Journal articles on the topic 'RF Plasma CVD'
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Hay, Stephen O., Ward C. Roman, and Meredith B. Colket. "CVD diamond deposition processes investigation: CARS diagnostics/modeling." Journal of Materials Research 5, no. 11 (November 1990): 2387–97. http://dx.doi.org/10.1557/jmr.1990.2387.
Full textYAMAMOTO, Masaoki, Masayuki FUKUI, and Takayuki SHIBATA. "Properties of carbonous films synthesized by RF plasma CVD." Journal of the Japan Society for Precision Engineering 55, no. 12 (1989): 2222–27. http://dx.doi.org/10.2493/jjspe.55.2222.
Full textMannan, Md Abdul, Masamitsu Nagano, Norie Hirao, and Yuji Baba. "Hexagonal BCN Films Prepared by RF Plasma-enhanced CVD." Chemistry Letters 37, no. 1 (January 5, 2008): 96–97. http://dx.doi.org/10.1246/cl.2008.96.
Full textTSAKADZE, E., K. OSTRIKOV, Z. TSAKADZE, N. JIANG, R. AHMAD, and S. XU. "CONTROL AND DIAGNOSTICS OF INDUCTIVELY COUPLED PLASMAS FOR CHEMICAL VAPOUR DEPOSITION ON NANOCOMPOSITE CARBON NITRIDE-BASED FILMS." International Journal of Modern Physics B 16, no. 06n07 (March 20, 2002): 1143–47. http://dx.doi.org/10.1142/s0217979202011019.
Full textInao, Takuro, Masahiko Kumadaki, Kohki Satoh, Masaki Yoshino, and Hidenori Itoh. "Deposition of Boron Nitride Films using RF Plasma CVD Method." IEEJ Transactions on Fundamentals and Materials 134, no. 6 (2014): 397–401. http://dx.doi.org/10.1541/ieejfms.134.397.
Full textKashem, Abul, Masaki Matsushita, and Shinzo Morita. "RF Plasma CVD of C-S Compound under Hydrogen Dilution." Journal of Photopolymer Science and Technology 13, no. 1 (2000): 47–49. http://dx.doi.org/10.2494/photopolymer.13.47.
Full textJie, Jiang, and Liu Chenzan. "Diamond-like carbon thin films prepared by rf-plasma CVD." Vacuum 42, no. 16 (1991): 1058. http://dx.doi.org/10.1016/0042-207x(91)91327-k.
Full textMITSUI, Akira, and Akio KATO. "Preparation of SiC Powders by CVD Method Using RF-Plasma." Journal of the Ceramic Association, Japan 94, no. 1089 (1986): 517–20. http://dx.doi.org/10.2109/jcersj1950.94.1089_517.
Full textMitomo, Tohru, Tomohiro Ohta, Hiroaki Sasaki, Kenichi Ohtsuka, and Yasuhiro Habu. "Deposition of amorphous-carbon films by RF plasma CVD method." KAGAKU KOGAKU RONBUNSHU 17, no. 2 (1991): 305–12. http://dx.doi.org/10.1252/kakoronbunshu.17.305.
Full textMitsui, Akira, and Akio Kato. "Preparation of SiC powders by CVD method using RF-plasma." International Journal of High Technology Ceramics 3, no. 1 (January 1987): 85. http://dx.doi.org/10.1016/0267-3762(87)90071-3.
Full textKim, Y. T., B. Hong, G. E. Jang, S. J. Suh, and D. H. Yoon. "Characterization of a-SiC:H Films Deposited by RF Plasma CVD." Crystal Research and Technology 37, no. 2-3 (February 2002): 219–24. http://dx.doi.org/10.1002/1521-4079(200202)37:2/3<219::aid-crat219>3.0.co;2-9.
Full textSuzuki, Keigo, and Kazunori Kijima. "Phase transformation of BaTiO3 nanoparticles synthesized by RF-plasma CVD." Journal of Alloys and Compounds 419, no. 1-2 (August 2006): 234–42. http://dx.doi.org/10.1016/j.jallcom.2005.08.075.
Full textJonas, Stanisława, Karol Kyzioł, Jerzy Lis, and Katarzyna Tkacz-Śmiech. "Stability of a-C:N:H Layers Deposited by RF Plasma Enhanced CVD." Solid State Phenomena 147-149 (January 2009): 738–43. http://dx.doi.org/10.4028/www.scientific.net/ssp.147-149.738.
