Books on the topic 'Photolithography'

Golpon, Roland. Reproduktionsfotografie: Grundlagen und verfahrenstechniken der fotomechanischen und elektronischen reproduktion : lösungsheft. Frankfurt: Polygraph, 1988.

Peck, Harold L. Stripping: The assembly of film images. 2nd ed. Pittsburgh, Pa., U.S.A: Graphic Arts Technical Foundation, 1988.

Golpon, Roland. Reproduktionsfotografie: Grundlagen und verfahrenstechniken der fotomechanischen und elektronischen reproduktion. Frankfurt: Polygraph, 1988.

Stewart, Howe Kathleen, ed. Intersections: Lithography, photography, and the traditions of printmaking. Albuquerque: University of New Mexico Press, 1998.

Flemming, Alex. Estação Sumaré. São Paulo: Imprensa Oficial SP, 1998.

C, Watts Michael P., and Society of Photo-optical Instrumentation Engineers., eds. Advances in resist technology and processing VII: 5-6 March 1990, San Jose, California. Bellingham, Wash., USA: SPIE, 1990.

C, Watts Michael P., and Society of Photo-optical Instrumentation Engineers., eds. Advances in resist technology and processing VII: 5-6 March 1990, San Jose, California. Bellingham, Wash., USA: SPIE, 1990.

Hiroshi, Ito, and Society of Photo-optical Instrumentation Engineers., eds. Advances in resist technology and processing VIII: 4-5 March, 1991, San Jose, California. Bellingham, Wash., USA: SPIE, 1991.

N, Blair Raymond, Destree Tom, and Graphic Arts Technical Foundation, eds. The Lithographers manual. 8th ed. Pittsburgh, Pa: Graphic Arts Technical Foundation, 1988.

S, Allen Norman, ed. Photopolymerisation and photoimaging science and technology. London: Elsevier Applied Science, 1989.

1944-, Thompson L. F., International Society for Hybrid Microelectronics., and Society of Photo-optical Instrumentation Engineers., eds. Advances in resist technology and processing II: March 11-12, 1985, Santa Clara, California. Bellingham, Wash., USA: SPIE--the International Society for Optical Engineering, 1985.

Tom, Destree, and Graphic Arts Technical Foundation, eds. The lithographers manual. 9th ed. Pittsburgh, Pa: Graphic Arts Technical Foundation, 1994.

Tokkyochō, Japan. Handōtai rokō gijutsu. Tōkyō: Tokkyochō, 2002.

Hird, Kenneth F. Offset lithographic technology. South Holland, Ill: Goodheart-Willcox, 1991.

Limburg, Michael. The essentials of computer-to-plate technology. Pittsburgh, Pa: Graphic Arts Technical Foundation, 1995.

Adams, Richard M. Computer-to-plate: Automating the printing industry. 2nd ed. Pittsburgh, Pa: Graphic Arts Technical Foundation, 1996.

Limburg, Michael. Gutenberg goes digital: All you need to know about computer-to-plate technology. London: Blueprint, 1995.

M, Adams Richard. Computer-to-plate: automating the printing industry. Pittsburgh: Graphic Arts Technical Foundation, 1996.

Chiao, Jung-Chih. Device and process technologies for microelectronics, MEMS, and photonics IV: 12-14 December 2005, Brisbane, Australia. Edited by Society of Photo-optical Instrumentation Engineers, Queensland University of Technology, University of Adelaide, and University of Adelaide. Centre for Biomedical Engineering. Bellingham, Wash: SPIE, 2006.

J, Evans C., and National Institute of Standards and Technology (U.S.), eds. Interferometric metrology of photomask blanks: Approaches using 633 nm wavelength. Gaithersburg, MD: U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology, 2000.

Yang, Chung-Wei. Pictorials and the Transformation of Chinese Fiction in the Era of Photolithography (1900-1910). [New York, N.Y.?]: [publisher not identified], 2022.

Tan, Hark Hoe. Device and process technologies for microelectronics, MEMS, photonics, and nanotechnology IV: 5-7 December 2007, Canberra, Australia. Bellingham, Wash: SPIE, 2008.

Tan, Hark Hoe. Device and process technologies for microelectronics, MEMS, photonics, and nanotechnology IV: 5-7 December 2007, Canberra, Australia. Edited by Society of Photo-optical Instrumentation Engineers, Australian National University, Australian National University. Research School of Physical Sciences, and University of Adelaide. Centre for Biomedical Engineering. Bellingham, Wash: SPIE, 2008.

