Relevant bibliographies by topics / Diblock copolymer (DBC) lithography

Academic literature on the topic 'Diblock copolymer (DBC) lithography'

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Published: 14 March 2023

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Journal articles on the topic "Diblock copolymer (DBC) lithography"

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Chervanyov, A. I. "Conductivity of Insulating Diblock Copolymer System Filled with Conductive Particles Having Different Affinities for Dissimilar Copolymer Blocks." Polymers 12, no. 8 (July 25, 2020): 1659. http://dx.doi.org/10.3390/polym12081659.

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We investigate the electrical response of the insulating diblock copolymer system (DBC) filled with conductive spherical fillers depending on the affinities of these fillers for copolymer blocks and the interaction between fillers. We demonstrate that the contrast (difference) between the affinities of the fillers for dissimilar copolymer blocks is a decisive factor that determines the distribution of these fillers in the DBC system. The distribution of filler particles, in turn, is found to be directly related to the electrical response of the DBC-particle composite. In particular, increasing the affinity contrast above a certain threshold value results in the insulator-conductor transition. This transition is found to be caused by the preferential localization of the fillers in the microphases of the DBC system having larger affinity for these fillers. The effect of the interaction between fillers is found to be secondary to the described effect of the affinity contrast that dominates in determining the distribution of fillers in the composite. This effect of the inter-particle interactions is shown to be significant only when the affinity contrast and filler volume fraction are sufficiently large.
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Permyakova, N. M., T. B. Zheltonozhskaya, V. I. Karpovskyi, R. V. Postoi, V. I. Maksin, S. V. Partsevskaya, L. M. Grishchenko, D. O. Klymchuk, and V. V. Klepko. "Composition of α-tocopheryl acetate with micellar nanocarriers and the possibility of its use as a biologically active additive." Polymer journal 42, no. 4 (December 10, 2020): 292–306. http://dx.doi.org/10.15407/polymerj.42.04.292.

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Based on the asymmetric diblock copolymer (DBC) poly(ethylene oxide)/polyacrylic acid, effective, biocompatible and biodegradable micellar carriers were obtained for the delivery of vitamin E analogue, α-tocopheryl acetate (α-TOCA), in living organisms. The monitoring of the stability of micellar structures of the block copolymer and its composition with α-TOCA over time, in a saline solution and when the pH of the solution changes, was carried out. The stability of DBC micelles over time at pH = 3.5, partial disaggregation of micelles at pH = 9 and an increase in their aggregation in physiological solution were shown. The high stability of the α-TOCA/DBC composition formed in situ in time in the range of pH=3.5-9 and a significant decrease in its solutions of salting out effects in the presence of NaCl were established. The thermodynamic parameters of the process of the micelle formation of the pure α-TOCA in water/ethanol solution (95/5 v/v) as well as the size and morphology of its micellar structures were determined by light scattering and TEM methods. The initial α-TOCA micelles in water/ethanol solution were stable over a wide pH range, but their stability was much lower and the sensitivity to the presence of NaCl was much higher than that of DBC micelles. The dialysis method revealed the gradual release of the drug from the micellar carrier through a semipermeable membrane into the surrounding aqueous and aqueous-saline media. However, the rate and efficiency of α-TOCA release from the DBC micelles in an aqueous medium were significantly lower compared to a similar process of drug release from the pure α-TOCA dispersion. Thus, a possibility of providing of long-term controlled release of α-TOCA in the living organism due to the use of DBC micelles has been proven. Based on in vivo tests of the biological action of the composition on pregnant sows, its high bioavailability, rapid absorption, active participation in metabolic processes and positive effect on the reproductive qualities of sows compared to pure α-TOCA, were displayed, which improves the safety and productivity of newborn piglets. Key words: diblock copolymer, α-tocopheryl acetate, micellar carrier, encapsulation/release, biological action.
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Kuech, Thomas F., and Luke J. Mawst. "Nanofabrication of III–V semiconductors employing diblock copolymer lithography." Journal of Physics D: Applied Physics 43, no. 18 (April 21, 2010): 183001. http://dx.doi.org/10.1088/0022-3727/43/18/183001.

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Muramatsu, Makoto. "Nanopatterning of diblock copolymer directed self-assembly lithography with wet development." Journal of Micro/Nanolithography, MEMS, and MOEMS 11, no. 3 (July 9, 2012): 031305. http://dx.doi.org/10.1117/1.jmm.11.3.031305.

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Kunitskaya, Larisa, Tatyana Zheltonozhskaya, Rostyslav Stoika, and Dmytro Klymchuk. "Compositions of Anticancer Drug with Micellar Nanocarriers and Their Cytotoxicity." French-Ukrainian Journal of Chemistry 5, no. 2 (2017): 103–20. http://dx.doi.org/10.17721/fujcv5i2p103-120.

