Books on the topic 'Plasma etching'

M, Manos Dennis, and Flamm Daniel L, eds. Plasma etching: An introduction. Boston: Academic Press, 1989.

Sugawara, M. Plasma etching: Fundamentals and applications. New York: Oxford University Press, 1998.

Hull, David R. Plasma etching a ceramic composite. [Washington, DC]: National Aeronautics and Space Administration, 1992.

Morgan, Russ A. Plasma etching in semiconductor fabrication. Amsterdam: Elsevier, 1985.

NATO Advanced Study Institute on Plasma Processing of Semiconductors (1996 Bonas, France). Plasma processing of semiconductors. Dordrecht: Kluwer Academic Publishers, 1997.

Chen, Hsin-Yi. Inductively coupled plasma etching of InP. Ottawa: National Library of Canada, 2000.

F, Williams P., ed. Plasma processing of semiconductors. Boston: Kluwer, 1997.

Symposium, on Plasma Processing (5th 1984 New Orleans La ). Proceedings of the Fifth Symposium on Plasma Processing. Pennington, NJ (10 S. Main St., Pennington 08534-2896): Dielectrics and Insulation and Electronics Divisions, Electrochemical Society, 1985.

International Symposium on Plasma Processing (14th 2002 Philadelphia, Pa.). Plasma processing XIV: Proceedings of the International Symposium. Edited by Mathad G. S, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division, and Electrochemical Society Meeting. Pennington, NJ: Electrochemical Society, 2002.

Symposium on Plasma Processing (13th 2000 Toronto, Ont.). Plasma processing XIII: Proceedings of the International Symposium. Edited by Mathad G. S, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division, and Electrochemical Society Meeting. Pennington, New Jersey: Electrochemical Society., 2000.

Rangelow, Ivo W. Deep etching of silocon. Wrocław: Oficyna Wydawnicza Politekchniki Wrocławskiej, 1996.

Riccardo, D'Agostino, ed. Plasma deposition, treatment, and etching of polymers. Boston: Academic Press, 1990.

Hans-Ullrich, Poll, ed. Die Glimmentladung in perfluorierten Gasen zum Plasmaätzen und zur Schichtabscheidung. [Karl-Marx-Stadt]: Technische Hochschule Karl-Marx-Stadt, Sektion Physik/Elektronische Bauelemente, 1985.

Manenschijn, Albert. Ion bombardment and ion-assisted etching in rf discharges. Delft, Netherlands: Technische Universiteit Delft, 1991.

Symposium on Highly Selective Dry Etching and Damage Control (1993 Honolulu, Hawaii). Proceedings of the Symposium on Highly Selective Dry Etching and Damage Control. Pennington, NJ: Electrochemical Society, 1993.

Gerhard, Franz. Oberflächentechnologie mit Niederdruckplasmen: Beschichten und Strukturieren in der Mikrotechnik. 2nd ed. Berlin: Springer-Verlag, 1994.

Gerhard, Franz. Kalte Plasmen: Grundlagen, Erscheinungen, Anwendungen. Berlin: Springer-Verlag, 1990.

Parkhutik, V. P. Plazmennoe anodirovanie: Fizika, tekhnika, primenenie v mikroėlektronike. Minsk: "Navuka i tėkhnika", 1990.

Rizvi, Syed Shabbar Abbas. Inductively coupled Ar/Cl2 plasma etching of GaN. [s.l: The Author], 2003.

Samukawa, Seiji. Feature profile evolution in plasma processing using on-wafer monitoring system. Tokyo: Springer, 2014.

Okpalugo, Osmund A. Characteristics of argon-chlorine inductively coupled plasmas for plasma surface modification and etching. [S.l: The author], 2003.

Zhang, Ying, Qinghuang Lin, and G. S. Oehrlein. Advanced etch technology for nanopatterning: 13-14 February 2012, San Jose, California, United States. Edited by SPIE (Society). Bellingham, Wash: SPIE, 2012.

M, Rossnagel Stephen, Cuomo J. J, and Westwood William D. 1937-, eds. Handbook of plasma processing technology: Fundamentals, etching, deposition, and surface interactions. Park Ridge, N.J., U.S.A: Noyes Publications, 1990.

Roosmalen, A. J. van. Dry etching for VLSI. New York: Plenum Press, 1991.

S, Mathad G., Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division, and International Symposium on Plasma Etching Processes for Sub-Quarter Micron Devices (1999 : Honolulu, Hawaii), eds. Plasma etching processes for sub-quarter micron devices: Proceedings of the International Symposium. Pennington, New Jersey: Electrochemical Society., 2000.

Lieberman, M. A. Principles of plasma discharges and materials processing. 2nd ed. Hoboken, NJ: Wiley-Interscience, 2004.

Diran, Apelian, and Szekely Julian 1934-, eds. Plasma processing and synthesis of materials III: Symposium held April 17-19, 1990, San Francisco, California, U.S.A. Pittsburgh, Pa: Materials Research Society, 1991.

Cui, Naiyi. The evolution of sub-micron surface topography during the plasma etching of selected materials. [S.l: The Author], 1998.

Symposium B on Photon-Assisted Processing of Surfaces and Thin Films (1994 Strasbourg, France). Photon-assisted processing of surfaces and thin films: Proceedings of Symposium B on Photon-Assisted Processing of Surfaces and Thin Films of the 1994 E-MRS Spring Conference, Strasbourg, France, May 24-27, 1994. Amsterdam: Elsevier, 1995.

