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Journal articles on the topic 'Radio frequency inductively-coupled plasma'

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Published: 28 June 2021
Last updated: 1 February 2022

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1

Boulos, Maher I. "THE INDUCTIVELY COUPLED RADIO FREQUENCY PLASMA." High Temperature Material Processes (An International Quarterly of High-Technology Plasma Processes) 1, no. 1 (1997): 17–39. http://dx.doi.org/10.1615/hightempmatproc.v1.i1.20.

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2

Boulos, M. I. "The inductively coupled R.F. (radio frequency) plasma." Pure and Applied Chemistry 57, no. 9 (January 1, 1985): 1321–52. http://dx.doi.org/10.1351/pac198557091321.

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3

Bera, K., B. Farouk, and P. Vitello. "Inductively coupled radio frequency methane plasma simulation." Journal of Physics D: Applied Physics 34, no. 10 (May 1, 2001): 1479–90. http://dx.doi.org/10.1088/0022-3727/34/10/308.

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4

Abdel-Rahman, M., V. Schulz-von der Gathen, and T. Gans. "Transition phenomena in a radio-frequency inductively coupled plasma." Journal of Physics D: Applied Physics 40, no. 6 (March 2, 2007): 1678–83. http://dx.doi.org/10.1088/0022-3727/40/6/017.

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5

Stittsworth, J. A., and A. E. Wendt. "Striations in a radio frequency planar inductively coupled plasma." IEEE Transactions on Plasma Science 24, no. 1 (1996): 125–26. http://dx.doi.org/10.1109/27.491744.

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6

Hua, Yue, Jian Song, Zeyu Hao, Gailing Zhang, and Chunsheng Ren. "Characteristics of a dual-radio-frequency cylindrical inductively coupled plasma." Contributions to Plasma Physics 59, no. 7 (February 4, 2019): e201800029. http://dx.doi.org/10.1002/ctpp.201800029.

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7

Tuszewski, M. "Enhanced Radio Frequency Field Penetration in an Inductively Coupled Plasma." Physical Review Letters 77, no. 7 (August 12, 1996): 1286–89. http://dx.doi.org/10.1103/physrevlett.77.1286.

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8

Bozeman, S. P., D. A. Tucker, B. R. Stoner, J. T. Glass, and W. M. Hooke. "Diamond deposition using a planar radio frequency inductively coupled plasma." Applied Physics Letters 66, no. 26 (June 26, 1995): 3579–81. http://dx.doi.org/10.1063/1.113793.

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9

Lafleur, T., and C. S. Corr. "Characterization of a radio-frequency inductively coupled electrothermal plasma thruster." Journal of Applied Physics 130, no. 4 (July 28, 2021): 043304. http://dx.doi.org/10.1063/5.0056124.

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10

Dewangan, Rakesh Kumar, Sangeeta B. Punjabi, N. K. Joshi, D. N. Barve, H. A. Mangalvedekar, and B. K. Lande. "State-space modeling of the radio frequency inductively-coupled plasma generator." Journal of Physics: Conference Series 208 (February 1, 2010): 012056. http://dx.doi.org/10.1088/1742-6596/208/1/012056.

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11

Xianliang, Jiang, and M. I. Boulos. "Heat Transfer During Radio Frequency Inductively Coupled Plasma Deposition of Tungsten." Plasma Science and Technology 9, no. 4 (August 2007): 427–30. http://dx.doi.org/10.1088/1009-0630/9/4/09.

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12

Yanguang Shan. "A Stochastic Spray Model for the Radio-Frequency Inductively Coupled Plasma." IEEE Transactions on Plasma Science 37, no. 9 (September 2009): 1747–53. http://dx.doi.org/10.1109/tps.2009.2028141.

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13

Tang, Deli, and Paul K. Chu. "Anode double layer in magnetized radio frequency inductively coupled hydrogen plasma." Journal of Applied Physics 94, no. 3 (August 2003): 1390–95. http://dx.doi.org/10.1063/1.1589592.

