Academic literature on the topic 'Siliciures – Teneur en nickel'
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Journal articles on the topic "Siliciures – Teneur en nickel"
Kazamer, Norbert, Stephania Kossman, István Baranyi, Didier Chicot, Viorel-Aurel Serban, Zoltán Rajnai, and Mircea Voda. "Effet de l’addition de TiB2 sur les propriétés mécaniques et tribologiques de revêtements NiCrBSi déposés par projection thermique." Matériaux & Techniques 106, no. 2 (2018): 202. http://dx.doi.org/10.1051/mattech/2018026.
Full textRado, C., S. Kalogeropoulou, and N. Eustathopoulos. "Mouillabilité et réactivité entre les siliciures de nickel ou de fer et SiC." Revue de Métallurgie 91, no. 9 (September 1994): 1347. http://dx.doi.org/10.1051/metal/199491091347.
Full textTirand, G., C. Primault, and V. Robin. "Sensibilité à la fissuration à chaud des alliages base nickel à haute teneur en chrome." Matériaux & Techniques 102, no. 4 (2014): 403. http://dx.doi.org/10.1051/mattech/2014035.
Full textKamoun, Nesrine, Mohamed Kadri Younes, and Abdelhamid Ghorbel. "Influence de la teneur en nickel sur les propriétés texturales, structurales et catalytiques des aérogels à base de zircone sulfatée et dopée au nickel." Annales de chimie Science des Matériaux 35, no. 6 (December 28, 2010): 311–22. http://dx.doi.org/10.3166/acsm.35.311-322.
Full textLemoine, Pierric, and Patrice Berthod. "Influence des carbures de chrome sur le comportement thermodilatométrique d’alliages ternaires base nickel, base cobalt et base fer à haute teneur en carbone." Annales de chimie Science des Matériaux 34, no. 2 (April 28, 2009): 61–76. http://dx.doi.org/10.3166/acsm.34.61-76.
Full textDiop, Cheikh, Dorothée Dewaele, Aminata Toure, Mathilde Cabral, Fabrice Cazier, Mamadou Fall, Baghdad Ouddane, and Amadou Diouf. "Étude de la contamination par les éléments traces métalliques des sédiments cotiers au niveau des points d’évacuation des eaux usées à Dakar (Sénégal)." Revue des sciences de l’eau 25, no. 3 (November 28, 2012): 277–85. http://dx.doi.org/10.7202/1013107ar.
Full textClowes, Ron M. "Logan Medallist 5. Geophysics and Geology: An Essential Combination Illustrated by LITHOPROBE Interpretations–Part 2, Exploration Examples." Geoscience Canada 44, no. 4 (December 19, 2017): 135–80. http://dx.doi.org/10.12789/geocanj.2017.44.125.
Full textDissertations / Theses on the topic "Siliciures – Teneur en nickel"
Esposito, Laura. "Mise en oeuvre de procédés innovants pour l'optimisation de contacts TiSi pour les technologies imageurs avancées." Electronic Thesis or Diss., Aix-Marseille, 2021. http://theses.univ-amu.fr.lama.univ-amu.fr/210319_ESPOSITO_505pj561fjb969hmp55qmrno_TH.pdf.
Full textIn image sensor devices, Ti silicides are used to establish contacts between transistors and copper interconnects. A new problematic emerges with the co-integration of Ti-based and Ni-based silicided contacts: the titanium silicide (C54-TiSi2) needs to be formed at a lower temperature than the conventional formation temperature (800°C). In order to reduce the temperature of silicide formation, the influence of nanosecond laser annealing on Ti silicide contact formation has been investigated in this PhD work. To do so, consecutive deposition of Ti and TiN films with thicknesses below 10 nm were carried out after a specific surface treatment. Annealing by UV nanosecond laser (UV-NLA) at different energy densities, different numbers of shots and followed by rapid thermal annealing (RTA) for various temperatures were performed. The different samples were characterized by several methods including: four-point probe measurements, X-ray diffraction, and transmission electron microscopy. The main results obtained with the use of UV-NLA are the following: it enables the formation of an amorphous phase in the solid state and the formation of the metastable C40-TiSi2 phase becomes possible by melting the first nanometers of the substrate. By combining multiple laser shots and a subsequent RTA, the formation of the C54-TiSi2 phase at low temperature of 650 °C has been demonstrated. Studies carried out on doped and/or polycrystalline substrates, as well as on wafers with nanometric patterns indicate that, in the current state, the integration of UV- NLA into the industrial process is more complex than expected. Prospects for promoting the integration of UV-NLA are also discussed
Nemouchi, Fabrice. "Réactivité de films nanométriques de nickel sur substrats silicium-germanium." Aix-Marseille 3, 2005. http://www.theses.fr/2005AIX30052.
