Books on the topic 'Electron rays'

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1

Optical systems for soft X rays. New York: Plenum Press, 1986.

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2

Dyson, D. J. X-ray and electron diffraction studies in materials science. London: Maney for the Institute of Materials, Minerals, and Mining, 2004.

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3

United States. National Aeronautics and Space Administration., ed. GRO: Red-shifted electron-positron annihilation gamma-rays from radiopulsars. [Washington, DC]: National Aeronautics and Space Administration, 1993.

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4

United States. National Aeronautics and Space Administration., ed. GRO: Red-shifted electron-positron annihilation gamma-rays from radiopulsars. [Washington, DC]: National Aeronautics and Space Administration, 1993.

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5

United States. National Aeronautics and Space Administration., ed. GRO: Red-shifted electron-positron annihilation gamma-rays from radiopulsars. [Washington, DC]: National Aeronautics and Space Administration, 1993.

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6

Garratt-Reed, A. J. Energy-dispersive X-ray analysis in the electron microscope. Oxford: BIOS, 2003.

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7

Electron dynamics by inelastic X-ray scattering. Oxford: Oxford University Press, 2007.

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8

1938-, Wiedemann Helmut, and North Atlantic Treaty Organization. Scientific Affairs Division., eds. Electron-photon interaction in dense media. Dordrecht: Kluwer Academic, 2002.

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9

Flash of the cathode rays: A history of J.J. Thomson's electron. Bristol: Institute of Physics Pub., 1997.

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10

K, Freund Andreas, Freund H. P, Howells Malcolm R, and Society of Photo-optical Instrumentation Engineers., eds. Coherent electron-beam x-ray sources : techniques and applications: 31 July-1 August 1997, San Diego, California. Bellingham, Washington: SPIE, 1997.

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11

Lone, M. A. Self-powered detector probes for electron and gamma-ray beam monitoring in high-power industrial accelerators. Chalk River, Ont: Chalk River Laboratories, 1992.

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12

A search for muon neutrino to electron neutrino oscillations in the MINOS experiment. New York: Springer, 2011.

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13

E, Seeger David, and Society of Photo-optical Instrumentation Engineers., eds. Emerging lithographic technologies: 10-11 March 1997, Santa Clara, California. Bellingham, Wash: SPIE, 1997.

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14

1934-, Rentzepis Peter M., ed. Time-resolved electron and X-Ray diffraction: 13-14 July 1995, San Diego, California. Bellingham, WA: SPIE, 1996.

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15

Coppens, Philip. X-ray charge densities and chemical bonding. [Chester, England]: International Union of Crystallography, 1997.

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16

Scott, Mackay R., Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International., and International SEMATECH, eds. Emerging lithographic technologies VIII: 24-26 February, 2004, Santa Clara, California, USA. Bellingham, Wash., USA: SPIE, 2004.

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17

Symposium B on Epitaxial Thin Film Growth and Nanostructures (1997 Strasbourg, France). Recent developments in thin film research: Epitaxial growth and nanostructures, electron microscopy, and x-ray diffraction : proceedings of Symposium B on Epitaxial Thin Film Growth and Nanostructures and proceedings of Symposium C on Recent Developments in Electron Microscopy and X-Ray Diffraction of Thin Film Structures of the 1997 ICAM/E-MRS Spring Conference, Strasbourg, France, June 16-20, 1997. Edited by Ritter G and Symposium C on Recent Developments in Electron Microscopy and X-Ray Diffraction of Thin Film Structures (1997 : Strasbourg, France). Amsterdam: Elsevier, 1997.

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18

Rochow, Theodore George. An Introduction to Microscopy by Means of Light, Electrons, X-Rays, or Ultrasound. Boston, MA: Springer US, 1995.

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19

A history of the electron: J.J. and G.P. Thomson. Cambridge: Cambridge University Press, 2012.

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20

Great Britain. Health and Safety Executive., ed. Safety in the design and use of gamma and electron irradiation facilities. 2nd ed. Sudbury: HSE Books, 1998.

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21

L, Engelstad Roxann, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International., and International SEMATECH, eds. Emerging lithographic technologies VII: 25-27 February, 2003, Santa Clara, California, USA. Bellingham, Wash: SPIE, 2003.

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22

Ann, Dobisz Elizabeth, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International, and International SEMATECH, eds. Emerging lithographic technologies V: 27 February-1 March, 2001, Santa Clara, [California], USA. Bellingham, Wash: SPIE, 2001.

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23

Yuli, Vladimirsky, Society of Photo-optical Instrumentation Engineers., and Semiconductor Equipment and Materials International, eds. Emerging lithographic technologies III: 15-17 March, 1999, Santa Clara, California. Bellingham, Wash: SPIE, 1999.

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24

Ann, Dobisz Elizabeth, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International., and International SEMATECH, eds. Emerging lithographic technologies IV: 28 February-1 March, 2000, Santa Clara, USA. Bellingham, Wash: SPIE, 2000.

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25

Kaiyou, Chen, Columbia Astrophysics Laboratory (Columbia University), and United States. National Aeronautics and Space Administration., eds. "Pair production and gamma-ray emission in the outer magnetospheres of rapidly spinning young pulsars": Final technical report for NAG 5-3797, report period--1 December 1996 - 30 November 1997. [Washington, DC: National Aeronautics and Space Administration, 1997.

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26

The power of [alpha]: Electron elementary particle generation with [alpha]-quantized lifetimes and masses. Hackensack, N.J: World Scientific, 2007.