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14

Amorim, J. "High-density plasma mode of an inductively coupled radio frequency discharge." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 9, no. 2 (March 1991): 362. http://dx.doi.org/10.1116/1.585576.

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15

Tong, J. B., X. Lu, C. C. Liu, Z. Q. Pi, R. J. Zhang, and X. H. Qu. "Numerical simulation and prediction of radio frequency inductively coupled plasma spheroidization." Applied Thermal Engineering 100 (May 2016): 1198–206. http://dx.doi.org/10.1016/j.applthermaleng.2016.02.108.

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16

Qin, Qian, Fang Yang, Tao Shi, Zhimeng Guo, Haixia Sun, Pei Li, Xin Lu, Cunguang Chen, Junjie Hao, and Peng Cao. "Spheroidization of tantalum powder by radio frequency inductively coupled plasma processing." Advanced Powder Technology 30, no. 8 (August 2019): 1709–14. http://dx.doi.org/10.1016/j.apt.2019.05.022.

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17

Tang, D. L., R. K. Y. Fu, X. B. Tian, and P. K. Chu. "Improved planar radio frequency inductively coupled plasma configuration in plasma immersion ion implantation." Review of Scientific Instruments 74, no. 5 (May 2003): 2704–8. http://dx.doi.org/10.1063/1.1568559.

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18

Allen, G. Mark, and David M. Coleman. "Characterization of a Dual Inductively Coupled Plasma Atomic Emission Source." Applied Spectroscopy 41, no. 3 (March 1987): 381–87. http://dx.doi.org/10.1366/0003702874449039.

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A dual inductively copuled plasma atomic emission spectroscopic system is described. This new analytical discharge segregates the normally integrated processes of sampling and spectral excitation associated with atomic emission sources. A low-power, low-argon-flow, radio-frequency plasma is used as a sampling device to create gaseous species from liquid and solid samples which are subsequently transported to a second plasma for excitation. Design and construction of instrumentation and associated operational parameters are reviewed. Comparisons of the sampling and the excitation plasmas include spatial emission profiles, linear calibration plots, signal-to-background ratios, and analytical detection limits. Use of the dual ICP for direct analysis of particulates (coal fly ash and firebrick) is demonstrated.
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19

Ding, Z. F., W. G. Huo, and Y. N. Wang. "Novel low-frequency oscillation in a radio-frequency inductively coupled plasma with tuned substrate." Physics of Plasmas 11, no. 6 (June 2004): 3270–77. http://dx.doi.org/10.1063/1.1740772.

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20

Cui, Chunshi, and R. W. Boswell. "Role of excitation frequency in a low‐pressure, inductively coupled radio‐frequency, magnetized plasma." Applied Physics Letters 63, no. 17 (October 25, 1993): 2330–32. http://dx.doi.org/10.1063/1.110516.

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21

Li, Weifeng, Zhibin Yin, Wei Hang, Bin Li, and Benli Huang. "Pulsed radio-frequency discharge inductively coupled plasma mass spectrometry for oxide analysis." Spectrochimica Acta Part B: Atomic Spectroscopy 122 (August 2016): 69–74. http://dx.doi.org/10.1016/j.sab.2016.05.010.

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22

Tsai, Chen-Ming, A. P. Lee, and C. S. Kou. "Characteristics of heating mode transitions in a radio-frequency inductively coupled plasma." Journal of Physics D: Applied Physics 39, no. 17 (August 17, 2006): 3821–25. http://dx.doi.org/10.1088/0022-3727/39/17/017.

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23

Noda, Hideyuki, Hisao Nagai, Masao Shimakura, Mineo Hiramatsu, and Masahito Nawata. "Synthesis of diamond using a low pressure, radio frequency, inductively coupled plasma." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 16, no. 6 (November 1998): 3170–74. http://dx.doi.org/10.1116/1.581516.

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24

Zhenfeng, Ding, Huo Weigang, and Wang Younian. "The Tuned Substrate Self-bias in a Radio-frequency Inductively Coupled Plasma." Plasma Science and Technology 6, no. 6 (December 2004): 2549–58. http://dx.doi.org/10.1088/1009-0630/6/6/007.

