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Books on the topic 'Electron-beam lithography'

Author: Grafiati

Published: 4 June 2021

Last updated: 31 July 2024

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1

Hahmann, Peter. Electron-beam lithography contributions from Jena. Jena: Verlag Vopelius, 2014.

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2

International Symposium on Electron, Ion, and Photon Beams (2nd 1984 Tarrytown, N.Y.). Proceedings of the 1984 International Symposium on Electron, Ion, and Photon Beams, 29 May-1 June, 1984, Westchester Marriott Hotel, Tarrytown, New York. Edited by Kelly J, American Vacuum Society, and American Institute of Physics. New York: Published for the American Vacuum Society by the American Institute of Physics, 1985.

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3

Popov, V. K. Raschet i proektirovanie ustroĭstv ėlektronnoĭ i ionnoĭ litografii. Moskva: "Radio i svi͡a︡zʹ", 1985.

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4

Gu, Wenqi. Dian zi shu bao guang wei na jia gong ji shu. Beijing: Beijing gong ye da xue chu ban she, 2004.

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5

International Symposium on Nanometer Structure Electronics (1984 Toyonaka, Osaka University). Nanometer structure electronics: An investigation of the future of micro-electronics : proceedings of the International Symposium on Nanometer Structure Electronics, April 16-18, 1984 Osaka University, Toyonaka, Japan. Tokyo, Japan: Ohm, 1985.

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6

Liebmann, Lars W. Design technology co-optimization in the era of sub-resolution IC scaling. Bellingham, Washington: SPIE, 2016.

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7

J, Resnick Douglas, and Society of Photo-optical Instrumentation Engineers., eds. Electron-beam, X-ray, and ion-beam technology: Submicrometer lithographies IX : 7-8 March 1990, San Jose, California. Bellingham, Wash., USA: SPIE--the International Society for Optical Engineering, 1990.

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8

D, Blais Phillip, and International Society for Hybrid Microelectronics., eds. Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V: 11-12 March, 1986, Santa Clara, California. Bellinham, Wash., USA: SPIE--the International Society for Optical Engineering, 1986.

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9

1946-, Peckerar Martin Charles, and Society of Photo-optical Instrumentation Engineers., eds. Electon-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing: 6-7 March 1991, San Jose, California. Bellingham, Wash: SPIE, 1991.

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10

O, Patterson David, Society of Photo-optical Instrumentation Engineers., and Semiconductor Equipment and Materials International., eds. Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV: 28 February-1 March 1994, San Jose, California. Bellingham, Wash: SPIE, 1994.

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11

E, Seeger David, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International., and SEMATECH (Organization), eds. Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI: 11-13 March 1996, Santa Clara, California. Bellingham, Wash: SPIE, 1996.

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12

International Workshop on X-ray and Extreme Ultraviolet Lithography (1997 Yokohama, Japan). Digest of papers, XEL '1997: 1997 International Workshop on X-ray and Extreme Ultraviolet Lithography, July 13-15, 1997, Pacifico Yokohama, Yokohama. [Tokyo: Japan Society for the Promotion of Sciences?, 1997.

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13

D, Blais Phillip, and Society of Photo-optical Instrumentation Engineers., eds. Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V: 11-12 March 1986, Santa Clara, California. Bellingham, Wash., USA: SPIE--the International Society for Optical Engineering, 1986.

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14

K, Marrian Christie R., ed. Technology of proximal probe lithography. Bellingham, Wash: SPIE Optical Engineering Press, 1993.

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15

O, Patterson David, and Society of Photo-optical Instrumentation Engineers., eds. Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III: 1-2 March 1993, San Jose, California. Bellingham, Wash: The Society, 1993.

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16

Gurung, Raju. Computer visualisation and proximity effect correction for submicron electron beam lithography. Manchester: University of Manchester, 1995.

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17

Fretwell, Tracey Ann. Monte Carlo simulation of energy intensity distributions for electron beam lithography. Manchester: University of Manchester, 1995.

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18

E, Seeger David, and Society of Photo-optical Instrumentation Engineers., eds. Emerging lithographic technologies: 10-11 March 1997, Santa Clara, California. Bellingham, Wash: SPIE, 1997.

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19

Ann, Dobisz Elizabeth, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International, and International SEMATECH, eds. Emerging lithographic technologies V: 27 February-1 March, 2001, Santa Clara, [California], USA. Bellingham, Wash: SPIE, 2001.

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20

Ann, Dobisz Elizabeth, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International., and International SEMATECH, eds. Emerging lithographic technologies IV: 28 February-1 March, 2000, Santa Clara, USA. Bellingham, Wash: SPIE, 2000.

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21

L, Engelstad Roxann, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International., and International SEMATECH, eds. Emerging lithographic technologies VII: 25-27 February, 2003, Santa Clara, California, USA. Bellingham, Wash: SPIE, 2003.

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22

Fontaine, Bruno M. La, and F. M. Schellenberg. Alternative lithographic technologies: 24-26 February 2009, San Jose, California, United States. Edited by SPIE (Society) and International SEMATECH. Bellingham, Wash: SPIE, 2009.

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23

Herr, Daniel J. C. Alternative lithographic technologies II: 23-25 February 2010, San Jose, California, United States. Edited by SPIE (Society) and SEMATECH (Organization). Bellingham, Wash: SPIE, 2010.

