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Journal articles on the topic 'Soft-lithography'

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Published: 4 June 2021
Last updated: 10 March 2023

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1

Xia, Younan, and George M. Whitesides. "SOFT LITHOGRAPHY." Annual Review of Materials Science 28, no. 1 (August 1998): 153–84. http://dx.doi.org/10.1146/annurev.matsci.28.1.153.

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2

Xia, Younan, and George M. Whitesides. "Soft Lithography." Angewandte Chemie International Edition 37, no. 5 (March 16, 1998): 550–75. http://dx.doi.org/10.1002/(sici)1521-3773(19980316)37:5<550::aid-anie550>3.0.co;2-g.

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3

Weiler, M., and C. Pacholski. "Soft colloidal lithography." RSC Advances 7, no. 18 (2017): 10688–91. http://dx.doi.org/10.1039/c7ra00338b.

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4

Brittain, Scott, Karteri Paul, Xiao-Mei Zhao, and George Whitesides. "Soft lithography and microfabrication." Physics World 11, no. 5 (May 1998): 31–37. http://dx.doi.org/10.1088/2058-7058/11/5/30.

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5

XIA, Y., and G. M. WHITESIDES. "ChemInform Abstract: Soft Lithography." ChemInform 29, no. 25 (June 22, 2010): no. http://dx.doi.org/10.1002/chin.199825359.

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6

Amadeo, Filippo, Prithviraj Mukherjee, Hua Gao, Jian Zhou, and Ian Papautsky. "Polycarbonate Masters for Soft Lithography." Micromachines 12, no. 11 (November 13, 2021): 1392. http://dx.doi.org/10.3390/mi12111392.

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Fabrication of microfluidic devices by soft lithography is by far the most popular approach due to its simplicity and low cost. The approach relies on casting of elastomers, such as polydimethylsiloxane (PDMS), on masters fabricated from photoresists on silicon substrates. These masters, however, can be expensive, complicated to fabricate, and fragile. Here we describe an optimized replica molding approach to preserve the original masters by heat molding of polycarbonate (PC) sheets on PDMS molds. The process is faster and simpler than previously reported methods and does not result in a loss of resolution or aspect ratio for the features. The generated PC masters were used to successfully replicate a wide range of microfluidic devices, including rectangular channels with aspect ratios from 0.025 to 7.3, large area spiral channels, and micropost arrays with 5 µm spacing. Moreover, fabrication of rounded features, such as semi-spherical microwells, was possible and easy. Quantitative analysis of the replicated features showed variability of <2%. The approach is low cost, does not require cleanroom setting or hazardous chemicals, and is rapid and simple. The fabricated masters are rigid and survive numerous replication cycles. Moreover, damaged or missing masters can be easily replaced by reproduction from previously cast PDMS replicas. All of these advantages make the PC masters highly desirable for long-term preservation of soft lithography masters for microfluidic devices.
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7

Pisignano, Dario, Giuseppe Maruccio, Elisa Mele, Luana Persano, Francesca Di Benedetto, and Roberto Cingolani. "Polymer nanofibers by soft lithography." Applied Physics Letters 87, no. 12 (September 19, 2005): 123109. http://dx.doi.org/10.1063/1.2046731.

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8

Herminghaus, Stephan. "Soft lithography: Harnessing the unstable." Nature Materials 2, no. 1 (January 2003): 11–12. http://dx.doi.org/10.1038/nmat799.

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9

Urbanski, John Paul, William Thies, Christopher Rhodes, Saman Amarasinghe, and Todd Thorsen. "Digital microfluidics using soft lithography." Lab Chip 6, no. 1 (2006): 96–104. http://dx.doi.org/10.1039/b510127a.

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10

Bjorkholm, J. E., J. Bokor, L. Eichner, R. R. Freeman, W. M. Mansfield, L. Szeto, D. W. Taylor, et al. "Soft x-ray projection lithography." Optics and Photonics News 2, no. 5 (May 10, 1991): 27. http://dx.doi.org/10.1364/opn.2.5.000027.

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11

Ceglio, N. M. "Soft x-ray projection lithography." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 8, no. 6 (November 1990): 1325. http://dx.doi.org/10.1116/1.584912.