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25

Chin, O. H., K. K. Jayapalan, and C. S. Wong. "Effect of neutral gas heating in argon radio frequency inductively coupled plasma." International Journal of Modern Physics: Conference Series 32 (January 2014): 1460320. http://dx.doi.org/10.1142/s2010194514603202.

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Heating of neutral gas in inductively coupled plasma (ICP) is known to result in neutral gas depletion. In this work, this effect is considered in the simulation of the magnetic field distribution of a 13.56 MHz planar coil ICP. Measured electron temperatures and densities at argon pressures of 0.03, 0.07 and 0.2 mbar were used in the simulation whilst neutral gas temperatures were heuristically fitted. The simulated results showed reasonable agreement with the measured magnetic field profile.
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26

Hao, Zhenhua, Zhenhua Fu, Jintao Liu, Xingying Zhu, Fa Zhou, Yongchun Shu, Jianhong Yi, and Jilin He. "Spheroidization of a granulated molybdenum powder by radio frequency inductively coupled plasma." International Journal of Refractory Metals and Hard Materials 82 (August 2019): 15–22. http://dx.doi.org/10.1016/j.ijrmhm.2019.03.023.

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27

Wagatsuma, Kazuaki. "APPLICATION OF MODULATION TECHNIQUES TO ATOMIC EMISSION SPECTROMETRY WITH INDUCTIVELY-COUPLED RADIO-FREQUENCY PLASMA AND RADIO-FREQUENCY GLOW DISCHARGE PLASMA." Applied Spectroscopy Reviews 37, no. 2 (July 24, 2002): 223–45. http://dx.doi.org/10.1081/asr-120006045.

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28

Munafò, A., S. A. Alfuhaid, J. L. Cambier, and M. Panesi. "A tightly coupled non-equilibrium model for inductively coupled radio-frequency plasmas." Journal of Applied Physics 118, no. 13 (October 7, 2015): 133303. http://dx.doi.org/10.1063/1.4931769.

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29

Tong, Lei, Yu-Ru Zhang, Jia-Wei Huang, Ming-Liang Zhao, De-Qi Wen, Yuan-Hong Song, and You-Nian Wang. "Hybrid simulation of radio frequency biased inductively coupled Cl2 plasmas." Physics of Plasmas 28, no. 5 (May 2021): 053512. http://dx.doi.org/10.1063/5.0048522.

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30

Lim, Hyuna, Yoonsoo Park, Namwuk Baek, So-Yeon Jun, Sungwoo Lee, Jeayoung Yang, Donggeun Jung, and SeGi Yu. "Plasma Polymerized SiCOH Films from Octamethylcyclotetrasiloxane by Dual Radio Frequency Inductively Coupled Plasma Chemical Vapor Deposition System." Journal of Nanoscience and Nanotechnology 21, no. 8 (August 1, 2021): 4477–83. http://dx.doi.org/10.1166/jnn.2021.19417.

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We have fabricated porous plasma polymerized SiCOH (ppSiCOH) films with low-dielectric constants (low-k, less than 2.9), by applying dual radio frequency plasma in inductively coupled plasma chemical vapor deposition (ICP-CVD) system. We varied the power of the low radio frequency (LF) of 370 kHz from 0 to 65 W, while fixing the power of the radio frequency (RF) of 13.56 MHz. Although the ppSiCOH thin film without LF had the lowest k value, its mechanical strength is not high to stand the subsequent semiconductor processing. As the power of the LF was increased, the densities of ppSiCOH films became high, accordingly high in the hardness and elastic modulus, with quite satisfactory low-k value of 2.87. Especially, the ppSiCOH film, deposited at 35 W, exhibited the highest mechanical strength (hardness: 1.7 GPa, and elastic modulus: 9.7 GPa), which was explained by Fourier transform infrared spectroscopy. Since the low-k material is widely used as an inter-layer dielectric insulator, good mechanical properties are required to withstand chemical mechanical polishing damage. Therefore, we suggest that plasma polymerized process based on the dual frequency can be a good candidate for the deposition of low-k ppSiCOH films with enhanced mechanical strength.
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31

Shan, Yanguang, and J. Mostaghimi. "Numerical simulation of aerosol droplets desolvation in a radio frequency inductively coupled plasma." Spectrochimica Acta Part B: Atomic Spectroscopy 58, no. 11 (November 2003): 1959–77. http://dx.doi.org/10.1016/j.sab.2003.09.003.

