Dissertations / Theses on the topic 'Recombination lifetime'

In broad terms, this thesis is concerned with the measurement and interpretation of carrier lifetimes in multicrystalline silicon. An understanding of these lifetimes in turn leads to a clearer picture of the limiting mechanisms in solar cells made with this promising material, and points to possible paths for improvement. The work falls into three broad categories: gettering, trapping and recombination. A further section discusses a powerful new technique for characterising impurities in semiconductors in general, and provides an example of its application. Gettering of recombination centres in multicrystalline silicon wafers improves the bulk lifetime, often considerably. Although not employed deliberately in most commercial cell processes, gettering nevertheless occurs to some extent during emitter formation, and so may have an important impact on cell performance. However, the response of different wafers to gettering is quite variable, and in some cases is non-existent. Work in this thesis shows that the response to gettering is best when the dislocation density is low and the density of mobile impurities is high. For Eurosolare material these conditions prevail at the bottom and to a lesser extent in the middle of an ingot. However, these conclusions can not always be applied to multicrystalline silicon produced by other manufacturers. Low resistivity multicrystalline silicon suffers from a concurrent thermally induced degradation of the lifetime. This had previously been attributed to the dissolution of precipitated metals, although we note that the crystallographic quality also appears to deteriorate. The thermal degradation effect results in an optimum gettering time for low resistivity material. Edge-defined Film-fed Growth (EFG) ribbon silicon was also found to respond to gettering, and even more so to bulk hydrogenation. Evidence for Cu contamination in the as-grown EFG wafers is presented. Multicrystalline silicon is often plagued by trapping effects, which can make lifetime measurement in the injection-level range of interest very difficult, and sometimes impossible. An old model based on centres that trap and release minority carriers, but do not interact with majority carriers, was found to provide a good explanation for these effects. These trapping states were linked with the presence of dislocations and also with boron-impurity complexes. Their annealing behaviour and lack of impact on device parameters can be explained in terms of the models developed. The trapping model allowed a recently proposed method for correcting trap-affected data to be tested using typical values of the trapping parameters. The correction method was found to extend the range of useable data to approximately an order of magnitude lower in terms of carrier density than would be available otherwise, an improvement that could prove useful in many practical cases. High efficiency PERL and PERC cells made on gettered multicrystalline silicon resulted in devices with open circuit voltages in the 640mV range that were almost entirely limited by bulk recombination. Furthermore, the injection-level dependence of the bulk lifetime resulted in decreased fill factors. Modelling showed that these effects are even more pronounced for cells dominated by interstitial iron recombination centres. Analysis of a commercial multicrystalline cell fabrication process revealed that recombination in the emitter created the most stringent limit on the open circuit voltage, followed by the bulk and the rear surface. The fill factors of these commercial cells were mostly affected by series resistance, although some reduction due to injection-level dependent lifetimes seems likely also. Secondary Ion Mass Spectroscopy on gettered layers of multicrystalline silicon revealed the presence of Cr and Fe in considerable quantities. Further evidence strongly implied that they resided almost exclusively as precipitates. More generally, injection-level dependent lifetime measurements offer the prospect of powerful contamination-monitoring tools, provided that the impurities are well characterised in terms of their energy levels and capture cross-sections. Conversely, lifetime measurements can assist with this process of characterising impurities, since they are extremely sensitive to their presence. This possibility is explored in this thesis, and a new technique, dubbed Injection-level Dependent Lifetime Spectroscopy (IDLS) is developed. To test its potential, the method was applied to the well-known case of FeB pairs in boron-doped silicon. The results indicate that the technique can offer much greater accuracy than more conventional DLTS methods, and may find applications in microelectronics as well as photovoltaics.

