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Relevant bibliographies by topics / High-throughput nanolithography / Journal articles

Journal articles on the topic 'High-throughput nanolithography'

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Author: Grafiati

Published: 10 December 2022

Last updated: 29 January 2023

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1

Neumann, Hendrikje R., and Christine Selhuber-Unkel. "High-throughput micro-nanostructuring by microdroplet inkjet printing." Beilstein Journal of Nanotechnology 9 (September 4, 2018): 2372–80. http://dx.doi.org/10.3762/bjnano.9.222.

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The production of micrometer-sized structures comprised of nanoparticles in defined patterns and densities is highly important in many fields, ranging from nano-optics to biosensor technologies and biomaterials. A well-established method to fabricate quasi-hexagonal patterns of metal nanoparticles is block copolymer micelle nanolithography, which relies on the self-assembly of metal-loaded micelles on surfaces by a dip-coating or spin-coating process. Using this method, the spacing of the nanoparticles is controlled by the size of the micelles and by the coating conditions. Whereas block copolymer micelle nanolithography is a high-throughput method for generating well-ordered nanoparticle patterns at the nanoscale, so far it has been inefficient in generating a hierarchical overlay structure at the micrometer scale. Here, we show that by combining block copolymer micelle nanolithography with inkjet printing, hierarchical patterns of gold nanoparticles in the form of microstructures can be achieved in a high-throughput process. Inkjet printing was used to generate droplets of the micelle solution on surfaces, resulting in printed circles that contain patterns of gold nanoparticles with an interparticle spacing between 25 and 42 nm. We tested this method on different silicon and nickel–titanium surfaces and the generated patterns were found to depend on the material type and surface topography. Based on the presented strategy, we were able to achieve patterning times of a few seconds and produce quasi-hexagonal micro-nanopatterns of gold nanoparticles on smooth surfaces. Hence, this method is a high-throughput method that can be used to coat surfaces with nanoparticles in a user-defined pattern at the micrometer scale. As the nanoparticles provide a chemical contrast on the surface, they can be further functionalized and are therefore highly relevant for biological applications.

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2

Berry, I. L. "Programmable aperture plate for maskless high-throughput nanolithography." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 15, no. 6 (November 1997): 2382. http://dx.doi.org/10.1116/1.589652.

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3

Hakala, Tommi K., Veikko Linko, Antti-Pekka Eskelinen, J. Jussi Toppari, Anton Kuzyk, and Päivi Törmä. "Field-Induced Nanolithography for High-Throughput Pattern Transfer." Small 5, no. 23 (December 4, 2009): 2683–86. http://dx.doi.org/10.1002/smll.200901326.

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4

Schaper, Charles D. "Molecular transfer lithography for pseudomaskless, high-throughput, aligned nanolithography." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 21, no. 6 (2003): 2961. http://dx.doi.org/10.1116/1.1621660.

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5

Zhang, Hua, Nabil A Amro, Sandeep Disawal, Robert Elghanian, Roger Shile, and Joseph Fragala. "High-Throughput Dip-Pen-Nanolithography-Based Fabrication of Si Nanostructures." Small 3, no. 1 (January 2, 2007): 81–85. http://dx.doi.org/10.1002/smll.200600393.

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6

WEI, J., and C. K. WONG. "PHYSICAL AND CHEMICAL NANOLITHOGRAPHY TECHNIQUES: CHALLENGES AND PROSPECTS." International Journal of Nanoscience 04, no. 04 (August 2005): 575–85. http://dx.doi.org/10.1142/s0219581x05003644.

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The fabrication of nanodevices and nanosystems having dimensions smaller than 100 nm requires the ability to produce, control, manipulate, and modify structures at the nanometer scale. Physical and chemical nanolithography techniques have been demonstrated to be promising because of the low cost and high throughput. Although the physical and chemical nanolithography techniques can pattern small features on single chips or across an entire wafer, there are considerable challenges when dealing with complex nanostructures, alignment and multilevel stacks. In this paper, the problems are reviewed and potential solutions suggested.

