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Journal articles on the topic 'Silicon chromium'

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Author: Grafiati

Published: 10 December 2022

Last updated: 28 January 2023

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1

Wen, Jing, Wei Hua, QingKun Gong, and Bing Wang. "Exploring the Electro-Thermal Properties of Chromium Silicon Monoxide Films and Its Possible Storage Applications." Journal of Nanoelectronics and Optoelectronics 17, no. 3 (March 1, 2022): 489–94. http://dx.doi.org/10.1166/jno.2022.3224.

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Chromium silicon monoxide has received considerable interest due to its applications as resistor. To deeply explore the key factors that determine the electro-thermal properties of chromium silicon monoxide films, a variety of chromium silicon monoxide films were prepared on glass and silicon substrates for different deposition conditions. The electrical resistivities of the chromium silicon monoxide films were found to strongly depend on the film thickness, atomic proportion of silicon oxide, and annealing temperature, and reducing the atomic proportion of silicon oxide can effectively suppress its resistivity variation for different temperature. In this case, choosing smaller atomic proportion of silicon oxide can greatly enhance the life stability of the chromium silicon oxide films. Based on the measured data, a chromium silicon monoxide film with the optimized thickness, electrical resistivity, and thermal conductivity, are fabricated, and its influence on the physical performances of the electrical memory is also assessed.

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2

Okamoto, H. "Cr-Si (Chromium-Silicon)." Journal of Phase Equilibria 22, no. 5 (October 2001): 593. http://dx.doi.org/10.1007/s11669-001-0089-8.

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3

Okamoto, H. "Cr-Si (Chromium-Silicon)." Journal of Phase Equilibria 18, no. 2 (April 1997): 222. http://dx.doi.org/10.1007/bf02665714.

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4

Okamoto, H. "Cr-Si (Chromium-Silicon)." Journal of Phase Equilibria 22, no. 5 (October 2001): 593. http://dx.doi.org/10.1007/s12385-001-0089-8.

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5

Cofer, C. G., and J. A. Lewis. "Chromium catalysed silicon nitridation." Journal of Materials Science 29, no. 22 (November 1994): 5880–86. http://dx.doi.org/10.1007/bf00366871.

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6

Komanduri, R., N. Umehara, and M. Raghunandan. "On the Possibility of Chemo-Mechanical Action in Magnetic Float Polishing of Silicon Nitride." Journal of Tribology 118, no. 4 (October 1, 1996): 721–27. http://dx.doi.org/10.1115/1.2831600.

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Chromium oxide abrasive has been reported in the literature to provide efficient chemo-mechanical polishing action for silicon nitride ceramic. Since aluminum oxide and chromium oxide abrasives are nearly of the same hardness, magnetic float polishing tests were conducted on silicon nitride balls with these two abrasives to investigate mechanical versus chemo-mechanical aspects of polishing. Tests results show higher removal rates and smoother surface texture (with fewer pits) with chromium oxide abrasive compared to aluminum oxide abrasive. Formation of pits due to brittle fracture seems to be the more predominant mode of material removal with aluminum oxide abrasive than with chromium oxide abrasive. While there may be some mechanical action (abrasion) with chromium oxide abrasive initially, subsequent removal is believed to be due to chemo-mechanical action. This could be due to degeneration of the chromium oxide abrasive (both mechanical and chemical) during polishing. Various hypotheses for the material removal mechanism (both mechanical and chemo-mechanical) were considered. Based on that, the higher removal rates and smoother surface texture on the silicon nitride balls with chromium oxide abrasive in semifinish polishing is interpreted here as possibly due to chemo-mechanical action. Higher chemical stability of aluminum oxide abrasive (compared to chromium oxide abrasive) and the known role of chromium oxide as a catalyst for the oxidation of silicon nitride are some of the reasons attributed for this action.

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7

Aleksandrov, A. A., V. Ya Dashevskii, and L. I. Leont’ev. "THERMODYNAMICS OF OXYGEN SOLUTIONS IN SILICON-CONTAINING Fe – Co – Cr MELTS." Izvestiya Visshikh Uchebnykh Zavedenii. Chernaya Metallurgiya = Izvestiya. Ferrous Metallurgy 61, no. 8 (October 24, 2018): 657–61. http://dx.doi.org/10.17073/0368-0797-2018-8-657-661.

