Books on the topic 'Silicon oxide'

J, Dumin D., ed. Oxide reliability: A summary of silicon oxide wearout, breakdown, and reliability. [River Edge, NJ]: World Scientific, 2002.

Ragnarsson, Lars-Åke. Ultrathin oxides in metal-oxide-silicon structures: Defects and characterization. Göteborg: Chalmers tekniska högsk., 1999.

Rumak, N. V. Sistema kremniĭ--dvuokisʹ kremnii͡a︡ v MOP-strukturakh. Minsk: "Nauka i tekhnika", 1986.

Robert, Corriu, Jutzi Peter, and Workshop on Tailor-Made Silicon-Oxygen Compounds--from Molecules to Materials (1995 : University of Bielefeld, Germany), eds. Tailor-made silicon-oxygen compounds: From molecules to materials. Braunschweig/Wiesbaden: Vieweg, 1996.

Baliga, Jayant. Silicon RF power MOSFETs. Singapore: World Scientific, 2005.

A, Terlep Judith, Dever Therese M, and United States. National Aeronautics and Space Administration., eds. Atomic oxygen durability of solar concentrator materials for Space Station Freedom. [Washington, DC]: National Aeronautics and Space Administration, 1990.

Chin, Miao. Complementary metal oxide silicon cyclic redundancy check generators. Monterey, Calif: Naval Postgraduate School, 1991.

1948-, Gautier Jacques, ed. Physics and operation of silicon devices in integrated circuits. London: ISTE, 2009.

1948-, Gautier Jacques, ed. Physics and operation of silicon devices in integrated circuits. London: ISTE, 2009.

1948-, Gautier Jacques, ed. Physics and operation of silicon devices in integrated circuits. London: ISTE, 2009.

Kuo, James B. CMOS VLSI engineering: Silicon-on-insulator (SOI). Boston: Kluwer Academic Publishers, 1998.

Kerkar, Moussa. A structural investigation of evaporated non-stoichiometric silicon oxide films. [s.l.]: typescript, 1986.

S, Ginley D., Materials Research Society, Materials Research Society Meeting, and Symposium on Crystalline Oxides on Semiconductors (2002 : Boston, Mass.), eds. Crystalline oxide-silicon heterostructures and oxide optoelectronics: Symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A. Warrendale, Pa: Materials Research Society, 2003.

S, Jacobson Nathan, Miller Robert A, and United States. National Aeronautics and Space Administration., eds. Refractory oxide coatings on SiC ceramics. [Washington, DC]: National Aeronautics and Space Administration, 1994.

Baraban, A. P. Ėlektronika sloev SiO₂ na kremnii. Leningrad: Izd-vo Leningradskogo universiteta, 1988.

Beatty, Mariss E. S. Establishing Relationships Between Structure and Performance for Silicon Oxide Encapsulated Electrocatalysts. [New York, N.Y.?]: [publisher not identified], 2022.

Krumbein, Ulrich. Simulation of carrier generation in advanced silicon devices. Konstanz: Hartung-Gorre, 1996.

IEEE SOS/SOI Technology Conference. (1988 St. Simons Island, Ga.). 1988 IEEE SOS/SOI Technology Workshop, October 3-5, 1988, Sea Palms Resort, St. Simons Island, Georgia, proceedings. [United States: s.n., 1988.

United States. Bureau of Mines. Manufactured abrasives. Washington, D.C: U.S. Department of the Interior, Bureau of Mines, 1993.

Bufler, Fabian M. Full-band Monte Carlo simulation of nanoscale strained silicon MOSFETs. Konstanz: Hartung-Gorre, 2003.

Dammann, Michael. Defects in silicon induced by high temperature treatment and their influence on MOS-devices: A thesis submitted to the Swiss Federal Institute of Technology Zurich for the degree of Doctor of Technical Sciences. Zurich: Physical Electronics Laboratory, Swiss Federal Institute of Technology, 1994.

Kuo, James B. CMOS VLSI Engineering: Silicon-on-Insulator (SOI). Boston, MA: Springer US, 1998.

Grigorʹevich, Litovchenko Vladimir, ed. Stroenie i ėlektronnai͡a struktura amorfnykh diėlektrikov v kremnievykh MDP strukturakh. Novosibirsk: VO "Nauka", 1993.

Mian, Abdul Razzaq. Some electronic properties of thin dielectric oxide films containing cerium, niobium, vanadium and silicon. Uxbridge: Brunel University, 1988.

