Journal articles: 'Microwave plasmas'

1

Zubritsky, Elizabeth. "Science: Miniature microwave plasmas." Analytical Chemistry 72, no. 1 (January 2000): 22 A—23 A. http://dx.doi.org/10.1021/ac002711l.

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2

Brown, Peter G., Timothy J. Brotherton, John M. Workman, and Joseph A. Caruso. "Electron Number Density Studies in Moderate-Power Argon and Helium Microwave-Induced Plasmas." Applied Spectroscopy 41, no. 5 (July 1987): 774–79. http://dx.doi.org/10.1366/0003702874448175.

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The electron number density of atmospheric-pressure argon and helium microwave-induced plasmas operating in the power regime of 100 to 450 W has been examined. The resulting data demonstrate a trend of increasing electron density, ne, for both the Ar and He microwave-induced plasmas as forward power is increased. An examination of ne vs. plasma observation position demonstrates a maximum in ne at the central plasma observation position for both plasmas. Further, spatial dependence of electron density appears to be more pronounced at high power levels. Nebulization of aqueous solutions containing varying concentrations of an easily ionizable element into the Ar microwave-induced plasma, MIP, demonstrates little if any effect on ne. Moreover, this observation can be explained by the fact that there is a far greater quantity of water than easily ionizable element being introduced into the plasma in a given time period. Thus the electron contribution resulting from water degradation products in the plasma far outweighs that from the relatively small amount of easily ionizable element present. This last point is further substantiated by an examination of the Ar MIP with and without solution nebulization.

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3

Venkateswaran, S., D. A. Schwer, and C. L. Merkle. "Numerical Modeling of Waveguide Heated Microwave Plasmas." Journal of Fluids Engineering 115, no. 4 (December 1, 1993): 732–41. http://dx.doi.org/10.1115/1.2910206.

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Waveguide-heated microwave plasmas for space propulsion applications are analyzed by a two-dimensional numerical solution of the combined Navier-Stokes and Maxwell equations. Two waveguide configurations—one purely transmitting and the other with a reflecting end wall—are considered. Plasma stability and absorption characteristics are studied and contrasted with the characteristics of resonant cavity heated plasmas. In addition, preliminary estimates of the overall efficiency and the thrust and specific impulse of the propulsion system are also made. The computational results are used to explain experimental trends and to better understand the working of these devices.

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4

Haifeng, Zhang, Shao Fuqiu, and Wang Long. "Interactions of Microwave with Plasmas." Plasma Science and Technology 5, no. 3 (June 2003): 1773–78. http://dx.doi.org/10.1088/1009-0630/5/3/003.

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5

Novik, K. M., and A. D. Piliya. "Enhanced microwave scattering in plasmas." Plasma Physics and Controlled Fusion 36, no. 3 (March 1, 1994): 357–81. http://dx.doi.org/10.1088/0741-3335/36/3/001.

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6

Huang, J. H., and S. L. Suib. "Methane dimerization via microwave plasmas." Research on Chemical Intermediates 20, no. 1 (January 1994): 133–39. http://dx.doi.org/10.1163/156856794x00135.

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7

Exton, R. J., S. Popovic, G. C. Herring, and M. Cooper. "Levitation using microwave-induced plasmas." Applied Physics Letters 86, no. 12 (March 21, 2005): 124103. http://dx.doi.org/10.1063/1.1887837.

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8

Leins, M., J. Kopecki, S. Gaiser, A. Schulz, M. Walker, U. Schumacher, U. Stroth, and T. Hirth. "Microwave Plasmas at Atmospheric Pressure." Contributions to Plasma Physics 54, no. 1 (November 5, 2013): 14–26. http://dx.doi.org/10.1002/ctpp.201300033.

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9

van Ninhuijs, M. A. W., J. Beckers, and O. J. Luiten. "Collisional microwave heating and wall interaction of an ultracold plasma in a resonant microwave cavity." New Journal of Physics 24, no. 6 (June 1, 2022): 063022. http://dx.doi.org/10.1088/1367-2630/ac6c46.

