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Journal articles on the topic 'DC Sputter Deposition'

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Author: Grafiati

Published: 6 September 2023

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1

Thormählen, Lars, Dennis Seidler, Viktor Schell, Frans Munnik, Jeffrey McCord, and Dirk Meyners. "Sputter Deposited Magnetostrictive Layers for SAW Magnetic Field Sensors." Sensors 21, no. 24 (December 15, 2021): 8386. http://dx.doi.org/10.3390/s21248386.

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For the best possible limit of detection of any thin film-based magnetic field sensor, the functional magnetic film properties are an essential parameter. For sensors based on magnetostrictive layers, the chemical composition, morphology and intrinsic stresses of the layer have to be controlled during film deposition to further control magnetic influences such as crystallographic effects, pinning effects and stress anisotropies. For the application in magnetic surface acoustic wave sensors, the magnetostrictive layers are deposited on rotated piezoelectric single crystal substrates. The thermomechanical properties of quartz can lead to undesirable layer stresses and associated magnetic anisotropies if the temperature increases during deposition. With this in mind, we compare amorphous, magnetostrictive FeCoSiB films prepared by RF and DC magnetron sputter deposition. The chemical, structural and magnetic properties determined by elastic recoil detection, X-ray diffraction, and magneto-optical magnetometry and magnetic domain analysis are correlated with the resulting surface acoustic wave sensor properties such as phase noise level and limit of detection. To confirm the material properties, SAW sensors with magnetostrictive layers deposited with RF and DC deposition have been prepared and characterized, showing comparable detection limits below 200 pT/Hz1/2 at 10 Hz. The main benefit of the DC deposition is achieving higher deposition rates while maintaining similar low substrate temperatures.

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2

Somekh, R. E., and Z. H. Barber. "UHV sputter deposition with a research-scale DC magnetron." Journal of Physics E: Scientific Instruments 21, no. 11 (November 1988): 1029–33. http://dx.doi.org/10.1088/0022-3735/21/11/005.

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3

Kent, Karl, and Milutin Stoilovic. "Development of latent fingerprints using preferential DC sputter deposition." Forensic Science International 72, no. 1 (March 1995): 35–42. http://dx.doi.org/10.1016/0379-0738(94)01671-q.

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4

Sonoda, Tsutomu, and Kiyotaka Katou. "Coating of Granular Polymeric Spacers with Copper by Sputter-Deposition for Enhancing Cell Wall Structure of Sintered Highly Porous Aluminum Materials." Materials Science Forum 660-661 (October 2010): 432–36. http://dx.doi.org/10.4028/www.scientific.net/msf.660-661.432.

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The deposition of copper onto acrylic resin powder in its self-convective motion by magnetron DC sputtering was examined in order to prepare granular polymeric spacers coated with the metal, aiming at enhancing the cell wall structure of sintered highly porous aluminum materials. The fabrication of sintered highly porous aluminum materials was carried out in an ordinary powder metallurgy processing combined with a space-holder method with the polymer-copper binary spacer granules prepared by powder-coating using the sputter-deposition technique. The effects of the sputter-deposition of copper onto the spherical polymeric spacers on cell structures of the sintered porous compacts were investigated. According to optical observations, it was found that the sputtered copper could be uniformly and adherently deposited onto the surface of the acrylic granules. According to EPMA analysis on the cross-section on a sintered porous compact, it was found that Cu atoms were distributed at the vicinity of its cell walls, concluding that cell wall structures could be enhanced by this processing. Therefore it was expected that the compressive properties of the sintered highly porous aluminum materials were also improved by this powder coating process.

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5

Park, Min Woo, Wang Woo Lee, Jae Gab Lee, and Chong Mu Lee. "A Comparison of the Mechanical Properties of RF- and DC- Sputter-Deposited Cr Thin Films." Materials Science Forum 546-549 (May 2007): 1695–98. http://dx.doi.org/10.4028/www.scientific.net/msf.546-549.1695.

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Chromium (Cr) films were deposited on plain carbon steel sheets by DC and RF magnetron sputtering as well as by electroplating. Effects of DC or RF sputtering power on the deposition rate and properties such as hardness and surface roughness of the Cr films were investigated. X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microcopy (SEM) analyses were performed to investigate the crystal structure, surface roughness, thickness of the Cr films. The deposition rate, hardness and surface roughness of the Cr film deposited by either DC or RF sputtering increase with the increase of sputtering power. The deposition rate and hardness of the Cr film deposited by DC sputtering are higher than those of the Cr film deposited by RF sputtering, but RF sputtering offers smoother surface. The sputter-deposited Cr film is harder and has a smoother surface than the electroplated one.

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6

Kharrazi Olsson, M., K. Macák, U. Helmersson, and B. Hjörvarsson. "High rate reactive dc magnetron sputter deposition of Al2O3 films." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 16, no. 2 (March 1998): 639–43. http://dx.doi.org/10.1116/1.581081.

