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Journal articles on the topic 'Solid thin film metals'

Author: Grafiati

Published: 6 September 2023

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1

Dufner, D. C. "HREM observations of internetallic alloy formation in Pt-Sn thin films." Proceedings, annual meeting, Electron Microscopy Society of America 50, no. 1 (August 1992): 52–53. http://dx.doi.org/10.1017/s0424820100120667.

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The general goal of this research is to clarify mechanisms of solid state reactions at the atomic level as a step in the rationalization of macroscopic reaction behavior in solids. A study of intermetallic alloy formation resulting from interdiffusion of metals in thin films can be made by HREM. In this work, reactions between Pt and Sn in thin films are studied to elucidate mechanisms for structural and compositional changes during the interdiffusion process.Thin films of Pt and Sn used in this study were prepared by the two-film method introduced by Shiojiri. Few hundred angstroms of Pt were vacuum-deposited onto holey carbon films mounted on TEM grids. Sn films with an average thickness of 200Å were created by evaporation at rates of 15-30 Å/sec onto air-cleaved KBr substrates. The Sn films were wet-stripped and collected on the holey Pt grids. Figure 1 shows a cross-section schematic of a Pt-Sn couple. While this two-film arrangement did not allow observations of the actual reaction interface, microtomy was used to produce cross-sections.

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2

Dai, Wangqi, Ziqiang Ma, Donglei Wang, Siyu Yang, and Zhengwen Fu. "Functional multilayer solid electrolyte films for lithium dendrite suppression." Applied Physics Letters 121, no. 22 (November 28, 2022): 223901. http://dx.doi.org/10.1063/5.0122984.

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The improvement of the interface between a lithium metal and a solid electrolyte layer is very important for the application of a lithium anode coated by solid electrolytes in lithium metal batteries. In order to address the issues of interface performance and compatibility between solid electrolyte films prepared by magnetron sputtering and lithium metals and the suppression of lithium dendrite during the cycling, a three-layer interface solid electrolyte film based on carbon-doped lithium phosphate oxynitride (LiCPON) was employed for coating a lithium metal. The sandwich structure of LiCPON by introducing an ultra-thin lithium niobium oxynitride (LiNbON) layer prepared by sputtering LiNbO3 in nitrogen ambient can be confirmed by time-of-flight secondary ion mass spectrometry. Atomic force microscopy data indicated that the surface of the LiCPON thin film with the sandwich structure is flatter and smoother than that of the LiCPON thin film on the lithium metal. The interface impedance of the symmetric battery based on the sandwich structure of the LiCPON coating lithium metal was reduced from 512.2 to 65.4 Ω, and the symmetric battery stable cycles from 300 h with an overpotential of more than 200 mV to 400 h with low overpotential of about 77 mV. These results suggest that functional multilayer solid electrolyte films become an effective method for protecting lithium. The incorporation of ultra-thin LiNbON into the LiCPON thin film could significantly decrease interface impedance between the lithium metal and solid electrolyte layer.

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3

Suenaga, Seiichi, Miho Koyama, Shinji Arai, and Masako Nakahashi. "Solid-state reactions of the Ag–Cu–Ti thin film–Al2O3 substrate system." Journal of Materials Research 8, no. 8 (August 1993): 1805–11. http://dx.doi.org/10.1557/jmr.1993.1805.

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A new interpretation of the reaction mechanism between active metal thin-film filler and ceramic substrate is proposed. The authors predict the possibility of prebonding reactions, prior to melting of the filler, at the interface of the system described above. To prove this, solid-state reactions of Ag–Cu–Ti thin films on sapphire substrates have been studied with Auger electron spectroscopy (AES) and x-ray diffraction (XRD). Reaction process and products have been clarified at the temperature just below the melting point of the filler. It is evident that Cu3Ti3O (diamond structure of Fd3m) is formed by the reaction between Cu3Ti and O which results from the reduction of sapphire. It seems that Cu3Ti3O contributes to bonding between metals and sapphire as an intermediate phase.

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4

Metwalli, Ezzeldin. "Growth kinetics of metal nanoparticles on solid surfaces." Acta Crystallographica Section A Foundations and Advances 70, a1 (August 5, 2014): C1176. http://dx.doi.org/10.1107/s2053273314088238.

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Dispersed metal nanoparticles (nps) in a polymer matrix are essential for many technological applications, including biological imaging, thin film technology, magnetic recording media, optoelectronics and sensors. Real time investigation of the evolution of nps size and shape during the in-situ metal deposition on polymer thin films enables a fine tune of magnetic and electric properties. Metals in their atomic state are deposited on several homopolymer and block copolymer films by DC magnetron system (Metwalli et al., 2013, Metwalli et al., 2008, Buffet et al., 2011). With the unprecedented time resolution of 10 milliseconds, the growth kinetics of the metal nps on the polymer surfaces is monitored using in-situ GISAXS. An exponential growth of nps size on all polymer surfaces is observed. Below a certain critical nps size, an initial fast particle growth is due to high particle mobility. A slower kinetics at concentrated metal dispersion is due to the strong metal-metal interactions. The metal growth kinetics study for many chemically different homopolymer films explains the long-time debated high selectivity characteristics of metals towards one block in block copolymer based nano-templates.

