Journal articles on the topic 'Resist film removal'
Create a spot-on reference in APA, MLA, Chicago, Harvard, and other styles
Consult the top 48 journal articles for your research on the topic 'Resist film removal.'
Next to every source in the list of references, there is an 'Add to bibliography' button. Press on it, and we will generate automatically the bibliographic reference to the chosen work in the citation style you need: APA, MLA, Harvard, Chicago, Vancouver, etc.
You can also download the full text of the academic publication as pdf and read online its abstract whenever available in the metadata.
Browse journal articles on a wide variety of disciplines and organise your bibliography correctly.
Mercadier, Thomas, Philippe Garnier, Virginie Loup, Raluca Tiron, Song Zhang, Ayumi Higuchi, and Naser Belmiloud. "Evaluation and Optimization of Particle Removal with a Resist Peeling Method." Solid State Phenomena 346 (August 14, 2023): 268–74. http://dx.doi.org/10.4028/p-art4vs.
Full textSobhian, Mani. "The Role of Extreme Agitation in Accelerating the Removal Rate of Advanced Packaging Photoresists." Additional Conferences (Device Packaging, HiTEC, HiTEN, and CICMT) 2013, DPC (January 1, 2013): 001389–416. http://dx.doi.org/10.4071/2013dpc-wp15.
Full textHollenbeck, J. L., and R. C. Buchanan. "Oxide thin films for nanometer scale electron beam lithography." Journal of Materials Research 5, no. 5 (May 1990): 1058–72. http://dx.doi.org/10.1557/jmr.1990.1058.
Full textLee, Jong Han, Sang Won Shin, Young Suk Kwon, In Hoon Choi, Chung Nam Whang, Tae Gon Kim, and Jong Han Song. "Magnetic Patterning of the Ni/Cu Thin Film by 40 keV O Ion Irradiation." Solid State Phenomena 124-126 (June 2007): 867–70. http://dx.doi.org/10.4028/www.scientific.net/ssp.124-126.867.
Full textJimbo, Sadayuki, Kouji Shimomura, Tokuhisa Ohiwa, Makoto Sekine, Haruki Mori, Keiji Horioka, and Haruo Okano. "Resist and Sidewall Film Removal after Al Reactive Ion Etching (RIE) Employing F+H2O Downstream Ashing." Japanese Journal of Applied Physics 32, Part 1, No. 6B (June 30, 1993): 3045–50. http://dx.doi.org/10.1143/jjap.32.3045.
Full textMikalsen Martinussen, Simen, Raimond N. Frentrop, Meindert Dijkstra, and Sonia Maria Garcia-Blanco. "Redeposition-Free Deep Etching in Small KY(WO4)2 Samples." Micromachines 11, no. 12 (November 24, 2020): 1033. http://dx.doi.org/10.3390/mi11121033.
Full textTomita, Hiroshi, Minako Inukai, Kaori Umezawa, and Li Nan Ji. "Direct Observation of Single Bubble Cavitation Damage for MHz Cleaning." Solid State Phenomena 145-146 (January 2009): 3–6. http://dx.doi.org/10.4028/www.scientific.net/ssp.145-146.3.
Full textMuangtong, Piyanut, Righdan Mohsen Namus, and Russell Goodall. "Improved Tribocorrosion Resistance by Addition of Sn to CrFeCoNi High Entropy Alloy." Metals 11, no. 1 (December 24, 2020): 13. http://dx.doi.org/10.3390/met11010013.
Full textFarahani, Emad, Andre C. Liberati, Amirhossein Mahdavi, Pantcho Stoyanov, Christian Moreau, and Ali Dolatabadi. "Ice Adhesion Evaluation of PTFE Solid Lubricant Film Applied on TiO2 Coatings." Coatings 13, no. 6 (June 6, 2023): 1049. http://dx.doi.org/10.3390/coatings13061049.
Full textLimcharoen, Alonggot, Pichet Limsuwan, Chupong Pakpum, and Krisda Siangchaew. "Characterisation of C–F Polymer Film Formation on the Air-Bearing Surface Etched Sidewall of Fluorine-Based Plasma Interacting with AL2O3–TiC Substrate." Journal of Nanomaterials 2013 (2013): 1–6. http://dx.doi.org/10.1155/2013/851489.
