Relevant bibliographies by topics / Soft-lithography

Academic literature on the topic 'Soft-lithography'

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Published: 4 June 2021
Last updated: 10 March 2023

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Journal articles on the topic "Soft-lithography"

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Xia, Younan, and George M. Whitesides. "SOFT LITHOGRAPHY." Annual Review of Materials Science 28, no. 1 (August 1998): 153–84. http://dx.doi.org/10.1146/annurev.matsci.28.1.153.

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Xia, Younan, and George M. Whitesides. "Soft Lithography." Angewandte Chemie International Edition 37, no. 5 (March 16, 1998): 550–75. http://dx.doi.org/10.1002/(sici)1521-3773(19980316)37:5<550::aid-anie550>3.0.co;2-g.

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Weiler, M., and C. Pacholski. "Soft colloidal lithography." RSC Advances 7, no. 18 (2017): 10688–91. http://dx.doi.org/10.1039/c7ra00338b.

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Brittain, Scott, Karteri Paul, Xiao-Mei Zhao, and George Whitesides. "Soft lithography and microfabrication." Physics World 11, no. 5 (May 1998): 31–37. http://dx.doi.org/10.1088/2058-7058/11/5/30.

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XIA, Y., and G. M. WHITESIDES. "ChemInform Abstract: Soft Lithography." ChemInform 29, no. 25 (June 22, 2010): no. http://dx.doi.org/10.1002/chin.199825359.

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Amadeo, Filippo, Prithviraj Mukherjee, Hua Gao, Jian Zhou, and Ian Papautsky. "Polycarbonate Masters for Soft Lithography." Micromachines 12, no. 11 (November 13, 2021): 1392. http://dx.doi.org/10.3390/mi12111392.

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Fabrication of microfluidic devices by soft lithography is by far the most popular approach due to its simplicity and low cost. The approach relies on casting of elastomers, such as polydimethylsiloxane (PDMS), on masters fabricated from photoresists on silicon substrates. These masters, however, can be expensive, complicated to fabricate, and fragile. Here we describe an optimized replica molding approach to preserve the original masters by heat molding of polycarbonate (PC) sheets on PDMS molds. The process is faster and simpler than previously reported methods and does not result in a loss of resolution or aspect ratio for the features. The generated PC masters were used to successfully replicate a wide range of microfluidic devices, including rectangular channels with aspect ratios from 0.025 to 7.3, large area spiral channels, and micropost arrays with 5 µm spacing. Moreover, fabrication of rounded features, such as semi-spherical microwells, was possible and easy. Quantitative analysis of the replicated features showed variability of <2%. The approach is low cost, does not require cleanroom setting or hazardous chemicals, and is rapid and simple. The fabricated masters are rigid and survive numerous replication cycles. Moreover, damaged or missing masters can be easily replaced by reproduction from previously cast PDMS replicas. All of these advantages make the PC masters highly desirable for long-term preservation of soft lithography masters for microfluidic devices.
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Pisignano, Dario, Giuseppe Maruccio, Elisa Mele, Luana Persano, Francesca Di Benedetto, and Roberto Cingolani. "Polymer nanofibers by soft lithography." Applied Physics Letters 87, no. 12 (September 19, 2005): 123109. http://dx.doi.org/10.1063/1.2046731.

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Herminghaus, Stephan. "Soft lithography: Harnessing the unstable." Nature Materials 2, no. 1 (January 2003): 11–12. http://dx.doi.org/10.1038/nmat799.

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Urbanski, John Paul, William Thies, Christopher Rhodes, Saman Amarasinghe, and Todd Thorsen. "Digital microfluidics using soft lithography." Lab Chip 6, no. 1 (2006): 96–104. http://dx.doi.org/10.1039/b510127a.

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Bjorkholm, J. E., J. Bokor, L. Eichner, R. R. Freeman, W. M. Mansfield, L. Szeto, D. W. Taylor, et al. "Soft x-ray projection lithography." Optics and Photonics News 2, no. 5 (May 10, 1991): 27. http://dx.doi.org/10.1364/opn.2.5.000027.

