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Relevant bibliographies by topics / Nanoimprint lithography

Academic literature on the topic 'Nanoimprint lithography'

Author: Grafiati

Published: 4 June 2021

Last updated: 11 March 2023

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Journal articles on the topic "Nanoimprint lithography"

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Kwon, B., and Jong H. Kim. "Importance of Molds for Nanoimprint Lithography: Hard, Soft, and Hybrid Molds." Journal of Nanoscience 2016 (June 22, 2016): 1–12. http://dx.doi.org/10.1155/2016/6571297.

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Nanoimprint lithography has attracted considerable attention in academic and industrial fields as one of the most prominent lithographic techniques for the fabrication of the nanoscale devices. Effectively controllable shapes of fabricated elements, extremely high resolution, and cost-effectiveness of this especial lithographic system have shown unlimited potential to be utilized for practical applications. In the past decade, many different lithographic techniques have been developed such as electron beam lithography, photolithography, and nanoimprint lithography. Among them, nanoimprint lithography has proven to have not only various advantages that other lithographic techniques have but also potential to minimize the limitations of current lithographic techniques. In this review, we summarize current lithography techniques and, furthermore, investigate the nanoimprint lithography in detail in particular focusing on the types of molds. Nanoimprint lithography can be categorized into three different techniques (hard-mold, soft-mold, and hybrid nanoimprint) depending upon the molds for imprint with different advantages and disadvantages. With numerous studies and improvements, nanoimprint lithography has shown great potential which maximizes its effectiveness in patterning by minimizing its limitations. This technique will surely be the next generation lithographic technique which will open the new paradigm for the patterning and fabrication in nanoscale devices in industry.

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Stewart, Michael D., and C. Grant Willson. "Imprint Materials for Nanoscale Devices." MRS Bulletin 30, no. 12 (December 2005): 947–51. http://dx.doi.org/10.1557/mrs2005.248.

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AbstractNanoimprint lithography is a potentially low-cost, high-resolution patterning technique, but most of the surrounding development work has been directed toward tool designs and processing techniques. There remains a tremendous opportunity and need to develop new materials for specific nanoimprint applications. This article provides an overview of relevant materials-related development work for nanoimprint lithographic applications. Material requirements for nanoimprint patterning for the sub-45-nm integrated-circuit regime are discussed, along with proposed nanoimprint applications such as imprintable dielectrics, conducting polymers, biocompatible materials, and materials for microfluidic devices. Polymers available for thermal nanoimprint processing and photocurable precursors for ultraviolet-assisted nanoimprint lithography are discussed.

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Chen, Jian Gang, Li Jun Liu, Zhi Xin Zhao, and Ju Rong Liu. "Research and Development of Nanoimprint Lithography Technology." Applied Mechanics and Materials 757 (April 2015): 99–103. http://dx.doi.org/10.4028/www.scientific.net/amm.757.99.

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This paper introduces research situation and prospect of nanoimprint lithography technology. The process of three common lithography (Such as hot press printing, UV curing stamping and Micro Contact stamping) is discussed. For getting better quality, the method and main factors of nanoimprint lithography pattern are analyzed. Furthermore, some key problems of the nanoimprint lithography process are solved for the purpose of the further understands for this process. A new way of thinking is provided for development new nanoimprint lithography technology in the paper.

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Chou, Stephen Y. "Nanoimprint lithography." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 14, no. 6 (November 1996): 4129. http://dx.doi.org/10.1116/1.588605.

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Glinsner, Thomas, Gerald Kreindl, and Michael Kast. "Nanoimprint Lithography." Optik & Photonik 5, no. 2 (June 2010): 42–45. http://dx.doi.org/10.1002/opph.201190097.

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Taniguchi, Jun, Yuji Tokano, Iwao Miyamoto, Masanori Komuro, and Hiroshi Hiroshima. "Diamond nanoimprint lithography." Nanotechnology 13, no. 5 (September 6, 2002): 592–96. http://dx.doi.org/10.1088/0957-4484/13/5/309.