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32

Yu, S. J., Z. F. Ding, J. Xu, J. L. Zhang, and T. C. Ma. "CVD of hard DLC films in a radio frequency inductively coupled plasma source." Thin Solid Films 390, no. 1-2 (June 2001): 98–103. http://dx.doi.org/10.1016/s0040-6090(01)00945-2.

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33

HE, Jianwu, Longfei MA, Senwen XUE, Chu ZHANG, Li DUAN, and Qi KANG. "Study of electron-extraction characteristics of an inductively coupled radio-frequency plasma neutralizer." Plasma Science and Technology 20, no. 2 (January 2018): 025403. http://dx.doi.org/10.1088/2058-6272/aa89e1.

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34

Seo, D. C., T. H. Chung, H. J. Yoon, and G. H. Kim. "Electrostatic probe diagnostics of a planar-type radio-frequency inductively coupled oxygen plasma." Journal of Applied Physics 89, no. 8 (April 15, 2001): 4218–23. http://dx.doi.org/10.1063/1.1354633.

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35

Meyer, J. A., and A. E. Wendt. "Measurements of electromagnetic fields in a planar radio‐frequency inductively coupled plasma source." Journal of Applied Physics 78, no. 1 (July 1995): 90–96. http://dx.doi.org/10.1063/1.360585.

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36

Murata, Masayoshi, Yosiaki Takeuchi, Eishiro Sasagawa, and Kazutoshi Hamamoto. "Inductively coupled radio frequency plasma chemical vapor deposition using a ladder‐shaped antenna." Review of Scientific Instruments 67, no. 4 (April 1996): 1542–45. http://dx.doi.org/10.1063/1.1146885.

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37

Eng, K., K. Strohmaier, R. Palmer, B. Stoner, and S. Washburn. "Comparison of external and internal planar radio frequency antennae for inductively coupled plasma." Review of Scientific Instruments 68, no. 6 (June 1997): 2381–83. http://dx.doi.org/10.1063/1.1148121.

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38

Hossain, M. M., K. C. Paul, Y. Tanaka, T. Sakuta, and T. Ishigaki. "Prediction of operating region of pulse-modulated radio frequency inductively coupled thermal plasma." Journal of Physics D: Applied Physics 33, no. 15 (July 24, 2000): 1843–53. http://dx.doi.org/10.1088/0022-3727/33/15/314.

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39

Ye, Rubin, Pierre Proulx, and Maher I. Boulos. "Particle turbulent dispersion and loading effects in an inductively coupled radio frequency plasma." Journal of Physics D: Applied Physics 33, no. 17 (August 14, 2000): 2154–62. http://dx.doi.org/10.1088/0022-3727/33/17/310.

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40

Bai, Y., J. Liu, P. Ma, B. Li, J. Zhu, L. W. Guo, and X. Y. Liu. "Effect of radio frequency power on the inductively coupled plasma etched Al0.65Ga0.35N surface." Applied Surface Science 256, no. 21 (August 2010): 6254–58. http://dx.doi.org/10.1016/j.apsusc.2010.03.150.

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41

Zuo, Yong-gang, Jia-jun Li, Yang Bai, Hao Liu, He-wei Yuan, and Guang-chao Chen. "Growth of nanocrystalline diamond by dual radio frequency inductively coupled plasma jet CVD." Diamond and Related Materials 73 (March 2017): 67–71. http://dx.doi.org/10.1016/j.diamond.2016.12.006.

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42

Chung, ChinWook, Sang-Hun Seo, and Hong-Young Chang. "The radio frequency magnetic field effect on electron heating in a low frequency inductively coupled plasma." Physics of Plasmas 7, no. 9 (September 2000): 3584–87. http://dx.doi.org/10.1063/1.1286804.