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7

LI, HAI, XIAO-DONG ZHANG, YI ZHANG, ZHEN-QIAN OUYANG, and JUN HU. "FABRICATION OF TRUE-COLOR MICROPATTERNS BY 2D STEPWISE CONTRACTION AND ADSORPTION NANOLITHOGRAPHY (SCAN)." Surface Review and Letters 14, no. 01 (February 2007): 129–34. http://dx.doi.org/10.1142/s0218625x07009141.

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Fabrication of structures on the micro- and nanometer scales is of great importance for both fundamental research and potential applications. While microlithography methods are relatively established, the production of multi-component micro- and nanostructures with high density still presents difficulties. In this paper, a novel strategy termed as two-dimensional (2D) stepwise contraction and adsorption nanolithography (SCAN) is used to fabricate true-color micropatterns through a series of size-reduction process based on the physical elasticity of elastomer. Faithful multicolor patterns with feature size about 30 times smaller than the initial ones can be fabricated by employing the 2D SCAN. The simplicity and high throughput capability of SCAN make it a competitive alternative to other micro- and nanolithography techniques.

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8

Lin, P. S. D. "High-throughput nanolithography using an oxygen-plasma resistant two-layer resist system." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 6, no. 6 (November 1988): 2290. http://dx.doi.org/10.1116/1.584072.

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9

Jones, Alexandra G., Claudio Balocco, Rosemary King, and Aimin M. Song. "Highly tunable, high-throughput nanolithography based on strained regioregular conducting polymer films." Applied Physics Letters 89, no. 1 (July 3, 2006): 013119. http://dx.doi.org/10.1063/1.2219094.

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10

Haaheim, Jason, and Omkar A. Nafday. "Dip Pen Nanolithography: A Desktop Nanofabrication Approach Using High-Throughput Flexible Nanopatterning." Microscopy Today 17, no. 2 (March 2009): 30–33. http://dx.doi.org/10.1017/s1551929500054468.

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Dip Pen Nanolithography (DPN) is a scanning probe lithography technique where an atomic force microscope tip is used to transfer molecules to a surface via a solvent meniscus. This technique allows surface patterning on scales of under 100 nanometres. DPN is the nanotechnology analog of the dip pen (also called the quill pen), where the tip of an atomic force microscope cantilever acts as a “pen,” which is coated with a chemical compound or mixture acting as an “ink,” and put in contact with a substrate, the “paper.”DPN enables direct deposition of nanoscale materials onto a substrate in a flexible manner. The vehicle for deposition can include pyramidal scanning probe microscope tips, hollow tips, and even tips on thermally actuated cantilevers. Recent advances have demonstrated massively parallel patterning using two-dimensional arrays of 55,000 tips, depicted below. Applications of this technology currently range through chemistry, materials science, and the life sciences, and include such work as ultra high density biological nanoarrays, additive photomask repair, and brand protection for pharmaceuticals.

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11

Nafday, Omkar A., and Steven Lenhert. "High-throughput optical quality control of lipid multilayers fabricated by dip-pen nanolithography." Nanotechnology 22, no. 22 (April 4, 2011): 225301. http://dx.doi.org/10.1088/0957-4484/22/22/225301.

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12

Arango-Santander, Santiago, Sidónio C. Freitas, Alejandro Pelaez-Vargas, and Claudia García. "Silica Sol-Gel Patterned Surfaces Based on Dip-Pen Nanolithography and Microstamping: A Comparison in Resolution and Throughput." Key Engineering Materials 720 (November 2016): 264–68. http://dx.doi.org/10.4028/www.scientific.net/kem.720.264.

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Fabrication of patterns on silicon and gold via Dip-Pen Nanolithography (DPN) using silica sol as ink and the combination of DPN, soft lithography, and silica sol-gel to transfer patterns from silicon and gold to stainless steel were assessed. In addition, a comparison in terms of throughput and resolution of both protocols was performed. Optical, scanning electron and atomic force microscopy were used to characterize the patterns. Silica sol showed high resolution but low throughput when used to pattern directly on gold and silicon using DPN. The combination of DPN, silica sol-gel and soft lithography showed high throughput and resolution. The present experimental methodology was useful to create patterns on a surface and transfer them to another surface of interest, which may serve as a biomaterial surface modification model.