All-optical time-resolved measurement techniques provide a powerful tool for investigating critical parameters that determine the performance of infrared photodetector and emitter semiconductor materials. Narrow-bandgap InAs/GaSb type-II superlattices (T2SLs) have shown great promise as next generation materials, due to superior intrinsic properties and versatility. Unfortunately, InAs/GaSb T2SLs are plagued by parasitic Shockley-Read-Hall recombination centers that shorten the carrier lifetime and limit device performance. Ultrafast pump-probe techniques and time-resolved differential-transmission measurements are used here to demonstrate that "Ga-free" InAs/InAs₁₋xSbx T2SLs and InAsSb alloys do not have this same limitation and thus have significantly longer carrier lifetimes. Measurements of unintentionally doped MWIR and LWIR InAs/InAs₁₋xSbx T2SLs demonstrate minority carrier (MC) lifetimes of 18.4 µs and 4.5 µs at 77 K, respectively. This represents a more than two order of magnitude increase compared to the 90 ns MC lifetime measured in a comparable MWIR and LWIR InAs/GaSb T2SL. Through temperature-dependent differential-transmission measurements, the various carrier recombination processes are differentiated and the dominant recombination mechanisms identified for InAs/InAs₁₋xSbx T2SLs. These results demonstrate that these Ga-free materials are viable options over InAs/GaSb T2SLs and potentially bulk Hg₁₋xCdxTe photodetectors. In addition to carrier lifetimes, the drift and diusion of excited charge carriers through the superlattice layers (i.e. in-plane transport) directly aects the performance of photo-detectors and emitters. All-optical ultrafast techniques were successfully used for a direct measure of in-plane diffusion coeffcients in MWIR InAs/InAsSb T2SLs using a photo-generated transient grating technique at various temperatures. Ambipolar diffusion coefficients of approximately 60 cm²/s were reported for MWIR InAs/InAs₁₋xSbxT2SLs at 293 K.

Thesis (M. S.)--Electrical and Computer Engineering, Georgia Institute of Technology, 2009.
Committee Chair: Cressler, John; Committee Member: Citrin, David; Committee Member: Shen, Shyh-Chiang. Part of the SMARTech Electronic Thesis and Dissertation Collection.

Aukštųjų energijų fizikos eksperimentuose plačiai taikomi puslaidininkiniai pin struktūros dalelių detektoriai jonizuojančiosioms dalelėms registruoti. Radiacinė spinduliuotė sukuria defektus medžiagoje ir neigiamai įtakoja detektorių parametrus, todėl būtina charakterizuoti apšvitintus detektorius ieškant būdų, kaip juos patobulinti. Apšvitintų detektorių charakterizavimui taikomi volt-amperinių, volt-faradinių būdingųjų dydžių matavimai ir analizė, giliųjų lygmenų talpinė bei šiluma skatinamų srovių spektroskopija. Tačiau stipriai apšvitintuose detektoriuose, kai defektų koncentracija viršija legirantų koncentraciją bei išauga nuotėkio srovė, šie metodai negali būti taikomi siekiant korektiškai įvertinti radiacinių defektų parametrus. Šiame darbe buvo sukurti modeliai, apibūdinantys slinkties sroves, tekančias detektoriuje dėl elektrinio lauko persiskirstymo keičiantis išorinei įtampai arba elektriniame lauke judant injektuotam krūviui. Šie modeliai buvo pritaikyti naujų metodikų sukūrimui, kurios įgalina įvertinti krūvio pernašos, pagavimo, rekombinacijos/generacijos parametrus stipriai apšvitintuose detektoriuose po apšvitos. Sukurti metodai buvo pritaikyti defektų spektroskopijai ir skersinei žvalgai sluoksninėse struktūrose bei defektų evoliucijos tyrimams apšvitos metu. Disertacijoje pateikti ir aptarti apšvitintų detektorių ir apšvitos metu pasireiškiančios parametrų kaitos rezultatai. Elektronikos grandynuose plačiai naudojami galios pin struktūros diodai, kurie... [toliau žr. visą tekstą]
In high energy physics experiments the semiconductor particle detectors of pin structure are commonly employed for tracking of the ionising particles. However, ionising radiation creates defects and consequently affects the parameters of particle detectors. Therefore, it is necessary to characterize irradiated detectors and search for the new approaches on how to suppress or control the degradation process. Measurements of current-voltage, capacitance-voltage characteristics as well as deep level transient spectroscopy, thermally stimulated currents spectroscopy are employed for the characterization of irradiated particle detectors. At high irradiation fluences when defects concentration exceeds that of dopants, a generation current increases and, thus, the above mentioned techniques can not be applied for the correct evaluation of defect parameters. In this work, models describing displacement currents in detectors due to redistribution of electric field determined by variations of external voltage or a moving charge in electric field are discussed. These models were applied for creation of the advanced techniques which allow evaluating of charge transport, trapping and recombination/generation parameters in heavily irradiated detectors after irradiation. These techniques were applied for the spectroscopy of deep levels associated with defects, for cross-sectional scans within layered junction structures as well as for examination of defects evolution during irradiation. In... [to full text]

