Books on the topic 'Lithographic applications'

E, Seeger David, and Society of Photo-optical Instrumentation Engineers., eds. Emerging lithographic technologies: 10-11 March 1997, Santa Clara, California. Bellingham, Wash: SPIE, 1997.

Yuli, Vladimirsky, Society of Photo-optical Instrumentation Engineers., and Semiconductor Equipment and Materials International, eds. Emerging lithographic technologies III: 15-17 March, 1999, Santa Clara, California. Bellingham, Wash: SPIE, 1999.

1969-, Lercel Michael J., Society of Photo-optical Instrumentation Engineers., and International SEMATECH, eds. Emerging lithographic technologies X: 21-23 February, 2006, San Jose, California, USA. Bellingham, Wash: SPIE, 2006.

L, Engelstad Roxann, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International., and International SEMATECH, eds. Emerging lithographic technologies VII: 25-27 February, 2003, Santa Clara, California, USA. Bellingham, Wash: SPIE, 2003.

Ann, Dobisz Elizabeth, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International., and International SEMATECH, eds. Emerging lithographic technologies IV: 28 February-1 March, 2000, Santa Clara, USA. Bellingham, Wash: SPIE, 2000.

1969-, Lercel Michael J., Society of Photo-optical Instrumentation Engineers., and SEMATECH (Organization), eds. Emerging lithographic technologies XI: 27 February- 1 March 2007, San Jose, California, USA. Bellingham, Wash: SPIE, 2007.

1969-, Lercel Michael J., Society of Photo-optical Instrumentation Engineers., and SEMATECH (Organization), eds. Emerging lithographic technologies XI: 27 February- 1 March 2007, San Jose, California, USA. Bellingham, Wash: SPIE, 2007.

Scott, Mackay R., Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International., and International SEMATECH, eds. Emerging lithographic technologies VIII: 24-26 February, 2004, Santa Clara, California, USA. Bellingham, Wash., USA: SPIE, 2004.

Yuli, Vladimirsky, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International, and SEMATECH (Organization), eds. Emerging lithographic technologies II: 23-25 February 1998, Santa Clara, California. Bellingham, Wash: SPIE, 1998.

Ann, Dobisz Elizabeth, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International, and International SEMATECH, eds. Emerging lithographic technologies V: 27 February-1 March, 2001, Santa Clara, [California], USA. Bellingham, Wash: SPIE, 2001.

Fontaine, Bruno M. La, and F. M. Schellenberg. Alternative lithographic technologies: 24-26 February 2009, San Jose, California, United States. Edited by SPIE (Society) and International SEMATECH. Bellingham, Wash: SPIE, 2009.

Herr, Daniel J. C. Alternative lithographic technologies II: 23-25 February 2010, San Jose, California, United States. Edited by SPIE (Society) and SEMATECH (Organization). Bellingham, Wash: SPIE, 2010.

Resnick, Douglas J., and William Man-Wai Tong. Alternative lithographic technologies IV: 13-16 February 2012, San Jose, California, United States. Edited by SPIE (Society). Bellingham, Washington: SPIE, 2012.

Herr, Daniel J. C. Alternative lithographic technologies III: 1-3 March 2011, San Jose, California, United States. Edited by SPIE (Society). Bellingham, Wash: SPIE, 2011.

Excimer laser lithography. Bellingham, Wash., USA: SPIE Optical Engineering Press, 1990.

EUV lithography. Bellingham, Wash: SPIE, 2007.

Lin, Burn Jeng. Optical lithography: Here is why. Bellingham, Wash: SPIE, 2009.

Optical lithography: Here is why. Bellingham, Wash: SPIE, 2009.

Lin, Burn Jeng. Optical lithography: Here is why. Bellingham, Wash: SPIE, 2009.

Okoroanyanwu, Uzodinma. Molecular theory of lithography. Bellingham, Washington, USA: SPIE, 2015.

J, Ehrlich Daniel, and Tsao Jeffrey Y, eds. Laser microfabrication: Thin film processes and lithography. Boston: Academic Press, 1989.

Vivek, Bakshi, ed. EUV sources for lithography. Bellingham, Wash: SPIE Press, 2005.

Mack, Chris A. Principles of optical lithography: The science of microfabrication. Chichester, West Sussex, England: Wiley, 2007.

America, Optical Society of, ed. Extreme ultraviolet lithography: Summaries of papers presented at the topical meeting, Extreme Ultraviolet Lithography, September 19-21, 1994, Monterey, California. Washington, DC: The Society, 1994.

Filatov, D. O. Two-dimensional periodic nanoscale patterning of solid surfaces by four-beam standing wave excimer laser lithography. New York: Nova Science Pub. Inc., 2010.

(1989), Ernst-Abbe Colloquium Jena. Proceedings. Jena, German Democratic Republic: Friedrich-Schiller-Universität Jena, 1989.

