Relevant bibliographies by topics / Mask-on/mask-off

Contents

  1. Journal articles
  2. Dissertations / Theses
  3. Books
  4. Book chapters
  5. Conference papers

Academic literature on the topic 'Mask-on/mask-off'

Author: Grafiati
Published: 9 March 2023
Last updated: 10 March 2023

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Journal articles on the topic "Mask-on/mask-off"

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Morciglio, Anthony J., and Yi Jiang. "Mask on, Mask off: An SEIAR Model to Evaluate the Role of Mask in Preventing Disease Transmission." Biophysical Journal 120, no. 3 (February 2021): 263a. http://dx.doi.org/10.1016/j.bpj.2020.11.1686.

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Agustien, Gina Septiani, Nitya Nurul Fadilah, and Dina Fitri Nusyifa. "UJI STABILITAS FISIK SEDIAAN MASKER GEL PEEL-OFF EKSTRAK ETANOL DAUN KENITU (Chrysophyllum cainito L.)." Jurnal Insan Farmasi Indonesia 5, no. 2 (December 31, 2022): 210–18. http://dx.doi.org/10.36387/jifi.v5i2.1064.

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Kenitu leaves contain flavonoids which function as antioxidants that can counteract the bad effects of free radicals, the antioxidant effect will be better if formulated in topical dosage forms. One of the topical dosage forms for use on the face is a peel-off gel mask, its use is easy to remove like an elastic membrane. This study aims to determine the physical stability of the peel-off gel mask preparation of kenitu leaves ethanol extract. The research method was experimental by making three peel-off gel mask formulations based on variations in extract concentration, namely F1 (2%), F2 (4%) and F3 (8%). Evaluations were carried out on the physical stability of the preparation, including organoleptic observations, homogeneity, pH, adhesion, dispersibility, drying time of the preparation, and viscosity. The results showed that the physical stability test of the peel-off gel mask preparation of kenitu leaves ethanol extract could be formulated in the form of a peel-off gel mask preparation, and the best mask formula was F1 with an extract concentration of 2%.
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Sembiring, Bunga Mari. "FORMULASI SEDIAAN MASKER GEL Peel-off EKSTRAK DAUN KECOMBRANG (Etlingera elatior) SEBAGAI PERAWATAN PADA KULIT WAJAH." Jurnal Penelitian Farmasi & Herbal 3, no. 2 (April 30, 2021): 29–34. http://dx.doi.org/10.36656/jpfh.v3i2.656.

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Kecombrang (Etlingera elatior) leaves contain flavonoid compounds, saponins, alkoloid, and tannins. Based on the compounds owned kecombrang leaves can be used as a peel off gel mask. The purpose of this study was to make a peel off gel mask formulation of kecombrang (Etlingera elatior) leaf extract as a treatment for facial skin. The gel peel off mask formulation was made with 4 formulations, F0 = 0%, FI = 10%, FII = 15%, FIII = 20%. Extraction method is done using maceration method with 96% ethanol solvent. Evaluation of peel off gel mask preparations, including organoleptic tests (color, odor, shape), pH measurement of preparations, homogeneity test, dry time test, spreadability test. Peel off gel mask preparations that have effectiveness as treatments for facial skin are FIII formulations with a concentration of 15% that meet the evaluation test requirements, and positive control (Naturgo) which has had better effectiveness test results. The results of the evaluation test of peel off gel mask preparation, including organoleptic test (color, odor, shape), pH measurement of the preparation, homogeneity test, dry time test, dispersion test according to the gel preparation parameters.
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Khairunnisa, Amalia, Pratika Viogenta, Nani Kartinah, Fathur Rahman, and Mulia Mulia. "Peel-off Kefir Mask Arachi (Arachis hypogaea L.): Characterization and Antioxidant Activity." Borneo Journal of Pharmacy 5, no. 1 (February 28, 2022): 42–47. http://dx.doi.org/10.33084/bjop.v5i1.2597.

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This study aims to determine the best formulation for the peel-off mask Arachi or peanut (Arachis hypogaea L). Arachis hypogaea kefir as an active ingredient is added with variations in the concentration of F1 (0.5%) and F2 (2%) (w/v). Organoleptic tests, homogeneity, dry time, and pH were carried out on the peel-off mask that had been made. Antioxidant test (DPPH methods) was performed on masks F1 and F2. The results showed that the peel-off mask of A. hypogaea kefir had the best antioxidant activity at a concentration of 2% (F2) kefir with an IC50 value of 1.865 ppm and was very active. The characteristics of the peel-off mask have good physical stability, proven by not experiencing a change in color, odor, being homogeneous, having good dispersion power, and having a dry time ranging from 10-23 minutes. The pH value of the peel-off mask preparation is 4.52, and it is appropriate with SNI and the pH balance of normal human skin. The peel-off mask of A. hypogaea kefir can be produced because has good physical stability and antioxidant activity.
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Kwon, Miji, and Wonyoung Yang. "Mask-Wearing Behaviors after Two Years of Wearing Masks Due to COVID-19 in Korea: A Cross-Sectional Study." International Journal of Environmental Research and Public Health 19, no. 22 (November 13, 2022): 14940. http://dx.doi.org/10.3390/ijerph192214940.