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Abstract Recently, we introduced a resonant microwave cavity as a diagnostic tool for the study of ultracold plasmas (UCPs). This diagnostic allows us to study the electron dynamics of UCPs non-destructively, very fast, and with high sensitivity by measuring the shift in the resonance frequency of a cavity, induced by a plasma. However, in an attempt to theoretically predict the frequency shift using a Gaussian self-similar expansion model, a three times faster plasma decay was observed in the experiment than found in the model. For this, we proposed two causes: plasma–wall interactions and collisional microwave heating. In this paper, we investigate the effect of both causes on the lifetime of the plasma. We present a simple analytical model to account for electrons being lost to the cavity walls. We find that the model agrees well with measurements performed on plasmas with different initial electron temperatures and that the earlier discrepancy can be attributed to electrons being lost to the walls. In addition, we perform measurements for different electric field strengths in the cavity and find that the electric field has a small, but noticeable effect on the lifetime of the plasma. By extending the model with the theory of collisional microwave heating, we find that this effect can be predicted quite well by treating the energy transferred from the microwave field to the plasma as additional initial excess energy for the electrons.

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10

Krasik, Yakov, John Leopold, Guy Shafir, Yang Cao, Yuri Bliokh, Vladislav Rostov, Valery Godyak, et al. "Experiments Designed to Study the Non-Linear Transition of High-Power Microwaves through Plasmas and Gases." Plasma 2, no. 1 (March 8, 2019): 51–64. http://dx.doi.org/10.3390/plasma2010006.

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The interaction of powerful sub-picosecond timescale lasers with neutral gas and plasmas has stimulated enormous interest because of the potential to accelerate particles to extremely large energies by the intense wakefields formed and without being limited by high accelerating gradients as in conventional accelerator cells. The interaction of extremely high-power electromagnetic waves with plasmas is though, of general interest and also to plasma heating and wake-field formation. The study of this subject has become more accessible with the availability of sub-nanosecond timescale GigaWatt (GW) power scale microwave sources. The interaction of such high-power microwaves (HPM) with under-dense plasmas is a scale down of the picosecond laser—dense plasma interaction situation. We present a review of a unique experiment in which such interactions are being studied, some of our results so far including results of our numerical modeling. Such experiments have not been performed before, self-channeling of HPM through gas and plasma and extremely fast plasma electron heating to keV energies have already been observed, wakefields resulting from the transition of HPM through plasma are next and more is expected to be revealed.

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11

Taheri, Saeedeh, Dylan John McFarlane, Scott William Mattner, and Graham Ian Brodie. "Potential of Microwave Heating and Plasma for Biosecurity Applications." Thermo 2, no. 3 (September 19, 2022): 312–33. http://dx.doi.org/10.3390/thermo2030022.

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This review explores the use of microwave heating and microwave-generated plasma for biosecurity applications. Microwave heating has been shown to rapidly heat and kill a wide range of pests and pathogens. Examples of microwave thermal disinfestation of soils, grains, hay, and timber are presented and discussed. Microwave energy can also ionize various gasses, including air, to create plasma. Plasmas are described by many characteristics, such as temperature, degree of ionization, and density. In the “after glow” (cold plasma) of a plasma discharge, there are sufficient charged particles and excited atoms to generate elevated UV levels and ionize the surfaces of objects. Examples of cold plasma and plasma-activated water disinfestation of grains and other commodities are also presented and discussed. Brief comments on the scale-up of this technology have also been presented.

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12

Abdel-Gawad, H. I. "On the continuity equation for electrons in microwave-afterglow plasmas." Journal of Plasma Physics 47, no. 2 (April 1992): 193–95. http://dx.doi.org/10.1017/s0022377800024168.

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13

Franz, Gerhard, Florian Schamberger, Igor Krstev, and Stefan Umrath. "Recording Spatially Resolved Plasma Parameters in Microwave-Driven Plasmas." Plasma Science and Technology 15, no. 1 (January 2013): 43–51. http://dx.doi.org/10.1088/1009-0630/15/1/08.