Maldovan, Martin. Periodic materials and interference lithography: For photonics, phononics and mechanics. Weinheim: Wiley-VCH, 2009.

Maldovan, Martin. Periodic materials and interference lithography: For photonics, phononics and mechanics. Weinheim: Wiley-VCH, 2009.

Maldovan, Martin. Periodic materials and interference lithography: For photonics, phononics and mechanics. Weinheim: Wiley-VCH, 2009.

1930-, Zernike Frits, Attwood David T, and Optical Society of America, eds. OSA proceedings on extreme ultraviolet lithography: Proceedings of the topical meeting, September 19-21, 1994, Monterey, California. Washington, DC: The Society, 1995.

America, Optical Society of, ed. Extreme ultraviolet lithography: Summaries of papers presented at the topical meeting, Extreme Ultraviolet Lithography, September 19-21, 1994, Monterey, California. Washington, DC: The Society, 1994.

D, Kubiak Glenn, Kania Don R, and Optical Society of America, eds. Extreme ultraviolet lithography: From the topical meeting, May 1-3, 1996, Boston, Massachusetts. Washington, DC: The Society, 1996.

Fontaine, Bruno M. La. Extreme ultraviolet (EUV) lithography: 22-25 February 2010, San Jose, California, United States. Bellingham, Wash: SPIE, 2010.

Jung-Chih, Chiao, Society of Photo-optical Instrumentation Engineers., University of Western Australia, and Defence Science and Technology Organisation (Australia), eds. Device and process technologies for MEMS, microelectronics, and photonics III: 10-12 December 2003, Perth, Australia. Bellingham, Wash: SPIE, 2004.

Ma, Xu. Computational lithography. Hoboken, N.J: Wiley, 2010.

Fontaine, Bruno M. La, and Patrick P. Naulleau. Extreme ultraviolet (EUV) lithography II: 28 February-3 March 2011, San Jose, California, United States. Edited by SPIE (Society). Bellingham, Wash: SPIE, 2011.

International Symposium on Electron, Ion, and Photon Beams (2nd 1984 Tarrytown, N.Y.). Proceedings of the 1984 International Symposium on Electron, Ion, and Photon Beams, 29 May-1 June, 1984, Westchester Marriott Hotel, Tarrytown, New York. Edited by Kelly J, American Vacuum Society, and American Institute of Physics. New York: Published for the American Vacuum Society by the American Institute of Physics, 1985.

Harper, Judith. The microelectronics market for imaging chemicals. Norwalk, CT: Business Communications Co., 1999.

Teex. Photolithography. Texas Engineering Extension, 1997.

Service, Texas Engineering Extension. Photolithography Overview. TEEX/Technology and Economic Development, 1997.

Peck, Harold L. Stripping: The Assembly of Film Images. 2nd ed. Graphic Arts Technical Fndtn, 1994.

Schnauss, Julius. Collotype And Photolithography: Together With An Appendix On Steam Presses. Kessinger Publishing, LLC, 2007.

Schnauss, Julius. Collotype and Photo-Lithography. Creative Media Partners, LLC, 2018.

Advances in resist technology and processing VIII: 4-5 March, 1991, San Jose, California. Bellingham, Wash., USA: SPIE, 1991.

Ito, Hiroshi. Advances in Resist Technology and Processing VIII: Proceedings, 4-5 March 1991 San Jose, California (Spie Proceedings Series, Vol 1466). SPIE-International Society for Optical Engine, 1991.

Kawata, Satoshi. Super Resolution in Optical Microscopy, Photolithography, Optical Memory and Micro-Spectroscopy. University of Cambridge ESOL Examinations, 2002.

Advances in thin film thermocouple durability under high temperature and pressure testing conditions. [Cleveland, Ohio]: National Aeronautics and Space Administration, Lewis Research Center, 1999.

Arce, Gonzalo R., and Xu Ma. Computational Lithography. Wiley & Sons, Incorporated, John, 2011.

Arce, Gonzalo R., and Xu Ma. Computational Lithography. Wiley & Sons, Incorporated, John, 2010.

Arce, Gonzalo R., and Xu Ma. Computational Lithography. Wiley & Sons, Incorporated, John, 2011.

Arce, Gonzalo R., and Xu Ma. Computational Lithography. Wiley & Sons, Incorporated, John, 2010.

Arce, Gonzalo R., and Xu Ma. Computational Lithography. Wiley & Sons, Incorporated, John, 2010.

Finley, Charles E., and Kenneth F. Hird. Offset Lithographic Technology. Goodheart-Willcox Publisher, 2009.