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7

Ting, Jyh-Ming, and B. S. Tsai. "DC reactive sputter deposition of ZnO:Al thin film on glass." Materials Chemistry and Physics 72, no. 2 (November 2001): 273–77. http://dx.doi.org/10.1016/s0254-0584(01)00451-5.

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8

Schneider, R., J. Geerk, G. Linker, O. Meyer, and R. Smithey. "Effects of DC bias voltage in sputter deposition of YBaCuO films." Physica C: Superconductivity 235-240 (December 1994): 671–72. http://dx.doi.org/10.1016/0921-4534(94)91559-8.

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9

Koren, G. "DC sputter deposition of YBa2Cu3O7 thin films for two sided coating." Physica C: Superconductivity 209, no. 4 (May 1993): 369–72. http://dx.doi.org/10.1016/0921-4534(93)90547-4.

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10

Kellett, B. J., and J. H. James. "Ion beam sputter deposition of YBa2Cu3O7−δ thin films." Journal of Materials Research 8, no. 12 (December 1993): 3032–42. http://dx.doi.org/10.1557/jmr.1993.3032.

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This article addresses issues associated with in situ growth of superconducting YBa2Cu3O7−δ thin films by ion beam sputtering. High oxygen partial pressure during ion beam deposition can cause significant beam broadening and oxidation of filaments and grids. Also, many of the targets used for processing YBCO are unstable when sputtered in a high oxygen partial pressure. It is shown that ion beam sputtering can produce YBCO films of comparable quality to those produced by laser ablation or dc magnetron sputtering. Typical film properties are Tco = 91 K and Jc (77 K) = 106 A cm−2. It appears that the oxygen gas pressure during the postdeposition cooldown has a more important influence on film properties than the oxygen partial pressure during deposition.

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11

Dinh, Cam Thi Mong, Thang Bach Phan, and Hoang Thanh Nguyen. "Synthesis of ZnO nanowires on Ti/glass substrates by DC magnetron sputter deposition." Science and Technology Development Journal 17, no. 2 (June 30, 2014): 47–55. http://dx.doi.org/10.32508/stdj.v17i2.1314.

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One-dimensional (1-D) zinc oxide (ZnO) nanostructures, such as ZnO nanowires and nanorods, have in recent years attracted a lot of attention due to their many unique properties and possibility that can be applied to various nanoscale functional devices. In this study, ZnO nanowires have been successfully synthesized on Ti/glass substrates by an DC magnetron sputter deposition technique. Deposition of ZnO using this technique generally leads to the formation of ZnO thin film but not of nanowire. So prior to the ZnO deposition, a Cu labyer was prepared on the Ti/glass substrate using an electroless plating method under different conditions. X-ray diffraction (XRD) analysis confirmed that the ZnO nanowires with wurtzite structures have high crystal quality and are c-axis orientated. Scanning electron microscopy (SEM) showed the diameters of nanowires normally range from 60 to 150 nm and their lengths reach 20 μm. Photoluminescence (PL) measurements were adopted to analyze the optical properties of the nanowires. The existence of an electroless Cu layer is critical for the growth of the ZnO nanowires. In addition, the effect of the Cu deposition conditions on the diameters and lengths of the ZnO nanowires is discussed in details.

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12

Wu, Wan-Yu, and Jyh-Ming Ting. "Effects of Process Conditions on the Synthesis and Microstructure of Nano-Scale Metal-Containing Amorphous Carbon Thin Films." Journal of Nanoscience and Nanotechnology 8, no. 5 (May 1, 2008): 2623–26. http://dx.doi.org/10.1166/jnn.2008.18294.

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Thin films of metal-containing amorphous carbon (a-C:Me) were deposited on a number of substrates, including silicon, Pt coated silicon, carbon coated silicon, polymer, and glass. The deposition was performed in a dc reactive sputter deposition system equipped with one single magnetron gun. The gases used were various mixtures of CH4 + Ar. The gas mixture was admitted to the deposition chamber at constant flow rate and ratio. Self-assembled alternating layer structure was observed under certain deposition conditions. Correlation between the self-assembled alternating layer structure and deposition parameters is presented and discussed. The role of carbon energy in the segregation of metal and carbon to form the layer structure is addressed.

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13

Sonoda, Tsutomu, Kiyotaka Katou, and Tadashi Asahina. "Porous Structure and Mechanical Properties of the Cellular Metallic Materials Fabricated by Sintering Al Powder Coated with Sn." Materials Science Forum 591-593 (August 2008): 277–81. http://dx.doi.org/10.4028/www.scientific.net/msf.591-593.277.

