Books on the topic 'Plasma deposition'

Konuma, Mitsuharu. Film Deposition by Plasma Techniques. Berlin, Heidelberg: Springer Berlin Heidelberg, 1992. http://dx.doi.org/10.1007/978-3-642-84511-6.

1950-, Konuma Mitsuharu, ed. Film deposition by plasma techniques. Berlin: Springer-Verlag, 1992.

Konuma, Mitsuharu. Film deposition by plasma techniques. New York: Springer-Verlag, 1992.

Konuma, Mitsuharu. Plasma techniques for film deposition. Harrow, U.K: Alpha Science International, 2005.

Konuma, Mitsuharu. Film Deposition by Plasma Techniques. Berlin, Heidelberg: Springer Berlin Heidelberg, 1992.

Riccardo, D'Agostino, ed. Plasma deposition, treatment, and etching of polymers. Boston: Academic Press, 1990.

Buuron, Adrianus Jacobus Maria. Plasma deposition of carbon materials: Proefschrift. Eindhoven: Technische Universiteit Eindhoven, 1993.

Chemical vapor deposition: Thermal and plasma deposition of electronic materials. New York: Van Nostrand Reinhold, 1995.

M, Rossnagel Stephen, Cuomo J. J, and Westwood William D. 1937-, eds. Handbook of plasma processing technology: Fundamentals, etching, deposition, and surface interactions. Park Ridge, N.J., U.S.A: Noyes Publications, 1990.

Giovanni, Bruno, Capezzuto Pio, and Madan A, eds. Plasma deposition of amorphous silicon-based materials. Boston: Academic Press, 1995.

Stangeby, P. C. Interpretation of plasma impurity deposition probes. Analytic approximation. [S.l.]: [s.n.], 1987.

Stangeby, P. C. Interpretation of Langmuir, heat-flux, deposition, trapping and gridded energy analyser probe data for impure plasmas. [S.l.]: [s.n.], 1987.

André, Anders, ed. Handbook of plasma immersion ion implantation and deposition. New York: Wiley, 2000.

Prani͡avichi͡us, L. Coating technology : ion beam deposition. Warwick, R.I: Satas & Associates, 1993.

Etemadi, Peyman. Plasma enhanced chemical vapor deposition of crystalline diamond films. Ottawa: National Library of Canada, 2002.

United States. National Aeronautics and Space Administration. Scientific and Technical Information Program., ed. Numerical modeling tools for chemical vapor deposition. [Washington, D.C.]: National Aeronautics and Space Administration, Office of Management, Scientific and Technical Information Program, 1992.

Riccardo, D'Agostino, Favia Pietro, Fracassi Francesco, and NATO Advanced Study Institute on Plasma Treatments and Deposition of Polymers (1996 : Acquafredda di Maratea, Italy), eds. Plasma processing of polymers. Dordrecht: Kluwer Academic Publishers, 1997.

André, Bouchoule, ed. Dusty plasmas: Physics, chemistry, and technological impacts in plasma processing. Chichester: Wiley, 1999.

United States. National Aeronautics and Space Administration., ed. Plasma-assisted physical vapor deposition surface treatments for tribological control. [Washington, DC]: National Aeronautics and Space Administration, 1990.

United States. National Aeronautics and Space Administration., ed. Plasma-assisted physical vapor deposition surface treatments for tribological control. [Washington, DC]: National Aeronautics and Space Administration, 1990.

United States. National Aeronautics and Space Administration., ed. Plasma-assisted physical vapor deposition surface treatments for tribological control. [Washington, DC]: National Aeronautics and Space Administration, 1990.

Luminous chemical vapor deposition and interface engineering. New York: Marcel Dekker, 2005.

Metcalf, Myers Roger, and United States. National Aeronautics and Space Administration., eds. Mechanisms of anode power deposition in a low pressure free burning arc. [Washington, DC]: National Aeronautics and Space Administration, 1994.

Metcalf, Myers Roger, and United States. National Aeronautics and Space Administration., eds. Mechanisms of anode power deposition in a low pressure free burning arc. [Washington, DC]: National Aeronautics and Space Administration, 1994.

United States. National Aeronautics and Space Administration., ed. An overview of CVD processes. Washington DC: National Aeronautics and Space Administration, 1986.

Robert, Moran. Thin layer deposition: Highlighting implantation and epitaxy, plasma, thermal, and ion. Norwalk, CT: Business Communications Co., 1996.

Menno N van den Donker. Plasma deposition of microcrystalline silicon solar cells: Looking beyond the glass. Jülich: Forschungszentrum Jülich GmbH, Zentralbibliothek, 2006.

Geiser, Juergen. Simulation of deposition processes with PECVD apparatus. Hauppauge, N.Y: Nova Science Publishers, 2011.

Michalski, Andrzej. Krystalizacja warstw wielofazowych z plazmy impulsowej. Warszawa: Wydawnictwa Politechniki Warszawskiej, 1987.

