Journal articles on the topic 'Nitridation'
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Mylinh, Dang Thy, Dae-Ho Yoon, and Chang-Yeoul Kim. "Aluminum Nitride Formation From Aluminum Oxide/Phenol Resin Solid-Gel Mixture By Carbothermal Reduction Nitridation Method." Archives of Metallurgy and Materials 60, no. 2 (June 1, 2015): 1551–55. http://dx.doi.org/10.1515/amm-2015-0171.
Full textAksenov, Igor, Yoshinobu Nakada, and Hajime Okumura. "Nitridation of GaAs (001)-2×4 Surface Studied by Auger-Electron Spectroscopy." MRS Internet Journal of Nitride Semiconductor Research 4, S1 (1999): 136–41. http://dx.doi.org/10.1557/s1092578300002350.
Full textYang, Xue Qing, Nai Peng, and Cheng Ji Deng. "Nitridation Isothermal Kinetics of In Situ β-Sialon Bonded Al2O3-C Refractories." Key Engineering Materials 697 (July 2016): 572–75. http://dx.doi.org/10.4028/www.scientific.net/kem.697.572.
Full textKim, Dae-Young, Pil-Ryung Cha, Ho-Seok Nam, Hyun-Joo Choi, and Kon-Bae Lee. "Effect of Material and Process Variables on Characteristics of Nitridation-Induced Self-Formed Aluminum Matrix Composites—Part 1: Effect of Reinforcement Volume Fraction, Size, and Processing Temperatures." Materials 13, no. 6 (March 13, 2020): 1309. http://dx.doi.org/10.3390/ma13061309.
Full textLi, Xu, Jianyun Zhao, Ting Liu, Yong Lu, and Jicai Zhang. "Growth of Semi-Polar (101¯3) AlN Film on M-Plane Sapphire with High-Temperature Nitridation by HVPE." Materials 14, no. 7 (March 31, 2021): 1722. http://dx.doi.org/10.3390/ma14071722.
Full textKim, Dae-Young, Pil-Ryung Cha, Ho-Seok Nam, Hyun-Joo Choi, and Kon-Bae Lee. "Effect of Material and Process Variables on Characteristics of Nitridation-Induced Self-Formed Aluminum Matrix Composites—Part 2: Effect of Nitrogen Flow Rates and Processing Temperatures." Materials 13, no. 5 (March 8, 2020): 1213. http://dx.doi.org/10.3390/ma13051213.
Full textChoi, Jung Hun, Suresh Kumar, Shi Yang Ji, Shojiki Kanako, Takashi Hanada, Ryuji Katayama, and Takashi Matsuoka. "Effect of Nitridation on Indium-Composition of InGaN Films." Key Engineering Materials 508 (March 2012): 193–98. http://dx.doi.org/10.4028/www.scientific.net/kem.508.193.
Full textPeng, Zhao Yang, Yi Yu Wang, Hua Jun Shen, Yun Bai, Yi Dan Tang, Xi Ming Chen, Cheng Zhan Li, Ke An Liu, and Xin Yu Liu. "Re-Investigation of SiC/SiO2 Interface Passivation by Nitrogen Annealing." Materials Science Forum 897 (May 2017): 335–39. http://dx.doi.org/10.4028/www.scientific.net/msf.897.335.
Full textKumar, S. G. Prasanna, Nagaraju Kottam, R. Hari Krishna, M. N. Chandra Prabha, R. Preetham, Santosh Behara, and Tiju Thomas. "Influence of Nitridation on Structural and Photoluminescence Behaviour of CaZrO3:Eu3+ Nanophosphors." Asian Journal of Chemistry 32, no. 6 (2020): 1515–19. http://dx.doi.org/10.14233/ajchem.2020.22586.
Full textZhang, Qian, Xu Li, Jianyun Zhao, Zhifei Sun, Yong Lu, Ting Liu, and Jicai Zhang. "Effect of High-Temperature Nitridation and Buffer Layer on Semi-Polar (10–13) AlN Grown on Sapphire by HVPE." Micromachines 12, no. 10 (September 25, 2021): 1153. http://dx.doi.org/10.3390/mi12101153.
Full textAkahane, Yoshiyuki, Takuo Kano, Kyosuke Kimura, Hiroki Komatsu, Yukimune Watanabe, Tomohiko Yamakami, and Kiichi Kamimura. "Preparation and Characterization of Nitridation Layer on 4H SiC (0001) Surface by Direct Plasma Nitridation." Materials Science Forum 778-780 (February 2014): 631–34. http://dx.doi.org/10.4028/www.scientific.net/msf.778-780.631.
Full textFong, Chee Yong, Sha Shiong Ng, Fong Kwong Yam, Abu Hassan Haslan, and Hassan Zainuriah. "Effects of Nitridation Temperatures on Gallium Nitride Thin Films Formed on Silicon Substrates." Advanced Materials Research 895 (February 2014): 57–62. http://dx.doi.org/10.4028/www.scientific.net/amr.895.57.