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Thermodynamic analysis of the effect of silicon on the solubility of oxygen in Fe – Co – Cr melts has been carried out at 1873 K. Silicon has a sufficiently high deoxidizing ability in Fe – Co – Cr melts. Silicon at low contents practically does not affect the concentration of oxygen in the melt, which is determined by the chromium content. With a higher content of silicon after changing the mechanism of interaction process of chromium and silicon with oxygen, when silicon already determines the solubility of oxygen in the melt, the oxygen concentration decreases.

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8

Vlasova, M., M. Kakazey, J. G. Gonzales-Rodriguez, G. Dominguez, Momcilo Ristic, O. Scherbina, T. Tomila, L. Isaeva, I. I. Timofeeva, and A. Bukov. "Mechanoactivation of chromium silicide formation in the SiC-Cr-Si system." Science of Sintering 34, no. 3 (2002): 231–40. http://dx.doi.org/10.2298/sos0203231v.

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The processes of simultaneous grinding of the components of a SiC-Cr-Si mixture and further temperature treatment in the temperature range 1073-1793 K were studied by X-ray phase analysis, IR spectroscopy, electron microscopy, and X-ray microanalysis. It was established that, during grinding of the mixture, chromium silicides form. A temperature treatment completes the process. Silicide formation proceeds within the framework of the diffusion of silicon into chromium. In the presence of SiO2 in the mixture, silicide formation occurs also as a result of the reduction of silica by silicon and silicon carbide. The sintering of synthesized composite SiC-chromium silicides powders at a high temperature under a high pressure (T = 2073 K, P = 5 GPa) is accompanied by the destruction of cc-SiC particles, the cc/3 transition in silicon carbide and deformation distortions of the lattices of chromium silicides.

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9

Aleksandrov, A. A., and V. Ya Dashevskii. "EFFECT OF SILICON ON THE OXYGEN SOLUBILITY IN Ni – Co – Cr MELTS." Izvestiya. Ferrous Metallurgy 62, no. 3 (June 20, 2019): 241–45. http://dx.doi.org/10.17073/0368-0797-2019-3-241-245.

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Thermodynamic analysis of the effect of silicon on the solubility of oxygen in Ni – Co – Cr melts has been carried out at 1873 K. Silicon at low contents practically does not affect the concentration of oxygen in Ni – Co – Cr melts, which is determined by the chromium content. With a higher content of silicon after changing the interaction mechanism of chromium and silicon with oxygen, when silicon already determines the solubility of oxygen in the melt, the oxygen concentration decreases. However, the deoxidizing ability of silicon at elevated contents in Ni – Co – Cr melts is much lower than in Ni – Co melts.

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10

Royer, Laurent, Stéphane Mathieu, Christophe Liebaut, and Pierre Steinmetz. "Oxidation and Nitridation of Pure Chromium at Elevated Temperature in Synthetic Air – Effect of Silicon Addition." Materials Science Forum 595-598 (September 2008): 1047–55. http://dx.doi.org/10.4028/www.scientific.net/msf.595-598.1047.

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The oxidation and nitridation of pure chromium and of chromium alloys containing 0.5 to 5at% silicon was investigated at 1300°C in several atmospheres. Global methods like thermogravimetry were associated to thickness measurements and microstructural characterisation to evaluate oxidation mechanisms. The contribution of nitridation to weight gain during high temperature exposure is discussed, examining nitride volume fraction. Experiments demonstrate that the presence of nitrogen in the substrate is always consecutive to a breakdown of the oxide layer and does not result from diffusion through the Cr2O3 layer. Silicon, when present in chromium solid solution, slows down the oxidation kinetics and limits the progression of nitrogen in the chromium lattice and at grain boundaries. The absence of the Cr2N layer beneath the metal/oxide interface does not benefit to the adherence of the oxide scale. Oxidation of silicon in chromium leads to the formation of discontinuous particles of SiO2 at the metal/oxide interface, at the grain boundaries and dispersed in the bulk in the alloy sub-surface.

