Relevant bibliographies by topics / Silica films

Academic literature on the topic 'Silica films'

Author: Grafiati
Published: 8 June 2024

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Contents

  1. Journal articles
  2. Dissertations / Theses
  3. Books
  4. Book chapters
  5. Conference papers
  6. Reports

Journal articles on the topic "Silica films":

1

Maier, Wilhelm F., Michael Wiedorn, and Herbert O. Schramm. "Microporous Silica Films." Angewandte Chemie International Edition in English 30, no. 11 (November 1991): 1509–10. http://dx.doi.org/10.1002/anie.199115091.

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2

Chien, Wen Chen, Yang Yen Yu, and Shih Yu Chen. "Synthesis and Characterization of Photopolymerized Poly(acrylic)/Monodispersed Colloidal Silica Hybrid Thin Films." Advanced Materials Research 47-50 (June 2008): 662–65. http://dx.doi.org/10.4028/www.scientific.net/amr.47-50.662.

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In this study, poly(acrylic)/silica hybrid thin films were prepared from various acrylic monomers and monodispersed colloidal silica with a coupling agent MSMA. The silica content in the hybrid thin films was varied from 0 to 50 wt%. The experimental results showed that the coverage area of silica particle by the MSMA decreased with increasing silica content and resulted in the aggregation of silica particle in the hybrid films. Thus, the silica domain in the hybrid films was varied from 20 to 35 nm by the different mole ratios of MSMA to silica. The results of SEM, TEM, and EA supported the above results. The analysis of FTIR and Raman spectra indicated that the degree of photopolymerization was very high. The prepared hybrid films from the crosslinked acrylic polymer moiety showed much better film uniformity, thermal stability and mechanical properties than those obtained from poly(methyl methacrylate). The refractive index decreased linearly with increasing the silica fraction in the hybrid films. Excellent optical transparency was obtained in the prepared hybrid films. These results showed that the prepared hybrid thin films had potential applications as passive films for optical devices.
3

Deschanels, X., S. Dourdain, C. Rey, G. Toquer, A. Grandjean, S. Pellet-Rostaing, O. Dugne, C. Grygiel, F. Duval, and Y. Serruys. "Radiation damages on mesoporous silica thin films and bulk materials." MRS Proceedings 1514 (2013): 69–74. http://dx.doi.org/10.1557/opl.2013.386.

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ABSTRACTMesoporous silicas are highly potential materials for applications in the nuclear field like separation, recycling or nuclear wastes confinement. In this work, the effects of the radiation damage on the mesoporous network were investigated by XRR (X-Rays Reflectivity) and nitrogen adsorption isotherm on respectively mesoporous organized thin films (SBA) and disordered bulk mesoporous materials (Vycor glass). The article attempts to answer the question of the existence of a relationship between the rigidity of the mesoporous silica network, and the behavior of silica materials under irradiation.
4

Li, Yu, Yi He Zhang, Bo Shen, and Feng Zhu Lv. "Preparation and Dielectric Properties of Polyimide Nanocomposite Films Based on Hollow Silica." Advanced Materials Research 217-218 (March 2011): 647–51. http://dx.doi.org/10.4028/www.scientific.net/amr.217-218.647.

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The hollow silica was fabricated by using monodispersed polystyrene microspheres as core template and tetraethyl orthosilicate as silica source, and polyimide nanocomposite films with different hollow silica concentration were successfully prepared via in situ polymerization. The hollow silica and nanocomposite films were characterized. The results indicated that the diameter of the hollow silica is around 30nm and the dielectric constant of the nanocomposite films enhance with the increase of the concentration of the hollow silica.
5

Yu, Yang Yen, Wen Chen Chien, and Tsung Wei Tsai. "Microstructure and Properties of Polyimide /Monodispersed Colloidal Silica Hybrid Films Prepared by Sol–Gel Process." Advanced Materials Research 47-50 (June 2008): 650–53. http://dx.doi.org/10.4028/www.scientific.net/amr.47-50.650.