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12

Rogers, John A. "Quantifying distortions in soft lithography." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 16, no. 1 (January 1998): 88. http://dx.doi.org/10.1116/1.589841.

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13

Shim, Wooyoung, Adam B. Braunschweig, Xing Liao, Jinan Chai, Jong Kuk Lim, Gengfeng Zheng, and Chad A. Mirkin. "Hard-tip, soft-spring lithography." Nature 469, no. 7331 (January 2011): 516–20. http://dx.doi.org/10.1038/nature09697.

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14

Rogers, John A., and Ralph G. Nuzzo. "Recent progress in soft lithography." Materials Today 8, no. 2 (February 2005): 50–56. http://dx.doi.org/10.1016/s1369-7021(05)00702-9.

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15

Hsu, Julia W. P. "Soft lithography contacts to organics." Materials Today 8, no. 7 (July 2005): 42–54. http://dx.doi.org/10.1016/s1369-7021(05)70986-x.

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16

Ong, Jason Kee Yang, David Moore, Jennifer Kane, and Ravi F. Saraf. "Negative Printing by Soft Lithography." ACS Applied Materials & Interfaces 6, no. 16 (August 13, 2014): 14278–85. http://dx.doi.org/10.1021/am5035939.

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17

Roy, Pritam Kumar, Shraga Shoval, Mirit Sharabi, and Edward Bormashenko. "Soft lithography with liquid marbles." Colloids and Surfaces A: Physicochemical and Engineering Aspects 607 (December 2020): 125488. http://dx.doi.org/10.1016/j.colsurfa.2020.125488.

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18

Huang, Yonggang Y., Weixing Zhou, K. J. Hsia, Etienne Menard, Jang-Ung Park, John A. Rogers, and Andrew G. Alleyne. "Stamp Collapse in Soft Lithography." Langmuir 21, no. 17 (August 2005): 8058–68. http://dx.doi.org/10.1021/la0502185.

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19

Chung, Sungil, Yonggwan Im, Jaeyoung Choi, and Haedo Jeong. "Microreplication techniques using soft lithography." Microelectronic Engineering 75, no. 2 (August 2004): 194–200. http://dx.doi.org/10.1016/j.mee.2004.05.012.

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20

Abdelgawad, Mohamed, Michael W. L. Watson, Edmond W. K. Young, Jared M. Mudrik, Mark D. Ungrin, and Aaron R. Wheeler. "Soft lithography: masters on demand." Lab on a Chip 8, no. 8 (2008): 1379. http://dx.doi.org/10.1039/b804050h.

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21

Brehmer, Martin, Lars Conrad, and Lutz Funk. "New Developments in Soft Lithography." Journal of Dispersion Science and Technology 24, no. 3-4 (January 7, 2003): 291–304. http://dx.doi.org/10.1081/dis-120021792.

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22

Göbel, O. F., M. Nedelcu, and U. Steiner. "Soft Lithography of Ceramic Patterns." Advanced Functional Materials 17, no. 7 (March 8, 2007): 1131–36. http://dx.doi.org/10.1002/adfm.200600783.

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23

Biswas, Saheli, Aditi Chakrabarti, Antoine Chateauminois, Elie Wandersman, Alexis M. Prevost, and Manoj K. Chaudhury. "Soft Lithography Using Nectar Droplets." Langmuir 31, no. 48 (November 25, 2015): 13155–64. http://dx.doi.org/10.1021/acs.langmuir.5b03829.

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24

Moon, Jun Hyuk, Alex Small, Gi-Ra Yi, Seung-Kon Lee, Won-Seok Chang, David J. Pine, and Seung-Man Yang. "Patterned polymer photonic crystals using soft lithography and holographic lithography." Synthetic Metals 148, no. 1 (January 2005): 99–102. http://dx.doi.org/10.1016/j.synthmet.2004.09.019.

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25

Bruinink, C. M., M. Péter, M. de Boer, L. Kuipers, J. Huskens, and D. N. Reinhoudt. "Stamps for Submicrometer Soft Lithography Fabricated by Capillary Force Lithography." Advanced Materials 16, no. 13 (July 5, 2004): 1086–90. http://dx.doi.org/10.1002/adma.200306523.

