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Journal articles on the topic 'Nanoimprint lithography'

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Author: Grafiati

Published: 4 June 2021

Last updated: 11 March 2023

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1

Kwon, B., and Jong H. Kim. "Importance of Molds for Nanoimprint Lithography: Hard, Soft, and Hybrid Molds." Journal of Nanoscience 2016 (June 22, 2016): 1–12. http://dx.doi.org/10.1155/2016/6571297.

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Nanoimprint lithography has attracted considerable attention in academic and industrial fields as one of the most prominent lithographic techniques for the fabrication of the nanoscale devices. Effectively controllable shapes of fabricated elements, extremely high resolution, and cost-effectiveness of this especial lithographic system have shown unlimited potential to be utilized for practical applications. In the past decade, many different lithographic techniques have been developed such as electron beam lithography, photolithography, and nanoimprint lithography. Among them, nanoimprint lithography has proven to have not only various advantages that other lithographic techniques have but also potential to minimize the limitations of current lithographic techniques. In this review, we summarize current lithography techniques and, furthermore, investigate the nanoimprint lithography in detail in particular focusing on the types of molds. Nanoimprint lithography can be categorized into three different techniques (hard-mold, soft-mold, and hybrid nanoimprint) depending upon the molds for imprint with different advantages and disadvantages. With numerous studies and improvements, nanoimprint lithography has shown great potential which maximizes its effectiveness in patterning by minimizing its limitations. This technique will surely be the next generation lithographic technique which will open the new paradigm for the patterning and fabrication in nanoscale devices in industry.

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2

Stewart, Michael D., and C. Grant Willson. "Imprint Materials for Nanoscale Devices." MRS Bulletin 30, no. 12 (December 2005): 947–51. http://dx.doi.org/10.1557/mrs2005.248.

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AbstractNanoimprint lithography is a potentially low-cost, high-resolution patterning technique, but most of the surrounding development work has been directed toward tool designs and processing techniques. There remains a tremendous opportunity and need to develop new materials for specific nanoimprint applications. This article provides an overview of relevant materials-related development work for nanoimprint lithographic applications. Material requirements for nanoimprint patterning for the sub-45-nm integrated-circuit regime are discussed, along with proposed nanoimprint applications such as imprintable dielectrics, conducting polymers, biocompatible materials, and materials for microfluidic devices. Polymers available for thermal nanoimprint processing and photocurable precursors for ultraviolet-assisted nanoimprint lithography are discussed.

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3

Chen, Jian Gang, Li Jun Liu, Zhi Xin Zhao, and Ju Rong Liu. "Research and Development of Nanoimprint Lithography Technology." Applied Mechanics and Materials 757 (April 2015): 99–103. http://dx.doi.org/10.4028/www.scientific.net/amm.757.99.

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This paper introduces research situation and prospect of nanoimprint lithography technology. The process of three common lithography (Such as hot press printing, UV curing stamping and Micro Contact stamping) is discussed. For getting better quality, the method and main factors of nanoimprint lithography pattern are analyzed. Furthermore, some key problems of the nanoimprint lithography process are solved for the purpose of the further understands for this process. A new way of thinking is provided for development new nanoimprint lithography technology in the paper.

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4

Chou, Stephen Y. "Nanoimprint lithography." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 14, no. 6 (November 1996): 4129. http://dx.doi.org/10.1116/1.588605.

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5

Glinsner, Thomas, Gerald Kreindl, and Michael Kast. "Nanoimprint Lithography." Optik & Photonik 5, no. 2 (June 2010): 42–45. http://dx.doi.org/10.1002/opph.201190097.

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6

Taniguchi, Jun, Yuji Tokano, Iwao Miyamoto, Masanori Komuro, and Hiroshi Hiroshima. "Diamond nanoimprint lithography." Nanotechnology 13, no. 5 (September 6, 2002): 592–96. http://dx.doi.org/10.1088/0957-4484/13/5/309.

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7

Tan, Hua. "Roller nanoimprint lithography." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 16, no. 6 (November 1998): 3926. http://dx.doi.org/10.1116/1.590438.

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8

Faircloth, Brian, Henry Rohrs, Richard Tiberio, Rodney Ruoff, and Robert R. Krchnavek. "Bilayer, nanoimprint lithography." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 18, no. 4 (2000): 1866. http://dx.doi.org/10.1116/1.1305272.