International Colloquium on Plasmas and Sputtering (6th 1987 Antibes, France). Comptes rendus des travaux du CIP G87. Paris: Société française du vide, 1987.

Chang, R. P. H. 1941-, Abeles B, and Symposium on Plasma Synthesis and Etching of Electronic Materials (1984 : Boston, Mass.), eds. Plasma synthesis and etching of electronic materials: Symposium held November 27-30, 1984, Boston, Massachusetts, U.S.A. Pittsburgh, Pa: Materials Research Society, 1985.

International Symposium on Plasma Process-Induced Damage (3rd 1998 Honolulu, Hawaii). 1998 3rd International Symposium on Plasma Process-Induced Damage: June 4-5, 1998, Honolulu, Hawaii, USA. Edited by Nakamura Moritaka, Dao, Leanne Thuy Lien, 1953-, Hook Terence, IEEE Electron Devices Society, American Vacuum Society, and Ōyō Butsuri Gakkai. Sunnyvale, CA: Northern California Chapter of the American Vacuum Society, 1998.

E, Chen Fusen, Murarka S. P, and Society of Photo-optical Instrumentation Engineers., eds. Microelectronics technology and process integration: 20-21 October 1994, Austin, Texas. Bellingham, Wash., USA: SPIE, 1994.

International Symposium on Thin Film Materials, Processes, Reliability, and Applications: Thin Film Processes (1997 Paris, France). Proceedings of the International Symposium on Thin Film Materials, Processes, Reliability, and Applications, Thin Film Processes. Edited by Mathad G. S, Meyyappan M, Engelhardt M, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division, Electrochemical Society Electrodeposition Division, Electrochemical Society Meeting, and International Society of Electrochemistry. Meeting. Pennington, NJ: Electrochemical Society, 1998.

1955-, Toprac Anthony J., Dang Kim, Society of Photo-optical Instrumentation Engineers., and Solid State Technology (Organization), eds. Process, equipment, and materials control in integrated circuit manufacturing IV: 22-24 September, 1998, Santa Clara, California. Bellingham, Washington: SPIE, 1998.

1955-, Toprac Anthony J., Dang Kim, Society of Photo-optical Instrumentation Engineers., and Electrochemical Society, eds. Process, equipment, and materials control in integrated circuit manufacturing V: 22-23 September, 1999, Santa Clara, California. Bellingham, Wash., USA: SPIE, 1999.

International Symposium on Thin Film Materials, Processes, and Reliability (2003 Paris, France). Thin film materials, processes, and reliability: Plasma processing for the 100 nm node and copper interconnects with low-k inter-level dielectric films : proceedings of the international symposium. Edited by Mathad G. S, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division, and Electrochemical Society Meeting. Pennington, NJ: Electrochemical Society, 2003.

James, Bondur, and Society of Photo-optical Instrumentation Engineers., eds. Microelectronic processes, sensors, and controls: 27-29 September 1993, Monterey, California. Bellingham, Wash: SPIE, 1994.

International Symposium on Plasma Process-Induced Damage (2nd 1997 Monterey, Calif.). 1997 2nd International Symposium on Plasma Process-Induced Damage: 13-14 May 1997, Monterey, California, USA. Edited by Cheung Kin P, Nakamura Moritaka, Gabriel Calvin T, IEEE Electron Devices Society, American Vacuum Society, and Ōyō Butsuri Gakkai. Sunnyvale, Calif: Northern California Chapter of the American Vacuum Society, 1997.

Singh, M. Microstructural characterization of reaction-formed silicon carbide ceramics. [Washington, D.C: National Aeronautics and Space Administration, 1995.

A, Leonhardt T., and United States. National Aeronautics and Space Administration., eds. Microstructural characterization of reaction-formed silicon carbide ceramics. [Washington, D.C: National Aeronautics and Space Administration, 1995.

Symposium on Dry Process (9th 1987 Honolulu, Hawaii). Proceedings of the Symposium on Dry Process. Pennington, NJ (10 S. Main St., Pennington 08534-2896): Electrochemical Society, 1988.

Mart, Graef, Patel Divyesh N, Society of Photo-optical Instrumentation Engineers., and Electrochemical Society, eds. Multilevel interconnect technology III: 22-23 September 1999, Santa Clara, California. Bellingham, Wash., USA: SPIE, 1999.

N, Patel Divyesh, Graef Mart, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International., Solid State Technology (Organization), and Electrochemical Society, eds. Multilevel interconnect technology: 1-2 October 1997, Austin, Texas. Bellingham, Wash: SPIE, 1997.

Plasma Etching. Elsevier, 1989. http://dx.doi.org/10.1016/c2009-0-22185-4.

Plasma Processing Xiii. Electrochemical Society, 2000.

Plasma Etching: An Introduction (Plasma : Materials Interactions). Academic Press, 1989.

(Editor), Dennis M. Manos, and Daniel L. Flamm (Editor), eds. Plasma Etching: An Introduction (Plasma : Materials Interactions). Academic Press, 1989.

Auciello, Orlando, Daniel L. Flamm, and Riccardo d'Agostino. Plasma Deposition, Treatment, and Etching of Polymers: The Treatment and Etching of Polymers. Elsevier Science & Technology Books, 2012.

Sugawara, Minoru. Plasma Etching: Fundamentals and Applications. Oxford University Press, 1998.