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26

Radzievskaya, T. A., N. N. Ivanov, and S. A. Tarasov. "Cut-off UV light filter to prevent negative slope of the soft lithography hard mold walls." Proceedings of Universities. Electronics 27, no. 1 (February 2022): 41–49. http://dx.doi.org/10.24151/1561-5405-2022-27-1-41-49.

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The general-purpose polymers formation issues are solved using micro- and nanoelectronic technologies of new generation, for example a nanoimprint lithography. One of its subspecies, soft lithography, includes topology formation using soft master die fabricated by hard mold imprint. Therefore, engineering study of possibility of hard molds self-dependent fabrication for the purposes of optoelectronic data bus formation for new generation printed circuit boards using general-purpose polymer materials is a priority. In this work, to rationalize the purchasing cost of an expensive hard mold of soft lithography, an original technological process for a hard mold fabrication based on the SU-8 photoresist has been developed and implemented. During the performing of the proposed technological process, the reason for the negative slope (T-topping) formation of soft lithography hard mold walls made of SU-8 photoresist was determined. A series of cut-off UV filters for optical wavelengths less than 350 nm has been developed and fabricated to eliminate T-topping. Based on the UV radiation intensity experimental measurements data from the i-line mercury lamp of the automated alignment and exposure system EVG620 NT, the UV radiation intensity attenuation dependences on the functional layer thickness of the developed optical UV filter for 365 and 400 nm wavelengths are plotted. The developed UV filters application effectiveness has been proven due to T-topping elimination during the technological process of producing the soft lithography hard mold test topology. The use of soft lithography will make it possible in the future to create a new generation printed circuit boards with a built-in optoelectronic data bus in the form of a polymer planar optical waveguides array and optical input / output elements.
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27

Whitesides, George M., Emanuele Ostuni, Shuichi Takayama, Xingyu Jiang, and Donald E. Ingber. "Soft Lithography in Biology and Biochemistry." Annual Review of Biomedical Engineering 3, no. 1 (August 2001): 335–73. http://dx.doi.org/10.1146/annurev.bioeng.3.1.335.

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28

Pisignano, Dario, Luana Persano, Roberto Cingolani, Giuseppe Gigli, Francesco Babudri, Gianluca M. Farinola, and Francesco Naso. "Soft molding lithography of conjugated polymers." Applied Physics Letters 84, no. 8 (February 23, 2004): 1365–67. http://dx.doi.org/10.1063/1.1644921.

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29

Benedetto, F. Di, A. Biasco, D. Pisignano, and R. Cingolani. "Patterning polyacrylamide hydrogels by soft lithography." Nanotechnology 16, no. 5 (February 22, 2005): S165—S170. http://dx.doi.org/10.1088/0957-4484/16/5/006.

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30

Pagliara, Stefano, Luana Persano, Andrea Camposeo, Roberto Cingolani, and Dario Pisignano. "Registration accuracy in multilevel soft lithography." Nanotechnology 18, no. 17 (April 2, 2007): 175302. http://dx.doi.org/10.1088/0957-4484/18/17/175302.

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31

Young, R. J. H., P. S. A. Evans, G. I. Hay, D. J. Southee, and D. J. Harrison. "Electroluminescent light sources via soft lithography." Circuit World 34, no. 3 (August 22, 2008): 9–12. http://dx.doi.org/10.1108/03056120810896218.

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32

Guan, Jingjiao, Aravind Chakrapani, and Derek J. Hansford. "Polymer Microparticles Fabricated by Soft Lithography." Chemistry of Materials 17, no. 25 (December 2005): 6227–29. http://dx.doi.org/10.1021/cm049392p.

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33

Meenakshi, Viswanathan, Yelizaveta Babayan, and Teri W. Odom. "Benchtop Nanoscale Patterning Using Soft Lithography." Journal of Chemical Education 84, no. 11 (November 2007): 1795. http://dx.doi.org/10.1021/ed084p1795.

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34

Gould, Paula. "Soft lithography solves ‘mold lock’ dilemma." Materials Today 9, no. 7-8 (July 2006): 15. http://dx.doi.org/10.1016/s1369-7021(06)71565-6.