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43

Todorovic-Markovic, Biljana, Zoran Markovic, I. Mohai, Z. Károly, Z. Farkas, Z. Nikolic, and J. Szépvölgyi. "Optical diagnostics of fullerene synthesis in the RF thermal plasma process." Journal of the Serbian Chemical Society 70, no. 1 (2005): 79–85. http://dx.doi.org/10.2298/jsc0501079t.

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In this work, the results of an optical emission study of fullerene synthesis in an inductively coupled radio frequency thermal plasma reactor are presented. The emission spectroscopy studies, based on the use of the Swan C2 (0,1) and CN (0,0) vibration emission spectra, were carried out to determine the plasma temperature. The evaporation process of graphite powder was observed by scanning electron microscopy.
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44

Gao, Song Hua, and Li Hua Gao. "Hydrophobic Modification on Surface of Silicone Rubber by Tetrafluoromethane Radio Frequency Inductively Coupled Plasma." Advanced Materials Research 1003 (July 2014): 69–73. http://dx.doi.org/10.4028/www.scientific.net/amr.1003.69.

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Hydrophobic modification on surface of silicone rubber by CF4 radio frequency inductively coupled plasma is discussed. Static contact angle and X-ray photoelectron spectroscopy were used in characterizing the hydrophobic property and chemical composition of the modified silicone rubber. The results show that the improvement of surface hydrophobic property on modified silicone rubber is put down to the introduction of fluorocarbon functional groups (C-CFn, n=1, 2,3) and fluosilicic structures (Si-F and Si-F2) during the treatment.
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45

Gao, Fei, Yu-Ru Zhang, Shu-Xia Zhao, Xue-Chun Li, and You-Nian Wang. "Electronic dynamic behavior in inductively coupled plasmas with radio-frequency bias." Chinese Physics B 23, no. 11 (November 2014): 115202. http://dx.doi.org/10.1088/1674-1056/23/11/115202.

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46

Yoshimura, Kikuko, Shinji Nakagami, Takeshi Minaguchi, Hirohiko Nakano, Toshiaki Tatsuta, and Osamu Tsuji. "Simple Monitoring of Discharge State in Inductively Coupled Plasma Using Radio Frequency Impedance Analyzer." Journal of Photopolymer Science and Technology 15, no. 2 (2002): 283–90. http://dx.doi.org/10.2494/photopolymer.15.283.

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47

Hur, Min Young, Donggeun Lee, Sangsun Yang, and Hae June Lee. "Numerical Modeling of Nano-powder Synthesis in a Radio-Frequency Inductively Coupled Plasma Torch." Applied Science and Convergence Technology 27, no. 1 (January 31, 2018): 14–18. http://dx.doi.org/10.5757/asct.2018.27.1.14.

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48

YAMADA, Satoko, Shigeru ITO, and Kazuo AKASHI. "Nitriding of Pure Iron in High-density Plasma Using Inductively Coupled Radio Frequency Discharge." Journal of the Surface Finishing Society of Japan 50, no. 2 (1999): 195–99. http://dx.doi.org/10.4139/sfj.50.195.

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49

Wang, Z. J., X. B. Tian, C. Z. Gong, J. W. Shi, S. Q. Yang, Ricky K. Y. Fu, and Paul K. Chu. "Plasma immersion ion implantation into cylindrical bore using internal inductively-coupled radio-frequency discharge." Surface and Coatings Technology 206, no. 24 (August 2012): 5042–45. http://dx.doi.org/10.1016/j.surfcoat.2012.05.118.

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50

Nakagaki, Keita, Toshihiko Yamauchi, Yoshinori Kanno, Seiji Kobayashi, and Ryou Takemoto. "Behavior of Transition into Inductively Coupled Plasma Mode with Internal Radio Frequency Multiturn Antenna." Japanese Journal of Applied Physics 47, no. 3 (March 14, 2008): 1745–47. http://dx.doi.org/10.1143/jjap.47.1745.

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