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Journal articles on the topic 'Novolak'

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Author: Grafiati

Published: 4 June 2021

Last updated: 7 February 2022

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1

Rokhati, Nur, and Aji Prasetyaningrum. "PEMBUATAN RESIN PHENOL FORMALDEHID TERHADAP APLIKASINYA SEBAGAI VERNIS." Reaktor 12, no. 1 (April 8, 2008): 42. http://dx.doi.org/10.14710/reaktor.12.1.42-47.

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Phenol formaldehid termasuk kelompok resin sintetis yang dihasilkan dari reaksi polimerisasi antara phenol dengan formaldehid. Ada dua jenis resin phenol formaldehid yaitu : novolak yang bersifat termoplast dan resol yang bersifat termoset. Phenol formaldehid dapat diaplikasikan sebagai vernis karena dapat membentuk lapisan film yang kering.Penelitian dilakukan dengan mereaksikan phenol dan formaldehid dengan pH dan perbandingan mol bervariasi. Jenis novolak dibuat pada suasana asam dengan penambahan HCl, suhu 900C, dan waktu reaksi 5 jam, sedangkan jenis resol dibuat pada suasana basa dengan penambahan NaOH, suhu 800C dan waktu reaksi 3 jam. Hasil resin phenol formaldehid diaplikasikan sebagai vernis pada kayu jati. Hasil penelitian menunjukkan bahwa dengan bertambahnya pH dan perbandingan reaktan, waktu kering semakin lama. Kondisi optimum jenis novolak diperoleh pada pH 2,5 dan perbandingan reaktan 1 : 0,8, sedangkan untuk jenis resol dicapai pada pH 10 dan perbandingan mol reaktan 1 : 2. Aplikasi jenis novolak sebagai vernis kayu menghasilkan warna yang lebih cerah (tingkat gloss tinggi) dibanding dengan jenis resol

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2

Hawkins, E. G. E. "Degradation of novolak resins." Journal of Applied Chemistry 6, no. 4 (May 4, 2007): 131–39. http://dx.doi.org/10.1002/jctb.5010060402.

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3

Li, Gai Yun, and Te Fu Qin. "Novolak Type Phenol Formaldehyde Resin from Waste Brown-Rotted Wood." Advanced Materials Research 217-218 (March 2011): 490–94. http://dx.doi.org/10.4028/www.scientific.net/amr.217-218.490.

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The waste brown-rotted wood was liquefied in phenol with phosphoric acid as a catalyst and the resulting liquefied products were condensed with formaldehyde to yield novolak liquefied wood-based phenol formaldehyde resin (LWF). The results showed that brown-rotted wood could be almost completely liquefied within 0.5 h at phenol to wood (P/W) ratio 2. An increase in P/W ratio from 2 to 3 slightly improved the flow property of LWF, but accompanied by decreasing the product yield from approximately 140 to 120 %. The increase of liquefaction time from 30 min to 60 min did not have a significant influence on the resulting LWF. The thermofluidity of LWF were compared to that of the commercial novolak PF resin, and could be used to make moldings with similar thermal property and mechanical properties to those obtained from the conventional novolak PF resin.

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4

Shih, Hsiao-Yi, and Arnost Reiser. "Percolation View of Novolak Dissolution. 6. The Acceleration of Novolak Dissolution by Phenolic Additives." Macromolecules 30, no. 13 (June 1997): 3855–59. http://dx.doi.org/10.1021/ma9700800.

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5

WANG, Xiuxun, Hiromu SAITO, and Takashi INOUE. "Miscibility of Polyoxymethylene with Novolak Resin." KOBUNSHI RONBUNSHU 48, no. 7 (1991): 443–47. http://dx.doi.org/10.1295/koron.48.443.

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6

Wanat, Stanley F. "Novolak resins and the microelectronic revolution." Journal of Micro/Nanolithography, MEMS, and MOEMS 7, no. 3 (July 1, 2008): 033008. http://dx.doi.org/10.1117/1.2968268.

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7

Yamagishi, Tada-Aki, Masahiro Nomoto, Shouhei Yamashita, Toshio Yamazaki, Yoshiaki Nakamoto, and Shin-ichiro Ishida. "Characterization of high molecular weight novolak." Macromolecular Chemistry and Physics 199, no. 3 (March 1, 1998): 423–28. http://dx.doi.org/10.1002/(sici)1521-3935(19980301)199:3<423::aid-macp423>3.0.co;2-n.

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8

Bajdur, Wioletta M., and Wies?aw W. Su?kowski. "Polyelectrolytes from NS-novolak production waste." Journal of Applied Polymer Science 89, no. 11 (June 27, 2003): 3000–3005. http://dx.doi.org/10.1002/app.12425.

