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Books on the topic 'Cvd'

Author: Grafiati
Published: 4 June 2021
Last updated: 8 February 2025

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1

Gleason, Karen K., ed. CVD Polymers. Weinheim, Germany: Wiley-VCH Verlag GmbH & Co. KGaA, 2015. http://dx.doi.org/10.1002/9783527690275.

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2

Toivo, Kodas, and Hampden-Smith Mark, eds. Chemistry of Metal CVD. Weinheim: VCH, 1994.

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3

Moran, Robert. Thin layer deposition: Highlighting CVD. Norwalk, CT: Business Communications Co., 2000.

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4

Bansa, Patrice B. Property characterization of CVD nickel. Ottawa: National Library of Canada, 2001.

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5

Gesheva, K. A. Chemical vapor deposition (CVD) technology. Hauppauge, N.Y: Nova Science Publishers, 2008.

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6

United States. National Aeronautics and Space Administration., ed. An overview of CVD processes. Washington DC: National Aeronautics and Space Administration, 1986.

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7

Robert, Moran. Thin layer deposition: Highlighting CVD. Norwalk, CT: Business Communications Co., 1996.

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8

Syrkin, V. G. CVD-metod: Khimicheskoe parofaznoe osazhdenie. Moskva: "Nauka", 2000.

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9

M, Kazaroff John, Appel Marshall A, and United States. National Aeronautics and Space Administration., eds. Iridium-coated rhenium thrusters by CVD. [Washington, DC]: National Aeronautics and Space Administration, 1988.

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10

M, Kazaroff John, Appel Marshall A, and United States. National Aeronautics and Space Administration., eds. Iridium-coated rhenium thrusters by CVD. [Washington, DC]: National Aeronautics and Space Administration, 1988.

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11

M, Kazaroff John, Appel Marshall A, and United States. National Aeronautics and Space Administration., eds. Iridium-coated rhenium thrusters by CVD. [Washington, DC]: National Aeronautics and Space Administration, 1988.

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12

Bliznakovska, Blagica. CVD: Main concepts, applications and restrictions. Jülich: Forschungszentrum Jülich GmbH, Zentralbibliothek, 1993.

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13

Russell, C. James. CVD diamond and related superhard materials. Waltham, MA (1100 Winter St., Waltham 02154): Decision Resources, 1993.

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14

Sussmann, Ricardo S., ed. CVD Diamond for Electronic Devices and Sensors. Chichester, UK: John Wiley & Sons, Ltd, 2009. http://dx.doi.org/10.1002/9780470740392.

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15

E, Spear Karl, Dismukes John P, and Electrochemical Society, eds. Synthetic diamond: Emerging CVD science and technology. New York: Wiley, 1994.

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16

universitet, Uppsala, ed. Nucleation and growth of CVD diamond films. Uppsala: Acta Universitatis Upsaliensis, 1995.

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17

S, Sussmann Ricardo, ed. CVD diamond for electronic devices and sensors. Chichester, West Sussex, UK: J. Wiley, 2009.

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18

Wörner, Eckhard. Thermische und optische Eigenschaften von CVD-Diamant. [s.l.]: [s.n.], 1998.

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19

Lindstam, Mikael. Photon stimulated CVD of amorphous carbon thin films. Uppsala: Acta Universitatis Upsaliensis, 2000.

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20

United States. National Aeronautics and Space Administration., ed. Dopant incorporation efficiency in CVD silicon carbide epilayers. [Washington, DC: National Aeronautics and Space Administration, 1996.

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21

E, Hann Raiford, and United States. National Aeronautics and Space Administration., eds. Paralinear oxidation of CVD SiC in water vapor. [Washington, D.C: National Aeronautics and Space Administration, 1997.

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22

E, Hann Raiford, ed. Paralinear oxidation of CVD SiC in Water Vapor. [Washington, D.C: National Aeronautics and Space Administration, 1997.

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23

universitet, Uppsala, ed. Growth, structure and morphology of CVD carbon films. Uppsala: Acta Universitatis Upsaliensis, 1993.

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24

Fischer, Roland A. Precursor chemistry of advanced materials: CVD, ALD and nanoparticles. Berlin: Springer, 2010.

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25

1933-, Pulker H. K., and Bergmann E, eds. Wear and corrosion resistant coatings by CVD and PVD. Chichester: E. Horwood, 1989.

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26

Jones, Anthony C. CVD of compound semiconductors: Precursor synthesis, development and applications. Weinheim, Germany: VCH, 1997.

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27

A, Fischer Roland, ed. Precursor chemistry of advanced materials: CVD, ALD and nanoparticles. Berlin: Springer, 2005.

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28

Prange, Robert. Abscheidung metastabiler Ti₁₋xAlxN-Schichten nach dem plasmagestützten CVD-Verfahren. Düsseldorf: VDI Verlag, 2000.

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29

M, Yun H., DiCarlo James A, and United States. National Aeronautics and Space Administration., eds. Creep and rupture strength of an advanced CVD SiC fiber. [Washington, DC]: National Aeronautics and Space Administration, 1997.

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30

Anita, Garg, Hull David R, United States. National Aeronautics and Space Administration., and U.S. Army Research Laboratory., eds. Microstructural and strength stability of a developmental CVD SiC fiber. [Washington, D.C.]: National Aeronautics and Space Administration, 1995.

