Journal articles: 'Electrodeposited film'

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Son, Min-Kyu. "Effect of Deposition Parameters on Morphological and Compositional Characteristics of Electrodeposited CuFeO2 Film." Coatings 12, no. 12 (November 25, 2022): 1820. http://dx.doi.org/10.3390/coatings12121820.

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Deposition parameters determine the characteristics of semiconductor films in electrodeposition. Thus, it is essential to understand the effect of deposition parameters on the electrodeposited film for fabricating suitable semiconductor film fitting for various applications. In this work, the morphological and compositional properties of electrodeposited delafossite CuFeO2 film, according to the deposition parameters, were studied. The CuFeO2 film was fabricated by the galvanostatic electrodeposition and post-annealing process under inert gas flow. The type of solvent, electrolyte condition, applied current density and deposition time were controlled as the variable deposition parameters. As a result, the typical CuFeO2 film, without any impurities, was electrodeposited in the electrolyte-based DMSO solvent. Interestingly, the concentration of potassium perchlorate as a complexing agent caused morphological change in electrodeposited CuFeO2 film, as well as compositional transition. On the other hand, the applied current density and deposition time only influenced the morphology of electrodeposited CuFeO2 film. These observations would provide specific guidelines for the fabrication of electrodeposited CuFeO2 film with suitable composition and morphology for various applications.

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Noorbakhsh Nezhad, Amir Hossein, Ehsan Rahimi, Reza Arefinia, Ali Davoodi, and Saman Hosseinpour. "Effect of Substrate Grain Size on Structural and Corrosion Properties of Electrodeposited Nickel Layer Protected with Self-Assembled Film of Stearic Acid." Materials 13, no. 9 (April 28, 2020): 2052. http://dx.doi.org/10.3390/ma13092052.

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In the present study, the impact of copper substrate grain size on the structure of the succeeding electrodeposited nickel film and its consequent corrosion resistance in 3.5% NaCl medium were evaluated before and after functionalization with stearic acid. Nickel layers were electrodeposited on two different copper sheets with average grain size of 12 and 25 µm, followed by deposition of stearic acid film through self-assembly. X-ray diffraction analysis of the electrodeposited nickel films revealed that the deposition of nickel film on the Cu substrate with small (12 µm) and large (25 µm) grains is predominantly governed by growth in the (220) and (111) planes, respectively. Both electrodeposited films initially exhibited a hydrophilic nature, with water-contact angles of 56° and <10°, respectively. After functionalization with stearic acid, superhydrophobic films with contact angles of ~150° were obtained on both samples. In a 3.5% NaCl medium, the corrosion resistance of the nickel layer electrodeposited on the copper substrate with 25 µm grains was three times greater than that deposited on the copper substrate with 12 µm grains. After functionalization, the corrosion resistance of both films was greatly improved in both short and long immersion times in 3.5% NaCl medium.

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Cetina-Dorantes, Marco, Francisco Lizama-Tzec, Dallely Herrera-Zamora, Octavio García-Valladares, Victor Gómez-Espinoza, Geonel Rodriguez Gattorno, and Gerko Oskam. "(Digital Presentation) Electrodeposition and Characterization of a Selective Coating on Aluminum for Scale-up in Thermo-Solar Applications." ECS Meeting Abstracts MA2022-02, no. 22 (October 9, 2022): 936. http://dx.doi.org/10.1149/ma2022-0222936mtgabs.

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Flat-plate solar collector systems are devices used to convert solar energy to thermal energy. These devices require a selective coating that absorbs all sunlight but does not emit energy in the near IR; hence, a multilayer system of metal/IR-reflector/metal oxide is often used. Many substrates are used, including metals such as copper, stainless steel, and aluminum. Aluminum is an interesting substrate for its lower cost and good optical properties. Electrodeposited materials have gained importance in the industry for the easy handling and good results in scale-up. However, in general it is difficult to electrodeposit onto aluminum due to the ever-present thin insulating oxide film. In this work, we propose an adherent interlayer film based on copper, which is electrodeposited onto aluminum, and serves as a basis for the subsequent electrodeposition of a selective coating consisting of bright nickel and the absorber film of electrodeposited black nickel. Solar collectors based on aluminum substrates and this electrodeposited selective coating are specifically useful for thermo-solar applications at low to medium temperature. Electrochemistry studies including cyclic voltammetry, rotating disk cyclic voltammetry, and galvanostatic curves are carried out for all the different layers. The properties of the coatings are subsequently characterized by reflectance spectra using UV-Vis, NIR and IR spectrophotometers equipped with integrating spheres. The solar absorptance is calculated by weighting the reflectance spectrum against the solar radiation spectrum ASTM G173-03. The thermal emittance is calculated weighting the reflectance spectra against the black body radiation function at 100 °C. The morphology and homogeneity of the film are evaluated with scanning electron microscopy, and energy dispersive spectroscopy. X-ray photoelectron spectrometry is used to determine the film composition. The crystalline structure of the films is studied by X-ray diffraction and Raman measurements. The second and third layer, bright nickel, and black nickel, respectively, are electrodeposited on top of the Cu layer using a previously reported method. We characterize the selective coating electrodeposited onto aluminum/Cu/bright nickel and show that this is a viable technology for the fabrication of low-cost and high efficiency flat plate solar collectors. In addition, we demonstrate the scale-up of the electrodeposition process, and characterize the performance of a complete flat-plate solar collector device of 1.8 m2 gross area. Acknowledgements The authors gratefully acknowledge CONACYT, Módulo Solar S.A. de C.V. and IER-UNAM for funding through the Mexican Center for Innovation in Solar Energy (CeMIE-Sol), Project P-81.

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Qiu, C. X., and I. Shih. "Photovoltaic devices fabricated on electrodeposited CuInSe2 films." Canadian Journal of Physics 67, no. 4 (April 1, 1989): 444–47. http://dx.doi.org/10.1139/p89-079.

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Using both Al–CuInSe2 Schottky junctions and CdS–CuInSe2 heterojunctions fabricated on electrodeposited p-type CuInSe2 films, we have investigated some properties of CuInSe2. From current–voltage and capacitance–voltage measurements carried out on these devices, it was found that the electronic quality of the CuInSe2 film surface was improved after the deposition of the CdS layer. In addition, it was observed that the electronic properties of the heterojunctions were dependent on the In/Cu ratio in the electrodeposited CuInSe2 films. Using a film with In/Cu = 1.1, we successfully fabricated a cell with an active-area conversion efficiency of 5.2%. Post-fabrication air heat treatment at 180 °C on the CdS–CuInSe2 devices was found to result in an increase in the charge-carrier concentration in the electrodeposited CuInSe2 films.

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Xiong, Wei, Fei Hu, Hua Bing Fang, and Yue Hui Hu. "The Linear Sweep Voltammetric Study and Two-Step Electrodeposition of CuIn_0.95 Se_2.1Thin Film in a Citric Acid Electrolyte." Advanced Materials Research 472-475 (February 2012): 2744–47. http://dx.doi.org/10.4028/www.scientific.net/amr.472-475.2744.

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Electrodeposition of CuInSe2 (CIS) thin films has been investigated by linear sweep voltammetry on F-doped tin oxide (FTO) glass in electrolytes containing citric acid. It is found that one-step electrodeposited CIS thin films have great deviation from the ideal stoichiometric ratio. After deposited a film at -900 mV (vs.SCE) for 20s on the FTO, the linear sweep voltammetry has showed that only one reduction current peak at -550 mV is remained, and the two-step electrodeposited CIS film showed a near- toichiometric ratio of 1:0.9:2.1.

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Kobayashi, Tatsuya, and Ikuo Shohji. "Fabrication of Three-Dimensional Microstructure Film by Ni-Cu Alloy Electrodeposition for Joining Dissimilar Materials." Materials Science Forum 1016 (January 2021): 738–43. http://dx.doi.org/10.4028/www.scientific.net/msf.1016.738.

