Dissertations / Theses on the topic 'FIELD EMISSION OF CNT'
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Parmee, Richard. "X-ray generation by field emission." Thesis, University of Cambridge, 2018. https://www.repository.cam.ac.uk/handle/1810/284924.
Full textChristy, Larry A. "Field Emission Properties of Carbon Nanotube Fibers and Sheets for a High Current Electron Source." University of Cincinnati / OhioLINK, 2014. http://rave.ohiolink.edu/etdc/view?acc_num=ucin1406819279.
Full textNavitski, Aliaksandr [Verfasser]. "Scanning field emission investigations of structured CNT and MNW cathodes, niobium surfaces and photocathodes / Aliaksandr Navitski." Wuppertal : Universitätsbibliothek Wuppertal, 2010. http://d-nb.info/1009494678/34.
Full textAhmed, Muhammad Shafiq. "Characterization of carbon nanotubes grown by chemical vapour deposition." Thesis, UOIT, 2009. http://hdl.handle.net/10155/26.
Full textFrench, Paul Jacob. "High-sensitivity field emission magnetometers and other applications of field emission technologies." Thesis, University College London (University of London), 2008. http://discovery.ucl.ac.uk/1443981/.
Full textHong, Ching-yin 1973. "Intelligent field emission arrays." Thesis, Massachusetts Institute of Technology, 2003. http://hdl.handle.net/1721.1/17037.
Full textIncludes bibliographical references (p. 289-301).
This electronic version was submitted by the student author. The certified thesis is available in the Institute Archives and Special Collections.
Field emission arrays (FEAs) have been studied extensively as potential electron sources for a number of vacuum microelectronic device applications. For most applications, temporal current stability and spatial current uniformity are major concerns. Using the kinetic model of electron emission, field emission can be described as two sequential processes- the flux of electrons to the tip surface followed by the transmission of the electrons through the surface barrier. Either of these processes could be the determinant of the emission current. Unstable emission current is usually due to absorption/desorption of gas molecules on the tip surface (barrier height variation) and non-uniform emission is usually due to tip radius variation (barrier width change). These problems could be solved if the emission current is determined by the electron supply to the surface instead of the electron transmission through the surface barrier. In this thesis, we used the inversion layer of a MOSFET to control the electron supply. It results in additional benefits of low turn-on voltage and low voltage swing to turn the device on and off. A novel CMP-based process for fabricating integrated LD-MOSFET/FEA is presented. We obtained FEA devices with an extraction gate aperture of 1.3 [mu]m and emitter height of 1 [mu]m. We present a comprehensive study of field emitter arrays with or without MOSFET. The silicon field emitter shows turn-on voltage of [approximately]24 V with field enhancement factor (b[sub]FN) of [approximately]370. We demonstrated that the LD-MOSFET provides excellent control of emission current. The threshold voltage of the LD-MOSFET is [approximately]0.5V. The integrated device can be switched ON and OFF using a MOSFET gate voltage swing of 0.5V. This results in an ON/OFF current ratio of 1000:1. The current fluctuation is significantly reduced when the MOSFET is integrated with the FEA device and the device is operated in the MOSFET control regime. The emission current of the integrated LD-MOSFET/FEA remains stable regardless the gas and vacuum condition. The saturation current level of the integrated devices in the MOSFET controlled region is also the same regardless the emitter array size or the FEA's position on the wafer. We also present a comprehensive study of three-dimensional oxidation in silicon emitter tip
(cont.) formation. Stress plays an important role in the oxidation mechanism. A new sharp emitter tip formation mechanism is proposed: rather than a continuous oxidation process, an emitter neck breaking stage occurs before the sharp emitter tip is formed. Stress from volume difference of silicon and silicon dioxide is the main cause for the emitter neck breaking. Initial formation of microcracks around the neck occurs at high temperature due to volume difference stress, oxide grows into the cracks right after crack formation, and a sharp emitter tip is then formed by further oxidation.
by Ching-yin Hong.
Ph.D.
Ding, Meng 1972. "Field emission from silicon." Thesis, Massachusetts Institute of Technology, 2001. http://hdl.handle.net/1721.1/8645.
Full textIncludes bibliographical references (p. 259-275).