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5

Gill, S. P. A., H. Gao, V. Ramaswamy, and W. D. Nix. "Confined Capillary Stresses During the Initial Growth of Thin Films on Amorphous Substrates." Journal of Applied Mechanics 69, no. 4 (June 20, 2002): 425–32. http://dx.doi.org/10.1115/1.1469001.

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Changes in substrate curvature indicating the existence of compressive stress in isolated crystallites are commonly observed during the initial stages of thin film deposition of metals on glass or ceramic substrates. Following the suggestion of Abermann et al. (R. Abermann et al., 1978, Thin Solid Films, 52, p. 215), we attribute the origin of this compressive stress to the action of capillary forces during film growth. As new atomic layers are deposited, the capillary forces acting on atoms near the surface are stored as transformation strains in the bulk of the crystallites. To test this concept, we propose three models for evaluating the capillary strains and their induced compressive stresses in a crystalline. A finite element analysis is performed to show that the model predictions agree well with experimental data.

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6

Feng, Wei, Xin Zhou, Wei Quan Tian, Wei Zheng, and PingAn Hu. "Performance improvement of multilayer InSe transistors with optimized metal contacts." Physical Chemistry Chemical Physics 17, no. 5 (2015): 3653–58. http://dx.doi.org/10.1039/c4cp04968c.

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Solid experimental investigations were performed to reveal the specific interface nature of thin-film InSe layered semiconductor/metals. Multilayer InSe transistors showed significantly increased mobilities in the contact sequence of Al, Ti, Cr, and In. The interface nature of the metal/thin-film InSe layered semiconductor was strong van der Waals epitaxial interactions, accompanied with d-orbital overlap.

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7

Fragnaud, P., and D. M. Schleich. "Thin film components for solid state lithium batteries." Sensors and Actuators A: Physical 51, no. 1 (October 1995): 21–23. http://dx.doi.org/10.1016/0924-4247(95)01064-5.

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8

Goikhman, A. Y., S. A. Sheludyakov, and E. A. Bogdanov. "Ion Beam Deposition for Novel Thin Film Materials and Coatings." Materials Science Forum 674 (February 2011): 195–200. http://dx.doi.org/10.4028/www.scientific.net/msf.674.195.

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The Ion Beam Deposition (IBD) technique is not very widespread, but simple and very powerful methodic of thin film preparation, allowing to obtain high quality, smooth and very uniform films on big substrate areas (until 40 cm diameter), by target ablation with high energy particles in high vacuum. For the bombarding of the target is convenient to use the charged particles – ions of Ar, because they are easy to disperse in the electric field. Also, including neutralizing system, allow to obtain high-energy neutrals, irradiating the target, producing thin films from any kind of solid targets: from simple metals to complex conducting and non-conducting stoichiometric alloys. Thus, energy of condensing target particles is an average from several units to tens of eV. In the present contribution, we discuss the possibilities and advantages of IBD technology on application examples, including results of functional properties research of Ti, TiO2, SiO2 and Ag thin films for medicine applications, Ni, NiOx, Co and CoO single layers and structures for spintronics applications, and TiO2-SiO2, Ti-Zr-O-SiO2 multilayer structures for laser mirrors applications, produced by IBD system. Good structural, morphological quality (with roughness ~ 0.3 nm) and high uniformity on big areas along with right phase and stoichiometric state is demonstrated by convenient standard techniques for the structures prepared under the optimized growth conditions.

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9

Liu, Wen-Yuan, Zheng-Wen Fu, and Qi-Zong Qin. "A sequential thin-film deposition equipment for in-situ fabricating all-solid-state thin film lithium batteries." Thin Solid Films 515, no. 7-8 (February 2007): 4045–48. http://dx.doi.org/10.1016/j.tsf.2006.10.111.

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10

Paksunchai, Chutima, Chirawat Chantharangsi, Somyod Denchitcharoen, Surasing Chaiyakun, and Pichet Limsuwan. "Structure and Morphology Study of Very Thin TiCrN Films Deposited by Unbalanced Magnetron Co-Sputtering." Key Engineering Materials 798 (April 2019): 152–57. http://dx.doi.org/10.4028/www.scientific.net/kem.798.152.

