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Journal articles on the topic 'DIRECT LASER WRITING LITHOGRAPHY'

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Author: Grafiati

Published: 10 March 2023

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1

Rensch, Clemens, Stefan Hell, Manfred v. Schickfus, and Siegfried Hunklinger. "Laser scanner for direct writing lithography." Applied Optics 28, no. 17 (September 1, 1989): 3754. http://dx.doi.org/10.1364/ao.28.003754.

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2

Ulrich, H., R. W. Wijnaendts-van-Resandt, C. Rensch, and W. Ehrensperger. "Direct writing laser lithography for production of microstructures." Microelectronic Engineering 6, no. 1-4 (December 1987): 77–84. http://dx.doi.org/10.1016/0167-9317(87)90019-0.

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3

Ni, Haibin, Guanghui Yuan, Liangdong Sun, Ning Chang, Di Zhang, Ruipeng Chen, Liyong Jiang, Hongyuan Chen, Zhongze Gu, and Xiangwei Zhao. "Large-scale high-numerical-aperture super-oscillatory lens fabricated by direct laser writing lithography." RSC Advances 8, no. 36 (2018): 20117–23. http://dx.doi.org/10.1039/c8ra02644k.

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4

Guney, M. G., and G. K. Fedder. "Estimation of line dimensions in 3D direct laser writing lithography." Journal of Micromechanics and Microengineering 26, no. 10 (September 7, 2016): 105011. http://dx.doi.org/10.1088/0960-1317/26/10/105011.

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5

Sun, Hong-Bo, Atsushi Nakamura, Koshiro Kaneko, Satoru Shoji, and Satoshi Kawata. "Direct laser writing defects in holographic lithography-created photonic lattices." Optics Letters 30, no. 8 (April 15, 2005): 881. http://dx.doi.org/10.1364/ol.30.000881.

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6

Harke, Benjamin, Paolo Bianchini, Fernando Brandi, and Alberto Diaspro. "Photopolymerization Inhibition Dynamics for Sub-Diffraction Direct Laser Writing Lithography." ChemPhysChem 13, no. 6 (March 5, 2012): 1429–34. http://dx.doi.org/10.1002/cphc.201200006.

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7

Wang Hongqing, 王洪庆, 温积森 Wen Jisen, 杨臻垚 Yang Zhenyao, 汤孟博 Tang Mengbo, 孙秋媛 Sun Qiuyuan, 马程鹏 Ma Chengpeng, 王子昂 Wang Ziang, et al. "高速并行双光子激光直写光刻系统." Chinese Journal of Lasers 49, no. 22 (2022): 2202009. http://dx.doi.org/10.3788/cjl202249.2202009.

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8

Hu, Jin, D. L. Pu, and Lin Sen Chen. "The Deep Etching Process Based on Parallel Laser Direct Writing System." Key Engineering Materials 426-427 (January 2010): 265–69. http://dx.doi.org/10.4028/www.scientific.net/kem.426-427.265.

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Due to the high cost-effectiveness, extra flexibility, and short production cycle, laser direct writing system as a kind of maskless lithography technology has been widely used in the fields of micro-nano-manufacturing. The working principle of the parallel laser direct writing system based on DMD(Digital Micromirror Device) is introduced. A novel negative photoresist -- dry film photoresist is adopted into the study of deep etching for the fabrication of the micro mold. The experimental results show that: the whole process is convenient, efficient and flexible; the precision of the 2-D patterning and the depth of etching is reliable.

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9

Yuan, Chenyu, Jukun Liu, Tianqing Jia, Kan Zhou, Hongxin Zhang, Jia Pan, Donghai Feng, and Zhenrong Sun. "Super resolution direct laser writing in ITX resist inspired by STED microscopy." Journal of Nonlinear Optical Physics & Materials 23, no. 02 (June 2014): 1450015. http://dx.doi.org/10.1142/s0218863514500155.

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Direct laser writing (DLW) has become a routine tool for fabricating microstructures through two photon polymerization. Due to the diffraction limit, the resolution is usually larger than a quarter of a wavelength. In this article, by using stimulated emission depletion (STED) inspired lithography, we fabricate nanodot of 81 nm in diameter and nanoline of 93 nm in width in resist with initiator of isopropyl thioxanthone (ITX). An 800 nm, 75-MHz fs laser works as the polymerization light and a 532 nm donut mode continuous wave (CW) laser as the depletion light. This technology is potentially useful for fabrication of super resolution nanostructures.