Full textLerch, Martin. "Nitridation of Zirconia." Journal of the American Ceramic Society 79, no. 10 (August 9, 2005): 2641–44. http://dx.doi.org/10.1111/j.1151-2916.1996.tb09028.x.
Full textWang, X. S., G. Zhai, J. Yang, L. Wang, Y. Hu, Z. Li, J. C. Tang, X. Wang, K. K. Fung, and N. Cue. "Nitridation of Si()." Surface Science 494, no. 2 (November 2001): 83–94. http://dx.doi.org/10.1016/s0039-6028(01)01409-1.
Full textLin, Tie Song, and De Chang Jia. "Influence of Sintering Aids on the Nitridation of Reaction Bonded Si3N4/BN Ceramics." Key Engineering Materials 353-358 (September 2007): 1497–500. http://dx.doi.org/10.4028/www.scientific.net/kem.353-358.1497.
Full textHayashi, Fumitaka, and Masakazu Iwamoto. "Almost Complete Nitridation of Mesoporous Silica to Mesoporous Silicon (Oxy)Nitride with Ammonia." Advances in Science and Technology 68 (October 2010): 159–64. http://dx.doi.org/10.4028/www.scientific.net/ast.68.159.
Full textZhang, Dong Guo, Zhong Hui Li, Da Qing Peng, and Xun Dong. "Influence of the Nitridation Time after the Al Pre-Seeded Layer on the Properties of GaN Layer Grown on Si (1 1 1)." Advanced Materials Research 887-888 (February 2014): 446–49. http://dx.doi.org/10.4028/www.scientific.net/amr.887-888.446.
Full textLi, Yong, Xiaoyan Zhu, Yawei Zhai, Jiaping Wang, Wendong Xue, Junhong Chen, and Jialin Sun. "Research on High Performance Fe3Si-Si3N4-SiC Composite Used for Blast Furnace." Open Materials Science Journal 6, no. 1 (January 18, 2012): 1–5. http://dx.doi.org/10.2174/1874088x01206010001.
Full textLi, Yong, Xiao Yan Zhu, Ya Wei Zhai, Jia Ping Wang, Wen Dong Xue, Jun Hong Chen, and Jia Lin Sun. "Study on High Performance Fe3Si-Si3N4-SiC Composite Preparation and its Application in Blast Furnace." Advanced Materials Research 194-196 (February 2011): 1547–53. http://dx.doi.org/10.4028/www.scientific.net/amr.194-196.1547.
Full textShin, Jong-Hyeon, Yong-Hyun Kim, Jong-Bae Park, Dae-Chul Kim, Young-Woo Kim, Jong-Sik Kim, and Jung-Sik Yoon. "A Study on the Characteristics of Inductively Coupled Plasma Nitridation Process." Coatings 12, no. 10 (September 20, 2022): 1372. http://dx.doi.org/10.3390/coatings12101372.
Full textLan, Li, Luo, Zhou, Wei, and Yin. "Direct Nitridation Synthesis of Quasi-Spherical β-Si3N4 Powders with CaF2 Additive." Materials 12, no. 18 (September 5, 2019): 2870. http://dx.doi.org/10.3390/ma12182870.
Full textYe, Cong, Jia-Ji Wu, Chih-Hung Pan, Tsung-Ming Tsai, Kuan-Chang Chang, Huaqiang Wu, Ning Deng, and He Qian. "Boosting the performance of resistive switching memory with a transparent ITO electrode using supercritical fluid nitridation." RSC Advances 7, no. 19 (2017): 11585–90. http://dx.doi.org/10.1039/c7ra01104k.
Full textJia, Ting Ting, Xin Hong Cheng, Duo Cao, Da Wei Xu, Zhong Jian Wang, Chao Xia, Li Zheng, and Yue Hui Yu. "Impact of In Situ NH3 Plasma Treatments on the Interface between HfLaOx Thin Film and InP Substrate." Advanced Materials Research 721 (July 2013): 67–72. http://dx.doi.org/10.4028/www.scientific.net/amr.721.67.
Full textMilakhin D. S., Malin T. V., Mansurov V. G., Kozhukhov A. S., Novikova N. N., Yakovlev V. A., and Zhuravlev K. S. "Determination of the AlN nucleation layer thickness formed on the Al-=SUB=-2-=/SUB=-O-=SUB=-3-=/SUB=-(0001) surface during nitridation process by XPS and IR spectroscopy." Semiconductors 56, no. 8 (2022): 518. http://dx.doi.org/10.21883/sc.2022.08.54455.23.