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Tan, Hua. "Roller nanoimprint lithography." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 16, no. 6 (November 1998): 3926. http://dx.doi.org/10.1116/1.590438.

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Faircloth, Brian, Henry Rohrs, Richard Tiberio, Rodney Ruoff, and Robert R. Krchnavek. "Bilayer, nanoimprint lithography." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 18, no. 4 (2000): 1866. http://dx.doi.org/10.1116/1.1305272.

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Alkaisi, M. M., W. Jayatissa, and M. Konijn. "Multilevel nanoimprint lithography." Current Applied Physics 4, no. 2-4 (April 2004): 111–14. http://dx.doi.org/10.1016/j.cap.2003.10.009.

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Lin, Jian-Shian, Chieh-Lung Lai, Ya-Chun Tu, Cheng-Hua Wu, and Yoshimi Takeuchi. "A Uniform Pressure Apparatus for Micro/Nanoimprint Lithography Equipment." International Journal of Automation Technology 3, no. 1 (January 5, 2009): 84–88. http://dx.doi.org/10.20965/ijat.2009.p0084.

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Nanoimprint lithography (NIL) has overcome the limitation of light diffraction. It is capable of printing features less than 10nm in size with high lithographic resolution, high manufacturing speed, and low production cost. The uniformity of pressure, however, remains a critical issue. To improve the uniformity of pressure, we developed a flexible uniform pressure component based on Pascal's Law. When external force is applied to this component, uniform pressure is delivered to the mold and substrate. Average pressure over the embossed area using our improved nanoimprint equipment deviates by only 3.15%.

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Dissertations / Theses on the topic "Nanoimprint lithography"

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Hauser, Hubert [Verfasser], and Holger [Akademischer Betreuer] Reinecke. "Nanoimprint lithography for solar cell texturisation = Nanoimprint Lithographie fuer die Solarzellentexturierung." Freiburg : Universität, 2013. http://d-nb.info/1123476160/34.

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Hubbard, Graham John. "Nanoimprint lithography using disposable masters." Thesis, University of Bath, 2011. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.576992.

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A novel imprint process, called Disposable Master Technology has been developed using disposable masters replicated from nickel masters using roll-to-roll printing. The disposable masters consist of a polyester terephthalate film coated with a photosensitive resin containing the inverse structure of the nickel master. The use of hydrophobic and oleophobic additives was found to improve release after imprinting. This has enabled structures of deeply submicron periodicity to be imprinted on silicon wafers up to 4" diameter with good reproducibility. Resist systems have been developed based on urethane acrylates plus a resist based on Oxetanyl Silsesquioxane which contains silicon for improved etch resistance, useful when transferring the imprinted structures into the substrate by reactive ion etching. The addition of fluorinated acrylates has been shown to improve the substrate coverage during spin coating and to ease disposable master release after imprinting. Silicone acrylate, used as an additive was found to improve the etch resistivity as well as also easing disposable master release. The generation of disposable masters from anodic porous alumina has been investigated. Aluminium sample pre-treatment has been optimized for 2 inch diameter aluminium discs to produce 100 nm and 200 nm spaced pores of 180 to 500 nm depth with conical or cylindrical shape. The self-ordered porous alumina has beef! replicated on to PET film creating polymer nanopillars of down to 50 nm in diameter. The resulting nanostructured polymer films can act as anti-reflection coatings. The angle dependent transmission of polymer films has been found to increase transmission by up to 2% at a normal angle of incidence and by 5% at 70Q, when compared to a control sample. Highly ordered mono-domain porous alumina templates were also demonstrated by pre- texturing the aluminium surface using disposable master technology, to provide another method of fabricating master moulds for disposable master technology

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Zheng, Zijian. "Soft lithography and nanoimprint lithography for applications in polymer electronics." Thesis, University of Cambridge, 2007. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.613415.

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He, X. "Nanoimprint lithography for applications in photovoltaic devices." Thesis, University of Cambridge, 2010. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.603915.