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Asymmetric diblock (DBC) and triblock (TBC) copolymers contained biocompatible chemically complementary polyacrylamide and poly(ethylene oxide) (PAAm-b-PEO-b-PAAm) or its monomethyl ether (MEPEO-b-PAAm), and also partially hydrolyzed triblock copolymer derivative (TBChydr) were used to create micelles of a special type. The micelles obtained are characterized by small CMCs and large values of the Gibbs micellization energy, thus indicating a high stability of DBC, TBC and TBChydr micelles in aqueous solutions and the capabilities of their use to encapsulate and deliver poorly soluble and/or toxic drugs in living organism. Morphological features and size of DBC and TBC micelles were determined by TEM. The electron images demonstrated spherical micelles of a polymolecular type, monomolecular type and separate micelle aggregates. TBC and TBChydr micelles were used to examine in vitro anticancer activity of their compositions with doxorubicin (Dox). The created micelle systems showed the enhanced cytotoxicity as compared to individual Dox against murine leukemia cells of L1210 line, murine transformed fibroblasts of L929 line and human T-leukemia cells of Jurkat line and allow to achieve a high efficacy at low Dox concentrations (0,1÷3 µg·cm-3) that opens the great prospects for essential decrease in drug dose at chemotherapy.
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Park, J. H., J. Kirch, L. J. Mawst, C. C. Liu, P. F. Nealey, and T. F. Kuech. "Controlled growth of InGaAs/InGaAsP quantum dots on InP substrates employing diblock copolymer lithography." Applied Physics Letters 95, no. 11 (September 14, 2009): 113111. http://dx.doi.org/10.1063/1.3224916.

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Yoshida, Shinya, Takahito Ono, and Masayoshi Esashi. "Conductive polymer patterned media fabricated by diblock copolymer lithography for scanning multiprobe data storage." Nanotechnology 19, no. 47 (October 29, 2008): 475302. http://dx.doi.org/10.1088/0957-4484/19/47/475302.

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Terekhin, V. V., O. V. Dement’eva, A. V. Zaitseva, and V. M. Rudoy. "Diblock copolymer micellar lithography: 1. Intermicellar interactions and pathways for control of monomicellar film structure." Colloid Journal 73, no. 5 (October 2011): 697–706. http://dx.doi.org/10.1134/s1061933x11050152.

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Terekhin, V. V., O. V. Dement’eva, and V. M. Rudoy. "Diblock copolymer micellar lithography: 2. Formation of highly ordered nanoparticle ensembles with controlled geometric characteristics." Colloid Journal 73, no. 5 (October 2011): 707–16. http://dx.doi.org/10.1134/s1061933x11050164.

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Kim, Honghyuk, Jonathan Choi, Zachary Lingley, Miles Brodie, Yongkun Sin, Thomas F. Kuech, Padma Gopalan, and Luke J. Mawst. "Selective growth of strained (In)GaAs quantum dots on GaAs substrates employing diblock copolymer lithography nanopatterning." Journal of Crystal Growth 465 (May 2017): 48–54. http://dx.doi.org/10.1016/j.jcrysgro.2017.02.046.

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Dissertations / Theses on the topic "Diblock copolymer (DBC) lithography"

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DIALAMEH, MASOUD. "Fabrication and characterization of reference nano and micro structures for 3D chemical analysis." Doctoral thesis, Politecnico di Torino, 2019. http://hdl.handle.net/11583/2742524.

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Xiao, Qijun. "Hierarchical multiple bit clusters and patterned media enabled by novel nanofabrication techniques – High resolution electron beam lithography and block polymer self assembly." 2010. https://scholarworks.umass.edu/dissertations/AAI3397756.

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This thesis discusses the full scope of a project exploring the physics of hierarchical clusters of interacting nanomagnets. These clusters may be relevant for novel applications such as multilevel data storage devices. The work can be grouped into three main activities: micromagnetic simulation, fabrication and characterization of proof-of-concept prototype devices, and efforts to scale down the structures by creating the hierarchical structures with the aid of diblock copolymer self assembly. Theoretical micromagnetic studies and simulations based on Landau-Lifshitz-Gilbert (LLG) equation were conducted on nanoscale single domain magnetic entities. For the simulated nanomagnet clusters with perpendicular uniaxial anisotropy, the simulation showed the switching field distributions, the stability of the magnetostatic states with distinctive total cluster perpendicular moments, and the stepwise magnetic switching curves. For simulated nanomagnet clusters with in-plane shape anisotropy, the simulation showed the stepwise switching behaviors governed by thermal agitation and cluster configurations. Proof-of-concept cluster devices with three interacting Co nanomagnets were fabricated by e-beam lithography (EBL) and pulse-reverse electrochemical deposition (PRECD). EBL patterning on a suspended 100 nm SiN membrane showed improved lateral lithography resolution to 30 nm. The Co nanomagnets deposited using the PRECD method showed perpendicular anisotropy. The switching experiments with external applied fields were able to switch the Co nanomagnets through the four magnetostatic states with distinctive total perpendicular cluster magnetization, and proved the feasibility of multilevel data storage devices based on the cluster concept. Shrinking the structures size was experimented by the aid of diblock copolymer. Thick poly(styrene)-b-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer templates aligned with external electrical field were used to fabricate long Ni/Fe magnetic nanowire array, dominant shape anisotropy was observed and compared to the result from previously reported Co nanowire array with strong crystalline anisotropy. Guided diblock copolymer poly(styrene)-b-poly(4-vinyl pyridine) (PS- b-P4VP) self assembly was performed to generate clustered microdomains. Direct e-beam patterning on PS-b-P4VP thin film showed precise and arbitrary patterning on the lateral ordering of the self assembly. Graphoepitaxy of self-assembled PS-b-P4VP copolymers on isolated SiN triangular plateaus successfully resulted in the exact clusters of three microdomains. Theoretical consideration and system modeling based on the micellar configuration of the microdomains were done, and the distribution of the cluster’s size and number of elements were explained qualitatively.
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Conference papers on the topic "Diblock copolymer (DBC) lithography"