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10

Cara, Eleonora, Federico Ferrarese Lupi, Matteo Fretto, Natascia De Leo, Mauro Tortello, Renato Gonnelli, Katia Sparnacci, and Luca Boarino. "Directed Self-Assembly of Polystyrene Nanospheres by Direct Laser-Writing Lithography." Nanomaterials 10, no. 2 (February 7, 2020): 280. http://dx.doi.org/10.3390/nano10020280.

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In this work, we performed a systematic study on the effect of the geometry of pre-patterned templates and spin-coating conditions on the self-assembling process of colloidal nanospheres. To achieve this goal, large-scale templates, with different size and shape, were generated by direct laser-writer lithography over square millimetre areas. When deposited over patterned templates, the ordering dynamics of the self-assembled nanospheres exhibits an inverse trend with respect to that observed for the maximisation of the correlation length ξ on a flat surface. Furthermore, the self-assembly process was found to be strongly dependent on the height (H) of the template sidewalls. In particular, we observed that, when H is 0.6 times the nanospheres diameter and spinning speed 2500 rpm, the formation of a confined and well ordered monolayer is promoted. To unveil the defects generation inside the templates, a systematic assessment of the directed self-assembly quality was performed by a novel method based on Delaunay triangulation. As a result of this study, we found that, in the best deposition conditions, the self-assembly process leads to well-ordered monolayer that extended for tens of micrometres within the linear templates, where 96.2% of them is aligned with the template sidewalls.

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11

Eschenbaum, Carsten, Daniel Großmann, Katja Dopf, Siegfried Kettlitz, Tobias Bocksrocker, Sebastian Valouch, and Uli Lemmer. "Hybrid lithography: Combining UV-exposure and two photon direct laser writing." Optics Express 21, no. 24 (November 26, 2013): 29921. http://dx.doi.org/10.1364/oe.21.029921.

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12

Kim, H. S., B. H. Son, Y. C. Kim, and Y. H. Ahn. "Direct laser writing lithography using a negative-tone electron-beam resist." Optical Materials Express 10, no. 11 (October 9, 2020): 2813. http://dx.doi.org/10.1364/ome.409302.

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13

Fischer, Joachim, Georg von Freymann, and Martin Wegener. "The Materials Challenge in Diffraction-Unlimited Direct-Laser-Writing Optical Lithography." Advanced Materials 22, no. 32 (June 30, 2010): 3578–82. http://dx.doi.org/10.1002/adma.201000892.

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14

Shoji, Masaaki, Hideo Jotaki, Masaaki Moriyama, and Kentaro Totsu. "Evaluation of Thick-Film Photoresist for Grayscale Lithography Utilizing Direct Laser Writing." IEEJ Transactions on Sensors and Micromachines 140, no. 5 (May 1, 2020): 113–18. http://dx.doi.org/10.1541/ieejsmas.140.113.

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15

Braun, Avi, and Stefan Alexander Maier. "Versatile Direct Laser Writing Lithography Technique for Surface Enhanced Infrared Spectroscopy Sensors." ACS Sensors 1, no. 9 (August 17, 2016): 1155–62. http://dx.doi.org/10.1021/acssensors.6b00469.

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16

Hasan, Md Nazmul, Muttahid-Ull Haque, Jonathan Trisno, and Yung-Chun Lee. "Direct-writing lithography using laser diode beam focused with single elliptical microlens." Journal of Micro/Nanolithography, MEMS, and MOEMS 14, no. 4 (November 2, 2015): 043505. http://dx.doi.org/10.1117/1.jmm.14.4.043505.

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17

Butkus, Antanas, Edvinas Skliutas, Darius Gailevičius, and Mangirdas Malinauskas. "Femtosecond-laser direct writing 3D micro/nano-lithography using VIS-light oscillator." Journal of Central South University 29, no. 10 (October 2022): 3270–76. http://dx.doi.org/10.1007/s11771-022-5153-z.

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18

Meisel, D. C., M. Deubel, M. Hermatschweiler, K. Busch, W. Koch, G. von Freymann, A. Blanco, C. Enkrich, and M. Wegener. "Three-Dimensional Photonic Crystals." Solid State Phenomena 99-100 (July 2004): 55–64. http://dx.doi.org/10.4028/www.scientific.net/ssp.99-100.55.

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We review our work on two complementary and compatible techniques, namely direct laser writing and holographic lithography which are suitable for fabricating three-dimensional Photonic Crystal templates for the visible and near-infrared. The structures are characterized by electron micrographs and by optical spectroscopy, revealing their high optical quality.

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19

Fallica, Roberto. "Beyond grayscale lithography: inherently three-dimensional patterning by Talbot effect." Advanced Optical Technologies 8, no. 3-4 (June 26, 2019): 233–40. http://dx.doi.org/10.1515/aot-2019-0005.