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Metals with a three-dimensional microstructure film can be joined to plastics by the anchor effect. The three-dimensional microstructure films can be electrodeposited by a Ni-Cu alloy. In this study, the effects of the ratio of the concentration of Ni amidosulfate and Cu sulfate in the plating solution and plating current density on the shapes and microstructures of electrodeposited films were investigated. When the ratio of the concentration of the Ni amidosulfate and the Cu sulfate is 0.47-1.4:0.06 (M/L), a dendritic-type electrodeposited structure was generated at plating current density of 10 mA/cm2. When the ratio of the concentration of the Ni amidosulfate and the Cu sulfate is 0.47:0.6-1.2 (M/L), a feathery-type and needle-type electrodeposited structure was generated.

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Wang, Zi Feng, Yong Zhao Liu, Yu Shan Liu, and Jian Min Zhang. "Fabrication of the ZnS-ZnO Composite Film by Sulfurizing the as-Electrodeposited ZnO Film." Advanced Materials Research 881-883 (January 2014): 909–13. http://dx.doi.org/10.4028/www.scientific.net/amr.881-883.909.

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The ZnS-ZnO composite film was successfully prepared by sulfidation of the as-electrodeposited ZnO film in the aqueous solution of zinc nitrate and hexamethylenetetramine. The ZnO film was electrodeposited on the substrate of indium-tin oxide (ITO) glass, and then the sodium sulfide solution was used to convert the ZnO film into the ZnS-ZnO composite film. The products were characterized by X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), energy-dispersive X-ray spectrometer (EDS) and UVvisible absorption. The experimental results show that the composite film on ITO glass still retained the morphology of as-electrodeposited ZnO coating, and is composed of ZnS with cubic structure and ZnO with hexagonal structure.

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Kim, Young-Soo, Jin-Kyu Lee, Jae-Hoon Ahn, Eun-Kyung Park, Gil-Pyo Kim, and Sung-Hyeon Baeck. "Fabrication of Mesoporous Cerium Dioxide Films by Cathodic Electrodeposition." Journal of Nanoscience and Nanotechnology 7, no. 11 (November 1, 2007): 4198–201. http://dx.doi.org/10.1166/jnn.2007.109.

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Mesoporous cerium dioxide (Ceria, CeO2) thin films have been successfully electrodeposited onto ITO-coated glass substrates from an aqueous solution of cerium nitrate using CTAB (Cetyltrimethylammonium Bromide) as a templatingagent. The synthesized films underwent detailed characterizations. The crystallinity of synthesized CeO2 film was confirmed by XRD analysis and HR-TEM analysis, and surface morphology was investigated by SEM analysis. The presence of mesoporosity in fabricated films was confirmed by TEM and small angle X-ray analysis. As-synthesized film was observed from XRD analysis and HR-TEM image to have well-crystallized structure of cubic phase CeO2. Transmission electron microscopy and small angle X-ray analysis revealed the presence of uniform mesoporosity with a well-ordered lamellar phase in the CeO2 films electrodeposited with CTAB templating.

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Chowdhury, RI, MS Islam, F. Sabeth, G. Mustafa, SFU Farhad, DK Saha, FA Chowdhury, S. Hussain, and ABMO Islam. "Characterization of Electrodeposited Cadmium Selenide Thin Films." Dhaka University Journal of Science 60, no. 1 (April 15, 2012): 137–40. http://dx.doi.org/10.3329/dujs.v60i1.10352.

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Cadmium selenide (CdSe) thin films have been deposited on glass/conducting glass substrates using low-cost electrodeposition method. X-ray diffraction (XRD) technique has been used to identify the phases present in the deposited films and observed that the deposited films are mainly consisting of CdSe phases. The photoelectrochemical (PEC) cell measurements indicate that the CdSe films are n-type in electrical conduction, and optical absorption measurements show that the bandgap for as-deposited film is estimated to be 2.1 eV. Upon heat treatment at 723 K for 30 min in air the band gap of CdSe film is decreased to 1.8 eV. The surface morphology of the deposited films has been characterized using scanning electron microscopy (SEM) and observed that very homogeneous and uniform CdSe film is grown onto FTO/glass substrate. The aim of this work is to use n-type CdSe window materials in CdTe based solar cell structures. The results will be presented in this paper in the light of observed data.DOI: http://dx.doi.org/10.3329/dujs.v60i1.10352 Dhaka Univ. J. Sci. 60(1): 137-140 2012 (January)

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KUDO, TERUHISA, MUTSUMI KIMURA, KENJI HANABUSA, and HIROFUSA SHIRAI. "Fabrication of p-n Junction Diodes from Phthalocyanine and Electropolymerized Perylene Derivatives." Journal of Porphyrins and Phthalocyanines 02, no. 03 (May 1998): 231–35. http://dx.doi.org/10.1002/(sici)1099-1409(199805/06)2:3<231::aid-jpp82>3.0.co;2-s.

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Perylene derivative films doped with metal ion were deposited on indium tin oxide ( ITO )-coated glass electrodes by electrodeposition from solutions of N, N″-4-hydroxyphenyl-3,4,9,10-perylenetetracarboxylic-diimide (hph-PTC) and CaCl 2, PbCl 2, ZnCl 2 or CoBr 2 as a supporting electrolyte in N, N-dimethylformamide ( DMF ). The p-n junction diodes consisting of a p-type phthalocyanine (Pc) sublimed film and an n-type hph-PTC electrodeposited film doped with metal ion exhibited Zener-type breakdown and photocurrent enhancement. The device with a p-n junction consisting of a Pc sublimed film and an hph-PTC electrodeposited film doped with Ca 2+ showed the largest amplification of photocurrent. This result suggests that the dopant ion in hph-PTC is an important factor in the preparation of p-n junction diodes.

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Rodriguez, Mark A., Katharine L. Harrison, Subrahmanyam Goriparti, James J. M. Griego, Brad L. Boyce, and Brian R. Perdue. "Use of a Be-dome holder for texture and strain characterization of Li metal thin films via sin2(ψ) methodology." Powder Diffraction 35, no. 2 (June 2020): 89–97. http://dx.doi.org/10.1017/s0885715620000305.

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Residual strain in electrodeposited Li films may affect safety and performance in Li metal battery anodes, so it is important to understand how to detect residual strain in electrodeposited Li and the conditions under which it arises. To explore this Li films, electrodeposited onto Cu metal substrates, were prepared under an applied pressure of either 10 or 1000 kPa and subsequently tested for the presence or absence of residual strain via sin2(ψ) analysis. X-ray diffraction (XRD) analysis of Li films required preparation and examination within an inert environment; hence, a Be-dome sample holder was employed during XRD characterization. Results show that the Li film grown under 1000 kPa displayed a detectable presence of in-plane compressive strain (−0.066%), whereas the Li film grown under 10 kPa displayed no detectable in-plane strain. The underlying Cu substrate revealed an in-plane residual strain near zero. Texture analysis via pole figure determination was also performed for both Li and Cu and revealed a mild fiber texture for Li metal and a strong bi-axial texture of the Cu substrate. Experimental details concerning sample preparation, alignment, and analysis of the particularly air-sensitive Li films have also been detailed. This work shows that Li metal exhibits residual strain when electrodeposited under compressive stress and that XRD can be used to quantify that strain.

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Mochizuki, Chihiro, Takashi Senga, and Masami Shibata. "Pd-Based Metallic Glass Films Formed by Electrodeposition Process." Solid State Phenomena 194 (November 2012): 183–86. http://dx.doi.org/10.4028/www.scientific.net/ssp.194.183.

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The formation of Pd-Ni-P and Pd-Ni-Cu-P metallic glass films using the electrodeposition method was examined. In this study, the structure and composition of these metallic alloys were investigated at various condition of electrodeposition. The X-ray diffraction pattern on the electrodeposited Pd-Ni-P films in the range of 18-69 at% Pd, 12-62 at% Ni and 9-21 at% P showed a broad diffraction peak, which indicates metallic amorphous structure. A result of DSC showed that the electrodeposited Pd-Ni-P films in the range of 36-57 at% Pd, 24-47 at% Ni and 16-21 at% P were metallic glasses. In addition, it was proven that the electrodeposited Pd54Cu8Ni22P16 film was metallic glass.