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Kihara, Naoko, Kazutaka Takizawa, and Hiroyuki Hieda. "Fabrication of sub-10-nm pattern using diblock copolymer." In SPIE Advanced Lithography, edited by Frank M. Schellenberg and Bruno M. La Fontaine. SPIE, 2009. http://dx.doi.org/10.1117/12.812210.

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Chang, Li-Wen, Marissa A. Caldwell, and H. S. Philip Wong. "Diblock copolymer directed self-assembly for CMOS device fabrication." In SPIE Advanced Lithography, edited by Frank M. Schellenberg. SPIE, 2008. http://dx.doi.org/10.1117/12.772000.

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Hong, Yang, Li-Wen Chang, Albert Lin, and H. S. Philip Wong. "SLICE image analysis for diblock copolymer characterization and process optimization." In SPIE Advanced Lithography, edited by Daniel J. C. Herr. SPIE, 2010. http://dx.doi.org/10.1117/12.848378.

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Muramatsu, Makoto, Mitsuaki Iwashita, Takahiro Kitano, Takayuki Toshima, Yuriko Seino, Daisuke Kawamura, Masahiro Kanno, Katsutoshi Kobayashi, and Tsukasa Azuma. "Nanopatterning of diblock copolymer directed self-assembly lithography with wet development." In SPIE Advanced Lithography, edited by Daniel J. C. Herr. SPIE, 2011. http://dx.doi.org/10.1117/12.878931.

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Kihara, Naoko, Hiroyuki Hieda, and Katsuyuki Naito. "NIL mold manufacturing using self-organized diblock copolymer as patterning template." In SPIE Advanced Lithography, edited by Frank M. Schellenberg. SPIE, 2008. http://dx.doi.org/10.1117/12.771630.

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Chang, Li-Wen, and H. S. Philip Wong. "Diblock copolymer directed self-assembly for CMOS device fabrication." In SPIE 31st International Symposium on Advanced Lithography, edited by Alfred K. K. Wong and Vivek K. Singh. SPIE, 2006. http://dx.doi.org/10.1117/12.661028.

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Chirasatitsin, Somyot, Priyalakshmi Viswanathan, Giuseppe Battaglia, and Adam J. Engler. "Directing Stem Cell Fate in 3D Through Cell Inert and Adhesive Diblock Copolymer Domains." In ASME 2013 Summer Bioengineering Conference. American Society of Mechanical Engineers, 2013. http://dx.doi.org/10.1115/sbc2013-14442.

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Adhesions are important cell structures required to transduce a variety of chemical and mechanics signals from outside-in and vice versa, all of which regulate cell behaviors, including stem cell differentiation (1). Though most biomaterials are coated with an adhesive ligand to promote adhesion, they do not often have a uniform distribution that does not match the heterogeneously adhesive extracellular matrix (ECM) in vivo (2). We have previously shown that diblock copolymer (DBC) mixtures undergo interface-confined de-mixing to form nanodomins of one copolymer in another (3). Here we demonstrate how diblock copolymer mixtures can be made into foams with nanodomains to better recapitulate native ECM adhesion regions and influence cell adhesion.
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Izumi, Kenichi, Bongkeun Kim, Nabil Laachi, Kris T. Delaney, Michael Carilli, and Glenn H. Fredrickson. "Barriers to defect melting in chemo-epitaxial directed self-assembly of lamellar-forming diblock copolymer/homopolymer blends." In SPIE Advanced Lithography, edited by Douglas J. Resnick and Christopher Bencher. SPIE, 2015. http://dx.doi.org/10.1117/12.2085685.

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Black, C. T., and R. Ruiz. "Self assembly in semiconductor microelectronics: self-aligned sub-lithographic patterning using diblock copolymer thin films." In SPIE 31st International Symposium on Advanced Lithography, edited by Qinghuang Lin. SPIE, 2006. http://dx.doi.org/10.1117/12.659252.

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Peters, Andrew J., Richard A. Lawson, Peter J. Ludovice, and Clifford L. Henderson. "Effects of block copolymer polydispersity and χN on pattern line edge roughness and line width roughness from directed self-assembly of diblock copolymers." In SPIE Advanced Lithography, edited by William M. Tong and Douglas J. Resnick. SPIE, 2013. http://dx.doi.org/10.1117/12.2021443.

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