Journal articles: 'Film roughness'

1

He, Li Jun, Chuan Li, and Xing Zhao Liu. "Surface Roughness in Alumina Thin Film Deposited on Silica Using Oblique Incidence." Materials Science Forum 787 (April 2014): 373–77. http://dx.doi.org/10.4028/www.scientific.net/msf.787.373.

Full text

Abstract:

The main characteristics of a surface are physical and chemical structure, surface tension and surface roughness. Surface roughness is one of the critical factors, which could cause instability in quality performance. In this paper, surface roughness of alumina thin films deposited on a silicon substrate by using electron beam evaporation with oblique angle deposition were studied. It has been found that the surface roughness of the alumina thin films was dependent on the substrate temperature, the deposition rate, the film thickness and the inclined angle. The experimental results showed that increasing the substrate temperature reduced the surface roughness at a low inclined angle and enhanced the surface roughness at a high inclined angle, and the surface roughness increased with increasing deposition rate and film thickness. By choosing the appropriate film preparation parameters, the film surface roughness was effectively controlled.

APA, Harvard, Vancouver, ISO, and other styles

2

ZHAO, PEI, RENG WANG, DINGQUAN LIU, FENGSHAN ZHANG, WEITAO SU, and XIAOFENG XU. "UNDERLAYER ROUGHNESS INFLUENCE ON THE PROPERTIES OF Ag THIN FILM." Surface Review and Letters 15, no. 06 (December 2008): 787–91. http://dx.doi.org/10.1142/s0218625x08012062.

Full text

Abstract:

The effects of the roughness of ZnS underlayer on the microstructure, optical, and electrical properties of nanometer Ag thin film have been investigated in this paper. Nanometer Ag thin films in glass/ ZnS /7.5 nm Ag /30 nm ZnS stacks have been deposited and analyzed. In the stacks, the underlayers of ZnS have been sputtered with various thicknesses to generate various surface roughnesses. The X-ray diffraction (XRD) has been used to study the crystal structure of Ag films. The surface topography and the roughness of ZnS underlayer have been analyzed by atomic force microscopy. The sheet resistant will become larger as the increasing of the roughness. The optical constants can be derived by fitting the transmission and reflectance spectrum. From optical constants comparison of Ag films, with the surface of the stack becoming rougher, it was found that the refractive index will increase but the extinction coefficient will decrease.

APA, Harvard, Vancouver, ISO, and other styles

3

Chengwei, Wu. "On Mixed Squeeze Films of Infinite Width Plates." Journal of Tribology 113, no. 2 (April 1, 1991): 378–83. http://dx.doi.org/10.1115/1.2920632.

Full text

Abstract:

A mixed squeeze film model between two rough squeezing plates is established in the present paper. The squeeze behavior in the presence of full and partial fluid film between two rough surfaces is analyzed by using Patir and Cheng’s average flow model and Greenwood and Tripp’s roughness contact model. For one-dimensional squeeze films, transverse and isotropic surface roughness (γ ≤ 1) leads to an increasing squeeze film damping coefficient and a longer sinkage time in comparison with smooth surfaces. But, longitudinal roughness (γ > 1) leads to a decreasing squeeze film damping coefficient and a shorter sinkage time. When the roughness orientation parameter γ is kept constant, increasing roughness amplitude causes an early roughness contact and an increasing contact rigidity.

APA, Harvard, Vancouver, ISO, and other styles

4

Mitsuya, Y., T. Ohkubo, and H. Ota. "Averaged Reynolds Equation Extended to Gas Lubrication Possessing Surface Roughness in the Slip Flow Regime: Approximate Method and Confirmation Experiments." Journal of Tribology 111, no. 3 (July 1, 1989): 495–503. http://dx.doi.org/10.1115/1.3261957.

Full text

Abstract:

The average film thickness theory is extended to gas lubrication possessing surface roughness in the slip flow regime. A simplified averaged Reynolds equation is derived and its applicability is confirmed through comparing with experiments. This averaging equation makes use of the mixed average film thickness defined as Havem = αHm + (1 − α)Hmˆ, where m = 1, 2 and 3; α indicates the mixing ratio; and H¯ and Hˆ denote the arithmetically and harmonically averaged film thicknesses. The experiments were performed using computer flying heads having precisely photolithography-fabricated longitudinal, transverse or checkered pattern roughnesses under submicron spacing conditions. From the excellent agreement obtained between the calculated and experimental results, it can be concluded that the assumption that velocity slippage occurs along the surface even if roughnes is present is justified, and that the approximate method is applicable for determining the surface roughness effects in the slip flow regime.

APA, Harvard, Vancouver, ISO, and other styles

5

Wongkaew, Akkarat, Chanida Soontornkallapaki, Naritsara Amhae, and Wichet Lamai. "Effect of ZnO on a Superhydrophilic Self-Cleaning Properties of TiO₂/SiO₂ Thin Film on Glass Slide Substrate." Advanced Materials Research 1131 (December 2015): 237–41. http://dx.doi.org/10.4028/www.scientific.net/amr.1131.237.

Full text

Abstract:

This work aims to study the effect of ZnO containing in TiO2/SiO2 film on the superhydrophilic property after exposed to different types of light. The metal solutions were prepared by sol-gel technique and the film was deposited on glass slides by dip coating method. The parameter studied was the amount of ZnO in the TiO2/SiO2 film. The contents of ZnO were 5-20% weight (increased by 5%). The amount of TiO2 was constant at 30% weight. The obtained films were analyzed for their roughness. The results indicated that film roughness changed according to the ZnO contents. With 5%ZnO in the thin film, the roughness was 0.726 nm while 20%ZnO obtained the roughness of 2.128 nm. UV-Vis spectrophotometer was used for measuring of transmittance of films. At wavelength of 550 nm, the transmittances of each film were greater than 90%. Band gap energy of each film was calculated from the transmittance data. It was found that the average band gap energy of the films was 2.47 eV. Then, the films contained various amount of ZnO were grouped into 2 sets. The first set was exposed to visible light while the other set was exposed to UV. The duration of exposure was 5 hr. Both sets of films after exposed to any light were kept in a black box controlled relative humidity of 85%. Each film was measured contact angle every day. It was found that the 30%TiO2/5%Zn/SiO2 film exposed to visible light showed the best superhydrophilic property. The contact angle was about 0-5° within 3 days. This may due to the reduction of band gap energy in the presence of ZnO in TiO2/SiO2 films to 2.41 eV and the roughness of the film.

APA, Harvard, Vancouver, ISO, and other styles

6

Niesen, T. P., M. R. De Guire, J. Bill, F. Aldinger, M. Rühle, A. Fischer, F. C. Jentoft, and R. Schlögl. "Atomic force microscopic studies of oxide thin films on organic self-assembled monolayers." Journal of Materials Research 14, no. 6 (June 1999): 2464–75. http://dx.doi.org/10.1557/jmr.1999.0331.

Full text

Abstract:

The surface morphology of TiO2- and ZrO2-based thin films, deposited from aqueous solution at 70–80 °C onto functionalized organic self-assembled monolayers (SAMs) on silicon has been examined using atomic force microscopy (AFM). The films have been previously shown to consist, respectively, of nanocrystalline TiO2 (anatase) and of nanocrystalline tetragonal ZrO2 with amorphous basic zirconium sulfate. The films exhibit characteristic surface roughnesses on two length scales. Roughness on the nanometer scale appears to be dictated by the size of the crystallites in the film. Roughness on the micron scale is postulated to be related to several factors, including the topography of the SAM and the effects of larger, physisorbed particles or agglomerates. The topographies of the oxide thin films, on both the nanometer and micron scales, are consistent with a particle-attachment mechanism of film growth.

APA, Harvard, Vancouver, ISO, and other styles

7

Mitsuya, Y., and H. Ota. "Stiffness and Damping of Compressible Lubricating Films Between Computer Flying Heads and Textured Media: Perturbation Analysis Using the Finite Element Method." Journal of Tribology 113, no. 4 (October 1, 1991): 819–27. http://dx.doi.org/10.1115/1.2920698.