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Dissertations / Theses on the topic "Soft-lithography"

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Kim, Hyung-Jun. "Automation of soft lithography." Thesis, Massachusetts Institute of Technology, 2006. http://hdl.handle.net/1721.1/38290.

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Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 2006.
Includes bibliographical references (leaves 79-82).
This dissertation is a final documentation of the project whose goal is demonstrating manufacturability of soft lithography. Specifically, our target is creating micron scale patterns of resists on a 3 square inch, relatively large area in case of soft lithography, flexible substrate using microcontact printing in order to forming electronic circuit patterns for flexible displays. At first, the general principles and characteristics of soft lithography are reviewed in order to provide the snapshot of soft lithography technologies, and the key factors that affect the productivity and quality of microcontact printing are discussed because such factors should be understood in advanced to develop current lab-based microcontact printing science into plant manufacturing technology. We proposed a prototype for automated of microcontact printing process adopting a continuous reel-to-reel design, ideal for mass production, as well as printing-side-up design in order to minimize the distortion of relief features of PDMS stamp. The machine we created not only demonstrated the manufacturability of microcontact printing, our initial project goal, but also high scalability for mass production. The machine can print micron scale patterns on a 7 square inch plastic sheet, four times bigger than initial target area, at once.
by Hyung-Jun Kim.
M.Eng.
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Young, Richard James Hendley. "Electroluminescent devices via soft lithography." Thesis, Brunel University, 2017. http://bura.brunel.ac.uk/handle/2438/17139.

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This thesis provides a compendium for the use of microcontact printing in fabricating electrical devices. Work has been undertaken to examine the use of soft lithographic techniques for employment in electronic manufacture. This thesis focusses on the use of high electric field generators as a means to producing electroluminescent devices. These devices provide a quantifiable output in the form of light. Analysis of the electrical performance of electrode structures can be determined by their success at producing light. A prospective reduction in driving voltage would deem these devices more efficient, longer lasting and an improvement on current specification. The work focussed on the viability of using relatively crude print techniques to create high resolution structures. This was carried out successfully and demonstrated that lighting structures of 75 μm and 25 μm have been produced. Microcontact printing has been established as a method for patterning gold surfaces with a functionalising self-assembled monolayer using alkanethiol molecules. This layer is then utilised as an etch resist layer to expose gold tracks for use as electric field generator electrode arrays. Through careful analysis of each step of the printing process, techniques were developed and reported to create a robust and repeatable print mechanism for reliability and accuracy. These techniques were employed to optimise the print process culminating in the development of each stage and final electrode structures mounted on a rigid backplate for use as electroluminescent devices for characterisation. These devices were then modelled for their electrical characteristics and investigated for being used in low voltage application. In this case for the development of electroluminescent applications, a driving voltage of 65 V was achieved and represents a significant advance to the field of printed electronics and Electroluminescence.
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Zheng, Zijian. "Soft lithography and nanoimprint lithography for applications in polymer electronics." Thesis, University of Cambridge, 2007. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.613415.

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Chen, Ying. "PATTERNING ELASTOMER, THERMOPLASTICS AND SHAPE MEMORYMATERIAL BY UVO LITHOGRAPHY AND SOFT LITHOGRAPHY." University of Akron / OhioLINK, 2017. http://rave.ohiolink.edu/etdc/view?acc_num=akron1491264216402058.

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Bhat, Rahila. "Novel routes to the fabrication oftemplates for soft lithography." Thesis, University of Liverpool, 2005. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.420743.

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Hassanin, Hany Salama Sayed Ali. "Fabrication of ceramic and ceramic composite microcomponents using soft lithography." Thesis, University of Birmingham, 2011. http://etheses.bham.ac.uk//id/eprint/1538/.

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This PhD project is set out to develop a high precision ceramic fabrication approach suitable for mass production, and to meet the needs of microengine application. A group of new processes have been developed and the results are characterized for fabrication of high precision ceramic oxides and composite microcomponents using soft lithography and colloidal powder processing. The materials chosen in the research are alumina, yttria stabilised zirconia and their composite for their excellent properties at high temperature.
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Grothe, Julia, Florian Wissner, Benjamin Schumm, Giovanni Mondin, and Stefan Kaskel. "Precursor strategies for metallic nano- and micropatterns using soft lithography." Saechsische Landesbibliothek- Staats- und Universitaetsbibliothek Dresden, 2016. http://nbn-resolving.de/urn:nbn:de:bsz:14-qucosa-189005.