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13

Haaheim, Jason, and Omkar A. Nafday. "Dip Pen Nanolithography®: A “Desktop Nanofab™” Approach Using High-Throughput Flexible Nanopatterning." Scanning 30, no. 2 (2008): 137–50. http://dx.doi.org/10.1002/sca.20098.

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14

Bearinger, Jane P., Gary Stone, Amy L. Hiddessen, Lawrence C. Dugan, Ligang Wu, Philip Hailey, James W. Conway, et al. "Phototocatalytic Lithography of Poly(propylene sulfide) Block Copolymers: Toward High-Throughput Nanolithography for Biomolecular Arraying Applications." Langmuir 25, no. 2 (January 20, 2009): 1238–44. http://dx.doi.org/10.1021/la802727s.

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15

Grushina, Anya. "Direct-write grayscale lithography." Advanced Optical Technologies 8, no. 3-4 (June 26, 2019): 163–69. http://dx.doi.org/10.1515/aot-2019-0024.

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Abstract Grayscale lithography is used to produce three-dimensional (3D) structures on micro- and nanoscale. During the last decade, micro-optics and other applications were actively pushing the market demand for such structures. Direct-write systems that use lasers and heated scanning probes can be used for high-precision grayscale micro- and nanolithography. They provide solutions for the most demanding applications in research and industrial manufacturing. At both the micro- and nanoscale, though, some challenges remain, mainly related to throughput. Ongoing R&D efforts and emerging new applications drive several companies to join forces in order to meet the market demands for grayscale lithography of today and in the future.

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16

Mondal, Partha Pratim. "The Expanding Horizon of Light Sheet Technology." iScience Notes 6, no. 6 (December 14, 2021): 1–2. http://dx.doi.org/10.22580/iscinotej6.6.2.

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Seldom, do we come across a technology that advances multiple research disciplines across science and engineering. One such technology is light sheet that promises to take scientific investigation to the next level. The existing technology, predominantly based on point-focusing has reached a saturation limit, in terms of speed, limited field-of-view and lack of biophysical parameter estimation. Moreover, current technology is complex and needs human intervention. Light sheet techniques based on sheet-illumination expand our abilities for high throughput interrogation of a large pool of live biological specimens with near diffraction-limited resolution and an order increase in field-of-view. The outlook of research community has changed dramatically over the last decade that has seen an increased use of light sheet technology. Light sheet technique has penetrated both biological and physical sciences with its impact on microscopy, cytometry, nanolithography, beam-shaping, plasma physics and optical manipulation. Eventually, the technique will influence other disciplines and may give rise to new research fields.

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17

Hill, Flynn R., Enrico Monachino, and Antoine M. van Oijen. "The more the merrier: high-throughput single-molecule techniques." Biochemical Society Transactions 45, no. 3 (June 15, 2017): 759–69. http://dx.doi.org/10.1042/bst20160137.

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The single-molecule approach seeks to understand molecular mechanisms by observing biomolecular processes at the level of individual molecules. These methods have led to a developing understanding that for many processes, a diversity of behaviours will be observed, representing a multitude of pathways. This realisation necessitates that an adequate number of observations are recorded to fully characterise this diversity. The requirement for large numbers of observations to adequately sample distributions, subpopulations, and rare events presents a significant challenge for single-molecule techniques, which by their nature do not typically provide very high throughput. This review will discuss many developing techniques which address this issue by combining nanolithographic approaches, such as zero-mode waveguides and DNA curtains, with single-molecule fluorescence microscopy, and by drastically increasing throughput of force-based approaches such as magnetic tweezers and laminar-flow techniques. These methods not only allow the collection of large volumes of single-molecule data in single experiments, but have also made improvements to ease-of-use, accessibility, and automation of data analysis.

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18

Bullen, David A., Xuefeng Wang, Jun Zou, Sung-Wook Chung, Chang Liu, and Chad A. Mirkin. "Development of Parallel Dip Pen Nanolithography Probe Arrays for High Throughput Nanolithography." MRS Proceedings 758 (2002). http://dx.doi.org/10.1557/proc-758-ll4.2.