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Abstract There are a growing number of applications where three-dimensional patterning is needed for the fabrication of micro- and nanostructures. Thus far, grayscale lithography is the main technique for obtaining a thickness gradient in a resist material that is exploited for pattern transfer by anisotropic etch. However, truly three-dimensional structures can only be produced by unconventional lithography methods such as direct laser writing, focused ion beam electrodeposition, colloidal sphere lithography, and tilted multiple-pass projection lithography, but at the cost of remarkable complexity and lengthiness. In this work, the three-dimensional shape of light, which is formed by Talbot effect diffraction, was exploited to produce inherently three-dimensional patterns in a photosensitive polymer. Using light in the soft X-ray wavelength, periodic three-dimensional structures of lateral period 600 nm were obtained. The position at which the sample has to be located to be in the Fresnel regime was simulated using an analytical implementation of the Fresnel integrals approach. Exploiting the light shape forming in diffraction effects thus enables the patterning of high-resolution three-dimensional nanostructures over a large area and with a single exposure pass – which would be otherwise impossible with conventional lithographic methods.

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20

Yu, Luming, Boyang Lu, Ping Yu, Yang Wang, Guojian Ding, Qi Feng, Yang Jiang, et al. "Ultra-small size (1–20 μm) blue and green micro-LEDs fabricated by laser direct writing lithography." Applied Physics Letters 121, no. 4 (July 25, 2022): 042106. http://dx.doi.org/10.1063/5.0099642.

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Ultra-small micro-LEDs are essential for next-generation display technology. However, micro-LEDs below 5 μm have been seldom reported. In this work, we demonstrate InGaN-based blue and green micro-LEDs from 1 to 20 μm by using laser direct writing lithography. The 1-μm blue micro-LEDs show a peak external quantum efficiency of 13.02%, which is 9.57% for green ones. By characterizing the size-dependent external quantum efficiency and simply assuming that this variety is dominantly determined by the dry-etching induced dead zone, we deduce that the dead zone sizes of carrier injection at the edge of chips are 0.18 and 0.15 μm in blue and green ones, respectively. A time-resolved photoluminescence measurement also shows that carrier lifetime reduction at the edge of blue ones is more serious than that of green ones, reflecting the easier carrier lateral diffusion in the former than the latter. These results exhibit the ability of laser direct writing lithography on micro-LED fabrication and also provide a reference for predicting the limit of their chip size scaling-down.

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21

Jaramillo, Juan, Artur Zarzycki, July Galeano, and Patrick Sandoz. "Performance Characterization of an xy-Stage Applied to Micrometric Laser Direct Writing Lithography." Sensors 17, no. 2 (January 31, 2017): 278. http://dx.doi.org/10.3390/s17020278.

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22

Fan Changjiang, 范长江, 徐建程 Xu Jiancheng, 任志君 Ren Zhijun, 应朝福 Ying Chaofu, and 王辉 Wang Hui. "Performance of high-order spiral phase plate made by direct laser writing lithography." High Power Laser and Particle Beams 23, no. 12 (2011): 3283–86. http://dx.doi.org/10.3788/hplpb20112312.3283.

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23

Lim, Miles P., Xiaofei Guo, Eva L. Grunblatt, Garrett M. Clifton, Ayda N. Gonzalez, and Christopher N. LaFratta. "Augmenting mask-based lithography with direct laser writing to increase resolution and speed." Optics Express 26, no. 6 (March 8, 2018): 7085. http://dx.doi.org/10.1364/oe.26.007085.

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24

Žukauskas, Albertas, Ieva Matulaitienė, Domas Paipulas, Gediminas Niaura, Mangirdas Malinauskas, and Roaldas Gadonas. "Tuning the refractive index in 3D direct laser writing lithography: towards GRIN microoptics." Laser & Photonics Reviews 9, no. 6 (October 29, 2015): 706–12. http://dx.doi.org/10.1002/lpor.201500170.

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25

Bückmann, Tiemo, Nicolas Stenger, Muamer Kadic, Johannes Kaschke, Andreas Frölich, Tobias Kennerknecht, Christoph Eberl, Michael Thiel, and Martin Wegener. "Tailored 3D Mechanical Metamaterials Made by Dip-in Direct-Laser-Writing Optical Lithography." Advanced Materials 24, no. 20 (April 12, 2012): 2710–14. http://dx.doi.org/10.1002/adma.201200584.