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This thesis describes efforts to achieve an idealized architecture and to characterize the transport in polymer-based PV devices, by employing novel nanoimprint techniques. First, a novel double-imprinting process is described, which allows the fabrication of ideally structured “polymer-polymer” and “polymer-small molecule” heterojunctions, with any composition. The dimensions of both phases can be independently tailored to match the respective exciton diffusion length in either phase PV devices with extremely high densities (up to 10¹⁴/mm²) of interpenetrating nanoscale columnar features, as small as 25 nm in the active polymer blend layer, were fabricated and showed considerable improvement over the traditional blend devices. It is believed that this work advances the state of the art in polymeric organic electronic devices. Second, a non-conventional nanopatterning technique has been developed and used to fabricate well-aligned vertical ZnO nanowire arrays. This demonstrates the potential for this approach to serve as a nanostructured metal oxide scaffold for “polymer-metal oxide” hybrid PVs, as well as other nanoscaled (opto)electronic devices, due to its attractive electromechanical properties.

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Colburn, Matthew Earl. "Step and flash imprint lithography : a low-pressure, room-temperature nanoimprint lithography /." Access restricted to users with UT Austin EID Full text (PDF) from UMI/Dissertation Abstracts International, 2001. http://wwwlib.umi.com/cr/utexas/fullcit?p3025205.

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Fernández, Estévez Ariadna. "Functional surfaces by means of nanoimprint lithography techniques." Doctoral thesis, Universitat Autònoma de Barcelona, 2016. http://hdl.handle.net/10803/400142.

