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Journal articles on the topic 'Fluctuation electron microscopy'

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Author: Grafiati

Published: 10 December 2022

Last updated: 28 January 2023

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1

Kennedy, Ellis, Neal Reynolds, Luis Rangel DaCosta, Frances Hellman, Colin Ophus, and M. C. Scott. "Tilted fluctuation electron microscopy." Applied Physics Letters 117, no. 9 (August 31, 2020): 091903. http://dx.doi.org/10.1063/5.0015532.

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2

Zjajo, Armin, Itai Matzkevich, Hongchu Du, Rafal Dunin-Borkowski, Aram Rezikyan, and Michael Treacy. "Reducing Decoherence in Fluctuation Electron Microscopy." Microscopy and Microanalysis 27, S1 (July 30, 2021): 1776–77. http://dx.doi.org/10.1017/s1431927621006498.

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3

Voyles, P. M., and D. A. Muller. "Fluctuation Microscopy in the STEM." Microscopy and Microanalysis 7, S2 (August 2001): 226–27. http://dx.doi.org/10.1017/s1431927600027203.

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Fluctuation microscopy is an electron microscopy technique sensitive to medium-range order (MRO) in disordered materials. It has been applied to study amorphous germanium and silicon, leading to the conclusion that these materials exhibit more MRO than the conventional continuous random network model for their structure.As originally proposed by Treacy and Gibson, fluctuation microscopy utilizes mesoscopicresolution (1.5 nm) hollow-cone dark field (HCDF) imaging in a TEM. The normalized variance of such images,is a measure of the magnitude of fluctuations in the diffracted intensity from mesoscopic volumes of the sample and is sensitive to MRO via the three- and four-body atom distribution functions. Studying V as a function of the diffraction vector magnitude k gives information about the degree of MRO and the internal structure of ordered regions. V as a function of the inverse resolution Q gives information about the characteristic MRO length scale.

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4

Rezikyan, A., Z. Jibben, B. Rock, G. Zhao, and M. Treacy. "Simulation of Decoherence in Fluctuation Electron Microscopy." Microscopy and Microanalysis 19, S2 (August 2013): 1592–93. http://dx.doi.org/10.1017/s1431927613009951.

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5

Rezikyan, A., Z. Jibben, B. Rock, G. Zhao, and M. M. J. Treacy. "Simulation of Decoherence in Fluctuation Electron Microscopy." Microscopy and Microanalysis 20, S3 (August 2014): 150–51. http://dx.doi.org/10.1017/s1431927614002475.

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6

Li, J., and I. Anderson. "Rocking-Beam Variable Coherence Electron Microscopy: An Alternative Approach to Fluctuation Electron Microscopy." Microscopy and Microanalysis 12, S02 (July 31, 2006): 672–73. http://dx.doi.org/10.1017/s1431927606067316.

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7

Moriguchi, Sakumi, Hiroki Kurata, Seiji Isoda, and Takashi Kobayashi. "High Resolution Electron Microscopy in Organic Chemistry: 1-MEV Electron Microscope in Kyoto." Proceedings, annual meeting, Electron Microscopy Society of America 48, no. 1 (August 12, 1990): 140–41. http://dx.doi.org/10.1017/s0424820100179452.

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Since the epock-making results of 1.5 Å point-to-point resolution obtained with the 500 kV HREM in Kyoto in 1978, we are convinced of the validty of the high voltage electron microscope for the high resolution. However, in order to attain the higher resolution of about 1.3 Å, which is required to resolve a carbon-carbon distance in an aromatic hydrocarbon, there remain so many problems to be solved. In 1990 a new 1 MeV microscope with twin-tank (JE0L-ARM1000) in top-entry type has been installed in Kyoto university aiming to achieve such high resolution.The stability of high voltage is especially important for high resolution because the energy spread of the incident electron beam attenuates the phase transfer function and reduces the image contrast in higher spatial frequencies region. In order to suppress the high voltage fluctuation lower than 1 p. p. m. at 1 MeV and to monitor it, the twin-tank system is adopted, which has produced also satisfactory results in the previous high voltage electron microscopes in Kyoto. Fig. 1 shows the stability of the high tension measured at the top of the accerelating column of the new 1 MeV microscope. The fluctuation is evidently suppressed to less than 1 × 10-6 for five minutes long. The ripple monitored on a sincroscope is also less than 1 p.p.m. The chromatic abberation constant Cc is 3.6mm.