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11

Li, Jing Kun, Xue Ping Ren, Qiang Yan, Yan Ling Zhang, and Hong Liang Hou. "High Pressure Sintering of Silicon Carbide with Mg-Cr₃C₂ Composite Additive." Materials Science Forum 1035 (June 22, 2021): 768–72. http://dx.doi.org/10.4028/www.scientific.net/msf.1035.768.

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Porous silicon carbide was sintered at 1300 °C/30 MPa for 2 h with 4 wt.% magnesium alloy and 4 wt.% chromium carbide composite additives. The sintered ceramic presented density of around 92% of the theoretical density. No new phase was observed after sintering. Mg segregates around chromium carbide particles in sintered ceramic. The silicon carbide particles were mainly bonded by melt magnesium alloy and chromium carbide diffused in solid state. The voids existed in the sintered ceramic, but much more fracture occurred in silicon carbide particles during bending due to high bonding strength of sintering necks. Some voids existed in the ceramic, which act as crack sources during fracture.

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12

Raghavan, V. "Cr-Fe-Si (Chromium-Iron-Silicon)." Journal of Phase Equilibria & Diffusion 25, no. 6 (December 1, 2004): 545–46. http://dx.doi.org/10.1361/15477020421179.

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13

Abraham, A. "SPECIAL NICKEL, CHROMIUM AND SILICON STEELS*." Journal of the American Society for Naval Engineers 11, no. 1 (March 18, 2009): 144–57. http://dx.doi.org/10.1111/j.1559-3584.1899.tb02454.x.

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14

Raghavan, V. "Cr-Fe-Si (Chromium-Iron-Silicon)." Journal of Phase Equilibria and Diffusion 25, no. 6 (November 2004): 545–46. http://dx.doi.org/10.1007/s11669-004-0073-1.

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15

Raghavan, V. "Al-Cr-Si (Aluminum-Chromium-Silicon)." Journal of Phase Equilibria and Diffusion 29, no. 2 (February 16, 2008): 176–78. http://dx.doi.org/10.1007/s11669-008-9255-6.

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16

Raghavan, V. "Cr-Fe-Si (chromium-iron-silicon)." Journal of Phase Equilibria 24, no. 3 (May 2003): 265–66. http://dx.doi.org/10.1361/105497103770330613.

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17

Raghavan, V. "Cr-Fe-Si (chromium-iron-silicon)." Journal of Phase Equilibria 14, no. 5 (October 1993): 626–28. http://dx.doi.org/10.1007/bf02669150.

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18

Schmidt, Jan, Rafael Krain, Karsten Bothe, Gerhard Pensl, and Svetlana Beljakowa. "Recombination activity of interstitial chromium and chromium-boron pairs in silicon." Journal of Applied Physics 102, no. 12 (December 15, 2007): 123701. http://dx.doi.org/10.1063/1.2822452.

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19

Solovjov, J. A., V. A. Pillipenko, and P. I. Gaiduk. "Structure and morphology of CrSi₂ layers formed by rapid thermal treatment." Doklady BGUIR 18, no. 4 (June 25, 2020): 71–79. http://dx.doi.org/10.35596/1729-7648-2020-18-4-71-79.

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The formation of chromium disilicide layers on n-type single crystal silicon substrates (111) during rapid thermal annealing in heat balance mode by the methods of Rutherford backscattering, X-ray diffraction and transmission electron microscopy of cross sections was investigated. Chromium films of about 30 nm thickness were deposited by magnetron sputtering of a chromium target with argon ions onto silicon substrates at room temperature. The rapid thermal treatment was carried out in a temperature range of 200 to 550 °C in a heat balance mode by irradiating the substrates backside with a non-coherent light flux of quartz halogen lamps in a nitrogen ambient for 7 s. It was established that hexagonal phase of chromium disilicide formation with grain size of 150–300 nm occurs in a threshold manner when the temperature of rapid thermal treatment exceeds 400 °C. At the same time, there are strong changes in the films surface morphology and surface roughness, and a silicide-silicon interface occur. In this case the wavy film surface morphology practically repeats silicide-silicon interface morphology (the surface exactly replicates the interface). The mechanism of CrSi2/Si interface structure roughness formation based on consideration of Kirkendall effect and deformation-stimulated diffusion of vacancies is proposed and discussed. The research results of the structure and morphology of CrSi2 layers on silicon are well-correlated with the results of the Schottky barrier electrophysical measurements. The results obtained can be used in microelectronics for forming rectifying contacts and interconnects metallization for integrated circuits, as well as for thermoelectric and optoelectronic applications.

