Relevant bibliographies by topics / Ion Beam Lithography / Books
To see the other types of publications on this topic, follow the link: Ion Beam Lithography.

Books on the topic 'Ion Beam Lithography'

Author: Grafiati
Published: 4 June 2021
Last updated: 31 January 2023

Create a spot-on reference in APA, MLA, Chicago, Harvard, and other styles

Select a source type:

Consult the top 36 books for your research on the topic 'Ion Beam Lithography.'

Next to every source in the list of references, there is an 'Add to bibliography' button. Press on it, and we will generate automatically the bibliographic reference to the chosen work in the citation style you need: APA, MLA, Harvard, Chicago, Vancouver, etc.

You can also download the full text of the academic publication as pdf and read online its abstract whenever available in the metadata.

Browse books on a wide variety of disciplines and organise your bibliography correctly.

1

Gu, Wenqi. Dian zi shu bao guang wei na jia gong ji shu. Beijing: Beijing gong ye da xue chu ban she, 2004.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
2

The physics of submicron lithography. New York: Plenum Press, 1992.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
3

Popov, V. K. Raschet i proektirovanie ustroĭstv ėlektronnoĭ i ionnoĭ litografii. Moskva: "Radio i svi͡a︡zʹ", 1985.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
4

International Symposium on Electron, Ion, and Photon Beams (2nd 1984 Tarrytown, N.Y.). Proceedings of the 1984 International Symposium on Electron, Ion, and Photon Beams, 29 May-1 June, 1984, Westchester Marriott Hotel, Tarrytown, New York. Edited by Kelly J, American Vacuum Society, and American Institute of Physics. New York: Published for the American Vacuum Society by the American Institute of Physics, 1985.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
5

Dian zi shu sao miao pu guang ji shu. [Peking]: Yu hang chu ban she, 1985.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
6

S, Khokle W., ed. Patterning of material layers in submicron region. New York: J. Wiley, 1993.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
7

1931-, Bethge Klaus, ed. Ion tracks and microtechnology: Principles and applications. Braunschweig: Vieweg, 1990.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
8

T, Reid David, ed. Rapid prototyping & manufacturing: Fundamentals of stereolithography. Dearborn, MI: Society of Manufacturing Engineers in cooperation with the Computer and Automated Systems Association of SME, 1992.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
9

1975-, Ma Xiangguo, and Li Wenping 1976-, eds. Ju jiao li zi shu wei na jia gong ji shu. Beijing: Beijing gong ye da xue chu ban she, 2006.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
10

service), SpringerLink (Online, ed. Stereolithography: Materials, Processes and Applications. Boston, MA: Springer Science+Business Media, LLC, 2011.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
11

Stereolithography and other RP&M technologies: From rapid prototyping to rapid tooling. Dearborn, Mich: Society of Manufacturing Engineers in cooperation with the Rapid Prototyping Association of SME, 1996.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
12

D, Blais Phillip, and Society of Photo-optical Instrumentation Engineers., eds. Electron-beam, x-ray, and ion-beam lithographies VI: [proceedings] 5-6 March 1987, Santa Clara, California. Bellingham, Wash., USA: The Society, 1987.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
13

W, Yanof Arnold, and Society of Photo-optical Instrumentation Engineers., eds. Electron-beam, X-ray, and ion-beam technology: Submicrometer lithographies VII : 2-4 March 1988, Santa Clara, California. Bellingham, Wash., USA: The Society, 1988.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
14

D, Blais Phillip, and Society of Photo-optical Instrumentation Engineers., eds. Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V: 11-12 March 1986, Santa Clara, California. Bellingham, Wash., USA: SPIE--the International Society for Optical Engineering, 1986.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
15

W, Yanof Arnold, Society of Photo-optical Instrumentation Engineers., and SPIE Symposium on Microlithography (1989 : San Jose, Calif.), eds. Electron-beam, X-ray, and ion-beam technology: Submicrometer lithographies VIII : 1-3 March 1989, San Jose, California. Bellingham, Wash., USA: SPIE, 1989.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
16

D, Blais Phillip, and International Society for Hybrid Microelectronics., eds. Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V: 11-12 March, 1986, Santa Clara, California. Bellinham, Wash., USA: SPIE--the International Society for Optical Engineering, 1986.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
17