A field emitter serves as a cold source of electrons. It has practical applications in various fields such as field emission flat panel displays, multiple electron-beam lithography, ion propulsion/micro-thrusters, radio frequency source, information storage technology, and electronic cooling. Silicon is an attractive material for building electron field emitters. To understand the physics of electron field emission from silicon and to push technologies of making quality field emitter arrays present both opportunities and challenges. This work focuses on an experimental study of electron field emission phenomena from silicon field emitter arrays. We demonstrate electron field emission from both the conduction band and the valence band of silicon simultaneously. A two-band field emission model is presented to explain the experimental data. Theoretical predictions for valence band emission were made in the past; however there was no direct observation until now. Experimental evidence of current saturation in field emission existed in the literature. We also report the observation of current saturation in n-type silicon field emitter arrays. A simple model is presented to account for the results. We report successfully fabricating 1/,m gate-aperture silicon field emitter arrays with a turn-on voltage as low as 14 V. The gate leakage current is observed to be less than 0.01% of the total emission current. Devices show excellent emission uniformity for different sized arrays. The low turn-on voltage is attributed to the small emitter tip radius. It was achieved by isotropic etching of silicon and low temperature oxidation sharpening of the emitter tips.
(cont.) Field emitters with a tip radius of about 10nm can be routinely obtained. Optimization of the oxidation sharpening process further reduced the tip radius to be around lnm. The results were confirmed by Transmission Electron Microscopy (TEM). Device characterization showed agreement with Fowler-Nordheim theory. Analytical and numerical models were introduced to account for the experimental results. We also demonstrate the successful fabrication of the high aspect ratio silicon tip field emitter arrays. Silicon emitters as high as 5-6[mu]m with an aspect ratio larger than 10:1 was achieved in our facilities. Furthermore we have also successfully fabricated and tested the fully gated high aspect ratio field emitter arrays. The experimental current-voltage data agree well with the Fowler-Nordheim theory. A Maxwell Stress Microscope, which is capable of imaging sample topography and the surface potential simultaneously is set up and tested for the purpose of further study of the properties of the surfaces of the silicon field emitters.
by Meng Ding.
Ph.D.
Poa, Chun Hwa Patrick. "Electron field emission from carbons and their emission mechanism." Thesis, University of Surrey, 2002. http://epubs.surrey.ac.uk/842670/.
Full textLaou, Philips. "Field emission devices on silicon." Thesis, National Library of Canada = Bibliothèque nationale du Canada, 1998. http://www.collectionscanada.ca/obj/s4/f2/dsk1/tape11/PQDD_0001/NQ44486.pdf.
Full textBoswell, Emily. "Field emission from porous silicon." Thesis, University of Oxford, 1997. http://ora.ox.ac.uk/objects/uuid:a4344196-7fc2-4713-b47b-85920b137759.
Full textChen, Liang-Yu 1979. "Double-gated field emission arrays." Thesis, Massachusetts Institute of Technology, 2004. http://hdl.handle.net/1721.1/30099.
Full textIncludes bibliographical references (p. 108-114).
There is a need for massively parallel, individually addressed and focused electron sources for applications such as flat panel displays, mass storage and multi-beam electron beam lithography. This project fabricates and characterizes double-gated field emission devices with high aspect ratio. One of the gates extracts the electrons while the second gate focuses the electrons into small spots. High aspect ratio silicon field emitters were defined by reactive ion etching of silicon followed by multiple depositions of polycrystalline oxide insulators and silicon gates. The layers were defined by a combination of lithography, chemical mechanical polishing and micromachining. We obtained devices with gate and focus apertures of 0.4[mu]m and 1.2[mu]m diameter. The anode current has very little dependence on the focus voltage and the ratio of the focus field factor to the gate field factor βF / βG is 0.015. Scanning electron micrographs of the devices, numerical simulation and spot size measurements on a phosphor screen confirmed these results. An e-beam resist, PMMA, was successfully exposed using the FEA device as an electron source.
by Liang-Yu Chen.
S.M.
Kymissis, Ioannis 1977. "Field emission from organic materials." Thesis, Massachusetts Institute of Technology, 2003. http://hdl.handle.net/1721.1/16947.