Full textOng, Si Ci, Usman Ilyas, and Rajdeep Singh Rawat. "Nanofabrication using home-made RF plasma coupled chemical vapour deposition system." International Journal of Modern Physics: Conference Series 32 (January 2014): 1460342. http://dx.doi.org/10.1142/s2010194514603421.
Full textTsai, C., J. Nelson, W. W. Gerberich, J. Heberlein, and E. Pfender. "Metal reinforced thermal plasma diamond coatings." Journal of Materials Research 7, no. 8 (August 1992): 1967–69. http://dx.doi.org/10.1557/jmr.1992.1967.
Full textKURAMASU, Keizaburo, Tetsuhiro KORECHIKA, Masatoshi KITAGAWA, and Takashi HIRAO. "Mechanical Properties of SiOxNy Films Deposited by RF Plasma-Enhanced CVD." Journal of the Ceramic Society of Japan 105, no. 1218 (1997): 161–65. http://dx.doi.org/10.2109/jcersj.105.161.
Full textBerghaus, J. O., J. L. Meunier, and F. Gitzhofer. "Direct current bias effects in RF induction thermal plasma diamond CVD." IEEE Transactions on Plasma Science 30, no. 1 (February 2002): 442–49. http://dx.doi.org/10.1109/tps.2002.1003894.
Full textKim, Dong-Sun, and Tae-Won Kang. "Deposition of Amorphous Carbon Thin Films by Pulsed RF Plasma CVD." JOURNAL OF CHEMICAL ENGINEERING OF JAPAN 38, no. 8 (2005): 593–99. http://dx.doi.org/10.1252/jcej.38.593.
Full textKejun, Liao, and Wang Wanlu. "Cubic Boron Nitride Films Formed by Thermally Assisted rf Plasma CVD." Chinese Physics Letters 12, no. 1 (January 1995): 58–60. http://dx.doi.org/10.1088/0256-307x/12/1/016.
Full textSachdev, H., and P. Scheid. "Formation of silicon carbide and silicon carbonitride by RF-plasma CVD." Diamond and Related Materials 10, no. 3-7 (March 2001): 1160–64. http://dx.doi.org/10.1016/s0925-9635(00)00575-6.
Full textBaldwin, S. K., T. G. Owano, and C. H. Kruger. "Growth rate studies of CVD diamond in an RF plasma torch." Plasma Chemistry and Plasma Processing 14, no. 4 (December 1994): 383–406. http://dx.doi.org/10.1007/bf01570203.
Full textItoh, Naomi, Kiyotaka Kato, and Isamu Kato. "Fabrication of sin thin films by rf biased microwave plasma CVD." Electronics and Communications in Japan (Part II: Electronics) 74, no. 7 (1991): 101–6. http://dx.doi.org/10.1002/ecjb.4420740711.
Full textShimizu, Hideki, Setsuo Nakao, Hiroshi Kusakabe, and Mikio Noda. "Microstructures of hydrogenated amorphous carbon films prepared by rf plasma CVD." Journal of Non-Crystalline Solids 114 (December 1989): 196–98. http://dx.doi.org/10.1016/0022-3093(89)90111-7.
Full textTakenaka, Kosuke, Yusuke Okumura, and Yuichi Setsuhara. "Characterization of inductively coupled RF plasmas for plasma-assisted mist CVD of ZnO films." Journal of Physics: Conference Series 379 (August 7, 2012): 012031. http://dx.doi.org/10.1088/1742-6596/379/1/012031.
Full textSaha, Sucharita, and Debajyoti Das. "Diamond-Like Carbon Thin Films from Low-Pressure and High-Density CH4 Plasma." IOP Conference Series: Materials Science and Engineering 1221, no. 1 (March 1, 2022): 012037. http://dx.doi.org/10.1088/1757-899x/1221/1/012037.
Full textFantoni, R., M. Giorgi, A. G. G. Moliterni, W. C. M. Berden, V. Lazic, O. Martini, and F. Polla Mattiot. "On-line gas-phase optical diagnostics in plasma CVD deposition of carbon films." Journal of Materials Research 7, no. 5 (May 1992): 1204–14. http://dx.doi.org/10.1557/jmr.1992.1204.