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24

Resnick, Douglas J., and William Man-Wai Tong. Alternative lithographic technologies IV: 13-16 February 2012, San Jose, California, United States. Edited by SPIE (Society). Bellingham, Washington: SPIE, 2012.

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25

Herr, Daniel J. C. Alternative lithographic technologies III: 1-3 March 2011, San Jose, California, United States. Edited by SPIE (Society). Bellingham, Wash: SPIE, 2011.

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26

A, Tseng A., ed. Nanofabrication: Fundamentals and applications. Singapore: World Scientific, 2008.

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27

A, Tseng A., ed. Nanofabrication: Fundamentals and applications. Singapore: World Scientific, 2008.

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28

Yen, Anthony, Alek C. Chen, and Burn Lin. Lithography Asia 2008: 4-6 November 2008, Taipei, Taiwan. Edited by SPIE (Society) and Taiwan Semiconductor Industry Association. Bellingham, Wash: SPIE, 2008.

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29

1969-, Lercel Michael J., Society of Photo-optical Instrumentation Engineers., and SEMATECH (Organization), eds. Emerging lithographic technologies XI: 27 February- 1 March 2007, San Jose, California, USA. Bellingham, Wash: SPIE, 2007.

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30

Cooley, Graham Edward. An electron beam lithographic route to polyacetylene via poly(vinylchloride). Uxbridge: Brunel University, 1989.

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31

Gu, Linfei. Electron Beam Lithography Process Optimization. GRIN Verlag GmbH, 2013.

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32

Yanof, Arnold W. Electron-Beam, X Ray, and Ion-Beam Technology; Submicrometer Lithographics VII (Proceedings of SPIE--the International Society for Optical Engineering). Society of Photo Optical, 1988.

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33

Bencher, Christopher. Alternative Lithographic Technologies VIII. SPIE, 2016.

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34

Lin, Qinghuang. Advances in Resist Technology and Processing XXIII: 20-22 February, 2006. SPIE, 2006.

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35

Mackay, R. Scott. Emerging Lithographic Technologies 9. SPIE-International Society for Optical Engine, 2005.

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36

Schellenberg, Frank. Emerging Lithographic Technologies XII: 26-28 February 2008, San Jose, California, USA. SPIE, 2008.

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37

Wiederrecht, Gary. Handbook of Nanofabrication. Elsevier Science & Technology Books, 2010.

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38

Trybula, Walt, and Ampere A. Tseng. Emerging Lithographic Technologies for Nanopatterning. Taylor & Francis Group, 2010.

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39

Trybula, Walt, and Ampere A. Tseng. Emerging Lithographic Technologies for Nanopatterning. Taylor & Francis Group, 2010.

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40

(Editor), Ampere A. Tseng, and Walt Trybula (Editor), eds. Emerging Lithographic Technologies for Nanopatterning. CRC, 2008.

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41

Nanofabrication: Fundamentals and Applications. World Scientific Publishing Co Pte Ltd, 2008.

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42

Nanofabrication: Fundamentals and Applications. World Scientific Publishing Company, 2007.

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43

Nanofabrication: Fundamentals and Applications. World Scientific Publishing Company, 2008.

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44

Nanofabrication: Fundamentals and Applications. World Scientific Publishing Co Pte Ltd, 2008.

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45

Gallop, J., and L. Hao. Superconducting Nanodevices. Edited by A. V. Narlikar. Oxford University Press, 2017. http://dx.doi.org/10.1093/oxfordhb/9780198738169.013.17.

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This article reviews recent progress in superconducting nanodevices, with particular emphasis on fabrication methods developed for superconducting nanowires and nanoscale Josephson junctions based on different barrier materials. It evaluates the future potential of superconducting nanodevices, including nano-superconducting quantum interference devices (nanoSQUIDs), in light of improvements in nanoscale fabrication and manipulation techniques, along with their likely impacts on future quantum technology and measurement. The article first considers efforts to realize devices at the physical scale of 100 nm and below before discussing different types of Josephson junction such as trilayer junctions. It also describes the use of focused ion beam milling and electron beam lithography techniques for junction fabrication at the nanoscale and the improved energy sensitivity detectable with a nanoSQUID. Finally, it looks at a range of applications for nanoSQUIDs, superconducting single photon detectors, and other superconducting nanodevices.

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46

Hong, M. H. Laser applications in nanotechnology. Edited by A. V. Narlikar and Y. Y. Fu. Oxford University Press, 2017. http://dx.doi.org/10.1093/oxfordhb/9780199533060.013.24.

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This article discusses a variety of laser applications in nanotechnology. The laser has proven to be one of many mature and reliable manufacturing tools, with applications in modern industries, from surface cleaning to thin-film deposition. Laser nanoengineering has several advantages over electron-beam and focused ion beam processing. For example, it is a low-cost, high-speed process in air, vacuum or chemical environments and also has the capability to fulfill flexible integration control. This article considers laser nanotechnology in the following areas: pulsed laser ablation for nanomaterials synthesis; laser nanoprocessing to make nanobumps for disk media nanotribology and anneal ultrashort PN junctions; surface nanopatterning with near-field, and light-enhancement effects; and large-area parallel laser nanopatterning by laser interference lithography and laser irradiation through a microlens array. Based on these applications, the article argues that the laser will continue to be one of the highly potential nanoengineering means in next-generation manufacturing.

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