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35

Sonmez, Utku M., Stephen Coyle, Rebecca E. Taylor, and Philip R. LeDuc. "Polycarbonate Heat Molding for Soft Lithography." Small 16, no. 16 (March 29, 2020): 2000241. http://dx.doi.org/10.1002/smll.202000241.

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36

Xu, Bing, Francisco Arias, and George M. Whitesides. "Making Honeycomb Microcomposites by Soft Lithography." Advanced Materials 11, no. 6 (April 1999): 492–95. http://dx.doi.org/10.1002/(sici)1521-4095(199904)11:6<492::aid-adma492>3.0.co;2-i.

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37

Gonçalves, Manuel R., Taron Makaryan, Fabian Enderle, Stefan Wiedemann, Alfred Plettl, Othmar Marti, and Paul Ziemann. "Plasmonic nanostructures fabricated using nanosphere-lithography, soft-lithography and plasma etching." Beilstein Journal of Nanotechnology 2 (August 16, 2011): 448–58. http://dx.doi.org/10.3762/bjnano.2.49.

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We present two routes for the fabrication of plasmonic structures based on nanosphere lithography templates. One route makes use of soft-lithography to obtain arrays of epoxy resin hemispheres, which, in a second step, can be coated by metal films. The second uses the hexagonal array of triangular structures, obtained by evaporation of a metal film on top of colloidal crystals, as a mask for reactive ion etching (RIE) of the substrate. In this way, the triangular patterns of the mask are transferred to the substrate through etched triangular pillars. Making an epoxy resin cast of the pillars, coated with metal films, allows us to invert the structure and obtain arrays of triangular holes within the metal. Both fabrication methods illustrate the preparation of large arrays of nanocavities within metal films at low cost. Gold films of different thicknesses were evaporated on top of hemispherical structures of epoxy resin with different radii, and the reflectance and transmittance were measured for optical wavelengths. Experimental results show that the reflectivity of coated hemispheres is lower than that of coated polystyrene spheres of the same size, for certain wavelength bands. The spectral position of these bands correlates with the size of the hemispheres. In contrast, etched structures on quartz coated with gold films exhibit low reflectance and transmittance values for all wavelengths measured. Low transmittance and reflectance indicate high absorbance, which can be utilized in experiments requiring light confinement.
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38

Kwon, B., and Jong H. Kim. "Importance of Molds for Nanoimprint Lithography: Hard, Soft, and Hybrid Molds." Journal of Nanoscience 2016 (June 22, 2016): 1–12. http://dx.doi.org/10.1155/2016/6571297.

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Nanoimprint lithography has attracted considerable attention in academic and industrial fields as one of the most prominent lithographic techniques for the fabrication of the nanoscale devices. Effectively controllable shapes of fabricated elements, extremely high resolution, and cost-effectiveness of this especial lithographic system have shown unlimited potential to be utilized for practical applications. In the past decade, many different lithographic techniques have been developed such as electron beam lithography, photolithography, and nanoimprint lithography. Among them, nanoimprint lithography has proven to have not only various advantages that other lithographic techniques have but also potential to minimize the limitations of current lithographic techniques. In this review, we summarize current lithography techniques and, furthermore, investigate the nanoimprint lithography in detail in particular focusing on the types of molds. Nanoimprint lithography can be categorized into three different techniques (hard-mold, soft-mold, and hybrid nanoimprint) depending upon the molds for imprint with different advantages and disadvantages. With numerous studies and improvements, nanoimprint lithography has shown great potential which maximizes its effectiveness in patterning by minimizing its limitations. This technique will surely be the next generation lithographic technique which will open the new paradigm for the patterning and fabrication in nanoscale devices in industry.
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39

Bottein, Thomas, Olivier Dalstein, Magali Putero, Andrea Cattoni, Marco Faustini, Marco Abbarchi, and David Grosso. "Environment-controlled sol–gel soft-NIL processing for optimized titania, alumina, silica and yttria-zirconia imprinting at sub-micron dimensions." Nanoscale 10, no. 3 (2018): 1420–31. http://dx.doi.org/10.1039/c7nr07491c.