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20

Reislöhner, U., and W. Witthuhn. "Iron- and Chromium-Indium Pairs in Silicon." Materials Science Forum 65-66 (January 1991): 281–86. http://dx.doi.org/10.4028/www.scientific.net/msf.65-66.281.

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21

Bouabellou, A., R. Halimi, K. Mirouh, R. Labbani, R. Djebien, and A. Mosser. "Silicidation in chromium–amorphous silicon multilayer films." Thin Solid Films 383, no. 1-2 (February 2001): 296–98. http://dx.doi.org/10.1016/s0040-6090(00)01572-8.

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22

Ferrante, M., and E. Pigoretti. "Metallization of silicon carbide with chromium powder." Journal of Materials Science Letters 11, no. 24 (1992): 1687–88. http://dx.doi.org/10.1007/bf00736209.

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23

Prots', Yu M., P. S. Salamakha, O. L. Sologub, and O. I. Bodak. "The neodymium—(vanadium, chromium, manganese)—silicon systems." Journal of Alloys and Compounds 215, no. 1-2 (November 1994): 235–38. http://dx.doi.org/10.1016/0925-8388(94)90846-x.

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24

Lee, Dong Bok, and G. Simkovich. "Oxidation of molybdenum-tungsten-chromium-silicon alloys." Oxidation of Metals 31, no. 3-4 (April 1989): 265–74. http://dx.doi.org/10.1007/bf00846689.

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25

Zhang, Hui, Yan Liu, Yong Jie Yan, Han Qin Liang, Xue Jian Liu, and Zheng Ren Huang. "Wetting Behaviors of Nickel-Based Alloys on Sintered Silicon Carbide Ceramics." Key Engineering Materials 602-603 (March 2014): 274–78. http://dx.doi.org/10.4028/www.scientific.net/kem.602-603.274.

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Wetting behaviors of pure nickel and nickel-based alloys on sintered silicon carbide ceramics and their interfacial microstructures were investigated in this presentation. The nickel-based alloys were mainly the commercial nickel-molybdenum-chromium products. The wetting and spreading properties were observed by a real-time thermal optical measurement system under flowing argon-5%hydrogen atmosphere. As temperature increased, the pure nickel cylinder sample had few changes before 1356°C except for the thermal expansion in size and changed to liquid drop-shape when the temperature reached 1366°C. The contact angle was about 90o. And nickel could not contact sintered silicon carbide ceramics well. However, the introduction of molybdenum and/or chromium in the pure nickel was good for the wetting properties of pure nickel on sintered silicon carbide ceramics. The contact angles of nickel-based alloys (B-1, C-1 and C-2) on sintered silicon carbide ceramics after holding 15min at 1400°C were 25o, 12.5o, 11.5o, respectively. And they hardly reduced as temperature increased. The SEM images indicated that the interfacial microstructures of B-1 and C-1 on sintered silicon carbide ceramic substrates were uniform and the dissolved interface near silicon carbide ceramics indicated that they had a good bonding. At the same time, the reciprocal diffusion was clear in the intermediate layer. Besides that, the introduction of chromium was supposed to reduce the diffusion rate of molybdenum from the alloy to the ceramic substrate.

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26

Gutiérrez, Juliana, Gabriel Plascencia, Antonio Romero, Fidel Reyes, and Isaac Arellano. "Rate of Reduction of Chromium Oxides in a Slag by FeSi and FeMgSi Ferroalloys." Defect and Diffusion Forum 258-260 (October 2006): 288–93. http://dx.doi.org/10.4028/www.scientific.net/ddf.258-260.288.

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The rate of reduction of chromium oxides in a stainless steel slag was studied in stagnant slag / metal melts at 1600 °C. The experimental results show that the magnesium contained in a FeMgSi ferroalloy has a reduction potential comparable to that of the silicon in a FeSi ferroalloy. On the other hand, it was confirmed that the rate limiting step in the reduction of the chromium oxides is the transport of chromium from the bulk of the slag to the slag / metal interface. The mass transfer coefficients for the reduction of chromium were estimated and are in good agreement with previously reported values.