Full textIncludes bibliographical references (p. 207-218).
This electronic version was submitted by the student author. The certified thesis is available in the Institute Archives and Special Collections.
Field emission displays (FEDs) show great promise as high performance flat panel displays. The light emission process is efficient, long lifetimes are possible with high brightness, and bright passive matrix displays can be built. Because passive matrix displays don't need a transistor backplane, it was once thought that these displays would be cheaper to fabricate than their competitors. It is now clear that this is not the case. Fabricating a transistor backplane has turned out to be less expensive than micromachining an array of uniform field emitter tips with aligned gates. Competing technologies which use an active backplane (such as active matrix liquid crystal panels) have become ubiquitous, and FED technologies developed to date have been too expensive for the consumer market. This thesis presents a new strategy for creating a low-cost field emission display. This strategy begins by creating a field emitter out of organic conductors-a class of materials mostly neglected to date for this application. The organic emitter is made by copying a non-lithographic template. The process takes 5 minutes, occurs at room temperature and at atmospheric pressure, and does not damage the template. We show that organic conductors are easy to pattern into regular patterns and can form structures which exhibit field emission, with field enhancement factors of about 100-600 times. The field emission follows a Fowler-Nordheim characteristic. Also explored are some of the properties of organic conductors in vacuum such as conductivity over time, the interaction of the organic field emitter with background gases, and the conduction mechanism. In particular, we show that oxygen degrades the emission properties of organic field emission tips, and that organic materials retain sufficient conductivity in vacuum to serve as field emitters.
(cont.) The second prong of the strategy is to combine the field emitter with an inexpensive transistor. A thin-film transistor made using an organic semiconductor is used to control the emission from the field emitter. We demonstrate a circuit architecture which allows the transistor to control the field emitter without creating a micromachined gate. This architecture uses only one high voltage supply for the panel to extract and accelerate electrons toward the phosphor screen. We show that the field emitter current can be controlled over a range of about 1000:1 using only 30V. This is verified through measurements of spot brightness on a phosphor screen. We then show that using the transistor has additional advantages. The current noise is reduced by a factor of 20, and DC current degradation is eliminated for oxygen partial pressures up to 1 x 10-6 torr. A new linearized analysis is presented which explains the DC current control and noise reduction, and also estimates the work function fluctuation on the emitter tip. The experimental results are examined in the context of this analytical framework. The work in this thesis shows (1) that a field emitter can be made from an organic conductor using a simple process (2) a field emission display can be controlled without making an array of micromachined gates and (3) using a transistor has a number of advantages in addition to controlling the field emitter ...
by Ioannis Kymissis.
Ph.D.
Satyanarayana, Bukinakere Subbakrishniah. "Field emission from tetrahedral amorphous carbon." Thesis, University of Cambridge, 2000. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.621638.
Full textPopov, M. Yu, A. P. Volkov, S. G. Buga, V. S. Bormashov, K. V. Kondrashov, R. L. Lomakin, N. V. Lyparev, V. V. Medvedev, S. A. Tarelkin, and S. A. Perfilov. "Nanostructured metal-fullerene field emission cathode." Thesis, Sumy State University, 2011. http://essuir.sumdu.edu.ua/handle/123456789/20585.
Full textCollins, Clare Melissa. "Ordered nanomaterials for electron field emission." Thesis, University of Cambridge, 2017. https://www.repository.cam.ac.uk/handle/1810/270357.
Full textZhao, Xin. "Field emission study of carbon nanostructures." W&M ScholarWorks, 2006. https://scholarworks.wm.edu/etd/1539623508.
Full textZhang, Weiwei. "Hybrid Integration of Er-doped Materials and CNTs on Silicon for Light Emission and Amplification." Thesis, Université Paris-Saclay (ComUE), 2017. http://www.theses.fr/2017SACLS001/document.
