar ratio of 0.84/0.16. The gel films deposited on steel and aluminum were heat treated at 550 y 600 °C during 5 and 10 min, respectively, and the adherence of the resulting ceramic films was evaluated. Continuous coatings were obtained that reached average thicknesses between 2 y 3 mm when deposited on stainless steel, and between 1.5 y 1.6 on aluminum, depending on the coating method. The corrosion resistance of the best-adhered coatings was evaluated during 500 h in a saline chamber, according to ASTM B117-11. All the substrate-coating combinations showed a very good corrosion resistance. For the two substrate types, the films deposited by dip-coating showed higher corrosion resistance than the ones deposited by spin-coating. The anticorrosive protective effect of the coatings was better for the aluminum substrates, compared to the stainless-steel substrates.
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Karel, M. F. A., T. P. Lemmens, B. M. E. Tullemans, S. J. H. Wielders, E. Gubbins, D. van Beurden, S. van Rijt, and J. M. E. M. Cosemans. "Characterization of Atherosclerotic Plaque Coating for Thrombosis Microfluidics Assays." Cellular and Molecular Bioengineering 15, no. 1 (October 27, 2021): 55–65. http://dx.doi.org/10.1007/s12195-021-00713-9.

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Abstract Introduction Studying arterial thrombus formation by in vitro flow assays is a widely used approach. Incorporating human atherosclerotic plaque material as a thrombogenic surface in these assays represents a method to model the pathophysiological environment of thrombus formation upon plaque disruption. Up until now, achieving a homogeneous coating of plaque material and subsequent reproducible platelet adhesion has been challenging. Here, we characterized a novel method for coating of plaque material on glass coverslips for use in thrombosis microfluidic assays. Methods A homogenate of human atherosclerotic plaques was coated on glass coverslips by conventional manual droplet coating or by spin coating. Prior to coating, a subset of coverslips was plasma treated. Water contact angle measurements were performed as an indicator for the hydrophilicity of the coverslips. Homogeneity of plaque coatings was determined using profilometric analysis and scanning electron microscopy. Thrombogenicity of the plaque material was assessed in real time by microscopic imaging while perfusing whole blood at a shear rate of 1500 s−1 over the plaque material. Results Plasma treatment of glass coverslips, prior to spin coating with plaque material, increased the hydrophilicity of the coverslip compared to no plasma treatment. The most homogeneous plaque coating and highest platelet adhesion was obtained upon plasma treatment followed by spin coating of the plaque material. Manual plaque coating on non-plasma treated coverslips yielded lowest coating homogeneity and platelet adhesion and activation. Conclusion Spin coating of atherosclerotic plaque material on plasma treated coverslips leads to a more homogenous coating and improved platelet adhesion to the plaque when compared to conventional droplet coating on non-plasma treated coverslips. These properties are beneficial in ensuring the quality and reproducibility of flow experiments.
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Xiong, Chao, Min Gao, and Wei Gao. "Cu2ZnSnS4 (CZTS) thin films prepared by sol–gel spin-coating technique." International Journal of Modern Physics B 34, no. 01n03 (December 16, 2019): 2040019. http://dx.doi.org/10.1142/s0217979220400196.

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The [Formula: see text] (CZTS) thin film is a photovoltaics material with excellent photoelectric properties and has good potential applications. The CZTS thin films with different spin-coated layers and sulfurized temperatures were successfully prepared by a sol–gel spin-coating technique. The relationships of microstructure, surface morphology and processing parameters were studied using XRD, SEM and EDS. The results indicate that the grain size of the sample sulfurized at [Formula: see text]C was larger than that of the sample sulfurized at [Formula: see text]C. With increasing layers of spin, coatings, the films showed better crystalline structure. The sulfureted CZTS thin films prepared by six spin-coating possess uniform elemental distribution.
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Ratnawulan, Sisi Gusti Putri, Dian Septiana, Suchi Ramadhani Putri, and Ahmad Fauzi. "The Effect of SiMn/PS Composition on Hydrophobic Properties of Nanocomposite Thin Layer." Journal of Physics: Conference Series 2309, no. 1 (July 1, 2022): 012019. http://dx.doi.org/10.1088/1742-6596/2309/1/012019.