Full text

Abstract:

Averaged static and dynamic lubrication equations are derived in the general form containing anisotropic film thicknesses dependent on roughness orientation. Solving these equations lead to a presentation of the dynamic characteristics of lubricating films existing between computer flying heads and textured media. Squeeze effects owing to moving roughness accompanying high-frequency spacing variation are found to be given as a function of arithmetically averaged film thickness minus harmonically averaged film thickness. The calculation procedure using the finite element method is then presented for the averaged static and dynamic lubrication equations. Stiffness and damping coefficient are demonstrated indicating the effects of roughness orientation and roughness movement. Under the fixed static film conditions, the roughness decreases the stiffness. In contrast to this, the roughness only slightly affects the damping coefficient. Under fixed load and loading point conditions, these relationships are inversed. It is interesting to note that damping coefficients are decreased by longitudinal roughness and are increased by moving transverse roughness. The reason for this tendency is considered to be that the moving transverse roughness serves to generate the squeeze damping force.

APA, Harvard, Vancouver, ISO, and other styles

8

Cui, Rui Hai, Zhao Hua Jiang, and Zhong Ping Yao. "Influence of Cu²⁺ Doping on the Photocatalytic Activity of TiO₂ Film." Key Engineering Materials 368-372 (February 2008): 1483–85. http://dx.doi.org/10.4028/www.scientific.net/kem.368-372.1483.

Full text

Abstract:

With the approach of anodic oxidation, TiO2/Ti film doped with Cu2+ was produced in H2SO4 electrolyte mixed with CuSO4. The surface morphology and the roughness of the films were studied with atomic force microscopy. The phase composition of the films was studied by X-ray diffraction. The photocatalytic activity of the films was compared through the photocatalytic degradation rate of phenol. The relations of the photocatalytic activity to the concentration of Cu2+, the microstructure and the surface roughness of the film were investigated. The results showed that Cu2+ increased the surface roughness and restrained the growth of crystal. In addition, the phenol in aqueous solution was successfully photodegraded under visible light irradiation by Cu2+-TiO2/Ti film. The composition and structure of the film affected the catalytic activity greatly. Compared with TiO2/Ti film, the recombination rate of e- and h+ of Cu2+-TiO2/Ti film was decreased.

APA, Harvard, Vancouver, ISO, and other styles

9

Peng, Yonghong, Shuai Zhang, Fanghua Zhu, Wa Li, Yong Yi, Kai Du, and Qiang Yin. "Fabrication and Characterization of Fluorinated Polyimides (PI) Films with Improved Hydrophobic Property." Nano 13, no. 07 (July 2018): 1850080. http://dx.doi.org/10.1142/s1793292018500807.

Full text

Abstract:

There is a demand for composite films with excellent hydrophobic properties in inertial confinement fusion (ICF) physics experiments. In this paper, we prepared fluorinated polyimide hydrophobic films using spinning and plasma etching methods. The experimental results indicate that the water contact angle for the perfluorodecyltrichlorosilane (PFTS) treatment polyimide (PI) film is 112.0[Formula: see text], which is larger than the pure PI film [Formula: see text]. The rap oil contact angle is 84.2[Formula: see text], which is also much larger than the contact angle of PI film [Formula: see text]. Moreover, the surface roughness of the prepared films was measured by white light interferometry (WLI). The surface roughness (Ra) of pure PI is 9.79[Formula: see text]nm, but with the application of FSiO2 particles, the Ra of the films increases to 65.05[Formula: see text]nm. After plasma treatment, the Ra of the PI/FSiO2 composite film increases to 186.71[Formula: see text]nm because plasma treatment can scratch the film surface and increase its roughness. However, treating the PI/FSiO2 composite film with the plasma and PFTS, the Ra is only 88.90[Formula: see text]nm. This decrease in Ra is due to the PFTS, which is able to reduce the surface roughness. The development of composite films, compared to pure PI films, could prove to be an extremely valuable material in ICF experiments.

APA, Harvard, Vancouver, ISO, and other styles

10

SURESH, K. A., YUSHAN SHI, A. BHATTACHARYYA, and SATYENDRA KUMAR. "WETTING–DEWETTING TRANSITION AND CONFORMAL TO NON-CONFORMAL INTERFACIAL ROUGHNESS TRANSITION IN ULTRA-THIN LIQUID CRYSTAL FILMS ON SOLID SUBSTRATES." Modern Physics Letters B 15, no. 08 (April 10, 2001): 225–33. http://dx.doi.org/10.1142/s0217984901001628.

Full text

Abstract:

High-resolution X-ray reflectivity has been employed to study the structure, wetting properties, and interfacial roughness of ultra-thin liquid crystal films. The films were prepared at the air–water interface and transferred on to glass substrates by a modified horizontal deposition technique. A 3-layer film was found to partially-wet the substrate in the nematic and isotropic phases and dewet upon cooling to the crystalline phase. The surface roughnesses at the air-film and the film-glass interfaces exhibited a gradual reversible but hysteretic conformal (strongly correlated) to non-conformal transition between the isotropic and smectic-A phases.

APA, Harvard, Vancouver, ISO, and other styles

11

Santjojo, D. J. Djoko H., Masruroh, Sri Widyarti, and Fadli Robiandi. "Functionality of ZnPc Thin Film Deposited on Polystyrene Interlayer for Immobilization of Biomolecules in QCM Based Biosensor." Materials Science Forum 827 (August 2015): 266–70. http://dx.doi.org/10.4028/www.scientific.net/msf.827.266.

Full text

Abstract:

Functionality of zinc pthalocyanine (ZnPc) thin film for immobilization of biomolecules was studied using bovine serum albumin (BSA). The functionality is affected by microstructures and surface roughness of the film. This studies is conducted by producing ZnPc films by means of thermal evaporation in vacuum. The ZnPc films were deposited on quartz crystal substrates with a polystyrene interlayer. Observations were carried out using a scanning electron microscope and an optical micro-profilometry. Enhancement of the functionality is observed with the increase of the film thickness. Surface roughness and microstructures of the film influence the functionality in a complex way. Adsorbtion of the BSA molecules is associated with both the surface roughness and microstructures. Although generally the adsorption is proportional to the contact area but the roughness and fibrous microstructures of the deposited ZnPc produce complex adsorption and trapping mechanisms in the immobilization of the BSA.

APA, Harvard, Vancouver, ISO, and other styles

12

Guangteng, G., P. M. Cann, A. V. Olver, and H. A. Spikes. "Lubricant Film Thickness in Rough Surface, Mixed Elastohydrodynamic Contact." Journal of Tribology 122, no. 1 (July 14, 1999): 65–76. http://dx.doi.org/10.1115/1.555330.

Full text

Abstract:

A spacer layer imaging method has been employed to map lubricant film thickness in very thin film, rough surface, rolling elastohydrodynamic (EHD) contacts. A series of model roughnesses have been produced by depositing tiny ridges and bumps on a steel ball surface and the influence of these features on film thickness has been investigated at a range of rolling speeds. It has been shown that all the model surface features studied form speed-dependent, micro-EHD lubricating films, but the detailed shape and thickness of these films depends upon the geometry of the feature and the rolling speed. All model surface features also produce a net increase in mean film thickness, compared to the smooth surface, under operating conditions where the film thickness is less than the out-of-contact height of the surface feature studied. For a real, random, rough surface, however, mean film thickness is less than the smooth surface case. The film thickness mapping technique has also been used to measure the effective roughness of surfaces in lubricated contact. This shows that surfaces based on 2-D array of tiny circular bumps become rougher as the rolling speed and thus film thickness increases. However, real, rough surfaces appear to show a decrease of in-contact roughness with increasing rolling speed. [S0742-4787(00)01001-8]

APA, Harvard, Vancouver, ISO, and other styles

13

Ji, H., and G. S. Was. "Mechanism of in-plane texture development by ion-beam-assisted deposition." Journal of Materials Research 14, no. 6 (June 1999): 2524–32. http://dx.doi.org/10.1557/jmr.1999.0338.