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26

Zhou Guozun, 周国尊, 何敏菲 He Minfei, 杨臻垚 Yang Zhenyao, 曹春 Cao Chun, 谢飞 Xie Fei, 曹耀宇 Cao Yaoyu, 匡翠方 Kuang Cuifang, and 刘旭 Liu Xu. "基于边缘光抑制技术的双光束激光直写纳米光刻系统." Chinese Journal of Lasers 49, no. 2 (2022): 0202001. http://dx.doi.org/10.3788/cjl202249.0202001.

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27

Bae, Garam, Moonjeong Jang, Yeong Min Kwon, Wooseok Song, Sun Sook Lee, and Ki-Seok An. "Photon-Pen Writing for Metal Oxide-Based Versatile Nanosensors." ECS Meeting Abstracts MA2022-02, no. 63 (October 9, 2022): 2474. http://dx.doi.org/10.1149/ma2022-02632474mtgabs.

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Low-temperature processes and simplification of lithographic techniques are key challenges for the fabrication of solution-processed metal oxide-based nanodevices. Recent breakthroughs in location-specific synthetic methodologies involving inkjet printing and photon-activation routes have enabled lithography-free and bottom-up fabrication of such devices. However, a revolutionary strategy to resolve room-temperature direct fabrication of metal oxide-based materials still remains elusive. Here, a pertinent route enabling wafer-scale, location-specific direct-writing, termed “photon-pen writing (PPW),” of functional metal oxide-based devices is proposed. Using PPW, fabrication of elaborate patterns of metal oxides is demonstrated through location-specific dechlorination and subsequent oxidation via thermal energy transfer of a focused infrared laser in ambient environment. By tailoring process parameters, precise manipulation of the chemical and structural features of the PPW-produced metal-oxide patterns are demonstrated. The versatility of the PPW process by realizing a highly sensitive, stable, uniform, and wafer-scale nanosensor array for gas and light detection using PPW-ZnO channel and PPW-ITO electrodes is demonstrated, with 4.1% of response at 50 ppb NO2 and 2.93 ± 0.23 µA of photocurrent for 0.76 mW cm−2 , 254 nm UV light. A new route toward wafer-scale production of bespoke nanosensor arrays onto single chip for next-generation nanoelectronics is introduced.

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28

Brenner, Philipp, Ofer Bar-On, Tobias Siegle, Tobias Leonhard, Raz Gvishi, Carsten Eschenbaum, Heinz Kalt, Jacob Scheuer, and Uli Lemmer. "3D whispering-gallery-mode microlasers by direct laser writing and subsequent soft nanoimprint lithography." Applied Optics 56, no. 13 (April 24, 2017): 3703. http://dx.doi.org/10.1364/ao.56.003703.

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29

Mizera, Tomas, Peter Gaso, Dusan Pudis, Martin Ziman, Anton Kuzma, and Matej Goraus. "3D Polymer-Based 1 × 4 MMI Splitter." Nanomaterials 12, no. 10 (May 20, 2022): 1749. http://dx.doi.org/10.3390/nano12101749.

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Due to the increasing trend of photonic device miniaturisation, there is also an increased need for optical splitting in a small volume. We propose a smart solution to split light in three dimensions (3D). A 3D optical splitter based on multimode interference (MMI) for the wavelength of 1550 nm is here designed, simulated, fabricated and optimised for splitting at 1550 nm. We focus also on the possibility of its direct integration on an optical fibre. The design is focused on the use of 3D laser lithography based on the direct laser writing (DLW) process. The output characteristics are investigated by near-field measurement, where we confirm the successful 1 × 4 splitting on a 158 µm long MMI splitter.

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30

Pisanello, Marco, Di Zheng, Antonio Balena, Filippo Pisano, Massimo De Vittorio, and Ferruccio Pisanello. "An open source three-mirror laser scanning holographic two-photon lithography system." PLOS ONE 17, no. 4 (April 15, 2022): e0265678. http://dx.doi.org/10.1371/journal.pone.0265678.

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Two-photon polymerization is a widely adopted technique for direct fabrication of 3D and 2D structures with sub-diffraction-limit features. Here we present an open-hardware, open-software custom design for a holographic multibeam two-photon polymerization system based on a phase-only spatial light modulator and a three-mirror scanhead. The use of three reflective surfaces, two of which scanning the phase-modulated image along the same axis, allows to overcome the loss of virtual conjugation within the large galvanometric mirrors pair needed to accommodate the holographic projection. This extends the writing field of view among which the hologram can be employed for multi-beam two-photon polymerization by a factor of ~2 on one axis (i.e. from ~200μm to ~400μm), with a voxel size of ~250nm × ~1050nm (lateral × axial size), and writing speed of three simultaneous beams of 2000 voxels/s, making our system a powerful and reliable tool for advanced micro and nano-fabrications on large area.