Full textPfeiffer, P., X. D. Zhang, D. Stümmler, S. Sanders, M. Weingarten, M. Heuken, A. Vescan, and H. Kalisch. "Backside Contacting for Uniform Luminance in Large-Area OLED." MRS Advances 2, no. 42 (2017): 2275–80. http://dx.doi.org/10.1557/adv.2017.175.
Full textSawada, Yasushi, Keiichi Yamazaki, Noriyuki Taguchi, and Tetsuji Shibata. "Pretreatment of Blind Via Holes before Ni/Au and Cu Plating Applied with Atmospheric Pressure Plasma Jet." Journal of Microelectronics and Electronic Packaging 2, no. 3 (July 1, 2005): 189–96. http://dx.doi.org/10.4071/1551-4897-2.3.189.
Full textAhner, Nicole, Sven Zimmermann, Matthias Schaller, and Stefan E. Schulz. "Determination of Surface Energy Characteristics of Plasma Processed Ultra Low-K Dielectrics for Optimized Wetting in Wet Chemical Plasma Etch Residue Removal." Solid State Phenomena 195 (December 2012): 110–13. http://dx.doi.org/10.4028/www.scientific.net/ssp.195.110.
Full textEs-Souni, Mona, Martha Es-Souni, Hamzah Bakhti, Aydin Gülses, Helge Fischer-Brandies, Yahya Açil, Jörg Wiltfang, and Christian Flörke. "A Bacteria and Cell Repellent Zwitterionic Polymer Coating on Titanium Base Substrates towards Smart Implant Devices." Polymers 13, no. 15 (July 27, 2021): 2472. http://dx.doi.org/10.3390/polym13152472.
Full textMoore, John, Jared Pettit, Alex Brewer, and Alman Law. "Temporary Bonding of Wafers, Displays, and Components." Additional Conferences (Device Packaging, HiTEC, HiTEN, and CICMT) 2015, DPC (January 1, 2015): 1–68. http://dx.doi.org/10.4071/2015dpc-tp13.
Full textHoribe, H., M. Yamamoto, T. Maruoka, Y. Goto, A. Kono, I. Nishiyama, and S. Tagawa. "Ion-implanted resist removal using atomic hydrogen." Thin Solid Films 519, no. 14 (May 2011): 4578–81. http://dx.doi.org/10.1016/j.tsf.2011.01.287.
Full textChavez, K. L., and D. W. Hess. "Removal of Resist Materials Using Acetic Acid." Journal of The Electrochemical Society 150, no. 4 (2003): G284. http://dx.doi.org/10.1149/1.1557085.
Full textHoribe, Hideo, Masayuki Fujita, and Akira Yoshikado. "Acrylic-Type Resist Removal Using 532 nm Laser Pulses." Journal of The Electrochemical Society 153, no. 7 (2006): G609. http://dx.doi.org/10.1149/1.2197767.
Full textGupta, Atul, Eric Snyder, Christiane Gottschalke, Kevin Wenzel, James Gunn, Hao Lu, Yuya Suzuki, Venky Sundaram, and Rao Tummala. "First Demonstration of Fine Line RDL Yield Enhancement using an Innovative Ozone Treatment Process for Panel Fan-out and Interposers." Additional Conferences (Device Packaging, HiTEC, HiTEN, and CICMT) 2017, DPC (January 1, 2017): 1–19. http://dx.doi.org/10.4071/2017dpc-tp1_presentation2.
Full textHollenbeck, J. L., and R. C. Buchanan. "Nanometer-scale structures produced in oxide films." Proceedings, annual meeting, Electron Microscopy Society of America 45 (August 1987): 396–97. http://dx.doi.org/10.1017/s0424820100126779.
Full textHossain, Sylvia D., and Michael F. Pas. "Heated SC1 Solution for Selective Etching and Resist Particulate Removal." Journal of The Electrochemical Society 140, no. 12 (December 1, 1993): 3604–6. http://dx.doi.org/10.1149/1.2221133.
Full textPavlova, T. V., V. M. Shevlyuga, B. V. Andryushechkin, G. M. Zhidomirov, and K. N. Eltsov. "Local removal of silicon layers on Si(1 0 0)-2 × 1 with chlorine-resist STM lithography." Applied Surface Science 509 (April 2020): 145235. http://dx.doi.org/10.1016/j.apsusc.2019.145235.