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Soft lithographic methods describe a set of printing methods which are widely used for the preparation of structured surfaces. Structured surfaces are essential components in the field of (opto-)electronic devices such as organic light emitting diodes, photovoltaics or organic field effect transistors. In recent years, crucial progress has been achieved in the development of patterned metal coatings for these applications. This review focusses on new strategies for soft lithographical printing of metal structures emphasizing the subtle interplay of printing techniques, metal precursor chemistry, and surface functionalization strategies
Dieser Beitrag ist mit Zustimmung des Rechteinhabers aufgrund einer (DFG-geförderten) Allianz- bzw. Nationallizenz frei zugänglich
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Cao, Arthur Y. (Arthur Yao). "Design and prototype : a manufacturing system for the soft lithography technique." Thesis, Massachusetts Institute of Technology, 2006. http://hdl.handle.net/1721.1/38562.

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Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, September 2006.
"August 2006."
Includes bibliographical references (leaves 155-158).
Ever since 1998 when the term "soft lithography" was first created, soft lithography techniques have drawn close attention of the academia and the industry. Micro contact printing is by far the most widely used soft lithography technique in the industry. The objective of this research project is to design and prototype a micro contact printing machine which could achieve high scalability, feature resolution and production rate. It should also fulfill quality requirements, in terms of minimizing the tool deformation and air trapping furing printing. A reel-to-reel design with wipers to create linear propagation during stamping was used in the final design. The final prototype was made of three stations, the printing station, the inking station and the rotary system, which switches the stamps between printing and inking station. The other important design novelty is that the PDMS stamp has been fixed and the Au coated PET was actually applied to the stamp to get printed. The design minimizes the deformation on the stamp and also eases the linear propagation of the printing interface. The reel-to-reel design can be easily scaled up for mass production with large volume. The prototype was tested and the printing samples were made.
by Arthur Y. Cao.
M.Eng.
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Petrzelka, Joseph E. "Contact region fidelity, sensitivity, and control in roll-based soft lithography." Thesis, Massachusetts Institute of Technology, 2012. http://hdl.handle.net/1721.1/74909.

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Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 2012.
Cataloged from PDF version of thesis.
Includes bibliographical references (p. 341-349).
Soft lithography is a printing process that uses small features on an elastomeric stamp to transfer micron and sub-micron patterns to a substrate. Translating this lab scale process to a roll-based manufacturing platform allows precise control of the stamp contact region and the potential for large area, high rate surface patterning. In this manner, emerging devices can be produced economically, including flexible displays, distributed sensor networks, transparent conductors, and bio-inspired surfaces. Achieving and maintaining collapse-free contact of the soft stamp features is a necessary condition for printing. In the first part of the thesis, stamp behavior is examined at two length scales. First, microfeature collapse is examined across a range of dimensionless aspect ratios and pattern ratios to determine the collapse mode and the feature stiffness. Second, behavior of roll-mounted stamps is investigated on the macroscopic scale. The results of these analyses, simulations, and experiments show that contact is prohibitively sensitive as the feature scale shrinks to single microns or below. In the second part of the thesis, methods are developed to reduce the contact sensitivity. A compliant stamp architecture is introduced to tune the mechanical response of the stamp. Next, a new process for manufacturing cylindrical stamps is developed that removes limitations of planar stamp templates. The third part of the thesis addresses process control. A parallel kinematic stage is designed to manipulate the height and pitch of a roll over a substrate with submicron precision. A hybrid state-space / classical feedback control approach is used to achieve high bandwidth servo control in the presence of coupling and unmodeled dynamics. Using optical instrumentation, the stamp contact pattern is monitored and can be controlled using camera images as a control variable. Ultimately, a practical method of impedance control is implemented that demonstrates excellent disturbance rejection. The results of this thesis provide models for stamp behavior at the local microscale and the roll-based macroscale. These results illustrate the high sensitivity of contact to displacement disturbances in roll-based lithography, but also provide valuable design insight towards designing stamps and processing machinery that are robust to these inherent disturbances.
by Joseph Edward Petrzelka.
Ph.D.
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Richardson, Elliot J. W. "Micro- and nano-soft lithography for the fabrication of photonic devices." Thesis, University of Strathclyde, 2016. http://digitool.lib.strath.ac.uk:80/R/?func=dbin-jump-full&object_id=27964.