Full textThis thesis is a contribution to the hybrid integration of active materials including Erbium-doped and carbon nanotubes rich layers on silicon for on-chip light emission.In a first step, we designed, fabricated, and characterized within the silicon-on-insulator and silicon nitride platforms a range of photonic structures including strip/slot waveguides, micro disks, strip/slot ring resonators, and micro cavities aiming at preparing a set of passive device building blocks needed for hybrid integration on Si. Silicon slot waveguides and slot ring add-drop resonators filled with index liquids with linear propagation losses 2-7 dB/cm and Q-factors up to 30,000, have been demonstrated around wavelength=1.55µm. Propagation loss of silicon nitride slot waveguides were minimized down to ~4dB/cm for compact spiral structures (2cm long, within ~500µm×500µm area). Air-band mode Nano beam cavities were also investigated, leading to Nano cavities with mode volumes V ~0.03(wavelength/n)^3 and Q-factors ~70,000 when filled with soft materials.In a second step, hybrid integration of Erbium doped materials and semiconducting single-wall carbon nanotubes (SWCNTs) was investigated for light emission under optical pumping.Integration of Erbium-doped materials was studied within the framework of two collaborations: Prof. Daming Zhang’s team, in State Key Laboratory on Integrated Optoelectronics, Jilin University, China, and Prof. Zhipei Sun, in Department of Micro- and Nanosciences, Aalto University, Finland. Erbium doped layers coming from Jilin were composed of Er3+ and Yb3+ co-doped core {shell} nanoparticles which were copolymerized with methyl methacrylate (MMA) to synthesize nanocomposite (PMMA-NPs: Er3+/Yb3+). We conducted the experimental characterization that led to the demonstration of an internal net gain up to 10-17dB/cm at wavelength=1.53µm in Erbium doped polymer rib waveguides fabricated in Jilin. The second Erbium doped material available during this thesis was based on Er2O3/Al2O3 atomic layers, grown in Aalto University. This collaboration was devoted to integrate high Erbium ion concentration (10E21/cm3) in oxide cladding layers on top of silicon nitride slot waveguides, which were fabricated in our group for the demonstration of on-chip optical net gain. The carried out experiments have conducted to the demonstration of 1.5-22.8dB/cm gain for sub millimeter length waveguides.In another direction, hybrid integration of SWCNTs emitting at wavelengths around 1.3 µm on ring resonators and Nano beam cavities has been investigated. First, we studied the coupling of SWCNTs photoluminescence (PL) in silicon micro-ring resonators and compared it with the PL intensity coupled into the bus waveguide . It has been shown that the pump beam polarization controls the light coupling into the straight bus waveguide. We demonstrated an enhancement of the PL intensity of 20dB at resonance. We also explored CNT hybrid integration with ultra-small mode volume Nano beam optical cavities, and hence with larger Purcell-like Q/V factors in comparison with the one obtained in micro-ring resonators. The results revealed that the PL resonance enhancement due to Nano beam cavity field confinement exhibited a nonlinear growth as a function of the pump power. It was also shown that the resonance of the PL peak intensity grows faster with the pump power than the PL background, which is accompanied by a line width narrowing of the resonance PL peak. This result is the first step to achieve an integrated laser based on carbon nanotubes
Srinivasan, Srikant. "A Compact Model for the Coaxially Gated Schottky Barrier Carbon Nanotube Field Effect Transistor." University of Cincinnati / OhioLINK, 2006. http://rave.ohiolink.edu/etdc/view?acc_num=ucin1161897189.
Full textLysenkov, Dmitry. "Optimization of nanostructures for field emission cathodes." [S.l.] : [s.n.], 2006. http://deposit.ddb.de/cgi-bin/dokserv?idn=979952913.
Full textHerz, Paul Richard 1972. "Vertically integrated transistors for field emission applications." Thesis, Massachusetts Institute of Technology, 2000. http://hdl.handle.net/1721.1/9069.
Full textIncludes bibliographical references (p. 101-105).
Field emission devices have demonstrated several research and commercial applications in the areas of flat panel displays, microwave power devices, imaging sensors and electron sources. Recent work has shown the feasibility of using integrated MOSFETs to control and enhance field emission stability and operating characteristics. This research effort investigates the integration of vertical MOS transistors with field emitter arrays as a means to enhance field emission device capabilities and range of applications. Vertical MOSFET device modeling was performed using MEDICI, a commercially available electrostatic simulator. In addition, process modeling was conducted using SUPREM to optimize design and layout sequencing for device fabrication. Working devices were fabricated and tested in the Integrated Circuits Laboratory within the Microsystems and Technology Laboratory at MIT. Techniques to achieve high-density field emitter arrays necessary for integrated VMOS / FEA devices were also investigated. This study determined that it is feasible to integrate and control field emitter arrays with vertical MOSFET devices.
by Paul Richard Herz.