A, Tseng A., ed. Nanofabrication: Fundamentals and applications. Singapore: World Scientific, 2008.

A, Tseng A., ed. Nanofabrication: Fundamentals and applications. Singapore: World Scientific, 2008.

International Workshop on X-ray and Extreme Ultraviolet Lithography (1997 Yokohama, Japan). Digest of papers, XEL '1997: 1997 International Workshop on X-ray and Extreme Ultraviolet Lithography, July 13-15, 1997, Pacifico Yokohama, Yokohama. [Tokyo: Japan Society for the Promotion of Sciences?, 1997.

Yen, Anthony, Alek C. Chen, and Burn Lin. Lithography Asia 2008: 4-6 November 2008, Taipei, Taiwan. Edited by SPIE (Society) and Taiwan Semiconductor Industry Association. Bellingham, Wash: SPIE, 2008.

EUV kōgen no kaihatsu to ōyō: Development and application of extreme ultraviolet light source. Tōkyō-to Chiyoda-ku: Shīemushī Shuppan, 2013.

D, Kubiak Glenn, Kania Don R, and Optical Society of America, eds. Extreme ultraviolet lithography: From the topical meeting, May 1-3, 1996, Boston, Massachusetts. Washington, DC: The Society, 1996.

service), SpringerLink (Online, ed. Stereolithography: Materials, Processes and Applications. Boston, MA: Springer Science+Business Media, LLC, 2011.

Fontaine, Bruno M. La. Extreme ultraviolet (EUV) lithography: 22-25 February 2010, San Jose, California, United States. Bellingham, Wash: SPIE, 2010.

Ann, MacDonald Carolyn, and Society of Photo-optical Instrumentation Engineers., eds. EUV, X-ray, and neutron optics and sources: 21-23 July 1999, Denver, Colorado. Bellingham, Wash., USA: SPIE, 1999.

Fontaine, Bruno M. La, and Patrick P. Naulleau. Extreme ultraviolet (EUV) lithography II: 28 February-3 March 2011, San Jose, California, United States. Edited by SPIE (Society). Bellingham, Wash: SPIE, 2011.

1930-, Zernike Frits, Attwood David T, and Optical Society of America, eds. OSA proceedings on extreme ultraviolet lithography: Proceedings of the topical meeting, September 19-21, 1994, Monterey, California. Washington, DC: The Society, 1995.

1975-, Ma Xiangguo, and Li Wenping 1976-, eds. Ju jiao li zi shu wei na jia gong ji shu. Beijing: Beijing gong ye da xue chu ban she, 2006.

Arrowsmith, David John. Electrolytic processes on surfaces: Contributions to electrolytic polishing, anodizing, adhesion, colar, lithography and electronic applications. Birmingham: Aston University. Department of Mechanical and Production Engineering, 1988.

1931-, Bethge Klaus, ed. Ion tracks and microtechnology: Principles and applications. Braunschweig: Vieweg, 1990.

M, Ceglio Natale, and Society of Photo-optical Instrumentation Engineers., eds. Multilayer optics for advanced x-ray applications: 22-23 July 1991, San Diego, California. Bellingham, Wash: SPIE, 1992.

M, Khounsary Ali, Dinger Udo, Ota Kazuya, and Society of Photo-optical Instrumentation Engineers., eds. Advances in mirror technology for X-ray, EUV lithography, laser and other applications II: 5 August, 2004, Denver, Colorado, USA. Bellingham, Wash: SPIE, 2004.

M, Khounsary Ali, Dinger Udo, Ota Kazuya, and Society of Photo-optical Instrumentation Engineers., eds. Advances in mirror technology for X-ray, EUV lithography, laser and other applications: 7-8 August 2003, San Diego, California, USA. Bellingham, Wash., USA: SPIE, 2004.

Emerging Lithographic Techniques VI. SPIE Society of Photo-Optical Instrumentation Engi, 2002.

Mackay, R. Scott. Emerging Lithographic Technologies 9. SPIE-International Society for Optical Engine, 2005.

Trybula, Walt, and Ampere A. Tseng. Emerging Lithographic Technologies for Nanopatterning. Taylor & Francis Group, 2010.

(Editor), Ampere A. Tseng, and Walt Trybula (Editor), eds. Emerging Lithographic Technologies for Nanopatterning. CRC, 2008.

Trybula, Walt, and Ampere A. Tseng. Emerging Lithographic Technologies for Nanopatterning. Taylor & Francis Group, 2010.

Schellenberg, Frank. Emerging Lithographic Technologies XII: 26-28 February 2008, San Jose, California, USA. SPIE, 2008.

Development of a low-debris laser driven soft x-ray source for lithographic applications. London, U.K.: Imperial College London, 2016.