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In Korea, wearing masks in public places has become the norm during the prolonged coronavirus disease 2019 (COVID-19) pandemic. This cross-sectional study investigated the mask-wearing behavior of Koreans (n = 433) via online mode living in Seoul and Gwangju after wearing a mask in public spaces for two years due to COVID-19. The respondents selected their face masks based on season, gender, age, occupation, mask-wearing hours, mask filter performance, mask shape, and mask color. The general discomfort caused by wearing a mask was divided into physical and speech discomfort, and it was not correlated with anxiety when not wearing a face mask. Speech discomfort caused by wearing a mask was correlated with general discomfort, clear speech, vocal pain, anxiety, and only-indoor mask-off plans. Anxiety when not wearing a mask appeared to affect both indoor and outdoor mask-off plans. The more uncomfortable and less anxious respondents were when not wearing a mask, the sooner they wanted to discontinue wearing masks indoors and outdoors. It is expected that the use of masks will continue in the future and that there may be differences in the place and time of use of masks in Korea and around the world due to new infectious diseases and fine dust. Facial masks can be worn more comfortably and conveniently if the discomfort and anxiety of wearing a mask are improved by considering various behaviors when wearing a mask in the future.
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Furnaz, Shumaila, Natasha Baig, Sajjad Ali, Sahar Rizwan, Uzzam Ahmed Khawaja, Muhammad Abdullah Usman, Muhammad Tanzeel Ul Haque, Ayesha Rizwan, Farheen Ali, and Musa Karim. "Knowledge, attitude and practice of wearing mask in the population presenting to tertiary hospitals in a developing country." PLOS ONE 17, no. 3 (March 10, 2022): e0265328. http://dx.doi.org/10.1371/journal.pone.0265328.

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Background In the era of COVID-19 where there is emphasis on the importance of wearing a mask, wearing it rightly is equally important. Therefore, the purpose of this study was to assess the knowledge, attitude and practice of wearing a mask in the general population of a developing country at three major tertiary care hospital. Materials and methods Participants of this cross-sectional study were patients and attendants at three major tertiary care hospital of Karachi Pakistan. Selected participants, through non-probability convenient sampling technique, were interviewed regarding knowledge, attitude, and practice of wearing mask using an Urdu translated version of a questionnaire used in an earlier study. Three summary scores (0 to 100) were computed to indicate participants’ mask wearing practice, technique of putting it on, and technique of taking if off. Collected data were analyzed with the help of IBM SPSS version 19. Results A total of 370 selected individuals were interviewed, out of which 51.9% were male and mean age was 37.65±11.94 years. For more than 90% of the participants, wearing a face mask was a routine practicing during the pandemic. The mean practice score was 65.69±25.51, score for technique of putting on a face mask was 67.77±23.03, and score of technique of taking off a face mask was 51.01±29.23. Education level of participant tends to have positive relationship with all three scores, while presence of asthma or chronic obstructive pulmonary disease (COPD) as co-morbid had negative impact on mask wearing practice. Conclusion We have observed suboptimal knowledge, attitude and practice of wearing mask among the selected individuals. There is a continued need to spread awareness and educate general population about the importance of using a face mask, as well as the proper technique of wearing and taking off a face mask.
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Annisa, Annisa, Andi Tenri Kawareng, and Niken Indriyanti. "Formulasi Sediaan Masker Gel Peel Off dari Minyak Atsiri Sereh (Cymbopogon citratus)." Proceeding of Mulawarman Pharmaceuticals Conferences 14 (December 31, 2021): 348–53. http://dx.doi.org/10.25026/mpc.v14i1.599.

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Lemongrass (Cymbopogon citratus) is one of the essential oil producing plants known as Lemongrass oil with the main content of citral compounds. Lemongrass essential oil is known to have antioxidant activity. The antioxidant activity of lemongrass oil can be used for skin care in the form of a peel off gel mask. The purpose of this study was to formulate a peel off gel mask preparation from lemongrass essential oil (Cymbopogon citratus) and to know the results of the physical evaluation of the peel off gel mask. The peel off gel mask was made in three formulas with different concentrations of PVA, namely F1 (10%), F2 (13%), and F3 (16%). Physical evaluation tests include organoleptic tests, homogeneity, viscosity, pH, dispersion, and drying time. The peel off gel mask in the three formulas was obtained in the form of a thick gel, white in color, and had a characteristic lemongrass smell. The results obtained based on the physical evaluation showed that the three formulas had met the required standard parameters.
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Luthfiyana, Novi, Nurhikma Nurhikma, and Taufik Hidayat. "Characteristics of Peel Off Gel Mask From Seaweed (Eucheuma cottonii) Porridge." Jurnal Pengolahan Hasil Perikanan Indonesia 22, no. 1 (April 30, 2019): 119. http://dx.doi.org/10.17844/jphpi.v22i1.25888.