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Very thin titanium chromium nitride (TiCrN) films with various Ti content were deposited by unbalanced magnetron co-sputtering of Ti and Cr metals. Deposition time was set to 15 min to achieve film thickness ranging from 142 to 190 nm. Silicon wafers and copper grids were used as substrates. The Ti current (ITi) was varied from 0.4 to 1.0 A to achieve the differnt Ti content whereas Cr current (ICr) was fixed to 0.6 A. Effects of the Ti content on structure and morphology of these TiCrN thin films were studied by X-ray diffraction (XRD), transmission electron microscopy (TEM), atomic force microscopy (AFM), field emission scanning electron microscopy (FE-SEM), and energy-dispersive X-ray spectroscopy (EDS). The XRD revealed that the films showed crystalline structure with fcc phase and were formed as TixCr1-xN solid solution with a crystallite size of about 13 nm. The TEM result confirmed that the films were polycrystalline. The AFM images of the films showed dome top characteristic with root-mean-square roughness slightly decreasing from 1.643 to 1.273 nm. FE-SEM cross-sectional images exhibited development of film morphology from columnar structure corresponding to zone 1 of Thornton’s structure zone model to fine structure gradually with the increase of the Ti content.

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11

ANDERSON, ANTHONY M., and STEPHEN H. DAVIS. "Solidification of free liquid films." Journal of Fluid Mechanics 617 (December 25, 2008): 87–106. http://dx.doi.org/10.1017/s0022112008003753.

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We examine steady longitudinal freezing of a two-dimensional single-component free liquid film. In the liquid, there are thermocapillary and volume-change flows as a result of temperature gradients along the film and density change upon solidification. We examine these flows, heat transfer, and interfacial shapes using an asymptotic analysis which is valid for thin films with small aspect ratios. These solutions depend sensitively on contact conditions at the tri-junctions. In particular, when the sum of the angles formed in the solid and liquid phases falls below a critical value, the existence of steady solutions is lost and the liquid film cannot be continuous, suggesting breakage of the film owing to freezing. The solutions are relevant to the freezing of foams of metals or ceramics, materials unaffected by surface active agents.

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12

Vladoiu, Rodica, Milan Tichý, Aurelia Mandes, Virginia Dinca, and Pavel Kudrna. "Thermionic Vacuum Arc—A Versatile Technology for Thin Film Deposition and Its Applications." Coatings 10, no. 3 (February 27, 2020): 211. http://dx.doi.org/10.3390/coatings10030211.

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This review summarizes the more-than-25-years of development of the so-called thermionic vacuum arc (TVA). TVA is an anodic arc discharge in vapors of the material to be deposited; the energy for its melting is delivered by means of a focused electron beam. The resulting material ions fall at the substrate where they form a well-adhesive layer; the ion energy is controllable. The deposited layers are, as a rule, free from droplets typical for cathodic arc deposition systems and the thermal stress of the substrates being coated is low. TVA is especially suitable for processing refractory metals, e.g., carbon or tungsten, however, in the course of time, various useful applications of this system originated. They include layers for fusion application, hard coatings, low-friction coatings, biomedical-applicable films, materials for optoelectronics, and for solid-state batteries. Apart from the diagnostic of the film properties, also the diagnostic of the TVA discharge itself as well as of the by TVA generated plasma was performed. The research and application of the TVA proceeds in broad international collaboration. At present, the TVA technology has found its firm place among the different procedures for thin film deposition.

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13

Mitsugi, Fumiaki, Akihiro Nakamura, Yuji Kodama, Toshikazu Ohkubo, and Yukiharu Nomoto. "Preparation of inorganic solid state thin film for electrochromic application." Thin Solid Films 515, no. 9 (March 2007): 4159–65. http://dx.doi.org/10.1016/j.tsf.2006.02.072.

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14

Wan, Qihang, Jun Li, Zhang Liu, Lu Han, Siyi Huang, and Zumin Wang. "Fabrication of Nanoporous Gold via an Improved Solid-Phase Method for Non-Enzymatic Detection of Aniline." Metals 13, no. 4 (April 13, 2023): 754. http://dx.doi.org/10.3390/met13040754.

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In this paper, nanoporous gold (NPG) thin films with superior catalytic performance were prepared on glassy carbon electrodes (GCE) by optimizing the process parameters and adopting an improved solid-phase reaction method. The morphology and structures of NPG films were comprehensively investigated and the structural defects on continuous NPG ligaments were observed. The NPG films demonstrated higher sensitivity and a lower detection limit during the amperometric sensing of aniline than NPGs made using conventional techniques. The results of multiple electrochemical tests demonstrated that the NPG/GCE electrodes possess high stability and good reproducibility. The prepared NPG film is a favorable material that can be superior in aniline electrochemical detection and can also be applied in other electrochemical sensing reactions.

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15

McCarty, E. D., and S. A. Hackney. "The morphological stability of lateral growth in solid-solid phase transformation during thin-film interdiffusion in Al/Cu bimetal films." Metallurgical and Materials Transactions A 25, no. 8 (August 1994): 1613–25. http://dx.doi.org/10.1007/bf02668527.