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31

de Miguel, Gustavo, Giuseppe Vicidomini, Martí Duocastella, and Alberto Diaspro. "Selective fluorescence functionalization of dye-doped polymerized structures fabricated by direct laser writing (DLW) lithography." Nanoscale 7, no. 47 (2015): 20164–70. http://dx.doi.org/10.1039/c5nr06071k.

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32

Lightman, Shlomi, Raz Gvishi, Gilad Hurvitz, and Ady Arie. "Comparative analysis of direct laser writing and nanoimprint lithography for fabrication of optical phase elements." Applied Optics 55, no. 34 (November 23, 2016): 9724. http://dx.doi.org/10.1364/ao.55.009724.

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33

Duocastella, Martí, Giuseppe Vicidomini, Kseniya Korobchevskaya, Katarzyna Pydzińska, Marcin Ziółek, Alberto Diaspro, and Gustavo de Miguel. "Improving the Spatial Resolution in Direct Laser Writing Lithography by Using a Reversible Cationic Photoinitiator." Journal of Physical Chemistry C 121, no. 31 (July 28, 2017): 16970–77. http://dx.doi.org/10.1021/acs.jpcc.7b03591.

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34

Ahn, Jinseong, Changui Ahn, Seokwoo Jeon, and Junyong Park. "Atomic Layer Deposition of Inorganic Thin Films on 3D Polymer Nanonetworks." Applied Sciences 9, no. 10 (May 15, 2019): 1990. http://dx.doi.org/10.3390/app9101990.

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Atomic layer deposition (ALD) is a unique tool for conformally depositing inorganic thin films with precisely controlled thickness at nanoscale. Recently, ALD has been used in the manufacture of inorganic thin films using a three-dimensional (3D) nanonetwork structure made of polymer as a template, which is pre-formed by advanced 3D nanofabrication techniques such as electrospinning, block-copolymer (BCP) lithography, direct laser writing (DLW), multibeam interference lithography (MBIL), and phase-mask interference lithography (PMIL). The key technical requirement of this polymer template-assisted ALD is to perform the deposition process at a lower temperature, preserving the nanostructure of the polymer template during the deposition process. This review focuses on the successful cases of conformal deposition of inorganic thin films on 3D polymer nanonetworks using thermal ALD or plasma-enhanced ALD at temperatures below 200 °C. Recent applications and prospects of nanostructured polymer–inorganic composites or hollow inorganic materials are also discussed.

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35

Grauzeliene, Sigita, Aukse Navaruckiene, Edvinas Skliutas, Mangirdas Malinauskas, Angels Serra, and Jolita Ostrauskaite. "Vegetable Oil-Based Thiol-Ene/Thiol-Epoxy Resins for Laser Direct Writing 3D Micro-/Nano-Lithography." Polymers 13, no. 6 (March 12, 2021): 872. http://dx.doi.org/10.3390/polym13060872.

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The use of renewable sources for optical 3D printing instead of petroleum-based materials is increasingly growing. Combinations of photo- and thermal polymerization in dual curing processes can enhance the thermal and mechanical properties of the synthesized thermosets. Consequently, thiol-ene/thiol-epoxy polymers were obtained by combining UV and thermal curing of acrylated epoxidized soybean oil and epoxidized linseed oil with thiols, benzene-1,3-dithiol and pentaerythritol tetra(3-mercaptopropionate). Thiol-epoxy reaction was studied by calorimetry. The changes of rheological properties were examined during UV, thermal and dual curing to select the most suitable formulations for laser direct writing (LDW). The obtained polymers were characterized by dynamic-mechanical thermal analysis, thermogravimetry, and mechanical testing. The selected dual curable mixture was tested in LDW 3D lithography for validating its potential in optical micro- and nano-additive manufacturing. The obtained results demonstrated the suitability of epoxidized linseed oil as a biobased alternative to bisphenol A diglycidyl ether in thiol-epoxy thermal curing reactions. Dual cured thermosets showed higher rigidity, tensile strength, and Young’s modulus values compared with UV-cured thiol-ene polymers and the highest thermal stability from all prepared polymers. LDW results proved their suitability for high resolution 3D printing—individual features reaching an unprecedented 100 nm for plant-based materials. Finally, the biobased resin was tested for thermal post-treatment and 50% feature downscaling was achieved.

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36

Lu, Yu, Wei Wu, and Ke-yi Wang. "High-Speed Transmission and Mass Data Storage Solutions for Large-Area and Arbitrarily Structured Fabrication through Maskless Lithography." Journal of Electrical and Computer Engineering 2016 (2016): 1–7. http://dx.doi.org/10.1155/2016/6074791.