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The aim of this study was to determine the best concentration of E. cottonii seaweed porridge in the formulation of peel off gel masks. The main materials used in this study were <em>E. cottonii</em> and other basic substances of peel off gel mask. The analytical methods used were the total microbial and antioxidant test on the E. cottonii slurry preparation. Mask preparations were analyzed for physical stability, pH, duration of preparation, drying, viscosity and homogeneity. The experimental design used was a Completely Randomized with four treatments by adding <em>E.cottonii</em> porridge 0%, 10%, 15% and 20% respectively with two replications.The results showed that the best peel off gel mask was formulation with the addition 20% of E.cottonii. Microbes were not found in <em>E. cottonii</em> porridge. The antioxidant activity of <em>E. cottonii</em> porridge had IC50 value of 137.35±0.35 μg / mL. Consumer acceptance of products through sensory testing in the category of likes. The peel off gel mask has good physical stability, proven by no changes in color, odor as well as gel texture. The pH value of the preparation of peel off gel mask is in line with SNI and pH balance of normal human skin. The best viscosity value of peel off gel mask is 14,003 cps. The time needed for the mask to dry for an average of 25 minutes and homogeneity is characterized by the absence of secondary particle aggregation.
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Madu, Victory C., Heather Carnahan, Robert Brown, Kerri-Ann Ennis, Kaitlyn S. Tymko, Darryl M. G. Hurrie, Gerren K. McDonald, Stephen M. Cornish, and Gordon G. Giesbrecht. "Skin Cooling on Breath-Hold Duration and Predicted Emergency Air Supply Duration During Immersion." Aerospace Medicine and Human Performance 91, no. 7 (July 1, 2020): 578–85. http://dx.doi.org/10.3357/amhp.5433.2020.

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PURPOSE: This study was intended to determine the effect of skin cooling on breath-hold duration and predicted emergency air supply duration during immersion.METHODS: While wearing a helicopter transport suit with a dive mask, 12 subjects (29 ± 10 yr, 78 ± 14 kg, 177 ± 7 cm, 2 women) were studied in 8 and 20°C water. Subjects performed a maximum breath-hold, then breathed for 90 s (through a mouthpiece connected to room air) in five skin-exposure conditions. The first trial was out of water for Control (suit zipped, hood on, mask off). Four submersion conditions included exposure of the: Partial Face (hood and mask on); Face (hood on, mask off); Head (hood and mask off); and Whole Body (suit unzipped, hood and mask off).RESULTS: Decreasing temperature and increasing skin exposure reduced breath-hold time (to as low as 10 ± 4 s), generally increased minute ventilation (up to 40 ± 15 L · min−1), and decreased predicted endurance time (PET) of a 55-L helicopter underwater emergency breathing apparatus. In 8°C water, PET decreased from 2 min 39 s (Partial Face) to 1 min 11 s (Whole Body).CONCLUSION: The most significant factor increasing breath-hold and predicted survival time was zipping up the suit. Face masks and suit hoods increased thermal comfort. Therefore, wearing the suits zipped with hoods on and, if possible, donning the dive mask prior to crashing, may increase survivability. The results have important applications for the education and preparation of helicopter occupants. Thermal protective suits and dive masks should be provided.Madu VC, Carnahan H, Brown R, Ennis K-A, Tymko KS, Hurrie DMG, McDonald GK, Cornish SM, Giesbrecht GG. Skin cooling on breath-hold duration and predicted emergency air supply duration during immersion. Aerosp Med Hum Perform. 2020; 91(7):578–585.
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Ayuningtyas, Nurista Dida, Yahya Febrianto, and Alno Prasetyo. "Formulation and Evaluation of Antioxidant Peel-Off Mask Ethanol Extract Sarang Semut (Myrmecodia sp.) Using DPPH 2,2-Diphenyl-1-picrylhydrazyl Method." Journal of Science and Technology Research for Pharmacy 1, no. 1 (March 3, 2021): 12–19. http://dx.doi.org/10.15294/jstrp.v1i1.44159.