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14

Tarasova, A. V., N. K. Podder, and E. J. Clothiaux. "Measurements of plasma potential in high-pressure microwave plasmas." Review of Scientific Instruments 80, no. 4 (April 2009): 043506. http://dx.doi.org/10.1063/1.3125624.

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15

Oosterbeek, Johan W., Neha Chaudhary, Matthias Hirsch, Udo Höfel, and Robert C. Wolf. "Assessment of ECH stray radiation levels at the W7-X Michelson Interferometer and Profile Reflectometer." EPJ Web of Conferences 203 (2019): 03010. http://dx.doi.org/10.1051/epjconf/201920303010.

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Electron Cyclotron Heating and Electron Cyclotron Current Drive are key components for heating and control in magnetically confined fusion plasmas. The high power microwaves are not always completely absorbed leading to stray radiation [1], [2]. At W7-X, the total injected microwave power can be up to 7.5 MW @140 GHz while the entire Electron Cyclotron Emission picked-up by an observer at the edge of the plasma is a fraction of a mW. In the situation of a Michelson Interferometer, the principle measurement is the entire ECE spectrum. Thus, any stray radiation is bound to enter the spectrum. In this work initial stray radiation measurements without filters at the location of two microwave receivers -the Michelson Interferometer and the Profile Reflectometer -are discussed. The data is used to dimension a notch filter to be used with the broad band Michelson Interferometer.

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16

Chou, ChinHao, and Jonathan Phillips. "Plasma production of metallic nanoparticles." Journal of Materials Research 7, no. 8 (August 1992): 2107–13. http://dx.doi.org/10.1557/jmr.1992.2107.

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Metallic iron and iron oxide particles were produced by injecting ferrocene into the afterglow region of a low pressure, low power, plasma generated using a microwave power source. This was done as part of an effort to explore the feasibility of using flow type microwave plasmas for the production of metal nanoparticles. It was found that two parameters had the largest impact on the particles: injection point and plasma composition. Analysis done using Mössbauer effect spectroscopy, transmission electron microscopy, and x-ray diffraction indicated that low yields of small particles (ca. 10 nm) resulted from injection into the afterglow region. Much higher yields of large particles (ca. 50 nm) formed if the ferrocene was injected through the coupler. In hydrogen plasmas the particles that were produced were metallic iron, whereas in oxygen and argon plasmas the particles were iron oxide. In all cases significant amounts of graphitic carbon formed around the metal particles.

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17

Lysakowski, Richard S., Raymond E. Dessy, and Gary L. Long. "Laser-Enhanced Ionization in Microwave-Induced Plasmas." Applied Spectroscopy 43, no. 7 (September 1989): 1139–45. http://dx.doi.org/10.1366/0003702894203561.

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Laser-Enhanced Ionization (LEI) signals have been detected for Na, Li, and Ba analytes in a microwave-induced plasma (MIP). A 300-mW continuous-wave (cw) dye laser pumped by a 5-W argon-ion laser was used to promote measurably increased ionization rates for these elements. A low-power, high-efficiency microwave plasma at 1 atmosphere with nitrogen and nitrogen-containing support gas was employed as the atom reservoir. The effects of varying applied microwave power, support gas composition, electrode voltage, and geometry were studied and results are given. The experimental variables that most significantly affect LEI signal intensity are: (1) electrode geometry, spacing, voltage, and distance above the cavity; (2) applied microwave power; (3) gas composition in an argon and nitrogen mixture; and (4) laser intensity. Experimental results are presented from the studies of Na LEI signals as a function of each one of these variables. Preliminary analytical studies yield Na detection limits in the low ng/mL range, showing this method to be competitive with other laser-based ionization methods.

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18

Zhu, Xiao Mei, Bing Sun, Cheng Huo, and Hong Duan Xie. "Advances in Abatement of Perfluorocarbons (PFCs) with Microwave Plasma." Advanced Materials Research 518-523 (May 2012): 2315–18. http://dx.doi.org/10.4028/www.scientific.net/amr.518-523.2315.