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Mubshrah, Ayesha, and Walther Schwarzacher. "Study of Structural Morphology of Electrodeposited Ni Film." ECS Meeting Abstracts MA2023-02, no. 20 (December 22, 2023): 1251. http://dx.doi.org/10.1149/ma2023-02201251mtgabs.

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Structural morphology of thin electrodeposited metallic films plays a vital role in determining the properties of the films and their application. We prepared a range of Ni electrodeposited polycrystalline films using a BIOLOGIC potentiostat and investigated the effects of varying parameters such as the deposition rate and concentration of the solution to improve control over their properties. We conducted analysis of surface morphology of thin films of area 1cm2, as well as at microstructural level of area 50x50 um2, using ex-situ AFM and in-situ HS AFM. Ex-situ AFM data helps us to do quantitative surface analysis, including slope, scaling analysis [1] and grain area calculation as a function of time, concentration, and applied potential. HS AFM provides us with information about the grain structure evolution at microstructural level [2]. The texture of films was determined by XRD analysis. For the thin films, Ni[111] orientation was dominant, but for thick films, the dominant crystallographic orientations was Ni[200].We also performed EBSD analysis for Ni thin films after milling with focused ion beam. EBSD uses backscattered electron to obtain the information of structural morphology and crystallographic orientation of thin films layer by layer. The correlation between ex-situ AFM and EBSD data helps to gain a clear understanding of the structural features of the films. Liu, L., & Schwarzacher, W. (2013). Slope analysis and scaling analysis of electrodeposited thin films. Electrochemistry communications, 29, 52-54. Koorikkat, A., Payton, O., Picco, L., & Schwarzacher, W. (2020). Imaging the Surface of a Polycrystalline Electrodeposited Cu Film in Real Time Using In Situ High-Speed AFM. Journal of the Electrochemical Society, 167(16), 162510.

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AOE, Tetuhiro. "Stripping of Electrodeposited and Painted Film. The Stripping of Electrodeposits." Journal of the Surface Finishing Society of Japan 48, no. 5 (1997): 501–6. http://dx.doi.org/10.4139/sfj.48.501.

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Fudzi, Laimy Mohd, Zulkarnain Zainal, Hong Ngee Lim, Sook Keng Chang, and Asma Samsudin. "Effect of Heat Treatment on Electrodeposited ZnSe on Vertically Aligned ZnO Nanorods for Photoelectrochemical Cell." Solid State Phenomena 307 (July 2020): 179–84. http://dx.doi.org/10.4028/www.scientific.net/ssp.307.179.

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Following successful growth of zinc oxide (ZnO) nanorods, a layer of zinc selenide (ZnSe) was electrodeposited onto the nanorods to further enhance its conversion efficiency in the photoelectrochemical (PEC) cell. The electrodeposited ZnSe layer onto the ZnO nanorods was subjected to heat treatment at 200, 250 and 300°C. The prepared films were characterized by X-ray diffractometry (XRD), field emission scanning electron microscopy (FESEM), and ultraviolet-visible spectroscopy (UV-Vis) to investigate the structural, morphological and compositional characteristics. Additionally, PEC conversion generated by the prepared thin films were tested with photocurrent measurements under calibrated visible illumination from a halogen lamp. Based on FESEM analysis, the thickness of ZnO thin film increased with temperature. However, the diameters of the ZnO nanorods were found to be in a decreasing trend upon heat treatment at higher temperature. The electrodeposited ZnSe layer at the potential of -0.7 V for 60 seconds (calcined at 200°C) possessed crystallite size of 20.1 nm. According to UV-Vis analysis, band gap energy measured was 2.8 eV, which is very close to standard ZnSe band gap value (2.7 eV). Additional layer of ZnSe electrodeposited enhanced thin film performance in terms of current density as much as 37.4% while having high photocurrent density of 0.2671 mAcm-2.

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Yu, Xiangtao, Jun Yang, Xiangyu Ren, and Zhuyin Sui. "Influences of pH and EDTA Additive on the Structure of Ni Films Electrodeposited by Using Bubble Templates as Electrocatalysts for Hydrogen Evolution Reaction." Membranes 11, no. 3 (February 27, 2021): 165. http://dx.doi.org/10.3390/membranes11030165.

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The structure of Ni films is essential to their electrocatalytic performance for hydrogen evolution reaction (HER). The pH value and EDTA (ethylene diamine tetraacetic acid) additive are important factors for the structure control of electrodeposited metal films due to their adjustment of metal electrocrystallization and hydrogen evolution side reactions. The structures of Ni films from 3D (three-dimensional) porous to compact and flat structure are electrodeposited by adjusting solution pH values or adding EDTA. It is found that when pH value increases from 7.7 to 8.1, 3D porous films change to compact films with many protrusions. Further increasing the pH value or adding 0.1 M EDTA causes compact and flat films without protrusions to appear. When pH ≤ 7.7, hydrogen bubbles with large break-off diameter are easily adsorbed on film surface acting as porous structure templates, and the electroactive ion species, Ni2+ and Ni(NH3)n2+ complexes with low coordination number (n ≤ 3), possess high reduction overpotential, which is beneficial to forming protrusions and smaller particles. So, porous Ni films are electrodeposited. In solutions with pH ≥ 8.1 or 0.1 M EDTA, Ni(NH3)n2+ complexes with high coordination number (6 ≥ n ≥ 3) and hexadentate chelate are formed. Due to the improved wettability, bubbles with a small break-off diameter rapidly detach the film surface resulting in strong stirring. The reduction overpotential is reduced, leading to the formation of larger particles. Therefore, the solution leveling ability increases, and it is difficult to form protrusions, thus it forms a compact and flat film. The 3D porous film exhibits excellent catalytic performance for HER due to the large catalytic activity area.

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Tzec, F. I. Lizama, M. A. Aguilar Frutis, G. Rodríguez Gattorno, and G. Oskam. "Electrodeposition of ZnO for Application in Dye-sensitized Solar Cells." Journal of New Materials for Electrochemical Systems 16, no. 3 (July 4, 2013): 209–15. http://dx.doi.org/10.14447/jnmes.v16i3.20.

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ZnO has been electrodeposited from 0.5 M Zn(NO3)2 at pH 4.5 with and without polyethylene glycol (PEG) as additive. Cyclic voltammetry on FTO substrates reveals two electrochemical regimes, where reduction of nitrate and water are rate determining, respectively. ZnO films were galvanostatically electrodeposited as a function of the deposition current density: at low current densities, where nitrate reduction is rate determining, highly crystalline ZnO films were obtained, whereas amorphous ZnO films were obtained at higher current densities, where water reduction dominates. The amorphous films transform to crystalline ZnO upon sintering, and SEM images show that the presence of PEG results in a homogeneous film morphology. The films were used for the fabrication of dye-sensitized solar cells (DSSCs), resulting in solar cell conversion efficiencies of up to 1.4% for non-sintered ZnO films deposited at low current density (without PEG), while the best cells were obtained with films electrodeposited from the plating bath with 0.15 mM PEG with efficiencies of up to 1.8% for sintered films prepared at higher current density. These results illustrate that the presence of PEG in the plating bath optimizes the film morphology and, hence, the performance of ZnO-based dye-sensitized solar cells.

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Amini, Moharam, Kamran Torabi, Loghman Jamilpanah, and Seyed Majid Mohseni. "(Digital Presentation) Electronic and Optical GAP Evaluation By Oxygen Tuning in MOSE₂." ECS Meeting Abstracts MA2022-01, no. 22 (July 7, 2022): 1125. http://dx.doi.org/10.1149/ma2022-01221125mtgabs.

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In this study, a simple and fast electrochemical method was employed to synthesis molybdenum diselenide thin film. Molybdenum diselenide films have been electrodeposited on FTO substrates from an ammoniacal solution of H2MoO4 and SeO2. We fabricated thin films composed of MoSe2, MoO2 and MoO3 elements by adjusting some electrodeposition factors, e.g., deposition time and potential. The Structural characterizations of the electrodeposited films were investigated by SEM, Scanning tunneling spectroscopy (STS), Raman spectroscopy and UV-Visible spectroscopy. And also, Electronic and optical gap have been measured by STS and UV-Vis spectra, respectively.