Full textZhu, Xiao Yan, Yong Li, Jia Ping Wang, Ya Wei Zhai, Jun Bo, and Jian Fang Zhang. "Preparation of Both Reactive α-Si3N4 and SiC Mixed Powder in Flame-Isolation Nitridation Shuttle Kiln." Key Engineering Materials 512-515 (June 2012): 17–23. http://dx.doi.org/10.4028/www.scientific.net/kem.512-515.17.
Full textSuzuki, Takuma, Junji Senzaki, Tetsuo Hatakeyama, Kenji Fukuda, Takashi Shinohe, and Kazuo Arai. "Reliability of 4H-SiC(000-1) MOS Gate Oxide Using N2O Nitridation." Materials Science Forum 615-617 (March 2009): 557–60. http://dx.doi.org/10.4028/www.scientific.net/msf.615-617.557.
Full textSuehiro, Takayuki, Naoto Hirosaki, Yoshinobu Yamamoto, Toshiyuki Nishimura, Mamoru Mitomo, Junichi Takahashi, and Hisanori Yamane. "Preparation of Lutetium Nitride by Direct Nitridation." Journal of Materials Research 19, no. 3 (March 2004): 959–63. http://dx.doi.org/10.1557/jmr.2004.19.3.959.
Full textMa, Bei Yue, Ying Li, Li Bing Xu, and Yu Chun Zhai. "In Situ Synthesis of β-Sialon Powder from Fly Ash." Advanced Materials Research 194-196 (February 2011): 2179–82. http://dx.doi.org/10.4028/www.scientific.net/amr.194-196.2179.
Full textBalerio, Robert, Hyosim Kim, Andres Morell-Pacheco, Laura Hawkins, Ching-Heng Shiau, and Lin Shao. "ZrN Phase Formation, Hardening and Nitrogen Diffusion Kinetics in Plasma Nitrided Zircaloy-4." Materials 14, no. 13 (June 25, 2021): 3572. http://dx.doi.org/10.3390/ma14133572.
Full textNakanuma, Takato, Yu Iwakata, Arisa Watanabe, Takuji Hosoi, Takuma Kobayashi, Mitsuru Sometani, Mitsuo Okamoto, Akitaka Yoshigoe, Takayoshi Shimura, and Heiji Watanabe. "Comprehensive physical and electrical characterizations of NO nitrided SiO2/4H-SiC(112̄0) interfaces." Japanese Journal of Applied Physics 61, SC (March 2, 2022): SC1065. http://dx.doi.org/10.35848/1347-4065/ac4685.
Full textFukushima, Jun, Keiichiro Kashimura, and Hirotsugu Takizawa. "Nitridation Reaction of Titanium Powders by 2.45 GHz Multimode Microwave Irradiation using a SiC Susceptor in Atmospheric Conditions." Processes 8, no. 1 (December 21, 2019): 20. http://dx.doi.org/10.3390/pr8010020.
Full textChao, Shou-Yen, Wen-How Lan, Shou-Kong Fan, Zi-Wen Zhon, and Mu-Chun Wang. "Electrical Performance of 28 nm-Node Varying Channel-Width nMOSFETs under DPN Process Treatments." Micromachines 13, no. 11 (October 29, 2022): 1861. http://dx.doi.org/10.3390/mi13111861.
Full textAkahane, Yoshiyuki, Kyosuke Kimura, Takuo Kano, Yukimune Watanabe, Tomohiko Yamakami, Shinji Fujimaki, and Kiichi Kamimura. "Plasma Nitridation of 4H-SiC by Glow Discharge of N2/H2 Mixed Gases." Materials Science Forum 821-823 (June 2015): 504–7. http://dx.doi.org/10.4028/www.scientific.net/msf.821-823.504.
Full textYang, Tao, Yan Gai Liu, Ding Yun Ye, Qi Wang, Zhao Hui Huang, and Ming Hao Fang. "Phase Behavior Analysis of Low-Grade Bauxite and Rutile by Carbothermal Reduction-Nitridation." Advanced Materials Research 624 (December 2012): 239–43. http://dx.doi.org/10.4028/www.scientific.net/amr.624.239.
Full textSung, Mei-Chen, Ya-Fen Wang, Shang-Che Chen, and Cheng-Hsien Tsai. "Two-Stage Plasma-Thermal Nitridation Processes for the Production of Aluminum Nitride Powders from Aluminum Powders." Materials 12, no. 3 (January 24, 2019): 359. http://dx.doi.org/10.3390/ma12030359.
Full textIGARI, Yoshiyuki, Izumo ABE, and Isao KUSUNOKI. "Nitridation of Aluminum Surface." SHINKU 45, no. 5 (2002): 463–67. http://dx.doi.org/10.3131/jvsj.45.463.
