Journal articles on the topic 'Lithography'
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Vandаlovskyi, V. "Artistic and technical features of the lithographic manner mixed technique." Research and methodological works of the National Academy of Visual Arts and Architecture, no. 27 (February 27, 2019): 92–98. http://dx.doi.org/10.33838/naoma.27.2018.92-98.
Full textKwon, B., and Jong H. Kim. "Importance of Molds for Nanoimprint Lithography: Hard, Soft, and Hybrid Molds." Journal of Nanoscience 2016 (June 22, 2016): 1–12. http://dx.doi.org/10.1155/2016/6571297.
Full textWen, Zaoxia, Xingyu Liu, Wenxiu Chen, Ruolin Zhou, Hao Wu, Yongmei Xia, and Lianbin Wu. "Progress in Polyhedral Oligomeric Silsesquioxane (POSS) Photoresists: A Comprehensive Review across Lithographic Systems." Polymers 16, no. 6 (March 19, 2024): 846. http://dx.doi.org/10.3390/polym16060846.
Full textLund, Sarah E. "Fossils: Lithography’s Porous Time and Eugène Delacroix’s Faust Marginalia." Nineteenth Century Studies 35 (November 2023): 1–32. http://dx.doi.org/10.5325/ninecentstud.35.0001.
Full textPrakoso, Emmanuel Putro, Inovensius Hugo Bima Wicaksana, Nick Soedarso, and Rina Carina. "TEKNIK CETAK DATAR KITCHEN LITHOGRAPY SEBAGAI MEDIA EKSPRESI DESAIN PADA METODE REPRODUKSI GRAFIKA." Jurnal Dimensi DKV Seni Rupa dan Desain 4, no. 2 (October 1, 2019): 155. http://dx.doi.org/10.25105/jdd.v4i2.5888.
Full textWu, Yu, and Zihao Xiao. "The Recent Progress of Lithography Machine and the State-of-art Facilities." Highlights in Science, Engineering and Technology 5 (July 7, 2022): 155–65. http://dx.doi.org/10.54097/hset.v5i.737.
Full textVoznyuk G. V., Grigorenko I. N., Mitrofanov M. I., Nikolaev V. V., and Evtikhiev V. P. "Subwave textured surfaces for the radiation coupling from the waveguide." Technical Physics Letters 48, no. 3 (2022): 76. http://dx.doi.org/10.21883/tpl.2022.03.52896.19103.
Full textSharma, Ekta, Reena Rathi, Jaya Misharwal, Bhavya Sinhmar, Suman Kumari, Jasvir Dalal, and Anand Kumar. "Evolution in Lithography Techniques: Microlithography to Nanolithography." Nanomaterials 12, no. 16 (August 11, 2022): 2754. http://dx.doi.org/10.3390/nano12162754.
Full textZhang, Zhen. "Optimization of Triple Periodic Bilayer Stacks and Aerial Image Performance Analysis." International Journal of Electronics and Electrical Engineering 8, no. 3 (September 2020): 53–57. http://dx.doi.org/10.18178/ijeee.8.3.53-57.
Full textSeo, Manseung, Haeryung Kim, and Masahiko Onosato. "Lithography Using a Microelectronic Mask." Journal of Robotics and Mechatronics 18, no. 6 (December 20, 2006): 816–23. http://dx.doi.org/10.20965/jrm.2006.p0816.
Full textPanzarasa, Guido, and Guido Soliveri. "Photocatalytic Lithography." Applied Sciences 9, no. 7 (March 27, 2019): 1266. http://dx.doi.org/10.3390/app9071266.
Full textChoi, Young Joo, Ran Namgung, Jun Soo Kim, Dae Seok Song, Hyeon Park, Shin-hyo Bae, Min-Ki Chon, et al. "Stochastic defect removal coating for high-performance extreme ultraviolet lithography." Journal of Vacuum Science & Technology B 40, no. 4 (July 2022): 042602. http://dx.doi.org/10.1116/6.0001723.
Full textMeijer, Rob, Peter Thomson, and Lysbeth Croiset van Uchelen-Brouwer. "The History of the Lithographie Royale, 1818-25." Quaerendo 31, no. 4 (2001): 281–306. http://dx.doi.org/10.1163/157006901x00173.
