Relevant bibliographies by topics / Optical metrology

Academic literature on the topic 'Optical metrology'

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Published: 4 June 2021
Last updated: 22 June 2024

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Journal articles on the topic "Optical metrology"

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Williams, D. C. "Optical metrology." Optics & Laser Technology 20, no. 3 (June 1988): 163. http://dx.doi.org/10.1016/0030-3992(88)90048-5.

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Burch, J. M. "Optical metrology." Optics & Laser Technology 20, no. 2 (April 1988): 105. http://dx.doi.org/10.1016/0030-3992(88)90101-6.

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Baker, L. R. "Optical Metrology." Journal of Modern Optics 35, no. 5 (May 1988): 753–54. http://dx.doi.org/10.1080/09500348814550801.

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YOSHIZAWA, Toru. "Optical metrology." Journal of the Japan Society for Precision Engineering 75, no. 1 (2009): 93–94. http://dx.doi.org/10.2493/jjspe.75.93.

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Gasvik, K. J., and J. M. Burch. "Optical metrology." Precision Engineering 10, no. 3 (July 1988): 164. http://dx.doi.org/10.1016/0141-6359(88)90036-0.

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Walker, C. A. "Optical metrology." Optics and Lasers in Engineering 8, no. 2 (January 1988): 144. http://dx.doi.org/10.1016/0143-8166(88)90052-8.

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Osborne, Ian S. "Shrinking optical metrology." Science 361, no. 6402 (August 9, 2018): 564.10–566. http://dx.doi.org/10.1126/science.361.6402.564-j.

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Parks, Robert E. "Optical wavefront metrology." Optics and Photonics News 2, no. 5 (May 10, 1991): 12. http://dx.doi.org/10.1364/opn.2.5.000012.

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Udem, Th, R. Holzwarth, and T. W. Hänsch. "Optical frequency metrology." Nature 416, no. 6877 (March 2002): 233–37. http://dx.doi.org/10.1038/416233a.

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Day, Gordon W., and Douglas L. Franzen. "Optical Fiber Metrology." Journal of Lightwave Technology 26, no. 9 (May 2008): 1119–31. http://dx.doi.org/10.1109/jlt.2008.923624.

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Dissertations / Theses on the topic "Optical metrology"

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Lee, Woei Ming. "Optical trapping : optical interferometric metrology and nanophotonics." Thesis, St Andrews, 2010. http://hdl.handle.net/10023/882.

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Sawyer, Nicolas B. E. "Novel optical surface metrology methods." Thesis, University of Nottingham, 1999. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.287239.

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Logan, Randy. "Optical metrology of thin films." Thesis, Massachusetts Institute of Technology, 1997. http://hdl.handle.net/1721.1/46094.

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Huang, Zixin. "Protocols for optical quantum metrology." Thesis, The University of Sydney, 2018. http://hdl.handle.net/2123/18067.

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This thesis explores various protocols which can be applied to quantum metrology, such that precision of the measurement can beat the best classical approaches. We first demonstrate that ancilla-assisted schemes can improve phase estimation in the presence of noise, and we propose an experiment to demonstrate these effects. Given that the use of ancillae helps, it is no surprise that there are noisy channels for which the optimal strategy may depend on the noise level. We show that there is a non-trivial crossover between the ancilla-assisted strategy and the parallel-entangled strategy for Pauli noise channels and the amplitude damping channel. We see that under certain circumstances, the environment cannot access the parameter of interest. We then integrated techniques from quantum communication, to derive a general framework that renders quantum metrology protocols into cryptographic ones. Here the protocol is unconditionally secure if the trusted parties wish only to achieve the standard quantum limit. If Heisenberg-limited precision is to be achieved, they sacrifice some security, where adversaries can access information, but only at the risk of getting caught at it (cheat-sensitivity). In many scenarios, the quantum Fisher information is achieved for only one value of the phase. In a particular phase estimation scheme that measures the parity at the output of a Mach-Zehnder interferometer where the input is a two-mode squeezed vacuum, this problem is particularly imminent. We apply an adaptive technique to resolve this issue, showing that one can achieve precisions substantially below the shot noise limit. The key to a quadratically enhanced improvement in quantum metrology is entanglement. Finally, we demonstrate in a photonic system how high-dimensional entanglement can be certified, and provide an alternate interpretation of entanglement from an information-theoretic perspective.
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Ji, Zheng. "The Use of Optical Metrology in Active Positioning of a Lens." Thesis, University of North Texas, 2014. https://digital.library.unt.edu/ark:/67531/metadc699892/.