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Abstract Many researches on the synthesis of hydrophobic coatings have been carried out, but in use, the coating is easily scratched, easily damaged by contact with other objects and easy to corrode, thereby reducing the quality of the coating. This can hinder the application of hydrophobic coatings in industry and others. Therefore, it is necessary to develop a hydrophobic coating that is strong and durable and anti-corrosion so that it can improve the quality of a surface. For this reason, research is carried out by mixing a substrate that has anti-corrosion properties such as silica and is hard such as manganese in order to overcome the problems that occurred previously using the spin coating method. The precursor was made by adding 0.5 grams of polystyrene composition, with varying SiMn composition. The coating was carried out using the spin coating method and the calcination temperature was 60°C using an oven for 1 hour. The results of this study from the composition variation showed that the SiMn/PS nanocomposite layer was hydrophobic based on the contact angle test. The largest contact angle at 50%:50% composition.
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Naghdi, Samira, and Vesna Mišković-Stanković. "Review—A Review of the Corrosion Behaviour of Graphene Coatings on Metal Surfaces Obtained by Chemical Vapour Deposition." Journal of The Electrochemical Society 169, no. 2 (February 1, 2022): 021505. http://dx.doi.org/10.1149/1945-7111/ac53cb.

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Outstanding characteristics of graphene are its high thermal conductivity, inherent high capacity, extremely large specific surface area, high strength, ductility, and remarkable chemical inertness, making it an attractive candidate in the corrosion barrier field. Since graphene coating does not change the thickness and appearance of the substrate, it is an ideal coating for protecting a metal substrate from destructive effects. Between various deposition procedures of graphene coatings on metal surfaces, i.e., electrophoretic deposition, dip coating, spray coating, spin coating, etc., chemical vapour deposition (CVD)-grown graphene coatings have been shown to improve the corrosion resistance of graphene-coated metals significantly. This review is focused on the protective properties of graphene coatings deposited by CVD on different metal substrates and exposed to corrosive environments.
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Dissertations / Theses on the topic "Spin coating"

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Carson, Emma. "Spin coating of passive electroactive ceramic devices." Thesis, University of Ulster, 2001. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.369951.

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Haas, Dylan. "Predicting the Uniformity of Two-Component, Spin Deposited Films." Diss., The University of Arizona, 2006. http://hdl.handle.net/10150/195952.

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Various physical parameters of solvents within two component, PMMA + Solvent films are analyzed for their impact upon the coating uniformity of spin deposited PMMA films. Towards this end, a model is presented for describing the surface behavior of spin-on films during the latter stages of deposition, correlating the tendency of a film toward non-uniform deposition to physical characteristics of the spin-on solution. A finite difference solution to this model is presented for two-component, spin-on films that is shown to effectively predict the uniformity of the resulting thin-film layers. The model is then used to determine the impact of specific film parameters upon the predicted spin-on uniformity of the film. Based upon these results, the interdependency between evaporation rate, solvent viscosity, surface tension and rotation rate in determining the uniformity of the spin-on film is evaluated by comparing the model predictions against those found in actual spin-on, two component films. The results from this model are used to provide a physical explanation for why certain surface non-uniformities begin to develop during spin coating.
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Han, Sangjun 1972. "Optimization of process variables in extrusion-spin coating." Thesis, Massachusetts Institute of Technology, 1997. http://hdl.handle.net/1721.1/43576.

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Lombe, Mubanga. "Spin coating of Newtonian and non-Newtonian fluids." Doctoral thesis, University of Cape Town, 2006. http://hdl.handle.net/11427/4904.

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Derksen, James Stephen. "A new coating method for semiconductor lithography : fluid layer overlap in extrusion-spin coating." Thesis, Massachusetts Institute of Technology, 1997. http://hdl.handle.net/1721.1/43575.

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Ganeshamurugan, Subramaniam. "Synthesis and evaluation of novel buffer/hole-injecting oligo(9-aminoanthracene)(s) in aluminium quinolate organic electroluminescent devices (OELDs)." Thesis, London South Bank University, 2002. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.271761.

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Han, Sangjun 1972. "Modeling and analysis of extrusion-spin coating : an efficient and deterministic photoresist coating method in microlithography." Thesis, Massachusetts Institute of Technology, 2001. http://hdl.handle.net/1721.1/8694.