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Yeh, Yih-Min, and Hsiang Chen. "Investigation of Electrodeposited WO3 Film with Heat Treatment." Journal of New Materials for Electrochemical Systems 17, no. 1 (February 26, 2014): 029–32. http://dx.doi.org/10.14447/jnmes.v17i1.440.

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In this research, we propose an alternative method to fabricate WO3 films as electro chromatic devices (ECDs). To fabricate the electrochromic film, we electrochemically deposit a WO3 film on FTO (fluorine-doped tin oxide). The deposited film was crystallized with heat treatment at various temperatures. To investigate the material quality of the film in different deposition and heat treatment conditions, X-ray diffraction (XRD) was used to examine the crystalline structure and scanning electron microscope (SEM) was used to analyze the surface morphology. Furthermore, the electrical performance of the film was evaluated by cyclic voltammetry (CV) and the transmittance modulation could still attain above 40% after 1000 times repeated cycles. The electrochromatic behavior has been demonstrated in WO3, electrodeposition, electrochromatic device, cyclic voltammetry, heat treatmentwavelength between 780 nm to 1050 nm.

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Worsley, Myles, Vera Smulders, and Bastian Mei. "Controlled Synthesis of Chromium-Oxide-Based Protective Layers on Pt: Influence of Layer Thickness on Selectivity." Catalysts 12, no. 10 (September 20, 2022): 1077. http://dx.doi.org/10.3390/catal12101077.

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Chromium-oxyhydroxide (CrxOyHz)-based thin films have previously been shown in photocatalysis and industrial chlorate production to prevent unwanted reduction reactions to occur, thereby enhancing the selectivity for hydrogen evolution and thus the overall process efficiency. Here, a highly reproducible synthesis protocol was developed to allow for the electrodeposition of CrxOyHz-based thin films with controlled thickness in the range of the sub-monolayer up to (>4) multilayer coverage. Electrodeposited CrxOyHz coatings were electrochemically characterized using voltammetry and stripping experiments, allowing thickness-dependent film selectivity to be deduced in detail. The results are discussed in terms of mass transport properties and structure of the electrodeposited chromium oxyhydroxide films. It is shown that the permeation of diatomic probe molecules, such as O2 and CO, was significantly reduced by films as thin as four monolayers. Importantly, it is shown that the prepared thin film coatings enabled prolonged hydrogen oxidation in the presence of CO (up to 5 vol.%), demonstrating the benefits of thin-film-protected electrocatalysts. In general, this study provides insight into the synthesis and use of thin-film-protected electrodes leading to improvements in (electro)catalyst selectivity and durability.

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Qiu, C. X., and I. Shih. "Investigation of electrodeposited CuInSe2 films." Canadian Journal of Physics 65, no. 8 (August 1, 1987): 1011–14. http://dx.doi.org/10.1139/p87-163.

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After a brief review of CuInSe2 films prepared using an electrophoretic technique, results obtained by an electrochemical deposition method will be described. The electrophoretic technique, which is simple, was first investigated and found to be unsuitable for CuInSe2-film deposition. Using the electrochemical deposition method, we obtained uniform and homogeneous CuInSe2 films. The quality of the films was then determined by scanning electron microscopy, electron-probe microanalysis, X-ray diffraction, and secondary-ion mass spectroscopy. Heterojunction cells of the form CdS–CuInSe2 were finally fabricated using the electrodeposited films. The devices showed an active-area AM1 short-circuit current density of more than 30 mA∙cm−2 and a Voc of about 0.2 V.

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Kojabad, Zohreh Deljoo, Sohrab Sanjabi, and Seyed Abbas Shojaosadati. "Electrodeposition of Gold and Polypyrrole Thin Films for Neural Microelectrodes." Advanced Materials Research 829 (November 2013): 337–41. http://dx.doi.org/10.4028/www.scientific.net/amr.829.337.

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A low impedance electrode/tissue interface is critically important for neural microelectrodes recording to maintain signal quality. In this study, gold/polypyrrol thin films used to decrease the interface impedance. Gold thin film was electrodeposited by cyclic voltammetry in the potential range of-0.3 to 1 volt on the stainless steel surface of microelectrodes with 127 micrometer in radius. Then polypyrrole was electrodeposited on the gold layer. Electrochemical impedance spectroscopy tests were performed for impedance measurement of microelectrode surface. The effect of morphology and thickness on the impedance of thin film was studied. The results showed that the impedance of the microelectrodes with gold/polypyrrol coatings was 38.2% lower than the electrodes without coating in the neural frequency.

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Zhu, Hongmei, Zhengjie Zhang, Minsu Liu, Weiren Fan, and Xuchuan Jiang. "Electrodeposited Vanadium Dioxide Films with Unique Optical Property." Journal of Nanoscience and Nanotechnology 19, no. 6 (June 1, 2019): 3597–603. http://dx.doi.org/10.1166/jnn.2019.16093.

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This study represents a facile but effective electrodeposition method to fabricate vanadium dioxide (VO2) thin films on fluorine doped tin oxide (FTO) glass at room temperature. The film microstructure (thickness, surface structure, particle size and composition) and relevant optical properties were investigated by several advanced techniques. The pertinent variables that can affect the thin film formation and structure, such as deposition potential, time and post-treatment annealing temperature were also studied. It was found that the film thickness could be tuned from 35 to 130 nm by adjusting the potential from −1.22 to −1.35 V, and consequently leading to optical transmittance decreasing from ∼60% to ∼38% in the wavelength of 500–1000 nm, further confirmed by computational simulations using three-dimension (3D) finite-difference time-domain method. The hysteresis loop of the generated VO2 film on FTO glass shows that the phase transition temperature from monoclinic to rutile is around 73 °C, a little higher than pure monoclinic VO2 (∼68 °C) in this study. This proposed electrodeposition method is possible to extend into obtaining metal oxide films with tuneable surface properties for thermochromic smart devices.

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Bharathi, B., S. Thanikaikarasan, P. V. Chandrasekar, Pratap Kollu, T. Mahalingam, and Luis Ixtlilco. "Studies on Electrodeposited NiS Thin Films." Journal of New Materials for Electrochemical Systems 17, no. 3 (October 3, 2014): 167–71. http://dx.doi.org/10.14447/jnmes.v17i3.417.

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Thin films of NiS have been deposited on indium doped tin oxide coated conducting glass substrates using electrodeposition technique. Structural studies revealed that the deposited films exhibit hexagonal structure with preferential orientation along (002) plane. Structural parameters such as crystallite size, strain and dislocation density are calculated for films with different thickness values obtained at various deposition time. The film composition and surface morphology have been analyzed using scanning electron microscopy and energy dispersive analysis by X-rays. Optical absorption analysis showed that the deposited films possess band gap value around 0.7 eV.

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Mladenovic, Ivana, Jelena Lamovec, Vesna Jovic, and Vesna Radojevic. "Synergetic effect of additives on the hardness and adhesion of thin electrodeposited copper films." Serbian Journal of Electrical Engineering 14, no. 1 (2017): 1–11. http://dx.doi.org/10.2298/sjee1701001m.

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Thin copper films were electrodeposited on a polycrystalline coldrolled copper substrate. The composition of the laboratory-made copper sulphate electrolyte was changed by the addition of various additives. The influence of chloride ion (Cl-), polyethylene glycol (PEG) and 3-mercapto-1-propane sulfonic acid (MPSA) on mechanical and adhesion properties of the electrodeposited copper films was investigated using Vickers microindentation technique. Calculations of the film hardness and adhesion were carried out using composite hardness models of Korsunsky and Chen-Gao. The hardness of the composite system is influenced by the adhesion of the copper film to the substrate. Increasing adhesion corresponds to increasing values of the calculated adhesion parameter b, named the critical reduced depth. When additives are added to a plating solution, the copper deposition mechanism is changed and fine-grained microstructure without the formation of microscopic nodules is obtained.