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8

Rezikyan, Aram, Zechariah J. Jibben, Bryan A. Rock, Gongpu Zhao, Franz A. M. Koeck, Robert F. Nemanich, and Michael M. J. Treacy. "Speckle Suppression by Decoherence in Fluctuation Electron Microscopy." Microscopy and Microanalysis 21, no. 6 (September 18, 2015): 1455–74. http://dx.doi.org/10.1017/s1431927615015135.

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AbstractWe compare experimental fluctuation electron microscopy (FEM) speckle data with electron diffraction simulations for thin amorphous carbon and silicon samples. We find that the experimental speckle intensity variance is generally more than an order of magnitude lower than kinematical scattering theory predicts for spatially coherent illumination.We hypothesize that decoherence, which randomizes the phase relationship between scattered waves, is responsible for the anomaly. Specifically,displacement decoherencecan contribute strongly to speckle suppression, particularly at higher beam energies. Displacement decoherence arises when the local structure is rearranged significantly by interactions with the beam during the exposure. Such motions cause diffraction speckle to twinkle, some of it at observable time scales.We also find that the continuous random network model of amorphous silicon can explain the experimental variance data if displacement decoherence and multiple scattering is included in the modeling. This may resolve the longstanding discrepancy between X-ray and electron diffraction studies of radial distribution functions, and conclusions reached from previous FEM studies.Decoherence likely affects all quantitative electron imaging and diffraction studies. It likely contributes to the so-called Stobbs factor, where high-resolution atomic-column image intensities are anomalously lower than predicted by a similar factor to that observed here.

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9

Li, Jing, X. Gu, and T. C. Hufnagel. "Using Fluctuation Microscopy to Characterize Structural Order in Metallic Glasses." Microscopy and Microanalysis 9, no. 6 (November 21, 2003): 509–15. http://dx.doi.org/10.1017/s1431927603030459.

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We have used fluctuation microscopy to reveal the presence of structural order on length scales of 1–2 nm in metallic glasses. We compare results of fluctuation microscopy measurements with high resolution transmission electron microscopy and electron diffraction observations on a series of metallic glass samples with differing degrees of structural order. The agreement between the fluctuation microscopy results and those of the other techniques is good. In particular, we show that the technique used to make thin specimens for electron microscopy affects the structure of the metallic glass, with ion thinning inducing more structural order than electropolishing. We also show that relatively minor changes in the composition of the alloy can have a significant effect on the medium-range order; this increased order is correlated with changes in mechanical behavior.

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10

Stratton, W. G., and P. M. Voyles. "Comparison of fluctuation electron microscopy theories and experimental methods." Journal of Physics: Condensed Matter 19, no. 45 (October 24, 2007): 455203. http://dx.doi.org/10.1088/0953-8984/19/45/455203.

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11

Jungk, Tobias, Thomas Walther, and Werner Mader. "Fluctuation Electron Microscopy on a-Ge and Polycrystalline Gold." Microscopy and Microanalysis 9, S03 (September 2003): 152–53. http://dx.doi.org/10.1017/s1431927603016143.

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12

Radić, Dražen, Sven Hilke, Martin Peterlechner, Matthias Posselt, Gerhard Wilde, and Hartmut Bracht. "Comparison of Experimental STEM Conditions for Fluctuation Electron Microscopy." Microscopy and Microanalysis 26, no. 6 (August 27, 2020): 1100–1109. http://dx.doi.org/10.1017/s143192762002440x.

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13

De Hosson, Jeff Th M., Nicolai G. Chechenin, Daan-Hein Alsem, Tomas Vystavel, Bart J. Kooi, Antoni R. Chezan, and Dik O. Boerma. "Ultrasoft Magnetic Films Investigated with Lorentz Tranmission Electron Microscopy and Electron Holography." Microscopy and Microanalysis 8, no. 4 (August 2002): 274–87. http://dx.doi.org/10.1017/s1431927602020214.