S.M.
Wang, Pei-Ning. "Device modelling of a field emission displays." Thesis, Massachusetts Institute of Technology, 1996. http://hdl.handle.net/1721.1/40204.
Full textTsai, Tsung Hui. "Tetrahedral amorphous carbon based field emission display." Thesis, University of Cambridge, 2002. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.620674.
Full textTsang, Wei Mong. "Electron field emission properties from nanoengineered structures." Thesis, University of Surrey, 2006. http://epubs.surrey.ac.uk/844374/.
Full textMarinov, Toma M. "Field Emission and Scattering From Conducting Nanofibers." University of Akron / OhioLINK, 2008. http://rave.ohiolink.edu/etdc/view?acc_num=akron1217614626.
Full textTheodore, Nimel D. "Silicon oxynitride: A field emission suppression coating." W&M ScholarWorks, 2006. https://scholarworks.wm.edu/etd/1539623498.
Full textReynolds, Adam Fisher. "Radiation modelling of vacuum field emission devices." Thesis, Massachusetts Institute of Technology, 2019. https://hdl.handle.net/1721.1/123359.
Full textThesis: S.M., Massachusetts Institute of Technology, Department of Nuclear Science and Engineering, 2019
Cataloged from student-submitted PDF version of thesis.
Includes bibliographical references (pages 76-78).
Recent advances in micro and nanofabrication techniques have enabled modern vacuum field emission devices (VacFEDs) and have been demonstrated in the laboratory for use as diodes and transistors. Modern VacFEDs operate through cold emission of electrons across a vacuum gap. It has been proposed that these devices are "radiation insensitive" since they do not have a solid state junction as in other modern electronic devices. Radiation testing has been conducted to characterize the radiation response for these devices however, minimal supporting modeling has been performed. This thesis attempts to model and quantify the radiation effects of modern VacFEDs.
It focuses primarily on two effects associated with ionizing radiation exposure to a VacFED diode materials and structure: 1) The production of a net electron Direct Drive (DD) current in conductive layers due to imbalance in ionization rates in device layers and 2) Radiation Induced Conductivity (RIC) due to creation and drift of electron-hole pairs across an electric field of a dielectric insulating layer. These currents are treated as a noise sources that compete with the output signal of the device. Two radiation transport codes are used quantify interaction, electron charge and energy deposition of consequence to direct drive and RIC effects: 1) CEPXS/ONEDANT: a 1-dimensional electron-photon discrete ordinates code package and 2) MCNP6: a general-purpose, continuous-energy, generalized-geometry, time dependent, Monte Carlo radiation-transport code. RIC response was found to have the greatest current for all device models considered over all energies.
This thesis found a dose rate of 6 x 106 rad(Si)/s at the surface of a VacFED diode is required to cause a 0.1 [mu] A noise current in a device designed to operate at 1.0 [mu]A. This finding suggests that VacFED technology has the capability to operate continuously in a modern pressurized water nuclear reactor core gamma ray environment, which has an approximate dose rate of 3 x 105 rad(Si)/s.
by Adam Fisher Reynolds.
S.M.
S.M. Massachusetts Institute of Technology, Department of Nuclear Science and Engineering
Cooper, Joseph Andrew. "Investigation of the effects of process variables on the properties of europium-doped yttrium oxide phosphor." Thesis, Georgia Institute of Technology, 1997. http://hdl.handle.net/1853/20503.
Full textWang, Tong. "Enhanced Field Emission Studies on Nioboim Surfaces Relevant to High Field Superconducting Radio-Frequency Devices." Diss., Virginia Tech, 2002. http://hdl.handle.net/10919/29284.
Full textPh. D.
Sosa, Edward Delarosa. "The Electron Emission Characteristics of Aluminum, Molybdenum and Carbon Nanotubes Studied by Field Emission and Photoemission." Thesis, University of North Texas, 2002. https://digital.library.unt.edu/ark:/67531/metadc3311/.