Full text

Abstract:

The objective of this work was to determine the mechanism of in-plane texture development in films made by ion-beam-assisted deposition (IBAD). Both in-plane texture and surface roughness were studied as functions of film thickness. A phenomenological growth model based on the preferential growth of aligned grains due to channeling was proposed, linking the surface roughness evolution and texture development. Good correlation was found between the measured roughness and the model prediction, as well as between the roughness evolution and the in-plane texture development. A critical thickness was introduced at which in-plane texture is completed. Both surface roughness and texture results gave a critical film thickness of 114–250 nm for an ion energy of 1000 eV and an R ratio of 0.4. This range of critical film thickness was far beyond the nucleation stage, providing evidence that the development of in-plane texture in IBAD Nb films was growth-controlled.

APA, Harvard, Vancouver, ISO, and other styles

14

Mohd Dahan, Rozana, Muhamad Naiman Sarip, Yap Seong Ling, Mohamad Hafiz Mohd Wahid, Adillah Nurashikin Arshad, Norlida Kamarulzaman, and Dzaraini Kamarun. "Surface Modification of Polyvinylidenefluoride-Trifluoroethylene Film Using Argon Gas Plasma." Advanced Materials Research 626 (December 2012): 317–23. http://dx.doi.org/10.4028/www.scientific.net/amr.626.317.

Full text

Abstract:

This study investigates the surface properties of plasma surface modified spin coated PVDF-TrFE (70/30) film using Atomic Force Microscopy (AFM), Water Contact Angle (WCA) and X-ray Photoelectron Spectroscopy (XPS). The surfaces of the spin coated PVDF-TrFE film were modified using 13.56 MHz rf Argon plasma. The exposure time of the charged particle PVDF-TrFE films were varied for 1, 3 and 5mins. Prior to modification, the average surface roughness obtained was 8.615nm, but upon modification, the surface roughness was found to increase to 12.466nm. The value of the contact angle of the modified film was reduced from 90o to 43o and the XPS analysis showed dehydrofluorination of PVDF-TrFE films surfaces. The improved in surface roughness and the increased in wettability of the modified film, resulted in good biocompatibility of the modified PVDF-TrFE thin films. This phenomenon has created interest in researchers for developing functional polymer used for applications in areas such are biomedical, bio-analytical assays, textile and even food industry.

APA, Harvard, Vancouver, ISO, and other styles

15

Park, Min Woo, Wang Woo Lee, Jae Gab Lee, and Chong Mu Lee. "A Comparison of the Mechanical Properties of RF- and DC- Sputter-Deposited Cr Thin Films." Materials Science Forum 546-549 (May 2007): 1695–98. http://dx.doi.org/10.4028/www.scientific.net/msf.546-549.1695.

Full text

Abstract:

Chromium (Cr) films were deposited on plain carbon steel sheets by DC and RF magnetron sputtering as well as by electroplating. Effects of DC or RF sputtering power on the deposition rate and properties such as hardness and surface roughness of the Cr films were investigated. X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microcopy (SEM) analyses were performed to investigate the crystal structure, surface roughness, thickness of the Cr films. The deposition rate, hardness and surface roughness of the Cr film deposited by either DC or RF sputtering increase with the increase of sputtering power. The deposition rate and hardness of the Cr film deposited by DC sputtering are higher than those of the Cr film deposited by RF sputtering, but RF sputtering offers smoother surface. The sputter-deposited Cr film is harder and has a smoother surface than the electroplated one.

APA, Harvard, Vancouver, ISO, and other styles

16

Topolovec-Miklozic, Ksenija, T. Reg Forbus, and Hugh A. Spikes. "Film thickness and roughness of ZDDP antiwear films." Tribology Letters 26, no. 2 (January 9, 2007): 161–71. http://dx.doi.org/10.1007/s11249-006-9189-2.

Full text

APA, Harvard, Vancouver, ISO, and other styles

17

Du, Yuanying, and Ming Li. "Effects on lubrication characteristics of water-lubricated rubber bearings with journal tilting and surface roughness." Proceedings of the Institution of Mechanical Engineers, Part J: Journal of Engineering Tribology 234, no. 2 (June 20, 2019): 161–71. http://dx.doi.org/10.1177/1350650119858573.

Full text

Abstract:

To study the effect of surface roughness on the lubrication characteristics of water-lubricated rubber bearings (WLRBs) when the stern shaft is tilted, the surface roughness of the bearings was measured by a surface roughness measuring instrument. Considering the tilting stern shaft and surface roughness, a mathematical model was constructed and water film thickness equation was deduced. By adopting the finite difference method, the film thickness and pressure distribution of WLRBs with tilt angle and roughness were analysed. The effects of tilt angle on film thickness and pressure under different surface roughness amplitudes and wavelengths were studied, and the results were then compared with those of smooth surface bearings without tilt angle. Finally, the minimum film thickness and maximum film pressure were analysed. The results showed that when the tilt of rotor and surface roughness of bearing were considered simultaneously, the film thickness exhibited a jagged distribution in the circumferential direction and decreased gradually in the axial direction. The film pressure had slightly irregular fluctuations and a sharp pressure peak. The tilt angle and roughness reduced the minimum film thickness, and the film thickness difference increased. The film pressure increased rapidly and local pressure exhibited slight, sudden changes. The surface roughness amplitude and wavelength had a considerable influence on the water film thickness, and the roughness amplitude had a clear effect on the film pressure. As the roughness amplitude increased, the minimum film thickness gradually declined and film pressure peak fluctuation grew. As the roughness wavelength increased, the film thickness fluctuated irregularly within a certain range of magnitude, and the minimum film thickness was almost constant.

APA, Harvard, Vancouver, ISO, and other styles

18

Lin, Jian Liang, Brajendra Mishra, Malki Pinkas, and John J. Moore. "Pulsed Closed Field Unbalanced Magnetron Sputtering (P-CFUBMS) Deposited TiC/a:C Thin Films." Materials Science Forum 561-565 (October 2007): 1177–80. http://dx.doi.org/10.4028/www.scientific.net/msf.561-565.1177.

Full text

Abstract:

TiC/a:C nanocomposite thin film has proven to be a worthy material selection as a thin film for tribological applications due to its low coefficient of friction, good wear resistance and high hardness. In the current study TiC/a:C thin films with carbon concentration near 55-62 at % were deposited via pulsed closed field unbalanced magnetron sputtering (P-CFUBMS) in pure argon atmosphere with different substrate bias voltages and onto 440C stainless steel substrate with different substrate roughness. It was found that the TiC/a:C film hardness and elastic modulus were increased from 18.5 GPa to 33.8 GPa by increasing the substrate bias from floating to -150 V. However higher substrate bias can also decrease the film tibological properties. The substrate roughness has a strong effect on TiC/a:C film wear behavior. When the Ra (Mean surface roughness values) is less than 110 nm, the COF values are in low range (0.18-0.28). Further increase the Ra value to above 300 nm will result in a higher COF (>0.33). Films deposited on higher surface roughness substrate need longer time to reach the sliding equilibrium state.

APA, Harvard, Vancouver, ISO, and other styles

19

Mitsuya, Y., and T. Hayashi. "Numerical Study of Film Thickness Averaging in Compressible Lubricating Films Incurring Stationary Surface Roughness." Journal of Tribology 112, no. 2 (April 1, 1990): 230–37. http://dx.doi.org/10.1115/1.2920246.

Full text

Abstract:

The compressibility effects of lubricating films incurring a roughness on film thickness averaging were studied numerically with a focus on the physical interpretation of the roughness effects. A numerical comparison between load-carrying capacities resulting from rough film thickness and from averaged film thickness are presented for a wide range of bearing numbers up to 107. It is found that currently indicated particular features such as the appearance of the maximum or minimum load-carrying capacity can be induced from the superimposition of local compressibility effects (LCEs) caused by individual unit roughness on compressibility effects owing to averaged film thickness. The most noticeable difference between the case of small LCEs and that of saturated LCEs is that the roughness phase results in a minimal effect with the increasing wave number for the former, while it creates a dominant effect for the latter. The results confirm that the same averaging method as that for incompressible films can be applied for small LCEs, and that Greengard’s method is applicable for nearly saturated LCEs. It should be noted that the averaged film thickness can be determined physically for small LCE regions, while it is defined mathematically for nearly saturated LCE regions.