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In this study, the polyimide-silica hybrid thin films, 6FDA-6FpDA-4ABA/SiO2 (FS0-FS50) were prepared from the 12nm colloidal silica and polyimide bearing acid endgroups. During the preparation, without any additional coupling agents or chelating ligands were used. The strong interactions between carboxylic acid coordinating with silica were believed to prevent the macrophase separation. TGA analysis showed that the thermal decomposition temperatures (Td) incresased with increasing the silica content. UV-VIS spectra showed that the cutoff wavelength of prepared hybrid films could be tunable through the silica content. The n&k analysis showed that the refractive index (n) of PS hybrid films were in the range of 1.575-1.479, which could be controlled by the silica content. The extinction coefficients (k) are almost zero in the wavelength range of 300–900 nm, indicating the prepared hybrid films have an excellent optical transparency in the UV and visible region. TEM images showed that the particle size of silica in the hybrid thin films could be effectively controlled. The results of SEM and AFM showed that all the prepared hybrid films have a good planarity. It demonstrated that the prepared polyimide-silica hybrid thin films have an excellent film formability and planarity.
6

Breval, E., M. L. Mulvihill, J. P. Dougherty, and R. E. Newnham. "Polyimide-silica microcomposite films." Journal of Materials Science 27, no. 12 (1992): 3297–300. http://dx.doi.org/10.1007/bf01116027.

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7

Loughlani, Rayane-Ichrak, Alonso Gamero-Quijano, and Francisco Montilla. "Electroassisted Incorporation of Ferrocene within Sol–Gel Silica Films to Enhance Electron Transfer." Molecules 28, no. 19 (September 28, 2023): 6845. http://dx.doi.org/10.3390/molecules28196845.

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The sol–gel method is a straightforward technique that allows electrode modification with silica thin films. Furthermore, the silica pores could be functionalized to enhance the electrical conductivity and reactivity of the silica films. In this context, silica thin films were functionalized with ferrocene species. This functionalization was performed by electroassisted accumulation, generating a micro-structured composite electrode (Fc@SiO2 electrode). These modified electrodes were characterized by electrochemical and spectroelectrochemical methods, pointing out that ferrocene species were confined with high stability within the microporous silica thin film, demonstrating the good adsorption capacity of the silica. While the spectroelectrochemical characterization indicates that only a fraction of the confined species within the silica films were electroactive, the electrochemical results demonstrate that the Fc@SiO2 film enhances the electrochemical response of cytochrome c in a solution, which gives rise to further applications of these films for redox-controlled release and electrochemical detection of other redox-active proteins.
8

Horikawa, Hajime, Takashi Ogihara, Akio Shimomura, and Junko Shimomura. "Preparation and Characterization of Silica Film on PBT Substrate by Sol-Gel Method Using Perhydropolysilazane." Key Engineering Materials 421-422 (December 2009): 161–64. http://dx.doi.org/10.4028/www.scientific.net/kem.421-422.161.

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Silica, silica/polymethylmethacrylate (PMMA) hybrid, and silica-particle blend silica films were successfully prepared on polybutylene terephtalate (PBT) substrate by dip coating using perhydropolysilazane (PHPS) as a silica source. The effect of thermal treatment on conversion from PHPS to silica was investigated in detail by scanning electron microscopy and Fourier transform infrared spectroscopy. Mechanical properties of silica and silica/PMMA hybrid thin films also were examined by the pencil scratch hardness tests.
9

Zhang, Yi He, Qing Song Su, Li Yu, Hong Zheng, Hai Tao Huang, Guo Ge Zhang, Ying Bang Yao, and Helen Lai Wah Chan. "Study on the Dielectric Properties of Hybrid and Porous Polyimide-Silica Films." Advanced Materials Research 47-50 (June 2008): 973–76. http://dx.doi.org/10.4028/www.scientific.net/amr.47-50.973.

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A sol-gel process was used to prepare polyimide-silica hybrid films from the polyimide precursors and TEOS in N,N- dimethyl acetamide, then the hybrid film was treated with hydrofluoric acid to remove the dispersed silica particles, leaving pores with diameters between 80nm to 1µm, depending on the size of silica particles. The structure and dielectric constant of the hybrid and porous films were characterized by FTIR,SEM. The porous films displayed relatively low dielectric constant compared to the hybrid polyimide-silica films.
10

Kubo, Tomoko, Eisuke Tadaoka, and Hiromitsu Kozuka. "Formation of silica coating films from spin-on polysilazane at room temperature and their stability in hot water." Journal of Materials Research 19, no. 2 (February 2004): 635–42. http://dx.doi.org/10.1557/jmr.2004.19.2.635.