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The deposition of pure tin onto pure aluminum powder in its self-convective motion by magnetron DC sputtering was examined in order to prepare Al-Sn composite powder and thereby to improve the sintering of the aluminum particles, aiming at the development of highly structure-controlled porous aluminum materials. The fabrication of porous aluminum materials was carried out by space-holder method using the prepared Al-Sn composite powder in ordinary powder metallurgy processing. The effects of the sputterdeposition of tin on porous structure and mechanical properties of the sintered compact were investigated. It was found that the porous structure of the sintered porous materials with the porosity 80% was better regulated by the sputter-deposition, compared to that without the deposition. Regarding their compressive properties, it was found that the plateau stress of the sintered porous materials reached by the sputter-deposition twice as high as that without the deposition. Therefore it was concluded that coating of aluminum powder with tin deposits enables the porous-structure to be controlled more effectively in fabricating sintered highly porous aluminum materials, as well as improves their mechanical property.

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14

Sangwaranatee, N. W., N. Sangwaranatee, M. Horprathum, C. Chananonnawathorn, and M. Muntini. "DC reactive sputter deposition of CuO thin films at different operating pressures." Materials Today: Proceedings 5, no. 7 (2018): 15166–69. http://dx.doi.org/10.1016/j.matpr.2018.04.076.

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15

Klein, P., B. Gottwald, T. Frauenheim, C. Köhler, and A. Gemmler. "Residual stresses modelled by MD simulation applied to PVD DC sputter deposition." Surface and Coatings Technology 200, no. 5-6 (November 2005): 1600–1603. http://dx.doi.org/10.1016/j.surfcoat.2005.08.120.

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16

R. Agool, Ibrahim, Mohammed K. Khalaf, Shaimaa H. Abd Muslim, and Riyadh N. Talaq. "Reactive DC magnetron sputter deposition and structural properties of NiO thin films." Engineering and Technology Journal 33, no. 6B (July 1, 2015): 1082–92. http://dx.doi.org/10.30684/etj.2015.116476.

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17

Shen, Yi, and Ruo He Yao. "Properties of Al Films Depend on Substrate Temperature by DC Magnetron Sputter Deposition." Advanced Materials Research 662 (February 2013): 413–16. http://dx.doi.org/10.4028/www.scientific.net/amr.662.413.

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Al films were prepared by DC magnetron sputter deposition at different substrate temperatures. The sheet resistance of the films was measured by four point probe sheet resistance meter, and the film thickness, which was obtained by surface profiling system. The surface and cross-section morphology of the films was observed by AFM and FESEM. As a result, the resistivity of the films decreases obviously as the substrate temperature increases gradually. The higher substrate temperature is, the rougher the films surface is and the larger the grain size is.

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18

Akhtar, Pervez, T. J. Ali, and R. Mahmud. "An Investigation into the Effects of Substrate Temperature on Magnetic Properties of RF Sputtered NiFe Films." Key Engineering Materials 442 (June 2010): 109–15. http://dx.doi.org/10.4028/www.scientific.net/kem.442.109.

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The paper describes results of investigation on sputtered NiFe Films to determine the sputter deposition condition that could produce magnetic field sensors with the desired magnetic properties. The magnetic materials used in such devices should have a low coercive force, a low anisotropy field and a low magnetization dispersion, α50. .The results of systematic investigation of radio-frequency (RF) sputtered, RF biased, 82-18 % NiFe films showed (i) Improved Kobelev methods were applied to magneto-optic measurement techniques, suppress the magnetization ripples when subjected under the application of dc field. (ii) Anisotropy field results indicated an inverse trend with increasing substrate temperature (iii) the experimental measurements on magnetization dispersion relatively constant up to 200 °C with α50 approximately 1.2°, it then increases more sharply to about 3.5° at 400 °C substrate temperature. The work also provide understanding of the effects on the magnetic properties of sputtered magnetic films that is very limited as current literature is almost entirely limited to evaporated magnetic films.

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19

Madsen, N. D., B. H. Christensen, S. Louring, A. N. Berthelsen, K. P. Almtoft, L. P. Nielsen, and J. Bøttiger. "Controlling the deposition rate during target erosion in reactive pulsed DC magnetron sputter deposition of alumina." Surface and Coatings Technology 206, no. 23 (July 2012): 4850–54. http://dx.doi.org/10.1016/j.surfcoat.2012.05.070.

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20

Prabaswara, Aditya, Jens Birch, Muhammad Junaid, Elena Alexandra Serban, Lars Hultman, and Ching-Lien Hsiao. "Review of GaN Thin Film and Nanorod Growth Using Magnetron Sputter Epitaxy." Applied Sciences 10, no. 9 (April 27, 2020): 3050. http://dx.doi.org/10.3390/app10093050.

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Magnetron sputter epitaxy (MSE) offers several advantages compared to alternative GaN epitaxy growth methods, including mature sputtering technology, the possibility for very large area deposition, and low-temperature growth of high-quality electronic-grade GaN. In this article, we review the basics of reactive sputtering for MSE growth of GaN using a liquid Ga target. Various target biasing schemes are discussed, including direct current (DC), radio frequency (RF), pulsed DC, and high-power impulse magnetron sputtering (HiPIMS). Examples are given for MSE-grown GaN thin films with material quality comparable to those grown using alternative methods such as molecular-beam epitaxy (MBE), metal–organic chemical vapor deposition (MOCVD), and hydride vapor phase epitaxy (HVPE). In addition, successful GaN doping and the fabrication of practical devices have been demonstrated. Beyond the planar thin film form, MSE-grown GaN nanorods have also been demonstrated through self-assembled and selective area growth (SAG) method. With better understanding in process physics and improvements in material quality, MSE is expected to become an important technology for the growth of GaN.