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Perfluorocarbons have been widely used in the semiconductor industry. As highly potent global warming gases, they have extremely long atmospheric lifetime and intensive absorption ability of infrared radiation. Naturally, the abatement of PFCs becomes a critical environmental issue. In this paper, an effort is made to review the development of microwave plasma technology for the control of PFCs. Relevant studies indicate that microwave plasma has the advantage of high electron temperature and high electron density which is of great potential to PFCs abatement. Low pressure microwave plasma may interfere with the normal operation of semiconductor manufacturing processes. At atmospheric pressure, microwave plasmas exhibit high react performance with PFCs. The atmospheric pressure microwave plasma combined with catalyst can reduce the microwave power and increase the destruction and removal efficiency and energy efficiency. The combination technology has a good potential to be used as an integrated technology for abating PFCs from complicated gas streams of semiconductor manufacturing processes.

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19

Hueso, José L., Víctor J. Rico, José E. Frías, José Cotrino, and Agustín R. González-Elipe. "Ar + NO microwave plasmas forEscherichia colisterilization." Journal of Physics D: Applied Physics 41, no. 9 (March 28, 2008): 092002. http://dx.doi.org/10.1088/0022-3727/41/9/092002.

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20

Röpcke, J., M. Käning, and B. P. Lavrov. "Spectroscopical diagnostics of molecular microwave plasmas." Le Journal de Physique IV 08, PR7 (October 1998): Pr7–207—Pr7–216. http://dx.doi.org/10.1051/jp4:1998717.

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21

Mazzucato, E. "Microwave reflectometry for magnetically confined plasmas." Review of Scientific Instruments 69, no. 6 (June 1998): 2201–17. http://dx.doi.org/10.1063/1.1149121.

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22

Penetrante, B. M., and J. N. Bardsley. "Electron heating in microwave-afterglow plasmas." Physical Review A 34, no. 4 (October 1, 1986): 3253–61. http://dx.doi.org/10.1103/physreva.34.3253.

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23

Schumacher, U., R. Stirn, A. B. Ene, K. Hirsch, M. Leins, P. Lindner, A. Schulz, and M. Walker. "Spectroscopic Analysis of Microwave-Generated Plasmas." IEEE Transactions on Plasma Science 37, no. 9 (September 2009): 1836–42. http://dx.doi.org/10.1109/tps.2009.2026278.

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24

Feichtinger, J., A. Schulz, M. Walker, and U. Schumacher. "Sterilisation with low-pressure microwave plasmas." Surface and Coatings Technology 174-175 (September 2003): 564–69. http://dx.doi.org/10.1016/s0257-8972(03)00404-3.

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25

Huang, Jian, and Steven L. Suib. "Dimerization of methane through microwave plasmas." Journal of Physical Chemistry 97, no. 37 (September 1993): 9403–7. http://dx.doi.org/10.1021/j100139a025.

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26

Scime, Earl E., Robert F. Boivin, John L. Kline, and Matthew M. Balkey. "Microwave interferometer for steady-state plasmas." Review of Scientific Instruments 72, no. 3 (2001): 1672. http://dx.doi.org/10.1063/1.1347971.

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27

Dušek, V., and J. Musil. "Microwave plasmas in surface treatment technologies." Czechoslovak Journal of Physics 40, no. 11 (November 1990): 1185–204. http://dx.doi.org/10.1007/bf01605048.

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28

Gehring, Tim, Qihao Jin, Fabian Denk, Santiago Eizaguirre, David Karcher, and Rainer Kling. "Reducing the Transition Hysteresis of Inductive Plasmas by a Microwave Ignition Aid." Plasma 2, no. 3 (August 16, 2019): 341–47. http://dx.doi.org/10.3390/plasma2030026.