APA, Harvard, Vancouver, ISO, and other styles

20

Faezahana, Mokhter, Nayan Nafarizal, Jia Wei Low, Che Ani Norhidayah, Mohd Zainizan Sahdan, Mohd Khairul Ahmad, Ali Yeon Md Shakaff, Zakaria Ammar, and Mohd Zain Ahmad Faizal. "2D and 3D Analyses of Metal Oxide Thin Films Examined by Atomic Force Microscope." Applied Mechanics and Materials 773-774 (July 2015): 716–19. http://dx.doi.org/10.4028/www.scientific.net/amm.773-774.716.

Full text

Abstract:

Atomic force microscope (AFM) is a useful tool to capture the two- and three-dimensional image of height and size of nanostructured thin film. It operate by measuring the forces between a sharp tip and surface of the measured sample. In addition, AFM is equipped with powerful software for image processing to interpret experimental results in detail. For example, by using the height and scanning length parameters of measured sample, average roughness and root mean square roughness can be evaluated. In the present works, the effect of image flattening process toward the surface roughness and surface fluctuations of metal oxide thin films will be presented. Set of samples were prepared by magnetron sputtering deposition and sol-gel coating techniques. In gas sensor industries using metal oxide thin film, surface roughness of metal oxide thin films are very important in order to improve the sensitivity and respond time of gas sensor. Therefore, optimization of thin film deposition and characterization are very important. The correlation between the three-dimensional image and thin film deposition and image processing parameters will also be presented.

APA, Harvard, Vancouver, ISO, and other styles

21

Kago, Keitaro, Hitoshi Endo, Hideki Matsuoka, Hitoshi Yamaoka, Nozomu Hamaya, Masahiko Tanaka, and Takeharu Mori. "Characterization of Thin Polymer Films by X-ray Reflectometry with Synchrotron Radiation." Journal of Synchrotron Radiation 5, no. 5 (September 1, 1998): 1304–8. http://dx.doi.org/10.1107/s0909049598006797.

Full text

Abstract:

X-ray reflectivity (XR) measurements with a synchrotron radiation source were carried out for thin polymer films on a glass plate. From the XR data, the film thickness and surface and interface roughnesses could be determined. In addition, the appropriate conditions and precision for measurements were also discussed. Kiessig fringes were observed clearly for specular XR measurements of poly(methylmethacrylate) thin film. Analysis of the XR data allowed the determination of the film thickness very precisely. By a curve-fitting procedure of the XR profile, the film-surface roughness and film–substrate interface roughnesses were determined. A Fourier transform of the XR data was performed as an alternative method of evaluating the film thickness. The values for the film thickness obtained by the curve-fitting procedure and Fourier-transform procedure were slightly different from each other. One possibility for the cause of this difference may be an integral error and/or cut-off effect in the Fourier-transform procedure. The XR technique with synchrotron radiation is a very powerful tool for structural characterization of thin polymer films.

APA, Harvard, Vancouver, ISO, and other styles

22

Huang, Jen Ching, Yi Chia Liao, Huail Siang Liu, and Fu Jen Cheng. "The Study on Deposition Process and Mechanical Properties of Deposited Cu Thin Films Using Molecular Dynamics." Advanced Materials Research 684 (April 2013): 37–41. http://dx.doi.org/10.4028/www.scientific.net/amr.684.37.

Full text

Abstract:

This paper studies the deposition process and mechanical properties of Cu thin films deposited on single crystal copper substrates with various surface roughnesses by molecular dynamics (MD). In the effect of vacancy concentration (Cv) of substrate, the Young's modulus of sample decreased as the Cv of substrate increased but the adhesion force will increase as the Cv of substrate increases. The effect of substrate roughness on the peak intensity of crystal orientation has little. And the greater Cv of substrate, the surface roughness of the deposited thin film also increased. In the effect of numbers of deposited atoms, the deposited thin film thickness increases, the surface will be relatively flat and the Young's modulus will also increase. By the XRD pattern, the principal growth directions of thin film are the (220) and (200) in the early stage of growth during deposition. However, with the thickness increasing, the (111) will be the preferred orientation.

APA, Harvard, Vancouver, ISO, and other styles

23

Li, Wang-Long. "Ultra-Thin Gas Squeeze Film Characteristics for Infinitely Large Squeeze Number." Journal of Tribology 120, no. 4 (October 1, 1998): 750–57. http://dx.doi.org/10.1115/1.2833775.

Full text

Abstract:

In this study, the characteristics of ultra-thin gas films are analyzed asymptotically for infinite squeeze number using the molecular gas film lubrication equation with coupled roughness and rarefaction effects taken into consideration. The governing equation of the internal region was obtained by a time averaged technique, and the boundary conditions were obtained numerically from the matching conditions near the boundaries. Two new functions, H and H−1 were proposed for deriving the matching equation near the boundary. Finally, the characteristics of squeeze film bearings with infinite width were analyzed for various roughness parameters (Peklenik number, standard deviations of the composite roughness, and roughness orientation angles), rarefaction parameter (Knudsen number), and operation conditions (excursion ratio).

APA, Harvard, Vancouver, ISO, and other styles

24

Amorsolo, Alberto V., Paul D. Funkenbusch, and Alan M. Kadin. "Atomic force microscope investigation of the thermal stability of thin TiSi2 films." Journal of Materials Research 13, no. 7 (July 1998): 1938–49. http://dx.doi.org/10.1557/jmr.1998.0273.

Full text

Abstract:

The thermal stability of TiSi2 films on Si has been studied using the atomic force microscope (AFM). Changes in the surface roughness, film morphology, and sheet resistance were monitored during a series of rapid thermal annealing treatments. A linear increase of the root-mean-square (rms) roughness with time was observed during the early stages of degradation, in agreement with a surface diffusion model of thermal grooving, followed by an apparent saturation roughness that was attributed to the effective rupture of the film.

APA, Harvard, Vancouver, ISO, and other styles

25

Müller, Robert, Lilit Ghazaryan, Paul Schenk, Sabrina Wolleb, Vivek Beladiya, Felix Otto, Norbert Kaiser, Andreas Tünnermann, Torsten Fritz, and Adriana Szeghalmi. "Growth of Atomic Layer Deposited Ruthenium and Its Optical Properties at Short Wavelengths Using Ru(EtCp)2 and Oxygen." Coatings 8, no. 11 (November 20, 2018): 413. http://dx.doi.org/10.3390/coatings8110413.

Full text

Abstract:

High-density ruthenium (Ru) thin films were deposited using Ru(EtCp)2 (bis(ethylcyclopentadienyl)ruthenium) and oxygen by thermal atomic layer deposition (ALD) and compared to magnetron sputtered (MS) Ru coatings. The ALD Ru film growth and surface roughness show a significant temperature dependence. At temperatures below 200 °C, no deposition was observed on silicon and fused silica substrates. With increasing deposition temperature, the nucleation of Ru starts and leads eventually to fully closed, polycrystalline coatings. The formation of blisters starts at temperatures above 275 °C because of poor adhesion properties, which results in a high surface roughness. The optimum deposition temperature is 250 °C in our tool and leads to rather smooth film surfaces, with roughness values of approximately 3 nm. The ALD Ru thin films have similar morphology compared with MS coatings, e.g., hexagonal polycrystalline structure and high density. Discrepancies of the optical properties can be explained by the higher roughness of ALD films compared to MS coatings. To use ALD Ru for optical applications at short wavelengths (λ = 2–50 nm), further improvement of their film quality is required.