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21

Deshmukh, Pratap, Sergey Yarmolenko, Sudheer Neralla, and Jagannathan Sankar. "Corrosion Analysis of Mg/Al₂O₃ Bio-Degradable Nanolaminate Thin-Films Fabricated Using DC/Pulsed DC Magnetron-Sputtering Technique." ECS Meeting Abstracts MA2022-02, no. 14 (October 9, 2022): 2596. http://dx.doi.org/10.1149/ma2022-02142596mtgabs.

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Multilayered Thin films are effective in controlling the rate of corrosion of magnesium alloys used for bio-implants applications. It’s been proven that corrosion of metallic implants can be delayed by depositing multilayered metal-oxide thin films. In this study, Mg/Al2O3 nanolaminates, along with different metal oxides, were deposited using DC and pulsed DC magnetron sputtering methods at room temperature on glass substrates. Applicability of these metal-oxide nanolaminates to corrosion control was studied by bulk volumetric degradation measurement technique using solutions such as Saline, HANKS and PBS. Mg/Al2O3 films were also studied under different flow conditions by varying flow rates and pore growth rate and degradation process are measured by time-lapsed technique on optical microscope. Effect of the oxide layer thickness, saline flow rate, total pressure, structural characteristics of oxide coatings and sputtering deposition parameters on pore density and corrosion rate was investigated. Pulsed DC magnetron sputtering enables preparation of thin films with control over pore growth and distribution. Results have shown that repeatable pore density and corrosion rate can be achieved through magnetron sputter-deposited Mg/Al2O3 nanolaminates.

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22

Hoon, Jian Wei, Kah Yoong Chan, and Cheng Yang Low. "XRD Investigations on Film Thickness and Substrate Temperature Effects of DC Magnetron Sputtered ZnO Films." Advanced Materials Research 845 (December 2013): 241–45. http://dx.doi.org/10.4028/www.scientific.net/amr.845.241.

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In this paper, direct current plasma magnetron sputter deposition technique was employed to deposit zinc oxide (ZnO) films on glass substrates. The magnetron sputtering process parameters including film thickness and substrate temperature were investigated. The crystallite sizes of the ZnO films were extracted from the measured X-ray diffraction patterns. The correlation of the crystallite size of the ZnO films with the film thickness and the substrate temperature will be discussed in this paper.

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23

DENG, JINXIANG, GUANGHUA CHEN, and XUEMEI SONG. "CHARACTERIZATION OF CUBIC BORON NITRIDE THIN FILMS DEPOSITED BY RF SPUTTER." International Journal of Modern Physics B 16, no. 28n29 (November 20, 2002): 4339–42. http://dx.doi.org/10.1142/s021797920201539x.

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Cubic boron nitride (c-BN) thin films have been deposited on Si substrates by radio frequency sputter. Sputtering target was hot pressed hexagonal boron nitride of 4N purity. Sputtering gas was the mixture of nitrogen and argon. During depositing c-BN thin films, substrates were biased by dc voltage negatively with respect to ground. By optimizing the deposition conditions, the boron nitride (BN) films containing a large amount of cubic phase were obtained. The samples were characterized with Fourier transformation infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). According to FTIR, the cubic phase content of c-BN thin films was evaluated to be 92. The B/N ratio was estimated to be approximately 1 from XPS. The AFM shows that the c-BN thin films delaminated from Si substrates obviously.

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24

Chen, Le, Michael E. Graham, Gonghu Li, and Kimberly A. Gray. "Fabricating highly active mixed phase TiO2 photocatalysts by reactive DC magnetron sputter deposition." Thin Solid Films 515, no. 3 (November 2006): 1176–81. http://dx.doi.org/10.1016/j.tsf.2006.07.094.

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25

Fischer, Maria, Mathis Trant, Kerstin Thorwarth, Jörg Patscheider, and Hans Josef Hug. "A setup for arc-free reactive DC sputter deposition of Al-O-N." Surface and Coatings Technology 362 (March 2019): 220–24. http://dx.doi.org/10.1016/j.surfcoat.2019.01.082.

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26

de Jong, Michiel, Victor E. van Enter, and Erik van der Kolk. "DC/RF magnetron sputter deposition and characterisation of Ca3Si2N2O4:Eu2+ luminescent thin films." Journal of Luminescence 164 (August 2015): 52–56. http://dx.doi.org/10.1016/j.jlumin.2015.03.008.