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Spin-coating was conducted on single-crystal silicon substrates using a xylene solution of perhydropolysilazane (PHPS) to obtain 0.14-μm-thick PHPS films. The PHPS films obtained were suspended over various acidic and basic solutions at room temperature so that they were exposed to the vapors from the solutions. PHPS-to-silica film conversion was studied by infrared absorption spectroscopy, and the stability of the exposed films in hot water was examined by soaking the films in 80 °C water. The as-deposited PHPS films were found to be dissolved in water. When the PHPS films were suspended over water, the films were partially converted into silica, but the resultant film had low stability in hot water. Higher degrees of PHPS-to-silica conversion and higher stabilities in hot water were found on exposing the PHPS films to basic or acidic vapors. Exposure to highly basic vapors from aqueous solutions of ammonia and ethylamine was significantly effective in PHPS-to-silica film conversion, which provided silica thin films with high stability in hot water.
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You might also be interested in the extended bibliographies on the topic 'Silica films' for particular source types:
Journal articles Dissertations / Theses Books

Dissertations / Theses on the topic "Silica films":

1

Campbell-Rance, Debbie. "Electrodeposited Silica Thin Films." VCU Scholars Compass, 2010. http://scholarscompass.vcu.edu/etd/2123.

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Sol-gel derived silica thin film synthesis has gained prominence because of the mild processing conditions and widespread understanding of the chemistry of the process. Traditionally, silicate films are prepared by spin- and dip-coating but these materials lack the desired porosity for sensing, separations and catalysis applications. Electrochemical deposition was proposed to improve the porosity of silicate films. The main aims of this work were threefold. First we wanted to elucidate what parameters influenced film formation during electrodeposition. Then we wanted to understand how these parameters affected the morphology of the materials prepared. These films were characterized by profilometry, AFM, and SEM-EDX. Films electrodeposited via cathodic potentials are particle-like, thicker and rougher than spin-coated films. The final goal was to pattern a substrate with silica using photolithography, sol-gel process and electrodeposition. Successful patterning was hindered by the deposition of silica on glass, especially when the gap between ITO bands was smaller than the diffusion layer thickness of the electroactive species.
2

Spaargaren, Susan Marianne Rosemary. "Radiation effects on silica based waveguides." Thesis, Imperial College London, 1997. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.267942.

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3

Klichko, Yaroslav Vladimirovich. "Functional mesoporous silica films for nanosystems applications." Diss., Restricted to subscribing institutions, 2009. http://proquest.umi.com/pqdweb?did=1998520791&sid=1&Fmt=2&clientId=1564&RQT=309&VName=PQD.

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Kokan, Julie Runyan. "Processing of low permittivity silica thin films." Thesis, Georgia Institute of Technology, 1994. http://hdl.handle.net/1853/20032.

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5

Geite, Patrik. "Medical Implant Applications of Mesoporous Silica Films." Thesis, Linköpings universitet, Nanostrukturerade material, 2019. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-154463.

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A literature review of medical implant applications of mesoporous silica films was written, highlighting the advantages and limitations of different film synthesis methods. Both films synthesized through the EISA sol-gel method and particulate films, including those synthesized through the direct growth method, were reviewed and discussed. All films were found to have their strengths and weaknesses, however, the films synthesized through the direct growth method was found to be the most promising type for coating implants. In addition to the literature review, copper-doped mesoporous silica films were synthesized on titanium grade 2 substrates. SEM shows that particles grown on all the films and EDX elemental analysis confirms the presence of copper in the material. Nitrogen physisorption measurements show that particles with incorporated copper have a higher specific surface area, and pore volume compared to un-doped particles. No copper content could be confirmed through FTIR. The particles grown on titanium substrates were more rod-like compared to the ones grown on the silicon substrates as control.
6

Wooten, Mary K. "NANOFILTRATION MEMBRANES FROM ORIENTED MESOPOROUS SILICA THIN FILMS." UKnowledge, 2014. http://uknowledge.uky.edu/cme_etds/28.