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Diferentes funcionalidades pueden ser obtenidas en diversas superficies a través de topografía en lugar de química, inspirándose en la naturaleza. El principal objetivo de esta tesis es la investigación de la litografía de nanoimpresión (NIL) como una técnica de fabricación factible para modificar superficies y así alterar sus propiedades físicas, utilizándolas para aplicaciones superhidrofóbicas y oleofóbicas. A lo largo de esta tesis una técnica derivada de la nanoimpresión, capaz de imprimir con cero capa residual, fue desarrollada. Esta novedosa técnica de impresión se puede adaptar para crear patrones sobre superficies con distintas formas, permitiéndonos realizar estructuras jerárquicas en tres dimensiones (3D) con diferentes combinaciones de micro y nanoestructuras. Demostramos que las técnicas de fabricación desarrolladas en esta tesis son adaptables a los procesos industriales de facturación, permitiendo así su aplicación en el desarrollo de superficies funcionales. Las estructuras tridimensionales producidas en esta tesis fueron realizadas usando métodos de replicación industrial, tales como electrodeposición o moldeo por inyección. Además, varios materiales fueron investigados en los que estas estructuras en 3D se pudieron reproducir. Nuestro proceso nos permite producir superficies superhidrofóbicas de una forma controlada, abriendo el camino hacia la producción industrial de superficies plásticas funcionales. En nuestros experimentos conseguimos un ángulo de contacto de 170 o con una histéresis de 4 o sin la necesidad de ningún tratamiento químico adicional. Los efectos dinámicos fueron medidos en estas superficies, obteniendo excelentes propiedades autolimpiables, así como una buena robustez antes impacto de gotas. El preciso control sobre nuestro proceso de fabricación nos permitió realizar superficies híbridas con propiedades de mojado inducidas. Se realizaron superficies jerárquicas que resultaron en una doble funcionalidad. Concretamente, nuestras estructuras presentaron tanto el estado de “lotus” como el de “petal” cuando se cambiaron las condiciones de deposición de las gotas, sin ninguna necesidad de modificar la superficie. La gran diferencia entre las dos presiones capilares ejercidas por las micro y nanoestructuras fue el factor que nos permitió controlar la adhesión de dichas gotas. A pesar de la percepción de que la litografía de nanoimpresión no es adecuada para imprimir superficies que puedan sobresalir (“overhanging”), en esta tesis probamos que a través de litografía de nanoimpresión asistida por ultravioleta podemos realizar estructuras de tipo “seta”. Estas structuras fueron fabricadas a través de un novedoso proceso de electrodeposición, consistente en un único paso. Estas estructures fueron replicadas en una resina comercial que, en combinación con un post-tratamiento químico, exhiben propiedades amfifóbicas (repeliendo tanto agua como aceites). Se realizó un análisis de las características de mojado de estas estructures mediante el uso de líquidos que poseyeran diferentes energías superficiales. La energía superficial crítica para conseguir la oleofobicidad fue demostrada experimentalmente.
Different surface functionalities can be achieved by means of topography instead of chemistry, based on inspirations from nature. The main objective of this thesis is the investigation of Nanoimprint Lithography (NIL) as a feasible fabrication technique to modify both organic and inorganic surfaces to alter their physical properties and utilize them for superhydrophobic and oleophobic applications. During this thesis a modified nanoimprint technique, capable of imprinting with zero residual layer was developed. This novel imprint based technique is adaptable to pattern over free form surfaces, allowing us to realize tailored three dimensional (3D) hierarchical micro and nanostructured surfaces. We demonstrate that the fabrication techniques developed in this thesis, are adaptable to industrial manufacturing process, allowing their application on the development of functional surfaces. The produced 3D hierarchical surfaces were realized using fully industrial replication methods such as electroplating and injection molding techniques. Moreover, various materials have been tested into which the 3D hierarchical structured were replicated. Our manufacturing approach allowed us to reproduce our superhydrophobic surfaces in a controlled manner opening the path to high volume manufacturing of functional plastic components and surfaces. Within our experimental findings we achieved a static contact angle value of 170 o with a hysteresis of 4 o without the need of any additional chemical treatment. Dynamic effects were measured on the produced surfaces, obtaining remarkable self-cleaning properties, as well as excellent robustness over impacting droplets. The precise control of the developed fabrication technique allowed us to realize hybrid hierarchical patterned surfaces with tunable wetting properties. Hierarchical surfaces were realized resulting in a dual state functionality. In particular, our structured surfaces exhibit both “lotus” and “petal” effect when varying the deposition conditions of the water droplets, without the need of any modification of the surface. The great difference between the capillary pressures exerted by the micro and nanostructures resulted in a tailored adhesion of the water droplets. The low capillary pressure induced by the microstructures and the high capillary pressure observed by the nanostructures, allowed to achieve a controlled dynamic effect, enabling different wetting states on the same hybrid surface. Despite the perception that NIL is not suitable for direct imprinting surfaces which contain overhanging structures, within this thesis we prove that ultraviolet light assisted nanoimprint lithography (UV-NIL) is a suitable technique to realize mushroom-like structures. These 3D structures, which contained overhanging features, were fabricated by a novel one-step up-plating process. The structures were successfully replicated in a commercial UV curable resist material, that, in combination with a chemical post treatment, exhibited amphiphobic (both hydrophobicity and oleophobicity) properties. Wetting analysis of the produced 3D surface was performed using a variety of liquids possessing different surface tensions. The critical surface tension for achieving oleophobicity was established experimentally.

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Mohamed, Khairudin. "Three-Dimensional Patterning Using Ultraviolet Curable Nanoimprint Lithography." Thesis, University of Canterbury. Electrical and Computer Engineering, 2009. http://hdl.handle.net/10092/3049.