In high energy physics experiments the semiconductor particle detectors of pin structure are commonly employed for tracking of the ionising particles. However, ionising radiation creates defects and consequently affects the parameters of particle detectors. Therefore, it is necessary to characterize irradiated detectors and search for the new approaches on how to suppress or control the degradation process. Measurements of current-voltage, capacitance-voltage characteristics as well as deep level transient spectroscopy, thermally stimulated currents spectroscopy are employed for the characterization of irradiated particle detectors. At high irradiation fluences when defects concentration exceeds that of dopants, a generation current increases and, thus, the above mentioned techniques can not be applied for the correct evaluation of defect parameters. In this work, models describing displacement currents in detectors due to redistribution of electric field determined by variations of external voltage or a moving charge in electric field are discussed. These models were applied for creation of the advanced techniques which allow evaluating of charge transport, trapping and recombination/generation parameters in heavily irradiated detectors after irradiation. These techniques were applied for the spectroscopy of deep levels associated with defects, for cross-sectional scans within layered junction structures as well as for examination of defects evolution during irradiation. In... [to full text]
Aukštųjų energijų fizikos eksperimentuose plačiai taikomi puslaidininkiniai pin struktūros dalelių detektoriai jonizuojančiosioms dalelėms registruoti. Radiacinė spinduliuotė sukuria defektus medžiagoje ir neigiamai įtakoja detektorių parametrus, todėl būtina charakterizuoti apšvitintus detektorius ieškant būdų, kaip juos patobulinti. Apšvitintų detektorių charakterizavimui taikomi volt-amperinių, volt-faradinių būdingųjų dydžių matavimai ir analizė, giliųjų lygmenų talpinė bei šiluma skatinamų srovių spektroskopija. Tačiau stipriai apšvitintuose detektoriuose, kai defektų koncentracija viršija legirantų koncentraciją bei išauga nuotėkio srovė, šie metodai negali būti taikomi siekiant korektiškai įvertinti radiacinių defektų parametrus. Šiame darbe buvo sukurti modeliai, apibūdinantys slinkties sroves, tekančias detektoriuje dėl elektrinio lauko persiskirstymo keičiantis išorinei įtampai arba elektriniame lauke judant injektuotam krūviui. Šie modeliai buvo pritaikyti naujų metodikų sukūrimui, kurios įgalina įvertinti krūvio pernašos, pagavimo, rekombinacijos/generacijos parametrus stipriai apšvitintuose detektoriuose po apšvitos. Sukurti metodai buvo pritaikyti defektų spektroskopijai ir skersinei žvalgai sluoksninėse struktūrose bei defektų evoliucijos tyrimams apšvitos metu. Disertacijoje pateikti ir aptarti apšvitintų detektorių ir apšvitos metu pasireiškiančios parametrų kaitos rezultatai. Elektronikos grandynuose plačiai naudojami galios pin struktūros diodai, kurie... [toliau žr. visą tekstą]

The solid-state mesoscopic solar cells (sMSCs) have been developed as a promising alternative technology to the conventional photovoltaics. However, the device performance suffers from the low hole-mobilities and the incomplete pore filling of the hole transport materials (HTMs) into the mesoporous electrodes. A variety of HTMs and different preparation methods have been studied to overcome these limitations. There are two types of sMSCs included in this doctoral thesis, namely solid-state dye-sensitized solar cells (sDSCs) and organometallic halide perovskite based solar cells. Two different types of HTMs, namely the small molecule organic HTM spiro-OMeTAD and the conjugated polymer HTM P3HT, were compared in sDSCs. The photo-induced absorption spectroscopy (PIA) spectra and spectroelectrochemical data suggested that the dye-dye hole conduction occurs in the absence of HTM and appears to be of significant importance to the contribution of hole transport. The PIA measurements and transient absorption spectroscopy (TAS) indicated that the oxidized dye was efficiently regenerated by a small molecule organic HTM TPAA due to its excellent pore filling. The conducting polymer P3HT was employed as a co-HTM to transfer the holes away from TPAA to prohibit the charge carrier recombination and to improve the hole transport. An alternative small molecule organic HTM, MeO-TPD, was found to outperform spiro-OMeTAD in sDSCs due to its more efficient pore filling and higher hole-mobility. Moreover, an initial light soaking treatment was observed to significantly improve the device performance due to a mechanism of Li+ ion migration towards the TiO2 surface. In order to overcome the infiltration difficulty of conducting polymer HTMs, a state-of-the-art method to perform in-situ photoelectrochemical polymerization (PEP) in an aqueous micellar solution of bis-EDOT monomer was developed as an environmental-friendly alternative pathway with scale-up potential for constructing efficient sDSCs with polymer HTMs. Three different types of HTMs, namely DEH, spiro-OMeTAD and P3HT, were used to investigate the influence of HTMs on the charge recombination in CH3NH3PbI3 perovskite based sMSCs. The photovoltage decay measurements indicate that the electron lifetime (τn) of these devices decreases by one order of magnitude in the sequence τspiro-OMeTAD > τP3HT > τDEH.