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This thesis presents the application of two soft lithographic tools for direct patterning of (soft) photonic materials at the micro- and nano-scale. Inkjet printing and Dip-Pen Nanolithography, respectively, have been used to pattern organic molecules, photoresists, and conductive inks to create optically active structures and devices. A series of light emitting polymers (LEPs), blended with a photo-curable host system, have been integrated as colour converters with an array of matrix-addressable gallium nitride (GaN) micro LEDs to form a red-green-blue (RGB) emitting array. Surface structure and conversion efficiency have been explored in detail with peak colour conversion efficiencies of 31.6% being obtained. Inkjet printing of silver conductive inks has been used in conjunction with mask-free ultraviolet direct writing to generate an 8 x 8 GaN LED array. The smallest feature achieved with the mask-free writing set up is 1 μm and the conductive ink was used to form a contact with the n-GaN to enable wire-bonding and characterisation of the LED. This mask-free process is attractive as fabrication of conventional masks for photolithography is both costly and lengthy. Possessing the ability for define LED patterns “free form” on photoresist and subsequently producing a common n-contact with the silver ink allows for rapid prototyping for novel and experimental LED designs. Two techniques were explored for utilising the potential of Dip-Pen Nanolithography; deposition of liquid inks (positive) and removal of dried material (negative). Photoresist inks were used to generate nanoscale features (560nm) on a planar LED structure. Subsequent exposure to a CHF3 plasma treatment deactivated the Mg doped GaN which was not protected by the photoresist; LEDs with 3 μm diameter at full-width half-maximum were fabricated in this manner. Utilising dip-pen nanolithography for negative patterning allows for grating structures to be created via the displacement and removal of material. 1D and 2D structures were generated using a lasing polymer as the optically active gain medium. When optically pumped it was found that these structures lased and the grating structures acted as Distributed Bragg Reflectors (DBRs).Key advantages for the techniques used throughout this thesis are that they allow the patterning of sensitive materials that otherwise would not survive classical lithography due to aggressive chemical treatment or high UV exposure. In addition all of the techniques used are readily programmable and require no masks to be fabricated thus allowing for rapid prototype production and experimental designs to be implemented without delays or incurring extra costs.
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Books on the topic "Soft-lithography"

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Soft-X-ray Projection Lithography Topical Meeting (1992 Monterey, Calif.). Soft-x-ray projection lithography: Summaries of papers presented at the Soft-X-ray Projection Lithography Topical Meeting, April 6-8, 1992, Monterey, California. Washington, DC: The Society, 1992.

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Jeffrey, Bokor, Optical Society of America, United States. Air Force. Office of Scientific Research., and Topical Meeting on Soft-X-Ray Projection Lithography (1991 : Monterey, Calif.), eds. OSA proceedings on soft-x-ray projection lithography: Proceedings of the Topical Meeting, April 10-12, 1991, Monterey, California. Washington, D.C: Optical Society of America, 1991.

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M, Hawryluck Andrew, Stulen R. H, and Optical Society of America, eds. OSA proceedings on soft x-ray projection lithography: Proceedings of the Topical Meeting, May 10-12, 1993, Monterey, California. Washington, D.C: The Society, 1993.

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Bokor, Jeffrey. Soft X-Ray Projection Lithography (Proceedings Series, Vol 12). Optical Society of America, 1991.

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Soft-x-ray projection lithography: Summaries of papers presented at the Soft-X-ray Projection Lithography Topical Meeting, April 6-8, 1992, Monterey, California (1992 technical digest series). The Society, 1992.