Full textWe present a study on the reactivity between thin films of nickel with several substrates : silicon, germanium and silicon-germanium. The formation sequence, the formation kinetic and the stability of silicides, germanides, and germano-silicides have been studied by "in situ" measurements and real time using XRD, DSC and four points probes resistance. We developed, in particularly, an original method to measure the heat flow during thin films on substrate reactions by DSC measurements. We observed different behavior of silicides versus gremanides. Indeed, silicides have overall a sequential growth with nevertheless some transient phases (Ni31Si12 and Ni3Si2) that appear and disappear rapidly. In contrary of silicides, germinides display a simultaneous growth of Ni5Ge3 and NiGe. In both systems, we realised original measurement of interfacial reaction rates of Ni rich phases (Ni2Si and Ni5Ge3) by simulating the kinetics by a linear-parabolic law (diffusion and interfacial reaction control). The formation of germano-silicides is sequential as silicides one. We observed that the Si rich phase (NiSi2) does not appear in presence of germanium. Moreover, during the Ni(Si1-xGex) formation, Ge is rejected from this phase. It could be explained by the thermodynamic equilibrium between Ni(Si1-xGex) and Si1-xGex with different concentration of germanium in both phases. This study provides new elements for the understanding of the fundamental phenomena needed for metallization of nanoelectronic devices
Blum, Ivan. "Diffusion et redistribution des dopants et du platine dans les siliciures de nickel sur silicium." Aix-Marseille 3, 2010. http://www.theses.fr/2010AIX30061.
Full textThe objective of this study is to quantify the diffusion and solubility of As, B and Pt in Ni silicides in order to gain a better understanding of their redistribution during silicidation. Therefore, these elements were implanted in o-Ni2Si and NiSi thin films and their diffusion and solubility were studied using secondary ion mass spectroscopy (SIMS) and atom probe tomography (APT). Diffusion coefficients could be measured by comparing SIMS measurements and two dimensional diffusion simulations. APT analyses allowed to observe the precipitation of B above its solubility limit in NiSi. Then, B and Pt redistribution during silicidation were characterized by SIMS and APT. The previous data concerning their diffusion and solubility in the two silicides were used together to interpret these results. In addition, B redistribution was compared to redistribution simulations using a simple model
Owen, Thomas. "Etude de la nucleation du diamant sur substrats de silicium et de siliciures de nickel." Université Louis Pasteur (Strasbourg) (1971-2008), 2000. http://www.theses.fr/2000STR13141.
Full textMassoura, Stamatia. "Spéciation et phytodisponibilité du nickel dans les sols." Vandoeuvre-les-Nancy, INPL, 2004. http://www.theses.fr/2004INPL009N.
Full textThis thesis relates to the study of parameters which influence the dynamic of nickel and its radionuclide 63 Ni in soils. At the Saille time, the study of the chemical and biological characteriza- tion of these elements availability in the soils is done. The available pool of Ni and 63 Ni (chemical estimation) was measured by chemical and isotopic methods and soil incubations; by evaluating the interest and limits of each roethod. The factors which influence the mobility of metal in soils were thus determined. With through this study, we showed that the bio- and phyto-availability of Ni depend on the soil mineralogy, on the soil weathering, on the type of metal associations with the mineraIs, and on the quantitative presence of these mineraIs. The transfer of Ni and 63 N i from the soil to the plant depends on the metal availability in the soil and on the roots behaviour to the soil offe1, in relation to the strategies of hyperaccumulation, accumulation or exclusion of N z. Plants are able to modify the metal availability in soils by influencing the sorption processes of Ni from the solid phase to the soil solution. They are also able to change the speciation of Ni in solu- tion however the majority form of Ni in the soil solution was N i2+. Hyperaccumulators regulate Ni and 63 N i concentration in soil solution and their migration to the ground water. If the physico-chemical properties of soils, the pollutant availability and the choice of the hyperaccumulators are taken into account, the se plants are able to decrease and control durably the ecotoxicological effects of trace elements and radionuclides contamination in soils
Lipoff, Clarisse. "Caractérisation moléculaire du locus nik codant pour le système de transport du nickel à haute affinité chez Escherichia coli : Sous-titre." Lyon, INSA, 1993. http://www.theses.fr/1993ISAL0060.