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ABSTRACTDip Pen Nanolithography (DPN) is a lithographic technique that allows direct deposition of chemicals, metals, biological macromolecules, and other molecular “inks” with nanometer dimensions and precision. This paper addresses recent developments in the design and demonstration of high-density multiprobe DPN arrays. High-density arrays increase the process throughput over individual atomic force microscope (AFM) probes and are easier to use than arrays of undiced commercial probes. We have demonstrated passive arrays made of silicon (8 probes, 310 μm tip-to-tip spacing) and silicon nitride (32 probes, 100 μm tip-to-tip spacing). We have also demonstrated silicon nitride “active” arrays (10 probes, 100 μm tip-to-tip spacing) that have embedded thermal actuators for individual probe control. An optimization model for these devices, based on a generalized multilayer thermal actuator, is also described.

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19

Saha, Sourabh K., and Martin L. Culpepper. "Characterization of the Dip Pen Nanolithography Process for Nanomanufacturing." Journal of Manufacturing Science and Engineering 133, no. 4 (July 20, 2011). http://dx.doi.org/10.1115/1.4004406.

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Dip pen nanolithography (DPN) is a flexible nanofabrication process for creating 2-D nanoscale features on a surface using an “inked” tip. Although a variety of ink-surface combinations can be used for creating 2-D nanofeatures using DPN, the process has not yet been characterized for high throughput and high quality manufacturing. Therefore, at present it is not possible to (i) predict whether fabricating a part is feasible within the constraints of the desired rate and quality and (ii) select/design equipment appropriate for the desired manufacturing goals. Herein, we have quantified the processing rate, tool life, and feature quality for DPN line writing by linking these manufacturing metrics to the process/system parameters. Based on this characterization, we found that (i) due to theoretical and practical constraints of current technology, the processing rate cannot be increased beyond about 20 times the typical rate of ∼1 μm2/min, (ii) tool life for accurate line writing is limited to 1–5 min, and (iii) sensitivity of line width to process parameters decreases with an increase in the writing speed. Thus, we conclude that for a high throughput and high quality system, we need (i) parallelization or process modification to improve throughput and (ii) accurate fixtures for rapid tool change. We also conclude that process control at high speed writing is less stringent than at low speed writing, thereby suggesting that DPN has a niche in high speed writing of narrow lines.

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20

Park, Changsu, Soobin Hwang, Donghyun Kim, Nahyun Won, Runjia Han, Seonghyeon Jeon, Wooyoung Shim, Jiseok Lim, Chulmin Joo, and Shinill Kang. "Massively parallel direct writing of nanoapertures using multi-optical probes and super-resolution near-fields." Microsystems & Nanoengineering 8, no. 1 (September 15, 2022). http://dx.doi.org/10.1038/s41378-022-00416-9.

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AbstractLaser direct-writing enables micro and nanoscale patterning, and is thus widely used for cutting-edge research and industrial applications. Various nanolithography methods, such as near-field, plasmonic, and scanning-probe lithography, are gaining increasing attention because they enable fabrication of high-resolution nanopatterns that are much smaller than the wavelength of light. However, conventional methods are limited by low throughput and scalability, and tend to use electron beams or focused-ion beams to create nanostructures. In this study, we developed a procedure for massively parallel direct writing of nanoapertures using a multi-optical probe system and super-resolution near-fields. A glass micro-Fresnel zone plate array, which is an ultra-precision far-field optical system, was designed and fabricated as the multi-optical probe system. As a chalcogenide phase-change material (PCM), multiple layers of Sb65Se35 were used to generate the super-resolution near-field effect. A nanoaperture was fabricated through direct laser writing on a large-area (200 × 200 mm2) multi-layered PCM. A photoresist nanopattern was fabricated on an 8-inch wafer via near-field nanolithography using the developed nanoaperture and an i-line commercial exposure system. Unlike other methods, this technique allows high-throughput large-area nanolithography and overcomes the gap-control issue between the probe array and the patterning surface.