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Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 2001.
Includes bibliographical references (p. 173-178).
In the fabrication of microelectronic chips, microlithography is used to transfer a pattern of circuit geometry from mask to semiconductor wafer. An important step in this process is the deposition of a thin and uniform layer of photoresist (often called resist) on which the lithographic image is exposed. Typical photoresist layers are less than 1 pum thick with a variation of 5 [angstroms] for advanced chips. Spin coating is the prevalent coating method to produce the required thickness and uniformity, but it typically wastes over 90% of the photoresist applied. A more efficient method needs to be developed for two reasons. The first is that 80% of the photoresist is an environmentally hazardous solvent. The second is the cost increase of photoresist. As the target of semiconductor industry moves toward the fabrication of smaller devices with larger capacity, the trend in photoresist shifts from i-line to deep UV resists, which allow for narrower linewidths on a chip. The price of this new resist is four to ten times higher than that of i-line resists. Reducing photoresist waste is desirable for both environmental and economical reasons. The current spin coating method has another problem in addition to low coating efficiency. Results from spin coating are unpredictable. The relationships between the inputs (process variables) and outputs (coating thickness and uniformity) can only be obtained by trial and error. Thus, a number of experiments have to be conducted to attain a certain coating thickness and uniformity. A more effective method would yield the predictable coating thicknesses and uniformities for given inputs.
(cont.) Both the cost and time required for process development can be reduced this way. Extrusion-spin coating achieves high coating efficiency with predictable coating results. This new method uses an efficient extrusion coating technique to apply a thin film of resist to a wafer before spinning. spinning. This initial layer of photoresist eliminates the spreading phase, the most inefficient step of spin coating. The initial layer also provides the existing spin coating models with determined initial conditions and thereby renders its results predictable. A prototype extrusion-spin coater has been designed and fabricated. Initial experiments have been conducted to determine, test and optimize process variables. One variable, the solvent concentration degree in the environment, is most critical. As the initial coating layer deposited by extrusion coating is only 20-40 [mu]m, solvent contained in the photoresist evaporates rapidly at the absence of a solvent concentration in the environment. Evaporation causes the viscosity of photoresist to be nonuniform over the wafer. The outcome of the spin coating process becomes less uniform. Experimental results are compared with Emslie et al.'s predictive models of spin coating. A solvent concentration of 80% or higher in the environment was found to be necessary to attain a predictable coating thickness with 5 [angstrom] uniformity. With optimized process variables, mean coating thickness matches theoretical predictions with a variation of 0.01 [mu]m. Defect-free coating results with coating efficiencies as high as 40% were achieved.
by Sangjun Han.
Ph.D.
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Hoggan, Erik Nebeker. "Spin Coating and Photolithography Using Liquid and Supercritical Carbon Dioxide." NCSU, 2002. http://www.lib.ncsu.edu/theses/available/etd-09232002-125551/.

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This thesis details work on the utilization of dense phase carbon dioxide (CO2) in semiconductor processing. In particular, work is presented on the formulation of CO2 soluble photoresists and the spin coating of those photoresists using only liquid CO2 as a solvent. As part of this spin coating work, a novel high-pressure CO2 spin coater was designed and constructed, and the theoretical equations governing its performance were derived. Also discussed in this thesis are 248 and 193 nm exposures of these CO2 spun films and subsequent development in supercritical CO2. Resist stripping was also performed in CO2. In short, this thesis details the first steps towards a complete replacement of all aqueous and organic solvents in the conventional photolithographic processes of spin coating, developing, and resist stripping. This change not only confers significant environmental advantages, but opens up many new avenues in resist chemistry and promises improvements in large scale film uniformity, elimination of feature collapse, elimination of extraneous processing steps, and improved control of the lithographic process.
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FARIAS, Bruno Veríssimo de Miranda. "Preparação por sol-gel de filmes granulados de CoCr2O4." Universidade Federal de Pernambuco, 2015. https://repositorio.ufpe.br/handle/123456789/20045.