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Background: Myrmecodia sp extract is known to be effective as an antioxidant on a concentration of 5-50 ppm. Antioxidants are substances that can scavenge free radicals. Free radicals can cause skin damage. Peel off mask is a cosmetic product that function as a dead skin peel mechanically containing synthetic polymers that are quite safe and effective. Aim: The purpose of this study was to determine the antioxidant effectiveness of the Myrmecodia sp extract. Method: The research used variations in the Myrmecodia sp extract of 2 %, 3%, and 4 %. The evaluation was carried out on the physical properties of the peel off mask and the antioxidant activity test. The antioxidant activity test used the 2,2-Diphenyl-1-picrylhydrazyl method. Statistical tests were carried out on the physical properties of the preparation and IC50 peel off mask using the one-way ANOVA test with a 95% confidence level. Result: Based on this research, it was found that the gel peel-off mask preparation of Myrmecodia sp. extracts has organoleptic of a bit thick, brown and odourless. The value of adhesion is between 10.33-13.04 seconds, pH 6.27-6.75, viscosity 17.00-22.67 dPas, and drying time 17.33-24.33 minutes. The test for the antioxidant activity of IC50 peel off mask at F 2, F 3 and F 4 was 49.4 ppm, 39.41 ppm and 35.25 ppm respectively. Conclusion: The peel-off gel mask of Myrmecodia sp. extracts has the potential as an antioxidant with the strong ability category.
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Dissertations / Theses on the topic "Mask-on/mask-off"

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CHATTERJEE, TANAYA. "It’s all about the Eyes: A multi-level investigation into the effects of gaze." Doctoral thesis, Università degli Studi di Milano-Bicocca, 2022. http://hdl.handle.net/10281/379112.

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I nostri tre studi ci forniscono un progresso nella conoscenza dei diversi meccanismi in gioco nella percezione della direzione dello sguardo, nel comportamento di seguire lo sguardo e nell'attenzione congiunta, sia a livello comportamentale che neurofisiologico. In particolare, la presente tesi porta prove dell'interazione e del corso temporale dei meccanismi cognitivi e neurali (processi bottom-up e top-down) che vengono reclutati quando si vede lo sguardo di altre persone. Questo equilibrio è possibilmente mantenuto al fine di prendere giustamente in considerazione o ignorare le informazioni provenienti dagli occhi di un'altra persona a seconda dei nostri obiettivi, dell'intenzione e del comportamento corrente.
our three studies provide us with an advance in knowledge on the different mechanisms at play in the perception of gaze direction, gaze following behavior and joint attention, both at the behavioral and neurophysiological level. Specifically, the present thesis brings evidence of the interplay and time course of the cognitive and neural mechanisms (bottom-up and top-down processes) that are recruited when seeing other people’s gaze. This balance is possibly maintained in order to justifiably take into account or disregard information coming from another person’s eyes depending upon our goals, intention and current behavior.
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Tseng, Jin-chi, and 曾金池. "Study on the Optimization Simulation and Application of Annular Off-Axis Illumination and Attenuated Phase Shift Mask." Thesis, 1995. http://ndltd.ncl.edu.tw/handle/85104331387172750793.

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碩士
國立交通大學
應用化學系
83
Off-Axis Illumination (OAI) has several merits when applied to microlithography. The most important merit is that depth of focus could be largely improved while conventional i-line process remain unchanged. Next, the application of OAI is quite easy, the simplest way to apply OAI is the adding of an aperture stop in stepper. The disadvantage of OAI is that the improvement is dependent of pattern orientation from types of quadrupole, dipole and slit. The homogeneity of illumination beam also needed to be improved. Annular OAI is not the best OAI for the improvement of resolution and depth of focus, however, annular OAI is independent of pattern orientation, therefore, its applicability to production line is higher than others. In this thesis, the Taguchi Genichi methodology of experimental design has been applied by using L9 and L18 orthogonal array to study the effects of optical parameters on the processes for 0.35 um linewidth patterns. Simulation study found out that NA 0.5, outer ring sigma equivalent 0.70 in annular OAI, inner ring sigma equivalent 0.35 in annular OAI and negative mask bias 0.03 um are the optimum design for 0.35 um dense line/space. The depth of focus improved by about 0.4 um. Faced with many variances in lithographic processes, the optimization of related factors for varied processes is the key issue. Simulation combined with Taguchi method could study such many variances economically and significantly.
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Lin, Ren-Jang, and 林仁章. "Study on the Optimization of Optical Proximity Correction Applied to Attenuated Phase-Shifting Mask with Annular off-Axis Illumination and Conventiona Illumination." Thesis, 1996. http://ndltd.ncl.edu.tw/handle/78440596484266114153.