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27

Hashimoto, Mituru, Hong Qiu, Tatsuya Ohbuchi, Miklos Adamik, Hisashi Nakai, Arpad Barna, and Peter B. Barna. "Characterization of cobalt films grown on MgO(001) by dc-biased-sputter deposition." Journal of Crystal Growth 166, no. 1-4 (September 1996): 792–97. http://dx.doi.org/10.1016/0022-0248(95)00495-5.

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28

Lee, Hanbin, Minjeong Park, Minhyon Jeon, and Byeongcheol Kim. "Multi-Layer Anti-Reflection Film Based on SiOx and NbOx by DC Pulse Sputter System with Inductively Coupled Plasma Source." Crystals 10, no. 6 (May 26, 2020): 424. http://dx.doi.org/10.3390/cryst10060424.

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The research on anti-reflection (AR) optical thin film has long sought to obtain high-performance reflection and transmission properties in photovoltaic and photonic devices. The study of multi-layer AR (M-AR) film with low- and high-refractive-index materials is essential to increase the selective transmittance and reflectance at visible light wavelengths. However, M-AR film exhibits low substrate adhesion and slow deposition rates. We developed a DC pulse sputter system incorporating an inductively coupled plasma (ICP) source of high density to obtain high-quality M-AR film. Six-layer AR optical thin film was simulated using SiOx as a low-refractive-index material and NbOx as a high-refractive-index material. The multi-layer AR film based on SiOx and NbOx (M-SiNb) was fabricated using DC pulse sputtering which incorporated an ICP source. M-SiNb film exhibited better properties than the optical simulation results at 550 nm (transmittance: 99.19%, reflectance: 0.87%). Similarly, the M-SiNb film fabricated using the ICP source had high transmittance and reflectance in the visible light region and excellent adhesion to the substrate notwithstanding the various mechanical tests it was subjected to. Consequently, the development of the DC pulse sputter system included the ICP source, and this study represents important research in the field of optical film.

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29

Krumme, J.-P., V. Doormann, F. Welz, O. Dösssel, and H. van Hal. "Ion-beam sputter deposition process for Y1Ba2Cu3O7-δ thin-film structures." Journal of Materials Research 9, no. 11 (November 1994): 2747–60. http://dx.doi.org/10.1557/jmr.1994.2747.

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Ion-beam sputter deposition (IBS) has been developed to a fully oxygen-compatible technology for growth of complex oxides, such as Y1Ba2Cu3O7−δ (YBCO) thin films. The IBS system consists of an rf-plasma ion source with molybdenum grids for sputtering, a dc-plasma electron source for space charge compensation, stoichiometric YBCO and NGO targets, a beam chopper with BaO2, Cu, and Nd blades for stoichiometry control, and an ECR-oxygen-plasma source for in situ film oxidation and photoresist removal. Due to its complexity the IBS process is fully computer-controlled. A salient feature of IBS is the excellent crystallographic and morphological properties of thin (100)/(010)- and (103)-oriented YBCO films on SrTiO3 (STO) and NdGaO3 (NGO) substrates. Sharp interfaces and good superconducting properties render this technology feasible for the fabrication of SIS-ramp-junction SQUID's.

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30

Kaufholz, Marthe, Bärbel Krause, Sunil Kotapati, Martin Köhl, Miguel F. Mantilla, Michael Stüber, Sven Ulrich, Reinhard Schneider, Dagmar Gerthsen, and Tilo Baumbach. "Monitoring the thin film formation during sputter deposition of vanadium carbide." Journal of Synchrotron Radiation 22, no. 1 (January 1, 2015): 76–85. http://dx.doi.org/10.1107/s1600577514024412.

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The thin film formation of magnetron sputtered polycrystalline coatings was monitored byin situX-ray reflectivity measurements. The measured intensity was analyzed using the Parratt algorithm for time-dependent thin film systems. Guidelines for the on-line interpretation of the data were developed. For thick coatings, the experimental resolution needs to be included in the data evaluation in order to avoid misinterpretations. Based on a simple layer model, the time-dependent mean electron density, roughness and growth velocity were extracted from the data. As an example, the method was applied to the hard coating material vanadium carbide. Both instantaneous and slowly varying changes of the coating could be detected. It was shown that the growth velocity is proportional to the DC power. Significant changes of the microstructure induced by the working gas pressure are mainly driven by the chemical composition.

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31

Chang, Chi-Lung, Tz-Heng Chiou, Pin-Hung Chen, Wei-Chih Chen, Chun-Ta Ho, and Wan-Yu Wu. "Characteristics of TiN/W 2 N multilayers prepared using magnetron sputter deposition with dc and pulsed dc powers." Surface and Coatings Technology 303 (October 2016): 25–31. http://dx.doi.org/10.1016/j.surfcoat.2016.03.086.

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32

Wu, Wan Yu, Chia Wei Hsu, and Jyh Ming Ting. "Nanoscaled C, Ni, Pt Thin Films." Journal of Nano Research 6 (June 2009): 29–34. http://dx.doi.org/10.4028/www.scientific.net/jnanor.6.29.