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Precisely positioned optical lenses are currently required for many highly repetitive mechanics and applications. Thus the need for micron-scale repetition between opto-mechanical units is evident, especially in industrial manufacturing and medical breakthroughs. In this thesis, a novel optical metrology system is proposed, designed, and built whose purpose is to precisely locate the center of a mechanical fixture and then to assemble a plano-convex optical lens into the located position of the fixture. Center location specifications up to ±3 µm decenter and ±0.001° tilting accuracy are required. Nine precisely positioned lenses and fixtures were built with eight units passing the requirements with a repetitive standard deviation of ±0.15 µm or less. The assembled units show satisfactory results.
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Idowu, Ade. "Dynamic metrology of error motions in precision spindles using optical metrology." Thesis, Cranfield University, 1998. http://dspace.lib.cranfield.ac.uk/handle/1826/3688.

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Knowledge of the accuracies of air bearing spindles in the sub-micrometre to nanometre range is required for the design, commissioning and operation of ultra-precise machine tools, measurement systems and other machines employing high precision rotational motion. In order to verify the dynamic performance of a spindle, measurement is required of its error motions in the unwanted five degrees of freedom (one axial, two tilts and two radial motions). Presentation of these error motions (eg in the form of polar charts) can then be used to provide critical spindle metrology data including total, asynchronous and average error motion rosette profiles and their average and peak values. This thesis describes a metrology system based on optical interferometry for measuring such unwanted error motions in three degrees of freedom involving motion along the spindle axis (axial rectilinear displacement and tilts about orthogonal axes), incurred with rotation of a precision air spindle over its specified speed-range. The system is not sensitive to orthoaxial translations which may be measured using alternative methods. Possible alternative techniques for measuring any of the degrees of freedom include an array of proximity sensors, (one for each translational degree of freedom and a further one for each of the other rotational degrees of freedom), to measure the run-out of an artefact. Proximity sensors based upon capacitive or optical fibre back-scatter techniques each offer the required single degree-of-freedom non-contacting capability and bandwidth. In the current work, a Fizeau interferometer is used to monitor the motion of the spindle of a vertical axis ultra-precision facing machine using a test-artefact. This is a mirror with less than one fringe departure from planarity from which interferogram. fringe-patterns are captured, digitised and analysed synchronously as the spindle rotates. The issue of the prediction of the dynamic form and motions of the observed interferograrn arises and the earlier theory is extended to optimise the set-up, including provision of automatic servo- alignment of the optical axis with the axis of the spindle. Measurement interferograrn data is sampled at selected angular incremental positions of spindle-rotation and image processing techniques used to filter the fringe pattern, enabling measurement of spindle tilt and axial displacement. Issues of sampling with respect to the anticipated spatial angular frequency of the spindle run-out are considered with respect to the speed/frequency capability of data-acquisition and processing arrangements. Essentially, with a spindle rotating at typical machining speeds of 300- 3000 rev/min, for consistent error motions, the resolution of an error plot is principally a function of observational time. It is foreseen that the system will be applicable in research and production-support in ultra-precision machining production processes and in rotational metrology.
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Seong, Kibyung. "Optical Metrology for Transmission Interferometric Testing." Diss., The University of Arizona, 2008. http://hdl.handle.net/10150/194698.