This thesis deals with the analysis of nano-structured layers deposited by high-frequency magnetron sputtering on the monocrystalline silicon surface. The content of the work focuses on the magnetron sputtering application as an alternative method for passivation and antireflection layers deposition of silicon solar cells. The procedure of pre-deposite silicon surface cleaning by plasma etching in the Ar/H2 gas mixture atmosphere is suggested. In the next step the silicon nitride and aluminum nitride layers with hydrogen content in Ar/N2/H2 gas mixture by magnetron sputtering are deposited. One part of the thesis describes an experimental pseudo-carbide films deposition from a silicon target in the atmosphere of acetylene (C2H2). An emphasis is placed on the research of sputtered layers properties and on the conditions on the silicon-layer interface with the help of the standard as well as special measurement methods. Sputtered layers structure is analyzed by modern X-ray spectroscopy (XPS) and by Fourier infrared spectroscopy (FTIR). Optical ellipsometry and spectrophotometry is used for the diagnostic of the layers optical properties depending upon the wavelength of incident light. A special method of determining the surface lay-out of the charge´s carrier life in the volume and on the surface of silicon is employed to investigate the passivating effects of the sputtered layers.

Etwa die Hälfte aller Solarzellen weltweit wird aus blockerstarrtem Silizium hergestellt. Derartige Blöcke weisen in ihren Außenbereichen eine verringerte Diffusionslänge der Minoritätsladungsträger auf. Um die Ursache dafür im Fall des bodennahen Bereichs zu bestimmen wurden zwei Spezialblöcke (ein Block mit reduzierter Bor-Dotierung und ein Block mit Phosphor-Dotierung) - u. a. mittels DLTS und FTIR - auf Kristalldefekte untersucht. Zusätzlich zu Dotierelementen (B, P, Al, As) wurden im Bodenbereich folgende Defekte nachgewiesen: Metalle: Fe, Cr Sauerstoffhaltige Defekte: Interstitieller Sauerstoff, Thermische Donatoren (TD), O1, O2 Stickstoffhaltige Defekte: NN-Paar, NNO-Komplex, Shallow Thermal Donors (STD) Ausgedehnte Defekte: Versetzungen, Ausscheidungen, Korngrenzen. Die Verteilung der flachen Donatoren (P, TD, STD, As) und Akzeptoren (B, Al) bestimmt den Widerstandsverlauf im bodennahen Bereich des Phosphor dotierten Spezialblocks. Das dortige Diffusionslängenprofil kann im Rahmen der Shockley-Read-Hall-Statistik erst durch eine Erhöhung des Minoritätseinfangquerschnitts für das Cr-Niveau (Faktor 5) bzw. für das STD-Niveau (Faktor 10) nachgezeichnet werden. Eisen, Versetzungen und Korngrenzen haben hier keinen wesentlichen Einfluss. In den untersten Millimetern des Spezialblocks müssen weitere Defekte hinzukommen, die die Diffusionslänge zusätzlich reduzieren; Thermische Donatoren und O1 und eventuell Ausscheidungen kommen dazu in Frage. Die sinngemäße Übertragung der Konzentrationsverläufe aus den beiden Spezialblöcken auf einen Block mit einer produktionsüblichen Dotierung ([B]≈10¹⁶/cm³) ergibt, dass in diesem Fall verschiedene Defekte (TD, STD, CrB und FeB) einen Beitrag zur Diffusionslängenreduktion im bodennahen Blockbereich liefern.