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16

Tang, Man-Chung, Lianne Hei-Yin Lo, Wai-Lung Cheung, Shiu-Lun Lai, Mei-Yee Chan, and Vivian Wing-Wah Yam. "Green-emitting dendritic alkynylgold(iii) complexes with excellent film morphologies for applications in solution-processable organic light-emitting devices." Chemical Communications 55, no. 92 (2019): 13844–47. http://dx.doi.org/10.1039/c9cc06854f.

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Bipolar dendritic alkynylgold(iii) complexes that exhibit excellent film morphologies in solid-state thin films have been designed and synthesized. Solution-processable OLEDs with EQEs >14.5% have been achieved.

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17

Vasil'ev, A. M., V. I. Bessaraba, E. M. Dudnik, A. V. Kovalev, and L. R. Shaginyan. "The properties of LaxY10xB6 solid solution-base thin-film emission structures." Soviet Powder Metallurgy and Metal Ceramics 31, no. 6 (June 1992): 543–46. http://dx.doi.org/10.1007/bf00802458.

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18

Lotnyk, Andriy, Stephan Senz, and Dietrich Hesse. "Thin-film solid-state reactions of solid BaCO3 and BaO vapor with (100) rutile substrates." Acta Materialia 55, no. 8 (May 2007): 2671–81. http://dx.doi.org/10.1016/j.actamat.2006.12.022.

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19

Wang, Rui, Lijun Pan, Qiaonan Han, Hongbing Zhu, Meixiu Wan, and Yaohua Mai. "Reactively sputtered Ta2O5 solid electrolyte layers in all thin film electrochromic devices." Journal of Alloys and Compounds 865 (June 2021): 158931. http://dx.doi.org/10.1016/j.jallcom.2021.158931.

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20

Park, Chanhwi, Sangsoo Lee, Sunho Choi, and Dongwook Shin. "Effect of boron/phosphorus ratio in lithium boron phosphorus oxynitride thin film electrolytes for all-solid-state thin film batteries." Thin Solid Films 685 (September 2019): 434–39. http://dx.doi.org/10.1016/j.tsf.2019.06.055.

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21

Xu, W., S. Q. Wang, Q. Y. Zhang, C. Y. Ma, Q. Wang, D. H. Wen, and X. N. Li. "Hierarchically structured AgO films with nano-porosity for photocatalyst and all solid-state thin film battery." Journal of Alloys and Compounds 802 (September 2019): 210–16. http://dx.doi.org/10.1016/j.jallcom.2019.06.188.

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22

Акашев, Л. А., Н. А. Попов, and В. Г. Шевченко. "Оптические свойства и электронные характеристики празеодима и неодима в конденсированном состоянии." Оптика и спектроскопия 129, no. 7 (2021): 848. http://dx.doi.org/10.21883/os.2021.07.51075.1614-21.

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The optical properties of unoxidized surfaces of polycrystalline Pr and Nd films in the spectral range 0.4 - 2.6 μm are studied. Optical constants were measured by Beattie ellipsometric method. Dispersion dependences of the optical conductivity σ, the reflectivity R, imaginary and real parts of the dielectric constant ε1 and ε2, and the function of characteristic electron energy losses Im (ε) -1 were calculated using the obtained optical constants. The paper presents the optical properties of both films and liquid metals studied earlier. The electronic characteristics of praseodymium and neodymium in solid thin-film and liquid states are calculated using the results of measurements in the infrared region of the spectrum using the two-band conductivity model.

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23

WITIT-ANUN, Nirun, and Adisorn BURANAWONG. "High-temperature oxidation resistance of CrAlN thin films prepared by DC reactive magnetron sputtering." Journal of Metals, Materials and Minerals 33, no. 3 (August 31, 2023): 1600. http://dx.doi.org/10.55713/jmmm.v33i3.1600.

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CrAlN thin films were prepared by using the reactive DC unbalanced magnetron sputtering method from the single alloy target on a silicon substrate. The effect of annealing temperature in the air which ranges from 500℃ to 900℃ for 1 h on phase structure, film composition, surface morphology, microstructure, and hardness was investigated by XRD, EDS, FE-SEM, and Nanoindentation techniques, respectively. The high-temperature (up to 900℃) oxidation resistance of the thin film was also evaluated. The result shows that solid solutions of (Cr,Al)N with (111), (200), and (220) planes for the as-deposited film and no oxide phase were found after annealing with different temperatures. The O content slightly increases with an increase in the annealing temperature with various Cr, Al, and N contents found by the EDS. From the FE-SEM result, as increased annealing temperature, the evolution of cross-sectional morphology from dense to compact columnar structure was exhibited but the oxides layer was not detected. These results concluded that the as-deposited thin film showed good oxidation resistance when annealed in air at an elevated temperature reaching 900℃. Moreover, the film’s hardness decreased from 61.19 GPa to 50.11 GPa with increasing the annealing temperature observed by the Nanoindentation technique.