APA, Harvard, Vancouver, ISO, and other styles

26

Yu, Ping, Guo-Bing Hu, Yun-Fei Tian, Ding-Quan Xiao, Yang Liu, and Qing-Wu Guo. "Synthesis and Photoluminescent Properties of Nanocrystalline CaMoO4 Thin Film via Chemical Solution Processing." Journal of Nanoscience and Nanotechnology 8, no. 5 (May 1, 2008): 2651–54. http://dx.doi.org/10.1166/jnn.2008.422.

Full text

Abstract:

Stoichiometric CaMoO4 thin film was successfully fabricated based on chemical solution processing. The thin films were deposited on Si(100) substrates by means of the spin-coating technique. X-ray diffraction reveals that the CaMoO4 thin film prepared are pure and well crystalline thin films. Atom Force Microscope photographs indicate that the film prepared possesses a homogeneous and dense surface morphology. The average grain size of the films was 40–50 nm, and the root-mean-square (RMS) of the surface roughness and the average surface roughness of the film measured were 2.161 nm and 1.726 nm respectively. The photoluminescent properties of calcium molybdate thin film under ultraviolet light excitation were systematically measured from 12 K to room temperature and a green emission band of the films were observed. The results of present work confirm that the chemical solution processing is a promising technology on the fabrication of CaMoO4 thin film.

APA, Harvard, Vancouver, ISO, and other styles

27

Kosykh, T. B., A. S. Prosyakov, A. P. Pyatakov, Alexander N. Shaposhnikov, Anatoly R. Prokopov, and Irene V. Sharay. "Surface Properties of Nanoscale Iron Garnet Films." Solid State Phenomena 233-234 (July 2015): 678–81. http://dx.doi.org/10.4028/www.scientific.net/ssp.233-234.678.

Full text

Abstract:

Surface properties of nanoscale iron garnet films of different compositions prepared by reactive ion beam sputtering were examined by means of scanning probe microscopy. Atomic force microscope images of the film surfaces are represented for the films of different compositions and deposition times. The article presents the dependences of the roughness parameters on the film composition and thickness and on the energy of Ar+ ions by which the substrates were pre-treated. It was shown that the roughness parameters of the films' surface increase with the increase of Ar+ ions energy and the films' thickness.

APA, Harvard, Vancouver, ISO, and other styles

28

Zhan, Chao, Wen Jian Ke, Xin Ming Li, Wan Li Du, Li Juan Wang, and Cong Ye. "The Influence of Substrate Temperature on the Morphological and Optical Properties of ZnTiO₃ Thin Films Prepared by Magnetron Sputtering." Advanced Materials Research 804 (September 2013): 3–7. http://dx.doi.org/10.4028/www.scientific.net/amr.804.3.

Full text

Abstract:

Cubic ZnTiO3thin films have been prepared by radio frequency magnetron sputtering on n-type (100) Si substrate at different temperatures. The morphological and optical properties of ZnTiO3films in relation to substrate temperatures are investigated by spectroscopic ellipsometry (SE) and AFM as well as SEM in detail. X-ray diffraction (XRD) measurement shows that all the films have a cubic phase structure and the optimum substrate temperature to form crystalline ZnTiO3thin film is 250 °C. Through SEM and AFM, the particle size in thin films and film surface roughness increase with increasing the substrate temperature. Based on a parameterized TaucLorentz dispersion model, the optical constants and surface roughness of ZnTiO3films related to the substrate temperature are systematically extracted by SE measurement. The surface roughness of the film measured from AFM agrees well with result extracted from SE, which proved that the established SE model is reasonable. With increasing substrate temperature, the refractive index decreases and the main factor in determining the refractive index was deduced to be the surface roughness related to the film packing density. The extinction coefficient of the samples is close to zero, but increases slightly with the increase of the substrate temperature, which is due to the enhancement of scattering effect in the crystalline ZnTiO3film.

APA, Harvard, Vancouver, ISO, and other styles

29

Choi, Won Seok, Young Park, Jin Hyo Boo, Junsin Yi, and Byung You Hong. "Synthesis and Characterization of Ce-Doped BZT Thin Films Deposited by a RF Magnetron Sputtering Method." Key Engineering Materials 321-323 (October 2006): 1336–39. http://dx.doi.org/10.4028/www.scientific.net/kem.321-323.1336.

Full text

Abstract:

We investigated the structural and electrical properties of the 0.5% Ce-doped Ba(ZrxTi1-x)O3 (BZT) thin films with a mole fraction of x=0.2 and a thickness of 150 nm for the MLCC (Multilayer Ceramic Capacitor) application. Ce-doped BZT films were prepared on Pt/Ti/SiO2/Si substrates by a RF magnetron sputtering system as a function of Ar/O2 ratio and substrate temperature. X-ray diffraction patterns were recorded for the samples deposited with three different substrate temperatures. The thickness and the surface roughness of the films deposited with different Ar/O2 ratios were measured. The oxygen gas, which was introduced during the film deposition, had an influence on the growth rate and the roughness of the film. The surface roughness and dielectric constant of the Ce-doped BZT film varied with Ar to O2 ratios (5:1, 2:1, and 1:1) from 1.21 nm to 2.33 nm and 84 to 149, respectively. The Ce-doped BZT film deposited at lower temperature has small leakage current and higher breakdown voltage.

APA, Harvard, Vancouver, ISO, and other styles

30

Kairaitis, Gediminas, and Arvaidas Galdikas. "Modelling of Phase Structure and Surface Morphology Evolution during Compound Thin Film Deposition." Coatings 10, no. 11 (November 9, 2020): 1077. http://dx.doi.org/10.3390/coatings10111077.

Full text

Abstract:

The dependences of the surface roughness and the phase structure of compound thin films on substrate temperature and flux of incoming particles are investigated by a proposed mathematical model. The model, which describes physically deposited thin compound film growth process is based on the Cahn–Hilliard equation and includes processes of phase separation, adsorption, and diffusion. In order to analyze large temperature range and assuming deposition of energetic particles, the diffusion is discriminated into thermal diffusion, radiation-enhanced diffusion, and ion beam mixing. The model is adapted to analyze surface roughness evolution during film growth. The influences of the substrate temperature and incoming flux particles on the surface roughness are determined by a series of numerical experiments. The modelling results showed that the surface roughness increased as the substrate temperature rose. Besides, a similar relationship was discovered between substrate temperature and size of nanoparticles formed in binary films, so the increase in the surface roughness with the substrate temperature was attributed to the increase in size of nanoparticles.

APA, Harvard, Vancouver, ISO, and other styles

31

Miksis, Michael J., and Stephen H. Davis. "Slip over rough and coated surfaces." Journal of Fluid Mechanics 273 (August 25, 1994): 125–39. http://dx.doi.org/10.1017/s0022112094001874.

Full text

Abstract:

We study the effect of surface roughness and coatings on fluid flow over a solid surface. In the limit of small-amplitude roughness and thin lubricating films we are able to derive asymptotically an effective slip boundary condition to replace the no-slip condition over the surface. When the film is absent, the result is a Navier slip condition in which the slip coefficient equals the average amplitude of the roughness. When a layer of a second fluid covers the surface and acts as a lubricating film, the slip coefficient contains a term which is proportional to the viscosity ratio of the two fluids and which depends on the dynamic interaction between the film and the fluid. Limiting cases are identified in which the film dynamics can be decoupled from the outer flow.

APA, Harvard, Vancouver, ISO, and other styles

32

Fan, Rong, Lin Jun Wang, Jian Huang, Ke Tang, Ji Jun Zhang, Wei Min Shi, and Yi Ben Xia. "ZnO Films Deposited on Various Diamond Film Substrates with Different Surface Roughness." Advanced Materials Research 287-290 (July 2011): 2347–50. http://dx.doi.org/10.4028/www.scientific.net/amr.287-290.2347.