1946-, Peckerar Martin Charles, and Society of Photo-optical Instrumentation Engineers., eds. Electon-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing: 6-7 March 1991, San Jose, California. Bellingham, Wash: SPIE, 1991.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
18

D, Blais Phillip, and International Society for Hybrid Microelectronics., eds. Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV: March 14-15, 1985, Santa Clara, California. Bellingham, Wash., USA: SPIE--the International Society for Optical Engineering, 1985.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
19

Yanof, Arnold W. Electron-Beam, X Ray, and Ion-Beam Technology; Submicrometer Lithographics VII (Proceedings of SPIE--the International Society for Optical Engineering). Society of Photo Optical, 1988.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
20

M, Warlaumont John, Society of Photo-optical Instrumentation Engineers., and Semiconductor Equipment and Materials International., eds. Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V: 20-21 February 1995, Santa Clara, California. Bellingham, Wash., USA: SPIE, 1995.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
21

E, Seeger David, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International., and SEMATECH (Organization), eds. Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI: 11-13 March 1996, Santa Clara, California. Bellingham, Wash: SPIE, 1996.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
22

Keskinbora, Kahraman. Prototyping Micro- and Nano-Optics with Focused Ion Beam Lithography. SPIE, 2019. http://dx.doi.org/10.1117/3.2531118.

Full text
APA, Harvard, Vancouver, ISO, and other styles
23

O, Patterson David, and Society of Photo-optical Instrumentation Engineers., eds. Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III: 1-2 March 1993, San Jose, California. Bellingham, Wash: The Society, 1993.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
24

1946-, Peckerar Martin Charles, and Society of Photo-optical Instrumentation Engineers., eds. Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II: 8-9 March 1992, San Jose, California. Bellingham, Wash: SPIE, 1992.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
25

O, Patterson David, Society of Photo-optical Instrumentation Engineers., and Semiconductor Equipment and Materials International., eds. Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV: 28 February-1 March 1994, San Jose, California. Bellingham, Wash: SPIE, 1994.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
26

James, Bondur, Reinberg Alan R, and Society of Photo-optical Instrumentation Engineers., eds. Dry processing for submicrometer lithography: 12-13 October 1989, Santa Clara, California. Bellingham, Wash., USA: The Society, 1990.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
27

Ann, MacDonald Carolyn, and Society of Photo-optical Instrumentation Engineers., eds. EUV, X-ray, and neutron optics and sources: 21-23 July 1999, Denver, Colorado. Bellingham, Wash., USA: SPIE, 1999.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
28

Spohr, Reimar. Ion Tracks and Microtechnology: Principles and Applications. Springer Vieweg. in Springer Fachmedien Wiesbaden GmbH, 2012.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
29

Jacobs, Paul F. Rapid Prototyping & Manufacturing: Fundamentals of Stereolithography. Mcgraw-Hill (Tx), 1993.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
30

Rapid prototyping & manufacturing: Fundamentals of stereolithography. Dearborn, MI: Society of Manufacturing Engineers in cooperation with the Computer and Automated Systems Association of SME, 1992.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
31

Springer and Joachim Bargon. Methods and Materials in Microelectronic Technology. Springer, 2012.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
32

Bargon, Joachim. Methods and Materials in Microelectronic Technology. Springer London, Limited, 2013.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
33

Gallop, J., and L. Hao. Superconducting Nanodevices. Edited by A. V. Narlikar. Oxford University Press, 2017. http://dx.doi.org/10.1093/oxfordhb/9780198738169.013.17.

Full text
Abstract:
This article reviews recent progress in superconducting nanodevices, with particular emphasis on fabrication methods developed for superconducting nanowires and nanoscale Josephson junctions based on different barrier materials. It evaluates the future potential of superconducting nanodevices, including nano-superconducting quantum interference devices (nanoSQUIDs), in light of improvements in nanoscale fabrication and manipulation techniques, along with their likely impacts on future quantum technology and measurement. The article first considers efforts to realize devices at the physical scale of 100 nm and below before discussing different types of Josephson junction such as trilayer junctions. It also describes the use of focused ion beam milling and electron beam lithography techniques for junction fabrication at the nanoscale and the improved energy sensitivity detectable with a nanoSQUID. Finally, it looks at a range of applications for nanoSQUIDs, superconducting single photon detectors, and other superconducting nanodevices.
APA, Harvard, Vancouver, ISO, and other styles
34

Hong, M. H. Laser applications in nanotechnology. Edited by A. V. Narlikar and Y. Y. Fu. Oxford University Press, 2017. http://dx.doi.org/10.1093/oxfordhb/9780199533060.013.24.