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24

Mitrofanov, I. V., D. S. Nazarov, A. A. Popovich, and M. Yu Maximov. "Atomic Layer Deposition of the Lithium–Silicon–Tin Oxide System for Solid-State Thin-Film Lithium Batteries." Russian Metallurgy (Metally) 2020, no. 13 (December 2020): 1643. http://dx.doi.org/10.1134/s003602952013025x.

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25

Bonvicini, Stephanie Nicole, Bo Fu, Alison Joy Fulton, Zhitai Jia, and Yujun Shi. "Formation of Au, Pt, and bimetallic Au–Pt nanostructures from thermal dewetting of single-layer or bilayer thin films." Nanotechnology 33, no. 23 (March 17, 2022): 235604. http://dx.doi.org/10.1088/1361-6528/ac5a83.

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Abstract Formation of Au, Pt, and bimetallic Au–Pt nanostructures by thermal dewetting of single-layer Au, Pt and bilayer Au–Pt thin films on Si substrates was systematically studied. The solid-state dewetting of both single-layer and bilayer metallic films was shown to go through heterogeneous void initiation followed by void growth via capillary agglomeration. For the single-layer of Au and Pt films, the void growth started at a temperature right above the Hüttig temperature, at which the atoms at the surface or at defects become mobile. Uniformly distributed Au (7 ± 1 nm to 33 ± 8 nm) and Pt (7 ± 1 nm) NPs with monodispersed size distributions were produced from complete dewetting achieved for thinner 1.7−5.5 nm thick Au and 1.4 nm thick Pt films, respectively. The NP size is strongly dependent on the initial thin film thickness, but less so on temperature and time. Thermal dewetting of Au–Pt bilayer films resulted in partial dewetting only, forming isolated nano-islands or large particles, regardless of sputtering order and total thin film thickness. The increased resistance to thermal dewetting shown in the Au–Pt bilayer films as compared to the individual Au or Pt layer is a reflection of the stabilizing effect that occurs upon adding Pt to Au in the bimetallic system. Energy dispersive x-ray spectroscopic analysis showed that the two metals in the bilayer films broke up together instead of dewetting individually. According to the x-ray diffraction analysis, the produced Au–Pt nanostructures are phase-segregated, consisting of an Au-rich phase and a Pt-rich phase.

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26

Sisson, Richard, Cameron Reinhart, Paul Bridgman, and Tatjana Jevremovic. "Examining metallic glass formation in LaCe:Nb by ion implantation." Nuclear Technology and Radiation Protection 32, no. 2 (2017): 127–35. http://dx.doi.org/10.2298/ntrp1702127s.

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In order to combine niobium (Nb) with lanthanum (La) and cerium (Ce), Nb ions were deposited within a thin film of these two elements. According to the Hume-Rothery rules, these elements cannot be combined into a traditional crystalline metallic solid. The creation of an amorphous metallic glass consisting of Nb, La, and Ce is then investigated. Amorphous metallic glasses are traditionally made using fast cooling of a solution of molten metals. In this paper, we show the results of an experiment carried out to form a metallic glass by implanting 9 MeV Nb 3+ atoms into a thin film of La and Ce. Prior to implantation, the ion volume distribution is calculated by Monte Carlo simulation using the SRIM tool suite. Using multiple methods of electron microscopy and material characterization, small quantities of amorphous metallic glass are indeed identified.

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27

Ashurbekova, Kristina, Karina Ashurbekova, Iva Saric, Evgenii Modin, Mladen Petravić, Ilmutdin Abdulagatov, Aziz Abdulagatov, and Mato Knez. "Molecular layer deposition of hybrid siloxane thin films by ring opening of cyclic trisiloxane (V3D3) and azasilane." Chemical Communications 56, no. 62 (2020): 8778–81. http://dx.doi.org/10.1039/d0cc04195e.

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28

Fang, Zhou, Danke Chen, Zhuoyi Li, Xu Ma, Xinyi Wan, Zheng Deng, and Xinsheng Peng. "A self-confinement synthesis of a POM-decorated MOF thin film for actively hydrolyzing ethyl acetate." Chemical Communications 56, no. 89 (2020): 13840–43. http://dx.doi.org/10.1039/d0cc05637e.

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29

Murakami, Y., A. Kenjo, T. Sadoh, T. Yoshitake, and M. Miyao. "Solid-phase crystallization of β-FeSi2 thin film in Fe/Si structure." Thin Solid Films 461, no. 1 (August 2004): 68–71. http://dx.doi.org/10.1016/j.tsf.2004.02.065.