Full textNoda, Seiji, Kazumasa Kawase, Hideo Horibe, Masaki Kuzumoto, and Tatsuo Kataoka. "Development of a Method for Resist Removal by Ozone with Acetic Acid Vapor." Journal of The Electrochemical Society 152, no. 1 (2005): G73. http://dx.doi.org/10.1149/1.1833311.
Full textFurusawa, Takeshi, Noriyuki Sakuma, Daisuke Ryuzaki, Seiichi Kondo, Ken-ichi Takeda, Shuntaro Machida, Ryo Yoneyama, and Kenji Hinode. "Direct Resist Removal Process from Copper-Exposed Vias for Low-Parasitic-Capacitance Interconnects." Journal of The Electrochemical Society 148, no. 4 (2001): G190. http://dx.doi.org/10.1149/1.1353580.
Full textChen, Y., D. S. Macintyre, and S. Thoms. "A non-destructive method for the removal of residual resist in imprinted patterns." Microelectronic Engineering 67-68 (June 2003): 245–51. http://dx.doi.org/10.1016/s0167-9317(03)00184-9.
Full textKono, Akihiko, Yu Arai, Takeshi Maruoka, Masashi Yamamoto, Yousuke Goto, Seiji Takahashi, Takashi Nishiyama, and Hideo Horibe. "High removal rate of cross-linked SU-8 resist using hydrogen radicals generated by tungsten hot-wire catalyzer." Thin Solid Films 562 (July 2014): 632–37. http://dx.doi.org/10.1016/j.tsf.2014.04.062.
Full textLu, Ming, and Shaozhang Niu. "A Detection Approach Using LSTM-CNN for Object Removal Caused by Exemplar-Based Image Inpainting." Electronics 9, no. 5 (May 22, 2020): 858. http://dx.doi.org/10.3390/electronics9050858.
Full textLi, X., H. Zhou, J. Abrokwah, P. Zurcher, K. Rajagopalan, W. Liu, R. Gregory, M. Passlack, and I. G. Thayne. "Low damage ashing and etching processes for ion implanted resist and Si3N4 removal by ICP and RIE methods." Microelectronic Engineering 85, no. 5-6 (May 2008): 966–68. http://dx.doi.org/10.1016/j.mee.2007.12.056.
Full textKalai, Amina, Fadila Malek, and Leila Bousmaha-Marroki. "Effect of Thymus ciliatus oil-based disinfectant solutions against bio-films formed by Bacillus cereus strains isolated from pasteurized-milk processing lines in Algeria." South Asian Journal of Experimental Biology 8, no. 1 (October 29, 2018): 01–12. http://dx.doi.org/10.38150/sajeb.8(1).p01-12.
Full textP. Yu. Glagolev, G. D. Demin, N. A. Djuzhev, M. A. Makhiboroda, and N. A. Filippo. "Study of the dynamics of heating anode units in a maskless nanolithograph based on an array of microfocus X-ray tubes." Technical Physics 92, no. 13 (2022): 2125. http://dx.doi.org/10.21883/tp.2022.13.52233.132-21.
Full textSun, Yong, and Richard Bailey. "Tribocorrosion Behavior of γ′-Fe4N Nitride Layer Formed on Mild Steel by Plasma Nitriding in Chloride-Containing Solution." Lubricants 11, no. 7 (June 29, 2023): 281. http://dx.doi.org/10.3390/lubricants11070281.
Full textChang, Shih-Chia, and Jeffrey M. Kempisty. "Lift-off Methods for MEMS Devices." MRS Proceedings 729 (2002). http://dx.doi.org/10.1557/proc-729-u2.3.
Full textMatsubara, Y., K. Endo, T. Tatsumi, and T. Horiuchi. "Adhesion of a-C:F during oxygen plasma annealing." MRS Proceedings 476 (1997). http://dx.doi.org/10.1557/proc-476-19.
Full textPremnath, Vijay Anirudh, and Chih-Hao Chang. "Investigation of polymer template removal techniques in three-dimensional thin-shell nanolattices." Journal of Vacuum Science & Technology B 41, no. 6 (October 17, 2023). http://dx.doi.org/10.1116/6.0003036.