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The degree of sophistication and customization available in optical components has been driven by advances in lens design and fabrication. The optical testing of these components remains a challenge. In particular, the precision measurement of the properties of transmissive optics such as transmitted wavefront, surface figure, and index of refraction continues to require new methodology tools.A method of surface figure measurement is described based on the transmitted wavefront of an optical element obtained from a Mach-Zehnder interferometer. Given known values for the refractive index and center thickness, along with the sample's transmitted wavefront, the unknown surface profile is reconstructed in a deterministic way. The technique relies on knowledge of one of the surfaces of the element, such as an easy to measure plano or spherical surface, and is well-suited for testing aspheric surfaces. Additionally, this method has the advantage of making measurements on multiplexed surfaces, such as a lenslet array.Since the index of refraction of materials varies with wavelength, the test sample undergoes chromatic effects with wavelength. Chromatic aberration is an important concern whenever optics are designed for use in the visible spectrum. A method has been presented for obtaining the longitudinal chromatic aberration of a test part from the transmitted wavefronts at 5 different wavelengths. The longitudinal chromatic aberration measurements on a plano-convex lens and an achromat are presented.Injection molding is becoming a popular manufacturing method for optical plastic elements because of low cost and mass production. During injection molding, the plastic lenses undergo large pressure and temperature changes so that the resulting lens has a spatially-varying index. Since the index is assumed to be a single number in the design stage, except for index-gradient lenses, an inhomogeneous index of the sample can cause a decrease in optical performance. The surface reconstruction algorithm can be modified to find two dimensional index values over the test aperture. In this case, both surfaces are measured by an external interferometer and one unknown parameter is the index value.
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Tsatourian, Veronika. "Femtosecond combs for optical frequency metrology." Thesis, Heriot-Watt University, 2014. http://hdl.handle.net/10399/2747.

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This thesis is dedicated to femtosecond combs as a tool for optical frequency metrology and as an integral part of an optical clock. After an overview of optical frequency measurement techniques, the design of two frequency combs based on mode-locked femtosecond lasers as they were at the beginning of my project is described. The first comb is based on an Er:fibre laser operating at a central wavelength of 1550 nm with a repetition rate of 100 MHz. The second is a Ti:sapphire-laser-based comb operating at a central wavelength of 810 nm with a repetition rate of 87 MHz. Improvements to the original design of the Ti:sapphire comb are detailed in the next chapter. A novel f-to-2f self-referencing scheme based on a pair of Wollaston prisms and employing a PPKTP crystal for SHG results in up to 20 dB enhancement of the signal to noise ratio in the carrier-envelope offset frequency beat signal f0 and in up to 15 dB lower phase noise in the f0 beat signal compared to a Michelson interferometer based system. Next, the factors influencing the stability and accuracy of the microwave reference signal and the performance of two synthesisers used for the stabilisation of the frequency combs were investigated. It is shown that stability of the maser reference signal is reduced by the distribution system by factor of 1.5. A fractional frequency change of 4.1(0.7) × 10−16 (K/h)−1 was measured for the better of the two synthesisers (an IFR 2023A) indicating that for accurate frequency measurements the synthesiser signal should be monitored to enable systematic frequency corrections to be made. Finally, an absolute frequency measurement of the electric quadrupole clock transition in a frequency standard based on a single 171Yb+ trapped ion is described. The result f = 688 358 979 309 310 ± 9 Hz agrees with an independent measurement made by the PTB group within the uncertainty of the measurements.
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Huang, Run. "High Precision Optical Surface Metrology using Deflectometry." Diss., The University of Arizona, 2015. http://hdl.handle.net/10150/581252.