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9

Alkaisi, M. M., W. Jayatissa, and M. Konijn. "Multilevel nanoimprint lithography." Current Applied Physics 4, no. 2-4 (April 2004): 111–14. http://dx.doi.org/10.1016/j.cap.2003.10.009.

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10

Lin, Jian-Shian, Chieh-Lung Lai, Ya-Chun Tu, Cheng-Hua Wu, and Yoshimi Takeuchi. "A Uniform Pressure Apparatus for Micro/Nanoimprint Lithography Equipment." International Journal of Automation Technology 3, no. 1 (January 5, 2009): 84–88. http://dx.doi.org/10.20965/ijat.2009.p0084.

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Nanoimprint lithography (NIL) has overcome the limitation of light diffraction. It is capable of printing features less than 10nm in size with high lithographic resolution, high manufacturing speed, and low production cost. The uniformity of pressure, however, remains a critical issue. To improve the uniformity of pressure, we developed a flexible uniform pressure component based on Pascal's Law. When external force is applied to this component, uniform pressure is delivered to the mold and substrate. Average pressure over the embossed area using our improved nanoimprint equipment deviates by only 3.15%.

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11

Zhang, Jie, Lin Zhang, Lianhuan Han, Zhao-Wu Tian, Zhong-Qun Tian, and Dongping Zhan. "Electrochemical nanoimprint lithography: when nanoimprint lithography meets metal assisted chemical etching." Nanoscale 9, no. 22 (2017): 7476–82. http://dx.doi.org/10.1039/c7nr01777d.

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12

Zhang, Man, Liang-Ping Xia, Sui-Hu Dang, A.-Xiu Cao, Qi-Ling Deng, and Chun-Lei Du. "A Novel Nanoimprint Lithography Thiol-ene Resist for Sub-70 nm Nanostructures." Science of Advanced Materials 12, no. 6 (June 1, 2020): 779–83. http://dx.doi.org/10.1166/sam.2020.3721.

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In this paper, we propose a novel kind of UV click-polymerization thiol-ene copolymers as nanoimprint lithography resists for sub-70 nm resolution patterns. High-precision mold imprint and release are two of the most critical steps of nanoimprint lithography, which requires the resists with properties of excellent conformal replication and low surface energy. Conventional UV-curable resists used in nanoimprint lithography, such as acrylate, epoxy resin, and vinyl ether, cannot satisfy all these properties requirements because they exhibit surface oxygen inhibition during polymerization, or materials fracture and delamination during mold releasing. A novel kind of thiol-ene copolymers have been investigated in this study, which have many properties favorable for use as nanoimprint lithography resists to imprint sub-70 nm and high-aspect-ratio nanostructures. These properties include sufficiently low viscosity and high Young's modulus, low surface energy for easy demolding, polymerization in benign ambient, and in particular, high chemical-etch resistance. These excellent properties give improve nanoimprinting results.

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13

Chaoran, Liu, Yue Jinzhao, Li Tianhao, Xia Weiwei, Li Dongxue, and Duan Zhiyong. "Vibration attenuation analysis of compressional gas cushion press nanoimprint lithography system." Proceedings of the Institution of Mechanical Engineers, Part C: Journal of Mechanical Engineering Science 228, no. 9 (October 28, 2013): 1634–42. http://dx.doi.org/10.1177/0954406213508755.

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Nanoimprint lithography has a great development in decades. Compressional gas cushion press is a novel method in improving the uniformity in nanoimprint lithography process. Based on compressional gas cushion press nanoimprint lithography system, an attenuation ring is added between the chamber wall and the pedestal. The attenuation ring decreases the influence of system vibration on the fidelity of patterning. The physical parameters of the attenuation material are optimized based on the theoretical models of the vibration attenuation and mechanical calculation. According to the optimization physical parameters, Young's modulus of a perfect material of attenuation ring should be smaller than 8 MPa, and Poisson's ratio should be close to 0.5. Therefore, natural rubber is employed as the material of attenuation ring. The simulation results based on COMSOL indicate that nested rectangular structure has the best attenuation effect among the four simulated internal structures. It provides technological supporting for the establishment of attenuation ring in compressional gas cushion press nanoimprint lithography system.

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14

Dinelli, F., C. Menozzi, P. Baschieri, P. Facci, and P. Pingue. "Scanning probe nanoimprint lithography." Nanotechnology 21, no. 7 (January 21, 2010): 075305. http://dx.doi.org/10.1088/0957-4484/21/7/075305.