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27

Buchwalter, L. P. "Chromium and tantalum adhesion to plasma-deposited silicon dioxide and silicon nitride." Journal of Adhesion Science and Technology 9, no. 1 (January 1995): 97–116. http://dx.doi.org/10.1163/156856195x00329.

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28

Zayakin, O. V., V. A. Salina, and V. I. Zhuchkov. "INFLUENCE OF TEMPERATURE ON THE ELEMENTS REDUCTION FROM CHROMIUM-CONTAINING ORE-LIME MELT." Izvestiya Visshikh Uchebnykh Zavedenii. Chernaya Metallurgiya = Izvestiya. Ferrous Metallurgy 61, no. 12 (January 16, 2019): 993–94. http://dx.doi.org/10.17073/0368-0797-2018-12-993-994.

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Results of thermodynamic modeling of the elements reduction from the chromium containing ore-lime melt with the use of silicon from ferrosiliconickel as a reducing agent are presented as a function of temperature. It has been established that an increase in temperature from 1300 to 2200 °C helps to reduce the reduction degree of chromium from 98,9 to 69,8 %.

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29

Sharma, M., P. Kumar, А. В. Иржак, S. Kumar, R. Pratap, С. В. фон Гратовски, В. Г. Шавров, and В. В. Коледов. "Плавление и электромиграция в тонких пленках хрома." Физика твердого тела 62, no. 6 (2020): 880. http://dx.doi.org/10.21883/ftt.2020.06.49342.23m.

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Abstract Chromium films with a thickness of 10–40 nm deposited onto silicon substrates by magnetron sputtering are subjected to the action of electric current induced by the tip of an atomic force microscope (AFM) cantilever in air under regular environmental conditions. The melting process at the nanoscale, electric field-induced migration of material, and the chemical reaction of chromium oxidation that occur in melt craters formed around the region affected by the current are investigated using optical and scanning electron microscopies, AFM, and Raman spectroscopy. The flow of melted material induced by electric current is accompanied by the formation and motion of an array of spherical nanoparticles in the melt crater along its periphery. We propose that the formation of nanodrop array at relatively low current densities can be explained by the chromium oxidation reaction and the surface tension of melted material on the silicon substrate.

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30

Reislöhner, U., S. Schwarz, and W. Witthuhn. "Iron-, Manganese- and Chromium-Indium Pairs in Silicon." Materials Science Forum 117-118 (January 1993): 147–52. http://dx.doi.org/10.4028/www.scientific.net/msf.117-118.147.

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31

Gupta, K. P. "The Cr-Ni-Si (Chromium-Nickel-Silicon) System." Journal of Phase Equilibria & Diffusion 27, no. 5 (October 1, 2006): 523–28. http://dx.doi.org/10.1361/154770306x136511.

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32

Sadoh, T., M. Watanabe, H. Nakashima, and T. Tsurushima. "Deep levels of chromium‐hydrogen complexes in silicon." Journal of Applied Physics 75, no. 8 (April 15, 1994): 3978–81. http://dx.doi.org/10.1063/1.356018.

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33

Brenscheidt, F., W. Matz, E. Wieser, and W. Möller. "Annealing studies of chromium-implanted silicon nitride ceramics." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 127-128 (May 1997): 677–80. http://dx.doi.org/10.1016/s0168-583x(96)01154-8.

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34

Manivannan, N., W. Balachandran, C. Ribton, R. Beleca, M. Abbod, M. Cox, and P. Anastasia. "Chromium coated silicon nitride electron beam exit window." Vacuum 113 (March 2015): 19–23. http://dx.doi.org/10.1016/j.vacuum.2014.11.024.

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35

Xiao, P., and B. Derby. "Wetting of silicon carbide by chromium containing alloys." Acta Materialia 46, no. 10 (June 1998): 3491–99. http://dx.doi.org/10.1016/s1359-6454(98)00037-8.

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36

Kovsarian, A., and J. M. Shannon. "Amorphous chromium silicide formation in hydrogenated amorphous silicon." Journal of Electronic Materials 27, no. 11 (November 1998): 1268–71. http://dx.doi.org/10.1007/s11664-998-0081-8.