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Uda, Kyota, Yuya Harada, Tensho Nakamura, Yuki Tsuda, Lina Sun, Yoshiyuki Suzuri, and Tsukasa Yoshida. "Tuning of Morphological, Crystallographic and Optoelectronic Properties in Electrodeposition of CuSCN for Device Applications." ECS Meeting Abstracts MA2022-02, no. 64 (October 9, 2022): 2360. http://dx.doi.org/10.1149/ma2022-02642360mtgabs.

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Copper(I) thiocyanate (CuSCN) is known as a wide bandgap p-type semiconductor and recently demonstrated its high ability as a hole-transporting material in perovskite solar cells and light emitting diodes. Its thin film is usually fabricated by simple solution coating and drying [1]. In fact, little is known for physical properties of CuSCN, such as bandgap, band positions, optical transparency, carrier density and mobility. We have established methods to electrodeposit well-crystallized CuSCN thin films in various forms. Although the electrochemistry is fairly simple as limited by diffusion of 1 : 1 complex between Cu2+ and SCN- ions ([Cu(SCN)]+), the [Cu2+] : [SCN-] ratio, its absolute concentration and solvent can significantly alter the morphology and crystal orientation of resulting CuSCN [2]. These unique features of the electrodeposition technique let us anticipate possibilities to tailor-tune physical properties of CuSCN to match the demands for device applications. In this study, we have carried out electrodeposition of CuSCN to vary its morphology and crystal orientation by tuning the bath composition and studied their band structure to explore the room for tuning its physical properties for thin film diodes and hybrid electroluminescence devices. Morphologies of CuSCN thin films electrodeposited from stoichiometric (REF), Cu-rich and SCN-rich baths are shown in Figs. 1 a-c. While the REF sample has an open structure made of relatively large bulky particles, the Cu-rich sample is dense, made of tiny grains to expose their hexagonally shaped top. On the other hand, the one from the SCN-rich bath show rectangular sides of the grains (Fig. 1 a) and strongly oriented to lay down the c-axis in parallel with the substrate. XRD patterns have found almost parallel orientation for the SCN-rich and a high degree of preference of the Cu rich to orient the c-axis of β-CuSCN perpendicular to the substrate. Although all these films indicate nearly the same energy gap of about 3.6 eV estimated by Tauc plot, significant difference was found for their work function (WF) measured by photoelectron yield spectroscopy (PYS) (Fig. 2). The threshold energy moved downwards from 5.23 to 5.66 eV vs. VAC from Cu-rich to SCN-rich film. The result indicates a high level of p-type doping in the presence of excess SCN-, probably due to increased concentration of Cu2+ as stabilized by SCN- bound to it. Simple devices as ITO / electrodeposited CuSCN / Aluminium were fabricated to examine their diode behaviour. While all of the devices employing the electrodeposited CuSCN thin films showed good rectifications in the J-V curves, the onset voltage determined that to observe 5 mA/cm2 moved from 1.21 to 2.57 V (ITO being positive) from Cu-rich to SCN-rich samples to confirm tunability of the device property by conditions of the electrodeposition. Successful operation of organic light emitting diode was also achieved by employing the electrodeposited CuSCN as a hole-injection layer. The device employing the electrodeposited CuSCN achieved a smaller turn-on voltage than that with spin-coated CuSCN in the I-V-L measurements. [1] Vinod E. Madhavan et al., ACS Energy Lett. 2016, 1, 1112−1117. [2] Lina Sun et al., Physics Procedia, 2011, 14, 12-24. Figure 1

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KIM, MIN-YOUNG, and TAE-SUNG OH. "THERMOELECTRIC CHARACTERISTICS OF THE THERMOPILE SENSORS PROCESSED WITH THE ELECTRODEPOSITED Bi–Te AND Sb–Te THIN FILMS." Surface Review and Letters 17, no. 03 (June 2010): 311–16. http://dx.doi.org/10.1142/s0218625x10013813.

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A thermopile sensor composed of 196 pairs of p–n thin film legs was processed on a glass substrate by using successive electrodeposition of the n-type Bi–Te and the p-type Sb–Te thin films. The 5.3-μm thick Bi–Te film, electrodeposited at a constant voltage of -50 mV in the 50-mM electrolyte with the Bi/(Bi + Te) mole ratio of 0.5, exhibited a Seebeck coefficient of -67 μV/K. The 5.2-μm thick Sb–Te film, electrodeposited at a constant voltage of 20 mV in the 70-mM solution with the Sb/(Sb + Te) mole ratio of 0.9, possessed a Seebeck coefficient of 63 μV/K. The thermopile sensor exhibited the sensitivities of 13.1 mV/K with temperature differences smaller than 9 K and of 27.3 mV/K with temperature differences larger than 9 K respectively, across the hot and cold ends.

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Yang, Jun, Xiaoyun Xie, and Xunnan Deng. "ELECTRODEPOSITED p-CulnSe2 THIN FILM." Chinese Journal of Applied Chemistry 5, no. 4 (August 1, 1988): 58–60. http://dx.doi.org/10.3724/j.issn.1000-0518.1988.4.58.

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Dhanasekaran, V., T. Mahalingam, S. Rajendran, Jin Koo Rhee, and D. Eapen. "Electroplated CuO Thin Films from High Alkaline Solutions." Journal of New Materials for Electrochemical Systems 15, no. 1 (December 6, 2011): 49–55. http://dx.doi.org/10.14447/jnmes.v15i1.88.

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CuO thin films were coated on ITO substrates by an electrodeposition route through potentiostatic mode. The electrodeposited CuO thin films were characterized and the role of copper sulphate concentration on the structural, morphological and optical properties of the CuO films was studied. Film thickness was measured by a stylus profilometer and found to be in the range between 800 and 1400 nm. The structural characteristics studies were carried out using X-ray diffraction and found that the films are polycrystalline in nature with a cubic structure. The preferential orientation of CuO thin films is found to be along (111) plane. The estimated microstructural parameters revealed that the crystallite size increases whereas the number of crystallites per unit area decreases with increasing film thickness. SEM studies show that the grain sizes of CuO thin films vary between 100 and 150 nm and also morphologies revealed that the electrodeposited CuO exhibits uniformity in size and shape. The surface roughness is estimated 15 nm of the CuO film were studied by atomic force microscopy. Optical properties of the films were analyzed from absorption and transmittance studies. The optical band gap energy was determined to be 1.5 eV from absorption coefficient. The variation of refractive index (n), extinction coefficient (k), with wavelength was studied and the results are discussed.

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Loperena, A. P., I. L. Lehr, and S. B. Saidman. "Electrosynthesis of a Duplex Coating Consisting of a Cerium-Based Layer and a Polypyrrole Film for the Corrosion Protection of AISI 304 Stainless Steel." Journal of Material Science and Technology Research 8 (November 30, 2021): 1–11. http://dx.doi.org/10.31875/2410-4701.2021.08.1.

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Duplex coating consisting of an inner cerium-based layer and polypyrrole (PPy) film topcoat was electrodeposited onto AISI 304 stainless steel. The cerium-based coating was electrodeposited in solutions containing cerium nitrate at 50 ºC. The polymeric outer layer was electropolymerized in the presence of sodium bis(2-ethylhexyl) sulfosuccinate (AOT). The electrosynthesis was done under potentiostat conditions. The coatings were characterized by scanning electron microscopy (SEM) and energy dispersive x-ray spectrometry (EDX). The morphology of the double-layered cerium polypyrrole film shows a granular structure with the presence of agglomerates of small grains. The anticorrosive performance of the coatings was evaluated in sodium chloride solution by linear polarization, open circuit measurements, and electrochemical impedance spectroscopy (EIS). Single films, cerium layer and PPy coating, and the duplex film all reduce the corrosion rate of AISI 304 stainless steel in NaCl solution. The duplex coating presents an improved corrosion resistance concerning the single films. The combination of the characteristics of the single layers is responsible for the superior corrosion protection efficiency of the double-layered cerium polypyrrole coating.