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The synthesis of mesoporous silica thin films using surfactant templating typically leads to an inaccessible pore orientation, making these films not suitable for membrane applications. Recent advances in thin film synthesis provide for the alignment of hexagonal pores in a direction orthogonal to the surface when templated on chemically neutral surfaces. In this work, orthogonal thin film silica membranes are synthesized on alumina supports using block copolymer poly(ethylene glycol)-block-poly(propylene glycol)-block-poly(ethylene glycol) (P123) as the template. The orthogonal pore structure is achieved by sandwiching membranes between two chemically neutral surfaces, resulting in 90 nm thick films. Solvent flux of ethanol through the membrane demonstrates pore accessibility and suggests a silica pore size of approximately 10 nm. The permeability of ions and fluorescently tagged solutes (ranging from 4,000 to 70,000 Da) is used to demonstrate the membrane’s size selectivity characteristics. A size cut off occurs at 69,000 Da for the model protein BSA. By functionalizing the silica surface with a long chained alkyl group using n-decyltriethoxysilane (D-TEOS), the transport properties of the membranes can be altered. Contact angle measurements and FTIR results show the surface to be very hydrophobic after functionalization. Solvent flux of ethanol through the silica thin film membrane is similar before and after functionalization, but water flux decreases. Thin film silica membranes show much promise for applications in catalysis, bio-sensing, and affinity separations.
7

Bragg, Donald. "Photocatalytic Oxidation of Carbon Monoxide Using Sputter Deposited Molybdenum Oxide Thin Films on a Silicon Dioxide Substrate." Fogler Library, University of Maine, 2007. http://www.library.umaine.edu/theses/pdf/BraggD2007.pdf.

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8

Basnig, Deomila. "Élaboration de films minces de silice pour des applications en chimie analytique." Electronic Thesis or Diss., Université de Lorraine, 2021. http://www.theses.fr/2021LORR0102.

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Un film orienté à base de silice mésoporeuse sur une électrode FTO a été préparé par une approche d'auto-assemblage assistée par électrochimie (EASA). Un potentiel de -1,5 V a été appliqué à l'électrode FTO contenant un précurseur de silice préhydrolysée (par exemple, l'orthosilicate de tétraéthyle), en présence d'un modèle (par exemple, le bromure de cétrimonium) et d'un électrolyte. Cette approche permet de générer des nanocanaux de silice alignés verticalement avec des tailles de pores ajustables entre 2 et 3 nm, selon le modèle. Ce travail a montré le comportement voltammétrique et la sélectivité du film de silice mésoporeuse vis-à-vis de divers cations chargés positivement de nature, de taille et de charge différentes. Les résultats ont montré une accumulation et une sélectivité favorisant l'ion le moins chargé positivement : MB⁺ > PQ²⁺ > DQ²⁺ > Ru(bpy)₃²⁺ > Ru(NH₃)₆³⁺. L'augmentation des signaux voltamétriques par rapport à l'électrode FTO nue dépendait fortement du type de sonde. L'accumulation des différentes sondes redox est attribuée à l'orientation verticale du nanocanal qui favorise le transport rapide et la diffusion à la surface de l'électrode. Une caractérisation électrochimique plus poussée a montré une interaction entre le processus contrôlé par la surface et le processus contrôlé par la diffusion, où les espèces adsorbées sont plus importantes dans les milieux dilués. Les résultats ont montré que la modification de la longueur debye et du rayon électrocinétique du nanocanal de silice en raison de la force ionique ou du diamètre du nanocanal affecte également le transport et la détection électrochimique de l'analyte paraquat. Les films de silice mésoporeuse ayant des tailles de pores différentes, préparés en utilisant différents bromure d'alkylammonium comme modèle, donnent des sensibilités différentes, qui pourraient être dues à la différence de charge électrochimique de la surface de la silice, ainsi qu'à la distribution des ions dans le nanocanal. Enfin, une tentative de modification de la surface de la paroi de silice en utilisant de la zircone a également été faite pour étudier le transport des cations, ce qui pourrait ouvrir la voie à une meilleure stabilité du film mésoporeux
Oriented mesoporous silica-based film on FTO electrode was prepared via electrochemically-assisted self-assembly approach (EASA). A potential of -1.5V was applied to the FTO electrode containing a prehydrolyzed silica precursor, (e.g. tetraethyl orthosilicate), in the presence of a template (e.g. cetrimonium bromide) and electrolyte. This approach could generate vertically-aligned silica nanochannels with pore sizes adjustable between 2 and 3 nm, depending on the template. This work showed the voltammetric behavior and the selectivity of the mesoporous silica film towards various positively-charged cations of different nature, size, and charge. Results showed an accumulation and selectivity favoring the least positive charged ion: MB⁺ > PQ²⁺ > DQ²⁺ > Ru(bpy)₃²⁺ > Ru(NH₃)₆³⁺. The enhancement of the voltammetric signals relative to the bare FTO electrode was strongly dependent on the probe type. The accumulation of the different redox probe is attributed to the due to the vertical orientation of the nanochannel favoring fast transport and diffusion unto the electrode surface. Further electrochemical characterization showed an interplay of the suface-controlled and diffusion-controlled process, wherein adsorbed species is more prominent in diluted media. Results showed that changing the debye length and electrokinetic radius of the silica nanochannel due to the ionic strength or nanochannel diameter also affects the transport and electrochemical detection of the paraquat analyte. Mesoporous silica films having different pore size, prepared using different alkyl ammonium bromide as template, yield different sensitivities, which could be due to the difference in electrochemical charge of the silica surface, as well as the distribution of ions in the nanochannel. Finally, an attempt to modify the surface of silica wall using zirconia was also made to study the transport of cations, which could pave a way for an improved stability of the mesoporous film
9

