Relevant bibliographies by topics / DC Sputter Deposition

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Academic literature on the topic 'DC Sputter Deposition'

Author: Grafiati
Published: 6 September 2023

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Journal articles on the topic "DC Sputter Deposition"

1

Thormählen, Lars, Dennis Seidler, Viktor Schell, Frans Munnik, Jeffrey McCord, and Dirk Meyners. "Sputter Deposited Magnetostrictive Layers for SAW Magnetic Field Sensors." Sensors 21, no. 24 (2021): 8386. http://dx.doi.org/10.3390/s21248386.

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For the best possible limit of detection of any thin film-based magnetic field sensor, the functional magnetic film properties are an essential parameter. For sensors based on magnetostrictive layers, the chemical composition, morphology and intrinsic stresses of the layer have to be controlled during film deposition to further control magnetic influences such as crystallographic effects, pinning effects and stress anisotropies. For the application in magnetic surface acoustic wave sensors, the magnetostrictive layers are deposited on rotated piezoelectric single crystal substrates. The thermomechanical properties of quartz can lead to undesirable layer stresses and associated magnetic anisotropies if the temperature increases during deposition. With this in mind, we compare amorphous, magnetostrictive FeCoSiB films prepared by RF and DC magnetron sputter deposition. The chemical, structural and magnetic properties determined by elastic recoil detection, X-ray diffraction, and magneto-optical magnetometry and magnetic domain analysis are correlated with the resulting surface acoustic wave sensor properties such as phase noise level and limit of detection. To confirm the material properties, SAW sensors with magnetostrictive layers deposited with RF and DC deposition have been prepared and characterized, showing comparable detection limits below 200 pT/Hz1/2 at 10 Hz. The main benefit of the DC deposition is achieving higher deposition rates while maintaining similar low substrate temperatures.
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2

Somekh, R. E., and Z. H. Barber. "UHV sputter deposition with a research-scale DC magnetron." Journal of Physics E: Scientific Instruments 21, no. 11 (1988): 1029–33. http://dx.doi.org/10.1088/0022-3735/21/11/005.

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3

Kent, Karl, and Milutin Stoilovic. "Development of latent fingerprints using preferential DC sputter deposition." Forensic Science International 72, no. 1 (1995): 35–42. http://dx.doi.org/10.1016/0379-0738(94)01671-q.

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4

Sonoda, Tsutomu, and Kiyotaka Katou. "Coating of Granular Polymeric Spacers with Copper by Sputter-Deposition for Enhancing Cell Wall Structure of Sintered Highly Porous Aluminum Materials." Materials Science Forum 660-661 (October 2010): 432–36. http://dx.doi.org/10.4028/www.scientific.net/msf.660-661.432.

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The deposition of copper onto acrylic resin powder in its self-convective motion by magnetron DC sputtering was examined in order to prepare granular polymeric spacers coated with the metal, aiming at enhancing the cell wall structure of sintered highly porous aluminum materials. The fabrication of sintered highly porous aluminum materials was carried out in an ordinary powder metallurgy processing combined with a space-holder method with the polymer-copper binary spacer granules prepared by powder-coating using the sputter-deposition technique. The effects of the sputter-deposition of copper onto the spherical polymeric spacers on cell structures of the sintered porous compacts were investigated. According to optical observations, it was found that the sputtered copper could be uniformly and adherently deposited onto the surface of the acrylic granules. According to EPMA analysis on the cross-section on a sintered porous compact, it was found that Cu atoms were distributed at the vicinity of its cell walls, concluding that cell wall structures could be enhanced by this processing. Therefore it was expected that the compressive properties of the sintered highly porous aluminum materials were also improved by this powder coating process.
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5

Park, Min Woo, Wang Woo Lee, Jae Gab Lee, and Chong Mu Lee. "A Comparison of the Mechanical Properties of RF- and DC- Sputter-Deposited Cr Thin Films." Materials Science Forum 546-549 (May 2007): 1695–98. http://dx.doi.org/10.4028/www.scientific.net/msf.546-549.1695.

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Chromium (Cr) films were deposited on plain carbon steel sheets by DC and RF magnetron sputtering as well as by electroplating. Effects of DC or RF sputtering power on the deposition rate and properties such as hardness and surface roughness of the Cr films were investigated. X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microcopy (SEM) analyses were performed to investigate the crystal structure, surface roughness, thickness of the Cr films. The deposition rate, hardness and surface roughness of the Cr film deposited by either DC or RF sputtering increase with the increase of sputtering power. The deposition rate and hardness of the Cr film deposited by DC sputtering are higher than those of the Cr film deposited by RF sputtering, but RF sputtering offers smoother surface. The sputter-deposited Cr film is harder and has a smoother surface than the electroplated one.
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6

Kharrazi Olsson, M., K. Macák, U. Helmersson, and B. Hjörvarsson. "High rate reactive dc magnetron sputter deposition of Al2O3 films." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 16, no. 2 (1998): 639–43. http://dx.doi.org/10.1116/1.581081.

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7

Ting, Jyh-Ming, and B. S. Tsai. "DC reactive sputter deposition of ZnO:Al thin film on glass." Materials Chemistry and Physics 72, no. 2 (2001): 273–77. http://dx.doi.org/10.1016/s0254-0584(01)00451-5.

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8

Schneider, R., J. Geerk, G. Linker, O. Meyer, and R. Smithey. "Effects of DC bias voltage in sputter deposition of YBaCuO films." Physica C: Superconductivity 235-240 (December 1994): 671–72. http://dx.doi.org/10.1016/0921-4534(94)91559-8.

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9

Koren, G. "DC sputter deposition of YBa2Cu3O7 thin films for two sided coating." Physica C: Superconductivity 209, no. 4 (1993): 369–72. http://dx.doi.org/10.1016/0921-4534(93)90547-4.

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10

Kellett, B. J., та J. H. James. "Ion beam sputter deposition of YBa2Cu3O7−δ thin films". Journal of Materials Research 8, № 12 (1993): 3032–42. http://dx.doi.org/10.1557/jmr.1993.3032.

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This article addresses issues associated with in situ growth of superconducting YBa2Cu3O7−δ thin films by ion beam sputtering. High oxygen partial pressure during ion beam deposition can cause significant beam broadening and oxidation of filaments and grids. Also, many of the targets used for processing YBCO are unstable when sputtered in a high oxygen partial pressure. It is shown that ion beam sputtering can produce YBCO films of comparable quality to those produced by laser ablation or dc magnetron sputtering. Typical film properties are Tco = 91 K and Jc (77 K) = 106 A cm−2. It appears that the oxygen gas pressure during the postdeposition cooldown has a more important influence on film properties than the oxygen partial pressure during deposition.
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