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9

Paniez, P., A. Schiltz, M. J. Bouzid, and E. Dechenaux. "Thermal flow properties of novolak polymers." Microelectronic Engineering 9, no. 1-4 (May 1989): 585–89. http://dx.doi.org/10.1016/0167-9317(89)90125-1.

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10

Horibe, Hideo. "Novolak Resist Removal Using Laser (266/532nm)." Journal of Photopolymer Science and Technology 18, no. 6 (2005): 665–71. http://dx.doi.org/10.2494/photopolymer.18.665.

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11

ZHENG, Hongfei, Zhihong LI, and Yumei ZHU. "Bismaleimide Modified by Allyl Novolak for Superabrasives." Chinese Journal of Chemical Engineering 15, no. 2 (March 2007): 302–4. http://dx.doi.org/10.1016/s1004-9541(07)60075-5.

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12

Reiser, A., J. P. Huang, X. He, T. F. Yeh, S. Jha, H. Y. Shih, M. S. Kim, Y. K. Han, and K. Yan. "The molecular mechanism of novolak–diazonaphthoquinone resists." European Polymer Journal 38, no. 4 (April 2002): 619–29. http://dx.doi.org/10.1016/s0014-3057(01)00230-0.

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13

Huang, Jian Ping, T. K. Kwei, and Arnost Reiser. "The dissolution of novolak in aqueous alkali." Macromolecules 22, no. 10 (October 1989): 4106–12. http://dx.doi.org/10.1021/ma00200a051.

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14

Paniez, P., and G. Amblard. "Commercial dyes for novolak based multilayer systems." Microelectronic Engineering 5, no. 1-4 (December 1986): 321–27. http://dx.doi.org/10.1016/0167-9317(86)90060-2.

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15

Dante, Roberto, Roberto Dante, Andrea Sliepcevich, Marco Andreoni, Mario Cotilli, and Mario Cotilli. "Interference between Tin Sulfides, Graphite and Novolak Oxidation." SAE International Journal of Materials and Manufacturing 11, no. 1 (March 7, 2017): 89–93. http://dx.doi.org/10.4271/05-11-01-0009.

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16

Kojima, Yoshikatsu, Yukinori Ochiai, and Shinji Matsui. "Focused Ion Beam Lithography Using Novolak-Based Resist." Japanese Journal of Applied Physics 27, Part 2, No. 9 (September 20, 1988): L1780—L1782. http://dx.doi.org/10.1143/jjap.27.l1780.

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17

Yeh, Tung Feng, Hsiao Yi Shih, and Arnost Reiser. "Percolation view of novolak dissolution and dissolution inhibition." Macromolecules 25, no. 20 (September 1992): 5345–52. http://dx.doi.org/10.1021/ma00046a037.

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18

Cirino, Giuseppe Antonio, Ana Paula Mousinho, Ronaldo Domingues Mansano, Patrick Verdonck, Luiz Goncalves Neto, and Antonio Carlos Seabra. "Fabrication of Microlenses With a Novolak-type Polymer." Molecular Crystals and Liquid Crystals 374 (2002): 153–58. http://dx.doi.org/10.1080/713738256.

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19

Yoshimura, Toshiyuki, Naoko Asai, Hiroshi Shiraishi, Minoru Toriumi, and Shinji Okazaki. "Formation of Fractionated Novolak Resin Langmuir-Blodgett Films." Japanese Journal of Applied Physics 32, Part 2, No. 4B (April 15, 1993): L631—L632. http://dx.doi.org/10.1143/jjap.32.l631.

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20

Reiser, Arnost, Hsiao-Yi Shih, Tung-Feng Yeh, and Jian-Ping Huang. "Novolak-Diazochinon-Photoresiste: abbildende Systeme für den Computerchip." Angewandte Chemie 108, no. 21 (November 6, 1996): 2610–22. http://dx.doi.org/10.1002/ange.19961082105.

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21

Simitzis, Johannis. "Composites von novolak-lignit zur herstellung von aktivkohle." Angewandte Makromolekulare Chemie 148, no. 1 (February 1987): 41–52. http://dx.doi.org/10.1002/apmc.1987.051480104.

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22

Lüders, Günter, Harald Goering, Martina Pohl, and Heinz Raubach. "Struktur und eigenschaften von simultanvernetzten bismaleimidmodifizierten novolak-epoxidharzen." Angewandte Makromolekulare Chemie 194, no. 1 (January 1992): 119–31. http://dx.doi.org/10.1002/apmc.1992.051940110.

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23

Lingnau, J., R. Dammel, and J. Theis. "Highly sensitive novolak-based X-ray positive resist." Polymer Engineering and Science 29, no. 13 (July 1989): 874–77. http://dx.doi.org/10.1002/pen.760291309.

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24

Hanabata, Makoto, Fumio Oi, and Akihiro Furuta. "Novolak design concept for high performance positive photoresists." Polymer Engineering and Science 32, no. 20 (October 1992): 1494–99. http://dx.doi.org/10.1002/pen.760322009.