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15

Traub, Matthew C., Whitney Longsine, and Van N. Truskett. "Advances in Nanoimprint Lithography." Annual Review of Chemical and Biomolecular Engineering 7, no. 1 (June 7, 2016): 583–604. http://dx.doi.org/10.1146/annurev-chembioeng-080615-034635.

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16

Zhu, Ruichao, Steven R. J. Brueck, Noel Dawson, Tito Busani, Praveen Joseph, Shrawan Singhal, and S. V. Sreenivasan. "Scatterometry for nanoimprint lithography." Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 34, no. 6 (November 2016): 06K503. http://dx.doi.org/10.1116/1.4967933.

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17

Khang, Dahl-Young, Hyewon Kang, Tae-Il Kim, and Hong H. Lee. "Low-Pressure Nanoimprint Lithography." Nano Letters 4, no. 4 (April 2004): 633–37. http://dx.doi.org/10.1021/nl049887d.

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18

SAITO, Takushi. "Nanoimprint lithography is profound!" Journal of the Japan Society for Precision Engineering 75, no. 8 (2009): 958–61. http://dx.doi.org/10.2493/jjspe.75.958.

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19

Muehlberger, Michael, Stephan Ruttloff, Dieter Nees, Amiya Moharana, Maria R. Belegratis, Philipp Taus, Sonja Kopp, Heinz D. Wanzenboeck, Adrian Prinz, and Daniel Fechtig. "Nanoimprint Replication of Biomimetic, Multilevel Undercut Nanostructures." Nanomaterials 11, no. 4 (April 20, 2021): 1051. http://dx.doi.org/10.3390/nano11041051.

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The nanoimprint replication of biomimetic nanostructures can be interesting for a wide range of applications. We demonstrate the process chain for Morpho-blue-inspired nanostructures, which are especially challenging for the nanoimprint process, since they consist of multilayer undercut structures, which typically cannot be replicated using nanoimprint lithography. To achieve this, we used a specially made, proprietary imprint material to firstly allow successful stamp fabrication from an undercut master structure, and secondly to enable UV-based nanoimprinting using the same material. Nanoimprinting was performed on polymer substrates with stamps on polymer backplanes to be compatible with roller-based imprinting processes. We started with single layer undercut structures to finally show that it is possible to successfully replicate a multilayer undercut stamp from a multilayer undercut master and use this stamp to obtain multilayer undercut nanoimprinted samples.

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20

Reboud, V., N. Kehagias, M. Zelsmann, M. Striccoli, M. Tamborra, M. L. Curri, A. Agostiano, et al. "Modification of Spontaneous Emission of (CdSe)ZnS Nanocrystals Embedded in Nanoimprinted Photonic Crystals." Journal of Nanoscience and Nanotechnology 8, no. 2 (February 1, 2008): 535–39. http://dx.doi.org/10.1166/jnn.2008.a143.

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Highly luminescent (CdSe)ZnS nanocrystals, with band edge emission in the red region of the visible spectrum, were successfully synthesized and incorporated in a resist, namely mr-NIL 6000. The nanocomposite material was imprinted by using conventional nanoimprint lithography (NIL) process. We report on the fabrication and characterization of nanoimprinted photonic crystals in this new functional material. Experiments showed good imprint properties of the NC/polymer based material and that the surface nanostructuration improves the light extraction efficiency by over 2 compared to a nanoimprinted unpatterned surface.

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21

Fan, Xi Qiu. "Nanoimprint Lithography: A Promising Candidate for Next-Generation Lithography." Advanced Materials Research 139-141 (October 2010): 1558–61. http://dx.doi.org/10.4028/www.scientific.net/amr.139-141.1558.

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Due to its inherent simplicity and low cost, the popularity of nanoimprint lithography is rising, and is positioned to succeed EUV as the most popular choice for next-generation lithography. This paper presents a homemade nanoimprint lithography prototype tool with a high precision alignment system, which adopts both macro and micro actuators to achieve coarse and fine alignment. Linear motors with 300 mm travel range and 0.1 µm step resolution, and piezoelectric translators with 50 µm travel range and 0.1 nm step resolution are used as macro and micro actuators, respectively. Imprint of 80nm width gratings with a 250 nm pitch is taken as an example to depict the process of NIL. High resolution and fine fidelity of the imprinted results demonstrate NIL’s promising candidate for next-generation lithography, and potential applications in manufacturing integrated circuits, optical, chemical, and biological nanostructures or micro-devices.