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Although a large number of works on nanoimprint lithography (NIL) techniques have been reported, the the ability for three-dimensional (3-D) patterning using NIL has not been fully addressed in terms of the mold fabrication and imprint processes. Patterning 3-D and multilevel features are important because they eliminate multiple steps and complex interlevel alignments in the nanofabrication process. The 3-D and multilevel mold design and fabrication, and imprint processes have been studied and investigated in this research work. In the UV-NIL technique, a transparent mold with micro/nanostructure patterns on its surface is allowed to be replicated on UV curable polymer without the need of high applied pressure or temperature. UV-NIL has the potential to fabricate micro/nanostructures with high resolution, high reproducibility, low cost, high throughput and is capable of 3-D patterning. This research focuses on two aspects; the development of mold making and imprint processes. In the process of making a master mold, an EBL technique was employed for writing patterns on e-beam resists. PMMA positive resist was used for 2-D patterning and ma-N2403 negative resist from Microresist Technology was used for 3-D patterning. After being developed, the 3-D mold pattern was transferred onto quartz substrate using a single-step reactive ion etching (RIE) technique. A number of challenging issues such as surface charging, electron scattering and proximity effects surfaced during the EBL pattern writing on insulating and transparent molds. A number of new approaches have been developed for suppressing the charging effects in the 2-D and 3-D patterning. Using thin metallic coating on the quartz substrates or on top of the resist, or conductive polymer coating using PEDOT/PSS on top of the resist has demonstrated excellent results in a 2-D structure with a high aspect-ratio of 1:10 and feature sizes down to 60 nm. In 3-D patterning, two approaches have been followed; the critical energy method and/or a top coating of conductive polymer (PEDOT/PSS) layer. Isolated 3-D structures with feature sizes down to 500 nm were successfully fabricated using the first method while by using the second method, dense 3-D structures patterns with feature sizes down to 300 nm, on 400 nm pitch have been demonstrated. In UV-NIL, the surface roughness Rq(rms) should be less than 5 nm, which is important for replicating optical structures and devices. In this work, the RIE process been optimized to yield 2 nm roughness on a patterned quartz surface. This was achieved by optimizing the RIE process pressure of below 6 mTorr. The other part of this thesis is on replication or imprinting of 2-D and 3-D structures. In the process of replicating the master mold profiles, the imprint processes were carried out using a vacuum operated manual imprint tool which was attached to a Mask Aligner UV illumination system. In 2-D imprinting, resist sticking on the vertical side wall was the main issue, especially on high aspect ratio structures. Meanwhile in 3-D imprinting, the imprint results have shown good reproducibility in up to 15 imprint cycles, where the issue of Ormocomp soft/daughter mold cracking after long UV exposure had limited the repetition of the imprint cycles. In this thesis, the 2-D and 3-D resist patterning on insulating substrates using the EBL technique have been demonstrated with the assistance of a number of developed charge suppression methods. Single-step RIE pattern transfer onto quartz substrates with surface roughness below 5nm has been achieved. Replication of 3-D and multilevel structures reliably make the UV-NIL technique suitable for future applications such as surface texturing, optical devices and many other complex structures including MEMS.

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Lin, Yu-Wei. "Fabrication of Metallic Antenna Arrays using Nanoimprint Lithography." Master's thesis, University of Central Florida, 2013. http://digital.library.ucf.edu/cdm/ref/collection/ETD/id/5979.

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This Thesis describes the development of a cost-effective process for patterning nanoscale metal antenna arrays. Soft ultraviolet (UV) Nanoimprint Lithography (NIL) into bilayer resist was chosen since it enables repeatable large-scale replication of nanoscale patterns with good lift-off properties using a simple low-cost process. Nanofabrication often involves the use of Electron Beam Lithography (EBL) which enables the definition of nanoscale patterns on small sample regions, typically < 1 mm2. However its sequential nature makes the large scale production of nanostructured substrates using EBL cost-prohibitive. NIL is a pattern replication method that can reproduce nanoscale patterns in a parallel fashion, allowing the low-cost and rapid production of a large number of nano-patterned samples based on a single nanostructured master mold. Standard NIL replicates patterns by pressing a nanostructured hard mold into a soft resist layer on a substrate resulting in exposed substrate regions, followed by an optional Reactive Ion Etching (RIE) step and the subsequent deposition of e.g. metal onto the exposed substrate area. However, non-vertical sidewalls of the features in the resist layer resulting from an imperfect hard mold, from reflow of the resist layer, or from isotropic etching in the RIE step may cause imperfect lift-off. To overcome this problem, a bilayer resist method can be used. Using stacked resist layers with different etch rates, undercut structures can be obtained after the RIE step, allowing for easy lift-off even when using a mold with non-vertical sidewalls. Experiments were carried out using a nanostructured negative SiO2 master mold. Various material combinations and processing methods were explored. The negative master mold was transferred to a positive soft mold, leaving the original master mold unaltered. The soft mold consisted of a 5 ?m thick top Poly(methyl methacrylate) (PMMA), or Polyvinyl alcohol (PVA) layer, a 1.5 mm thick Polydimethylsiloxane (PDMS) buffer layer, and a glass supporting substrate. The soft mold was pressed into a bilayer of 300 nm PMMA and 350 nm of silicon based UV-curable resist that was spin-coated onto a glass slide, and cured using UV radiation. The imprinted patterns were etched using RIE, exposing the substrate, followed by metal deposition and lift-off. The experiments show that the use of soft molds enables successful pattern transfer even in the presence of small dust particles between the mold and the resist layer. Feature sizes down to 280 nm were replicated successfully.
M.S.
Masters
Optics and Photonics
Optics and Photonics
Optics; International