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Viliardos, Michael A. Thermal annealing of Mo/Si multilayers to assess the stability relevant to soft x-ray projection lithography. 1992.

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Hawryluck, Andrew M. Osa Proceedings on Soft X-Ray Projection Lithography: Proceedings of the Topical Meeting, May 10-12, 1993, Monterey, California (Studies in the Languages of Colombia). American Society of Civil Engineers, 1993.

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McGuiness, C. L., R. K. Smith, M. E. Anderson, P. S. Weiss, and D. L. Allara. Nanolithography using molecular films and processing. Edited by A. V. Narlikar and Y. Y. Fu. Oxford University Press, 2017. http://dx.doi.org/10.1093/oxfordhb/9780199533060.013.23.

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This article focuses on the use of molecular films as building blocks for nanolithography. More specifically, it reviews efforts aimed at utilizing organic molecular assemblies in overcoming the limitations of lithography, including self-patterning and directed patterning. It considers the methods of patterning self-assembled organic monolayer films through soft-lithographic methods such as microcontact printing and nanoimprint lithography, through direct ‘write’ or ‘machine’ processes with a nanometer-sized tip and through exposure to electron or photon beams. It also discusses efforts to pattern the organic assemblies via the physicochemical self-assembling interactions, including patterning via phase separation of chemically different molecules and insertion of guest adsorbates into host matrices. Furthermore, it examines the efforts that have been made to couple patterned molecular assemblies with inorganic thin-film growth methods to form spatially constrained, three-dimensional thin films. Finally, it describes a hybrid self-assembly/conventional lithography (i.e. molecular rulers) approach to forming nanostructures.
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Book chapters on the topic "Soft-lithography"

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Zhu, Yimei, Hiromi Inada, Achim Hartschuh, Li Shi, Ada Della Pia, Giovanni Costantini, Amadeo L. Vázquez de Parga, et al. "Soft Lithography." In Encyclopedia of Nanotechnology, 2458. Dordrecht: Springer Netherlands, 2012. http://dx.doi.org/10.1007/978-90-481-9751-4_100777.

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Mele, Elisa, and Dario Pisignano. "Nanobiotechnology: Soft Lithography." In Biosilica in Evolution, Morphogenesis, and Nanobiotechnology, 341–58. Berlin, Heidelberg: Springer Berlin Heidelberg, 2009. http://dx.doi.org/10.1007/978-3-540-88552-8_15.

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Martínez, Elena, and Josep Samitier. "Soft Lithography and Variants." In Generating Micro- and Nanopatterns on Polymeric Materials, 57–68. Weinheim, Germany: Wiley-VCH Verlag GmbH & Co. KGaA, 2011. http://dx.doi.org/10.1002/9783527633449.ch4.

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Zhu, Yimei, Hiromi Inada, Achim Hartschuh, Li Shi, Ada Della Pia, Giovanni Costantini, Amadeo L. Vázquez de Parga, et al. "Soft X-Ray Lithography." In Encyclopedia of Nanotechnology, 2458. Dordrecht: Springer Netherlands, 2012. http://dx.doi.org/10.1007/978-90-481-9751-4_100780.

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Webb, Benjamin L. J., David Holmes, Chun Li, Jin Z. Zhang, and Matthew T. Lloyd. "Hard-Tip Soft-Spring Lithography." In Encyclopedia of Nanotechnology, 1021. Dordrecht: Springer Netherlands, 2012. http://dx.doi.org/10.1007/978-90-481-9751-4_100283.

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Duan, Xuexin, David N. Reinhoudt, and Jurriaan Huskens. "Soft Lithography for Patterning Self-Assembling Systems." In Functional Supramolecular Architectures, 343–70. Weinheim, Germany: WILEY-VCH Verlag & Co. KGaA, 2014. http://dx.doi.org/10.1002/9783527689897.ch10.

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Pépin, Anne, and Yong Chen. "Soft Lithography and Imprint-Based Techniques for Microfluidics and Biological Analysis." In Alternative Lithography, 305–30. Boston, MA: Springer US, 2003. http://dx.doi.org/10.1007/978-1-4419-9204-8_17.