Full textPugachev, Mikhail V., Aliaksandr I. Duleba, Arslan A. Galiullin, and Aleksandr Y. Kuntsevich. "Micromask Lithography for Cheap and Fast 2D Materials Microstructures Fabrication." Micromachines 12, no. 8 (July 21, 2021): 850. http://dx.doi.org/10.3390/mi12080850.
Full textTsarik, K. A. "Focused Ion Beam Exposure of Ultrathin Electron-Beam Resist for Nanoscale Field-Effect Transistor Contacts Formation." Proceedings of Universities. Electronics 26, no. 5 (2021): 353–62. http://dx.doi.org/10.24151/1561-5405-2021-26-5-353-362.
Full textYonghui Zhang, Yonghui Zhang, Zihui Zhang Zihui Zhang, Chong Geng Chong Geng, Shu Xu Shu Xu, Tongbo Wei Tongbo Wei, and and Wen'gang Bi and Wen'gang Bi. "Versatile nanosphere lithography technique combining multiple-exposure nanosphere lens lithography and nanosphere template lithography." Chinese Optics Letters 15, no. 6 (2017): 062201–62205. http://dx.doi.org/10.3788/col201715.062201.
Full textLi, Mu Jun, Hui Chun Ye, and Lian Guan Shen. "A Fast Method for Analyzing the Effect of Mask Error on Photolithography Pattern Quality." Advanced Materials Research 291-294 (July 2011): 3097–102. http://dx.doi.org/10.4028/www.scientific.net/amr.291-294.3097.
Full textDiaconu-Catan, Oxana. "The value of lithography in artistic creation." Studiul artelor şi culturologie: istorie, teorie, practică, no. 1(44) (February 2024): 66–73. http://dx.doi.org/10.55383/amtap.2023.1.12.
Full textMullen, Eleanor, and Michael A. Morris. "Green Nanofabrication Opportunities in the Semiconductor Industry: A Life Cycle Perspective." Nanomaterials 11, no. 5 (April 22, 2021): 1085. http://dx.doi.org/10.3390/nano11051085.
Full textPark, Sang Wook, Hyun Jin Yoon, Hee Young Oh, Yong Il Kim, Gi Jin Kwun, and Hai Won Lee. "Synthesis of Resists Containing a Photoacid Generator Group for Atomic Force Microscope Lithography." Solid State Phenomena 121-123 (March 2007): 697–700. http://dx.doi.org/10.4028/www.scientific.net/ssp.121-123.697.
Full textLiu, Fan, Guo Dong Gu, Chun Hong Zeng, Hai Jun Li, Wei Wang, Bao Shun Zhang, and Jin She Yuan. "Fabrication of 50nm T-Gate on GaN Substrate." Advanced Materials Research 482-484 (February 2012): 2341–44. http://dx.doi.org/10.4028/www.scientific.net/amr.482-484.2341.
Full textFallica, Roberto. "Beyond grayscale lithography: inherently three-dimensional patterning by Talbot effect." Advanced Optical Technologies 8, no. 3-4 (June 26, 2019): 233–40. http://dx.doi.org/10.1515/aot-2019-0005.
Full textAtthi, Nithi, Areerat Sriklad, Wutthinan Jeamsaksiri, Charndet Hruanun, Amporn Poyai, and Rardchawadee Silapunt. "Trimming Lithography: An Alternative Technology for Sub-Resolution and Sub-Wavelength Patterning." ECTI Transactions on Electrical Engineering, Electronics, and Communications 10, no. 2 (April 10, 2012): 198–207. http://dx.doi.org/10.37936/ecti-eec.2012102.170419.
Full textStewart, Michael D., and C. Grant Willson. "Imprint Materials for Nanoscale Devices." MRS Bulletin 30, no. 12 (December 2005): 947–51. http://dx.doi.org/10.1557/mrs2005.248.
Full textSHEN, T. C. "ROLE OF SCANNING PROBES IN NANOELECTRONICS: A CRITICAL REVIEW." Surface Review and Letters 07, no. 05n06 (October 2000): 683–88. http://dx.doi.org/10.1142/s0218625x00000695.