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As a tribute to the scientific work of Professor Gareth Thomas in the field of structure-property relationships this paper delineates a new possibility of Lorentz transmission electron microscopy (LTEM) to study the magnetic properties of soft magnetic films. We show that in contrast to the traditional point of view, not only does the direction of the magnetization vector in nano-crystalline films make a correlated small-angle wiggling, but also the magnitude of the magnetization modulus fluctuates. This fluctuation produces a rapid modulation in the LTEM image. A novel analysis of the ripple structure in nano-crystalline Fe-Zr-N film corresponds to an amplitude of the transversal component of the magnetization ΔMy of 23 mT and a longitudinal fluctuation of the magnetization of the order of ΔMx = 30 mT. The nano-crystalline (Fe99Zr1)1−xNx films have been prepared by DC magnetron reactive sputtering with a thickness between 50 and 1000 nm. The grain size decreased monotonically with N content from typically 100 nm in the case of N-free films to less than 10 nm for films containing 8 at%. The specimens were examined with a JEOL 2010F 200 kV transmission electron microscope equipped with a post column energy filter (GIF 2000 Gatan Imaging Filter). For holography, the microscope is mounted with a biprism (JEOL biprism with a 0.6 μm diameter platinum wire).

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14

Verma, Navneet C., Chethana Rao, Ashutosh Singh, Neha Garg, and Chayan K. Nandi. "Dual responsive specifically labelled carbogenic fluorescent nanodots for super resolution and electron microscopy." Nanoscale 11, no. 14 (2019): 6561–65. http://dx.doi.org/10.1039/c9nr00457b.

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We introduce an orange emissive fluorescent nanodot for successful single molecule stochastic optical reconstruction microscopy (STORM), super resolution radial fluctuation (SRRF) microscopy and transmission electron microscopy (TEM).

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15

Treacy, M., A. Rougee, and P. Buseck. "Fluctuation Electron Microscopy of Shungite, a Disordered Natural Carbonaceous Material." Microscopy and Microanalysis 12, S02 (July 31, 2006): 588–89. http://dx.doi.org/10.1017/s1431927606066128.

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16

Yi, F., WG Stratton, and PM Voyles. "Model of Fluctuation Electron Microscopy for a Nanocrystal /Amorphous Composite." Microscopy and Microanalysis 14, S2 (August 2008): 914–15. http://dx.doi.org/10.1017/s1431927608086133.

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17

Lee, Bong-Sub, Stephen G. Bishop, and John R. Abelson. "Fluctuation Transmission Electron Microscopy: Detecting Nanoscale Order in Disordered Structures." ChemPhysChem 11, no. 11 (July 7, 2010): 2311–17. http://dx.doi.org/10.1002/cphc.201000153.

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18

Zhao, Chao, Ren Bo Song, Lei Feng Zhang, Fu Qiang Yang, and Shuai Qin. "Research on Fluctuations in Work Hardening Rate of a Fe-Mn-Al-C Steel." Materials Science Forum 817 (April 2015): 288–92. http://dx.doi.org/10.4028/www.scientific.net/msf.817.288.

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The fluctuations in the work hardening rate of a Fe-12Mn-10Al-0.7C (wt. %) steel have been investigated through scanning electron microscopy (SEM) and transmission electron microscopy (TEM). The work hardening rate of the heat treated sample had a tendency of decrease with fluctuations. The first raise in the work hardening rate curve at about 2% true strain is attributed to the shearing of the small ferrite grains by austenite, and the deformation induced twinning can contribute to the raise and drop in the work hardening rate curve. The second fluctuation range at the true strain between 10% and 14% is mainly related to the activation of planar slip on the principle slip plane which is suppressed by twins in austenite.

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19

Chen, X., J. M. Gibson, and J. Sullivan. "Fluctuation Microscopy Studies of Amorphous Diamond-Like Carbon Films." Microscopy and Microanalysis 6, S2 (August 2000): 432–33. http://dx.doi.org/10.1017/s1431927600034656.

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Hydrogen-free amorphous diamond-like carbon films have stimulated great interest because of their useful properties, such as high hardness, chemical inertness, thermal stability, wide optical gap, and negative electron affinity[l]. Consequently, they may have various potential applications in mechanical and optical coatings, MEMS systems, chemical sensors and electronic devices. Amorphous diamond-like carbon films often contains significant amounts of four-fold or sp3 bonded carbon, in contrast to amorphous carbon films prepared by evaporation or sputtering which consist mostly of three-fold or sp2 bonded carbon. The ratio and the structure configurations of these three-fold and four-fold carbon atoms certainly decide the properties of these amorphous diamond-carbon films. Although the ratio of three-fold and four-fold carbon has been studied with Raman spectroscopy and electron-loss-energy spectroscopy, very little has been understood regarding key questions such as how the three-fold and the four-fold carbon atoms are integrated in the film, and what structures those three-fold carbon atoms take.