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Maury, Pascale Anne. "Fabrication of nanoparticle and protein nanostructures using nanoimprint lithography." Enschede : University of Twente [Host], 2007. http://doc.utwente.nl/57701.

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GoGwilt, Cai P. (Cai Peter). "The effects of feature geometry on simulating nanoimprint lithography." Thesis, Massachusetts Institute of Technology, 2011. http://hdl.handle.net/1721.1/66419.

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Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2011.
Cataloged from PDF version of thesis.
Includes bibliographical references (p. 67-68).
Nanoimprint lithography (NIL) is a method for fabricating nano-scale patterns by pressing stamps into viscous materials. A key barrier to industry adoption of NIL is the inability to predict whether a stamp will imprint successfully and how long the process should be run for. In this thesis, we help quantify the accuracy loss for an existing simulation package, simprint, which supports geometric abstractions and can simulate at the die level. To do this, we develop and study several comparison metrics. Our temporal submetric quantifies the error between two simulations at each timestep, while our spatial submetric quantifies the error at each spatial location. We subsequently use these metrics to study pattern abstraction by looking at how different types of patterns lead to different errors. This would allow us to suggest pattern abstractions that could improve the accuracy of a simulation. However, none of the features we study correlate with error. We conclude by exploring other possible uses of our metrics.
by Cai P. GoGwilt.
M.Eng.

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Books on the topic "Nanoimprint lithography"

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Lan, Hongbo. Nanoimprint lithography: Principles, processes and materials. New York: Nova Science Publishers, Inc., 2011.

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Zhou, Weimin. Nanoimprint Lithography: An Enabling Process for Nanofabrication. Berlin, Heidelberg: Springer Berlin Heidelberg, 2013. http://dx.doi.org/10.1007/978-3-642-34428-2.

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Zhou, Weimin. Nanoimprint Lithography: An Enabling Process for Nanofabrication. Berlin, Heidelberg: Springer Berlin Heidelberg, 2013.

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Mühlberger, Michael, ed. Nanoimprint Lithography Technology and Applications. MDPI, 2022. http://dx.doi.org/10.3390/books978-3-0365-4481-6.

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Zhou, Weimin. Nanoimprint Lithography: An Enabling Process for Nanofabrication. Springer, 2012.

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Zhou, Weimin. Nanoimprint Lithography: An Enabling Process for Nanofabrication. Springer, 2016.

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Ito, Hiroshi, Jun Taniguchi, Jun Mizuno, and Takushi Saito. Nanoimprint Technology: Nanotransfer for Thermoplastic and Photocurable Polymers. Wiley, 2013.

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Ito, Hiroshi, Jun Taniguchi, Jun Mizuno, and Takushi Saito. Nanoimprint Technology: Nanotransfer for Thermoplastic and Photocurable Polymers. Wiley & Sons, Incorporated, John, 2013.