Full textVoznesenskiy, Sergey, and Aleksandr Nepomnyaschiy. "Dose Characteristics of Multilayer Chitosan-Metal-Dielectric Nanostructures for Electronic Nanolithography." Solid State Phenomena 245 (October 2015): 195–99. http://dx.doi.org/10.4028/www.scientific.net/ssp.245.195.
Full textSievers, Gianni. "Learning How to Print in Colonial North India: The Nizami Press in Budaun and the First Urdu Manual on the Art of Lithography." Philological Encounters 8, no. 1 (March 16, 2023): 73–109. http://dx.doi.org/10.1163/24519197-bja10038.
Full textBorodin, B. R., F. A. Benimetskiy, and P. A. Alekseev. "Mechanical frictional scanning probe lithography of TMDCs." Journal of Physics: Conference Series 2103, no. 1 (November 1, 2021): 012090. http://dx.doi.org/10.1088/1742-6596/2103/1/012090.
Full textDING, Yucheng. "Next generation lithography——imprint lithography." Chinese Journal of Mechanical Engineering 43, no. 03 (2007): 1. http://dx.doi.org/10.3901/jme.2007.03.001.
Full textNalivaiko, V. I., and M. A. Ponomareva. "Promising developments of chalcogenide nanoresists for optical, x-ray and electron beam lithography." Interexpo GEO-Siberia 8, no. 1 (May 18, 2022): 33–36. http://dx.doi.org/10.33764/2618-981x-2022-8-1-33-36.
Full textZhang, Yuhang, Guanghui He, Feng Zhang, Yongfu Li, and Guoxing Wang. "The study of lithographic variation in resistive random access memory." Journal of Semiconductors 45, no. 5 (May 1, 2024): 052303. http://dx.doi.org/10.1088/1674-4926/45/5/052303.
Full textWATT, F., A. A. BETTIOL, J. A. VAN KAN, E. J. TEO, and M. B. H. BREESE. "ION BEAM LITHOGRAPHY AND NANOFABRICATION: A REVIEW." International Journal of Nanoscience 04, no. 03 (June 2005): 269–86. http://dx.doi.org/10.1142/s0219581x05003139.
Full textde Kerkhof, Mark van, Edgar Osorio, Vladimir Krivtsun, Maxim Spiridonov, Dmitry Astakhov, and Viacheslav Medvedev. "Miniature plasma source for in situ extreme ultraviolet lithographic scanner cleaning." Journal of Vacuum Science & Technology B 40, no. 2 (March 2022): 022601. http://dx.doi.org/10.1116/6.0001636.
Full textKim, Kibeom, Sangkwon Han, Jinsik Yoon, Sunghoon Kwon, Hun-Kuk Park, and Wook Park. "Lithographic resolution enhancement of a maskless lithography system based on a wobulation technique for flow lithography." Applied Physics Letters 109, no. 23 (December 5, 2016): 234101. http://dx.doi.org/10.1063/1.4967373.
Full textHeilandová, Lucie. "The First Lithographic Workshops in Brno and Early Lithography in Moravia." Acta Musei Nationalis Pragae – Historia litterarum 63, no. 3-4 (2019): 57–65. http://dx.doi.org/10.2478/amnpsc-2018-0008.
Full textBerggren, Karl K. "Lithography." Nanoscale 3, no. 7 (2011): 2662. http://dx.doi.org/10.1039/c1nr90018h.
Full textTejeda, R. O., E. G. Lovell, and R. L. Engelstad. "In-Plane Gravity Loading of a Circular Membrane." Journal of Applied Mechanics 67, no. 4 (May 5, 2000): 837–39. http://dx.doi.org/10.1115/1.1308581.
Full textFang, Bin, Jiafeng Feng, Hongxiang Wei, Xiufeng Han, Baoshun Zhang, and Zhongming Zeng. "Fabrication of Spin-Transfer Nano-Oscillator by Colloidal Lithography." Journal of Nanomaterials 2015 (2015): 1–6. http://dx.doi.org/10.1155/2015/973957.