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Software Configurable Optical Test System (SCOTS) developed at University of Arizona is a highly efficient optical metrology technique based on the principle of deflectometry, which can achieve comparable accuracy with interferometry but with low-cost hardware. In a SCOTS test, an LCD display is used to generate structured light pattern to illuminate the test optics and the reflected light is captured by a digital camera. The surface slope of test optics is determined by triangulation of the display pixels, test optics, and the camera. The surface shape is obtained by the integration of the slopes. Comparing to interferometry, which has long served as an accurate non-contact optical metrology technology, SCOTS overcomes the limitation of dynamic range and sensitivity to environment. It is able to achieve high dynamic range slope measurement without requiring null optics. In this dissertation, the sensitivity and performance of the test system have been analyzed comprehensively. Sophisticated calibrations of system components have been investigated and implemented in different metrology projects to push this technology to a higher accuracy including low-order terms. A compact on-axis SCOTS system lowered the testing geometry sensitivity in the metrology of 1-meter highly aspheric secondary mirror of Large Binocular Telescope. Sub-nm accuracy was achieved in testing a high precision elliptical X-ray mirror by using reference calibration. A well-calibrated SCOTS was successfully constructed and is, at the time of writing this dissertation, being used to provide surface metrology feedback for the fabrication of the primary mirror of Daniel K. Inouye Solar Telescope which is a 4-meter off-axis parabola with more than 8 mm aspherical departure.
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Holmes, R. D. "Coherent optical detection techniques in surface metrology." Thesis, University of Nottingham, 1995. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.294698.

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Books on the topic "Optical metrology"

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Soares, Olivério D. D., ed. Optical Metrology. Dordrecht: Springer Netherlands, 1987. http://dx.doi.org/10.1007/978-94-009-3609-6.

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Gasvik, Kjell J. Optical metrology. 2nd ed. Chichester: Wiley, 1995.

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Laboratory, National Physics, ed. Optical metrology. Teddington: NPL, 1991.

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Optical metrology. 3rd ed. West Sussex, Eng: J. Wiley & Sons, 2002.

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Gåsvik, Kjell J. Optical metrology. Chichester: Wiley, 1987.

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Optical metrology. 2nd ed. Chichester: J. Wiley, 1995.

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Osten, Wolfgang, and Nadya Reingand, eds. Optical Imaging and Metrology. Weinheim, Germany: Wiley-VCH Verlag GmbH & Co. KGaA, 2012. http://dx.doi.org/10.1002/9783527648443.

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Williams, D. C., ed. Optical Methods in Engineering Metrology. Dordrecht: Springer Netherlands, 1993. http://dx.doi.org/10.1007/978-94-011-1564-3.

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C, Williams D. Optical Methods in Engineering Metrology. Dordrecht: Springer Netherlands, 1993.

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C, Williams D., ed. Optical methods in engineering metrology. London: Chapman & Hall, 1993.

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Book chapters on the topic "Optical metrology"

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Stetson, Karl A. "Speckle Metrology." In Optical Metrology, 499–512. Dordrecht: Springer Netherlands, 1987. http://dx.doi.org/10.1007/978-94-009-3609-6_32.

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Froehly, Claude. "Picosecond Metrology." In Optical Metrology, 649–71. Dordrecht: Springer Netherlands, 1987. http://dx.doi.org/10.1007/978-94-009-3609-6_43.

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Almeida, Silverio P., and Luis M. Bernardo. "Phase Conjugation Metrology." In Optical Metrology, 467–80. Dordrecht: Springer Netherlands, 1987. http://dx.doi.org/10.1007/978-94-009-3609-6_30.

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Soares, O. D. D., and A. O. S. Gomes. "Laser Dimensional Metrology." In Optical Metrology, 24–58. Dordrecht: Springer Netherlands, 1987. http://dx.doi.org/10.1007/978-94-009-3609-6_4.

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Caulfield, H. J. "Optical Metrology - Some Personal Reflections." In Optical Metrology, 3–10. Dordrecht: Springer Netherlands, 1987. http://dx.doi.org/10.1007/978-94-009-3609-6_1.