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20

Hwang, Jinwoo, and P. M. Voyles. "Variable Resolution Fluctuation Electron Microscopy on Cu-Zr Metallic Glass Using a Wide Range of Coherent STEM Probe Size." Microscopy and Microanalysis 17, no. 1 (December 2, 2010): 67–74. http://dx.doi.org/10.1017/s1431927610094109.

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AbstractWe report variable resolution fluctuation electron microscopy (VRFEM) measurements on Cu64.5Zr35.5metallic glass acquired using scanning transmission electron microscopy nanodiffraction using coherent probes 0.8 to 11 nm in diameter. The VRFEM results show that medium range atomic order structure of Cu64.5Zr35.5bulk metallic glass at the ∼1 nm scale has large fluctuations, but the structure becomes almost completely homogeneous at the 11 nm scale. We show that our experimental VRFEM data are consistent with two different models, the pair persistent model and the amorphous/nanocrystal composite model. We also report a new way to filter VRFEM data to eliminate the effect of specimen thickness gradient using high-angle annular dark field images as references.

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21

Biswas, Parthapratim, Raymond Atta-Fynn, S. Chakraborty, and D. A. Drabold. "Real space information from fluctuation electron microscopy: applications to amorphous silicon." Journal of Physics: Condensed Matter 19, no. 45 (October 24, 2007): 455202. http://dx.doi.org/10.1088/0953-8984/19/45/455202.

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22

Ryan, Joseph V., and Carlo G. Pantano. "Medium-range order in silicon oxycarbide glass by fluctuation electron microscopy." Journal of Physics: Condensed Matter 19, no. 45 (October 24, 2007): 455205. http://dx.doi.org/10.1088/0953-8984/19/45/455205.

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23

Kwon, Min-Ho, Bong-Sub Lee, Stephanie N. Bogle, Lakshmi N. Nittala, Stephen G. Bishop, John R. Abelson, Simone Raoux, Byung-ki Cheong, and Ki-Bum Kim. "Nanometer-scale order in amorphous Ge2Sb2Te5 analyzed by fluctuation electron microscopy." Applied Physics Letters 90, no. 2 (January 8, 2007): 021923. http://dx.doi.org/10.1063/1.2430067.

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24

Zhao, Gongpu, Michael M. J. Treacy, and Peter R. Buseck. "Fluctuation electron microscopy of medium-range order in ion-irradiated zircon." Philosophical Magazine 90, no. 35-36 (December 14, 2010): 4661–77. http://dx.doi.org/10.1080/14786431003630876.

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25

Kennedy, Ellis, Alejandro Ceballos, Frances Hellman, Colin Ophus, and Mary Scott. "Tilted Fluctuation Electron Microscopy Characterization of Magnetically Anisotropic Amorphous Metal Films." Microscopy and Microanalysis 25, S2 (August 2019): 1886–87. http://dx.doi.org/10.1017/s143192761901016x.

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26

Voyles, Paul M., and John R. Abelson. "Medium-range order in amorphous silicon measured by fluctuation electron microscopy." Solar Energy Materials and Solar Cells 78, no. 1-4 (July 2003): 85–113. http://dx.doi.org/10.1016/s0927-0248(02)00434-8.

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27

Stratton, W. G., J. Hamann, J. H. Perepezko, P. M. Voyles, X. Mao, and S. V. Khare. "Aluminum nanoscale order in amorphous Al92Sm8 measured by fluctuation electron microscopy." Applied Physics Letters 86, no. 14 (April 4, 2005): 141910. http://dx.doi.org/10.1063/1.1897830.

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28

Sarac, B., C. Gammer, L. Deng, E. Park, Y. Yokoyama, M. Stoica, and J. Eckert. "Elastostatic reversibility in thermally formed bulk metallic glasses: nanobeam diffraction fluctuation electron microscopy." Nanoscale 10, no. 3 (2018): 1081–89. http://dx.doi.org/10.1039/c7nr06891c.

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29

Li, Tian T., Stephanie N. Bogle, and John R. Abelson. "Quantitative Fluctuation Electron Microscopy in the STEM: Methods to Identify, Avoid, and Correct for Artifacts." Microscopy and Microanalysis 20, no. 5 (July 17, 2014): 1605–18. http://dx.doi.org/10.1017/s1431927614012756.