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Ito, Hiroshi, Jun Taniguchi, Jun Mizuno, and Takushi Saito. Nanoimprint Technology: Nanotransfer for Thermoplastic and Photocurable Polymers. Wiley & Sons, Incorporated, John, 2013.

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Ito, Hiroshi, Jun Taniguchi, Jun Mizuno, and Takushi Saito. Nanoimprint Technology: Nanotransfer for Thermoplastic and Photocurable Polymers. Wiley & Sons, Limited, John, 2013.

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Book chapters on the topic "Nanoimprint lithography"

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Landis, Stefan. "NanoImprint Lithography." In Nano-Lithography, 87–168. Hoboken, NJ USA: John Wiley & Sons, Inc., 2013. http://dx.doi.org/10.1002/9781118622582.ch2.

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Chou, Stephen Y. "Nanoimprint Lithography." In Alternative Lithography, 15–23. Boston, MA: Springer US, 2003. http://dx.doi.org/10.1007/978-1-4419-9204-8_2.

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Yoda, Minami, Jean-Luc Garden, Olivier Bourgeois, Aeraj Haque, Aloke Kumar, Hans Deyhle, Simone Hieber, et al. "Nanoimprint Lithography." In Encyclopedia of Nanotechnology, 1569. Dordrecht: Springer Netherlands, 2012. http://dx.doi.org/10.1007/978-90-481-9751-4_100506.

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Schift, Helmut, and Anders Kristensen. "Nanoimprint Lithography." In Springer Handbook of Nanotechnology, 113–42. Berlin, Heidelberg: Springer Berlin Heidelberg, 2017. http://dx.doi.org/10.1007/978-3-662-54357-3_5.

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Schift, Helmut, and Anders Kristensen. "Nanoimprint Lithography." In Springer Handbook of Nanotechnology, 239–78. Berlin, Heidelberg: Springer Berlin Heidelberg, 2007. http://dx.doi.org/10.1007/978-3-540-29857-1_8.

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Taniguchi, Jun, Noriyuki Unno, Hidetoshi Shinohara, Jun Mizuno, Hiroshi Goto, Nobuji Sakai, Kentaro Tsunozaki, Hiroto Miyake, Norio Yoshino, and Kenichi Kotaki. "Ultraviolet Nanoimprint Lithography." In Nanoimprint Technology, 91–168. Chichester, UK: John Wiley & Sons, Ltd, 2013. http://dx.doi.org/10.1002/9781118535059.ch5.

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Zhou, Weimin. "Nanoimprint Lithography Resists." In Nanoimprint Lithography: An Enabling Process for Nanofabrication, 99–110. Berlin, Heidelberg: Springer Berlin Heidelberg, 2012. http://dx.doi.org/10.1007/978-3-642-34428-2_5.

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Zhou, Weimin. "Nanoimprint Lithography Process." In Nanoimprint Lithography: An Enabling Process for Nanofabrication, 111–46. Berlin, Heidelberg: Springer Berlin Heidelberg, 2012. http://dx.doi.org/10.1007/978-3-642-34428-2_6.

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Montelius, Lars, and Babak Heidari. "Wafer Scale Nanoimprint Lithography." In Alternative Lithography, 77–101. Boston, MA: Springer US, 2003. http://dx.doi.org/10.1007/978-1-4419-9204-8_5.

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Ito, Hiroshi, and Takushi Saito. "Nanoimprint Lithography: Background and Related Techniques." In Nanoimprint Technology, 9–15. Chichester, UK: John Wiley & Sons, Ltd, 2013. http://dx.doi.org/10.1002/9781118535059.ch2.

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Conference papers on the topic "Nanoimprint lithography"

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Chen, Y., E. Roy, Y. Kanamori, M. Belotti, and D. Decanini. "Soft nanoimprint lithography." In Photonics Asia 2004, edited by Yangyuan Wang, Jun-en Yao, and Christopher J. Progler. SPIE, 2005. http://dx.doi.org/10.1117/12.570745.