Full text
Abstract:
This article discusses a variety of laser applications in nanotechnology. The laser has proven to be one of many mature and reliable manufacturing tools, with applications in modern industries, from surface cleaning to thin-film deposition. Laser nanoengineering has several advantages over electron-beam and focused ion beam processing. For example, it is a low-cost, high-speed process in air, vacuum or chemical environments and also has the capability to fulfill flexible integration control. This article considers laser nanotechnology in the following areas: pulsed laser ablation for nanomaterials synthesis; laser nanoprocessing to make nanobumps for disk media nanotribology and anneal ultrashort PN junctions; surface nanopatterning with near-field, and light-enhancement effects; and large-area parallel laser nanopatterning by laser interference lithography and laser irradiation through a microlens array. Based on these applications, the article argues that the laser will continue to be one of the highly potential nanoengineering means in next-generation manufacturing.
APA, Harvard, Vancouver, ISO, and other styles
35

McGuiness, C. L., R. K. Smith, M. E. Anderson, P. S. Weiss, and D. L. Allara. Nanolithography using molecular films and processing. Edited by A. V. Narlikar and Y. Y. Fu. Oxford University Press, 2017. http://dx.doi.org/10.1093/oxfordhb/9780199533060.013.23.

Full text
Abstract:
This article focuses on the use of molecular films as building blocks for nanolithography. More specifically, it reviews efforts aimed at utilizing organic molecular assemblies in overcoming the limitations of lithography, including self-patterning and directed patterning. It considers the methods of patterning self-assembled organic monolayer films through soft-lithographic methods such as microcontact printing and nanoimprint lithography, through direct ‘write’ or ‘machine’ processes with a nanometer-sized tip and through exposure to electron or photon beams. It also discusses efforts to pattern the organic assemblies via the physicochemical self-assembling interactions, including patterning via phase separation of chemically different molecules and insertion of guest adsorbates into host matrices. Furthermore, it examines the efforts that have been made to couple patterned molecular assemblies with inorganic thin-film growth methods to form spatially constrained, three-dimensional thin films. Finally, it describes a hybrid self-assembly/conventional lithography (i.e. molecular rulers) approach to forming nanostructures.
APA, Harvard, Vancouver, ISO, and other styles
36

Hazzard-Donald, Katrina. Healin’ da Sick, Raisin’ da Daid. University of Illinois Press, 2017. http://dx.doi.org/10.5406/illinois/9780252037290.003.0007.

Full text
Abstract:
This chapter examines Hoodoo as health care and the role of the African American midwife in the old tradition black belt Hoodoo complex. Scholarship has totally overlooked a discussion of traditional Hoodoo healers: treaters, midwives, and root doctors. Even African Americans who know anything of contemporary Hoodoo will usually not immediately associate it with medicinal herbalism. Hoodoo marketeers were neither interested in nor had access to this aspect of Hoodoo. This chapter considers how Hoodoo midwives, treaters, and root doctors mastered treatments and developed their regional pharmacopoeia. It discusses one technique used by all three types of Hoodoo health care providers: the method of using string to tie sacred healing knots. It also describes nine types of healing amulets used in Hoodoo: single-knot string amulet; multiknot amulet; root necklace; prayer bead necklace; prayer cloth; biblical scroll; walking cane; religious lithography; and silver coin.
APA, Harvard, Vancouver, ISO, and other styles
You might also be interested in the bibliographies on the topic 'Ion Beam Lithography' for other source types:
Journal articles Dissertations / Theses
We offer discounts on all premium plans for authors whose works are included in thematic literature selections. Contact us to get a unique promo code!

To the bibliography