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22

LU, BINGRUI, SHEN-QI XIE, JING WAN, RONG YANG, ZHEN SHU, XIN-PING QU, RAN LIU, YIFANG CHEN, and EJAZ HUQ. "APPLICATIONS OF NANOIMPRINT LITHOGRAPHY FOR BIOCHEMICAL AND NANOPHOTONIC STRUCTURES USING SU-8." International Journal of Nanoscience 08, no. 01n02 (February 2009): 151–55. http://dx.doi.org/10.1142/s0219581x09005931.

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Nanoimprint lithography (NIL) technology has aroused great interests in both academia and industry due to its high resolution, low-cost, and high-volume nanopatterning capability. And as an expoxy resin-based negative amplified photoresist, SU-8 is an ideal candidate for NIL because of its low-glass-transition temperature, low-volume shrinkage coefficient, and good optical properties. In this reviewing paper, we highlight the major technical achievements in NIL on epoxy resin and its applications for bio- and nanophotonic structures. NIL was also applied for the duplication of imprint templates, originally fabricated by e-beam lithography (EBL) followed by reactive ion etch (RIE), using a SU-8/ SiO 2/PMMA tri-layer technique. And nanoimprint properties were systematically investigated for optimization. The developed nanoimprint process for different applications indicates promising industrial potentials in the next generation lithography resolution.

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23

Jiang, Meng Lin, Shi Wei Lin, and Wen Kai Jiang. "Hologram Images Patterned in Shrink BOPP Film by Large-Area Roller Nanoimprint Lithography." Advanced Materials Research 873 (December 2013): 503–6. http://dx.doi.org/10.4028/www.scientific.net/amr.873.503.

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Thermal roller nanoimprint lithography with the ability of larger area micro-to nanometer-scale patterning on flexible substrates possesses the advantages of low cost and high throughput, and is widely being practiced in industry. Hologram images have been successfully embossed in shrink biaxially oriented polypropylene films by the large-area roller nanoimprint lithography technique. The defects which occur during embossing processes have been studied in order to identify the underlying formation mechanism.

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24

Sun, Hongwen. "Stamp stress analysis with low temperature nanoimprint lithography." Functional materials 23, no. 3 (September 27, 2016): 517–20. http://dx.doi.org/10.15407/fm23.03.517.

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25

Schütte, C. "Advanced solutions for nanoimprint lithography." Nanoindustry Russia, no. 3 (2016): 28–29. http://dx.doi.org/10.22184/1993-8578.2016.65.3.28.29.

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26

Yan, Le, Lei Yin, and Hong Zhong Liu. "Nanoimprint Lithography of Multistep Loading." Advanced Materials Research 383-390 (November 2011): 7214–19. http://dx.doi.org/10.4028/www.scientific.net/amr.383-390.7214.

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In this paper, a method of multistep imprint lithography process is described. Through comparing among the loading process factors, a multistep loading locus, which includes a pre-cure release of the pressing force, is proposed for the high-conformity transfer of nano-patterns from the template to the wafer. A series of imprint experiments show that the new multistep loading process can meet the needs for different pressing areas, feature sizes and repetitious imprints. This loading process can effectively reduce the residual resist thickness while maintaining a uniform residual resist and non-distorted transfer of nano-patterns to the resist-coated wafer. And a high-conformity of 100 nm feature can be achieved.

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27

Hirai, Yoshihiko. "Polymer Science in Nanoimprint Lithography." Journal of Photopolymer Science and Technology 18, no. 4 (2005): 551–58. http://dx.doi.org/10.2494/photopolymer.18.551.

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28

Skupov, A. "Nanoimprint lithography: materials and technologies." ELECTRONICS: Science, Technology, Business 4, no. 164 (2017): 56–60. http://dx.doi.org/10.22184/1992-4178.2017.164.4.56.60.

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29

Xia, Qiangfei, and R. Fabian Pease. "Nanoimprint lithography 20 years on." Nanotechnology 26, no. 18 (April 15, 2015): 182501. http://dx.doi.org/10.1088/0957-4484/26/18/182501.

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30

Zankovych, S., T. Hoffmann, J. Seekamp, J.-U. Bruch, and C. M. Sotomayor Torres. "Nanoimprint lithography: challenges and prospects." Nanotechnology 12, no. 2 (May 25, 2001): 91–95. http://dx.doi.org/10.1088/0957-4484/12/2/303.