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Inductive plasma discharge has been a part of continuous investigations since it was discovered. Especially the E- to H-mode transition and the hysteresis behavior have been topics of research in the last few decades. In this paper, we demonstrate a way to reduce the hysteresis behavior by the usage of a microwave ignition system. With this system, a significant decrease of the needed coil current for the ignition of the inductive driven plasma is realized. For the microwave generation, a magnetron as in a conventional microwave oven is used, which offers a relatively inexpensive way for microwave ignition aid. At the measured pressure of 7.5 Pa, it was possible to reduce the needed coil current for the inductive mode transition by a factor of 3.75 compared to the mode transition current without the ignition aid. This was achieved by initiating the transition by a few seconds of microwave coupling. The performed simulations suggested that the factor can be further increased at higher pressures. That is especially interesting for plasmas that are hard to ignite or for RF-sources that cannot deliver high enough currents or frequencies for the ignition.

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29

Karoulina, E. V., and Yu A. Lebedev. "Computer simulation of microwave and DC plasmas: comparative characterisation of plasmas." Journal of Physics D: Applied Physics 25, no. 3 (March 14, 1992): 401–12. http://dx.doi.org/10.1088/0022-3727/25/3/010.

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30

Su, Chun Hsi, and Chia Min Huang. "Effect of Zinc Oxide Films on Si Substrates Growth by Microwave Plasma Jet Sintering System." Journal of Nano Research 22 (May 2013): 1–8. http://dx.doi.org/10.4028/www.scientific.net/jnanor.22.1.

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Microwave plasma techniques offered many advantages over conventional fabricating methods. However, few studies have used microwave plasma energy to sinter traditional ceramics. Thus, the aim of this work is microwave plasma Jet sintering system (MPJSS) and simulate analyze the electric field of ZnO films on Si (100) substrates. Ansoft HFSS consists of MPJSS modules for the calculation of ZnO films electromagnetic field. Sinter of ZnO films occurs at approximately N2 with a 10 sccm gas flow rate for a process pressure of 35 Torr and several power of 300W, 600W, 900W and 1200W applied power. Optical emission spectroscopic (OES) studies of N2 microwave plasmas, X-ray diffraction (XRD), Micro-Raman, and FESEM spectrometry were used to characterize the produced ZnO films. The results of XRD and Micro-Raman showed that the synthesized ZnO films had a high crystalline wurzite structure. The Zn2SiO4 peaks reveal an increase of the crystals dimensions with the increase of the E-field. Intensity of diffraction peak of ZnO films increases with increasing microwave powers in MPJSS.

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31

Formisano, V., U. de Angelis, and V. G. Vaccaro. "Particle Acceleration in Plasmas: a Model with Microwave-Driven Plasma Waves." Europhysics Letters (EPL) 3, no. 3 (February 1, 1987): 303–8. http://dx.doi.org/10.1209/0295-5075/3/3/009.

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32

Nagai, Mikio, Masaru Hori, and Toshio Goto. "Properties of atmospheric pressure plasmas with microwave excitations for plasma processing." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 23, no. 2 (March 2005): 221–25. http://dx.doi.org/10.1116/1.1851539.

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33

Ismael, Mohammed E. "Spectroscopic measurements of the electron temperature in low pressure microwave 2.45 GHz argon plasma." Iraqi Journal of Physics (IJP) 13, no. 27 (February 4, 2019): 14–23. http://dx.doi.org/10.30723/ijp.v13i27.259.

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The main goal of this work is to obtain the plasma electron temperature Te by optical emission spectroscopy of low pressure microwave argon plasma, as a function of working pressure and microwave power. A plasma system was designed and constructed in our laboratory using a magnetron of domestic microwave oven with power 800W without any commercial part. The applied voltage on the magnetron electrical circuit is changed for the purpose of obtaining the variable values of the microwave power. The spectral detection is performed with a spectrometer of wavelength range (200−1000nm). The working pressure and magnetron applied voltage were 0.3-3.0mbar and 180-240V, respectively. Two methods had been applied to estimate the electron temperature, the ratio of two lines’ intensity and Boltzmann plot method. It was found that, for the plasmas investigated, an increase of the electron temperature when the applied voltage has been increasing, while the electron temperature decreases when the working pressure is increasing.