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30

Koshtyal, Yury, Ilya Mitrofanov, Denis Nazarov, Oleg Medvedev, Artem Kim, Ilya Ezhov, Aleksander Rumyantsev, Anatoly Popovich, and Maxim Yu Maximov. "Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity." Nanomaterials 11, no. 4 (April 2, 2021): 907. http://dx.doi.org/10.3390/nano11040907.

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Nanostructured metal oxides (MOs) demonstrate good electrochemical properties and are regarded as promising anode materials for high-performance lithium-ion batteries (LIBs). The capacity of nickel-cobalt oxides-based materials is among the highest for binary transition metals oxide (TMOs). In the present paper, we report the investigation of Ni-Co-O (NCO) thin films obtained by atomic layer deposition (ALD) using nickel and cobalt metallocenes in a combination with oxygen plasma. The formation of NCO films with different ratios of Ni and Co was provided by ALD cycles leading to the formation of nickel oxide (a) and cobalt oxide (b) in one supercycle (linear combination of a and b cycles). The film thickness was set by the number of supercycles. The synthesized films had a uniform chemical composition over the depth with an admixture of metallic nickel and carbon up to 4 at.%. All samples were characterized by a single NixCo1-xO phase with a cubic face-centered lattice and a uniform density. The surface of the NCO films was uniform, with rare inclusions of nanoparticles 15–30 nm in diameter. The growth rates of all films on steel were higher than those on silicon substrates, and this difference increased with increasing cobalt concentration in the films. In this paper, we propose a method for processing cyclic voltammetry curves for revealing the influence of individual components (nickel oxide, cobalt oxide and solid electrolyte interface—SEI) on the electrochemical capacity. The initial capacity of NCO films was augmented with an increase of nickel oxide content.

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31

Park, M., S. J. Krause, and S. R. Wilson. "The effects of deposition and annealing condition on the microstractural evolution of Al-Cu and Al-Cu-Si thin films." Proceedings, annual meeting, Electron Microscopy Society of America 49 (August 1991): 822–23. http://dx.doi.org/10.1017/s0424820100088427.

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Aluminum alloys (Al-Cu and Al-Cu-Si) are the most extensively used metals for interconnects in integrated circuits. Cu additions enhance electro-thermal migration resistance, but may increase corrosion susceptibility in both reactive ion etching and wet processing due to the formation of Al2Cu (θ) precipitates. Si was originally added to minimize erosion in contact windows, however it was recently found that the addition of 1.5% or 0.5% Si in Al-Cu alloy improves its corrosion resistance. θ precipitates in binary alloys have been found to occur at the Al/sublayer interface during high temperature (>200°C) deposition due to the fast surface diffusion of Cu. For the higher temperature deposition in the Al solid solution region, platelike θ precipitates were also formed at the interface and grain boundaries during a fast cooldown of wafers. However, it has not been well understood how the addition of Si in Al-Cu alters the thin film microstructure and increases the corrosion resistance. In this work, the effects of Si addition and deposition temperature on the film microstructure were studied for different alloy compositions and sublayers. The effects of thermal annealing on the interaction of Al films with Ti-W sublayer were also studied.

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32

Xu, Xiaomin, Bowen Shan, Sergii Kalytchuk, Minghua Xie, Shuaijun Yang, Danqing Liu, Stephen V. Kershaw, and Qian Miao. "Synthesis, solution-processed thin film transistors and solid solutions of silylethynylated diazatetracenes." Chem. Commun. 50, no. 85 (July 11, 2014): 12828–31. http://dx.doi.org/10.1039/c4cc04627g.

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33

Zhang, Ming, Zheng Huang, Junfang Cheng, Osamu Yamamoto, Nobuyuki Imanishi, Bo Chi, Jian Pu, and Jian Li. "Solid state lithium ionic conducting thin film Li1.4Al0.4Ge1.6(PO4)3 prepared by tape casting." Journal of Alloys and Compounds 590 (March 2014): 147–52. http://dx.doi.org/10.1016/j.jallcom.2013.12.100.

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34

Ott, A. W., J. W. Klaus, J. M. Johnson, and S. M. George. "Erratum to “Al2O3 thin film growth on Si (100) using binary reaction sequence chemistry” [Thin Solid Films 292 (1997) 135–144]." Thin Solid Films 517, no. 20 (August 2009): 5950. http://dx.doi.org/10.1016/j.tsf.2009.01.027.

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You, Zhengkai, Xiaolong Li, Jing Huang, Rongqin Chen, Jiyu Peng, Wenwen Kong, and Fei Liu. "Agarose Film-Based Liquid–Solid Conversion for Heavy Metal Detection of Water Samples by Laser-Induced Breakdown Spectroscopy." Molecules 28, no. 6 (March 19, 2023): 2777. http://dx.doi.org/10.3390/molecules28062777.

