Books on the topic 'PECVD'
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Geiser, Juergen. Simulation of deposition processes with PECVD apparatus. Hauppauge, N.Y: Nova Science Publishers, 2011.
Find full textEkinci, Yasin. Fabrication and characterisation of PECVD nanocrystalline silicon thin films. Leicester: De Montfort University, 2000.
Find full textM, Pantic Dragan, Electrochemical Society, United States. National Aeronautics and Space Administration., and Symposium on Dielectric Films on Compound Semiconductors., eds. Electron beam induced damage in PECVD Si₃N₄ and SiO₂ films on InP. [Washington, D.C.]: NASA, 1990.
Find full textLamberton, R. W. A study of the microstructure and growth of ultra-thin film amorphous hydrogenated carbon (a-C:H) prepared by plasma enhanced chemical vapour deposition (PECVD). [s.l: The Author], 1998.
Find full textSpósito, Ernesto, Gabriela Moirano, and Viviana Barneche. PECV. Montevideo, Uruguay: IMM, Intendencia Municipal de Montevideo, 2004.
Find full textservice), SpringerLink (Online, ed. Low Pressure Plasmas and Microstructuring Technology. Berlin, Heidelberg: Springer-Verlag Berlin Heidelberg, 2009.
Find full textGreat Britain. Department of the Environment. Wastes Technical Division., Warren Spring Laboratory, and Aspinwall and Company, eds. Development of the national household waste analysis programme: Summary report : prepared on behalf of the Department of the Environment under Research Contract PECD 7/10/288. London: Department of the Environment, Wastes Technical Division, 1993.
Find full textChen, Junhong, Zheng Bo, and Ganhua Lu. Vertically-Oriented Graphene: PECVD Synthesis and Applications. Springer London, Limited, 2015.
Find full textChen, Junhong, Zheng Bo, and Ganhua Lu. Vertically-Oriented Graphene: PECVD Synthesis and Applications. Springer, 2015.
Find full textBo, Zheng, Chen Junhong, and Lu Ganhua. Vertically-Oriented Graphene: PECVD Synthesis and Applications. Springer, 2016.
Find full textDie Kombination von Plasmanitrierung und plasmagestützter Schichtabscheidung aus der Gasphase (PACVD) in einem Verfahrensablauf. Berlin, Heidelberg: Springer Berlin Heidelberg, 1998.
Find full textSimulation of Deposition Processes with PECVD Apparatus: Theory and Applications. Nova Science Publishers, Incorporated, 2019.
Find full textJohnson, Erik Verne. Hydrogenated microcrystalline silicon thin film growth in the DC saddle field PECVD system. 2006.
Find full textThe PERCVD Principles. Steeltown Publishing LLC, 2011.
Find full textFranz, Gerhard. Low Pressure Plasmas and Microstructuring Technology. Springer, 2010.
Find full textJackson, C. P. Flow and Transport in the Unsaturated Zone: Final Report for Contract PECD 7/9/260. AEA Technology Plc, 1986.
Find full textMapping the distribution of metal contamination in United Kingdom estuaries: Final Report on DoE contrct PECD 7/7/280. Plymouth, U.K: Plymouth Marine Laboratory, 1992.
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