Full textNickel is requires for anaerobic activity of three metalloprotein hydrogenase of Escherichia coli. Characterisation on nik mutants impaired in hydrogenase activity, Which could be further restored by an express og nickel, led ti the suggestion that the nik locus is involved in nickel transport into cell. Our result confirm the hypothesis. The in vivo expressed nik locus encodes five polypeptide Nik A, B, C,D, E from 59 to 25,5 kDa. The operonic organization of locus nik is suggested by phenotypic analysis of plasmid and chromosomal Tn5 insertion, and confirmed by sequencing of the entire nik locus. The consensus for the general anaerobic regulatory protein FNR and a putative binding site for a regulatory protein were found in the nik regulatory sequence. Computer comparison analysis of nik protein sequence revealed strong homologies with the oligo-peptide periplasmic transport systemprotei. The function of locus nik was clearly demonstrated by the absence of high affinity nickel mutants in the presence of magnesium ; Transport assays and resistance to nickel of cor A mutants impaired in the non specific magnesium transport, indicate that three uptake pathways for nickel are present in E. Coli
Cacho, Florian. "Etude de simulation de la siliciurisatiion du nickel : application dans les technologies MOS." Paris, ENMP, 2005. https://pastel.archives-ouvertes.fr/tel-00159435.
Full textRivero, Christian. "Contraintes mécaniques induites par les procédés de la microélectronique : développement des contraintes lors des réactions Co-Si et Ni-Si." Aix-Marseille 3, 2005. http://www.theses.fr/2005AIX30001.
Full textThis study is aimed at a better understanding of stresses and their evolution under thermal loading in microelectronics devices. In the neighborhood of geometrical singularities very high local stresses appear and may lead to defects, which may decrease device lifetime. We have also investigated stress build up which occurs during metal-silicon reaction. Indeed metal silicides, which are used as contacts, are grown via metal-silicon solid state reaction. Joined X-ray diffraction and curvature measurements have been performed in situ during the reaction of thin Co and Ni films with Si. We show that the sign of the stress is well explained by the specific volume changes at the reacting interfaces. Stress development during the formation of Co silicides follows qualitatively the behavior predicted by Zhang and d'Heurle. On the other hand the behavior of Ni silicides appears more complex. We show that the transient appearance of Ni3Si2 plays an important role in stress development. The evolution of stresses in Ni2Si or Ni3Si2 does not follow the predictions of the Zhang and d'Heurle model. A new model is clearly needed and will have to take into account our experimental results
Bichon, Marie. "Evaluation et optimisation de la durée de vie d'électrodes élaborées en voie aqueuse pour des batteries de nouvelle génération." Thesis, Nantes, 2019. http://www.theses.fr/2019NANT4051.
Full textIncreasing the energy density of Liion batteries while reducing their manufacturing costs is a milestone towards widespread application of electric vehicles. In this regard, high capacity materials have been developed, among them lithium nickel manganese cobaltlayered oxide (NMC), as their energy densitycan be increased with higher nickel content. Aqueous processing of these materials can contribute to cost reduction, by using water as a solvent instead of standard, toxic Nmethylpyrrolidone (NMP), whose use requires pricey installation to recover the vapors upon drying of the electrode. This study aims at developing aqueous formulations of NMC532 cathodes (50% nickel, 30% manganese and 20% cobalt), and assess their electrochemical performance. As layered oxides are sensitive towards water, surface modification of the material upon immersion in aqueous slurries was investigated through various characterizations. Several routes were proposed to develop water-based cathodes with electrochemical performance comparable to NMP-based electrodes. In particular, corrosion of the aluminum current collector occurring in aqueous processing owing to the alkalinity of the NMC slurry is avoided through the addition of phosphoric acid which buffers the slurry pH, or by using a carbon-coated collector. The ageing behavior of such aqueous processed electrodes was then investigated through post mortem analyses after long-term cycling in Li-ion cells
Vallée, Karine. "Le nickel dans les eaux alimentaires : application à des champs captants du bassin Artois-Picardie." Lille 1, 1999. https://pepite-depot.univ-lille.fr/LIBRE/Th_Num/1999/50376-1999-385.pdf.
Full textBook chapters on the topic "Siliciures – Teneur en nickel"
VIDAL, Olivier. "Modélisation de l’évolution à long terme de l’énergie de production primaire et du prix des métaux." In L’économie des ressources minérales et le défi de la soutenabilité 1, 119–43. ISTE Group, 2021. http://dx.doi.org/10.51926/iste.9024.ch5.
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