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Kiliçkaya, M. S., and N. Ekem. "Velocity Measurements in a Rotating Tank Using an LDV System." In Optical Metrology, 101–9. Dordrecht: Springer Netherlands, 1987. http://dx.doi.org/10.1007/978-94-009-3609-6_10.

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Schulz-DuBois, E. O. "Sizing of Microscopic Particles by Photon Correlation." In Optical Metrology, 110–29. Dordrecht: Springer Netherlands, 1987. http://dx.doi.org/10.1007/978-94-009-3609-6_11.

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Almeida, Silverio P., and Srisuda Puang-ngern. "Optical Fourier Transform Construction." In Optical Metrology, 133–46. Dordrecht: Springer Netherlands, 1987. http://dx.doi.org/10.1007/978-94-009-3609-6_12.

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Almeida, Silverio P. "Optical Metrology of Fish Scales." In Optical Metrology, 147–55. Dordrecht: Springer Netherlands, 1987. http://dx.doi.org/10.1007/978-94-009-3609-6_13.

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Almeida, Silverio P. "Hybrid Coherent Optical and Electronic Filtering." In Optical Metrology, 156–72. Dordrecht: Springer Netherlands, 1987. http://dx.doi.org/10.1007/978-94-009-3609-6_14.

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Conference papers on the topic "Optical metrology"

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Ge, Cheng-liang, Guo-bin Fan, Zhi-qiang Liu, Zheng-dong Li, Jian-tao Wu, Zhi-wei Huang, and Zheng Liang. "Novel real-time infrared image processor with ADSP." In Optical Metrology, edited by Wolfgang Osten, Christophe Gorecki, and Erik L. Novak. SPIE, 2005. http://dx.doi.org/10.1117/12.607001.

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Puente Leon, Fernando. "An objective measure of the quality of honed surfaces." In Optical Metrology, edited by Wolfgang Osten, Christophe Gorecki, and Erik L. Novak. SPIE, 2005. http://dx.doi.org/10.1117/12.608161.

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Papp, Zsolt, Janos Kornis, and Balazs Gombkoto. "New methods in recording and reconstruction of digital holograms." In Optical Metrology, edited by Wolfgang Osten, Malgorzata Kujawinska, and Katherine Creath. SPIE, 2003. http://dx.doi.org/10.1117/12.503361.

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Tsamasphyros, George J., George N. Kanderakis, Nikolaos K. Furnarakis, and Zaira P. Marioli-Riga. "Detection of patch debonding in composite repaired cracked metallic specimens, using optical fibers and sensors." In Optical Metrology, edited by Christophe Gorecki. SPIE, 2003. http://dx.doi.org/10.1117/12.503774.

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Smolka, Bogdan, Rastislav Lukac, Konstantinos N. Plataniotis, and Anastasios N. Venetsanopoulos. "Robust retrieval of fine art paintings." In Optical Metrology, edited by Renzo Salimbeni. SPIE, 2003. http://dx.doi.org/10.1117/12.504101.

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Smolka, Bogdan, Rastislav Lukac, Konstantinos N. Plataniotis, and Anastasios N. Venetsanopoulos. "Nonparametric technique of noise reduction in color images." In Optical Metrology, edited by Renzo Salimbeni. SPIE, 2003. http://dx.doi.org/10.1117/12.504102.

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Bartolini, Franco, Mauro Barni, Roberto Caldelli, Massimiliano Corsini, Vito Cappellini, Alessia De Rosa, Andrea Del Mastio, Alessandro Piva, and Alessandro Nozzoli. "Research of the Image Processing and Communications Lab. of the University of Florence in the cultural heritage field." In Optical Metrology, edited by Renzo Salimbeni. SPIE, 2003. http://dx.doi.org/10.1117/12.504620.