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Wang, Jin Dong, and Fa Feng Xia. "Preparation and Characterization of Nanocomposite Ni-Al₂O₃ Thin Films by Ultrasonic-Electrodeposition Technology." Applied Mechanics and Materials 130-134 (October 2011): 994–97. http://dx.doi.org/10.4028/www.scientific.net/amm.130-134.994.

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Nanocomposite Ni-Al2O3 thin film containing nanosized Al2O3 particles had been grown on steel substrate by ultrasonic-electrodeposited technology. The optimum technological parameters of nanocomposite Ni-Al2O3 thin films were obtained by experiments and analysis. X-ray diffraction analysis was utilized to detect the crystalline and amorphous characteristics of Ni-Al2O3 thin films. The surface morphology and metallurgical structure were analysed by high resolution transmission electron microscope, and scanning electron microscope. The test results showed that nanocomposite Ni-Al2O3 thin films prepared by proper ultrasonic-electrodeposited method consist of nanometer-sized Al2O3 particles and nickel grains. And the Al2O3 nanoparticles and Ni grains diameters in thin films are about 40nm and 80nm, respectively.

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32

Lamovec, J., V. Jovic, M. Vorkapic, B. Popovic, V. Radojevic, and R. Aleksic. "Microhardness analysis of thin metallic multilayer composite films on copper substrates." Journal of Mining and Metallurgy, Section B: Metallurgy 47, no. 1 (2011): 53–61. http://dx.doi.org/10.2298/jmmb1101053l.

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Composite systems of alternately electrodeposited nanocrystalline Ni and Cu films on cold-rolled polycrystalline copper substrates were fabricated. Highly-densified parallel interfaces which can give rise to high strength of composites are obtained by depositing layers at a very narrow spacing. The hardness properties of the composite systems were characterized using Vickers microhardness testing with loads ranging from 1.96 N down to 0.049 N. Above a certain critical penetration depth, a measured hardness value is not the hardness of the electrodeposited film, but the so-called ?composite hardness?, because the substrate also participates in the plastic deformations during the indentation process. Dependence of microhardness on layer thickness, Ni/Cu layer thickness ratio and total thickness of the film was investigated. Model of Korsunsky was applied to the experimental data in order to determine the composite film hardness. The microhardness increased with decreasing the layer thickness down to 30 nm and it is consistent with the Hall-Petch relation. Layer thickness and layer thickness ratio are the important parameters which are responsible for making decision of the total film thickness.

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Chotibhawaris, Thanakrit, Luangvaranunt Tachai, Pongsakorn Jantaratana, and Yuttanant Boonyongmaneerat. "Influence of the Electrodeposited Co-Fe Alloys’ Characteristics on their Magnetic Properties." Advanced Materials Research 1025-1026 (September 2014): 709–16. http://dx.doi.org/10.4028/www.scientific.net/amr.1025-1026.709.

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Nanocrystalline CoFe films were fabricated by electrodeposition process for an investigation of the relationship between the alloys’ characteristics and their magnetic properties. The study shows that coating thickness promotes softer magnetic properties of the films, and induces changes of film roughness, preferred orientation and domain pattern. The preferred orientation of the ~1 μm films (thin films) is (110) plane, whereas that of the ~3 μm films (thick films) are (110) and (200) planes. The magnetic domain of the thin films exhibit a stripe-liked pattern, whereas a bubble-liked pattern appears in the thick films. Iron content significantly affects the magnetic properties of the thick films. In this study, the 57.3wt.%Fe thick film has the highest saturation magnetization, and the 80.0wt.%Fe thick film shows the lowest coercivity.

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Ma, Zhefan, and Qiang Huang. "Superconductivity of Electrodeposited Rhenium Alloys." ECS Meeting Abstracts MA2024-02, no. 23 (November 22, 2024): 1983. https://doi.org/10.1149/ma2024-02231983mtgabs.

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Superconductivity of Electrodeposited Rhenium Alloys Rhenium (Re) is a type I superconductor with an intrinsic superconducting transition temperature, or the critical temperature (Tc), at 1.7 K. Electrodeposited Re has been found to be in its amorphous state with an enhanced critical temperature of 6 K[1]. This enhancement enables superconductivity beyond the boiling point of liquid helium, i.e. 4.2K, facilitating the applications of Re in the connectivity for quantum devices. In addition, Re also maintains its ductility without undergoing ductile-to-brittle transition as temperature decreases, owing to its hexagonal close-packed (hcp) crystal structure[2], which further supports its accessibility to cryogenic electronic application, such as interconnects in quantum devices. However, this enhancement in T directly results from the amorphous or nanocrystalline grain structure and rapidly degrades upon Re recrystallization at elevated temperatures. In order to improve the thermal stability of the T of nanocrystalline Re or even further increase the Tc, rhenium films doped with other elements have been electrodeposited. For example, while alloying Re with Fe inhibits the recrystallization, the superconductivity of ReFe is found significantly suppressed. On the other hand, while Co doping suppresses the superconductivity to a much less degree, it has no impact on the recrystallization. Between these two alloying elements, both Fe and Co are ferromagnetic and have similar atomic radius. Yet, they have completely different crystal structures and are also different with respect to the Re host. The present work continues from previous studies to perform systematic comparison between dopants with various atomic radius, electronegativity, magnetism, and intrinsic crystallographic configurations to identify the determining factor for alloy superconductivity and the thermal stability. For example, Figure 1 shows the XRD patterns of as-deposited ReRu alloy films with controlled Ru contents as well as the same films after thermal annealing at various elevated temperatures. The electrodeposition is carried out on rotating Cu disk electrodes. The concentration of Re and Ru in electrolyte and the time of deposition are varied in order to achieve different composition and to keep film thickness between 300 and 400 nm. Film composition and thickness are measured using x-ray fluorescence spectroscopy (XRF). The film grain structure and superconductivity as well as their thermal stability will be discussed in detail in the presentation. Reference Pappas, D.P., et al., Enhanced superconducting transition temperature in electroplated rhenium. Applied Physics Letters, 2018. 112(18). Naor, A., et al., Properties and applications of rhenium and its alloys. Ammtiac Quarterly, 2010. 5(11). Malekpouri, B., K. Ahammed, and Q. Huang, Electrodeposition and superconductivity of rhenium-iron alloy films from water-in-salt electrolytes. Journal of Alloys and Compounds, 2022. 912: p. 165077. De, S., et al., Electrodeposition of superconducting rhenium-cobalt alloys from water-in-salt electrolytes. Journal of Electroanalytical Chemistry, 2020. 860: p. 113889. Figure 1. XRD patterns of rhenium-ruthenium alloy films (a) before annealing, after annealing at (b) 150 °C, (c) 200 °C, (d) 300 °C. XRD standards of pure Re and Cu are included in (c) and (d). Figure 1

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Renner, Robert F., and KNona C. Liddell. "Roughness development in electrodeposited ultrathin cobalt and nickel layers." Journal of Materials Research 15, no. 2 (February 2000): 458–62. http://dx.doi.org/10.1557/jmr.2000.0069.

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For both Co and Ni, a series of electrodeposited films of varying thickness (2–10 nm) was grown under otherwise identical conditions using potentiostatic control. The substrates were pieces of Si wafer onto which a Cu basal layer had been thermally evaporated. Contact mode atomic force microscopy was used to measure both the root-mean-square peak height (nm) and the areal peak density (μm−2) of each film. Root-mean-square (rms) peak heights for Co initially increase with film thickness and then plateau at a layer thickness of 3 nm. For Ni, the rms peak heights increase almost linearly for layer thicknesses less than 11 nm, reaching a value of 6 nm. Peak density shows the opposite trend, decreasing with layer thickness before reaching an approximately constant value for both metals at a film thickness of 4 nm. The atomic force microscopy data indicate that Ni and Co have different deposition mechanisms. A Co film initially nucleates rapidly; then the nucleation phase is followed by multinuclear, multilayer growth. Ni deposits also have initial rapid nucleation, but the dominant growth mode is primarily vertical, with increasing peak heights but no change in peak density. Increased peak density is linearly correlated with decreased peak height for the thinnest films in both systems.