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Xu, Hantao, Lianhuan Han, Bingqian Du, Yang Wang, Zhen Ma, Zhong-Qun Tian, Zhao-Wu Tian, and Dongping Zhan. "Electrochemical Nanoimprint Lithography." In 2021 IEEE 16th International Conference on Nano/Micro Engineered and Molecular Systems (NEMS). IEEE, 2021. http://dx.doi.org/10.1109/nems51815.2021.9451284.

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Litt, Lloyd C., and Matt Malloy. "SEMATECH's nanoImprint program: a key enabler for nanoimprint introduction." In SPIE Advanced Lithography, edited by Frank M. Schellenberg and Bruno M. La Fontaine. SPIE, 2009. http://dx.doi.org/10.1117/12.814370.

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Lugli, Paolo, Stefan Harrer, Sebastian Strobel, Francesca Brunetti, Giuseppe Scarpa, Marc Tornow, and Gerhard Abstreiter. "Advances in Nanoimprint Lithography." In 2007 7th IEEE Conference on Nanotechnology (IEEE-NANO). IEEE, 2007. http://dx.doi.org/10.1109/nano.2007.4601394.

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Li, Mingtao, Hua Tan, Linshu Kong, and Larry Koecher. "Four-inch photocurable nanoimprint lithography using NX-2000 nanoimprinter." In Microlithography 2004, edited by R. Scott Mackay. SPIE, 2004. http://dx.doi.org/10.1117/12.537232.

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Fukuhara, Kazuya, Masato Suzuki, Masaki Mitsuyasu, Takuya Kono, Tetsuro Nakasugi, Yonghyun Lim, and Wooyung Jung. "Overlay control for nanoimprint lithography." In SPIE Advanced Lithography, edited by Christopher Bencher and Joy Y. Cheng. SPIE, 2017. http://dx.doi.org/10.1117/12.2256715.

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7

Chien-Hung Lin and Rongshun Chen. "Nanofabrication with Ultrasonic Nanoimprint Lithography." In 2006 Sixth IEEE Conference on Nanotechnology. IEEE, 2006. http://dx.doi.org/10.1109/nano.2006.247725.

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8

Scheer, H. C. "Nanoimprint lithography techniques: an introduction." In 22nd European Mask and Lithography Conference. SPIE, 2006. http://dx.doi.org/10.1117/12.692648.

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Lyebyedyev, D., and Hella-Christin Scheer. "Mask definition by nanoimprint lithography." In 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents. SPIE, 2001. http://dx.doi.org/10.1117/12.425079.

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Kreindl, Gerald, and Thorsten Matthias. "Nanoimprint lithography for microfluidics manufacturing." In SPIE Micro+Nano Materials, Devices, and Applications, edited by James Friend and H. Hoe Tan. SPIE, 2013. http://dx.doi.org/10.1117/12.2035609.

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Reports on the topic "Nanoimprint lithography"

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Simmons, Blake Alexander, and William P. King. Fundamentals of embossing nanoimprint lithography in polymer substrates. Office of Scientific and Technical Information (OSTI), February 2011. http://dx.doi.org/10.2172/1011211.

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Kong, Linshu, and Larry Koecher. Nanoimprint Lithography of Parallel Patterning of Nanoscale Magnetoelectronic Devices. Fort Belvoir, VA: Defense Technical Information Center, December 2002. http://dx.doi.org/10.21236/ada411296.

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Schunk, Peter Randall, William P. King, Amy Cha-Tien Sun, and Harry D. Rowland. Simulations of non-uniform embossing:the effect of asymmetric neighbor cavities on polymer flow during nanoimprint lithography. Office of Scientific and Technical Information (OSTI), August 2007. http://dx.doi.org/10.2172/913532.

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Schunk, Peter Randall, William P. King, Amy Cha-Tien Sun, and Harry D. Rowland. Impact of polymer film thickness and cavity size on polymer flow during embossing : towards process design rules for nanoimprint lithography. Office of Scientific and Technical Information (OSTI), August 2006. http://dx.doi.org/10.2172/893154.

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