Full textCho, Chung-Woo, Byungyou Hong, and Young-Ze Lee. "Wear life evaluation of diamond-like carbon films deposited by microwave plasma-enhanced CVD and RF plasma-enhanced CVD method." Wear 259, no. 1-6 (July 2005): 789–94. http://dx.doi.org/10.1016/j.wear.2005.02.007.
Full textJeong, Chaehwan, Seongjae Boo, Minsung Jeon, and Koichi Kamisako. "Characterization of Intrinsic a-Si:H Films Prepared by Inductively Coupled Plasma Chemical Vapor Deposition for Solar Cell Applications." Journal of Nanoscience and Nanotechnology 7, no. 11 (November 1, 2007): 4169–73. http://dx.doi.org/10.1166/jnn.2007.064.
Full textFouad, Osama A., Nizam Uddin, Masaaki Yamazato, and Masamitsu Nagano. "RF-plasma enhanced CVD of TiSi2 thin films: effects of TiCl4 flow rate and RF power." Journal of Crystal Growth 257, no. 1-2 (September 2003): 153–60. http://dx.doi.org/10.1016/s0022-0248(03)01419-2.
Full textPrzetakiewicz, Karol, Katarzyna Tkacz-Śmiech, Piotr Boszkowicz, and Stanisława Jonas. "Polymer-Surface Modification with a-C:N:H Layers Plasma Chemically Deposited in RF CVD and MW CVD Systems." Solid State Phenomena 165 (June 2010): 159–64. http://dx.doi.org/10.4028/www.scientific.net/ssp.165.159.
Full textPark, Yonggyun, Pengzhan Liu, Seunghwan Lee, Jinill Cho, Eric Joo, Hyeong-U. Kim, and Taesung Kim. "Diagnosing Time-Varying Harmonics in Low-k Oxide Thin Film (SiOF) Deposition by Using HDP CVD." Sensors 23, no. 12 (June 14, 2023): 5563. http://dx.doi.org/10.3390/s23125563.
Full textSleptsova, Anastasia A., Sergey V. Chernykh, Dmitry A. Podgorny, and Ilya A. Zhilnikov. "Optimization of passivation in AlGaN/GaN heterostructure microwave transistor fabrication by ICP CVD." Modern Electronic Materials 6, no. 2 (July 15, 2020): 71–75. http://dx.doi.org/10.3897/j.moem.6.2.58860.
Full textSaitoh, Hidetoshi, Yoshihiko Hirotsu, and Yukio Ichinose. "Conditions for Formation of BN Film by Thermally Assisted RF Plasma CVD." Journal of the Japan Institute of Metals 54, no. 2 (1990): 186–92. http://dx.doi.org/10.2320/jinstmet1952.54.2_186.
Full textISHIGURO, Takashi, Hidetoshi SAITOH, and Yukio ICHINOSE. "Synthesis of cubic boron nitride film by an RF plasma CVD method." Journal of the Japan Society for Precision Engineering 53, no. 10 (1987): 1527–31. http://dx.doi.org/10.2493/jjspe.53.1527.
Full textKumadaki, Masahiko, Masaki Yoshino, Kohki Sato, and Hidenori Itoh. "Low-temperature Deposition of SiCN Thin Films by RF Plasma CVD Method." IEEJ Transactions on Fundamentals and Materials 134, no. 10 (2014): 538–44. http://dx.doi.org/10.1541/ieejfms.134.538.
Full textNAKAYAMA, Masatoshi, Kunihiro UEDA, Masanori SHIBAHARA, Kazunori MARUYAMA, and Kiichiro KAMATA. "Bias Effect on the Formation of Carbon Films by RF-Plasma CVD." Journal of the Ceramic Society of Japan 98, no. 1138 (1990): 597–600. http://dx.doi.org/10.2109/jcersj.98.597.
Full textOkuyama, Hideo, Kazuhiro Honnma, and Satoru Ohno. "Synthesis of Composite Metal Particles Modified UFP Using the RF-plasma CVD." Journal of the Japan Society of Powder and Powder Metallurgy 47, no. 9 (2000): 993–98. http://dx.doi.org/10.2497/jjspm.47.993.
Full textKim, Je-Deok, Hiroyuki Sugimura, and Osamu Takai. "Water-repellency of a-C:H films deposited by rf plasma-enhanced CVD." Vacuum 66, no. 3-4 (August 2002): 379–83. http://dx.doi.org/10.1016/s0042-207x(02)00158-6.