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碩士
國立交通大學
應用化學研究所
84
In i-line (365 nm) lithographic processes, denser and also narrower linewidth will generate serious proximity effect, decrease depth of focus (DOF) and resolution. It is not easy to have a resolution better than 0.35 μm and a DOF greater than 1.25 μm while still meet the design rules for all different patterns. The apphcation of phase-shifting Mask (PSM) and off-axis illurmnation (OAI) could increase both DOF and resolution, besides, optical proximity correction (OPC) on mask would also improve DOF and resolution. L9 and L18 orthogonal arrays of Taguchi method have been applied to the 0.35 μm processes to study the effects of optical parameters and OPC. Under the combination of attenuated PSM and annular OAI, the OPC by assisted line/space (L/S) resulted in the larger exposure latitude (EL), in which dense L/S increased ~11%, isolated line (IL) ~5%, isolated space (IS) ~1%. For improvement of DOF, dense US increased ~6.7%, IL ~3.4%, IS ~4.5 %. Under the combination of attenuated PSM and conventional illmnmation, regarding the exposure latitude (EL), dense L/S increased ~8%, IL ~6%, IS ~2%. regarding improvement of DOF, dense L/S increased ~1.1%, IL~2.8 %, IS~2.8 %. OPC by pattern bias indicated that only EL of dense L/S could be improved. EL increased ~5%. Pattern bias did not show improvement to both IL and IS. DOF was improved only slightly. The comparisons between assisted L/S and pattern bias indicated that assisted L/S is better method for OPC. Due to the demanding of narrower linewidth, the process parameters keep increasing. The optimization of related process parameters is the key issue for the success of lithography. Simulation combined with Taguchi method could study and analyze these parameters economically and integrately.
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Books on the topic "Mask-on/mask-off"

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Bey, Tiano. Mask on, Mask Off? Lulu Press, Inc., 2021.

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Mari Mask on Not Off! ConnieStandifer, 2023.

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Williams-Rogers, Dr Steppi G. The Mask On Your Face, Take It Off. Lulu.com, 2019.

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Williams-Rogers, Dr Steppi G. The Mask On Your Face Take It Off. Lulu.com, 2019.

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Book chapters on the topic "Mask-on/mask-off"

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Hastuti, Rini Tri, and Regia Desty Rakhmayanti. "Antioxidant Activity of Peel Off Mask Preparation with Green Apple (Malus domesticus) Juice and Ultrasonic Extraction." In Proceedings of the First International Conference on Medical Technology (ICoMTech 2021), 3–10. Dordrecht: Atlantis Press International BV, 2022. http://dx.doi.org/10.2991/978-94-6463-018-3_2.

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Dumas, Alexandre. "LXXII cromwell’s house." In Twenty Years After. Oxford University Press, 2008. http://dx.doi.org/10.1093/owc/9780199537266.003.0073.

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It was really Mordaunt whom d’Artagnan had followed, but without recognizing him. On entering the house he had taken off the mask, removed the grey beard which he had worn for a disguise, and then gone upstairs and entered a room hung with dark-coloured hangings,...
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Brown, Pamela Allen. "Dark Ambition: The Two Faces of Portia." In The Diva's Gift to the Shakespearean Stage, 194–213. Oxford University Press, 2021. http://dx.doi.org/10.1093/oso/9780198867838.003.0007.

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Portia in The Merchant of Venice has all the hallmarks of a great diva, such as Isabella Andreini or Vincenza Armani. She is famous beyond Italy, prodigiously intellectual, versatile, and brilliantly clever at devising plots that show off her acting skills, especially cross-gender disguise. Portia banters, plots, and travels with the confidence of a seasoned professional, while suitors and observers extol her golden virtues in paeans like those lavished on star actresses. Yet the diva of Belmont is too good to be true and too theatrical to be good; audiences might well interpret her artful cunning, sophistication, and duplicity as “dark” Italian qualities. In fact, Portia’s zest for acting, wifely insubordination, casual racism, and notable lack of mercy tend to unsettle her mask of moral perfection, as she relishes her diva-like domination of Morocco, Shylock, Bassanio, and Antonio.
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Burrows, George. "A Mellow Bit of Rhythm." In The Recordings of Andy Kirk and his Clouds of Joy, 182–206. Oxford University Press, 2019. http://dx.doi.org/10.1093/oso/9780199335589.003.0005.

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This concluding chapter considers the 1957 album, A Mellow Bit of Rhythm, as a Signifyin(g) form of musical recollection. It rounded off the recorded output of Kirk as a bandleader in a way that re-illuminated the earlier recordings made by his Clouds of Joy within a 1950s hot-jazz context. The retrospective album is shown to be as much a form of stylistic mask-play as the original recordings, as it served to represent a particular kind of ‘authentic’ black-jazz legacy for Andy Kirk and His Clouds of Joy within contemporary stylistic parameters and expectations. The bigger band and its more voluminous sound are considered relative to contemporary audio technologies and tastes and the louder big-band style is shown to re-present Kirk’s recordings of the previous two decades in fresh stylistic and racial garb. Exploring that album ultimately presents an opportunity to reflect on the whole race-political enterprise of the records of Kirk and his band.
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Jansen, Nils, and Sandy Steel. "Sanction and Duty, Individual Rights, and Compensation: On the Rebirth of the Roman Law of Delict in Natural Law Discussions." In The Structure of Tort Law, 205–69. Oxford University Press, 2021. http://dx.doi.org/10.1093/oso/9780198705055.003.0006.