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31

Simon, Yoan C., Isaac W. Moran, Kenneth R. Carter, and E. Bryan Coughlin. "Silylcarborane Acrylate Nanoimprint Lithography Resists." ACS Applied Materials & Interfaces 1, no. 9 (August 11, 2009): 1887–92. http://dx.doi.org/10.1021/am9002292.

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32

Clavijo Cedeño, C., J. Seekamp, A. P. Kam, T. Hoffmann, S. Zankovych, C. M. Sotomayor Torres, C. Menozzi, et al. "Nanoimprint lithography for organic electronics." Microelectronic Engineering 61-62 (July 2002): 25–31. http://dx.doi.org/10.1016/s0167-9317(02)00505-1.

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33

Grigaliūnas, V., S. Tamulevičius, R. Tomašiūnas, V. Kopustinskas, A. Guobien≐, and D. Jucius. "Laser pulse assisted nanoimprint lithography." Thin Solid Films 453-454 (April 2004): 13–15. http://dx.doi.org/10.1016/j.tsf.2003.11.071.

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34

Cochrane, Andrew, Kristianto Tjiptowidjojo, Roger T. Bonnecaze, and P. Randall Schunk. "Multiphase model for nanoimprint lithography." International Journal of Multiphase Flow 104 (July 2018): 9–19. http://dx.doi.org/10.1016/j.ijmultiphaseflow.2018.03.014.

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35

Okada, Makoto, Hiroto Miyake, Shuso Iyoshi, Takao Yukawa, Tetsuya Katase, Katsuhiko Tone, Yuichi Haruyama, and Shinji Matsui. "Double patterning in nanoimprint lithography." Microelectronic Engineering 112 (December 2013): 139–42. http://dx.doi.org/10.1016/j.mee.2013.06.009.

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36

Fuchs, A., M. Bender, U. Plachetka, L. Kock, N. Koo, T. Wahlbrink, and H. Kurz. "Lithography potentials of UV-nanoimprint." Current Applied Physics 8, no. 6 (October 2008): 669–74. http://dx.doi.org/10.1016/j.cap.2007.04.019.

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37

Xu, Yongan, Wei Zhao, and Hong Y. Low. "Sacrificial film-assisted nanoimprint lithography." Microelectronic Engineering 83, no. 3 (March 2006): 542–46. http://dx.doi.org/10.1016/j.mee.2005.12.004.

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38

Häffner, M., A. Heeren, M. Fleischer, D. P. Kern, G. Schmidt, and L. W. Molenkamp. "Simple high resolution nanoimprint-lithography." Microelectronic Engineering 84, no. 5-8 (May 2007): 937–39. http://dx.doi.org/10.1016/j.mee.2007.01.020.

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39

JUNG, Gun-Young. "Nanoimprint Lithography and Its Application." Physics and High Technology 20, no. 1/2 (February 28, 2011): 18. http://dx.doi.org/10.3938/phit.20.004.

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40

Lazzarino, F., C. Gourgon, P. Schiavone, and C. Perret. "Mold deformation in nanoimprint lithography." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 22, no. 6 (2004): 3318. http://dx.doi.org/10.1116/1.1815299.

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41

Chen, Lei, Xuegong Deng, Jian Wang, Ken Takahashi, and Feng Liu. "Defect control in nanoimprint lithography." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 23, no. 6 (2005): 2933. http://dx.doi.org/10.1116/1.2130352.

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42

Choi, P., P. F. Fu, and L. J. Guo. "Siloxane Copolymers for Nanoimprint Lithography." Advanced Functional Materials 17, no. 1 (January 5, 2007): 65–70. http://dx.doi.org/10.1002/adfm.200600257.

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43

Kim, Kwang-Seop, Jae-Hyun Kim, Hak-Joo Lee, and Sang-Rok Lee. "Tribology issues in nanoimprint lithography." Journal of Mechanical Science and Technology 24, no. 1 (January 2010): 5–12. http://dx.doi.org/10.1007/s12206-009-1216-4.

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44

Probst, Christian, Christoph Meichner, Klaus Kreger, Lothar Kador, Christian Neuber, and Hans-Werner Schmidt. "Athermal Azobenzene-Based Nanoimprint Lithography." Advanced Materials 28, no. 13 (January 28, 2016): 2624–28. http://dx.doi.org/10.1002/adma.201505552.

