Relevant bibliographies by topics / FILM THICKNESS SIMULATION

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Academic literature on the topic 'FILM THICKNESS SIMULATION'

Author: Grafiati
Published: 11 September 2023

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Journal articles on the topic "FILM THICKNESS SIMULATION"

1

Markov, A. B., A. V. Solovyov, E. V. Yakovlev, E. A. Pesterev, V. I. Petrov, and M. S. Slobodyan. "Computer simulation of temperature fields in the Cr (film)-Zr (substrate) system during pulsed electron-beam irradiation." Journal of Physics: Conference Series 2064, no. 1 (2021): 012058. http://dx.doi.org/10.1088/1742-6596/2064/1/012058.

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Abstract The paper presents the results of numerical simulation of the distribution of thermal fields during the formation of Cr-Zr surface alloy using a pulsed low-energy high-current electron beam (LEHCEB). The melting thresholds of the Cr-Zr system for different thicknesses of Cr films were calculated. The melting threshold of the Cr-Zr system increases linearly with increasing Cr film thickness. A linear regression dependency model of the melting threshold on the film thickness is proposed. Evaporation thresholds of the Cr-Zr system for different thicknesses of Cr films were calculated. The evaporation threshold of the Cr-Zr system increases linearly with increasing Cr film thickness. A linear regression dependency model of the evaporation threshold on the film thickness is proposed. The value of the LEHCEB energy density at which the lifetime of the film and substrate are equal is calculated. This value is a maximum value for the effective formation of Cr-Zr. A model of the LEHCEB energy density, at which the lifetime of the film and the substrate are equal, in the form of a third-degree polynomial is proposed.
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2

Grigoriev, Fedor V., Vladimir B. Sulimov, and Alexander V. Tikhonravov. "Atomistic Simulation of Stresses in Growing Silicon Dioxide Films." Coatings 10, no. 3 (2020): 220. http://dx.doi.org/10.3390/coatings10030220.

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Dependence of stress values in silicon dioxide films on its thickness in the initial stage of film growth was investigated using atomistic molecular dynamics simulation. It was shown that the stress in normally deposited films was compressive and varied slightly with growth of film thickness. The stress in the glancing angle deposited films was several times lower than the stress in the normally deposited films, and varied from compressive stress to tensile stress with increasing film thickness. An essential anisotropy of stress tensor components was revealed for the case of glancing angle deposition. The calculated stress values were in the interval of experimental data.
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3

Du, Run, Anying Zhang, Zhihua Du, and Xiaoyu Zhang. "Molecular Dynamics Simulation on Thin-Film Lubrication of a Mixture of Three Alkanes." Materials 13, no. 17 (2020): 3689. http://dx.doi.org/10.3390/ma13173689.

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We used the COMPASS forcefield to perform molecular dynamics (MD) simulation of a mixture composed of three alkanes as the lubricant for the thin-film lubrication. The viscosity of the lubrication film in the non-working state, the final film thickness, and density distribution were investigated. The results reveal that the viscosity error among different initial film thicknesses in the non-working state is within 5%, which confirms the applicability of the model and the forcefield. The viscosity decreases oscillating as temperature increases. Whatever the initial film thickness is, the film thickness change rate with respect to pressure load is almost the same. When pressure increases, the density peaks increase. As the initial film thickness increases, the normalized thicknesses of adsorption and ordered layers decrease. In nanoscale, the density predicted by the MD simulation is higher than the prediction of the Tait equation, even if the adsorption layers is excluded.
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4

Wang, Ben, Xiuhua Fu, Shigeng Song, et al. "Simulation and Optimization of Film Thickness Uniformity in Physical Vapor Deposition." Coatings 8, no. 9 (2018): 325. http://dx.doi.org/10.3390/coatings8090325.

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Optimization of thin film uniformity is an important aspect for large-area coatings, particularly for optical coatings where error tolerances can be of the order of nanometers. Physical vapor deposition is a widely used technique for producing thin films. Applications include anti-reflection coatings, photovoltaics etc. This paper reviews the methods and simulations used for improving thin film uniformity in physical vapor deposition (both evaporation and sputtering), covering characteristic aspects of emission from material sources, projection/mask effects on film thickness distribution, as well as geometric and rotational influences from apparatus configurations. Following the review, a new program for modelling and simulating thin film uniformity for physical vapor deposition was developed using MathCAD. Results from the program were then compared with both known theoretical analytical equations of thickness distribution and experimental data, and found to be in good agreement. A mask for optimizing thin film thickness distribution designed using the program was shown to improve thickness uniformity from ±4% to ±0.56%.
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5

Yan, Ying, Jiarun Li, Qiuyu Liu, and Ping Zhou. "Evaporation Effect on Thickness Distribution for Spin-Coated Films on Rectangular and Circular Substrates." Coatings 11, no. 11 (2021): 1322. http://dx.doi.org/10.3390/coatings11111322.