Full text

Abstract:

ZnO thin films were deposited by radio frequency (R. F.) magnetron sputtering on various diamond film substrates with different surface roughness. The influence of surface roughness on structural properties and surface morphology of ZnO thin films was investigated by X-ray diffraction (XRD) and atom force microscopy (AFM), respectively. Only on the nanocrystalline and free-standing diamond substrates, ZnO films with preferential c-axis orientation and smooth surface were obtained.

APA, Harvard, Vancouver, ISO, and other styles

33

Zhang, Zhong Shan, Liang Tang, and Lei Ji. "Preparation of AlN Thin Film Deposited on SiO₂ for Improving Temperature Frequency Coefficient of FBAR Used in CSACs." Advanced Materials Research 1004-1005 (August 2014): 791–94. http://dx.doi.org/10.4028/www.scientific.net/amr.1004-1005.791.

Full text

Abstract:

AlN films were deposited by RF magnetron sputtering on the SiO2films with different thickness. Preferred orientation, grain size, surface roughness and grain growth of the AlN films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM) and field-emission scanning electron microscopy (FESEM). It's found that when the thickness of SiO2films are 100 nm and 200 nm, the AlN films have characteristics of good C-axis preferred orientation, good surface roughness and vertical grain growth, which are suitable for application in thin film bulk acoustic wave resonators (FBARs). When the thickness of SiO2film is 300 nm, although the AlN film has characteristics of good C-axis preferred orientation and surface roughness, the grain growth is tilted, which is not suitable for application in the FBARs.

APA, Harvard, Vancouver, ISO, and other styles

34

Boutaous, M’hamed, and Patrick Bourgin. "Macroscopic Effects of Surface Roughness in Confined Air Flow." Journal of Fluids Engineering 126, no. 2 (March 1, 2004): 216–22. http://dx.doi.org/10.1115/1.1669034.

Full text

Abstract:

The general framework deals with the winding of thin plastic films, in order to obtain good-quality rolls. This issue is tightly connected to the thickness of the residual air layer entrapped between the film layers. It is then of importance to optimize the surface topography of the films so that to improve the quality of the wound rolls. In a previous work, we proposed a simple model for the flow of an air layer squeezed between a solid smooth substrate and a plastic film sample: it was shown experimentally that the macroscopic characteristics of the flow are connected to the film roughness, but how? In order to answer this question, we assimilated the confined air flow to a flow through a periodic array of cylinders and a mathematical model based on homogenization techniques was developed. In the present paper, we search for pertinent parameters which describe the real surface roughness of plastic films. The experiments were carried out by using a 3-D roughness measurement device and the first observation is that the roughness distribution is not uniform. We made a sampling expressed by the percentage of peaks exceeding some given height threshold. The corresponding experimental parameters are used to define the network of cylinders. For each type of film, the threshold value is the only adjustable parameter and the following results are obtained: It is possible to adjust this parameter so that to obtain a very good agreement between the experimental data and the theoretical predictions. In addition, the smoother the film, the more important the highest peaks are in terms of air leakage.

APA, Harvard, Vancouver, ISO, and other styles

35

Jiang, Aihua, Jianrong Xiao, Xinyu Li, and Zhiyong Wang. "Effect of Structure, Composition, and Micromorphology on the Hydrophobic Property of F-DLC Film." Journal of Nanomaterials 2013 (2013): 1–7. http://dx.doi.org/10.1155/2013/690180.

Full text

Abstract:

Fluorinated diamond-like carbon (F-DLC) films were prepared by radio frequency plasma-enhanced chemical vapor deposition technique with CF4and CH4as source gases under different deposition conditions. The chemical bonding structure and composition of the films were detected by Raman, Fourier transform infrared absorption spectrometry (FTIR), and X-ray photoelectron spectroscopy (XPS) characterization. The micromorphology and surface roughness of the film were observed and analyzed by atomic force microscopy (AFM). The results indicated that all the prepared films presented a diamond-like carbon structure. The relative content of fluorine in the films increased, containing more CF2groups. The ratio of hybrid structure sp3/sp2decreased. The surface roughness of the films increased when the gas flow ratioR(R = CF4/[CH4 + CF4]) or the deposition power increased. The contact angle of water with the surface of the F-DLC film was measured with a static drop-contact angle/surface tension measuring instrument. The hydrophobic property of the F-DLC films was found to be dependent on the sp2structure, fluorine content, and surface roughness of the films. The contact angle increased when the relative content of fluorine in the films and sp2content increased, whereas the contact angle first increased and then decreased with the surface roughness.

APA, Harvard, Vancouver, ISO, and other styles

36

Kamat, Sandip V., Vijaya Puri, and R. K. Puri. "The Effect of Film Thickness on the Structural Properties of Vacuum Evaporated Poly(3-methylthiophene) Thin Films." ISRN Polymer Science 2012 (March 21, 2012): 1–8. http://dx.doi.org/10.5402/2012/570363.

Full text

Abstract:

This paper reports on the structural properties of poly(3-methylthiophene) P3MeT thin films prepared by vacuum evaporation on the glass substrates. The structural and surface morphology, wettability, adhesion, and intrinsic stress of these thin films were studied for three different thicknesses. The variation of the film thickness affects the structure, surface, and mechanical properties of P3MeT thin films. Vapor chopping also strongly influences the surface morphology, surface roughness, and wettability of the thin films. It was found that there is a decrease in the intrinsic stress and (RMS) roughness, while the adhesion increases with increase in film thickness.

APA, Harvard, Vancouver, ISO, and other styles

37

CATTANI, M., A. R. VAZ, R. S. WIEDERKEHR, F. S. TEIXEIRA, M. C. SALVADORI, and I. G. BROWN. "INFLUENCE OF ELECTRON SCATTERING FROM MORPHOLOGICAL GRANULARITY AND SURFACE ROUGHNESS ON THIN FILM ELECTRICAL RESISTIVITY." Surface Review and Letters 14, no. 01 (February 2007): 87–91. http://dx.doi.org/10.1142/s0218625x07009116.

Full text

Abstract:

We report electrical resistivity measurements of platinum and gold thin films over a range of film thickness d(1.3 ≤ d ≤ 11.7 nm ), together with associated measurements of the film morphological and crystallographic grain size. The resistivity results are compared to predictions of the Fuchs–Sondheimer and the Mayadas–Shatzkes models, based on the electron mean free path and crystallographic grain size, and the agreement is not satisfactory. We describe an alternative model based on elastic electron scattering with morphological granularity (grain structure as measured on the film surface) and film surface roughness, and good agreement is obtained with the experimental results. This suggests that electron scattering by morphological granularity and surface roughness plays an important role in determining the electrical resistivity of thin metal films.

APA, Harvard, Vancouver, ISO, and other styles

38

Domingues, Gláucia, Michele de Almeida Oliveira, Nayne Barros Gonzaga Ferreira, Bhetina Cunha Gomes, Elivelton Alves Ferreira, and Ladário da Silva. "Effect of fluoride on the thickness, surface roughness and corrosion resistance of titanium anodic oxide films formed in a phosphate buffer solution at different applied potentials." Research, Society and Development 9, no. 11 (December 9, 2020): e95791110689. http://dx.doi.org/10.33448/rsd-v9i11.10689.

Full text

Abstract:

The anodizing process and anions type present in the electrolyte during anodic oxidation are important parameters to improve oxide biocompatibility. From these parameters, it is possible to control the thickness and surface roughness of the oxide film. This control is of major importance, once blood clots can be avoided when the oxide film on the metal substrate has a small surface roughness (Ra ≤ 50 nm). In this paper, the thickness, surface roughness, and corrosion resistance of the anodized titanium film were studied in a phosphate buffer solution containing fluoride anions (0.6 w.t % NaF), at 20 V, 40 V, 60 V, and 80 V, using atomic force microscopy (AFM), spectroscopic ellipsometry (SE), and electrochemical impedance spectroscopy (EIS) techniques. It was observed that thickness and roughness tend to increase as the applied potential rises. For oxides grown in the solution without NaF, the growth rate is roughly 1.3 ± 0.2 nm/V. Surface roughness generally presents the same behaviour. Moreover, EIS and SE thickness measurements agree at 20 V and 60 V but disagree at 80 V. This may be associated with a possible dielectric breakdown at 80 V. The oxide film formed at 60 V showed the best corrosion resistance in relation to the other studied potentials. Globular structures were also observed using AFM on surfaces at 40 V, 60 V, and 80 V, which suggests oxide film nucleation. Oxide films formed in solution with NaF presented lower thickness, excellent corrosion resistance, and low surface roughness (Ra ≤ 50 nm).