Friedrich-Schiller-Universität Jena. Sektion Chemie. Tagung. Oberflächenchemie fester Körper: 3. Tagung der Sektion Chemie der Friedrich-Schiller-Universität Jena zum Thema, "Struktur, Eigenschaften und Einsatzmöglichkeiten silikatischer Festkörper" : 4. bis 6. Juli 1984 in Jena. Jena: Friedrich-Schiller-Universität, 1985.

Friedrich-Schiller-Universität Jena. Sektion Chemie. Tagung. Oberflächenchemie fester Körper: "Herstellung, Struktur und Eigenschaften oberflächenreicher Silicate und Oxide" : 4. Tagung der Sektion Chemie der Friedrich-Schiller-Universität Jena zum Thema "Herstellung, Struktur und Eigenschaften oberflächenreicher Silikate und Oxide", 5. bis 7. Juli 1988 in Jena. Jena: Die Universität, 1989.

Bernstein, Kerry. SOI circuit design concepts. Boston: Kluwer Academic Publishers, 2002.

IEEE SOS/SOI Technology Conference. (1990 Key West, Fla.). 1990 IEEE SOS/SOI Technology Conference, October 2-4, 1990, Marriott's Casa, Marina Resort, Key West, Florida : proceedings. [New York: IEEE], 1990.

Wolfgang, Skorupa, ed. Rare-earth implanted MOS devices for silicon photonics: Microstructural, electrical and optoelectronic properties. Heidelberg: Springer, 2010.

Pringle, Steven Derek. A study of the formation of silicon oxide thin films using dual ion beam reactive sputtering. Salford: University of Salford, 1994.

Marshall, J. C. Design and testing guides for the CMOS and lateral bipolar-on-SOI test library. Gaithersburg, MD: U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology, 1994.

Marshall, J. C. Design and testing guides for the CMOS and lateral bipolar-on-SOI test library. Gaithersburg, Md: U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology, 1994.

Marshall, J. C. Design and testing guides for the CMOS and lateral bipolar-on-SOI test library. Gaithersburg, MD: U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology, 1994.

Wolf, Stanley. Microchip manufacturing. Sunset Beach, Calif: Lattice Press, 2004.

Laconte, J. Micromachined thin-film sensors for SOI-CMOS co-integration. New York: Springer, 2011.

Hori, Takashi. Gate dielectrics and MOS ULSIs: Principles, technologies, and applications. Berlin: Springer, 1997.

Silveira, Fernando. Low Power Analog CMOS for Cardiac Pacemakers: Design and Optimization in Bulk and SOI Technologies. Boston, MA: Springer US, 2004.

Maeda, Shigenobu. Teishōhi denryoku kōsoku MOSFET gijutsu: Takesshō shirikon TFT fukagata SRAM to SOI debaisu. Tōkyō: Sipec, 2002.

Hüpkes, Jürgen. Untersuchung des reaktiven Sputterprozesses zur Herstellung von aluminiumdotierten Zinkoxide-Schichten für Silizium-Dünnschicht-solarzellen. Jülich: Forschungszentrum Jülich, Zentralbibliothek, 2006.

C, Gupta D., Brown George A. 1937-, and Conference on Gate Dielectric Integrity (1999 : San Jose, Calif.), eds. Gate dielectric integrity: Material, process, and tool qualification. West Conshocken, Pa: ASTM, 2000.

Bernstein, Kerry. SOI circuit design concepts. Boston: Kluwer Academic Publishers, 2000.

United States. National Aeronautics and Space Administration., ed. "Plasma-sprayed refractory oxide coatings on silicon-base ceramics": Project closing report : (NCC-3-285), (project period--3/01/93-11/15/96). [Washington, DC: National Aeronautics and Space Administration, 1997.

Oxide Reliability: A Summary of Silicon Oxide Wearout, Breakdown, and Reliability. World Scientific Publishing Co Pte Ltd, 2002.

Zhang, Xiaoge Gregory. Electrochemistry of Silicon and Its Oxide. Springer, 2001.

Electrochemistry of Silicon and Its Oxide. Boston: Kluwer Academic Publishers, 2004. http://dx.doi.org/10.1007/b100331.

Zhang, Xiaoge Gregory. Electrochemistry of Silicon and Its Oxide. Springer, 2013.

Electrochemistry of silicon and its oxide. New York: Kluwer Academic/Plenum Publishers, 2001.

Zhang, Xiaoge Gregory. Electrochemistry of Silicon and Its Oxide. Springer London, Limited, 2007.

Dumin, David J. Oxide Reliability: A Summary of Silicon Oxide Wearout, Breakdown, and Reliability. World Scientific Publishing Co Pte Ltd, 2002.

Lin, Dah-cheng. Kinetic study on the synthesis of Si₃N₄ via the ammonization of SiO vapor. 1995.