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40

Marzban, Mostapha, Ehsan Yazdanpanah Moghadam, Javad Dargahi, and Muthukumaran Packirisamy. "Microfabrication Bonding Process Optimization for a 3D Multi-Layer PDMS Suspended Microfluidics." Applied Sciences 12, no. 9 (May 4, 2022): 4626. http://dx.doi.org/10.3390/app12094626.

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Microfluidic systems have received increased attention due to their wide variety of applications, from chemical sensing to biological detection to medical analysis. Microfluidics used to be fabricated by using etching techniques that required cleanroom and aggressive chemicals. However, another microfluidic fabrication technique, namely, soft lithography, is less expensive and safer compared to former techniques. Polydimethylsiloxane (PDMS) has been widely employed as a fabrication material in microfluidics by using soft lithography as it is transparent, soft, bio-compatible, and inexpensive. In this study, a 3D multi-layer PDMS suspended microfluidics fabrication process using soft lithography is presented, along with its manufacturing issues that may deteriorate or compromise the microsystem’s test results. The main issues considered here are bonding strength and trapped air-bubbles, specifically in multi-layer PDMS microfluidics. In this paper, these two issues have been considered and resolved by optimizing curing temperature and air-vent channel integration to a microfluidic platform. Finally, the suspended microfluidic system has been tested in various experiments to prove its sensitivity to different fluids and flow rates.
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41

Ni, Wei, Rubing Shao, Jing Wu, and X. Wu. "Soft-lithography-based Inter-chip Optical Interconnects." PIERS Online 4, no. 8 (2008): 871–75. http://dx.doi.org/10.2529/piers080907094722.

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42

Zeng, Li. "Soft Lithography Produces Well-Aligned Carbon Nanotubes." MRS Bulletin 26, no. 8 (August 2001): 596. http://dx.doi.org/10.1557/mrs2001.165.

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43

Nevill, J. Tanner, Alexander Mo, Branden J. Cord, Theo D. Palmer, Mu-ming Poo, Luke P. Lee, and Sarah C. Heilshorn. "Vacuum soft lithography to direct neuronal polarization." Soft Matter 7, no. 2 (2011): 343–47. http://dx.doi.org/10.1039/c0sm00869a.

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44

Wang, Yuli, Joseph Balowski, Colleen Phillips, Ryan Phillips, Christopher E. Sims, and Nancy L. Allbritton. "Benchtop micromolding of polystyrene by soft lithography." Lab on a Chip 11, no. 18 (2011): 3089. http://dx.doi.org/10.1039/c1lc20281b.

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45

Qin, Dong, Younan Xia, and George M. Whitesides. "Soft lithography for micro- and nanoscale patterning." Nature Protocols 5, no. 3 (February 18, 2010): 491–502. http://dx.doi.org/10.1038/nprot.2009.234.

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46

Krishnaswamy, J. "Pulsed electron beam lithography in soft vacuum." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 8, no. 1 (January 1990): 39. http://dx.doi.org/10.1116/1.584863.

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47

Truong, Tu T., Rongsheng Lin, Seokwoo Jeon, Hee Hyun Lee, Joana Maria, Anshu Gaur, Feng Hua, Ines Meinel, and John A. Rogers. "Soft Lithography Using Acryloxy Perfluoropolyether Composite Stamps." Langmuir 23, no. 5 (February 2007): 2898–905. http://dx.doi.org/10.1021/la062981k.

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48

Desai, Salil P., Dennis M. Freeman, and Joel Voldman. "Plastic masters—rigid templates for soft lithography." Lab on a Chip 9, no. 11 (2009): 1631. http://dx.doi.org/10.1039/b822081f.

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49

Zhou, W., Y. Huang, E. Menard, N. R. Aluru, J. A. Rogers, and A. G. Alleyne. "Mechanism for stamp collapse in soft lithography." Applied Physics Letters 87, no. 25 (December 19, 2005): 251925. http://dx.doi.org/10.1063/1.2149513.

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50

Di Benedetto, Francesca, Vito Fasano, Luana Persano, Claudio Maruccio, Elisa Mele, Giovanni Potente, David A. Weitz, Laura De Lorenzis, and Dario Pisignano. "Rolling particle lithography by soft polymer microparticles." Soft Matter 9, no. 7 (2013): 2206. http://dx.doi.org/10.1039/c2sm27327f.

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