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Submitted by Rafael Santana (rafael.silvasantana@ufpe.br) on 2017-07-25T19:46:06Z No. of bitstreams: 2 license_rdf: 811 bytes, checksum: e39d27027a6cc9cb039ad269a5db8e34 (MD5) Dissertacao PRONTA.compressed-2.pdf: 7340420 bytes, checksum: 27358d102b9b7c405f37c9e2a0ceb516 (MD5)
Made available in DSpace on 2017-07-25T19:46:06Z (GMT). No. of bitstreams: 2 license_rdf: 811 bytes, checksum: e39d27027a6cc9cb039ad269a5db8e34 (MD5) Dissertacao PRONTA.compressed-2.pdf: 7340420 bytes, checksum: 27358d102b9b7c405f37c9e2a0ceb516 (MD5) Previous issue date: 2015-07-02
Neste trabalho foi feito um estudo das propriedades estruturais e magnéticas de filmes granulares de cromita de cobalto sobre substrato de silicio. Aqui os filmes foram fabricados a partir do método químico sol‐gel, técnica de centrifugação spincoating e Tratamento térmico apropriado. Toda família de filmes foi fabricada sobre substrato de silício (100) e submetida a tratamento termico. A diferença de um filme para outro esta na quantidade de material depositado. Isto possibilitou o estudo das propriedades supracitadas em função da quantidade de material depositado para fabricação do filme. A cristalinidade de todas as amostras obtidas foi confirmada por difração de raios-X (XRD). A microscopia eletrônica de varredura (MEV) mostrou filmes granulares com boa homogeneidade e que a espessura de todas as amostras aumenta com a quantidade de gotas depositadas durante o spin‐coating. As propriedades magnéticas foram medidas usando magnetometria de amostra vibrante (VSM). O campo aplicado durante a medicao foi orientado paralelo ao plano do filme e observou‐se uma alta coercividade e que esta diminui quase linearmente com o aumento de temperatura.
In this work we have made a study of the structural and magnetic properties of cobalt chromite granular films over silicon substrate. Here the films were fabricated by the chemical method sol‐gel, spin coating technique and ppropriate heat treatment. The entire Family was deposited over silicon substrate (100) and submitted to heat treatment. The difference between a film to another is the quantity of deposited Material. This allowed the study of the above properties as a function of the deposited material. The crystallinity of all samples obtained was confirmed by X‐ray diffraction (XRD). The scanning electron microscopy (SEM) showed granular films with good homogeneity and the thickness of all samples increases when the number of drops increases during spin‐coating. The magnetic properties were measured using vibrating sample magnetometry (VSM). The applied field during the measurement was Oriented parallel to the film plane and observed a high coercivity and that decreases pproximately linearly with increasing temperature.
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Van, fraeyenhoven Paulien. "Comparing morphology in dip-coated and spin-coated polyfluorene:fullerene films." Thesis, Karlstads universitet, Institutionen för ingenjörs- och kemivetenskaper, 2016. http://urn.kb.se/resolve?urn=urn:nbn:se:kau:diva-42576.

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Unsustainable energy sources are running out and global warming is getting worse. Therefore the need for renewable energy sources is growing. Solar cells are a popular options used as an energy source. Most popular are the inorganic photovoltaic cells. With their high efficiency and long lifetime, they make a very good energy source. Unfortunately the costs for inorganic solar cells are rather high. Organic solar cells can make a good replacement for inorganic photovoltaic. They are easy to make, light and rather cheap. In this thesis, the morphology of a model system of the active layer of organic solar cells will be discussed, using dip coating as well as spin coating as a technique to prepare the films. The films consist of a blend of poly(9,9-dioctylfluorenyl-2,7-diyl) and [6,6]-phenyl C61-butyric acid methyl ester in different ratios and different solvents. The films that were made were prepared by spin coating or dip coating a glass substrate. After analysing the samples using atomic force microscopy, fluorescence spectroscopy and absorption spectroscopy it was clear that the morphology, as well as the position of the polymer chains can be influenced by using different dipping speeds, ratios or solvents.
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Books on the topic "Spin coating"

1

Carson, Emma J. Spin coating of passive electroactive ceramic devices. [s.l: The Author], 2001.

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Fong, Chee Yong. Sol-gel spin coating growth of gallium nitride thin films: A simple, safe, and cheap approach. Pulau Pinang: Penerbit Universiti Sains Malaysia, 2018.

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SICMAC, Summer School on Layered Functional Gradient Ceramics and Thermal Barrier Coatings (2006 Mahón Spain). Layered, functional gradient ceramics, and thermal barrier coatings: Design, fabrication and applications : proceedings of the SICMAC summer school on layered, functional gradient ceramics, and thermal barrier coatings held in Maó, Menorca Island (Spain) on June 11-16, 2006. Zuerich: Trans Tech Publications Ltd., 2007.

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Alicante), European Topical Conference on Hard Coatings (1st 1993. Proceedings of the 1st European Topical Conference on Hard Coatings and the II Iberian Vacuum Meeting, 12-15 July 1993, Alicante, Spain. Oxford: Pergamon Press, 1994.

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Karakterisasi film poly-paraphenilene terethalamide (PPTA) hasil sintesis metoda spin coating: Laporan penelitian. Bandung: Lembaga Penelitian, Universitas Padjadjaran, 2000.

