Books on the topic 'Photoresist'

United States International Trade Commission. Dry film photoresist from Japan. Washington, DC: U.S. International Trade Commission, 1993.

Ita, Paul A., and Matthew Bernard Zielinski. Photoresists & ancillaries. Cleveland, Ohio: Freedonia Group, 2003.

Moreau, Wayne M. Semiconductor lithography: Principles, practices, and materials. New York: Plenum Press, 1988.

Lin, Qinghuang. Advances in resist materials and processing technology XXIV: 26-28 February, 2007, San Jose, California, USA. Edited by Society of Photo-optical Instrumentation Engineers and SEMATECH (Organization). Bellingham, Wash: SPIE, 2007.

Allen, Robert D. Advances in resist materials and processing technology XXVII: 22-24 February 2010, San Jose, California, United States. Edited by SPIE (Society). Bellingham, Wash: SPIE, $c c2010., 2010.

Diazonaphthoquinone-based resists. Bellingham, Wash., USA: SPIE Optical Engineering Press, 1993.

Grishchenko, V. K. Zhidkie fotopolimerizui͡u︡shchiesi͡a︡ kompozit͡s︡ii. Kiev: Nauk. dumka, 1985.

Henderson, Clifford L. Advances in resist materials and processing technology XXVI: 23-25 February 2009, San Jose, California, United States. Bellingham, Wash: SPIE, 2009.

Photoreactive polymers: The science and technology of resists. New York: Wiley, 1989.

International, Symposium on Patterning Science and Technology (1st 1989 Hollywood Fla ). Proceedings of the Symposium on Patterning Science and Technology. Pennington, NJ (10 S. Main St., Pennington 08534-2896): Electrochemical Society, 1990.

Daly, Dan. Microlens arrays. London: Taylor & Francis, 2001.

Symposium on Photomask Technology and Management (15th 1995 Santa Clara, Calif.). 15th Annual Symposium on Photomask Technology and Management: 20-22 September 1995, Santa Clara, California. Edited by Shelden Gilbert V and Wiley James N. Bellingham, WA: SPIE, 1996.

1951-, Ueno Takumi, and Ito Toshio 1952-, eds. Microlithography fundamentals in semiconductor devices and fabrication technology. New York: Marcel Dekker, 1998.

Microlithography: Process technology for IC fabrication. New York: McGraw-Hill, 1986.

Harper, Judith. The microelectronics market for imaging chemicals. Norwalk, CT: Business Communications Co., 1999.

Stanton, Trena Deirdre. Photoresist dissolution. 1986.

Photoresist Use in Semiconductor Manufacturing. OECD, 2014. http://dx.doi.org/10.1787/9789264221161-en.

Nakamura, Kenichiro. Photopolymers: Photoresist Materials, Processes, and Applications. Taylor & Francis Group, 2018.

Photopolymers: Photoresist Materials, Processes, and Applications. Taylor & Francis Group, 2014.

Nakamura, Kenichiro. Photopolymers: Photoresist Materials, Processes, and Applications. Taylor & Francis Group, 2018.

Nakamura, Kenichiro. Photopolymers: Photoresist Materials, Processes, and Applications. Taylor & Francis Group, 2018.

Nakamura, Kenichiro. Photopolymers: Photoresist Materials, Processes, and Applications. Taylor & Francis Group, 2018.

Dimnik, Gerald Peter *. Photoresist dissolution: a fluorescence and interferometry study. 1988.

Wong, Sean Hang Edmond. Fabrication of three-dimensional photonic crystals via direct laser writing in an all-inorganic photoresist. 2005.

Wong, Sean Hang Edmond. Fabrication of three-dimensional photonic crystals via direct laser writing in an all-inorganic photoresist. 2005.

Wong, Sean Hang Edmond. Fabrication of three-dimensional photonic crystals via direct laser writing in an all-inorganic photoresist. 2005, 2005.

Dry film photoresist from Japan: Determination of the Commission in investigation no. 731-TA-622 (preliminary) under the Tariff Act of 1930, together with the information obtained in the investigation. Washington, DC: U.S. International Trade Commission, 1992.

The 2006-2011 World Outlook for Pattern-Generating Wafer Processing Equipment Used to Produce Masks and Reticles from Photoresist Coated Substrates Excluding Focused Ion Beam Milling Machines. Icon Group International, Inc., 2005.