APA, Harvard, Vancouver, ISO, and other styles

39

Sarip, Muhamad Naiman, Rozana Mohd Dahan, Yap Seong Ling, Mohamad Hafiz Mohd Wahid, Adillah Nurashikin Arshad, and Dzaraini Kamarun. "Effect of Exposure Time on Plasma Modified Polyvinylidenefluoride-Trifluoroethylene (PVDF-TrFE) Film Surfaces." Advanced Materials Research 895 (February 2014): 138–41. http://dx.doi.org/10.4028/www.scientific.net/amr.895.138.

Full text

Abstract:

This study investigates the plasma surface modified spin coated PVDF-TrFE (70/30) film of 200nm thick using Atomic Force Microscopy (AFM), Water Contact Angle (WCA) and Fourier Transform Infrared Spectroscopy (FTIR). The surface of the spin coated PVDF-TrFE film were modified using 13.56 MHz rf Argon plasma. The exposure time of the charged particle on PVDF-TrFE films were varied for 1, 3, 5, 7 and 9mins. Prior to modification, the average surface roughness observed was 3.5nm. However upon modification, the surface roughness was increased to 9.5nm. The contact angle of the surface modified film was reduced from 89° to 58°. The increase in surface roughness and wettability of the modified film provided good biocompatibility. This finding created great interest in developing functional polymer suitable for applications in areas such are biomedical, bio-analytical assays, textile and even food industry.

APA, Harvard, Vancouver, ISO, and other styles

40

Beaulieu, L. Y., A. D. Rutenberg, and J. R. Dahn. "Measuring Thickness Changes in Thin Films Due to Chemical Reaction by Monitoring the Surface Roughness with In Situ Atomic Force Microscopy." Microscopy and Microanalysis 8, no. 5 (October 2002): 422–28. http://dx.doi.org/10.1017/s1431927602010309.

Full text

Abstract:

Measuring the changing thickness of a thin film, without a reference, using an atomic force microscope (AFM) is problematic. Here, we report a method for measuring film thickness based on in situ monitoring of surface roughness of films as their thickness changes. For example, in situ AFM roughness measurements have been performed on alloy film electrodes on rigid substrates as they react with lithium electrochemically. The addition (or removal) of lithium to (or from) the alloy causes the latter to expand (or contract) reversibly in the direction perpendicular to the substrate and, in principle, the change in the overall height of these materials is directly proportional to the change in roughness. If the substrate on which the film is deposited is not perfectly smooth, a correction to the direct proportionality is needed and this is also discussed.

APA, Harvard, Vancouver, ISO, and other styles

41

Cheng, Hong Ho, and C. C. Chen. "Chemical-Assisted Mechanical Polishing of Diamond Film on Wafer." Materials Science Forum 505-507 (January 2006): 1225–30. http://dx.doi.org/10.4028/www.scientific.net/msf.505-507.1225.

Full text

Abstract:

Diamond has been well recognized a strategic engineering material. It possesses excellent physical and chemical properties including the highest hardness and thermal conductivity, and good resistance to chemical erosion. Although CVD diamond film has good potential outstanding properties, its industrial applications have been limited by the non-uniform thickness and rough surface. In the current study, the CVD diamond film is polished by the chemical-assisted mechanical method with different slurries. These slurries contain strong oxidation chemical and diamond powder. During the process, the diamond film was held against the rotational ceramic plate with transverse oscillation at 90 °Cor lower. The profilometer, atomic force microscope and scanning electron microscope were used to evaluate the surface integrity of the diamond films before and after polishing. Based on the experimental results, the slurry containing potassium persulfate (K2S2O8) produces the highest material removal rate while potassium permanganate (KMnO4) develops the best local surface roughness. The strategy of using potassium persulfate for coarse polishing followed by potassium permanganate for fine polishing yields the diamond films of the best global surface roughness. The average surface roughness of the diamond film produced by the proposed technique is below 10 nm after 5 hours.

APA, Harvard, Vancouver, ISO, and other styles

42

Kumar, Ranganathan, Matthias Gottmann, and K. R. Sridhar. "Film Thickness and Wave Velocity Measurements in a Vertical Duct." Journal of Fluids Engineering 124, no. 3 (August 19, 2002): 634–42. http://dx.doi.org/10.1115/1.1493808.

Full text

Abstract:

This paper describes the experimental investigation of an upward annular air-water flow in a duct with a 6.35 mm by 63.5 mm rectangular cross section. The test section was instrumented to measure the film thickness and the interfacial wave velocity. Flush-wire electrical conductivity probes were used to obtain local film thickness measurement with a spatial resolution of 200 μm or better and a temporal resolution greater than 2 kHz. Measurements of the base films range from 50 μm to ∼325 μm (2% to 10% of half-channel thickness). Statistical analysis shows that the standard deviation of the film thickness is a good measure of the film roughness. The relative roughness and the nondimensional film thickness are correlated as functions of the phasic Reynolds number ratio, R=Rel0.15/Reg0.3. It is found that at R=0.15, the relative roughness is a maximum. A simple model developed by matching the interfacial shear in the two fluids, predicts the wave velocity data very well.

APA, Harvard, Vancouver, ISO, and other styles

43

Olver, A. V., and D. Dini. "Roughness in lubricated rolling contact: The dry contact limit." Proceedings of the Institution of Mechanical Engineers, Part J: Journal of Engineering Tribology 221, no. 7 (July 1, 2007): 787–91. http://dx.doi.org/10.1243/13506501jet318.

Full text

Abstract:

A difficulty with the standard fast Fourier transform (FFT) perturbation model of roughness in lubricated rolling contacts is that it does not necessarily converge towards the elastic case as the film thickness is reduced; rather it leads to a situation in which all the roughness is completely flattened. This is rarely the case for real engineering surfaces. Here, it is shown that this difficulty can be avoided by carrying out a Fourier transform of the elastostatically flattened roughness and using the resulting (complex) amplitude as the low-film thickness limit of each Fourier component in the elastohydrodynamic lubrication (EHL) analysis. Results give a plausible convergence to the elastostatic solution, which is nevertheless consistent with the expected near-full-film EHL behaviour and which becomes identical to the earlier model for roughness that, statically, can be fully flattened. As expected, hydrodynamic action persists at the finest scale, even for very thin films.

APA, Harvard, Vancouver, ISO, and other styles

44

Tian, Zhong, Han Yan, Qing Peng, Lin Jay Guo, Shengjun Zhou, Can Ding, Peng Li, and Qi Luo. "Atomistic Insights into Aluminum Doping Effect on Surface Roughness of Deposited Ultra-Thin Silver Films." Nanomaterials 11, no. 1 (January 10, 2021): 158. http://dx.doi.org/10.3390/nano11010158.

Full text

Abstract:

Ultra-thin and continuous metallic silver films are attracting growing interest due to the applications in flexible transparent conducting electrodes. The surface morphology and structure of silver film are very important for its electrical resistivity and optical loss. Therefore, roughness control is essential for the production of ultra-thin metallic electrode film. We have investigated the effect of aluminum doping on the improvement of surface morphology of ultra-thin silver films using molecular dynamics simulations. Al-doped silver films showed smaller surface roughness than pure silver films at various substrate temperatures. When the temperature of the substrate was 600 K, the roughness of Al-doped silver film first decreased, and then increased with the increase of the incident velocity of silver atoms. Silver atoms were more likely to agglomerate on the surface of the substrate after adding aluminum atoms, as aluminum dopants promoted the immobilization of silver atoms on SiO2 substrate due to the anchoring effect. The smoother surface could be attributable to the reduced mean free path of silver due to the cage effect by the aluminum dopant.