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AbstractFluctuation electron microscopy can reveal the nanoscale order in amorphous materials via the statistical variance in the scattering intensity as a function of position, scattering vector, and resolution. However, several sources of experimental artifacts can seriously affect the magnitude of the variance peaks. The use of a scanning transmission electron microscope for data collection affords a convenient means to check whether artifacts are present. As nanodiffraction patterns are collected in serial, any spatial or temporal dependence of the scattering intensity across the series can easily be detected. We present examples of the major types of artifact and methods to correct the data or to avoid the problem experimentally. We also re-cast the statistical formalism used to identify sources of noise in view of the present results. The present work provides a basis on which to perform fluctuation electron microscopy with a high level of reliability and confidence in the quantitative magnitude of the data.

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30

Jungk, T., T. Walther, and W. Mader. "Critical assessment of the speckle statistics in fluctuation electron microscopy and comparison to electron diffraction." Ultramicroscopy 104, no. 3-4 (October 2005): 206–19. http://dx.doi.org/10.1016/j.ultramic.2005.04.003.

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31

Watanabe, S. "Direct Observation of Nanostructural Fluctuation during Radiation-Induced Amorphization." Materials Science Forum 561-565 (October 2007): 2021–24. http://dx.doi.org/10.4028/www.scientific.net/msf.561-565.2021.

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An atomistic study of radiation-induced amorphization in the NiTi intermetallic compound was performed by using in-situ high-resolution high-voltage electron microscopy and molecular dynamics in conjunction with image simulations. Both theoretical and experimental results show that metastable nanometer-size inherent atomic clusters form and disappear during irradiation, so that a spatiotemporal fluctuation under amorphization is induced. The random formation and annihilation of such inherent nanoclusters are believed to be responsible for these fluctuations, which appear to be related to transitions between the ideal glass state and metastable, unrelaxed states in an energy-dissipative system under irradiation.

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32

Iijima, Sumio. "A direct measurement of diffusion jump frequency in amorphous materials using VTR-high resolution electron microscopy." Proceedings, annual meeting, Electron Microscopy Society of America 47 (August 6, 1989): 126–27. http://dx.doi.org/10.1017/s0424820100152604.

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Intensity fluctuation in HREM granular images of amorphous thin films such as spattered C and Si films has long been noticed among electron microscopists. The granular images are continuously moving as if they were a bunch of living worms. The origin of the fluctuations is believed to be caused by a charging up effect on the film surface. The present paper introduces for this first time the phenomena using a TV image recording system.An amorphous oxide thin film used in the present experiment was formed by decomposing a portion of a Tl2Ba2CaCu2O8 superconductor oxide crystal under electron beam irradiation. The structure of the film may be a random network built up by metal-oxygen polyhedra. The HREM images were recorded at a direct magnification 1.2 × 106 times on a real-time TV camera (Getan 622) attached on an electron microscope (ABT-002B, 200keV, Cs 0.4mm, resolution 0.2nm).

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33

Bornhöfft, Manuel, Tobias Saltzmann, Julia Benke, Paul M. Voyles, Ulrich Simon, Matthias Wuttig, and Joachim Mayer. "Nano-diffraction in STEM and fluctuation electron microscopy of phase-change material." Acta Crystallographica Section A Foundations and Advances 71, a1 (August 23, 2015): s286. http://dx.doi.org/10.1107/s2053273315095637.

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34

Radić, Dražen, Sven Hilke, Martin Peterlechner, Matthias Posselt, and Hartmut Bracht. "Fluctuation electron microscopy on silicon amorphized at varying self ion-implantation conditions." Journal of Applied Physics 126, no. 9 (September 7, 2019): 095707. http://dx.doi.org/10.1063/1.5107494.

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35

Kennedy, Ellis, Alejandro Ceballos, Frances Hellman, Colin Ophus, and Mary Scott. "Characterizing Magnetic Anisotropy in Amorphous Metal Films Using Tilted Fluctuation Electron Microscopy." Microscopy and Microanalysis 24, S1 (August 2018): 204–5. http://dx.doi.org/10.1017/s1431927618001514.

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36

Treacy, M. M. J. "When structural noise is the signal: Speckle statistics in fluctuation electron microscopy." Ultramicroscopy 107, no. 2-3 (February 2007): 166–71. http://dx.doi.org/10.1016/j.ultramic.2006.07.001.