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37

Gupta, K. P. "The Co-Cr-Si (Cobalt-Chromium-Silicon) System." Journal of Phase Equilibria and Diffusion 31, no. 3 (March 16, 2010): 300–307. http://dx.doi.org/10.1007/s11669-010-9670-3.

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38

Heinz, Friedemann D., Florian Schindler, Wilhelm Warta, and Martin C. Schubert. "Interstitial Chromium in Silicon on the Micron Scale." Energy Procedia 38 (2013): 571–75. http://dx.doi.org/10.1016/j.egypro.2013.07.318.

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39

Zheng, Weijun, J. Michael Nilles, Dunja Radisic, and Kit H. Bowen. "Photoelectron spectroscopy of chromium-doped silicon cluster anions." Journal of Chemical Physics 122, no. 7 (February 15, 2005): 071101. http://dx.doi.org/10.1063/1.1851984.

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40

Baranov, P. G., V. A. Khramtsov, and E. N. Mokhov. "Chromium in silicon carbide: electron paramagnetic resonance studies." Semiconductor Science and Technology 9, no. 7 (July 1, 1994): 1340–45. http://dx.doi.org/10.1088/0268-1242/9/7/007.

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41

Gupta, K. P. "The Cr-Ni-Si (Chromium-Nickel-Silicon) system." Journal of Phase Equilibria and Diffusion 27, no. 5 (October 2006): 523–28. http://dx.doi.org/10.1007/bf02736465.

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42

Luo, Ping, Peter R. Strutt, and Tongsan D. Xiao. "Synthesis of chromium silicide-silicon carbide composite powders." Materials Science and Engineering: B 17, no. 1-3 (February 1993): 126–30. http://dx.doi.org/10.1016/0921-5107(93)90093-3.

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43

Lopez-Garcia, Zulema, and Saul J. Adelman. "An Abundance Analysis of the Silicon CP Star HD 43819." International Astronomical Union Colloquium 138 (1993): 149–53. http://dx.doi.org/10.1017/s0252921100020418.

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AbstractA fine analysis performed using four 4.3 Å/mm IIaO Mt. Wilson Observatory spectrograms shows that HD 43819 has abundance anomalies similar to those of other Silicon stars, namely it is helium, carbon, magnesium, and sulfur poor while being silicon, titanium, chromium, manganese, iron, strontium, zirconium, and rare earth rich.

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44

Shuaib, A. N., and Z. Ahmad. "Evaluation of the Mechanical Properties and Corrosion Resistance of Al-2.5Mg-Cr Alloys." Journal of Engineering Materials and Technology 114, no. 1 (January 1, 1992): 51–55. http://dx.doi.org/10.1115/1.2904140.

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The results of this paper relate to a development program designed to improve the corrosion resistance and mechanical properties of Al-2.5Mg alloys, by the addition of chromium and silicon, for desalination applications. The effect of 0.1 wt to 0.3 wt percent chromium addition on the mechanical properties and corrosion resistance of Al-2.5Mg in the Arabian Gulf water has been investigated. The results show that chromium addition has beneficial effects on the mechanical properties and corrosion resistance of the Al-2.5Mg alloys. A near optimum combination of mechanical properties and corrosion resistance is obtained by 0.2 wt and 0.3 wt percent chromium addition.

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45

Huang, Ru Qing, Ri Lai Ma, Zhen Lin Lu, and Yan Zhang. "Effect of Alloying Elements on the Corrosion Wear Behaviors of Low Chromium Cast Iron." Materials Science Forum 695 (July 2011): 397–400. http://dx.doi.org/10.4028/www.scientific.net/msf.695.397.

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The effect of alloying elements on the corrosion wear behaviors of low chromium cast iron in slurry with different ions was studied by self-made three-body corrosion wear tester. The results show that the corrosion wear resistance of low chromium cast iron was decreased with the increase of concentration of Cu2+ ion or SO42- ion in slurry. The corrosion wear mechanism of low chromium cast iron was dominated by micro-cutting of abrasive, accompanying by corrosion action. The addition of alloying elements did not improve the corrosion wear properties of low chromium cast iron obviously, because the amount of carbide and its hardness was decreased when the alloying elements were added into low chromium cast iron as well as the amount of silicon element was increased.