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34

Mueller, Juergen, and Michael M. Micci. "Microwave waveguide helium plasmas for electrothermal propulsion." Journal of Propulsion and Power 8, no. 5 (September 1992): 1017–22. http://dx.doi.org/10.2514/3.23587.

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35

Wijtvliet, R., E. Felizardo, E. Tatarova, F. M. Dias, C. M. Ferreira, S. Nijdam, E. V. Veldhuizen, and G. Kroesen. "Spectroscopic investigation of wave driven microwave plasmas." Journal of Applied Physics 106, no. 10 (November 15, 2009): 103301. http://dx.doi.org/10.1063/1.3259429.

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36

Popović, S., M. Rašković, S. P. Kuo, and L. Vušković. "Reactive Oxygen Emission from Microwave Discharge Plasmas." Journal of Physics: Conference Series 86 (October 1, 2007): 012013. http://dx.doi.org/10.1088/1742-6596/86/1/012013.

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37

Tatarova, Elena, Vasco Guerra, Júlio Henriques, and Carlos M. Ferreira. "Nitrogen dissociation in low-pressure microwave plasmas." Journal of Physics: Conference Series 71 (May 1, 2007): 012010. http://dx.doi.org/10.1088/1742-6596/71/1/012010.

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38

Heidenreich, J. E. "Electron energy distributions in oxygen microwave plasmas." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 6, no. 1 (January 1988): 288. http://dx.doi.org/10.1116/1.583980.

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39

Choe, W., Gi-Chung Kwon, Junghee Kim, Jayhyun Kim, Sang-Jean Jeon, and Songwhe Huh. "Simple microwave preionization source for ohmic plasmas." Review of Scientific Instruments 71, no. 7 (July 2000): 2728–32. http://dx.doi.org/10.1063/1.1150682.

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40

Chau, The Tu, Kwan Chi Kao, Gregory Blank, and Francisco Madrid. "Microwave plasmas for low-temperature dry sterilization." Biomaterials 17, no. 13 (July 1996): 1273–77. http://dx.doi.org/10.1016/s0142-9612(96)80003-2.

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41

Henriques, J., E. Tatarova, V. Guerra, and C. M. Ferreira. "Nitrogen dissociation in N2–Ar microwave plasmas." Vacuum 69, no. 1-3 (December 2002): 177–81. http://dx.doi.org/10.1016/s0042-207x(02)00328-7.

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42

The, T. "Microwave plasmas for low-temperature dry sterilization." Biomaterials 17, no. 13 (1996): 1273–77. http://dx.doi.org/10.1016/0142-9612(96)88672-8.

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43

Biggs, David R., and Mark A. Cappelli. "Tunable microwave pulse generation using discharge plasmas." Applied Physics Letters 109, no. 12 (September 19, 2016): 124103. http://dx.doi.org/10.1063/1.4963268.

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44

Nave, A. S. C., F. Mitschker, P. Awakowicz, and J. Röpcke. "Spectroscopic studies of microwave plasmas containing hexamethyldisiloxane." Journal of Physics D: Applied Physics 49, no. 39 (September 8, 2016): 395206. http://dx.doi.org/10.1088/0022-3727/49/39/395206.

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45

Matienzo, L. J., and F. D. Egitto. "Polymer oxidation downstream from oxygen microwave plasmas." Polymer Degradation and Stability 35, no. 2 (January 1992): 181–92. http://dx.doi.org/10.1016/0141-3910(92)90110-q.

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46

Steffen, Hartmut, Karsten Schröder, Benedikt Busse, Andreas Ohl, and Klaus D. Weltmann. "Functionalization of COC Surfaces by Microwave Plasmas." Plasma Processes and Polymers 4, S1 (April 2007): S392—S396. http://dx.doi.org/10.1002/ppap.200731006.

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47

Paquin, L., D. Masson, M. R. Wertheimer, and M. Moisan. "Amorphous silicon for photovoltaics produced by new microwave plasma-deposition techniques." Canadian Journal of Physics 63, no. 6 (June 1, 1985): 831–37. http://dx.doi.org/10.1139/p85-134.

