Relevant bibliographies by topics / Cu2O Films

Academic literature on the topic 'Cu2O Films'

Author: Grafiati
Published: 6 September 2023

Create a spot-on reference in APA, MLA, Chicago, Harvard, and other styles

Select a source type:

Contents

Consult the lists of relevant articles, books, theses, conference reports, and other scholarly sources on the topic 'Cu2O Films.'

Next to every source in the list of references, there is an 'Add to bibliography' button. Press on it, and we will generate automatically the bibliographic reference to the chosen work in the citation style you need: APA, MLA, Harvard, Chicago, Vancouver, etc.

You can also download the full text of the academic publication as pdf and read online its abstract whenever available in the metadata.

Journal articles on the topic "Cu2O Films"

1

Nordseth, Ørnulf, Raj Kumar, Kristin Bergum, Irinela Chilibon, Sean Erik Foss, and Edouard Monakhov. "Nitrogen-Doped Cu2O Thin Films for Photovoltaic Applications." Materials 12, no. 18 (September 19, 2019): 3038. http://dx.doi.org/10.3390/ma12183038.

Full text
Abstract:
Cuprous oxide (Cu2O) is a p-type semiconductor with high optical absorption and a direct bandgap of about 2.1 eV, making it an attractive material for photovoltaic applications. For a high-performance photovoltaic device, the formation of low-resistivity contacts on Cu2O thin films is a prerequisite, which can be achieved by, for instance, nitrogen doping of Cu2O in order to increase the carrier concentration. In this work, nitrogen-doped p-type Cu2O thin films were prepared on quartz substrates by magnetron sputter deposition. By adding N2 gas during the deposition process, a nitrogen concentration of up to 2.3 × 1021 atoms/cm3 in the Cu2O thin films was achieved, as determined from secondary ion mass spectroscopy measurements. The effect of nitrogen doping on the structural, optical, and electrical properties of the Cu2O thin films was investigated. X-ray diffraction measurements suggest a preservation of the Cu2O phase for the nitrogen doped thin films, whereas spectrophotometric measurements show that the optical properties were not significantly altered by incorporation of nitrogen into the Cu2O matrix. A significant conductivity enhancement was achieved for the nitrogen-doped Cu2O thin films, based on Hall effect measurements, i.e., the hole concentration was increased from 4 × 1015 to 3 × 1019 cm−3 and the resistivity was reduced from 190 to 1.9 Ω⋅cm by adding nitrogen to the Cu2O thin films.
APA, Harvard, Vancouver, ISO, and other styles
2

Oshima, Takumi, Masaya Nohara, Takuya Hoshina, Hiroaki Takeda, and Takaaki Tsurumi. "Characterization of Cu2O Thin Film Grown by Molecular Beam Epitaxy." Key Engineering Materials 582 (September 2013): 157–60. http://dx.doi.org/10.4028/www.scientific.net/kem.582.157.

Full text
Abstract:
We report the growth of Cu2O thin films on glass and MgO(100) substrates by molecular beam epitaxy. Crystal orientation of Cu2O thin films on glass substrate were changed from (100) to (111) with increasing the deposition rate. The Cu2O thin films were epitaxially grown on MgO(100) substrate with an orientation relationship of Cu2O(110) // MgO(100). The film quality and electrical properties of Cu2O thin films were changed with deposition rate. The slow deposition rate resulted in high conductivity and mobility, as well as good crystallinity and orientation.
APA, Harvard, Vancouver, ISO, and other styles
3

Nordseth, Ørnulf, Irinela Chilibon, Bengt Gunnar Svensson, Raj Kumar, Sean Erik Foss, Cristina Vasiliu, Laurentiu Baschir, et al. "Characterization of Cuprous Oxide Thin Films for Application in Solar Cells." Diffusion Foundations 22 (May 2019): 65–73. http://dx.doi.org/10.4028/www.scientific.net/df.22.65.

Full text
Abstract:
Cuprous oxide (Cu2O) has a high optical absorption coefficient and favourable electrical properties, which make Cu2O thin films attractive for photovoltaic applications. Using reactive radio-frequency magnetron sputtering, high quality Cu2O thin films with good carrier transport properties were prepared. This paper presents the characteristics of Cu2O thin films that were sputter deposited on quartz substrates and subjected to post-deposition rapid thermal annealing. The thickness of the thin films and the optical constants were determined by ellipsometry spectroscopy (SE). The optical transmittance increased in lower wavelength region after annealing at 900 ̊C in rapid thermal annealing (RTA). The structural and morphological properties of the Cu2O thin films were investigated by electronic scanning microscopy (SEM) and atomic force microscopy (AFM), whereas elemental analysis was performed by X-ray fluorescence spectroscopy (XRF). The carrier mobility, carrier density and film resistivity were changed after post-deposition rapid thermal annealing from respectively ~14 cm2/Vs, ~2.3 x 1015 cm-3 and ~193 Ωcm for the as-deposited Cu2O film to ~49 cm2/Vs, ~5.0 x 1014 cm-3 and ~218 Ωcm for the annealed Cu2O film. The investigation suggests that the sputter-deposited Cu2O thin films have good potential for application as absorber layers in solar cells.
APA, Harvard, Vancouver, ISO, and other styles
4

Chen, Lung-Chien, Chung-Chieh Wang, and Suz-Wei Lu. "Annealing Effects of Sputtered Cu2O Nanocolumns on ZnO-Coated Glass Substrate for Solar Cell Applications." Journal of Nanomaterials 2013 (2013): 1–6. http://dx.doi.org/10.1155/2013/891365.