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We have investigated the growth and characteristics of nanoscaled thin films of carbon, nickel, and platinum. The nanoscaled thin films were deposited on Si and quartz substrates with or without a surface layer of carbon, nickel, or platinum using a DC magnetron sputter deposition technique. The thicknesses, which were determined using ellipsometry, are all less than 10 nm. The film structures were examined using glazing angle incident x-ray diffractometry and Raman spectroscopy. The electrical and optical properties were determined using a four point probe technique and UV-VIS-IR spectrometry, respectively.

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33

Aleman, Angel, Chao Li, Hicham Zaid, Hanna Kindlund, Joshua Fankhauser, Sergey V. Prikhodko, Mark S. Goorsky, and Suneel Kodambaka. "Ultrahigh vacuum dc magnetron sputter-deposition of epitaxial Pd(111)/Al2O3(0001) thin films." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 36, no. 3 (May 2018): 030602. http://dx.doi.org/10.1116/1.5021609.

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34

Kharrazi, M., L. Kullman, and C. G. Granqvist. "High-rate dual-target DC magnetron sputter deposition of “blue” electrochromic Mo oxide films." Solar Energy Materials and Solar Cells 53, no. 3-4 (June 1998): 349–56. http://dx.doi.org/10.1016/s0927-0248(98)00033-6.

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35

Löbl, H. P., and M. Huppertz. "Thermal stability of nonstoichiometric silicon nitride films made by reactive dc magnetron sputter deposition." Thin Solid Films 317, no. 1-2 (April 1998): 153–56. http://dx.doi.org/10.1016/s0040-6090(97)00512-9.

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36

Militello, Maria C., Stephen W. Gaarenstroom, and Steven J. Simko. "Epitaxial Aluminum Nitride Film on Silicon(111) Grown by Reactive DC Magnetron Sputter Deposition." Surface Science Spectra 1, no. 1 (March 1992): 3–7. http://dx.doi.org/10.1116/1.1247668.

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37

Sivakumar, Kousik, and S. M. Rossnagel. "Deposition of aluminum-doped zinc oxide thin films for optical applications using rf and dc magnetron sputter deposition." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 28, no. 4 (July 2010): 515–22. http://dx.doi.org/10.1116/1.3425640.

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38

Bosworth, David, Nadia Stelmashenko, and Zoe H. Barber. "Structural Control of Carbon Nickel Thin Films Without Substrate Heating." MRS Proceedings 1451 (2012): 145–50. http://dx.doi.org/10.1557/opl.2012.1251.

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ABSTRACTA variety of characterization techniques have been employed to study the growth and structure of nickel carbon thin films fabricated by ionized magnetron sputter deposition. A two target magnetron system is used along with an RF powered coil, to create a secondary plasma, with a DC bias applied at the substrate. By varying the bias it is possible to control the energy of the depositing species as well as a range of other plasma properties and therefore the resulting film microstructure. It has been observed that a change from the metastable hexagonal nickel carbide phase to the stable face centered cubic structure of nickel can be induced. This change in metal crystallinity was accompanied by a change in carbon ordering. The ability to control the film structure and morphology without the need for substrate heating opens up the possibility of depositing a range of structures onto polymers.

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Sakkas, Charalampos, Jean-Marc Cote, Joseph Gavoille, Jean-Yves Rauch, Pierre-Henri Cornuault, Anna Krystianiak, Olivier Heintz, and Nicolas Martin. "Tunable Electrical Properties of Ti-B-N Thin Films Sputter-Deposited by the Reactive Gas Pulsing Process." Coatings 12, no. 11 (November 9, 2022): 1711. http://dx.doi.org/10.3390/coatings12111711.

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Titanium-boron-nitrogen (Ti-B-N) thin films were deposited by RF reactive magnetron sputtering using a titanium diboride (TiB2) target in an argon + nitrogen mixture. The argon mass flow rate was kept constant, whereas that of nitrogen was pulsed during the deposition. A constant pulsing period of P = 10 s was used, and the introduction time of the nitrogen gas (duty cycle (dc)) was systematically varied from dc = 0 to 100% of the pulsing period. This reactive gas pulsing process allowed the deposition of Ti-B-N thin films with various boron and nitrogen concentrations. Such adjustable concentrations in the films also led to changes in their electronic transport properties. Boron and nitrogen contents exhibited a reverse evolution as a function of the nitrogen duty cycle, which was correlated with the transition from a metallic to semiconducting-like behavior. A percolation model was applied to the electrical conductivity as a function of the nitrogen pulsing parameters, assuming some correlations with the evolution of the Ti-B-N thin film nanostructure.