CHAKRAVARTY, SRINIVAS L. N. "DEVELOPMENT OF SCRATCH RESISTANT PECVD SILICA-LIKE FILMS." University of Cincinnati / OhioLINK, 2000. http://rave.ohiolink.edu/etdc/view?acc_num=ucin973542599.

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Moskowitz, Steven. "Atomic force miscroscopy [sic] study of SiO₂/Si(111)--(7x7) grown via atomic oxygen plasma /." Thesis, Connect to this title online; UW restricted, 2005. http://hdl.handle.net/1773/11556.

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Books on the topic "Silica films":

1

Innocenzi, Plinio. Mesoporous Ordered Silica Films. Cham: Springer International Publishing, 2022. http://dx.doi.org/10.1007/978-3-030-89536-5.

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Center, Lewis Research, ed. Mechanical protection of DLC films on fused silica slides. Cleveland, Ohio: Lewis Research Center, 1985.

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3

Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (8th 2005 Québec, Québec). Silicon nitride, silicon dioxide thin insulating films, and other emerging diele[c]trics VIII: Proceedings of the international symposium. Edited by Sah R. E, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division, and Electrochemical Society Meeting. Pennington, N.J: Electrochemical Society, 2005.

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Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (8th 2005 Québec, Québec). Silicon nitride, silicon dioxide thin insulating films, and other emerging diele[c]trics VIII: Proceedings of the international symposium. Edited by Sah R. E, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division, and Electrochemical Society Meeting. Pennington, N.J: Electrochemical Society, 2005.

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Symposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Emerging Dielectrics (9th 2007 Chicago, Ill.). Silicon nitride, silicon dioxide, and emerging dielectrics 9. Edited by Sah R. E, Electrochemical Society. Dielectric Science and Technology Division., and Electrochemical Society Meeting. Pennington, N.J: Electrochemical Society, 2007.

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Symposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Emerging Dielectrics (9th 2007 Chicago, Ill.). Silicon nitride, silicon dioxide, and emerging dielectrics 9. Edited by Sah R. E, Electrochemical Society. Dielectric Science and Technology Division., and Electrochemical Society Meeting. Pennington, N.J: Electrochemical Society, 2007.

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Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (5th 1999 Seattle, Wash.). Silicon nitride and silicon dioxide thin insulating films: Proceedings of the fifth international symposium. Pennington, NJ (10 S. Main St., Pennington 08534-2696: Electrochemical Society), 1999.

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Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films (7th 2003 Paris, France). Silicon nitride and silicon dioxide thin insulating films VII: Proceedings of the international symposium. Edited by Sah R. E, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division, and Electrochemical Society Meeting. Pennington, NJ: Electrochemical Society, 2003.

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Angeles, CA) International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface (5th 2005 Los. The physics and chemistry of SiO₂ and the Si-SiO₂ interface--5. Pennington, NJ: Electrochemical Society, 2005.

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International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface (3rd 1996 Los Angeles, Calif.). The physics and chemistry of SiO₂ and the Si-SiO₂ interface-3, 1996: Proceedings of the Third International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface. Edited by Massoud Hisham Z, Poindexter Edward H, and Helms C. Robert. Pennington, NJ: Electrochemical Society, 1996.

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Book chapters on the topic "Silica films":

1

Gonçalves, M. Clara, and George S. Attard. "Nanostructured Mesoporous Silica Films." In Nanostructured Materials and Coatings for Biomedical and Sensor Applications, 159–68. Dordrecht: Springer Netherlands, 2003. http://dx.doi.org/10.1007/978-94-010-0157-1_16.