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This paper presents the implementation aspects and design of high-speed data transmission in laser direct-writing lithography. With a single field programmable gate array (FPGA) chip, mass data storage management, transmission, and synchronization of each part in real-time were implemented. To store a massive amount of data and transmit data with high bandwidth, a serial advanced technology attachment (SATA) intellectual property (IP) was developed on Xilinx Virtex-6 FPGA. In addition, control of laser beam power, collection of status read back data of the lithography laser through an analog-to-digital converter, and synchronization of the positioning signal were implemented on the same FPGA. A data structure for each unit with a unique exposure dose and other necessary information was established. Results showed that the maximum read bandwidth (240 MB/s) and maximum write bandwidth (200 MB/s) of a single solid-state drive conform to the data transmission requirement. The total amount of data meets the requirement of a large-area diffractive element approximately 102 cm2. The throughput has been greatly improved at meters per second or square centimeter per second. And test results showed that data transmission meets the requirement of the experiment.

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37

Bakhchova, Liubov, Linas Jonušauskas, Dovilė Andrijec, Marharyta Kurachkina, Tomas Baravykas, Alexey Eremin, and Ulrike Steinmann. "Femtosecond Laser-Based Integration of Nano-Membranes into Organ-on-a-Chip Systems." Materials 13, no. 14 (July 10, 2020): 3076. http://dx.doi.org/10.3390/ma13143076.

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Organ-on-a-chip devices are gaining popularity in medical research due to the possibility of performing extremely complex living-body-resembling research in vitro. For this reason, there is a substantial drive in developing technologies capable of producing such structures in a simple and, at the same time, flexible manner. One of the primary challenges in producing organ-on-chip devices from a manufacturing standpoint is the prevalence of layer-by-layer bonding techniques, which result in limitations relating to the applicable materials and geometries and limited repeatability. In this work, we present an improved approach, using three dimensional (3D) laser lithography for the direct integration of a functional part—the membrane—into a closed-channel system. We show that it allows the freely choice of the geometry of the membrane and its integration into a complete organ-on-a-chip system. Considerations relating to sample preparation, the writing process, and the final preparation for operation are given. Overall, we consider that the broader application of 3D laser lithography in organ-on-a-chip fabrication is the next logical step in this field’s evolution.

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38

Chen, Cheng, Yanhua Liu, Zhou-ying Jiang, Chong Shen, Ye Zhang, Fan Zhong, Linsen Chen, Shining Zhu, and Hui Liu. "Large-area long-wave infrared broadband all-dielectric metasurface absorber based on markless laser direct writing lithography." Optics Express 30, no. 8 (April 6, 2022): 13391. http://dx.doi.org/10.1364/oe.447783.

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39

Lima, Frederico, Isman Khazi, Ulrich Mescheder, Alok C. Tungal, and Uma Muthiah. "Fabrication of 3D microstructures using grayscale lithography." Advanced Optical Technologies 8, no. 3-4 (June 26, 2019): 181–93. http://dx.doi.org/10.1515/aot-2019-0023.

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Abstract Following the demand for three-dimensional (3D) micromachined structures, additive and subtractive processes were developed for fabrication of real 3D shapes in metals, alloys and monocrystalline Si (c-Si). As a primary structuring step for well-defined 3D structuring of the photoresist, grayscale lithography by laser direct writing was used. For additive fabrication of 3D microstructures, structured photoresist was used as molds. They were sputtered and subsequently electroplated by a metal (Cu) and an alloy (NiCo). The derived electroplated structures were demolded from the photoresist using an organic stripper. These metal structures are satisfactory replicas of the photoresist pattern. For subtractive pattern transfer of 3D structures into c-Si, reactive ion etching (RIE) was used to transfer the 3D photoresist structure into c-Si with 1:1 pattern transferability. The process parameters of RIE were optimized to obtain a selectivity of 1 and an anisotropy factor close to 1. Whereas conventional X-ray lithography (LIGA) and nanoimprint lithography result in 2.5D patterns, these techniques allow the fabrication of almost any arbitrary 3D shapes with high accuracy. In many cases, 3D structures (‘free forms’) are required, e.g. for molding of optical components such as spheres (or aspheres), channels for lab-on-a-chip and pillars for biological applications. Moreover, 3D structures on Si could be used as optical gratings and sensors.

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40

Egorov, Anton E., Alexey A. Kostyukov, Denis A. Shcherbakov, Danila A. Kolymagin, Dmytro A. Chubich, Rilond P. Matital, Maxim V. Arsenyev, et al. "Benzylidene Cyclopentanone Derivative Photoinitiator for Two-Photon Photopolymerization-Photochemistry and 3D Structures Fabrication for X-ray Application." Polymers 15, no. 1 (December 24, 2022): 71. http://dx.doi.org/10.3390/polym15010071.