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45

Dongxue, Li, Su Yufeng, Xia Weiwei, Liu Chaoran, Wang Wen, Wang Pan, and Duan Zhiyong. "Analysis of slumping on nanoimprint patterning with pseudoplastic metal nanoparticle fluid." RSC Adv. 4, no. 57 (2014): 30402–11. http://dx.doi.org/10.1039/c4ra01138d.

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46

Duan, Zhi Yong, Qiao Xia Gong, Hui Min Zhang, and Er Jun Liang. "A Novel Air Cushion Press Nanoimprint Lithography." Advanced Materials Research 308-310 (August 2011): 843–46. http://dx.doi.org/10.4028/www.scientific.net/amr.308-310.843.

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nanoimprint was developed quickly in decades because of its ultrahigh resolution, low cost, high throughput. It has demonstrated the ability to pattern 5 nm line-width and 12 inch wafer, and is one of the support technology in NGL. This paper reported a novel nanoimprint to improve the pressure uniformity with air cushion press. The chamber is sealed by a SiO2 window with an elastic ring membrane, on which the mold is fixed . Ultraviolet light solidify resist on the wafer through this window. When air in chamber bleeded the window falled and the mold is pressed into the resist. If air leading into the chamber again, the mold separate from substrate by the elastic ring membrane, then the patterns on mold are translated onto the substrate. Experiments exhibit that this nanoimprint system can replicate features with high fidelity over a large patterning area.

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47

Han, Seung Woo, Ki Jeong Seo, Jae Jong Lee, Seung Woo Lee, Hak Joo Lee, and Jung Yup Kim. "Design of a Rubber Membrane under Substrate for Nanoimprint Lithography Process." Key Engineering Materials 326-328 (December 2006): 345–48. http://dx.doi.org/10.4028/www.scientific.net/kem.326-328.345.

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Nanoimprint lithography is a promising technology to produce sub-100 nm scale features on silicon chips. One of key issues in the nanoimprint lithography is how to make uniform contact between the stamp and the substrate on a large area. In this study a rubber membrane unit under substrate is introduced to resolve this problem. Two layers of membrane were designed to consider air flow in the middle of resist on a silicon wafer. The geometry design for accomplishing uniform contact was carried out using finite element analysis. The material modeling of hyperelastic properties of rubber is characterized by the Mooney-Rivlin strain energy functions. Material constants in the strain energy functions are able to be determined via the curve fitting of experimental stress-strain data. Simple tension and equi-biaxial tests were performed to determine the material constants. To evaluate the effects of a rubber membrane unit, nanoimprint lithography process with it was executed. We could confirm that a distinct improvement of uniform contact was shown and air flow problem was solved during the process.

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48

Chen, Yiyong, Zhizhong Chen, Shengxiang Jiang, Chengcheng Li, Yifan Chen, Jinglin Zhan, Xiangning Kang, Fei Jiao, Guoyi Zhang, and Bo Shen. "Fabrication of nano-patterned sapphire substrates by combining nanoimprint lithography with edge effects." CrystEngComm 21, no. 11 (2019): 1794–800. http://dx.doi.org/10.1039/c8ce01058g.

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49

Tsai, Hung Yin, Ching Wen Liu, and Chia Jen Ting. "Fabrication of AR Film Using Nano-Imprint Process with a Diamond Mold." Advanced Materials Research 512-515 (May 2012): 2072–75. http://dx.doi.org/10.4028/www.scientific.net/amr.512-515.2072.

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Owning to the robust characteristics of diamonds, a nano-tip array structured mold was fabricated with diamond, we can then use this mold to produce anti-reflection (AR) films with nanoimprint lithography. Taking advantage of the self-ordered characteristic of anodic aluminum oxide (AAO), we can obtain the diamond mold by depositing a layer of diamond on the AAO using hot filament chemical vapor deposition (HFCVD). Then taking advantage of the high through-put characteristics of nanoimprint lithography, AR films can be mass produced. The AR films were subjected to reflectivity inspections, a 5.5% reduction in reflectivity was obtained.

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50

Lin, Burn J. "E-Beam Direct-Write Lithography/Nanoimprint Lithography and Aviation." Journal of Micro/Nanolithography, MEMS, and MOEMS 6, no. 1 (January 1, 2007): 010101. http://dx.doi.org/10.1117/1.2718964.

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