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Books on the topic 'Electron-beam technologies'

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Author: Grafiati
Published: 30 May 2022
Last updated: 31 May 2022

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1

Fontaine, Bruno M. La, and F. M. Schellenberg. Alternative lithographic technologies: 24-26 February 2009, San Jose, California, United States. Edited by SPIE (Society) and International SEMATECH. Bellingham, Wash: SPIE, 2009.

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2

Resnick, Douglas J., and William Man-Wai Tong. Alternative lithographic technologies IV: 13-16 February 2012, San Jose, California, United States. Edited by SPIE (Society). Bellingham, Washington: SPIE, 2012.

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3

Herr, Daniel J. C. Alternative lithographic technologies II: 23-25 February 2010, San Jose, California, United States. Edited by SPIE (Society) and SEMATECH (Organization). Bellingham, Wash: SPIE, 2010.

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4

Herr, Daniel J. C. Alternative lithographic technologies III: 1-3 March 2011, San Jose, California, United States. Edited by SPIE (Society). Bellingham, Wash: SPIE, 2011.

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5

International Conference on Electron Beam Technologies (3rd 1991 Varna (Bulgaria). International Conference on Electron Beam Technologies: 30 May - June 4, 1991, Varna, Bulgaria = [Mezhdunarodnai͡a︡ konferent͡s︡ii͡a︡ po ėlektronno-luchevym tekhnologii͡a︡m : Varna, Bolgarii͡a︡, 30 mai͡a︡ - 4 i͡u︡ni͡a︡ 1991]. [Sofia]: Bulgarian Academy of Sciences, Institute of electronics, 1991.

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6

International Conference on Electron Beam Technologies (1st 1985 Varna, Bulgaria). Mezhdunarodnai͡a︡ konferent͡s︡ii͡a︡ po ėlektronno luchevym tekhnologii͡a︡m: Bolgarii͡a︡, Varna, 26 mai͡a︡-2 ii͡u︡ni͡a︡ 1985 g. = International Conference on Electron Beam Technologies : Bulgaria, Varna, 26 May-2 Yune [sic] 1985. Sofii͡a︡: Izd-vo Bolgarskoĭ akademii nauk, 1985.

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7

Kyōkai, Nihon Tekkō. Bīmu riyō gijutsu no saikin no dōkō: Recent trend of beam application technologies. Tokyo: Nihon Tekkō Kyōkai, 1990.

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8

Electron Beam Pasteurization and Complementary Food Processing Technologies. Elsevier, 2015. http://dx.doi.org/10.1016/c2013-0-16457-4.

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9

Electron Beam Pasteurization and Complementary Food Processing Technologies. Woodhead Publishing, 2018.

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10

Mackay, R. Scott. Emerging Lithographic Technologies 9. SPIE-International Society for Optical Engine, 2005.

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11

Scott, Mackay R., Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International., and International SEMATECH, eds. Emerging lithographic technologies VIII: 24-26 February, 2004, Santa Clara, California, USA. Bellingham, Wash., USA: SPIE, 2004.

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12

E, Seeger David, and Society of Photo-optical Instrumentation Engineers., eds. Emerging lithographic technologies: 10-11 March 1997, Santa Clara, California. Bellingham, Wash: SPIE, 1997.

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13

Yuli, Vladimirsky, Society of Photo-optical Instrumentation Engineers., and Semiconductor Equipment and Materials International, eds. Emerging lithographic technologies III: 15-17 March, 1999, Santa Clara, California. Bellingham, Wash: SPIE, 1999.

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14

Schellenberg, Frank. Emerging Lithographic Technologies XII: 26-28 February 2008, San Jose, California, USA. SPIE, 2008.

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15

L, Engelstad Roxann, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International., and International SEMATECH, eds. Emerging lithographic technologies VII: 25-27 February, 2003, Santa Clara, California, USA. Bellingham, Wash: SPIE, 2003.

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16

Ann, Dobisz Elizabeth, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International., and International SEMATECH, eds. Emerging lithographic technologies IV: 28 February-1 March, 2000, Santa Clara, USA. Bellingham, Wash: SPIE, 2000.

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17

Yuli, Vladimirsky, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International, and SEMATECH (Organization), eds. Emerging lithographic technologies II: 23-25 February 1998, Santa Clara, California. Bellingham, Wash: SPIE, 1998.

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18

Ann, Dobisz Elizabeth, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International, and International SEMATECH, eds. Emerging lithographic technologies V: 27 February-1 March, 2001, Santa Clara, [California], USA. Bellingham, Wash: SPIE, 2001.

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19

1969-, Lercel Michael J., Society of Photo-optical Instrumentation Engineers., and International SEMATECH, eds. Emerging lithographic technologies X: 21-23 February, 2006, San Jose, California, USA. Bellingham, Wash: SPIE, 2006.

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20

1969-, Lercel Michael J., Society of Photo-optical Instrumentation Engineers., and SEMATECH (Organization), eds. Emerging lithographic technologies XI: 27 February- 1 March 2007, San Jose, California, USA. Bellingham, Wash: SPIE, 2007.

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21

1969-, Lercel Michael J., Society of Photo-optical Instrumentation Engineers., and SEMATECH (Organization), eds. Emerging lithographic technologies XI: 27 February- 1 March 2007, San Jose, California, USA. Bellingham, Wash: SPIE, 2007.

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22

Llarich, Kyle W. Cardiac Examination, Valvular Heart Disease, and Congenital Heart Disease. Oxford University Press, 2012. http://dx.doi.org/10.1093/med/9780199755691.003.0042.

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Abstract:
Despite tremendous technologic advances in medical testing and imaging, physicians must be able to assess patients accurately at the bedside; this assessment allows appropriate, cost-effective, and efficient ordering of tests. Part I of this chapter outlines the salient features of a thorough physical examination, cardiac imaging techniques, and valvular and congenital heart disease. A thorough physical examination includes assessment of jugular venous pressure, arterial pulses, apical impulses, additional cardiac palpitations, and appropriate imaging techniques. Cardiac imaging techniques include contrast angiography, echocardiography, radionuclide imaging, magnetic resonance imaging, electron beam computed tomography and positron emission tomography. Different types of valvular and congenital heart disease are examined.
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