Academic literature on the topic 'Organo-hydrides'

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Journal articles on the topic "Organo-hydrides"

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Meng, Fan-kun, and Xiao-qing Zhu. "Elemental steps of the thermodynamics of dihydropyrimidine: a new class of organic hydride donors." Organic & Biomolecular Chemistry 15, no. 1 (2017): 197–206. http://dx.doi.org/10.1039/c6ob02195f.

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van der Kerk, G. J. M., J. G. Noltes, and J. G. A. Luijten. "Investigations on organo-tin compounds. VIII. preparation of some organo-tin hydrides." Journal of Applied Chemistry 7, no. 7 (May 4, 2007): 366–69. http://dx.doi.org/10.1002/jctb.5010070704.

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van der Kerk, G. J. M., J. G. Noltes, and J. G. A. Luijten. "Investigations on organo-tin compounds. VII the addition of organo-tin hydrides to olefinic double bonds." Journal of Applied Chemistry 7, no. 7 (May 4, 2007): 356–65. http://dx.doi.org/10.1002/jctb.5010070703.

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Van Kerk, G. J. M. Der, and J. C. Noltes. "Investigations on organo-tin compounds. X. The addition of organo-tin hydrides to carbon-carbon unsaturated compounds." Journal of Applied Chemistry 9, no. 2 (May 4, 2007): 106–13. http://dx.doi.org/10.1002/jctb.5010090208.

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Bruno, Joseph W., H. A. Stecher, Lester R. Morss, David C. Sonnenberger, and Tobin J. Marks. "Organo-f-element thermochemistry. Thorium vs. uranium and ancillary ligand effects on metal-ligand bond disruption enthalpies in bis(pentamethylcyclopentadienyl)actinide bis(hydrocarbyls) and bis(pentamethylcyclopentadienyl) alkoxy actinide hydrides and hydrocarbyls." Journal of the American Chemical Society 108, no. 23 (November 1986): 7275–80. http://dx.doi.org/10.1021/ja00283a023.

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Pichler, Johann, Ana Torvisco, Patrick Bottke, Martin Wilkening, and Frank Uhlig. "Novel amino propyl substituted organo tin compounds." Canadian Journal of Chemistry 92, no. 6 (June 2014): 565–73. http://dx.doi.org/10.1139/cjc-2013-0504.

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In this work, a new synthetic pathway yielding unprotected amino propyl tin compounds is described. For this purpose, mono stannanes with different substitution patterns are used. In a first step, tin hydrides are deprotonated using lithium diisopropyl amide and mixed with an electrophile containing a protected amine in the ω-position. After deprotection via acidic hydrolysis, the desired amino propyl tin compounds are obtained in high yield and purity. The thermal reaction behavior of the amino propyl tin hydrohalide intermediates containing one aromatic residue at the central tin atom is also investigated. For this purpose, amino propyl tin hydrohalides are heated under vacuum until the aromatic hydrocarbon is liberated. This thermal treatment leads to so far unknown tin halides containing an amino propyl side chain. For all of these substances detailed liquid 1H, 13C, and 119Sn-nuclear magnetic resonance (NMR) data were obtained, and in one case solid state NMR is also conducted. Regarding solids, single crystal X-ray analysis is performed. Some derivatization reactions with these new substances are demonstrated, especially the synthesis of an amino propyl tin carboxylate, which might be very interesting for biological, pharmaceutical, or technical processes.
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Uzelac, Marina, Kang Yuan, Gary Stephen Nichol, and Michael James Ingleson. "Formation of a hydride containing amido-zincate using pinacolborane." Dalton Transactions, 2021. http://dx.doi.org/10.1039/d1dt02580e.

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Amido-zincates containing hydrides are underexplored yet potentially useful complexes. Attempts to access this type of zincate through combining amido-organo zincates and pinacolborane (HBPin) via a Zn-C / H-B exchange led...
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Lim, Chern-Hooi, Aaron M. Holder, James T. Hynes, and Charles B. Musgrave. "ChemInform Abstract: Catalytic Reduction of CO2by Renewable Organo-Hydrides." ChemInform 47, no. 39 (September 2016). http://dx.doi.org/10.1002/chin.201639230.

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Humphreys, Bedwyr, and Matthew Govett. "ECR RIE-Enhanced Low Pressure Plasma Etching of GaN/InGaN/AlGaN Heterostructures." MRS Internet Journal of Nitride Semiconductor Research 1 (1996). http://dx.doi.org/10.1557/s1092578300002003.

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A room temperature (RT) plasma etch process has been developed to non-selectively etch GaN/InGaN/AlGaN structures, grown on sapphire substrates, using an electron cyclotron resonance (ECR) plasma source with RIE enhancement. The process chemistry chosen was Cl2/CH4 based in order to facilitate the formation of volatile etch by-products, typically to form group III halides and group V hydrides, although indium is more likely to form an organo-metallic compound as opposed to a chloride. A characteristic of this process is the very smooth sidewall features obtained and the controllability of the etch profile via ECR power, table bias and/or gas flow ratio. Typical results obtained using a RT process were etch rate above 100 nm/min., selectivity to resist mask above 30:1 and smooth anisotropic profile at low ion-energies (below 100 eV). The process etch rate showed a characteristic increase with increasing table bias (above 130 nm/min.) with only small changes in the relative etch rate of each compound (i.e. selectivity maintained at roughly 1:1), however, this etch does rely upon competing etching and deposition mechanisms and thus too large a variation in one parameter without a corresponding compensation with another leads to a rough surface and a more selective etch. The process has also been demonstrated using a metal mask (e.g. Ni) and present work is progressing onto other gas combinations and the use of high temperature electrodes.
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Books on the topic "Organo-hydrides"

1

Environmental chemistry of the heavy elements: Hydrido and organo compounds. New York, N.Y: VCH, 1995.

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Environmental Chemistry of the Heavy Elements: Hydrido and Organo Compounds. Wiley & Sons, Incorporated, John, 1995.

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Book chapters on the topic "Organo-hydrides"

1

Oshima, K. "Substitution of Halo(organo)germanium Hydrides." In Compounds of Group 14 (Ge, Sn, Pb), 1. Georg Thieme Verlag KG, 2003. http://dx.doi.org/10.1055/sos-sd-005-00013.

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Oshima, K. "Substitution of Halogen in Halo(organo)germanium Hydrides." In Compounds of Group 14 (Ge, Sn, Pb), 1. Georg Thieme Verlag KG, 2003. http://dx.doi.org/10.1055/sos-sd-005-00015.

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