Parker, Philip M. The 2007-2012 World Outlook for Pattern-Generating Wafer Processing Equipment Used to Produce Masks and Reticles from Photoresist Coated Substrates Excluding Focused Ion Beam Milling Machines. ICON Group International, Inc., 2006.

Chalcogenide Inorganic Photoresists for Holography & Microlithodraphy. CRC, 2001.

Advances in Resist Technology and Processing VI. Society of Photo Optical, 1989.

Advances in Resist Technology and Processing, V. (Proceedings of S P I E). Society of Photo Optical, 1988.

G, Tarascon-Auriol Régine, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International., and SEMATECH (Organization), eds. Advances in resist technology and processing XIV: 10-12 March, 1997, Santa Clara, California. Bellingham, Washington: SPIE--the International Society for Optical Engineering, 1997.

Bowden, Murrae J. Advances in Resist Technology and Processing, IV. Society of Photo Optical, 1987.

Advances in resist technology and processing VI: 27 February-1 March, 1989, San Jose, California. Bellingham, Wash: International Society for Optical Engineering, 1989.

A, MacDonald Scott, and Society of Photo-optical Instrumentation Engineers., eds. Advances in resist technology and processing V: 29 February-2 March, 1988, Santa Clara, California. Bellingham, Wash., USA: International Society for Optical Engineering, 1988.

(Editor), Regine G. Auriol, and Regine G. Tarascon-Auriol (Editor), eds. Advances in Resist Technology and Processing XIV (Advances in Resist Technology & Processing XIV). SPIE-International Society for Optical Engine, 1997.

Svetochuvstvitelʹnye polimernye materialy. Leningrad: "Khimii͡a︡," Leningradskoe otd-nie, 1985.

1943-, Bowden M. J., and Society of Photo-optical Instrumentation Engineers., eds. Advances in resist technology and processing IV: 2-3 March 1987, Santa Clara, California. Bellingham, Wash., USA: SPIE--the International Society for Optical Engineering, 1987.

Omkaram, Nalamasu, and Society of Photo-optical Instrumentation Engineers., eds. Advances in resist technology and processing XI: 28 February-1 March, 1994, San Jose, California. Bellingham, Wash: International Society for Optical Engineering, 1994.

Advance in Resist Technology and Processing XIII. SPIE Society of Photo-Optical Instrumentation Engi, 1997.

Sturtevant, John L. Advances in Resist Technology And Processing 22. SPIE-International Society for Optical Engine, 2005.

M, Houlihan Francis, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International., and International SEMATECH, eds. Advances in resist technology and processing XVIII: 26-28 February, 2001, Santa Clara, [California] USA. Bellingham, Washington: SPIE, 2001.

1963-, Lin Qinghuang, Society of Photo-optical Instrumentation Engineers., and SEMATECH (Organization), eds. Advances in resist materials and processing technology XXIV: 26-28 February, 2007, San Jose, California, USA. Bellingham, Wash: SPIE, 2007.

Advances in resist technology and processing XIII: 11-13 March 1996, Santa Clara, California. Bellingham, Wash., USA: International Society for Optical Engineering, 1996.

R, Kunz Roderick, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International., and SEMATECH (Organization), eds. Advances in resist technology and processing XIII: 11-13 March 1996, Santa Clara, California. Bellingham, Wash., USA: International Society for Optical Engineering, 1996.

1952-, Fedynyshyn Theodore H., Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International., and International SEMATECH, eds. Advances in resist technology and processing XIX: 4-6 March, 2002, Santa Clara, [California] USA. Bellingham, Washington: SPIE, 2002.

L, Sturtevant John, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International., and International SEMATECH, eds. Advances in resist technology and processing XXI: 23-24 February 2004, Santa Clara, California, USA. Bellingham, Wash., USA: SPIE, 2004.

1963-, Lin Qinghuang, Society of Photo-optical Instrumentation Engineers., and SEMATECH (Organization), eds. Advances in resist materials and processing technology XXIV: 26-28 February, 2007, San Jose, California, USA. Bellingham, Wash: SPIE, 2007.

Henderson, Clifford. Advances in Resist Materials and Processing Technology XXV: 25-27 February 2008, San Jose, California, USA. SPIE, 2008.