Während über hexagonales (alpha) GaN zum ersten Mal 1932 berichtet wurde, gelang erst 1989 die Synthese einer mit Molekularstrahlepitaxie (MBE) auf 3C-SiC epitaktisch gewachsenen, metastabilen kubischen (eta) GaN Schicht. Die vorliegende Arbeit befaßt sich mit der Herstellung der Verbindungen eta-(In,Ga,Al)N mittels RF-Plasma unterstützter MBE auf GaAs(001) und den mikrostrukturellen sowie optischen Eigenschaften dieses neuartigen Materialsystems. Im Vergleich zur hexagonalen bietet die kubische Kristallstruktur auf Grund ihrer höheren Symmetrie potentielle Vorteile für die Anwendung in optischen und elektronischen Bauelementen. Viele wichtige Materialgrößen der kubischen Nitride sind jedoch noch gänzlich unbekannt, da sich die Synthese einkristalliner Schichten als sehr schwierig erweist. Das Ziel dieser Arbeit ist es daher erstens, die technologischen Grenzen der Herstellung von bauelementrelevanten kubischen (In,Ga,Al)N Heterostrukturen auszuweiten und zweitens, einen Beitrag zur Aufklärung der bis dato wenig bekannten optischen und elektronischen Eigenschaften des GaN und der Mischkristalle In GaN zu leisten. Zunächst wird ein optimierter MBE Prozess unter Einsatz einer Plasmaquelle hohen Stickstofflusses vorgestellt, welcher nicht nur die reproduzierbare Epitaxie glatter, einphasiger GaN Nukleationsschichten auf GaAs ermöglicht. Vielmehr können damit auch dicke GaN. Schichten mit glatter Oberflächenmorphologie hergestellt werden, welche die Grundlage komplizierterer eta-(In,Ga,Al)N Strukturen bilden. An einer solchen GaN Schicht mit einer mittleren Rauhigkeit von nur 1.5 nm werden dann temperaturabhängige Reflexions- und Transmissionsmessungen durchgeführt. Zur Auswertung der Daten wird ein numerisches Verfahren entwickelt, welches die Berechnung des kompletten Satzes von optischen Konstanten im Spektralgebiet 2.0 = 0.4 wären grün-gelbe Laserdioden. Zusammenfassung in PostScript
While the earliest report on wurtzite (alpha) GaN dates back to 1932, it was not until 1989 that the first epitaxial layer of metastable zincblende (eta) GaN has been synthesized by molecular beam epitaxy (MBE) on a 3C-SiC substrate. The present work focuses on radio frequency (RF) plasma-assisted MBE growth, microstructure, and optical properties of the eta-(In,Ga,Al)N material system on GaAs(001). Due to their higher crystal symmetry, these cubic nitrides are expected to be intrinsically superior for (opto-) electronic applications than the widely employed wurtzite counterparts. Owing to the difficulties of obtaining single-phase crystals, many important material constants are essentially unknown for the cubic nitrides. The aim of this work is therefore, first, to push the technological limits of synthesizing device-relevant zincblende (In,Ga,Al)N heterostructures and, second, to determine the basic optical and electronic properties of GaN as well as to investigate the hardly explored alloy InGaN. An optimized MBE growth process is presented which allows not only the reproducible nucleation of smooth, monocrystalline GaN layers on GaAs using a high-nitrogen-flow RF plasma source. In particular, thick single-phase GaN layers with smooth surface morphology are obtained being a prerequisite for the synthesis of ternary eta-(Ga,In,Al)N structures. Temperature dependent reflectance and transmittance measurements are carried out on such a GaN film having a RMS surface roughness as little as 1.5 nm. A numerical method is developed which allows to extract from these data the complete set of optical constants for photon energies covering the transparent as well as the strongly absorbing spectral range (2.0 -- 3.8 eV). Inhomogeneities in the refractive index leading to finite coherence effects are quantitatively analyzed by means of Monte Carlo simulations. The fundamental band gap EG(T) of GaN is determined for 5 < T < 300 K and the room temperature density of states is investigated. Systematic studies of the band edge photoluminescence (PL) in terms of transition energies, lineshapes, linewidths, and intensities are carried out for both alpha- and GaN as a function of temperature. Average phonon energies and coupling constants, activation energies for thermal broadening and quenching are determined. Excitation density dependent PL measurements are carried out for both phases in order to study the impact of nonradiative recombination processes at 300 K. A recombination model is applied to estimate the internal quantum efficiency, the (non)radiative lifetimes, as well as the ratio of the electron to hole capture coefficients for both polytypes. It is seen that the dominant nonradiative centers in the n-type material investigated act as hole traps which, however, can be saturated at already modest carrier injection rates. In summary, despite large defect densities in GaN due to highly mismatched heteroepitaxy on GaAs, band edge luminescence is observed up to 500 K with intensities comparable to those of state-of-the-art alpha-GaN. For the first time, thick InGaN films are fabricated on which blue and green luminescence can be observed up to 400 K for x=0.17 and x=0.4, respectively. Apart from bulk-like InGaN films, the first coherently strained InGaN/GaN (multi) quantum wells with In contents as high as 50 % and abrupt interfaces are grown. This achievement shows that a ternary alloy can be synthesized in a metastable crystal structure far beyond the miscibility limit of its binary constituents despite the handicap of highly lattice mismatched heteroepitaxy. The well widths of these structures range between 4 and 7 nm and are thus beyond the theoretically expected critical thickness for the strain values observed. It is to be expected that even higher In contents can be reached for film thicknesses below 5 nm. The potential application of such InGaN/GaN multi quantum wells with x >= 0.4 would thus be diode lasers operating in the green-yellow range. abstract in PostScript