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Laser-induced breakdown spectroscopy (LIBS) shows promising applications in the analysis of environmental heavy metals. However, direct analysis in water by LIBS faces the problems of droplet splashing and laser energy decay. In this study, a novel liquid–solid conversion method based on agarose films is proposed to provide an easy-to-operate and sensitive detection of heavy metals. First, the water samples were converted into semi-solid hydrogels with the aid of agarose and then dried into agarose films to make the signal intensities stronger. The calibration curves of Cd, Pb and Cr were constructed. The proposed method was validated by standard heavy metal solutions and real water samples. The results showed that the values of R2 were 0.990, 0.989 and 0.975, and the values of the LOD were 0.011, 0.122 and 0.118 mg L−1 for Cd (I) 228.80, Pb (I) 405.78 and Cr (I) 427.48 nm, respectively. The RMSEs of validation were 0.068 (Cd), 0.107 (Pb) and 0.112 mg·L−1 (Cr), and the recovery values were in the range of 91.2–107.9%. The agarose film-based liquid–solid conversion method achieved the desired ease of operation and sensitivity of LIBS in heavy-metal detection, thereby, showing good application prospects in heavy metal monitoring of water.

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Yu, K. M., J. M. Jaklevic, and E. E. Haller. "Solid-phase reactions between (100) GaAs and thin-film refractory metals (Ti, Zr, V, Nb, Cr, Mo, and W)." Applied Physics A Solids and Surfaces 44, no. 2 (October 1987): 177–90. http://dx.doi.org/10.1007/bf00626421.

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Sánchez-Vergara, M. E., A. Ortiz, C. Álvarez-Toledano, Jose G. López-Cortés, A. Moreno, and J. R. Alvarez. "Corrigendum to “Thin films of molecular materials synthesized from fisher's carbene ferrocenyl: Film formation and electrical properties” [Thin Solid Films S16 (2008) 6382–6387]." Thin Solid Films 517, no. 15 (June 2009): 4488. http://dx.doi.org/10.1016/j.tsf.2008.10.068.

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Kim, Han-Ki, Tae-Yeon Seong, and Young Soo Yoon. "Characteristics of rapid-thermal-annealed LiNi1−xCoxO2 cathode films for all-solid-state rechargeable thin film microbatteries." Thin Solid Films 447-448 (January 2004): 619–25. http://dx.doi.org/10.1016/j.tsf.2003.07.024.

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Bellido-Aguilar, Daniel Angel, Aryane Tofanello, Flavio L. Souza, Leonardo Negri Furini, and Carlos José Leopoldo Constantino. "Effect of thermal treatment on solid–solid interface of hematite thin film synthesized by spin-coating deposition solution." Thin Solid Films 604 (April 2016): 28–39. http://dx.doi.org/10.1016/j.tsf.2016.03.011.

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Ramirez y Medina, Isabel-Maria, Markus Rohdenburg, Enno Lork, and Anne Staubitz. "Aggregation induced emission – emissive stannoles in the solid state." Chemical Communications 56, no. 68 (2020): 9775–78. http://dx.doi.org/10.1039/d0cc04525j.

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Hofmann, S. "Surface and Thin Film Analysis of Metals and Semiconductors using X-Ray Photoelectron Spectroscopy." Advances in X-ray Analysis 35, B (1991): 883–97. http://dx.doi.org/10.1154/s0376030800013094.

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AbstractX-ray excited Photoelectron Spectroscopy (XPS) has become an indispensable tool for the study of metals and semiconductors. Due to the small mean free path of the photoelectrons In solids of the order of a few nanometers for energies in the keV range, it is a surface analysis technique. Its capability of quantitative analysis of all elements except hydrogen and helium and their chemical bonding states has recently been combined with small area and imaging analysis to typical spatial resolutions of about 10 μm. After a brief survey of the basic capabilities and limitations of XPS, some illustrative examples in typical metals and semiconductor research areas are presented, such as surface contamination and failure analysis in microelectronics, oxidation and corrosion, segregation at surfaces and interfaces, oxide/metal and oxide/semiconductor interfaces, and thin film analysis using angle resolved XPS and sputter depth profiling. Recent developments emphasize improved data evaluation and quantification schemes as well as instrumental capabilities with respect to both high spatial and energy resolution, and high power excitation sources such as synchrotron radiation.

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Xiao, Ling, Yan Hua Sun, Chun Hua Ding, Chao Zhu, and Lie Yu. "Amorphous Au Thin Films and their In Situ Crystallized Nanoparticles." Advanced Materials Research 236-238 (May 2011): 990–95. http://dx.doi.org/10.4028/www.scientific.net/amr.236-238.990.

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Two-phase thin solid films consisted of Au nanoparticles imbedded in an amorphous matrix were prepared via a series of galvanic replacement reactions between chloroauric acid solution and reducing metals. The Au nanoparticles were in situ crystallized from the amorphous films rather than precipitated from solution directly. Amorphous films with partly crystallized Au nanoparticles only existed stably in dilute chloroauric acid solution. The higher concentration of chloroauric acid evidently promoted the strain-induced crystallization process and accelerated the crystallization of amorphous films into Au nanoparticles with many stacking faults, twins and dislocations. The coexistence of amorphous and crystalline Au nanoparticles makes it possible to synthesize two-phase nanostructured films.