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Micron- and submicron-scale 3D structure realization nowadays is possible due to the two-photon photopolymerization (TPP) direct laser writing photolithography (DLW photolithography) method. However, the achievement of lithographic features with dimensions less than 100 nm is in demand for the fabrication of micro-optical elements with high curvature values, including X-ray microlenses. Spectroscopic and photochemical study of a photoinitiator (PI) based on a methyl methacrylate derivative of 2,5-bis(4-(dimethylamino)benzylidene) cyclopentanone was performed. Enhanced intersystem crossing in the methyl methacrylate derivative results in increased radical generation for the subsequent initiation of polymerization. A comprehensive study of the new photocompositions was performed, with particular emphasis on photochemical constants, the degree of photopolymerization, and topology. The optimal parameters for the fabrication of mechanically stable structures were determined in this research. The threshold dose parameters for lithography (radiation power of 5 mW at a speed of 180 µm/s) when trying to reach saturation values with a conversion degree of (35 ± 1) % were defined, as well as parameters for sub-100 nm feature fabrication. Moreover, the 45 nm feature size for elements was reached. Fabrication of X-ray lens microstructures was also demonstrated.

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Urbancova, Petra, Dusan Pudis, Matej Goraus, and Jaroslav Kovac. "IP-Dip-Based SPR Structure for Refractive Index Sensing of Liquid Analytes." Nanomaterials 11, no. 5 (April 29, 2021): 1163. http://dx.doi.org/10.3390/nano11051163.

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In this paper, we present a two-dimensional surface plasmon resonance structure for refractive index sensing of liquid analytes. The polymer structure was designed with a period of 500 nm and prepared in a novel IP-Dip polymer by direct laser writing lithography based on a mechanism of two-photon absorption. The sample with a set of prepared IP-Dip structures was coated by 40 nm thin gold layer. The sample was encapsulated into a prototyped chip with inlet and outlet. The sensing properties were investigated by angular measurement using the prepared solutions of isopropyl alcohol in deionized water of different concentrations. Sensitivity of 478–617 nm per refractive index unit was achieved in angular arrangement at external angle of incidence of 20°.

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Mačiulaitis, Justinas, Milda Deveikytė, Sima Rekštytė, Maksim Bratchikov, Adas Darinskas, Agnė Šimbelytė, Gintaras Daunoras, et al. "Preclinical study of SZ2080 material 3D microstructured scaffolds for cartilage tissue engineering made by femtosecond direct laser writing lithography." Biofabrication 7, no. 1 (March 23, 2015): 015015. http://dx.doi.org/10.1088/1758-5090/7/1/015015.

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Ai, Jun, Qifeng Du, Zhongli Qin, Jianguo Liu, and Xiaoyan Zeng. "Laser direct-writing lithography equipment system for rapid and μm-precision fabrication on curved surfaces with large sag heights." Optics Express 26, no. 16 (July 31, 2018): 20965. http://dx.doi.org/10.1364/oe.26.020965.

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Yu, Shengtao, Xiaoyu Li, and Chengqun Gui. "3D SOI edge coupler design for high tolerance." AIP Advances 13, no. 2 (February 1, 2023): 025365. http://dx.doi.org/10.1063/5.0127979.

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We designed and manufactured two single-mode fiber-to-chip three-dimensional (3D) edge couplers with taper and semi-cone structures on a 3.5 µm silicon device layer of a silicon-on-insulator. The 3D finite-difference time-domain is used to simulate and optimize the structure of the edge couplers within the 1550 nm band. The simulation results reveal a maximum coupling efficiency of the 3D edge couplers above 91.42% for the TE mode. The 3 dB coupling tolerances of the TE mode in horizontal and vertical directions are ±4.5 and ±1.5 µm, respectively. Laser-direct-writing grayscale lithography and inductive coupled plasma-reactive ion etching are used in the fabrication of 3D edge couplers. Experimental data show that 3D couplers have a maximum coupling efficiency of about 83.41% in the TE mode.

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Burkhardt, T., M. Mohaupt, M. Hornaff, B. Zaage, E. Beckert, H. J. Döring, M. Slodowski, et al. "Packaging Technology of Multi Deflection Arrays for Multi-Shaped Beam Lithography." International Symposium on Microelectronics 2011, no. 1 (January 1, 2011): 000600–000607. http://dx.doi.org/10.4071/isom-2011-wa5-paper1.