Full textTang, Yew Fei. "Electron field emission from laser crystallised amorphous silicon." Thesis, University of Surrey, 2003. http://epubs.surrey.ac.uk/843179/.
Full textSmith, Richard Charles. "Electron field emission properties of tip based emitters." Thesis, University of Surrey, 2005. http://epubs.surrey.ac.uk/843091/.
Full textWang, Peng Zhou Otto. "Fabrication and field emission properties of carbon nanotubes." Chapel Hill, N.C. : University of North Carolina at Chapel Hill, 2007. http://dc.lib.unc.edu/u?/etd,748.
Full textTitle from electronic title page (viewed Dec. 18, 2007). "... in partial fulfillment of the requirements for the degree of Doctor of Philosophy in the Department of Physics and Astronomy." Discipline: Physics and Astronomy; Department/School: Physics and Astronomy.
Fèbre, Alexander Jonathan le. "Field emission sensing for non-contact probe recording." Enschede : University of Twente [Host], 2008. http://doc.utwente.nl/58871.
Full textForrest, Roy Duncan. "Electron field emission from amorphous semiconductor thin films." Thesis, University of Surrey, 2000. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.484237.
Full textJames, E. M. "Development and characterisation of advanced field emission tips." Thesis, University of Cambridge, 1997. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.605024.
Full textGuerrera, Stephen A. (Stephen Angelo). "Feature scaling of large, ballasted, field emission arrays." Thesis, Massachusetts Institute of Technology, 2011. http://hdl.handle.net/1721.1/65970.
Full textThis electronic version was submitted by the student author. The certified thesis is available in the Institute Archives and Special Collections.
Cataloged from student submitted PDF version of thesis.
Includes bibliographical references (p. 143-147).
Field emitters are an exciting technology for high-frequency, high-power applications because of their excellent free space electron transport, and their potential for high current density and high current, especially when they are used in an array format. However, a major challenge preventing the widespread use of this technology are the spatial and temporal variations that arise from non-uniformity in emitter tip radius and work function, respectively. To address the problems, various methods of controlling the supply of electrons to the emitter have been developed. One method of current limiting is the vertical ungated field effect transistor (FET), which uses the channel pinch-o and velocity saturation of carriers in silicon combined with a high aspect ratio to provide an effective method of controlling current. To reduce the operating voltage, and likewise the energy spread of the emitted electrons, we created vertical ungated FET current limiters that were 100 nm in diameter, 8 m tall, and had a pitch of 1 m that were patterned using optical lithography. These devices demonstrated excellent current saturation, with output conductances lower than 10??11 S. In addition, a fabrication process for building nano-sharp emitters on these high aspect ratio pillars was developed. Using this process tip radii of less than 6 nm were obtained on top of the pillars. Process and device simulations were performed that indicate it will be possible to integrate extraction gates with small apertures into this structure, allowing for stable, uniform emission at gate voltages under 20 V in future work.
by Stephen A. Guerrera.
S.M.
Ducati, Caterina. "Nanostructured carbon for field emission and electrochemical applications." Thesis, University of Cambridge, 2003. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.619837.
Full textTeo, Kenneth B. K. "Aligned carbon nanotube technology for field emission applications." Thesis, University of Cambridge, 2002. https://www.repository.cam.ac.uk/handle/1810/272139.
Full textPtitsin, V. E. "New Thermal Field Electron Emission Energy Conversion Method." Thesis, Sumy State University, 2012. http://essuir.sumdu.edu.ua/handle/123456789/35247.
Full textHou, Kun. "Synthesis and field emission properties of carbon nanostructures." W&M ScholarWorks, 2008. https://scholarworks.wm.edu/etd/1539623523.
Full textSieger, Todd C. "A field emission transistor array for writing applications /." Online version of thesis, 1992. http://hdl.handle.net/1850/11062.
Full textLu, Duan Shao, and 盧端劭. "The effects of CNT graphitization on the field emission characterictics." Thesis, 2004. http://ndltd.ncl.edu.tw/handle/76027330436978370735.