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Shaikhutdinov, Shamil. "Water Adsorption on Silica Films." In Introduction to Ultrathin Silica Films Silicatene and Others, 271–91. New York: Jenny Stanford Publishing, 2022. http://dx.doi.org/10.1201/9781003088622-8.

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Shaikhutdinov, Shamil. "Ultrathin Silica Films on Metals." In Introduction to Ultrathin Silica Films Silicatene and Others, 107–65. New York: Jenny Stanford Publishing, 2022. http://dx.doi.org/10.1201/9781003088622-4.

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Shaikhutdinov, Shamil. "Silica and Silicates." In Introduction to Ultrathin Silica Films Silicatene and Others, 1–30. New York: Jenny Stanford Publishing, 2022. http://dx.doi.org/10.1201/9781003088622-1.

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Alexander, John Callum. "TiO2 Thin Films on Fused Silica." In Springer Theses, 221–59. Cham: Springer International Publishing, 2016. http://dx.doi.org/10.1007/978-3-319-34229-0_7.

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Bersuker, Gennadi, Keith McKenna, and Alexander Shluger. "Silica and High-k Dielectric Thin Films in Microelectronics." In Oxide Ultrathin Films, 101–18. Weinheim, Germany: Wiley-VCH Verlag GmbH & Co. KGaA, 2012. http://dx.doi.org/10.1002/9783527640171.ch5.

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Holt, S. A., K. J. Edler, and C. Fernandez-Martin. "Formation of surfactant–silica mesophase films at a silica interface." In Surface and Colloid Science, 169–74. Berlin, Heidelberg: Springer Berlin Heidelberg, 2004. http://dx.doi.org/10.1007/b97126.

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Khabibullin, Amir, and Ilya Zharov. "Responsive Nanoporous Silica Colloidal Films and Membranes." In Intelligent Stimuli-Responsive Materials, 265–91. Hoboken, NJ, USA: John Wiley & Sons, Inc., 2013. http://dx.doi.org/10.1002/9781118680469.ch8.

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Shaikhutdinov, Shamil. "Defects in Ultrathin Silica Films on Metals." In Introduction to Ultrathin Silica Films Silicatene and Others, 167–90. New York: Jenny Stanford Publishing, 2022. http://dx.doi.org/10.1201/9781003088622-5.

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Shaikhutdinov, Shamil. "Thin Silica Films on Si and SIC." In Introduction to Ultrathin Silica Films Silicatene and Others, 69–106. New York: Jenny Stanford Publishing, 2022. http://dx.doi.org/10.1201/9781003088622-3.

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Conference papers on the topic "Silica films":

1

Hur, Soojung C., Laurent Pilon, Adam Christensen, and Samuel Graham. "Thermal Conductivity of Cubic Mesoporous Silica Thin Films." In ASME 2007 International Mechanical Engineering Congress and Exposition. ASMEDC, 2007. http://dx.doi.org/10.1115/imece2007-43016.

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This paper reports, for the first time, the cross-plane thermal conductivity of highly ordered cubic mesoporous silica thin films with porosity of 31% and thickness ranging between 200 and 500 nm. The mesoporous thin films are synthesized based on evaporation induced self-assembly process. The pores are spherical with average inter-pore spacing and pore diameter equal to 5.95 nm and 5 nm, respectively. The thermal conductivity is measured at room temperature using the 3ω method. The experimental setup and the associated analysis are validated by comparing the thermal conductivity measurements for the silicon substrate and for high quality thermal oxide thin films with data reported in the literature. The cross-plane thermal conductivity of the synthesized mesoporous silica thin films does not strongly depend on film thickness due to the reduction in phonon mean free path caused by the presence of nanopores. The average thermal conductivity is 0.61 ± 0.011 W/mK, which is 56% lower than that of bulk fused silica at room temperature.
2

Coquil, Thomas, Neal Hutchinson, Laurent Pilon, Erik Richman, and Sarah Tolbert. "Thermal Conductivity of Cubic and Hexagonal Mesoporous Silica Thin Films." In ASME 2009 Heat Transfer Summer Conference collocated with the InterPACK09 and 3rd Energy Sustainability Conferences. ASMEDC, 2009. http://dx.doi.org/10.1115/ht2009-88256.