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Miyake, Masao, Takashi Sugiura, and Tetsuji Hirato. "Preparation of Polycrystalline CdTe Films by Annealing of Amorphous Films Electrodeposited from Ammoniacal Alkaline Baths." High Temperature Materials and Processes 31, no. 4-5 (October 30, 2012): 553–57. http://dx.doi.org/10.1515/htmp-2012-0092.

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AbstractA new route to prepare polycrystalline CdTe films using electrodeposition of amorphous Cd-Te films and subsequent annealing was investigated. Amorphous Cd-Te films with Te-rich compositions could be electrodeposited from ammoniacal alkaline aqueous solutions. The deposition rate of the amorphous film was much higher than that of crystalline CdTe. Annealing of the Te-rich amorphous Cd-Te film at 400 °C in air yielded a crystallized CdTe film with a nearly stoichiometric composition. Thermodynamic calculations of the vapor pressures of Cd and Te species suggested that the decrease in the Te content of the annealed film was due to the vaporization of Te in the forms of oxides. Although an isothermal annealing generated a number of large holes in the film, an annealing with a slow temperature ramp resulted in a crystalline CdTe film without the large holes.

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Wang, Xuejiao, Jingyuan Bai, Meilin Zhang, Yuxi Chen, Longyi Fan, Zhou Yang, Jin Zhang, and Renguo Guan. "A Comparison between Porous to Fully Dense Electrodeposited CuNi Films: Insights on Electrochemical Performance." Nanomaterials 13, no. 3 (January 25, 2023): 491. http://dx.doi.org/10.3390/nano13030491.

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Nanostructuring of metals is nowadays considered as a promising strategy towards the development of materials with enhanced electrochemical performance. Porous and fully dense CuNi films were electrodeposited on a Cu plate by electrodeposition in view of their application as electrocatalytic materials for the hydrogen evolution reaction (HER). Porous CuNi film were synthesized using the hydrogen bubble template electrodeposition method in an acidic electrolyte, while fully dense CuNi were electrodeposited from a citrate-sulphate bath with the addition of saccharine as a grain refiner. The prepared films were characterized chemically and morphologically by scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDX), and X-ray diffraction (XRD). The Rietveld analysis of the XRD data illustrates that both CuNi films have a nanosized crystallite size. Contact angle measurements reveal that the porous CuNi film exhibits remarkable superhydrophobic behavior, and fully dense CuNi film shows hydrophilicity. This is predominately ascribed to the surface roughness of the two films. The HER activity of the two prepared CuNi films were investigated in 1 M KOH solution at room temperature by polarization measurements and electrochemical impedance spectroscopy (EIS) technique. Porous CuNi exhibits an enhanced catalysis for HER with respect to fully dense CuNi. The HER kinetics for porous film is processed by the Volmer–Heyrovsky reaction, whereas the fully dense counterpart is Volmer-limited. This study presents a clear comparison of HER behavior between porous and fully dense CuNi films.

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Sultan, Musaab S. "Magnetic and Electrical Properties of Electrodeposited Nickel Films." ARO-THE SCIENTIFIC JOURNAL OF KOYA UNIVERSITY 11, no. 2 (December 8, 2023): 191–200. http://dx.doi.org/10.14500/aro.11211.

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Magnetic and electrical properties of nickel (Ni) thin films produced by the electrodeposition technique under a range of growth times (30, 40, and 60 s) are investigated thoroughly using Magneto-Optical Kerr Effect (MOKE) magnetometry and Magneto-Resistance setup, respectively. To deeply understand these properties, the elemental composition, surface morphology, and bulk crystalline structure are analyzed using energy dispersive X-ray spectroscopy (EDS) with high-resolution scanning electronmicroscopy (HRSEM), grazing incidence X-ra y reflectivity(GIXR), and X-ray diffraction measurements, respectively. EDSanalysis confirms that these samples are free from impurities andcontamination. An increase in coercive fields (~67 Oe) with widedistribution (58–85 Oe) across the film area and a slight variationin the shape of the loops are noticed by decreasing the film growthtime (30 s). This is attributed to the deviations in the film surfacemorphology (defects), as confirmed by HRSEM and GIXRmeasurements. The angular dependence of the coercivity is nearlyconstant for each sample and most angles, indicating the similarityin the reversal behavior in such films.The sample resistance is foundto be ~20.3 Ω and ~2.8 Ω for films with growth times of 40 s and 60 s,respectively. The co ercivity of the AMR profiles and MOKE loops isconsistent with each other, indicating that the magnetization at thesurface performs similarly to that of their bulks. This article givesan indication that Ni films produced by this technique under suchconditions are soft at longer deposition times and largely isotropic,which is more preferable in some magnetic applications.

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Min, Hyeon-Gyu, Dong-Joong Kang, and Jun-Hyub Park. "Comparison of Tensile and Fatigue Properties of Copper Thin Film Depending on Process Method." Applied Sciences 10, no. 1 (January 4, 2020): 388. http://dx.doi.org/10.3390/app10010388.

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In this study, tensile and fatigue tests were performed and analyzed to evaluate an influence of fabrication method on mechanical characteristics of copper thin film which widely used in flexible printed circuit board (FPCB). In general, manufacturing methods are known to affect the mechanical properties of materials, especially for thin films. The copper thin film is manufactured by a rolling process or an electrodeposition process. Therefore, specimen for tensile and fatigue tests were fabricated using by etching process with the rolled and electrodeposited thin films. First, the tensile tests were performed to obtain the elastic modulus, 0.2% offset yield stress, and tensile strength of the rolled copper and the electrodeposited copper thin film. Second, the copper thin films in FPCB is most often subjected to mechanical or/and thermal cyclic loading. The fatigue tests were performed to compare the fatigue characteristics and to evaluate an influence of fabrication method. Tensile test results showed that the elastic modulus was similar for each process, but the 0.2% yield strength and ultimate tensile strength were greater in the rolling process. In addition, the fatigue test results show that the copper thin films by the rolling process are better than by the electrodeposition process in fatigue life in all region.

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Magnenet, Claire, Emmanuel Contal, Sophie Lakard, Sandrine Monney, and Boris Lakard. "Electrodeposited Copolymer Films with Tunable Conductivity." Electrochem 1, no. 4 (October 12, 2020): 358–66. http://dx.doi.org/10.3390/electrochem1040023.

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Conducting copolymer films were prepared from pyrrole (Py) and 1,12-di-(1-pyrrolyl) dodecane (DiPy) in an attempt to prepare conducting films that can be used as sensitive material of chemiresistor gas sensors. Copolymer thin films were obtained by electrochemical oxidation in a lithium perchlorate/acetonitrile electrolyte with different feed ratios of comonomers. Increasing the portion of DiPy in the comonomer mixture resulted in the formation of thinner and less rough copolymer films and to a modification of their morphology from a granular structure to a clover-like structure. In addition, copolymer films with very different conductivities were obtained by varying the comonomers ratio. Indeed, the conductivity of the copolymer containing 91% of Py was 2 × 105 times higher than the conductivity of the polymer containing 91% of DiPy, indicating that it is possible to tune the conductivity of the film by varying the composition of the initial comonomer mixture.

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Schulze, Maxwell C., Roland K. Schulze, and Amy L. Prieto. "Electrodeposited thin-film CuxSb anodes for Li-ion batteries: enhancement of cycle life via tuning of film composition and engineering of the film-substrate interface." Journal of Materials Chemistry A 6, no. 26 (2018): 12708–17. http://dx.doi.org/10.1039/c8ta01798k.

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Kim, Sung-Kyoung, Hee-Young Choi, Ha-Jin Lee, and Haiwon Lee. "Characteristics of Electrodeposited Single-Walled Carbon Nanotube Films." Journal of Nanoscience and Nanotechnology 6, no. 11 (November 1, 2006): 3614–18. http://dx.doi.org/10.1166/jnn.2006.17993.