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31

Anita, Garg, Hull David R, United States. National Aeronautics and Space Administration., and U.S. Army Research Laboratory., eds. Microstructural and strength stability of a developmental CVD SiC fiber. [Washington, D.C.]: National Aeronautics and Space Administration, 1995.

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32

M, Terepka Francis, Gokoglu Suleyman A, and United States. National Aeronautics and Space Administration., eds. CVD of silicon carbide on structural fibers: Microstructure and composition. [Washington, DC]: National Aeronautics and Space Administration, 1992.

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33

Weerts, W. L. M. Low pressure CVD of polycrystalline silicon: Reaction kinetics and reactor modelling. Eindhoven: University of Eindhoven, 1995.

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34

Ramaekers, Peter Paul Jozef. TiC growth by CVD and in diffusion couples: A comparative study. [s.l.]: [s.n.], 1985.

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35

R, Hull David, United States. Army Aviation Systems Command., and United States. National Aeronautics and Space Administration., eds. Microstructural and strength stability of CVD SiC fibers in argon environment. [Washington, DC]: National Aeronautics and Space Administration, 1991.

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36

Rees, William S., ed. CVD of Nonmetals. Wiley, 1996. http://dx.doi.org/10.1002/9783527614813.

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37

Rees, William S. Jr. CVD of Nonmetals. Wiley & Sons, Limited, John, 2007.

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38

Cvd of Nonmetals. Wiley-VCH Verlag GmbH, 1996.

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39

Jr, Rees William S. CVD of Nonmetals. Wiley & Sons, Incorporated, John, 2008.

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40

Goldsmith, David J. Cardiovascular disease and chronic kidney disease. Edited by David J. Goldsmith. Oxford University Press, 2015. http://dx.doi.org/10.1093/med/9780199592548.003.0098.

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Abstract:
Even after as full a statistical adjustment as can be made for traditional cardiovascular risk factors has been undertaken, impaired kidney function and raised concentrations of albumin in urine each increase the risk of cardiovascular disease (CVD) by two- to fourfold, the degree increasing with severity. If the patient is also suffering from diabetes (as either the cause of CKD or a complication of it), the risks of CVD increase two- to fourfold again. CKD patients should, therefore, be acknowledged as having perhaps the highest cardiovascular risk of any patient cohort. CVD is underdiagnosed and undertreated in these patients. In early CKD the manifestations of CVD are similar to those of other patients. In late CKD and particularly in patients on dialysis the epidemiology is different. Left ventricular hypertrophy is very common and sudden cardiac death is greatly increased in incidence. Heart failure is a common complication. Calcification of valves and vessels becomes increasingly common and bad CVD outcomes are associated with hyperphosphataemia and other manifestations. The mechanisms by which risks are increased are not fully understood. The evidence base for the effectiveness of established therapies for CVD is relatively light in patients with CKD, but there is evidence for benefit of lipid-lowering therapies and most nephrologists believe that blood pressure and volume control are important for good long-term outcomes. Evidence of impact on CVD of interventions to alter mineral bone disease is disappointingly weak.
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41

Hampden-Smith, Mark J., and Toivo T. Kodas. Chemistry of Metal CVD. Wiley & Sons, Incorporated, John, 2008.

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42

Choy, Kwang Leong, ed. Chemical Vapour Deposition (CVD). CRC Press, 2019. http://dx.doi.org/10.1201/9780429342363.

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43

Choy, Kwang Leong, ed. Chemical Vapour Deposition (CVD). CRC Press, 2019. http://dx.doi.org/10.1201/9781315117904.

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44

Hampden-Smith, Mark J., and Toivo T. Kodas. Chemistry of Metal CVD. Wiley & Sons, Limited, John, 2007.

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45

Choy, Kwang-Leong. Chemical Vapour Deposition (cvd). Taylor & Francis Group, 2021.

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46

Chemical vapor deposition: CVD. Weinheim, Germany: VCH Verlagsgesellschaft, 1995.

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47

Banerjee, Amitava, and Kaleab Asrress. Risk factors for cardiovascular disease. Edited by Patrick Davey and David Sprigings. Oxford University Press, 2018. http://dx.doi.org/10.1093/med/9780199568741.003.0086.

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Abstract:
The most prevalent cardiovascular diseases (CVDs) are atherosclerotic, affecting all arterial territories. Epidemiologic studies such as the Framingham and INTERHEART studies have firmly established the commonest or ‘traditional’ risk factors for CVD; namely, smoking, hypertension, diabetes mellitus, hypercholesterolaemia, and a family history of CVD. The ‘risk-factors approach’ to CVD looks at these factors, individually and in combination, in the causation of disease. The complex causation pathways involve interplay of individual factors, whether genetic or environmental. More recently, there has been increasing interest in ‘epigenetics’ or the way in which the environment interacts with genes in the process underlying CVD. This chapter presents an analysis of the traditional and novel risk factors for CVD.
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48

The chemistry of Metal CVD. Weinheim: VCH, 1994.

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49

Kodas, Toivo T., and Mark J. Hampden‐Smith, eds. The Chemistry of Metal CVD. Wiley, 1994. http://dx.doi.org/10.1002/9783527615858.

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50

WHO CVD Risk Management Package. World Health Organization, 2003.

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