Full textBoumerzoug, Mohamed, Han Xu, Richard Bersin, Peter Mascher, and Ginutis Balcaitis. "Removal of Titanium Oxide Grown on Titanium Nitride and Reduction of VIA Contact Resistance using a Modern Plasma Asher." MRS Proceedings 495 (1997). http://dx.doi.org/10.1557/proc-495-345.
Full textAdelung, Rainer, Mady Elbahri, Shiva Kumar Rudra, Abhijit Biswas, Seid Jebril, Rainer Kunz, Sebastian Wille, and Michael Scharnberg. "Employing Thin Film Failure Mechanisms to Form Templates for Nano-electronics." MRS Proceedings 863 (2005). http://dx.doi.org/10.1557/proc-863-b7.3/o11.3.
Full textGuo, Hanwen, Xiaoying Chu, Yishun Guo, Jianhua Yang, Yingying Jin, Liyang Zhou, Yaou Peng, Qingying Wang, Fan Lu, and Bailiang Wang. "A water transfer printing method for contact lenses surface 2D MXene modification to resist bacterial infection and inflammation." Science Advances 10, no. 15 (April 12, 2024). http://dx.doi.org/10.1126/sciadv.adl3262.
Full textSandstrom, Clifford, and Tim Olson. "Mask-less Laser Direct Imaging & Adaptive Patterning for Fan-Out Heterogeneous Integration." IMAPSource Proceedings 2022, DPC (November 14, 2023). http://dx.doi.org/10.4071/001c.90153.
Full textBorini, Stefano, Andrea M. Rossi, Luca Boarino, and Giampiero Amato. "Etching Silicon Through an Effective Nanomask: An Electrochemical Way to Nanomachining." MRS Proceedings 872 (2005). http://dx.doi.org/10.1557/proc-872-j13.9.
Full textHockett, R. S., M. H. Herman, X. C. Mu, and Li-Jia Ma. "Investigations of Residual Chlorine on Etched AlCu Metal Lines by Total Reflection X-Ray Fluorescence (TXRF)." MRS Proceedings 225 (1991). http://dx.doi.org/10.1557/proc-225-329.
Full textTian, Xiaoli, Fu Li, Zhenyuan Tang, Song Wang, Kangkang Weng, Dan Liu, Shaoyong Lu, et al. "Crosslinking-induced patterning of MOFs by direct photo- and electron-beam lithography." Nature Communications 15, no. 1 (April 4, 2024). http://dx.doi.org/10.1038/s41467-024-47293-6.
Full textHanevelt, Julia, Jelle F. Huisman, Laura W. Leicher, Miangela M. Lacle, Milan C. Richir, Paul Didden, Joost M. J. Geesing, et al. "Limited wedge resection for T1 colon cancer (LIMERIC-II trial) – rationale and study protocol of a prospective multicenter clinical trial." BMC Gastroenterology 23, no. 1 (June 19, 2023). http://dx.doi.org/10.1186/s12876-023-02854-9.
Full textMaras, Steven. "Reflections on Adobe Corporation, Bill Viola, and Peter Ramus while Printing Lecture Notes." M/C Journal 8, no. 2 (June 1, 2005). http://dx.doi.org/10.5204/mcj.2338.
Full textLevey, Nick. "“Analysis Paralysis”: The Suspicion of Suspicion in the Fiction of David Foster Wallace." M/C Journal 15, no. 1 (October 31, 2011). http://dx.doi.org/10.5204/mcj.383.
Full textHughes, Karen Elizabeth. "Resilience, Agency and Resistance in the Storytelling Practice of Aunty Hilda Wilson (1911-2007), Ngarrindjeri Aboriginal Elder." M/C Journal 16, no. 5 (August 28, 2013). http://dx.doi.org/10.5204/mcj.714.
Full textBallard, Su. "Information, Noise and et al." M/C Journal 10, no. 5 (October 1, 2007). http://dx.doi.org/10.5204/mcj.2704.
Full textLombard, Kara-Jane. "“To Us Writers, the Differences Are Obvious”." M/C Journal 10, no. 2 (May 1, 2007). http://dx.doi.org/10.5204/mcj.2629.
Full textMurphy, Ffion, and Richard Nile. "The Many Transformations of Albert Facey." M/C Journal 19, no. 4 (August 31, 2016). http://dx.doi.org/10.5204/mcj.1132.
Full text