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This chapter evaluates how natural law has had a long-lasting, and still continuing, effect on the doctrinal understanding of the Roman law of delict. The unlawful act constitutes the basic category of the law of delict, and liability requires the breach of a duty of conduct; the notion of duties of care (Verkehrspflichten) is a clear expression of this. If Christian Thomasius sought to rip off the Aquilian mask of the actio de damno dato, as the Aquilian terminology of iniuria and culpa no longer reflected the reality of the compensatory tort law of his time, this applies all the more to the reformulation of tort law through the natural law doctrine of Christian Wolff. The elevation of the fault principle to axiomatic status was thus not only established in the nineteenth century, but was already in evidence in the natural law discussion of the seventeenth and eighteenth centuries—the idea of liability for the breach of standards of conduct, and the accompanying fault principle, were necessary elements of the sanction-based system of liability of the dominant natural law literature. At least in theory, therefore, there is no more place for a compensation-oriented distribution of risks and liability: the idea of delimitation of domains of individual freedom has occupied the territory.
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Leeder, Murray. "‘Purely and Simply Evil’." In Halloween, 95–100. Liverpool University Press, 2015. http://dx.doi.org/10.3828/liverpool/9781906733797.003.0007.

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This concluding chapter addresses the question of Michael Myers as an abstract embodiment of pure evil. In Halloween (1978), John Carpenter presents an ‘anonymity of evil’, with evil simultaneously localised within an individual and made faceless, traceless, and inexplicable. As Carpenter explains, this blankness was designed to allow the audience to ‘project their own feelings and thoughts and fears into this character so he's more than what he was, more than what was there’. The film works formally to underscore Michael's status as a dehumanised and abstract ‘evil’. The chapter then shifts the issue from moral philosophy to cinematic presentation, from ‘evil’ to ‘villainy’. Cinematic villains are often designated as pure evil but come off as less evil than intended simply because of the humanising touches performance inevitably adds. Carpenter worked against this tendency through the presentation of Michael Myers, so calculated to exclude everything that is human. The mask, which both resembles but is clearly not a human face, works to winnow away the human factor from Michael Myers. Like an actor in a Greek drama, Michael wears his villainy plainly on his face.
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Postema, Gerald J. "Plucking Off the Mask of Mystery." In Bentham and the Common Law Tradition, 257–94. Oxford University Press, 2019. http://dx.doi.org/10.1093/oso/9780198793052.003.0008.

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This chapter discusses Bentham's critique of Common Law theory and practice. Bentham's critique is of special interest because that criticism reflects the considerations and arguments that moved him to his positivist conception of law. This radical critique of both the practice and the theory of Common Law rests on the same set of principles and arguments, drawn from his social and political theory, in particular his conception of the primary tasks and functions of law, and the best or most efficient means of serving them. Thus, Bentham's defence of his conception of the nature of law rests not on normatively neutral, analytical, or conceptual considerations, but on his analysis of fundamental human and social needs, and the ways in which law can be used to meet them. Jurisprudence draws directly on political theory. His is a distinctively utilitarian positivism.
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Li, Jie Jack, Chris Limberakis, and Derek A. Pflum. "Protecting Groups." In Modern Organic Synthesis in the Laboratory. Oxford University Press, 2008. http://dx.doi.org/10.1093/oso/9780195187984.003.0012.

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In his book, Protecting Groups, Philip J. Kocieński stated that there are three things that cannot be avoided: death, taxes, and protecting groups. Indeed, protecting groups mask functionality that would otherwise be compromised or interfere with a given reaction, making them a necessity in organic synthesis. In this chapter, for each protecting group showcased, only the most widely used methods for protection and cleavage are shown. Also, this section is not comprehensive and only addresses some of the most common blocking groups in organic synthesis. For a thorough review of protecting groups, the reader should consult the following references: (a) Wuts, P. G. M.; Greene, T. W.; Protective Groups in Organic Synthesis, 4th ed.; Wiley: Hoboken, NJ, 2007; (b) Kocienski, P. J. Protecting Groups, 3rd edition.; Thieme: Stuggart, 2004. In this section, the formation and cleavage of eight protecting groups for alcohols and phenols are presented: acetate; acetonides for diols; benzyl ether; para-methoxybenzyl (PMB) ether; methyl ether; methoxymethylene (MOM) ether; tert-butyldiphenylsilyl (TBDPS) silyl ether; and tetrahydropyran (THP). Acetate is a convenient protecting group for alcohols—easy on and easy off. Selective protection of a primary alcohol in the presence of a secondary alcohol can be achieved at low temperature. The drawback of this protecting group is its incompatibility with hydrolysis and reductive conditions.
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Dumas, Alexandre. "64 In the carriage of M. Colbert." In The Man in the Iron Mask. Oxford University Press, 2008. http://dx.doi.org/10.1093/owc/9780199537259.003.0065.