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Pivec, Tanja, Tamilselvan Mohan, Rupert Kargl, Manja Kurečič, and Karin Stana Kleinschek. Design, Characterisation and Applications of Cellulose-Based Thin Films, Nanofibers and 3D Printed Structures: A Laboratory Manual. University of Maribor Press, 2021. http://dx.doi.org/10.18690/978-961-286-432-3.

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The introduction of the Laboratory Manual gives the theoretical bases on cellulose and its derivatives, which are used as starting polymers for the preparation of multifunctional polymers with three different advanced techniques - spin coating, electrospinning and 3D printing. In the following, each technique is presented in a separate Lab Exercise. Each exercise covers the theoretical basics on techniques for polymer processing and methods for their characterisation, with an emphasis on the application of prepared materials. The experimental sections contain all the necessary information needed to implement the exercises, while the added results provide students with the help to implement correct and successful exercises and interpret the results.
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Hultaker, Annette. Transparent Conductive Tin Doped Indium Oxide: Characterization of Thin Films Made by Sputter Deposition With Silver Additive & by Spin Coating from Nanoparticle ... the Faculty of Science & Technology, 37). Uppsala Universitet, 2002.

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Sankari, Hassan M. Application of the NMR spin-lattice relaxation method to the structure of pigment systems. 1994.

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Optonet. Advances in Optical Thin Films II: 13-15 September 2005, Jena, Germany (SPIE Conference Proceedings). SPIE-International Society for Optical Engine, 2005.

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(Editor), Michael Ray Jacobson, Society of Photo-Optical Instrumentation Engineers (Corporate Author), and New Mexico State University Applied Optics Laboratory (Corporate Author), eds. Modeling of Optical Thin Films: 20-21 August 1987, San Diego, California (Proceedings of Spie--the International Society for Optical Engineering, V. 821). Society of Photo Optical, 1988.

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Book chapters on the topic "Spin coating"

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Larson, Ronald G., and Timothy J. Rehg. "Spin Coating." In Liquid Film Coating, 709–34. Dordrecht: Springer Netherlands, 1997. http://dx.doi.org/10.1007/978-94-011-5342-3_20.

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Lau, W. J. "Spin Coating." In Encyclopedia of Membranes, 1808–10. Berlin, Heidelberg: Springer Berlin Heidelberg, 2016. http://dx.doi.org/10.1007/978-3-662-44324-8_1727.

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Weik, Martin H. "spin coating." In Computer Science and Communications Dictionary, 1639. Boston, MA: Springer US, 2000. http://dx.doi.org/10.1007/1-4020-0613-6_17950.

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Lau, W. J. "Spin Coating." In Encyclopedia of Membranes, 1–3. Berlin, Heidelberg: Springer Berlin Heidelberg, 2014. http://dx.doi.org/10.1007/978-3-642-40872-4_1727-1.

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Birnie, D. P. "Spin Coating Technique." In Sol-Gel Technologies for Glass Producers and Users, 49–55. Boston, MA: Springer US, 2004. http://dx.doi.org/10.1007/978-0-387-88953-5_4.

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Weill, A. "The Spin Coating Process Mechanism." In Springer Proceedings in Physics, 51–58. Berlin, Heidelberg: Springer Berlin Heidelberg, 1986. http://dx.doi.org/10.1007/978-3-642-71446-7_4.

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Birnie, Dunbar P. "Spin Coating: Art and Science." In Chemical Solution Deposition of Functional Oxide Thin Films, 263–74. Vienna: Springer Vienna, 2013. http://dx.doi.org/10.1007/978-3-211-99311-8_11.

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Lau, W. J. "Spin Coating Interfacial Polymerization (IP) Techniques." In Encyclopedia of Membranes, 1810–12. Berlin, Heidelberg: Springer Berlin Heidelberg, 2016. http://dx.doi.org/10.1007/978-3-662-44324-8_1728.

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Lau, W. J. "Spin Coating Interfacial Polymerization (IP) Techniques." In Encyclopedia of Membranes, 1–3. Berlin, Heidelberg: Springer Berlin Heidelberg, 2014. http://dx.doi.org/10.1007/978-3-642-40872-4_1728-1.

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Kozuka, Hiromiutsu. "Radiative Striations in Spin-Coating Films." In Handbook of Sol-Gel Science and Technology, 1–19. Cham: Springer International Publishing, 2016. http://dx.doi.org/10.1007/978-3-319-19454-7_148-1.