Full text國立中興大學
電機工程學系
92
In this research, the carbon nano tubes (CNTs) are grown by controlling methane flow, plasma power and nitrogen flow. The Raman spectrum is measured to analyze the relative concentration of diamond structure (D-band) and graphite structure (G-band). The growth rate of CNTs increases as the methane flow rate increase, however, the properties of CNT is not as good as that grown by lower flow rate. The tubes are twisty, some carbon black spots are observed in CNTs. The growth rate of CNTs becomes slow when nitrogen is mixed to dilute the reactant, but on the other side the quality of CNTs becomes better and the tubes are more straightly. The field emission data shoes that the current emitted has certain correlation with the D-band over G-band intensity ratio. The smaller the ratio means the higher the graphite structure concentration in the CNTs, and the better of the emission property. This observation is consistent with morphologic observations mention above. Key words: Carbon nano tubes, field emission, graphite structure, diamond structure
Li, Shao-Hua, and 李紹華. "Dependence of field emission properties of CNT arrays on the underly metals." Thesis, 2007. http://ndltd.ncl.edu.tw/handle/07583369826967682063.
Full textSHARMA, ANAND. "FIELD EMISSION OF ELECTRONS FROM HEMISPHERICAL CONDUCTING CARBON NANOTUBE TIP INCLUDING THE EFFECT OF IMAGE FORCE." Thesis, 2016. http://dspace.dtu.ac.in:8080/jspui/handle/repository/14632.
Full textChen, Pin-Hong, and 陳品宏. "Characteristics and Enhanced Field Emission Properties of N-doped TiO2/CNT Bundle Arrays." Thesis, 2012. http://ndltd.ncl.edu.tw/handle/69695992978846458924.
Full text國立臺灣科技大學
電子工程系
100
Anatase titanium dioxide (A-TiO2) were grown on top of carbon nanotube (CNT) bundle arrays by metal organic chemical vapor deposition (MOCVD) using titanium-tetraisopropoxide (TTIP, Ti[OCH(CH3)2]4) as the source reagents. The N-doped A-TiO2/CNTs nanocomposite was then fabricated with nitrogen plasma treatment. The surface morphology, structural and spectroscopic properties of the A-TiO2/CNTs and N-doped A-TiO2/CNTs nanocomposites were characterized using Field-emission scanning electron microscopy (FESEM), Raman spectroscopy, Transmission electron microscopy (TEM), and X-ray photoelectron spectroscopy (XPS). The FESEM image showed a dense coalescence of A-TiO2 with uniform size distribution on the nanotube walls. Raman spectra revealed that nanostructural A-TiO2 had been deposited on the CNT nanocrystals and a new vibration mode of D^'-band at higher wavenumber side was also found. The XPS spectra in the region of N 1s, Ti 2p and O 1s provided a conclusive evidence of the formation of O-Ti-N bond during nitrogen treatment process. The TEM image of A-TiO2 deposited CNT showed uniform distribution, and random directions of A-TiO2 had been grown on the surface of the CNT. The current density versus electric field measurements yielded turn-on field of 1.8 V/?慆 and 1.0 V/?慆 at a current density of 10 ?嫀/cm2, threshold field of 3.6 V/?慆 and 1.9 V/?慆 at a current density of 1 mA/cm2, and field enhancement factor of 2700 and 3000 for the A-TiO2/CNTs and N-doped A-TiO2/CNTs nanocomposites, respectively. Long term stability studies were also carried out. The results indicated that nitrogen doping decreased the turn-on field and threshold field of A-TiO2/CNTs, providing stable field emission applications. The probable mechanisms of field emission enhancement for N-doped A-TiO2/CNTs composite were proposed and discussed.
TsaiMing-che and 蔡銘哲. "Effect of alloy catalyst on the growing characters of CNT and its field emission properties." Thesis, 2007. http://ndltd.ncl.edu.tw/handle/47472912365598774275.