In broad terms, this thesis is concerned with the measurement and interpretation of carrier lifetimes in multicrystalline silicon. An understanding of these lifetimes in turn leads to a clearer picture of the limiting mechanisms in solar cells made with this promising material, and points to possible paths for improvement. The work falls into three broad categories: gettering, trapping and recombination. A further section discusses a powerful new technique for characterising impurities in semiconductors in general, and provides an example of its application. ¶ ...

碩士
國立臺灣大學
光電工程學研究所
96
In this thesis, we have established a time-resolved system for measuring the carrier lifetimes of quantum dots. Firstly, we have studied the recombination mechanism of quantum dots by using the excitation power dependent photoluminescence measurement. It has been demonstrated that the free-carrier recombination is the dominant mechanism at room temperature. The influence of exciton becomes larger when the temperature is decreased. Then, in order to verify this time-resolved system, a time- correlated single photon counting (TCSPC) system has been established. By comparing the result obtained by TCSPC system, the validity of our time-resolved system is confirmed. Furthermore, we investigated the temperature dependent carrier lifetimes. It has been shown that the carrier lifetime first increases and then decreases with increasing temperature.

Etwa die Hälfte aller Solarzellen weltweit wird aus blockerstarrtem Silizium hergestellt. Derartige Blöcke weisen in ihren Außenbereichen eine verringerte Diffusionslänge der Minoritätsladungsträger auf. Um die Ursache dafür im Fall des bodennahen Bereichs zu bestimmen wurden zwei Spezialblöcke (ein Block mit reduzierter Bor-Dotierung und ein Block mit Phosphor-Dotierung) - u. a. mittels DLTS und FTIR - auf Kristalldefekte untersucht. Zusätzlich zu Dotierelementen (B, P, Al, As) wurden im Bodenbereich folgende Defekte nachgewiesen: Metalle: Fe, Cr Sauerstoffhaltige Defekte: Interstitieller Sauerstoff, Thermische Donatoren (TD), O1, O2 Stickstoffhaltige Defekte: NN-Paar, NNO-Komplex, Shallow Thermal Donors (STD) Ausgedehnte Defekte: Versetzungen, Ausscheidungen, Korngrenzen. Die Verteilung der flachen Donatoren (P, TD, STD, As) und Akzeptoren (B, Al) bestimmt den Widerstandsverlauf im bodennahen Bereich des Phosphor dotierten Spezialblocks. Das dortige Diffusionslängenprofil kann im Rahmen der Shockley-Read-Hall-Statistik erst durch eine Erhöhung des Minoritätseinfangquerschnitts für das Cr-Niveau (Faktor 5) bzw. für das STD-Niveau (Faktor 10) nachgezeichnet werden. Eisen, Versetzungen und Korngrenzen haben hier keinen wesentlichen Einfluss. In den untersten Millimetern des Spezialblocks müssen weitere Defekte hinzukommen, die die Diffusionslänge zusätzlich reduzieren; Thermische Donatoren und O1 und eventuell Ausscheidungen kommen dazu in Frage. Die sinngemäße Übertragung der Konzentrationsverläufe aus den beiden Spezialblöcken auf einen Block mit einer produktionsüblichen Dotierung ([B]≈10¹⁶/cm³) ergibt, dass in diesem Fall verschiedene Defekte (TD, STD, CrB und FeB) einen Beitrag zur Diffusionslängenreduktion im bodennahen Blockbereich liefern.