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25

CIRINO, GIUSEPPE ANTONIO, ANA PAULA MOUSINHO, RONALDO DOMINGUES MANSANO, PATRICK VERDONCK, LUIZ GONçALVES NETO, and ANTONIO CARLOS SEABRA. "Fabrication of Microlenses With a Novolak-type Polymer." Molecular Crystals and Liquid Crystals 374, no. 1 (January 1, 2002): 153–58. http://dx.doi.org/10.1080/10587250210432.

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26

Weill, A., E. Dechenaux, and P. Paniez. "Differential scanning calorimetry analysis of novolak-based photoresists." Microelectronic Engineering 4, no. 4 (January 1986): 285–96. http://dx.doi.org/10.1016/0167-9317(86)90019-5.

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27

Dössel, K. F., H. L. Huber, and H. Oertel. "Highly-sensitive novolak-based positive X-ray resist." Microelectronic Engineering 5, no. 1-4 (December 1986): 97–104. http://dx.doi.org/10.1016/0167-9317(86)90035-3.

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28

Chaker, M., S. Boily, H. Lafontaine, P. P. Mercier, J. F. Currie, J. C. Kieffer, and H. Pepin. "Laser plasma x-ray lithography using novolak resists." Microelectronic Engineering 11, no. 1-4 (April 1990): 313–16. http://dx.doi.org/10.1016/0167-9317(90)90121-9.

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29

Mathurosemontri, Suchalinee, Kentaro Okuno, Yoichiro Ogura, Supaphorn Thumsorn, and Hiroyuki Hamada. "Investigation on Fracture Behavior of Glass Fiber Reinforced Thermoplstic and Thermosetting Composites." Key Engineering Materials 728 (January 2017): 235–39. http://dx.doi.org/10.4028/www.scientific.net/kem.728.235.

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Glass fiber reinforced thermoplastics and thermosetting composites were prepared in this study. Commercial grades of 20% glass fiber filled polypropylene, polyoxymethylene, polyamide 6 and polycarbonate were injection molded to dumbbell specimens. The specimens are referred as GF/PP, GF/POM, GF/PA and GF/PC, respectively. 55% GF reinforced novolak composites were fabricated by hand lay-up, which different curing times of 20 s, 35 s and 50 s. Mechanical properties, fracture behavior and morpgology of GF composites with and without notched were investigated. GF/PA showed the highest properties of tensile properties, notched strength and fracture toughness as compared to all of GF reinforced thermoplastics in this research. On the other hand, tensile properties and fracture toughness of GF reinforced novolak increased with increasing curing times. SEM photographs indicated ductile fractured surface near the crack edge while their brittle appeared at far of the crack in GF reinforced thermoplastics. It can be noted that notched sensitivity of GF reinforced thermoplastics was lower than GF reinforced thermosetting composites.

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30

Yeh, Tung-Feng, Jian Ping Huang, Arnost Reiser, Kenji Honda, Bernard T. Beauchemin, Jr., and Rodney J. Hurditch. "The interaction of novolak oligomers with hydrogen bond acceptors." Journal of Photopolymer Science and Technology 7, no. 1 (1994): 229–40. http://dx.doi.org/10.2494/photopolymer.7.229.

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31

Kozawa, Takahiro, Mitsuru Uesaka, Takeo Watanabe, Yoshio Yamashita, Yoichi Yoshida, and Seiichi Tagawa. "Radiation-induced reactions in novolak-based chemically amplified resists." Journal of Photopolymer Science and Technology 8, no. 1 (1995): 37–42. http://dx.doi.org/10.2494/photopolymer.8.37.

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32

Samatadze, A. I., I. V. Parakhin, and A. S. Tumanov. "SOLID RESOL-NOVOLAK RESINS AND COMPOSITION ON THEIR BASED." Proceedings of VIAM, no. 9 (September 2014): 10. http://dx.doi.org/10.18577/2307-6046-2014-0-9-10-10.

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33

HANABATA, Makoto, and Akihiro FURUTA. "Applications of high-ortho novolak resins to photoresist materials." KOBUNSHI RONBUNSHU 45, no. 10 (1988): 803–8. http://dx.doi.org/10.1295/koron.45.803.

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34

Bogan, Leonard E. "The novolak synthesis reaction: a description based on reactivities." Macromolecules 25, no. 7 (March 1992): 1966–69. http://dx.doi.org/10.1021/ma00033a021.

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35

Reiser, Arnost, Zhenglin Yan, Yu-Kai Han, and Myoung Soo Kim. "Novolak–diazonaphthoquinone resists: The central role of phenolic strings." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 18, no. 3 (2000): 1288. http://dx.doi.org/10.1116/1.591376.