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Järrendahl, K., I. Ivanov, J.-E. Sundgren, G. Radnóczi, Zs Czigany, and J. E. Greene. "Microstructure evolution in amorphous Ge/Si multilayers grown by magnetron sputter deposition." Journal of Materials Research 12, no. 7 (July 1997): 1806–15. http://dx.doi.org/10.1557/jmr.1997.0249.

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Microstructure evolution in amorphous Ge/Si multilayers grown by dual-target dc magnetron sputtering was investigated by cross-sectional transmission electron microscopy, x-ray diffraction, and growth simulations. In films grown under low intensity ion-irradiation conditions, the structure is columnar with low-density regions along column boundaries where layer intermixing was observed. By increasing the low-irradiation intensity (controlled by an applied negative substrate-bias), structures with smooth and well-defined layers could be grown. This was achieved at bias voltages between 80 and 140 V, depending on the sputtering gas pressure. As the ion-irradiation intensity is further increased, ion-induced intermixing degrades the layer interfaces and finally an amorphous Si1−xGex alloy forms. The combination of x-ray diffraction measurements and reflectivity calculations reveals an asymmetry between the Ge/Si and Si/Ge interface widths due, primarily, to a corresponding asymmetry in incident particle energies during the growth of alternate layers.

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Murray, Jack, Wayne Huebner, Matthew J. O’Keefe, Kristina Wilder, Ryan Eatinger, William Kuhn, Daniel S. Krueger, and J. Ambrose Wolf. "Sputter deposition of thin film MIM capacitors on LTCC substrates for RF bypass and filtering applications." International Symposium on Microelectronics 2011, no. 1 (January 1, 2011): 000747–52. http://dx.doi.org/10.4071/isom-2011-wp3-paper3.

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Thin film capacitors for RF bypass and filtering applications were sputter deposited onto low temperature co-fired ceramic (LTCC) substrates. The capacitors were configured in a metal-insulator-metal (MIM) design featuring 200 nm thick Al electrodes and a 300 nm thick Al2O3 dielectric layer, with dimensions varied between ∼150×150 μm and ∼750×750 μm. DC current-voltage measurements (E ≤ 5 MV/cm) coupled with impedance analysis (≤15 MHz) was used to characterize the resulting devices. More than 90% of the devices functioned as capacitors with high DC resistance (>20 MΩ) and low loss (tan δ <0.1). A second set of capacitors were made under the same experimental conditions with device geometries optimized for high frequency (≥200 MHz) applications. These capacitors featured temperature coefficient of capacitance (TCC) values between 500 and 1000 ppm/°C as well as low loss and high self-resonant frequency performance (ESR <0.6 Ohms at self-resonance of 5.7 GHz for 82 pF). Capacitance and loss values were comparable between the capacitor structures of similar areas at the different frequency regimes.

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Auret, F. D. "Characterization of defects introduced during dc magnetron sputter deposition of Ti–W on n-Si." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 4, no. 5 (September 1986): 1168. http://dx.doi.org/10.1116/1.583477.

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Aoi, Takafumi, Nobuto Oka, Yasushi Sato, Ryo Hayashi, Hideya Kumomi, and Yuzo Shigesato. "DC sputter deposition of amorphous indium–gallium–zinc–oxide (a-IGZO) films with H2O introduction." Thin Solid Films 518, no. 11 (March 2010): 3004–7. http://dx.doi.org/10.1016/j.tsf.2009.09.176.

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Pachlhofer, Julia M., Aitana Tarazaga Martín-Luengo, Robert Franz, Enrico Franzke, Harald Köstenbauer, Jörg Winkler, Alberta Bonanni, and Christian Mitterer. "Non-reactive dc magnetron sputter deposition of Mo-O thin films from ceramic MoOx targets." Surface and Coatings Technology 332 (December 2017): 80–85. http://dx.doi.org/10.1016/j.surfcoat.2017.07.083.

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45

Selinder, T. I., G. Larsson, U. Helmersson, S. Rudner, and I. Petrov. "The dc magnetron sputter deposition process of YBa 2 Cu 3 O x thin films." Physica C: Superconductivity and its Applications 162-164 (December 1989): 599–600. http://dx.doi.org/10.1016/0921-4534(89)91166-0.

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46

Meng, Lingling, Qufu Wei, Yueli Li, and Wenzheng Xu. "Effects of plasma pre-treatment on surface properties of fabric sputtered with copper." International Journal of Clothing Science and Technology 26, no. 1 (February 25, 2014): 96–104. http://dx.doi.org/10.1108/ijcst-06-2012-0028.

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Purpose – In this study, the polyester fabrics were treated with low temperature plasma before Cu sputtering. The effect of oxygen gas plasma pre-treatment on the surface structures, electrical properties, and mechanical properties of samples was investigated. The paper aims to discuss these issues. Design/methodology/approach – A laboratory direct current (DC) magnetron sputter coating system was used to deposit the nanoscale copper (Cu) films onto the surface of polyester plain fabric at room temperature. Findings – The crystal structure of the sputtered copper films did not show any obvious change on the O2-plasma-treated fabric, but the surface roughness and surface particle size increased significantly. Improvement in electrical properties of copper films was closely related to the deposition time. The tensile test results indicated that the mechanical properties of the plasma-treated polyester fabrics were also improved after copper coating. Originality/value – The research reports on the functional textiles, and the experiment results and analysis are original. There is a great potential to commercialize such functional textiles.