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46

Cunha, L., and C. Moura. "Si Doped and Un-Doped CrN Thin Films Produced by Magnetron Sputtering: Structural and Mechanical Properties." Journal of Nano Research 18-19 (July 2012): 201–11. http://dx.doi.org/10.4028/www.scientific.net/jnanor.18-19.201.

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Chromium nitride and silicon doped chromium nitride thin films have been deposited by r.f. reactive magnetron sputtering. The effect of processing parameters on the properties of chromium nitride films and the correspondent influence of the addition of silicon on the chromium nitride matrix in the films structure and mechanical properties have been investigated. The characterization of the coatings was performed by X-ray diffraction (XRD), and nano-indentation experiments. These studies allow analyzing the crystalline phases, crystal orientation/texture, crystallite size, mechanical properties and the relations between the characteristics of the films. The increase of the nitrogen partial pressure in the working atmosphere produces changes from a body-centered cubic (bcc) Cr structure, to hexagonal Cr2N to face-centered cubic (fcc) CrN structure, with CrN (111) preferred orientation. For the films with a dominant Cr2N phase the hardness has a relative maximum (42 GPa). The highest hardness was measured for a coating with dominant CrN phase (45 GPa) with a crystallite size around 18 nm. The addition of Si, in the films with CrN dominant phase, maintains the CrN (111) preferred orientation and produced variable changes in films hardness, depending on deposition conditions.

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47

Liu, Ying, Lin Wu, Ling Tong, Xiaoyu Yang, Ao Chen, Yilai Zhou, Zhiyuan Liao, Baoguo Zhang, and Ya Hu. "Preparation of reduced graphene oxide and its application in chromium-free inorganic insulating coating for oriented silicon steel." Journal of Physics: Conference Series 2076, no. 1 (November 1, 2021): 012059. http://dx.doi.org/10.1088/1742-6596/2076/1/012059.

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Abstract In the fields of military industry, national defence and major engineering, oriented silicon steel is an indispensable material, but the chromium-containing insulating coating coated on its surface is harmful to the environment and humans. Due to poor performance, the industrialization of chromium-free inorganic coating is hindered. To improve the corrosion resistance of chromium-free inorganic insulating coating for oriented silicon steel, reduced graphene oxide (rGO) was prepared by the hydrothermal reduction method and added to the basic chromium-free inorganic insulating coating composed of small-particle silica sol, large-particle silica sol and aluminium dihydrogen phosphate to obtain rGO-containing coating. Scanning electron microscopy (SEM) and Raman spectroscopy were used to analyse the microscopic morphology and structural characteristics of rGO. Electrochemical impedance spectroscopy (EIS) and Tafel polarization curves were used to test the corrosion resistance of the coating. The results show that the prepared rGO has a multi-layer structure with a smaller size than graphene oxide (GO) and can be dispersed in water-based coatings. And rGO can reduce the corrosion current density of the coating by two orders of magnitude, and improve the corrosion resistance of the coating.

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48

Dong, Fuyuan, Mingxu Zhang, Fan Peng, and Jianglong Zhang. "Preparation and Mechanical Properties of High Silicon Molybdenum Cast Iron Materials: Based on Deep Learning Model." Computational Intelligence and Neuroscience 2022 (September 26, 2022): 1–12. http://dx.doi.org/10.1155/2022/4825356.