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Multi-Shaped electron beam lithography is considered a promising approach for high throughput mask and direct writing. Providing multiple apertures and individually controlled electrodes it allows for massive parallelization of exposure shots, thus significantly decreasing write time. A silicon-based micro-structured MEMS multi-beam deflection array (MDA) featuring 8×8 apertures is presented. The hybrid integration of MDA devices in ceramic system carriers utilizing a laser-based Solderjet Bumping process is demonstrated. This flux-free soldering process provides adhesive-free, long term stable and vacuum compatible joints and is used for both mechanical fixation and electrical connection. Electron beam deflection in two perpendicular directions requires the highly accurate placement of two crossed MDA devices, which is carried out by three degrees of freedom alignment procedures and solder joining. Electrical signal routing within the electron optical column using flexible printed circuit boards and flux-free soldering is also reported. The precision adjustment of two carriers is accomplished by fiducial mark detection using image processing. Results on alignment accuracy in the sub-micron range, mechanical and electrical testing of such assemblies are reported.

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Sun, Xiuhui, Shaoyun Yin, Haibo Jiang, Weiguo Zhang, Mingyou Gao, Jinglei Du, and Chunlei Du. "U-Net convolutional neural network-based modification method for precise fabrication of three-dimensional microstructures using laser direct writing lithography." Optics Express 29, no. 4 (February 12, 2021): 6236. http://dx.doi.org/10.1364/oe.416871.

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Bagheri, Shahin, Ksenia Weber, Timo Gissibl, Thomas Weiss, Frank Neubrech, and Harald Giessen. "Fabrication of Square-Centimeter Plasmonic Nanoantenna Arrays by Femtosecond Direct Laser Writing Lithography: Effects of Collective Excitations on SEIRA Enhancement." ACS Photonics 2, no. 6 (May 26, 2015): 779–86. http://dx.doi.org/10.1021/acsphotonics.5b00141.

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Lebedevaite, Migle, Jolita Ostrauskaite, Edvinas Skliutas, and Mangirdas Malinauskas. "Photoinitiator Free Resins Composed of Plant-Derived Monomers for the Optical µ-3D Printing of Thermosets." Polymers 11, no. 1 (January 11, 2019): 116. http://dx.doi.org/10.3390/polym11010116.

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In this study, acrylated epoxidized soybean oil (AESO) and mixtures of AESO and vanillin dimethacrylate (VDM) or vanillin diacrylate (VDA) were investigated as photosensitive resins for optical 3D printing without any photoinitiator and solvent. The study of photocross-linking kinetics by real-time photorheometry revealed the higher rate of photocross-linking of pure AESO than that of AESO with VDM or VDA. Through the higher yield of the insoluble fraction, better thermal and mechanical properties were obtained for the pure AESO polymer. Here, for the first time, we validate that pure AESO and mixtures of AESO and VDM can be used for 3D microstructuring by employing direct laser writing lithography technique. The smallest achieved spatial features are 1 µm with a throughput in 6900 voxels per second is obtained. The plant-derived resins were laser polymerized using ultrashort pulses by multiphoton absorption and avalanche induced cross-linking without the usage of any photoinitiator. This advances the light-based additive manufacturing towards the 3D processing of pure cross-linkable renewable materials.

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Foltyn, Patrick, Ferdinand Restle, Markus Wissmann, Stefan Hengsbach, and Bernhard Weigand. "The Effect of Patterned Micro-Structure on the Apparent Contact Angle and Three-Dimensional Contact Line." Fluids 6, no. 2 (February 23, 2021): 92. http://dx.doi.org/10.3390/fluids6020092.

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The measurement of the apparent contact angle on structured surfaces is much more difficult to obtain than on smooth surfaces because the pinning of liquid to the roughness has a tremendous influence on the three phase contact line. The results presented here clearly show an apparent contact angle variation along the three phase contact line. Accordingly, not only one value for the apparent contact angle can be provided, but a contact angle distribution or an interval has to be given to characterize the wetting behavior. For measuring the apparent contact angle distribution on regularly structured surfaces, namely micrometric pillars and grooves, an experimental approach is presented and the results are provided. A short introduction into the manufacturing process of such structured surfaces, which is a combination of Direct LASER Writing (DLW) lithography, electroforming and hot embossing shows the high quality standard of the used surfaces.

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Luan, Shiyi, Fei Peng, Guoxing Zheng, Chengqun Gui, Yi Song, and and Sheng Liu. "High-speed, large-area and high-precision fabrication of aspheric micro-lens array based on 12-bit direct laser writing lithography." Light: Advanced Manufacturing 3 (2022): 1. http://dx.doi.org/10.37188/lam.2022.047.

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