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As Gourville had seen, the King’s musketeers were mounting and following their captain. The latter, who did not like to be confined in his proceedings, left his brigade under the orders of a lieutenant, and set off, on his part, upon post horses, recommending his...
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Conference papers on the topic "Mask-on/mask-off"

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Cheng, Lin, Peng-fei Cao, Jia Liu, and Xiao-ping Zhang. "Near-field diffraction simulation on three-dimensional mask model with off-axis illumination." In 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical devices and Systems, edited by Sen Han, Masaomi Kameyama, and Xiangang Luo. SPIE, 2009. http://dx.doi.org/10.1117/12.832103.

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Pforr, Rainer, Rik M. Jonckheere, Wolfgang Henke, Kurt G. Ronse, Patrick Jaenen, Ki-Ho Baik, and Luc Van den Hove. "New resolution-enhancing mask for projection lithography based on in-situ off-axis illumination." In SPIE'S 1993 Symposium on Microlithography, edited by John D. Cuthbert. SPIE, 1993. http://dx.doi.org/10.1117/12.150424.

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Saito, Yasuyuki. "Discussion of Mask Alignment Accuracy for EUV Lithography." In Extreme Ultraviolet Lithography. Washington, D.C.: Optica Publishing Group, 1994. http://dx.doi.org/10.1364/eul.1994.rmm.227.

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The shorter lithography printing light source wavelength is, the more accurate alignment is required for resist printing of high packing density integrated circuits (ICs). As to longer wavelength light source than extremely ultraviolet, view systems of alignment mark are sophisticated by using video camera system. However, it seems that it is difficult to sophisticate EUV mask-aligner alignment view system due to shorter light wavelength. Actually, old mask aligner systems such as contact aligners of Cobilt, projection aligners of Perkin Elmer, and direct steppers of GCA have alignment process visualisation for human eye by using cut off filters of UV light. However, EUV use also requires alignment system accuracy in order to increase EUV use value for high packing density on a IC chip. Since, EUV can not be visible for human naked eyes and detection of EUV is relatively difficult, the author thinks that implement of direct view alignment system by using EUV light source is difficult. However, since only use of printing of mask pattern such as printing of grating do not need accurate alignment or alignment itself, EUV lithography printing without alignment process is relatively easily applicable to grating photolithography. Since energy of EUV light is higher than that of UV, it may be necessay to treat or consider prevention against resonant turbulence of edges of photomask metal thin film patterns and photoresist small-size contact hole resonance interferences due to nuclear body resonance vibrations, by intentionally additions of heavy nuclei such as heavy impurites of metals. Through discussion on various kinds of mask aligner alignment processes, EUV lithography processes will be discussed.
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Yeung, Neil, Jonathan Lai, and Jiebo Luo. "Face Off: Polarized Public Opinions on Personal Face Mask Usage during the COVID-19 Pandemic." In 2020 IEEE International Conference on Big Data (Big Data). IEEE, 2020. http://dx.doi.org/10.1109/bigdata50022.2020.9378114.

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Wirth, Allan, and Andrew Jankevics. "CRICS - Confusion Rejection Image Compensation System." In Adaptive Optics. Washington, D.C.: Optica Publishing Group, 1995. http://dx.doi.org/10.1364/adop.1995.tua46.

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A novel concept for the compensation of aberrated images has been developed. It is based on the idea of introducing a pupil mask that blocks the most highly tilted portions of the incoming wavefront. Such a mask might consist of a spatial light modulator. The SLM would be driven by a binary Hartmann sensor. Subapertures with low tilt would turn on their corresponding SLM pixels allowing the nearly flat portions of the wavefront to propagate. Subapertures with larger tilts would act to turn off their SLM pixels, eliminating those portions of the pupil that don not contribute to the core of the image.
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Bowen, Richard W., and Hugh R. Wilson. "Pattern masking: retinal and cortical processes." In OSA Annual Meeting. Washington, D.C.: Optica Publishing Group, 1992. http://dx.doi.org/10.1364/oam.1992.thz3.

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We model pattern masking with a retinal luminance adaptation process followed by orientation-selective cortical filtering. We analyzed threshold elevations of a bandpass test stimulus (a 33 ms D6, sixth derivative of a Gaussian) masked by a 433 ms cosine grating, varying test polarity and spatial phase of the mask. The retinal process was defined by threshold elevation on uniform fields of the same luminance as the peak and the trough of the mask. The cortical process was defined by dividing cosine threshold elevation by uniform field elevation. The retinal process can be modeled with a Naka-Rushton nonlinearity. The cortical process is phase dependent, with threshold elevation greatest for negative tests on light bars and positive tests on dark bars of the mask grating. For the cortical process, dark bars produce more masking than light bars. We conclude that the cortical process must involve competitive interaction between on and off systems.
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Pan, Frank, Sean C. Stuart, Adam G. Vore, Sara Lampen, John A. Hackwell, Peter D. Fuqua, and James D. Barrie. "Fabrication of a bi-directional dark mirror coating." In Optical Interference Coatings. Washington, D.C.: Optica Publishing Group, 2022. http://dx.doi.org/10.1364/oic.2022.tea.7.