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47

Sonoda, Tsutomu, Akira Watazu, Kazumi Kato, and Tadashi Asahina. "Deposition of Sn-Al Onto Aluminum Powder in Its Self-Convective Motion by DC Sputtering." Materials Science Forum 498-499 (November 2005): 23–27. http://dx.doi.org/10.4028/www.scientific.net/msf.498-499.23.

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The deposition of Sn-5wt.%Al alloy onto pure aluminum powder in its self-convective motion by magnetron DC sputtering was examined in order to prepare Al-Sn composite particles, aiming not only at the development of highly uniform sintered binary compact materials but also at the improvement of the bonding between the aluminum particles after sintering at low temperature such as 250°C. The self-convection phenomenon of the aluminum powder in the vacuum chamber occurred when a perpendicular vibration was applied to the powder. The sputter-deposition of the Sn-Al alloy was carried out during the self-convection of the aluminum powder. Under SEM and according to EPMA analysis, as well as according to thermal analysis with DSC, it was confirmed that the obtained particles were coated with the Sn-Al deposits. Therefore it was found that Sn-Al composite powder could be produced by this processing, and thereby not only the development of highly uniform sintered binary compact materials but also the improvement of the bonding between the aluminum particles after sintering at low temperature were expected.

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Becerril-Gonzalez, J. J., A. M. Castro-Chong, G. Oskam, and O. Arés-Muzio. "Sputter deposition of Mo-alumina cermet solar selective coatings: Interrelation between residual oxygen incorporation, structure and optical properties." Materials Research Express 8, no. 10 (October 1, 2021): 105506. http://dx.doi.org/10.1088/2053-1591/ac3042.

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Abstract Mo/alumina cermet-based selective coatings are of great interest for concentrated solar-thermal power systems, in particular, parabolic trough collectors. We report on the sputter deposition of high-performance multilayer Mo/alumina cermet coatings on stainless steel with a solar absorptance of 94% and a thermal emittance of 8% (at 400 °C), and excellent thermal stability. The selective coatings were deposited in a 0.95 m3 sputtering chamber in order to correlate the deposition parameters, such as presence of residual gases, deposition power, and sputtering method (DC or RF), with the coating composition and the resulting optical properties. X-ray photoelectron spectroscopy, x-ray diffraction, and Raman spectroscopy have been applied to quantitatively describe the effect of residual oxygen on the distribution of oxidation states of Mo in the metallic infrared reflector layer, the high and low metallic volume fraction cermet layers, as well as the composition of the alumina top layer. The results provide strategies to obtain optimal selective coatings under conditions where residual oxygen cannot be avoided, which are essential for a successful transition from a laboratory to pre-industrial scale of vacuum deposition systems.

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Sonoda, Tsutomu, Akira Watazu, Kiyotaka Katou, and Tadashi Asahina. "AES Studies on the Ti/N Compositionally Gradient Film Deposited onto Ti-6Al-4V Alloy by Reactive DC Sputtering." Microscopy and Microanalysis 12, no. 4 (July 14, 2006): 356–61. http://dx.doi.org/10.1017/s1431927606060478.

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Deposition of Ti/N compositionally gradient film onto Ti-6Al-4V alloy substrates was carried out by reactive DC sputtering, not only to improve the blood compatibility of the alloy but also to relax the stress concentrated at the interface between the film and the alloy substrate. The compositional gradient was realized by varying continuously the nitrogen content in Ar-N2 sputter gas during deposition. In Auger electron spectroscopy (AES) analysis, Auger spectra were acquired in the N(E) mode using the beam brightness modulation (BBM) method to overcome the problem of the peak overlap of the principal Auger nitrogen transition peak (N-KLL) with one of titanium peaks (Ti-LMM). The deposited film appeared to be uniform and adhesive. TiN formation at the surface of the film was assumed, because of its yellow gold color and the X-ray diffraction (XRD) pattern for it. Under scanning electron microscopy, it was found that the surface had fine particles dispersed on a smooth accumulated deposit and that this depositing method improved the structural property of the film at the surface. According to AES in-depth profiles, the nitrogen (N) concentration in the film gradually decreased in the depth direction from the surface toward the alloy, confirming that a Ti/N compositionally gradient film had formed on the alloy substrate.

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Belkind, A., W. Zhu, J. Lopez, and K. Becker. "Time-resolved optical emission spectroscopy during pulsed dc magnetron sputter deposition of Ti and TiO2thin films." Plasma Sources Science and Technology 15, no. 2 (April 24, 2006): S17—S25. http://dx.doi.org/10.1088/0963-0252/15/2/s03.

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