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In the production and life of machines, wear is the main form of material failure. Many workpieces and equipment will produce friction and wear during use, causing energy and material consumption, resulting in huge economic losses. In the process of using engineering equipment, in order to improve the service life of the workpiece and improve the wear-resistant material, the research of the material itself must be closely linked with the wear mechanism. Among the antiwear materials, the application of high-chromium cast iron is the most common. The reason is that high-chromium cast iron has a series of advantages in performance, manufacturing technology, and price. However, high-chromium cast iron itself has high C content and high brittleness, resulting in defects in toughness and poor corrosion resistance. When working in harsh environments such as mechanical extrusion, high-strength wear, and chemical corrosion, cracking and deformation are prone to occur, corrosion and peeling, and another damage failure. High chromium cast iron must have a relatively stable structure, good strength and toughness, excellent wear resistance, and corrosion resistance. In this study, the static corrosion performance of high-chromium cast iron was tested to study the effects of Mo and V elements addition and content changes on corrosion resistance and vanadium, molybdenum, and subcritical treatment processes on the microstructure and properties of high-chromium cast iron, in order to obtain better performance. Lower cost high chromium cast iron castings. As a wear-resistant part, high-chromium cast iron castings are widely used in wear and can cope with harsh working environments, but their excellent hardness conditions bring certain defects in toughness and at the same time lack good corrosion resistance, in mechanical extrusion., high-strength wear, chemical corrosion, and other harsh environments are prone to damage and failure. Therefore, high-chromium cast iron should have dual properties, not only high hardness but also suitable for mud, sand, chemicals, and other media corrosion and wear resistance.

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Sulaiman, Syazwan Liyana, Sufizar Ahmad, and Hariati Taib. "Effect of Silicon Oxide Size and Reducing Environment on the Photocatalytic Capability of Poly(Vinyl Alcohol)/Chitosan/Silicon Oxide Beads." Applied Mechanics and Materials 699 (November 2014): 1000–1005. http://dx.doi.org/10.4028/www.scientific.net/amm.699.1000.

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The present work assess the capability of silicon oxide (SiO2) nanoparticle and microparticle incorporated in poly (vinyl alcohol)/chitosan/silicon oxide (PVA/CS/SiO2) beads to reduce chromium (Cr) ions of Cr (VI) to Cr (III). PVA/CS/(nanoand micro)-SiO2beads were prepared through a simple drop wise method. The elemental analysis of prepared photocatalytic beads were confirmed by scanning electron microscopy-energy dispersive x-ray spectroscopy (SEM-EDX) and morphology of PVA/CS/SiO2beads before and after Cr ions reduction were observed with SEM. The reduction of chromium (Cr (VI)) ions by both of PVA/CS/(nanoand micro)-SiO2) beads, as evaluated by the reduction duration taken were studied by photocatalytic process in which factors of SiO2powders size and pH of reducing environment were varied. Photocatalytic studies revealed better performance of PVA/CS/nanoSiO2beads in compared to PVA/CS/micro-SiO2beads in Cr (VI) to Cr (III) ions reduction. Reduction Cr (VI) to Cr (III) ions by PVA/CS/nanoSiO2beads occurred in 30 minutes and 50 minutes by PVA/CS/micro-SiO2. Moreover, both PVA/CS/(nanoand micro)-SiO2showed excellent reduction of Cr (VI) ions at lower pH environment. It is thus concluded that both of PVA/CS/(nanoand micro)-SiO2beads are capable for chromium reduction in highly acidic environment in which PVA/CS/nanoSiO2beads showed better performance.

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50

Hou, P. Y., Z. R. Shui, and J. Stringer. "Oxidation Behavior of Co-15wt% Cr Alloy Containing Dispersed Oxides Formed by Internal Oxidation." Corrosion 48, no. 12 (December 1, 1992): 990–1000. http://dx.doi.org/10.5006/1.3315911.

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Abstract Internal oxidation pretreatments of Co-15wt%Cr and Co-15wt%Cr-1 wt% Ti were carried out using a Rhines pack in quartz, in mullite, and in alumina. A dispersion of titanium oxide particles formed in the Ti-containing alloy as a result of the internal oxidation. However, silicon also diffused into all treated specimens when the pretreatments were carried out in quartz or in mullite. The effect of various pretreatments on the subsequent oxidation of these alloys was studied at 1,000°C and compared with that of a Co-15wt%Cr-1wt%Si alloy. The main purpose of this study was to determine the relative effectiveness of the dispersed oxide particles and the contaminated silicon on the selective oxidation of chromium. It was found that the oxidation behaviors of both treated alloys were strongly affected by the degree of silicon contamination. Selective oxidation of chromium to form a nearly continuous protective Cr2O3 scale was achieved with greater than 0.4 wt% silicon. The presence of dispersed particles reduced initial oxidation rate but was ineffective in promoting Cr2O3 scale formation.

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