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Thin films of chemically-functionalized single walled carbon nanotubes (SWNTs) were fabricated by using a direct current (DC) electrodeposition method. SWNTs were shortened and then functionalized with acid chloride group to combine with amine group-terminated gold substrate. The electrodeposited SWNT films were characterized by using Raman spectroscopy, attenuated total reflectance infrared (ATR/IR) spectrometry and atomic force microscopy. We demonstrated that the SWNT film was well distributed on an electrode with robust adhesion.

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OLUSOLA, O. O., and A. I. MUKOLU. "Investigating the Effect of Ph Variation on the Optoelectronic and Structural Properties of Electrodeposited Copper Selenide Thin Films." International Journal of Research and Innovation in Applied Science IX, no. IV (2024): 423–31. http://dx.doi.org/10.51584/ijrias.2024.904030.

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Copper Selenide (CuSe) thin film compound semiconductors have been deposited onto fluorine doped tin oxide (FTO) conducting substrates using electrodeposition technique through various electrolytic bath pH values of 2.00, 2.20, and 2.40. The deposition was carried out in potentiostatic mode using a 2-electrode system set-up at room temperature for 15 minutes at the cathodic voltage of 500 mV. The electrical and the optical properties of the thin films were carried out using photoelectrochemical (PEC) cells and ultraviolet visible spectrophotometer respectively. CuSe thin film possesses a p-type electrical conductivity and the sample grown at semiconductor and a pH of 2.2 was recorded to have the highest PEC signal and highest photo and dark currents that brings forth its maximum power. The energy band gap values of the electrodeposited CuSe thin films were observed to be 2.30 eV, 2.20 eV, and 2.00 eV at bath pH values of 2.0, 2.2, and 2.4 respectively. The optical band obtained at the various pH decreases as pH increases and these band gap values agree with the bulk band gap of CuSe. The preferred orientation peak of electrodeposited CuSe layers exists as klockmannite (CuSe) and the highest peak intensity for the preferred orientation peak occurred at pH of 2.20. At this pH value, the electrodeposited CuSe layers have the highest crystallite sizes.

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OLUSOLA, O. O., and A. I. MUKOLU. "Investigating the Effect of Ph Variation on the Optoelectronic and Structural Properties of Electrodeposited Copper Selenide Thin Films." International Journal of Research and Innovation in Applied Science IX, no. IV (2024): 448–56. http://dx.doi.org/10.51584/ijrias.2024.904033.

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Copper Selenide (CuSe) thin film compound semiconductors have been deposited onto fluorine doped tin oxide (FTO) conducting substrates using electrodeposition technique through various electrolytic bath pH values of 2.00, 2.20, and 2.40. The deposition was carried out in potentiostatic mode using a 2-electrode system set-up at room temperature for 15 minutes at the cathodic voltage of 500 mV. The electrical and the optical properties of the thin films were carried out using photoelectrochemical (PEC) cells and ultraviolet visible spectrophotometer respectively. CuSe thin film possesses a p-type electrical conductivity and the sample grown at semiconductor and a pH of 2.2 was recorded to have the highest PEC signal and highest photo and dark currents that brings forth its maximum power. The energy band gap values of the electrodeposited CuSe thin films were observed to be 2.30 eV, 2.20 eV, and 2.00 eV at bath pH values of 2.0, 2.2, and 2.4 respectively. The optical band obtained at the various pH decreases as pH increases and these band gap values agree with the bulk band gap of CuSe. The preferred orientation peak of electrodeposited CuSe layers exists as klockmannite (CuSe) and the highest peak intensity for the preferred orientation peak occurred at pH of 2.20. At this pH value, the electrodeposited CuSe layers have the highest crystallite sizes.

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Lizama-Tzec, Francisco Ivan, Marco de Jesús Cetina-Dorantes, Dallely Melissa Herrera-Zamora, Juan José Alvarado-Gil, Geonel Rodríguez-Gattorno, Manuel Alejandro Estrella-Gutiérrez, Octavio García-Valladares, Caridad Vales-Pinzón, and Gerko Oskam. "A Spray-Deposited Modified Silica Film on Selective Coatings for Low-Cost Solar Collectors." Coatings 14, no. 11 (October 27, 2024): 1368. http://dx.doi.org/10.3390/coatings14111368.

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Solar collectors represent an attractive green technology for water heating, where sunlight is efficiently absorbed by a selective coating and the generated heat is transferred to water. In this work, the improvement and scale-up of an electrodeposited black nickel selective coating with a modified silica (MS) film deposited by spray pyrolysis are reported. The MS material was prepared by the sol–gel method using tetraethyl orthosilicate with the addition of n-propyl triethoxysilane to obtain a porous film with an adequate refractive index and enhanced flexibility. The reflectance of electrodeposited selective coatings was characterized with and without the MS film and compared to a commercially available coating of black paint. The MS film increased the solar absorptance from 89% to 93% while maintaining a much lower thermal emittance than the painted coating. The reflectance of the MS film remained unchanged after prolonged thermal treatment at 200 °C (200 h). The fabrication process was scaled up to 193 cm × 12 cm copper fins, which were incorporated in commercial-size flat-plate solar collectors. Three complete collectors of an area of 1.7 m2 were fabricated and their performance was evaluated under outdoor conditions. The results show that the electrodeposited selective coating with the MS film outperformed both the commercial black paint system and the system without the modified silica film.

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Selvakumari, T. M. "Magnetic and Electroanalytical Properties of Electrodeposited FePtP Films." Asian Journal of Science and Applied Technology 1, no. 1 (May 5, 2012): 1–4. http://dx.doi.org/10.51983/ajsat-2012.1.1.691.

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FePtP films have been electrodeposited from a stable bath containing urea. By adjusting the current density and solution composition one can control the composition of the film. Effect of concentration of urea was studied. Vibration sample magnetometric studies indicate that urea has favourable impact on the magnetic properties of these films. Electroanalytical parameters like reduction potential and current for the FePtP deposition were studied using cyclic voltammeter. Reasons for variation in magnetic and electroanalytical properties are discussed.

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SHINOURA, Osamu, and Akifumi KAMIJIMA. "Magnetic Properties of Electrodeposited CoFe Film." Journal of the Surface Finishing Society of Japan 44, no. 12 (1993): 1114–18. http://dx.doi.org/10.4139/sfj.44.1114.

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Kul, Metin. "Electrodeposited SnS film for photovoltaic applications." Vacuum 107 (September 2014): 213–18. http://dx.doi.org/10.1016/j.vacuum.2014.02.005.

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Kang, Soon Hyung, Yu-Kyung Kim, Don-Soo Choi, and Yung-Eun Sung. "Characterization of electrodeposited CuInSe2 (CIS) film." Electrochimica Acta 51, no. 21 (June 2006): 4433–38. http://dx.doi.org/10.1016/j.electacta.2005.12.021.

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Li, Hongjie, Weizhi Zhang, Xi Yuan, Puzhi Li, Weilei Han, and Hongbing Huang. "Preparation of Chromium Carbide-Strengthened Ni-W Coatings by Electrodeposition and the Corresponding Anticorrosion Behavior in CO2-Saturated NaCl Solution." Coatings 14, no. 11 (October 31, 2024): 1386. http://dx.doi.org/10.3390/coatings14111386.

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In this study, we have prepared Ni-W/Cr3C2 composite electrodeposits through the diffuse reinforcement mechanism of chromium carbide nanoparticles. These electrodeposits exhibit excellent corrosion resistance and are designed to effectively protect the structural materials of pipe columns under the harsh CO2 corrosion environments faced by carbon sequestration and utilization technologies. A systematic investigation was conducted into the micro-morphology, profile undulation, phase composition, and surface chemical state of the electrodeposits. Furthermore, the corrosion-resistant behavior of Ni-W/Cr3C2 composite electrodeposits was investigated in simulated corrosive environments (i.e., brine solution containing 3.5 wt% NaCl and CO2-saturated brine). We then evaluated their corrosion response under the aforementioned conditions using electrochemical methods. In addition, the EIS of electrodeposited coatings revealed that the dense oxide film layer formed on the surface of the deposits, which acted as a primary barrier against corrosion, playing a pivotal role in maintaining the overall corrosion resistance of the material.

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Journal articles on the topic 'Electrodeposited film'

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