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36

Jones, T. T. "The melt-viscosity of some phenol-formaldehyde novolak resins." Journal of Applied Chemistry 2, no. 3 (May 4, 2007): 134–49. http://dx.doi.org/10.1002/jctb.5010020306.

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37

Böschel, Dorit, and Manfred Fedtke. "Zum reaktionsverhalten von resol- und novolak-modellen mit säureanhydriden." Angewandte Makromolekulare Chemie 220, no. 1 (March 1994): 163–76. http://dx.doi.org/10.1002/apmc.1994.052200114.

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38

Nakano, Ritsuko, Minoru Hirose, Nobuaki Santoh, Kenji Nakagawa, and Kazumasa Shigematsu. "Effect of Low-Molecular-Weight Novolak Resin on Microgrooves." Japanese Journal of Applied Physics 30, Part 1, No. 11B (November 30, 1991): 3121–24. http://dx.doi.org/10.1143/jjap.30.3121.

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39

Shih, Hsiao-Yi, Tung-Feng Yeh, Arnost Reiser, Ralph R. Dammel, Hans J. Merrem, and Gerhard Pawlowski. "A Percolation View of Novolak Dissolution. 3. Dissolution Inhibition." Macromolecules 27, no. 12 (June 1994): 3330–36. http://dx.doi.org/10.1021/ma00090a029.

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40

Yamagishi, Tada-Aki, Masahiro Nomoto, Shingo Ito, Shin-ichiro Ishida, and Yoshiaki Nakamoto. "Preparation and characterization of high molecular weight novolak resins." Polymer Bulletin 32, no. 5-6 (May 1994): 501–7. http://dx.doi.org/10.1007/bf00973894.

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41

Jagdhold, U., and J. Pelka. "Passivation effects in novolak based resists during O2-RIE." Microelectronic Engineering 17, no. 1-4 (March 1992): 331–35. http://dx.doi.org/10.1016/0167-9317(92)90068-3.

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42

Furuta, A., and M. Hanabata. "Novolak structures suitable for high resolution positive photoresists and application." Journal of Photopolymer Science and Technology 2, no. 3 (1989): 383–90. http://dx.doi.org/10.2494/photopolymer.2.383.

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43

Sheats, J. R. "Reciprocity failure in novolak/diazoquinone photoresist with 364-nm exposure." IEEE Transactions on Electron Devices 35, no. 1 (January 1988): 129–31. http://dx.doi.org/10.1109/16.2428.

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44

Lee, Haiwon, Seok-Kyu Lee, and Byung-Sun Park. "Novolak Based Resists for X-ray and Electron Beam Lithography." Journal of Photopolymer Science and Technology 5, no. 1 (1992): 197–205. http://dx.doi.org/10.2494/photopolymer.5.197.

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45

WANG, Xiuxun, Hiromu SAITO, and Takashi INOUE. "Crystallization Kinetics of Binary Mixtures of Polyoxymethylene and Novolak Resin." KOBUNSHI RONBUNSHU 48, no. 12 (1991): 771–74. http://dx.doi.org/10.1295/koron.48.771.

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46

WANG, Xiuxun, Hiromu SAITO, and Takashi INOUE. "Crystal Morphology of Binary Mixtures of Polyoxymethylene and Novolak Resin." KOBUNSHI RONBUNSHU 49, no. 3 (1992): 175–79. http://dx.doi.org/10.1295/koron.49.175.

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47

McKean, Dennis R., Scott A. MacDonald, Robert D. Johnson, Nicholas J. Clecak, and C. Grant Willson. "Characterization of a Novolak-based three-component deep-UV resist." Chemistry of Materials 2, no. 5 (September 1990): 619–24. http://dx.doi.org/10.1021/cm00011a027.

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48

Han, Yu-Kai, Zhenglin Yan, and Arnost Reiser. "Mechanism of the Trefonas Effect (Polyphotolysis) in Novolak−Diazonaphthoquinone Resists." Macromolecules 32, no. 25 (December 1999): 8421–26. http://dx.doi.org/10.1021/ma990686j.

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49

Nicolau, Dan V., Takahisa Taguchi, Hiroshi Taniguchi, and Susumu Yoshikawa. "Micron-Sized Protein Patterning on Diazonaphthoquinone/Novolak Thin Polymeric Films." Langmuir 14, no. 7 (March 1998): 1927–36. http://dx.doi.org/10.1021/la970802g.

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50

Horibe, Hideo, Tomosumi Kamimura, Takashi Hata, Masashi Yamamoto, Ichiro Yamato, Osamu Nigo, Masayuki Fujita, Akira Yoshikado, and Kunio Yoshida. "Removal of Diazonaphthoquinone/Novolak Resist Using UV Laser (266 nm)." Polymer Journal 37, no. 11 (November 2005): 813–17. http://dx.doi.org/10.1295/polymj.37.813.

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