Full textHabraken, F. H. P. M., E. L. J. Geerlings, R. H. G. Tijhaar, A. Slomp, and W. F. van der Weg. "Thermal nitridation of SiOxHyfilms." Journal of Applied Physics 62, no. 6 (September 15, 1987): 2573–75. http://dx.doi.org/10.1063/1.339429.
Full textCeravola, Roberta, Carlos Frontera, Judith Oró-Solé, Ashley P. Black, Clemens Ritter, Ignasi Mata, Elies Molins, Josep Fontcuberta, and Amparo Fuertes. "Topochemical nitridation of Sr2FeMoO6." Chemical Communications 55, no. 21 (2019): 3105–8. http://dx.doi.org/10.1039/c8cc09845j.
Full textCofer, C. G., and J. A. Lewis. "Chromium catalysed silicon nitridation." Journal of Materials Science 29, no. 22 (November 1994): 5880–86. http://dx.doi.org/10.1007/bf00366871.
Full textWright, P. J., A. Kermani, and K. C. Saraswat. "Nitridation and post-nitridation anneals of SiO/sub 2/ for ultrathin dielectrics." IEEE Transactions on Electron Devices 37, no. 8 (1990): 1836–41. http://dx.doi.org/10.1109/16.57134.
Full textYin, Hong Feng, and Yun Tang. "Preparation of Ca-α-Sialon-SiC Multiphase Ceramics from Gasification Slag." Materials Science Forum 695 (July 2011): 328–31. http://dx.doi.org/10.4028/www.scientific.net/msf.695.328.
Full textQin, Fu Wen, Ai Min Wu, Feng Chun Liu, Bao Dan Liu, and Xin Jiang. "Effect of Nitridation on GaN Film Grown on Glass Substrate by ECR-PEMOCVD Method." Materials Science Forum 654-656 (June 2010): 1716–19. http://dx.doi.org/10.4028/www.scientific.net/msf.654-656.1716.
Full textHuang, Qing, Guojin Zheng, and Tian Wu. "Surface nitridation of Ta powder by molten-salt electrolysis of Ta2O5 under N2 atmosphere." Functional Materials Letters 13, no. 07 (September 3, 2020): 2050032. http://dx.doi.org/10.1142/s1793604720500320.
Full textLiu, Dangrong R., Samuel Shinozaki, Motoyuki Miyata, and Yoshiyuki Yasutomi. "Influence of Fe impurity in nitridation of Si + B4C green compact." Journal of Materials Research 13, no. 2 (February 1998): 329–42. http://dx.doi.org/10.1557/jmr.1998.0045.
Full textPark, Dong Soo, Myoung Won Lee, Hai Doo Kim, Young Jo Park, and Yeon Gil Jung. "Fabrication and Properties of Porous RBSN." Key Engineering Materials 287 (June 2005): 277–81. http://dx.doi.org/10.4028/www.scientific.net/kem.287.277.
Full textYin, Shao Wu, Li Wang, Li Ge Tong, Fu Ming Yang, and Yan Hui Li. "Kinetics Analysis of Direct Nitridation of Silicon Powders at Atmospheric Pressure." Advanced Materials Research 562-564 (August 2012): 167–70. http://dx.doi.org/10.4028/www.scientific.net/amr.562-564.167.
Full textМилахин, Д. С., Т. В. Малин, В. Г. Мансуров, А. С. Кожухов, Н. Н. Новикова, В. А. Яковлев, and К. С. Журавлев. "Определение толщины зародышевого слоя AlN, сформированного на поверхности Al-=SUB=-2-=/SUB=-O-=SUB=-3-=/SUB=-(0001) в процессе нитридизации, методами РФЭС и ИК-спектроскопии." Физика и техника полупроводников 56, no. 8 (2022): 734. http://dx.doi.org/10.21883/ftp.2022.08.53137.23.
Full textYang, Wan Li, Zhong Qi Shi, Zhi Hao Jin, and Guan Jun Qiao. "Effect of Oxide Additives on Catalysis and Microstructure of RBSN Using Low-Purity Silicon Powder as Raw Materials." Materials Science Forum 695 (July 2011): 409–12. http://dx.doi.org/10.4028/www.scientific.net/msf.695.409.
Full textPark, Dong Soo, Byung Dong Hahn, and D. J. Baik. "Microstructure and Properties of Sintered Reaction Bonded Silicon Nitride with Aligned Whisker Seeds." Key Engineering Materials 287 (June 2005): 271–76. http://dx.doi.org/10.4028/www.scientific.net/kem.287.271.
Full textMoges, Kidist, Mitsuru Sometani, Takuji Hosoi, Takayoshi Shimura, Shinsuke Harada, and Heiji Watanabe. "Sub-nm-Scale Depth Profiling of Nitrogen in NO- and N2-Annealed SiO2/4H-SiC(0001) Structures." Materials Science Forum 963 (July 2019): 226–29. http://dx.doi.org/10.4028/www.scientific.net/msf.963.226.
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