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This paper reports the cross-plane thermal conductivity of highly ordered cubic and hexagonal templated mesoporous amorphous silica thin films synthesized by evaporation-induced self-assembly process. Cubic and hexagonal films featured spherical and cylindrical pores and average porosity of 25% and 45%, respectively. The pore diameter ranged from 3 to 18 nm and film thickness from 80 to 540 nm while the average wall thickness varied from 3 to 12 nm. The thermal conductivity was measured at room temperature using the 3ω method. The experimental setup and the associated analysis were validated by comparing the thermal conductivity measurements with data reported in the literature for the silicon substrate and for high quality thermal oxide thin films with thickness ranging from 100 to 500 nm. The cross-plane thermal conductivity of the synthesized mesoporous silica thin films does not show strong dependence on pore size, wall thickness, or film thickness. This is due to the fact that heat is mainly carried by very localized non propagating vibrational modes. The average thermal conductivity for the cubic mesoporous silica films was 0.30 ± 0.02 W/mK, while it was 0.20 ± 0.01 W/mK for the hexagonal films. This corresponds to a reduction of 79% and 86% from bulk fused silica at room temperature.
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Poulsen, Christian V., Mikael Svalgaard, and Ove Poulsen. "Photosensitivity in germania-doped silica films." In The European Conference on Lasers and Electro-Optics. Washington, D.C.: Optica Publishing Group, 1994. http://dx.doi.org/10.1364/cleo_europe.1994.cmm5.

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Abstract:
Integrated optics is believed to be the key technology for future integrated optical systems. One standard method for processing planar waveguides is a combination of plasma enhanced chemical vapor deposition (PECVD) for growing glass layers and photolithography/reactive ion etch (RIE) for creating the waveguides2 (Fig. la). We present an investigation of the photosensitivity of germania-doped silica films. The results may lead to an alternate method for creating the guiding structure in planar waveguides that requires much fewer process steps. Instead of using a combination of photolithography and RIE for defining the guiding core, the index change due to photosensitivity of germanium-doped silica may be utilized (Fig. 1b). To investigate the photosensitivity, germanium-doped silica films were grown on a 4" silicon wafer in a PECVD chamber. These films were fabricated at a temperature of 300°C, a base pressure of 700 mTorr, and gas flows of 17 seem silane, 1600 sccm nitrousdioxide and up to 8 sccm germane followed by annealing at 800°C in a nitrogen atmosphere for two hours.
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Kobavashi, Junva, Tohru Maruno, Yasuhiro Hida, Tohru Matsuura, and Shigekuni Sasaki. "Thermooptic switches using fluorinated polyimide waveguides." In Organic Thin Films for Photonic Applications. Washington, D.C.: Optica Publishing Group, 1997. http://dx.doi.org/10.1364/otfa.1997.fa.4.

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Thermooptic (TO) switches using polymer optical waveguides have attracted much attention because the TO effect of polymers is ten times that of silica. Therefore, using polymers instead of silica [1-2] significantly reduces the required switching power. Moreover, fabricating polymer optical waveguides is easier than fabricating silica-based ones, so large optical devices can be made more easily.
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Melninkaitis, Andrius, Algirdas Selskis, Rytis Buzelis, Lina Mažule, Tomas Tolenis, Lina Grineviciute, and Ramutis Drazdys. "New generation all-silica based optical elements for high power laser systems." In Nanostructured Thin Films X, edited by Tom G. Mackay, Akhlesh Lakhtakia, and Yi-Jun Jen. SPIE, 2017. http://dx.doi.org/10.1117/12.2272952.

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Grineviciute, Lina, Lukas Ramalis, Rytis Buzelis, and Tomas Tolenis. "Highly resistant all-silica polarizers for normal incidence applications." In Advances in Optical Thin Films VII, edited by Michel Lequime and Detlev Ristau. SPIE, 2021. http://dx.doi.org/10.1117/12.2597136.

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Kao, Chih-cheng, B. Gallas, and J. Rivory. "Study of Erbium Doped Silica Films Containing Silicon Nanograins." In 2007 IEEE Conference on Electron Devices and Solid-State Circuits. IEEE, 2007. http://dx.doi.org/10.1109/edssc.2007.4450187.

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Fardad, M. A., Eric M. Yeatman, and Emma J. Dawnay. "Porous films for nonlinear silica-on-silicon integrated optics." In SPIE's 1994 International Symposium on Optics, Imaging, and Instrumentation, edited by John D. Mackenzie. SPIE, 1994. http://dx.doi.org/10.1117/12.188938.