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Cotte, Stéphane, Abdellatif Baraket, François Bessueille, Stéphane Gout, Nourdin Yaakoubi, Didier Leonard, and Abdelhamid Errachid. "Fabrication of Microelectrodes Using Original “Soft Lithography” Processes." In New Sensors and Processing Chain, 1–9. Hoboken, NJ, USA: John Wiley & Sons, Inc., 2014. http://dx.doi.org/10.1002/9781119050612.ch1.

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Zhao, Xiao Li, Shen Dong, Ying Chun Liang, T. Sun, and Yong Da Yan. "AFM for Preparing Si Masters in Soft Lithography." In Advances in Machining & Manufacturing Technology VIII, 762–65. Stafa: Trans Tech Publications Ltd., 2006. http://dx.doi.org/10.4028/0-87849-999-7.762.

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Wolfe, Daniel B., Dong Qin, and George M. Whitesides. "Rapid Prototyping of Microstructures by Soft Lithography for Biotechnology." In Methods in Molecular Biology, 81–107. Totowa, NJ: Humana Press, 2009. http://dx.doi.org/10.1007/978-1-60327-106-6_3.

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Conference papers on the topic "Soft-lithography"

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Chen, Y., E. Roy, Y. Kanamori, M. Belotti, and D. Decanini. "Soft nanoimprint lithography." In Photonics Asia 2004, edited by Yangyuan Wang, Jun-en Yao, and Christopher J. Progler. SPIE, 2005. http://dx.doi.org/10.1117/12.570745.

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Hartney, Mark A. "Surface-Imaging Lithography." In Soft X-Ray Projection Lithography. Washington, D.C.: Optica Publishing Group, 1991. http://dx.doi.org/10.1364/sxray.1991.thd2.

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Surface-imaging lithography is a technique which was first described by Taylor et al. nearly ten years ago. In this approach, a pattern is defined at the surface or near-surface regions of a resist rather than throughout the entire resist thickness. Surface-imaging can eliminate problems such as reflectivity variations due to different substrates or topography in optical lithography and backscattering in electron-beam lithography.2 The use of surface-imaging has also proven beneficial for deep-UV optical lithography, where the high absorbance of most resists necessitates such an approach.
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Bobroff, Norman, and Alan E. Rosenbluth. "Optical Alignment for Lithography." In Soft X-Ray Projection Lithography. Washington, D.C.: Optica Publishing Group, 1991. http://dx.doi.org/10.1364/sxray.1991.fc1.

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The total overlay budget in semiconductor lithography has many components, including mask dimensional accuracy, tool-to-tool printing distortion, and process bias, but historically alignment registration has been the most critical. Yet progress in alignment has not kept pace with the exponential increases in printing resolution achieved during the last 10 years. In manufacturing, it is difficult to overlay lithography levels better than 200 nm at the 3 σ confidence level. Registration accuracy is limited by the complex interaction of the alignment optics with wafer registration marks at different process levels. Recent experimental and analytical work has led to an understanding of how to design optical alignment systems with reduced sensitivity to mark structure, coatings and processing. However, it is possible that no single alignment system can be optimized .for all process layers encountered in the fabrication of DRAMS or bipolar logic.
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Marconi, M. C., P. W. Wachulak, L. Urbanski, Artak Isoyan, Fan Jiang, Yang Chun Cheng, J. J. Rocca, C. S. Menoni, and F. Cerrina. "Tabletop soft x-ray lithography." In SPIE Optical Engineering + Applications, edited by James Dunn and Gregory J. Tallents. SPIE, 2009. http://dx.doi.org/10.1117/12.825509.

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Forsyth, James M. "Laser-plasma sources for lithography." In Soft X-Ray Projection Lithography. Washington, D.C.: Optica Publishing Group, 1991. http://dx.doi.org/10.1364/sxray.1991.wb3.

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Pease, R. Fabian. "Limits of Ultra Violet Lithography." In Soft X-Ray Projection Lithography. Washington, D.C.: Optica Publishing Group, 1993. http://dx.doi.org/10.1364/sxray.1993.mb.1.