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Amorphous hydrogenated silicon (a-Si :H) has been prepared by microwave (2.45 GHz) plasmas in Ar–SiH4 mixtures using two different deposition systems, a large-volume microwave plasma (LMP) apparatus, and a Surfatron system. Films of a-Si:H are characterized structurally (primarily by scanning electron microscopy), and by Fourier transform ir spectroscopy, as well as according to their electro-optical properties (dark and photoconductivity, I-V characteristics of Schottky-barrier diodes). Although microwave plasmas are thought to differ significantly from conventional lower frequency plasmas, results of the present characterizations show no evidence of this. Deposition in the Surfatron system gives rise to device-grade a-Si:H, as demonstrated by Schottky cell efficiences exceeding 3%. We have been unable to duplicate this in the LMP system in spite of nominally identical fabrication conditions; these films have gross columnar morphology, and they react with atmospheric constituents to give a-Si:(H, C, O) alloys. More pronounced ion bombardment of the substrate during deposition is thought to account for the better quality of Surfatron films.Finally, an ageing effect of Au/a-Si:H/Sb–Cr Schottky diodes is described, unlike any reported hitherto; in a typical device, conversion efficiency was observed to rise by roughly 60% after about 2 months, then it decreased slowly. Preliminary investigations of this effect using various surface analytical techniques suggest that Au acts as a catalyst for room-temperature chemical reactions between a-Si:H and atmospheric constituents, primarily oxygen and water vapor.

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48

Robert Bigras, G., R. Martel, and L. Stafford. "Incorporation-limiting mechanisms during nitrogenation of monolayer graphene films in nitrogen flowing afterglows." Nanoscale 13, no. 5 (2021): 2891–901. http://dx.doi.org/10.1039/d0nr07827a.

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Modification of graphene films in the flowing afterglow of microwave N₂ plasmas. Nitrogenation is first limited by the formation of defect sites by plasma-generated N and N₂(A) at low damage and then by the adsorption of nitrogen atoms at high damage.

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49

Tessier, Yves, J. E. Klemberg-Sapieha, S. Poulin-Dandurand, M. R. Wertheimer, and S. Gujrathi. "Silicon nitride from microwave plasma: fabrication and characterization." Canadian Journal of Physics 65, no. 8 (August 1, 1987): 859–63. http://dx.doi.org/10.1139/p87-132.

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Plasma silicon nitride (P-SiN) films were prepared from SiH4–NH3 mixtures and from ternary mixtures with Ar or N2 in a large-volume microwave plasma apparatus, at substrate temperatures Ts ranging from ambient to 250 °C. Under otherwise nominally identical fabrication conditions, deposition rates were 10 to 25 times greater than those reported by others for radio-or audio-frequency plasmas. Based on film compositions determined by elastic recoil detection, and measurements of such properties as density, refractive index, etch rate in dilute HF, and the moisture permeation coefficient, our best P-SiN films (produced at Ts ≥ 200 °C) were very similar to those reported in the literature.

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50

Xie, Yaoming, and Peter M. A. Sherwood. "X-Ray Photoelectron-Spectroscopic Studies of Carbon Fiber Surfaces. Part IX: The Effect of Microwave Plasma Treatment on Carbon Fiber Surfaces." Applied Spectroscopy 43, no. 7 (September 1989): 1153–58. http://dx.doi.org/10.1366/0003702894203543.

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X-ray photoelectron spectroscopy has been used to monitor the surface chemical changes occurring on type II carbon fibers exposed to air, oxygen, and nitrogen plasmas. In all cases the plasmas caused changes in surface functionality, in terms of both C-O and C-N functionality. Prolonged exposure to the plasmas caused loss of surface functionality for air and oxygen plasmas, and extended treatment caused fiber damage. Plasma treatment of fibers promises to be an effective method of fiber treatment.

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Journal articles on the topic 'Microwave plasmas'

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