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Cai, Guangshuo, Peng Yang, Xinzhong Wang, Yanli Pei, and Gang Wang. "Investigation of pH sensor based on liquid-solid dual-gated IGZO thin-film transistor." Materials Research Express 6, no. 9 (July 3, 2019): 096305. http://dx.doi.org/10.1088/2053-1591/ab2c93.

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Chukwuemeka, Augustine, and Nnamdi Nnabuchi Mishark. "Optical and solid state characterizaion of chemically deposited CuO/PbS double layer thin film." Materials Research Express 5, no. 2 (February 28, 2018): 026414. http://dx.doi.org/10.1088/2053-1591/aaaf11.

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Kushnerov, O. I., S. I. Ryabtsev, and V. F. Bashev. "Structure and properties of ion-plasma deposited films of CoCrFeMiMn high-entropy alloy." Journal of Physics and Electronics 30, no. 2 (December 30, 2022): 59–62. http://dx.doi.org/10.15421/332220.

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High-entropy Co19Cr18Fe22Mn21Ni20 thin films were obtained by the modernized method of three-electrode ion-plasma sputtering of mosaic targets consisting of pure metals. The structure, electrical resistance, and magnetic properties of films were investigated. Single diffuse halo was seen on the XRD patterns of the as-deposited films, which confirms their amorphous structure. Some of the thin films, which were annealed at 900 K in a vacuum, were identified to be oxidized by a small amount of oxygen in the work chamber. After the heat treatment, the Co19Cr18Fe22Mn21Ni20 films were transformed from an amorphous state into a crystallized FCC solid solution with the lattice parameter a=0.3613 nm. Also, the cubic B2 phase of FeCo with a lattice parameter of 0.2857 nm was formed in the annealed films. As a result of oxidation processes, a dispersed phase of manganese oxide also arose after annealing. The temperature dependencies of electrical resistivity of films were measured by the four-point technique upon continuously heating in the high vacuum. Both as-deposited and annealed films clearly revealed a typical ferromagnetic behavior. The as-deposited high-entropy film exhibited the soft magnetic properties while the annealed films could be attributed to hard magnetic materials.

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Shmatov, Alexander A., Ľubomír Šooš, and Zdenko Krajný. "NEW TECHNOLOGY FOR HARDENING READY-MADE TOOLS IN AQUAEOUS DISPERSED MEDIA." Acta Metallurgica Slovaca 23, no. 1 (March 28, 2017): 87. http://dx.doi.org/10.12776/ams.v23i1.844.

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<p class="AMSmaintext"><span lang="EN-US">The new method for hardening ready-made steels, hard alloys and diamond tools is developed: low-temperature process for producing thin-film solid lubricant coatings by hydro chemical treatment in specially prepared aqueous media of nanosized hard refractory compounds and subsequent tempering. The main advantages of the method over known processes are presented. The principles for dispersion of refractory materials are formulated. The structure and properties of the obtained coatings are examined. <br /></span></p>

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Toma, O., H. Rotella, H. Dahab, V. Maisonneuve, and B. Boulard. "Tysonite-type solid state electrolyte for fluoride ion batteries: Highly dense thin film by PVD processing." Journal of Alloys and Compounds 862 (May 2021): 158683. http://dx.doi.org/10.1016/j.jallcom.2021.158683.

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Seo, Han Gil, Sanghoon Ji, Jongsu Seo, Sanwi Kim, Bonjae Koo, Yoonseok Choi, Hyunseung Kim, Jeong Hwan Kim, Taek-Soo Kim, and WooChul Jung. "Sintering-resistant platinum electrode achieved through atomic layer deposition for thin-film solid oxide fuel cells." Journal of Alloys and Compounds 835 (September 2020): 155347. http://dx.doi.org/10.1016/j.jallcom.2020.155347.

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Seo, Inseok, and Steve W. Martin. "Fast lithium ion conducting solid state thin-film electrolytes based on lithium thio-germanate materials." Acta Materialia 59, no. 4 (February 2011): 1839–46. http://dx.doi.org/10.1016/j.actamat.2010.11.050.

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Hwang, Jaeyeon, Heon Lee, Kyung Joong Yoon, Hae-Weon Lee, Jong-Ho Lee, Hue-Sup Song, and Ji-Won Son. "Microstructure refinement of pulsed laser deposited La0.6Sr0.4CoO3−δ thin-film cathodes for solid oxide fuel cell." Metals and Materials International 19, no. 6 (November 2013): 1347–49. http://dx.doi.org/10.1007/s12540-013-0638-9.

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