Full text崑山科技大學
電子工程研究所
95
The iron, cobalt and nickel are three kinds of element most used as catalyst to grow CNT. However the research report pointed out that, the alloy catalyst which contains two different kinds of element has special effect on controlling CNT growth and caliber. The present research mainly uses RF Magnetron sputtering system to prepare the metal catalysts. The metal catalyst used in this study is nickel metal doped with different percent of iron metal and annealed to become a Ni-Fe alloy catalyst. By changing the composition of alloy catalyst, the growth of CNT and the character of field emission were studied. The alloy catalysts were etched by the microwave plasma enhanced chemical vapor deposition system in hydrogen atmosphere to produce nano scale catalysts. Then the mixture of methane and hydrogen were fed into the system to grow CNT at 500℃. The as-grown CNT samples were characterized by FE-SEM、TEM and Raman Spectroscopy. Its field emission properties were characterized by the I-V Measurement. The result shows that using Ni-Fe alloy catalyst will produce branched shape CNT. These CNT observed by the TEM showing a hollow bamboo structure with multi-walled CNT. Increasing the Fe amount in catalyst, the behavior of field emission is better. When Fe content in alloy catalyst is 39.4wt%, the lowest initial voltage of emission is 6.8V/μm and the highest current density is 314μA/cm2.
Hsu, Jen-Hao, and 許仁豪. "Effect of underlying metals and emitter patterns on the field emission properties of CNT diode devices." Thesis, 2006. http://ndltd.ncl.edu.tw/handle/92739368315904563539.
Full text國立嘉義大學
光電暨固態電子研究所
94
The present paper mainly was used the microwave plasma enhanced-chemical vapor deposition(MP-CVD) growing carbon nanotube (CNTs) by (Ni) the array (10μm x 10μm) and different spaces (20μm、15μm、10μm、5μm) with four different metals (TiN,Ti,Ta) to be the barrier layer。 The advantage used MP-CVD in the catalyzed metal (Ni) the array to grow the high density and vertically aligned CNTs。Then changed diverse parameters to grow CNTs and compared field emission characteristic by penetration vacuum electric properties measurement system measured field emission properties,the scanning electron microscope (SEM) to visit the appearance of carbon nanotube。And the Raman spectrum to obtain D-band and G-band, two area compare by a type, if the degree more greatly graphitization is better。 By the experiment we can suppose that higher temperature or higher microwave power cause better degree of graphitization。Degree of graphitization:TiN >Ta>Ti,Diameter of CNTs:TiN>Ta>Ti。Field emission properties: Ti >Ta>TiN。
"Development of carbon nanotubes with a diamond interlayer for field electron emission and heat transfer applications." Thesis, 2015. http://hdl.handle.net/10388/ETD-2015-10-2301.
Full textMancevski, Vladimir. "Fabrication and analysis of carbon nanotube based emitters." Thesis, 2011. http://hdl.handle.net/2152/ETD-UT-2011-08-3990.
Full texttext
Huang, Hsin-Kuo, and 黃信國. "The Influence of Sodium Metasilicate/TEOS Inorganic Binders and Silver Fillers on the CNT Film Field Emission Characteristics." Thesis, 2007. http://ndltd.ncl.edu.tw/handle/28358147820347999648.
Full text逢甲大學
紡織工程所
95
This study discussed field emission characteristics, film surface resistance and film surface morphology of CNT film contained sodium metasilicate and TEOS inorganic binder. The experimental results showed that the CNT paste containing sodium metasilicate(50 wt%) and TEOS inorganic binder both had good dispersion with CNT. SEM images showed that the CNT film containing sodium metasilicate(50 wt%) and TEOS inorganic binder had very smooth film surface . The CNT film containing sodium metasilicate(50 wt%) had better field emission characteristic than that of containing TEOS, and the turn-on electric field was 6.4 V/μm. In order to decrease CNT film surface resistance, nano Ag powder, nano Ag solution and silver epoxy were filled in the CNT paste containing sodium metasilicate(50 wt%). The surface resistance of CNT fim were decreased when nano Ag powder, nano Ag solution and silver epoxy were added and as a result of descending the turn-on electric field. The CNT film containing nano Ag powder had best field emission characteristics, the turn-on electric field was 3.7 V/μm and the film surface resistance was 550 (Ω•cm). The better dispersion of the CNT film was achieved when the nano Ag powder and nano Ag solution were added comparing with that of silver epoxy. Consequently, the optimal condition for a low turn-on electric field and high surface film conductivity were nano Ag powder and nano Ag solution instead of silver epoxy.