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Swab, P., and R. E. Klinger. "Physical microstructure of evaporated titania-silica and zirconia-silica multilayer thin films." In OSA Annual Meeting. Washington, D.C.: Optica Publishing Group, 1985. http://dx.doi.org/10.1364/oam.1985.thv1.

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Thin cross sections of titania-silica and zirconia-silica quarterwave stacks were prepared by ultramicrotomy and examined by transmission electron microscopy. Ultramicrotomy is a standard biological sample preparation technique originally developed for thin sectioning of soft tissue. In the present study, the thin films were deposited by reactive electron beam evaporation onto glass substrates at elevated temperatures. Electron-transparent cross-sectional slices were cut from these stacks and subsequently examined by transmission electron microscopy. The glassy structure of silica, the inhomogeneous crystalline morphology of zirconia, the noncrystalline anisotropy of titania, and the relationship between columnar growth and surface roughness with lateral dimensions of 3–10 nm were clearly observed. The improved resolution offered by ultramicrotomy also revealed the presence of a 2-nm thick nucleation layer in titania and a surface-smoothing effect by the silica. Thin-film microstructure analysis by ultramicrotomy offers several advantages over conventional shadow replication techniques. It provides direct imaging of the thin films in cross section, accurate thickness information, resolution not limited by a shadowing material, and image contrast which is largely independent of the specimen’s fracture mechanics. Equally important, microtomed thin sections allow direct chemical and crystalline structure analysis.
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Ramalis, Lukas, Ugnė Norkutė, Rytis Buzelis, Algirdas Selskis, and Tomas Tolenis. "Sculptured thin film based all-silica mirrors for high power lasers." In Advances in Optical Thin Films VII, edited by Michel Lequime and Detlev Ristau. SPIE, 2021. http://dx.doi.org/10.1117/12.2597151.

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Reports on the topic "Silica films":

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Smith, W. L., T. A. Michalske, and R. R. Rye. The deposition of boron nitride and carbon films on silica glass fibers. Office of Scientific and Technical Information (OSTI), November 1993. http://dx.doi.org/10.2172/10110580.

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Kalnitsky, A., S. P. Tay, J. P. Ellul, J. W. Andrews, E. A. Irene, and S. Chongsawagvirod. Measurements and Modelling of Thin Silicon Dioxide Films on Silicon. Fort Belvoir, VA: Defense Technical Information Center, May 1989. http://dx.doi.org/10.21236/ada207853.

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Mecholsky, Jr, Tsai J. J., Drawl Y. L., and W. R. Fracture Studies of Diamond Films on Silicon. Fort Belvoir, VA: Defense Technical Information Center, August 1991. http://dx.doi.org/10.21236/ada240978.

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Martin U. Pralle and James E. Carey. Black Silicon Enhanced Thin Film Silicon Photovoltaic Devices. Office of Scientific and Technical Information (OSTI), July 2010. http://dx.doi.org/10.2172/984305.

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Irene, Eugene A. Silicon Oxidation Studies on Thin Film Silicon Oxidation Formation. Fort Belvoir, VA: Defense Technical Information Center, March 1989. http://dx.doi.org/10.21236/ada206835.

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Berman, G. P., G. D. Doolen, R. Mainieri, D. K. Campbell, and V. A. Luchnikov. Molecular dynamics simulations of grain boundaries in thin nanocrystalline silicon films. Office of Scientific and Technical Information (OSTI), October 1997. http://dx.doi.org/10.2172/292865.

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Gallagher, A., D. Doughty, and J. Doyle. Diagnostics of glow discharges used to produce hydrogenated amorphous silicon films. Office of Scientific and Technical Information (OSTI), May 1990. http://dx.doi.org/10.2172/6910198.

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Keyes, Brian. National solar technology roadmap: Film-silicon PV. Office of Scientific and Technical Information (OSTI), June 2007. http://dx.doi.org/10.2172/1217298.

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Benziger, Jay B. Surface Intermediates in Thin Film Deposition on Silicon. Fort Belvoir, VA: Defense Technical Information Center, August 1989. http://dx.doi.org/10.21236/ada216662.

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Hall, R. B., C. Bacon, V. DiReda, D. H. Ford, A. E. Ingram, S. M. Lampo, J. A. Rand, T. R. Ruffins, and A. M. Barnett. Silicon-film{trademark} on ceramic solar cells. Final report. Office of Scientific and Technical Information (OSTI), February 1993. http://dx.doi.org/10.2172/10135001.

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