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27

Adams, Bernhard W. Nonlinear Optics, Quantum Optics, and Ultrafast Phenomena with X-Rays: Physics with X-Ray Free-Electron Lasers. Boston, MA: Springer US, 2003.

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28

W, Adams Bernhard, ed. Nonlinear optics, quantum optics, and ultrafast phenomena with X-rays: Physics with X-ray free-electron lasers. Boston: Kluwer Academic Publishers, 2003.

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29

United States. National Aeronautics and Space Administration., ed. Correlative analysis of hard and soft X-ray emissions in solar flares using CGRO/BATSE and YOHKOH: Final report, NASS-32791. [Washington, DC: National Aeronautics and Space Administration, 1996.

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30

1969-, Lercel Michael J., Society of Photo-optical Instrumentation Engineers., and International SEMATECH, eds. Emerging lithographic technologies X: 21-23 February, 2006, San Jose, California, USA. Bellingham, Wash: SPIE, 2006.

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31

Damage to VUV, EUV, and X-Ray Optics (Conference) (4th 2013 Prague, Czech Republic). Damage to VUV, EUV, and X-Ray Optics IV ; and, EUV and X-ray Optics: Synergy Between Laboratory and Space III: 15-18 April 2013, Prague, Czech Republic. Edited by Juha Libor editor, Bajt Saša editor, London Richard A. editor, Hudec R. editor, Pina Ladislav editor, SPIE (Society), HiPER (Project), et al. Bellingham, Washington: SPIE, 2013.

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32

Papanikolaou, N. Handbook of calculated electron momentum distributions, compton profiles, and x-ray form factors of elemental solids. Boca Raton: CRC Press, 1991.

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33

Workshop on Single Pass, High Gain FELs Starting from Noise, Aiming at Coherent X-Rays (1997 Garda Lake, Italy). Towards X-ray free electron lasers: Workshop on Single Pass, High Gain FELs Starting from Noise, Aiming at Coherent X-Rays; Garda Lake, Italy, June 1997. Edited by Bonifacio R and Barletta W. A. Woodbury, N.Y: American Institute of Physics, 1997.

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34

James, Howe, and SpringerLink (Online service), eds. Transmission Electron Microscopy and Diffractometry of Materials. 4th ed. Berlin, Heidelberg: Springer Berlin Heidelberg, 2013.

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35

Yen, Anthony, Alek C. Chen, and Burn Lin. Lithography Asia 2008: 4-6 November 2008, Taipei, Taiwan. Edited by SPIE (Society) and Taiwan Semiconductor Industry Association. Bellingham, Wash: SPIE, 2008.

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36

Yuli, Vladimirsky, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International, and SEMATECH (Organization), eds. Emerging lithographic technologies II: 23-25 February 1998, Santa Clara, California. Bellingham, Wash: SPIE, 1998.

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37

1969-, Lercel Michael J., Society of Photo-optical Instrumentation Engineers., and SEMATECH (Organization), eds. Emerging lithographic technologies XI: 27 February- 1 March 2007, San Jose, California, USA. Bellingham, Wash: SPIE, 2007.

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38

1969-, Lercel Michael J., Society of Photo-optical Instrumentation Engineers., and SEMATECH (Organization), eds. Emerging lithographic technologies XI: 27 February- 1 March 2007, San Jose, California, USA. Bellingham, Wash: SPIE, 2007.

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39

Europe, SPIE, Akademie věd České republiky. Fyzikální ústav, and SPIE (Society), eds. Harnessing relativistic plasma waves as novel radiation sources from terahertz to x-rays and beyond: 21-23 April 2009, Prague, Czech Republic. Bellingham, Wash: SPIE, 2009.

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40

DeGroot, Rodney C. Sem X-ray microanalysis of tracheid cell walls in southern yellow pine sapwood treated with water-dispersible pentachlorophenol. Madison, WI: USDA, Forest Service, Forest Products Laboratory, 1986.

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41

Akkerman, A. F. Vtorichnoe ėlektronnoe izluchenie iz tverdykh tel pod deĭstviem gamma-kvantov. Moskva: Ėnergoatomizdat, 1986.

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42

Scanning electron microscopy and x-ray microanalysis. 3rd ed. New York, NY: Kluwer Academic/Plenum Publishers, 2004.

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43

Goldstein, Joseph, L. C. Sawyer, Dale E. Newbury, Charles E. Lyman, Eric Lifshin, J. R. Michael, David C. Joy, and Patrick Echlin. Scanning Electron Microscopy and X-ray Microanalysis. 3rd ed. Springer, 2003.

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44

Scanning Electron Microscopy and X-ray Microanalysis. Springer My Copy UK, 2003.

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45

Scanning Electron Microscopy and X-Ray Microanalysis. Springer, 2017.

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46

Uniting Electron Crystallography And Powder Diffraction. Springer, 2013.

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47

Bell, Les, and Garrett-Reed. Energy Dispersive X-Ray Analysis in the Electron Microscope. Taylor & Francis Group, 2003.

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48

Scanning Electron Microscopy and X-Ray Microanalysis: Third Edition. Springer London, Limited, 2012.

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49

Scanning Electron Microscopy and X-Ray Microanalysis: Third Edition. Springer, 2013.

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50

Huang, Zhirong, Kwang-Je Kim, and Ryan Lindberg. Synchrotron Radiation and Free-Electron Lasers: Principles of Coherent X-Ray Generation. Cambridge University Press, 2017.

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