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Conference papers on the topic "Spin coating"

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Stillwagon, Larry E., Ronald G. Larson, and Gary N. Taylor. "Spin Coating And Planarization." In Microlithography Conference, edited by Murrae J. Bowden. SPIE, 1987. http://dx.doi.org/10.1117/12.940325.

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Lammers, J. H., M. N. M. Beerens, and S. B. G. M. O'Brien. "EFFECTS OF EVAPORATION DURING SPIN-COATING." In Proceedings of the First European Coating Symposium. WORLD SCIENTIFIC, 1996. http://dx.doi.org/10.1142/9789814503914_0033.

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Kim, Sang-Kon, Ji-Yong Yoo, and Hye-Keun Oh. "Resist distribution effect of spin coating." In SPIE's 27th Annual International Symposium on Microlithography, edited by Anthony Yen. SPIE, 2002. http://dx.doi.org/10.1117/12.474627.

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Charpin, J. P. F., Theodore E. Simos, George Psihoyios, and Ch Tsitouras. "Spin Coating over a Varying Geometry." In NUMERICAL ANALYSIS AND APPLIED MATHEMATICS: International Conference on Numerical Analysis and Applied Mathematics 2009: Volume 1 and Volume 2. AIP, 2009. http://dx.doi.org/10.1063/1.3241371.

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Kaddachi, Z., M. Belhi, M. Ben Karoui, and R. Gharbi. "Design and development of spin coating system." In 2016 17th International Conference on Sciences and Techniques of Automatic Control and Computer Engineering (STA). IEEE, 2016. http://dx.doi.org/10.1109/sta.2016.7952005.

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Pratt, L. D. "Photoresist aerosol particle formation during spin coating." In Microlithography '90, 4-9 Mar, San Jose, edited by Michael P. C. Watts. SPIE, 1990. http://dx.doi.org/10.1117/12.20111.

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Honda, Hirotada. "Stochastic Control in the Spin Coating Systems." In 2006 SICE-ICASE International Joint Conference. IEEE, 2006. http://dx.doi.org/10.1109/sice.2006.315681.

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Wimmers, O. J. "Spin coating of TiO2 and SiO2 layers on curved CRT screens to form antireflex coatings." In Optical Interference Coatings. Washington, D.C.: Optica Publishing Group, 1992. http://dx.doi.org/10.1364/oic.1992.otua10.

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Abstract:
Reflections from a CRT screen are very annoying for the viewer. They hamper the recognition of the image displayed on the screen and can even make it disappear completely. A reduction in reflection is possible by applying an antireflex coating on the outer surface of the screen. This has already been demonstrated on CRT's using evaporation as the deposition technique for the antireflex layers [1,2]. Another, and possibly cheaper, way to deposit antireflex layers is by spin coating them from sol-gel solutions [3 – 7]. In these studies the spin coating has been performed on relatively small substrates which were completely flat, without paying much attention to the thickness homogeneity of the layers on the substrates. For application of spin coating on CRT's, however, the substrate is the relatively large (14" diameter and up) curved outer surface of the screen, while the thickness uniformity of the coating over the entire screen has to be high. In order to see whether spin coating can be used to produce antireflex coatings on CRT's with a high thickness uniformity, both single TiO2 and SiO2 layers were spin coated on 14" CRT screens. In this paper, the thickness uniformity of these spin coated layers will be discussed. It will be shown that layers having less than 2% thickness variation over the entire screen can be made in this way.
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Özütok, F., S. Demiri, and E. Özbek. "Electrochromic NiO thin films prepared by spin coating." In TURKISH PHYSICAL SOCIETY 32ND INTERNATIONAL PHYSICS CONGRESS (TPS32). Author(s), 2017. http://dx.doi.org/10.1063/1.4976389.

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Ansari, A. A., and S. D. Sartale. "Spin coating of Ag nanoparticles: Effect of reduction." In SOLID STATE PHYSICS: Proceedings of the 58th DAE Solid State Physics Symposium 2013. AIP Publishing LLC, 2014. http://dx.doi.org/10.1063/1.4872596.

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Reports on the topic "Spin coating"

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Rehg, T. J., and B. G. Higgins. Analysis of solvent evaporation effects in spin coating of colloidal oxide suspensions. Office of Scientific and Technical Information (OSTI), July 1991. http://dx.doi.org/10.2172/5996455.

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Rehg, T., and B. Higgins. Analysis of solvent evaporation effects in spin coating of colloidal oxide suspensions. Office of Scientific and Technical Information (OSTI), September 1989. http://dx.doi.org/10.2172/5302714.

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