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Any new technology must offer significant improvement over an entrenched technology to become adopted. Here we describe where ultra-violet lithography might evolve to in ten years time the earliest possible time for soft x-ray lithography to be ready for manufacture.
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Neureuther, A. R., and W. G. Oldham. "Resist Characterization and Lithography Simulation." In Soft X-Ray Projection Lithography. Washington, D.C.: Optica Publishing Group, 1991. http://dx.doi.org/10.1364/sxray.1991.thd1.

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The properties of important high-resolution resist systems will be briefly reviewed. Techniques for resist characterization will be discussed including experimental techniques, models for exposure (latent image formation), modifications of the latent image including diffusion and amplification, and development.
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Lum, Bernice M., Andrew R. Neureuther, and Glenn D. Kubiak. "Modeling Soft X-Ray Projection Lithography." In Soft X-Ray Projection Lithography. Washington, D.C.: Optica Publishing Group, 1993. http://dx.doi.org/10.1364/sxray.1993.tud.10.

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Resist models to support resist line-edge profile simulation are being developed for soft x-ray projection lithography. Models for resist expos니re, post-exposure bake kinetics, and dissolution surface etching as well as exposure tool imaging are key to balancing tradeoffs between lithographic materials and exposure systems. The SAMPLE lithography simulation program is well suited for supporting the development of this new soft x- ray projection lithography technology once the materials and imaging models are extended.
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Zhengxiu, Fan. "Soft X-ray Multilayer Mirrors." In Soft X-Ray Projection Lithography. Washington, D.C.: Optica Publishing Group, 1992. http://dx.doi.org/10.1364/sxray.1992.pd5.

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Shafer, David. "Soft X-ray projection optics." In Soft X-Ray Projection Lithography. Washington, D.C.: Optica Publishing Group, 1991. http://dx.doi.org/10.1364/sxray.1991.the1.

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Abstract:
There is a surprising variety of interesting optical designs for possible use in soft X-ray lithography. The requirements for the projection system are more difficult than those for the beam handling and mask illuminator optics, and it is only the projection optics that will be discussed here.
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Reports on the topic "Soft-lithography"

1

Zapata, L. E., R. J. Beach, C. B. Dane, P. Reichert, J. N. Honig, and L. A. Hackel. Advanced laser driver for soft x-ray projection lithography. Office of Scientific and Technical Information (OSTI), March 1994. http://dx.doi.org/10.2172/10150132.

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Kania, Don, David Kyser, W. D. Meisburger, Hiroshi Suzuki, John H. Bruning, and Nicholas P. Economou. Development of Critical Technologies of Soft X-Ray Lithography Final Report CRADA No. TC-0503-93. Office of Scientific and Technical Information (OSTI), March 2018. http://dx.doi.org/10.2172/1430945.

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Kania, D. Development of Critical Technologies of Soft X-Ray Lithography Final Report CRADA No. TC-0503-93. Office of Scientific and Technical Information (OSTI), November 1996. http://dx.doi.org/10.2172/759898.

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Rockett, P. D., J. A. Hunter, and G. D. Kubiak. Initial development of efficient, low-debris laser targets for the Sandia soft x-ray projection lithography effort. Office of Scientific and Technical Information (OSTI), March 1997. http://dx.doi.org/10.2172/459880.

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Kania, Don, Jack Salvador, David Markle, and Richard Foster. Soft X-Ray Reflection Optics for X-Ray Projection Lithography Final Report CRADA No. TC-0191/0192-92. Office of Scientific and Technical Information (OSTI), March 2018. http://dx.doi.org/10.2172/1432981.

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Kuang, Ping. A new architecture as transparent electrodes for solar and IR applications based on photonic structures via soft lithography. Office of Scientific and Technical Information (OSTI), January 2011. http://dx.doi.org/10.2172/1029554.

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Foster, R., and S. Lane. Soft X-Ray Lens Development For Point Sources 0.25 (mu)m X-RAY LITHOGRAPHY Final Report CRADA No. TSB-0992-94. Office of Scientific and Technical Information (OSTI), February 2018. http://dx.doi.org/10.2172/1424643.

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