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37

Stratton, W. G., and P. M. Voyles. "A phenomenological model of fluctuation electron microscopy for a nanocrystal/amorphous composite." Ultramicroscopy 108, no. 8 (July 2008): 727–36. http://dx.doi.org/10.1016/j.ultramic.2007.11.004.

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38

Cheng, Ju-Yin, J. M. Gibson, and D. C. Jacobson. "Observations of structural order in ion-implanted amorphous silicon." Journal of Materials Research 16, no. 11 (November 2001): 3030–33. http://dx.doi.org/10.1557/jmr.2001.0416.

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Medium-range order in ion-implanted amorphous silicon has been observed using fluctuation electron microscopy. In fluctuation electron microscopy, variance of dark-field image intensity contains the information of high-order atomic correlations, primarily in medium-range order length scale (1–3 nm). Thermal annealing greatly reduces the order and leaves a random network. It appears that the free energy change previously observed on relaxation may therefore be associated with randomization of the network. In this paper, we discuss the origin of the medium-range order during implantation, which can be interpreted as a paracrystalline state, that is, a disordered network enclosing compacts of highly topologically ordered grains on the length scale of 1–3 nm with significant strain fields.

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39

Hwang, J., Z. H. Melgarejo, Y. E. Kalay, M. J. Kramer, D. S. Stone, and P. M. Voyles. "Computational Structure Refinement by Hybrid Reverse Monte Carlo Simulation Incorporating Fluctuation Electron Microscopy." Microscopy and Microanalysis 19, S2 (August 2013): 794–95. http://dx.doi.org/10.1017/s1431927613005965.

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40

Bogle, Stephanie N., Paul M. Voyles, Sanjay V. Khare, and John R. Abelson. "Quantifying nanoscale order in amorphous materials: simulating fluctuation electron microscopy of amorphous silicon." Journal of Physics: Condensed Matter 19, no. 45 (October 24, 2007): 455204. http://dx.doi.org/10.1088/0953-8984/19/45/455204.

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41

Yi, Feng, and P. M. Voyles. "Analytical and computational modeling of fluctuation electron microscopy from a nanocrystal/amorphous composite." Ultramicroscopy 122 (November 2012): 37–47. http://dx.doi.org/10.1016/j.ultramic.2012.07.022.

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42

Li, Tian T., Kristof Darmawikarta, and John R. Abelson. "Quantifying nanoscale order in amorphous materials via scattering covariance in fluctuation electron microscopy." Ultramicroscopy 133 (October 2013): 95–100. http://dx.doi.org/10.1016/j.ultramic.2013.06.017.

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43

Maldonis, Jason, Pei Zhang, Li He, Ankit Gujral, Mark D. Ediger, and Paul M. Voyles. "Fluctuation Electron Microscopy and Computational Structure Refinement for the Structure of Amorphous Materials." Microscopy and Microanalysis 22, S3 (July 2016): 486–87. http://dx.doi.org/10.1017/s1431927616003287.

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44

Hruszkewycz, S. O., T. Fujita, Mingwei W. Chen, and Todd C. Hufnagel. "Selected area nanodiffraction fluctuation electron microscopy for studying structural order in amorphous solids." Scripta Materialia 58, no. 4 (February 2008): 303–6. http://dx.doi.org/10.1016/j.scriptamat.2007.10.009.

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45

Krivanek, O. L., N. Dellby, A. J. Gubbens, M. K. Kundmann, M. L. Leber, D. A. Ray, and K. V. Truong. "Advances in Parallel-Detection EELS." Proceedings, annual meeting, Electron Microscopy Society of America 48, no. 2 (August 12, 1990): 76–77. http://dx.doi.org/10.1017/s0424820100133977.

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Parallel-detection electron energy-loss spectrometers (PEELS) now routinely provide spectra in which the main source of noise is the statistical fluctuation in the number of arriving electrons (i.e., they have DQE > 0.5), achieve an energy resolution which is more than 90% limited by the electron microscope gun, and are fairly easy to operate. They have pushed the minimum detectable mass (MDM) obtainable by PEELS close to the single atom level, and have improved the minimum detectable mass fraction (MDF) so that it is now comparable or better than MDF detectable by EDXS even for elements as heavy as Fe. The attainable energy resolution is now 0.3-0.5 eV on a routine basis when the spectrometer is mounted on a cold field-emission gun (S)TEM operating at 100 kV (Fig. 1). This impressive progress has opened up an important question: where next?Our answer is three-fold: towards greater integration of EELS with other techniques of electron microscopy, towards new applications of the technique, and towards more quantitative and yet more user-friendly analysis of the results.