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A novel hyperspectral imager design required a slit mask with bi-directional reflectance suppression between 600nm to 1650nm. A dark mirror coating was fabricated and patterned on a commercial off the shelf (COTS) edge filter.
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Tichenor, D. A., G. D. Kubiak, M. E. Malinowski, R. H. Stulen, S. J. Haney, K. W. Berger, L. A. Brown, et al. "High-resolution soft-x-ray projection imaging using Schwarzschild optics and a laser plasma source." In OSA Annual Meeting. Washington, D.C.: Optica Publishing Group, 1992. http://dx.doi.org/10.1364/oam.1992.mvv5.

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High resolution soft-x-ray projection images are recorded by using a laser plasma source (LPS) and multilayer coated optics. Soft x-rays are generated by focusing a KrF excimer laser beam on a moving gold target. The resulting 15-eV plasma emits an intense burst of soft x-rays from a spot 150 μm in diameter. The soft x-rays are collected by an off-axis ellipsoidal condenser to illuminate a transmission mask composed of a germanium absorber supported by a silicon membrane. A magnified image of the LPS is projected by the condenser into the entrance pupil of the imaging objective to provide Kohler illumination of the mask. The imaging objective is a 20× reduction Schwarzschild having a numerical aperture of 0.08 and operating at a wavelength of 14 nm. Features as small as 0.1 μm have been recorded in polymethylmethacrylate (PMMA). A second-generation system is being fabricated based on a 10× Schwarzschild objective and a near-on-axis ellipsoidal condenser. This system is designed to image a reflecting mask onto a resist-coated wafer.
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Zhu, Qi, Lunyu Ma, George Lo, and Suresh K. Sitaraman. "Three-Mask Fabrication and Optimized Design of First-Level Free-Standing Interconnect for Microelectronics Application." In ASME 2003 International Mechanical Engineering Congress and Exposition. ASMEDC, 2003. http://dx.doi.org/10.1115/imece2003-41833.

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Advances in compliant off-chip interconnects have achieved great strides. G-Helix, an electroplated compliant chip-to-substrate interconnect has the potential for accomplishing low-cost, easy-to-fabricate, wafer-level packaging. In this work, the design, fabrication, optimization and reliability of the G-Helix compliant off-chip interconnects have been studied. A three-mask process was used to successfully fabricate the free-standing G-Helix compliant interconnect. The mechanical compliance and the electrical parasitics were studied through numerical and analytical models. Response Surface Methodology (RSM) was used to maximize the mechanical compliance and minimize the electrical parasitics as well as the stresses induced in the interconnect. It is also seen through the models that an array of interconnects will be able to withstand the die and the heat-sink weight without plastically yielding. Also, the G-Helix interconnect assembly on organic printed circuit board using lead-free solder will be able to withstand more than 1000 accelerated thermal cycles without the need for an underfill.
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Li, Shiya, Stylianos Ploumpis, Stefanos Zafeiriou, and Connor Myant. "Design Automation for Mass Customisation via Additive Manufacture: A Case Study on Continuous Positive Airway Pressure Mask." In ASME 2020 International Design Engineering Technical Conferences and Computers and Information in Engineering Conference. American Society of Mechanical Engineers, 2020. http://dx.doi.org/10.1115/detc2020-22316.

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Abstract Additive Manufacturing (AM) has been identified as a key enabler for Mass Customization (MC) due to its negligible tooling cost associated with producing one-off items. This is especially valuable for the medical industry where the ability to create patient-specific products can greatly improve performance and comfort. However, the use of AM so far has only been limited to previously custom-made devices due to the prohibitive design costs associated with a knowledge-intensive and highly manual design process. The research community has often overlooked this area and as yet no study has shown a completely automated process that can reduce or even eliminate this design cost for existing mass-produced ergonomic products (e.g. respirators). This study investigates the methodology of developing a completely automated design pipeline through a case study on Continuous Positive Airway Pressure (CPAP) mask. Through a parametric design approach, a fully automated pipeline was constructed based on a large-scale statistical shape model “learnt” from 9,663 high-resolution facial scans. The pipeline accepts a single “in-the-wild” facial image as the only data input and produces a CAD model of CPAP mask in under a minute. The significant reduction in design time, ease of data acquisition and the complete removal of a manual CAD modelling process can make AM more accessible for CPAP masks manufacturers. The same workflow can potentially be employed to construct automation pipelines for other types of wearables, therefore encouraging the adoption of AM for MC of a wider selection of products.
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