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Bartolini, Franco, Vito Cappellini, Andrea Del Mastio, and Alessandro Piva. "Applications of image processing technologies to fine arts." In Optical Metrology, edited by Renzo Salimbeni. SPIE, 2003. http://dx.doi.org/10.1117/12.504630.

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Giamello, Marco, Francesca Droghini, Giovanni Guasparri, Sonia Mugnaini, Walter Romussi, Giuseppe Sabatini, and Andrea Scala. "Advanced information system for the investigation of the deterioration of the floor in the Cathedral of Siena." In Optical Metrology, edited by Renzo Salimbeni. SPIE, 2003. http://dx.doi.org/10.1117/12.506160.

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Salimbeni, Renzo, Roberto Pini, and Salvatore Siano. "The Optocantieri project: toward a synergy between optoelectronics and information science for cultural heritage conservation." In Optical Metrology, edited by Renzo Salimbeni. SPIE, 2003. http://dx.doi.org/10.1117/12.506181.

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Reports on the topic "Optical metrology"

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Casasent, David, and C. L. Wilson. Optical metrology for industrialization of optical information processing. Gaithersburg, MD: National Institute of Standards and Technology, 1997. http://dx.doi.org/10.6028/nist.ir.6060.

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Kleppner, Daniel. Optical Metrology with Cold Trapped Hydrogen. Fort Belvoir, VA: Defense Technical Information Center, November 2010. http://dx.doi.org/10.21236/ada534157.

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McNeil, J. R. Instrumentation to Enhance Optical Scatterometry for Semiconductor Metrology Development. Fort Belvoir, VA: Defense Technical Information Center, January 1998. http://dx.doi.org/10.21236/ada354189.

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Krukar, Richard, and John McNeil. Overlay and Grating Line Shape Metrology Using Optical Scatterometry. Fort Belvoir, VA: Defense Technical Information Center, October 1993. http://dx.doi.org/10.21236/adb176711.

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Glushko, E. Ya, and A. N. Stepanyuk. Pneumatic photonic crystals: properties and application in sensing and metrology. [б. в.], 2018. http://dx.doi.org/10.31812/123456789/2875.

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A pneumatic photonic crystal i.e. a medium containing regularly distributed gas-filled voids divided by elastic walls is proposed as an optical indicator of pressure and temperature. The indicator includes layered elastic platform, optical fibers and switching valves, all enclosed into a chamber. We have investigated theoretically distribution of deformation and pressure inside a pneumatic photonic crystal, its bandgap structure and light reflection changes depending on external pressure and temperature.
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Postek, Michael T., Andras E. Vladar, Bin Ming, and Benjamin Bunday. Documentation for Reference Material (RM) 8820 : A Versatile, Multipurpose Dimensional Metrology Calibration Standard for Scanned Particle Beam, Scanned Probe and Optical Microscopy. National Institute of Standards and Technology, March 2014. http://dx.doi.org/10.6028/nist.sp.1170.

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Beckwith, J. F., S. R. Patterson, D. C. Thompson, V. Badami, and S. Smith. Metrology of 13-nm optics for extreme ultraviolet lithography. Office of Scientific and Technical Information (OSTI), February 1997. http://dx.doi.org/10.2172/507835.

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Estler, W. Tyler, and Edward B. Magrab. Validation metrology of the large optics diamond turning machine. Gaithersburg, MD: National Bureau of Standards, January 1985. http://dx.doi.org/10.6028/nbs.ir.85-3182.

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Osher, Stanley, and Leonid Rudin. Feature-Oriented Image Reconstruction and Aero-Optic Metrology in Turbulence. Fort Belvoir, VA: Defense Technical Information Center, November 1994. http://dx.doi.org/10.21236/ada290269.

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Vorburger, T. V., C. J. Evans, and W. T. Estler. Rationale and procedures for development of a NASA primary metrology laboratory for large optics. Gaithersburg, MD: National Institute of Standards and Technology, 2001. http://dx.doi.org/10.6028/nist.ir.6710.

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