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46

Stratton, W. G., P. M. Voyles, J. Hamann, and J. H. Perepezko. "Medium-Range Order in High Al-content Amorphous Alloys Measured by Fluctuation Electron Microscopy." Microscopy and Microanalysis 10, S02 (August 2004): 788–89. http://dx.doi.org/10.1017/s1431927604880838.

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47

Ashida, Koji, Daichi Dojima, Satoshi Torimi, Norihito Yabuki, Yusuke Sudo, Takuya Sakaguchi, Satoru Nogami, Makoto Kitabatake, and Tadaaki Kaneko. "Rearrangement of Surface Structure of 4^o Off-Axis 4H-SiC (0001) Epitaxial Wafer by High Temperature Annealing in Si/Ar Ambient." Materials Science Forum 924 (June 2018): 249–52. http://dx.doi.org/10.4028/www.scientific.net/msf.924.249.

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Mechanism of surface roughening caused by the polishing induced subsurface damage on 4o off-cut 4H-SiC (0001) substrate during thermal etching, CVD epitaxial growth, and the subsequent high temperature annealing was investigated in the wide temperature range of 1000-1800°C. Different from the previous study based on a macroscopic characterization by optical microscopy, microscopic characterization based on a scanning electron microscopy (SEM) was employed in this study. By utilizing the SEM operated under various conditions, disordered step arrangements as well as stacking faults and dislocations were imaged. The obtained results revealed that the SFs cause the fluctuation in the step kinetics, resulting in the step bunching formation during the thermal process.

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Chen, Lian-Yi, Qing-Ping Cao, J. Z. Jiang, and Jing-Wei Deng. "Reply to the comments of Y.H. Liu: Ion sputter erosion in metallic glass—A response to “Comment on: Homogeneity of Zr64.13Cu15.75Ni10.12Al10 bulk metallic glass” by L-Y. Chen, Y-W. Zeng, Q-P. Cao, B-J. Park, Y-M. Chen, K. Hono, U. Vainio, Z-L. Zhang, U. Kaiser, X-D. Wang,and J-Z Jiang [J. Mater. Res. 24, 3116 (2009)]." Journal of Materials Research 25, no. 3 (March 2010): 602–4. http://dx.doi.org/10.1557/jmr.2010.0079.

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The morphology of the dark and bright regions observed by transmission electron microscopy for the Zr64.13Cu15.75Ni10.12Al10 bulk metallic glass strongly depends on the ion beam parameters used for ion milling. This indicates that the ion beam could introduce surface fluctuation to metallic glasses during ion milling.

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Zhu, Guang, Xiao Ping Zou, Jin Cheng, Mao Fa Wang, and Yi Su. "Synthesis of Straight Y-Shaped Silica Nanorods." Advanced Materials Research 47-50 (June 2008): 367–70. http://dx.doi.org/10.4028/www.scientific.net/amr.47-50.367.

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The straight Y-shaped silica nanorods have been synthesized on Si wafer by thermal chemical evaporation of mixed powders of silica and graphite at 1300°C and condensation on Si substrate without assistance of any catalyst. The synthesized samples were characterized by means of scanning electron microscopy, transmission electron microscopy. The results suggested that the straight Y-shaped silica nanorods have uniform diameter about 50-200nm and neat smooth surface. The growth of such silica nanorods may be a result of the fluctuation of external conditions causing a change in the growth direction of silica nanorods developed.

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Zhang, Qian, Qiu Xiang Wang, Hong Zhou Dong, and Li Feng Dong. "Synthesis and Characterization of Exotic Carbon Fibers with Branched Spurs Using Nickel Catalyst Precursor." Advanced Materials Research 645 (January 2013): 3–9. http://dx.doi.org/10.4028/www.scientific.net/amr.645.3.

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In this paper, we have synt hesized exotic carbon fibers with branched spurs by a chemical vapor deposition method using nickel catalyst precursor at 600 °C. No catalyst particles were found at the base of the carbon spurs, suggesting that the ni ckel catalyst particles, which were decomposed from the nickel catalyst precursor, facilitated the growth of the carbon fibers but not the spurs. The formation of the spurs resulted from the fluctuation of the carbon source gas acetylene flow. The samples were characterized by field emission sc anning electron microscopy, transmission electron microscopy, and X-ray powder diffraction.

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