Miyoshi, Kazuhisa. Plasma-deposited amorphous hydrogenated carbon films and their tribological properties. Cleveland, Ohio: Lewis Research Center, 1989.

Miyoshi, Kazuhisa. Plasma-deposited amorphous hydrogenated carbon films and their tribological properties. Cleveland, Ohio: Lewis Research Center, 1989.

Miyoshi, Kazuhisa. Plasma-deposited amorphous hydrogenated carbon films and their tribological properties. Cleveland, Ohio: Lewis Research Center, 1989.

Miyoshi, Kazuhisa. Plasma-deposited amorphous hydrogenated carbon films and their tribological properties. Cleveland, Ohio: Lewis Research Center, 1989.

American Chemical Society Symposium on Plasma Deposition of Polymeric Thin Films: Chemistry, Characterization, and Applications (1993 Denver, Colo.). Plasma deposition of polymeric thin films: Proceedings of the American Chemical Society Symposium on Plasma Deposition of Polymeric Thin Films: Chemistry, Characterization, and Applications, held in Denver, Colorado, March 28-29, 1993. Edited by Danilich Michael J, Marchant Roger E, and American Chemical Society. New York: Wiley, 1994.

Kamleshwar, Upadhya, Minerals, Metals and Materials Society. Structural Materials Division., and Minerals, Metals and Materials Society. Electronic, Magnetic, and Photonic Materials Division., eds. Plasma and laser processing of materials. Warrendale, Pa: Minerals, Metals & Materials Society, 1991.

Simon, Tsuo Y., ed. Hydrogenated amorphous silicon alloy deposition processes. New York: M. Dekker, 1993.

Jönsson, Martin. Investigations of plasma-enhanced CVD growth of carbon nanotubes and potential applications. Göteborg: Göteborg University, 2007.

Weidler, Natascha. Plasma-enhanced chemical vapor deposition of cobalt-based catalysts for the oxygen evolution reaction. Darmstadt: Universitäts- und Landesbibliothek Darmstadt, 2017.

E, Spear Karl, Dismukes John P, and Electrochemical Society, eds. Synthetic diamond: Emerging CVD science and technology. New York: Wiley, 1994.

Outlaw, R. A. Growth of high-quality thin-film Ge single crystals by plasma-enhanced chemical vapor deposition. Washington: NASA, 1986.

P, Hopson, and United States. National Aeronautics and Space Administration. Scientific and Technical Information Branch, eds. Growth of high-quality thin-film Ge single crystals by plasma-enhanced chemical vapor deposition. [Washington, DC]: National Aeronautics and Space Administration, Scientific and Technical Information Branch, 1986.

P, Hopson, and United States. National Aeronautics and Space Administration. Scientific and Technical Information Branch, eds. Growth of high-quality thin-film Ge single crystals by plasma-enhanced chemical vapor deposition. [Washington, DC]: National Aeronautics and Space Administration, Scientific and Technical Information Branch, 1986.

Bliznakovska, Blagica. PACVD of TiN. Jülich: Forschungszentrum Jülich, 1995.

Symposium B on Photon-Assisted Processing of Surfaces and Thin Films (1994 Strasbourg, France). Photon-assisted processing of surfaces and thin films: Proceedings of Symposium B on Photon-Assisted Processing of Surfaces and Thin Films of the 1994 E-MRS Spring Conference, Strasbourg, France, May 24-27, 1994. Amsterdam: Elsevier, 1995.

Bastani-Parizi, Hamideh. Chemical kinetic calculations of the gas phase in atmospheric microwave plasma-assisted chemical vapor deposition of diamond. Ottawa: National Library of Canada, 1993.

Flückiger, Roger Sylvain. Microcrystalline silicon thin films deposited by VHF plasmas for solar cell applications. Konstanz: Hartung-Gorre Verlag, 1995.

Anthony, Bernhardt, Black Jerry G, and Rosenberg R, eds. In-situ patterning: Selective area deposition and etching : symposium held November 29-December 1, 1989, Boston, Massachusetts, U.S.A. Pittsburgh, Pa: Materials Research Society, 1990.

T, Mearini G., and United States. National Aeronautics and Space Administration., eds. Effects of surface treatments on secondary electron emission from CVD diamond films. [Washington, D.C: National Aeronautics and Space Administration, 1995.

Symposium on Plasma Deposition of Polymeric Thin Films (1993 Denver, Colorado). Plasma deposition of polymeric thin films: Proceedings of the American Chemical Society symposium ... held in Denver, Colorado, March 28-29, 1993. Edited by Danilich Michael J and Marchant Roger E. New York: Wiley, 1994.

G, Lucovsky, Ibbotson Dale E, and Hess Dennis W, eds. Characterization of plasma-enhanced CVD processes: Symposium held Novermber 27-28, 1989, Boston, Massachusetts, U.S.A. Pittsburgh, Pa: Materials Research Society, 1990.