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Spin-coating is widely applied in the field of thin-film fabrication due to its simplicity and high film uniformity. To prepare thin films on rectangular substrates by spin-coating, the simulation and experimental methods were used to study the characteristics of the film thickness in this work. The two-phase flow simulations of spin-coating on a rectangular substrate and circular substrate were carried out with the volume of fluid (VOF) method. The simulation results showed that the airflow field and the substrate geometry had little effect on the evolution of spin-coated film thickness. However, in the experimental results, there was a significant difference in the thickness of the spin-coated film on the rectangular substrate and the circular substrate. According to further study, the solvent evaporation that was neglected in the simulation was the dominant factor of the differences. In addition, it was concluded that the non-uniform evaporation caused by the surface tension and edge accumulation in the later spin-coating stage was the main reason for the film accumulation of the windward area on the rectangular substrate. This work is useful to obtain a deeper understanding of the thin-film formation mechanism of spin-coating.
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6

Wang, Kaijie, Yongzhi Cao, Yaowen Cui, Aiying Ye, Shaofan Yi, and Zhenjiang Hu. "Study on Parameter Correlation of Thickness and Performance of Anodizing Film on 6061 Aluminum Alloy Frame in High Energy Laser System." Coatings 12, no. 12 (2022): 1978. http://dx.doi.org/10.3390/coatings12121978.

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As stray laser light is difficult to avoid in high-energy laser systems, it is of great significance to improve the laser damage resistance of the aluminum alloy frame anodizing film system. In this paper, the effects of anodic oxidation parameters on the thickness and performance of 6061 aluminium alloy anodic oxide composite film systems are investigated combining experiments and simulations. The thickness of the oxide film is calculated theoretically, and the simulation model is established. Then the effects of anodizing parameters and the reasons are analyzed. After characterizing the surface quality and laser damage resistance of the oxide film, the influence of anodizing parameters is summarized. This paper enables advance calculations of film thickness within a certain range, combined with the film properties, to provide a reference for the laboratory preparation of 6061 anodizing films and the preparation of structure-specific composite film systems based on the film.
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7

P, Ramesh, and James Gunasekaran E. "Numerical Simulation of Film Thickness Formation in a PFI Engine Under Motoring Conditions." Bonfring International Journal of Industrial Engineering and Management Science 9, no. 3 (2019): 11–15. http://dx.doi.org/10.9756/bijiems.9032.

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8

HU, ZHAN-NING, and V. C. LO. "THICKNESS DEPENDENCE OF THE COERCIVE FIELD IN FERROELECTRIC THIN FILMS." International Journal of Modern Physics B 20, no. 22 (2006): 3223–31. http://dx.doi.org/10.1142/s0217979206035424.

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By considering the effects of the space charges and domain boundaries in ferroelectric thin films, the thickness dependence of coercive field (Ec) is numerically simulated based on the four-state Potts model with the nearest-neighbor interactions between dipole moments. For large thickness, experimental results where Ec decreases with thickness can be produced from our Monte-Carlo simulation. On the other hand, when the thickness is very small, our simulation gets that Ec increases with thickness by the study of the polarization switching in the film. This gives an explanation of the experimental result by Zhu et al. in J. Appl. Phys.83, 1 (1998) for SBT-BTN film, and a similar report by Bune et al. in Nature391, 874 (1998) for the crystalline film. The critical temperature of the thin film is also discussed.
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9

Khaneft, Alexander V., Vadim A. Dolgachev, and Svyatoslav A. Rybin. "The Effect of Metal Film Thickness on Ignition of Organic Explosives with a Laser Pulse." Molecules 24, no. 24 (2019): 4600. http://dx.doi.org/10.3390/molecules24244600.

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The results of numerical ignition simulation of pentaerythritol tetranitrate (PETN), cyclotrimethylene trinitramine (RDX), cyclotetramethylene tetranitramine (HMX) and 1,3,5-triamino-2,4,6-trinitrobenzene (TATB) by aluminium (Al) and molybdenum (Mo) films heated by nanosecond laser pulses in a three-layer system: glass–metal–explosive material (EM) are presented. Influence of metal film thickness on the time of EM ignition delay was considered. A non-linier dependence of time of delay of ignition of EM from thickness of a metal film is shown. The greatest critical thicknesses of Al and Mo metallic films at which ignition of EM is still possible were determined. It was established that the greater the thickness of the metal film and heat resistance of EM, the greater the heat reserve needed in EM ignition film. It was established that the ignition delay time of EM increases in the sequence of PETN, RDX, HMX and TATB.
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10

Xiong, Min, Chuanxin Teng, Ming Chen, et al. "Simulation Study of High Sensitivity Fiber SPR Temperature Sensor with Liquid Filling." Sensors 22, no. 15 (2022): 5713. http://dx.doi.org/10.3390/s22155713.

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In this paper, a high sensitivity fiber temperature sensor based on surface plasmon resonance is designed and studied. In the simulation, the single mode fiber is polished to remove most of the cladding, and then gold and silver films are added. Finally, it is embedded in the heat shrinkable tube filled with a thermo-optic coefficient liquid for curing. The numerical simulation results show that the sensing characteristics are sensitive to the remaining cladding thickness of the fiber, the thickness of the gold film and the thickness of the silver film. When the thermo-optic coefficient of the filling liquid is −2.8 × 10−4/°C, the thickness of the gold film, the thickness of the silver film and the thickness of the remaining cladding of the fiber are 30 nm, 20 nm and 1 μm, respectively. The sensitivity of the sensor designed in this paper can reach −6 nm/°C; this result is slightly higher than that of similar research in recent years. It will have a promising application prospect in flexible wearable temperature sensors, smart cities and other fields.
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