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21

Minopoli, Antonio, Bartolomeo Della Ventura, Bohdan Lenyk, Francesco Gentile, Julian A. Tanner, Andreas Offenhäusser, Dirk Mayer, and Raffaele Velotta. "Ultrasensitive antibody-aptamer plasmonic biosensor for malaria biomarker detection in whole blood." Nature Communications 11, no. 1 (December 2020). http://dx.doi.org/10.1038/s41467-020-19755-0.

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AbstractDevelopment of plasmonic biosensors combining reliability and ease of use is still a challenge. Gold nanoparticle arrays made by block copolymer micelle nanolithography (BCMN) stand out for their scalability, cost-effectiveness and tunable plasmonic properties, making them ideal substrates for fluorescence enhancement. Here, we describe a plasmon-enhanced fluorescence immunosensor for the specific and ultrasensitive detection of Plasmodium falciparum lactate dehydrogenase (PfLDH)—a malaria marker—in whole blood. Analyte recognition is realized by oriented antibodies immobilized in a close-packed configuration via the photochemical immobilization technique (PIT), with a top bioreceptor of nucleic acid aptamers recognizing a different surface of PfLDH in a sandwich conformation. The combination of BCMN and PIT enabled maximum control over the nanoparticle size and lattice constant as well as the distance of the fluorophore from the sensing surface. The device achieved a limit of detection smaller than 1 pg/mL (<30 fM) with very high specificity without any sample pretreatment. This limit of detection is several orders of magnitude lower than that found in malaria rapid diagnostic tests or even commercial ELISA kits. Thanks to its overall dimensions, ease of use and high-throughput analysis, the device can be used as a substrate in automated multi-well plate readers and improve the efficiency of conventional fluorescence immunoassays.

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22

Fragala, Joseph S., R. Roger Shile, and Jason Haaheim. "Enabling the Desktop NanoFab with DPN® Pen and Ink Delivery Systems." MRS Proceedings 1037 (2007). http://dx.doi.org/10.1557/proc-1037-n02-04.

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AbstractDepositing a wide range of materials as nanoscale features onto diverse surfaces with nanometer registration and resolution are challenging requirements for any nanoscale processing system. Dip Pen Nanolithography® (DPN®), a high resolution, scanning probe-based direct-write technology, has emerged as a promising solution for these requirements. Many different materials can be deposited directly using DPN, including alkane thiols, metal salts and nanoparticles, metal oxides, polymers, DNA, and proteins. Indirect deposition allows the creation of many interesting nanostructures. For instance, using MHA may be used to create arrays of antibodies, which then bond specifically to antigens on the surface of viruses or cells, to create cell or virus arrays. The DPN system is designed to allow registration to existing features on a writing substrate via optical alignment or nanoscale alignment using the core AFM platform. This allows, for instance, the nanoscale deposition of sensor materials directly onto monolithic electronic chips with both sensing and circuit features.To enable the DPN process, novel pen and ink delivery systems have been designed and fabricated using MEMS technology. These MEMS devices bridge the gap between the macro world (instrument) and the nano world (nanoscale patterns). The initial MEMS devices were simple and robust both in design and fabrication to get products into the marketplace quickly. The first MEMS-based DPN device was a passive pen array based on silicon nitride AFM probe technology from Cal Quate's group at Stanford. The next two devices (an inkwell chip and a thermal bimorph active pen) were more complicated and took considerable effort to commercialize. In this work, some of the difficulties in bringing brand new MEMS devices from the prototype stage into production will be shared. The subsequent MEMS products have become even more complicated both in design and fabrication, but the development process has improved as well. For example, the 2D nanoPrintArray has 55,000 pens in one square centimeter for high throughput writing over large areas. The 2D arrays enable templated self assembly of nanostructures giving researchers the ability to control the placement of self assembled features rather than allowing the self assembly to occur randomly.Applications of DPN technology vary from deposition of DNA or proteins in nanoarrays for disease detection or drug discovery, to deposition of Sol-gel metal oxides for gas sensors, and to additive repair of advanced phase-shifting photomasks.

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