APA, Harvard, Vancouver, ISO, and other styles

45

Tian, Zhong, Han Yan, Qing Peng, Lin Jay Guo, Shengjun Zhou, Can Ding, Peng Li, and Qi Luo. "Atomistic Insights into Aluminum Doping Effect on Surface Roughness of Deposited Ultra-Thin Silver Films." Nanomaterials 11, no. 1 (January 10, 2021): 158. http://dx.doi.org/10.3390/nano11010158.

Full text

Abstract:

Ultra-thin and continuous metallic silver films are attracting growing interest due to the applications in flexible transparent conducting electrodes. The surface morphology and structure of silver film are very important for its electrical resistivity and optical loss. Therefore, roughness control is essential for the production of ultra-thin metallic electrode film. We have investigated the effect of aluminum doping on the improvement of surface morphology of ultra-thin silver films using molecular dynamics simulations. Al-doped silver films showed smaller surface roughness than pure silver films at various substrate temperatures. When the temperature of the substrate was 600 K, the roughness of Al-doped silver film first decreased, and then increased with the increase of the incident velocity of silver atoms. Silver atoms were more likely to agglomerate on the surface of the substrate after adding aluminum atoms, as aluminum dopants promoted the immobilization of silver atoms on SiO2 substrate due to the anchoring effect. The smoother surface could be attributable to the reduced mean free path of silver due to the cage effect by the aluminum dopant.

APA, Harvard, Vancouver, ISO, and other styles

46

Liu, Er Bao, Xiu Fang Cui, Guo Jin, Qing Fen Li, and Tian Min Shao. "Effect of Niobium Film on Corrosion Resistance of AZ91D Magnesium Alloy." Key Engineering Materials 525-526 (November 2012): 9–12. http://dx.doi.org/10.4028/www.scientific.net/kem.525-526.9.

Full text

Abstract:

The niobium film is prepared by magnetron sputtering on the surface of the AZ91D magnesium alloy. The morphology, phase structure, roughness, nanohardness and elastic modulus of the niobium films were studied by filed emission scanning electron microscope, X-ray diffraction, atomic force microscope and nanoindentation respectively. The influences of film deposition parameters, such as substrate temperature, negative bias and power on the properties of films were investigated. The corrosion resistance of niobium films on magnesium alloy was investigated by electrochemical system. Results show that the microstructure, phase structure, roughness, nanohardness and elastic modulus of the niobium films are determined by power, negative bias and substrate temperature. And the corrosion resistance of magnesium alloy improved obviously when coated with the niobium films.

APA, Harvard, Vancouver, ISO, and other styles

47

Renner, Robert F., and KNona C. Liddell. "Roughness development in electrodeposited ultrathin cobalt and nickel layers." Journal of Materials Research 15, no. 2 (February 2000): 458–62. http://dx.doi.org/10.1557/jmr.2000.0069.

Full text

Abstract:

For both Co and Ni, a series of electrodeposited films of varying thickness (2–10 nm) was grown under otherwise identical conditions using potentiostatic control. The substrates were pieces of Si wafer onto which a Cu basal layer had been thermally evaporated. Contact mode atomic force microscopy was used to measure both the root-mean-square peak height (nm) and the areal peak density (μm−2) of each film. Root-mean-square (rms) peak heights for Co initially increase with film thickness and then plateau at a layer thickness of 3 nm. For Ni, the rms peak heights increase almost linearly for layer thicknesses less than 11 nm, reaching a value of 6 nm. Peak density shows the opposite trend, decreasing with layer thickness before reaching an approximately constant value for both metals at a film thickness of 4 nm. The atomic force microscopy data indicate that Ni and Co have different deposition mechanisms. A Co film initially nucleates rapidly; then the nucleation phase is followed by multinuclear, multilayer growth. Ni deposits also have initial rapid nucleation, but the dominant growth mode is primarily vertical, with increasing peak heights but no change in peak density. Increased peak density is linearly correlated with decreased peak height for the thinnest films in both systems.

APA, Harvard, Vancouver, ISO, and other styles

48

Miyagawa, Shingo, Tomoyuki Suzuki, Takahiro Kudo, and Masataka Satoh. "Encapsulating Annealing of N⁺ Implanted 4H-SiC by Diamond-Like-Carbon Film." Materials Science Forum 556-557 (September 2007): 583–86. http://dx.doi.org/10.4028/www.scientific.net/msf.556-557.583.

Full text

Abstract:

The encapsulating annealing of N+ implanted 4H-SiC(0001) is performed using diamondlike- carbon (DLC) films for the suppression of surface roughening. 4H-SiC(0001) sample with an off-orientation of 8o is multiply implanted by N+ with energy ranging from 15 to 120 keV at a total dose of 2.4×1015 cm-2 at room temperature. DLC films with thickness ranging from 0.3 to 1.8 μm are deposited on the surface of implanted sample using plasma-based ion implantation equipment with C2H4 gas. The DLC capped sample is annealed at 1500 oC for 5 min using IR image annealer. After annealing, DLC film is removed by the oxidization. The sample capped by DLC film with a thickness of 0.3 μm shows the root mean square (RMS) surface roughness of 0.6 nm while the annealed sample without DLC film shows RMS surface roughness of 5.2 nm. As the thickness of DLC film is increased from 0.3 to 1.8 μm, the RMS surface roughness is decreased from 0.6 to 0.2 nm.

APA, Harvard, Vancouver, ISO, and other styles

49

Zeng, Ling Jun, Shuang Juan Shen, Qian Feng, Jian Min Zhang, Zhi Gao Chen, and Zhi Gao Huang. "The Growth, Surface Topography and Curie Temperature in Ni Thin Films: Kinetic Lattice Monte Carlo Simulation." Advanced Materials Research 150-151 (October 2010): 493–98. http://dx.doi.org/10.4028/www.scientific.net/amr.150-151.493.

Full text

Abstract:

Based on the Monte Carlo (MC) simulation, the film growth and magnetic properties of Ni (100) films are investigated. The simulated results indicate that the surface roughness of the Ni films drops with the increase of the substrate temperature and the decrease of the deposition rate. The Curie temperature Tc is greatly influenced by the surface roughness and size of Ni films. Moreover, it is found that the Curie temperatures of the films are related to the mean coordination number Z and the surface roughness r. The simulated results explain the experimental facts well.

APA, Harvard, Vancouver, ISO, and other styles

50

Rogozhin, Alexander, Andrey Miakonkikh, Elizaveta Smirnova, Andrey Lomov, Sergey Simakin, and Konstantin Rudenko. "Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor." Coatings 11, no. 2 (January 21, 2021): 117. http://dx.doi.org/10.3390/coatings11020117.

Full text

Abstract:

Ruthenium thin films were deposited by plasma-enhanced atomic layer deposition (PEALD) technology using Ru(EtCp)2 and oxygen plasma on the modified surface of silicon and SiO2/Si substrates. The crystal structure, chemical composition, and morphology of films were characterized by grazing incidence XRD (GXRD), secondary ion mass spectrometry (SIMS), and atomic force microscopy (AFM) techniques, respectively. It was found that the mechanism of film growth depends crucially on the substrate temperature. The GXRD and SIMS analysis show that at substrate temperature T = 375 °C, an abrupt change in surface reaction mechanisms occurs, leading to the changing in film composition from RuO2 at low temperatures to pure Ru film at higher temperatures. It was confirmed by electrical resistivity measurements for Ru-based films. Mechanical stress in the films was also analyzed, and it was suggested that this factor increases the surface roughness of growing Ru films. The lowest surface roughness ~1.5 nm was achieved with a film thickness of 29 nm using SiO2/Si-substrate for deposition at 375 °C. The measured resistivity of Ru film is 18–19 µOhm·cm (as deposited).

APA, Harvard, Vancouver, ISO, and other styles

Journal articles on the topic 'Film roughness'

Create a spot-on reference in APA, MLA, Chicago, Harvard, and other styles