Full textTian, Weicheng. "Research progress of laser lithography." Journal of Physics: Conference Series 2608, no. 1 (October 1, 2023): 012016. http://dx.doi.org/10.1088/1742-6596/2608/1/012016.
Full textLiu, Junjun, Dong Wang, Yitan Li, Haihua Wang, Huan Chen, Qianqian Wang, and Wenbing Kang. "Exceptional Lithography Sensitivity Boosted by Hexafluoroisopropanols in Photoresists." Polymers 16, no. 6 (March 15, 2024): 825. http://dx.doi.org/10.3390/polym16060825.
Full textErdmann, Andreas, David Reibold, Tim Fühner, and Peter Evanschitzky. "Photomasks for Semiconductor Lithography: From Simple Shadow Casters to Complex 3D Scattering Objects." Advances in Science and Technology 55 (September 2008): 173–80. http://dx.doi.org/10.4028/www.scientific.net/ast.55.173.
Full textAhmad Kamal, Ahmad Syazwan, Cheng-Chieh Lin, Zhiyu Wang, Di Xing, Yang-Chun Lee, Mu-Hsin Chen, Ya-Lun Ho, Chun-Wei Chen, and Jean-Jacques Delaunay. "CsPbBr3 nanocrystals plasmonic distributed Bragg reflector waveguide laser." Applied Physics Letters 122, no. 7 (February 13, 2023): 071104. http://dx.doi.org/10.1063/5.0128232.
Full textDomonkos, Mária, Pavel Demo, and Alexander Kromka. "Nanosphere Lithography for Structuring Polycrystalline Diamond Films." Crystals 10, no. 2 (February 14, 2020): 118. http://dx.doi.org/10.3390/cryst10020118.
Full textВознюк, Г. В., И. Н. Григоренко, М. И. Митрофанов, В. В. Николаев, and В. П. Евтихиев. "Субволновые текстурированные поверхности для вывода излучения из волновода." Письма в журнал технической физики 48, no. 6 (2022): 51. http://dx.doi.org/10.21883/pjtf.2022.06.52214.19103.
Full textTEO, SELIN H. G., A. Q. LIU, G. L. SIA, C. LU, J. SINGH, M. B. YU, and H. Q. SUN. "DEEP UV LITHOGRAPHY FOR PILLAR TYPE NANOPHOTONIC CRYSTAL." International Journal of Nanoscience 04, no. 04 (August 2005): 559–66. http://dx.doi.org/10.1142/s0219581x05003577.
Full textBin Yu, Bin Yu, Wei Jia Wei Jia, Changhe Zhou Changhe Zhou, Hongchao Cao Hongchao Cao, and Wenting Sun Wenting Sun. "Grating imaging scanning lithography." Chinese Optics Letters 11, no. 8 (2013): 080501–80503. http://dx.doi.org/10.3788/col201311.080501.
Full textLin, Jian-Shian, Chieh-Lung Lai, Ya-Chun Tu, Cheng-Hua Wu, and Yoshimi Takeuchi. "A Uniform Pressure Apparatus for Micro/Nanoimprint Lithography Equipment." International Journal of Automation Technology 3, no. 1 (January 5, 2009): 84–88. http://dx.doi.org/10.20965/ijat.2009.p0084.
Full textLee, Su Yong, Do Young Noh, Hae Cheol Lee, Chung-Jong Yu, Yeukuang Hwu, and Hyon Chol Kang. "Direct-write X-ray lithography using a hard X-ray Fresnel zone plate." Journal of Synchrotron Radiation 22, no. 3 (April 2, 2015): 781–85. http://dx.doi.org/10.1107/s1600577515003306.
Full textHruby, Jill. "LIGA Technologies and Applications." MRS Bulletin 26, no. 4 (April 2001): 337–40. http://dx.doi.org/10.1557/mrs2001.76.
Full textOKAZAKI, SHINJI. "CURRENT ISSUES AND FUTURE PROSPECTS OF LITHOGRAPHY." International Journal of High Speed Electronics and Systems 16, no. 01 (March 2006): 375–87. http://dx.doi.org/10.1142/s0129156406003709.
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