Full textGarci´a, A., V. Bellido, N. Flan˜o, and J. I. On˜ate. "Submicron characterization of B-C:H thin films produced by RF plasma CVD." Diamond and Related Materials 1, no. 2-4 (March 1992): 350–54. http://dx.doi.org/10.1016/0925-9635(92)90056-t.
Full textDehning, C., A. Holländer, A.-M. Leventi-Peetz, and K. Silmy. "Simulation of a Plasma Enhanced µ-jet-CVD Process." NAFEMS International Journal of CFD Case Studies 5 (April 2006): 51–56. http://dx.doi.org/10.59972/8ptzprew.
Full textGaisin, I. R., R. M. Valeeva, and N. I. Maksimov. "Cardiorenal continuum in hypertensive pregnancy." "Arterial’naya Gipertenziya" ("Arterial Hypertension") 15, no. 5 (October 28, 2009): 590–97. http://dx.doi.org/10.18705/1607-419x-2009-15-5-590-597.
Full textZarchi, Meysam, and Shahrokh Ahangarani. "A Comparison between Thin-Film Transistors Deposited by Hot-Wire Chemical Vapor Deposition and PECVD." Metallurgical and Materials Engineering 21, no. 1 (March 31, 2015): 7–14. http://dx.doi.org/10.30544/128.
Full textYasuoka, Yuki, Toru Harigai, Jun-Seok Oh, Hiroshi Furuta, Akimitsu Hatta, Tsuneo Suzuki, and Hidetoshi Saitoh. "Diamond-like carbon films from CO source gas by RF plasma CVD method." Japanese Journal of Applied Physics 54, no. 1S (November 10, 2014): 01AD04. http://dx.doi.org/10.7567/jjap.54.01ad04.
Full textShimada, Y., K. Kobayashi, N. Mutsukura, and Y. Machi. "Synthesis of diamond on substrate with mechanical treatment by RF plasma CVD method." Plasma Sources Science and Technology 2, no. 1 (February 1, 1993): 18–22. http://dx.doi.org/10.1088/0963-0252/2/1/005.
Full textMaemura, Yoko, Hiroshi Fujiyama, Tomoko Takagi, Ryo Hayashi, Wataru Futako, Michio Kondo, and Akihisa Matsuda. "Particle formation and a-Si:H film deposition in narrow-gap RF plasma CVD." Thin Solid Films 345, no. 1 (May 1999): 80–84. http://dx.doi.org/10.1016/s0040-6090(99)00100-5.
Full textDeb, B., B. Bhattacharjee, A. Ganguli, S. Chaudhuri, and A. K. Pal. "Boron nitride films synthesized by RF plasma CVD of borane–ammonia and nitrogen." Materials Chemistry and Physics 76, no. 2 (August 2002): 130–36. http://dx.doi.org/10.1016/s0254-0584(01)00524-7.
Full textNanbu, Toshikazu, Mikio Takemoto, and Toshitsugu Fukai. "Corrosion Resistance of TiN Coating Deposited on Quartz by RF Plasma-Assisted CVD." Zairyo-to-Kankyo 41, no. 11 (1992): 734–40. http://dx.doi.org/10.3323/jcorr1991.41.734.
Full textMATSUI, ISAO. "CVD Material Processing. Effect of O2 on Formation of Ar-O2 RF Plasma." KAGAKU KOGAKU RONBUNSHU 26, no. 6 (2000): 792–97. http://dx.doi.org/10.1252/kakoronbunshu.26.792.
Full textHozumi, Atsushi, Hiroki Sekoguchi, Nobuhisa Sugimoto, and Osamu Takai. "Transparent Water-repellent Films Containing Fluoro-alkyl Functions by RF Plasma-enhanced CVD." Transactions of the IMF 76, no. 2 (January 1998): 51–53. http://dx.doi.org/10.1080/00202967.1998.11871194.
Full textTóth, A., M. Mohai, T. Ujvári, and I. Bertóti. "Surface and nanomechanical properties of Si:C:H films prepared by RF plasma beam CVD." Diamond and Related Materials 14, no. 3-7 (March 2005): 954–58. http://dx.doi.org/10.1016/j.diamond.2005.01.017.
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