Full text
Abstract:
Cuprous oxide (Cu2O) films were prepared on an indium tin oxide glass substrate by radiofrequency magnetron sputtering using a high-purity Cu target. The temperature of annealing was varied to obtain Cu2O thin films with various elements, compositions, and surface structures. The p-Cu2O thin films thus formed were characterized by FESEM and XRD. After annealing at 500∘C, the bilayer structure which consisted of Cu nanoclusters on the surface of a film of Cu2O nanocolumns was observed. The Cu2O solar cell with the bilayered structure exhibited poor power conversion efficiency.
APA, Harvard, Vancouver, ISO, and other styles
5

El-Shaer, A., and A. R. Abdelwahed. "Potentiostatic Deposition and Characterization of Cuprous Oxide Thin Films." ISRN Nanotechnology 2013 (April 17, 2013): 1–4. http://dx.doi.org/10.1155/2013/271545.

Full text
Abstract:
Electrodeposition technique was employed to deposit cuprous oxide Cu2O thin films. In this work, Cu2O thin films have been grown on fluorine doped tin oxide (FTO) transparent conducting glass as a substrate by potentiostatic deposition of cupric acetate. The effect of deposition time on the morphologies, crystalline, and optical quality of Cu2O thin films was investigated.
APA, Harvard, Vancouver, ISO, and other styles
6

Sundaresh, Sreeram, Akash Hari Bharath, and Kalpathy B. Sundaram. "Effect of Cu2O Sputtering Power Variation on the Characteristics of Radio Frequency Sputtered p-Type Delafossite CuCrO2 Thin Films." Coatings 13, no. 2 (February 9, 2023): 395. http://dx.doi.org/10.3390/coatings13020395.

Full text
Abstract:
For the first time, the effect of Cuprous Oxide (Cu2O) sputtering power variation on the radio frequency sputtered Copper Chromium Oxide (CuCrO2) thin films was studied. In this work, the sputtering power of Cr2O3 was held constant at 200 W while the sputtering power of the Cu2O target was varied from 10 to 100 W. The films were subsequently annealed at 650 °C in N2 ambiance. The effects of Cu2O sputtering power variation on the structural, optical, and electrical properties of the films have been reported in this work. X-ray diffractometer (XRD) study revealed that the single-phase delafossite structure of CuCrO2 was only obtained at Cu2O sputtering power of 50 W. X-ray photoelectron spectroscopy (XPS) analysis further established the results of XRD study where Cu in 1+ oxidation state was identified in thin films obtained at 50 W of Cu2O sputtering power. The optical studies were conducted in this work on all the post-deposition annealed films in the wavelength range of 200–800 nm. The energy dispersive x-ray spectroscopy (EDS) study revealed a near stoichiometric composition ratio of 1:1.06 of Cu:Cr at% obtained in the films sputtered with 50 W of Cu2O sputtering power. The highest optical transmission of ~81% and the highest optical bandgap of 3.21 eV were observed for single-phase CuCrO2 thin films. The optical transmission and the optical bandgap were found to decrease with an increase in the Cu2O sputtering power. The electrical study performed on all the post-deposition annealed films revealed that the lowest resistivity of 0.652 Ω-cm was identified for single-phase CuCrO2 thin films obtained at 50 W of Cu2O sputtering power.
APA, Harvard, Vancouver, ISO, and other styles
7

LAI, GUOZHONG, HUIQING LAN, SUANZHI LIN, YAN QU, and FACHUN LAI. "OPTICAL PROPERTIES OF THE OXIDATION OF Cu THIN FILMS PREPARED BY THERMAL EVAPORATION." Surface Review and Letters 20, no. 01 (February 2013): 1350011. http://dx.doi.org/10.1142/s0218625x1350011x.

Full text
Abstract:
Copper films with 87 nm thickness were deposited on quartz substrates by thermal evaporation. In order to investigate the oxidation process, the Cu films were oxidized at different temperatures in air with different durations to obtain the complete and uncompleted copper oxide films. The structure and optical properties of the samples were studied by X-ray diffraction, scanning electron microscopy and spectrophotometer, respectively. It is found that the sample oxidized at 220°C for 200 min is Cu2O film with 106 nm thickness. Both the transmittance and reflectance of the samples increase with the increase of oxidation duration. The optical constants of the Cu film and the Cu2O film were retrieved by simulating the reflectance or transmittance based on the optical dielectric models. The optical constants of the Cu and Cu2O mixed layer with different composition were calculated by the effective medium theories. Adjusting the mixed layers composition and thickness, and Cu2O layer thickness, the transmittance and reflectance of the uncompleted oxidation films were simulated by optical multilayer design software. The results show that the uncompleted oxidation films consist of the Cu and Cu2O mixed layers and Cu2O layer. According to the parabolic rate law, the increase rate of Cu2O layer thickness for the uncompleted oxide films at 200°C is 1.6 nm s-1/2.
APA, Harvard, Vancouver, ISO, and other styles
8

Trinkler, Laima, Dajin Dai, Liuwen Chang, Mitch Ming-Chi Chou, Tzu-Ying Wu, Jevgenijs Gabrusenoks, Dace Nilova, Rihards Ruska, Baiba Berzina, and Ramunas Nedzinskas. "Luminescence Properties of Epitaxial Cu2O Thin Films Electrodeposited on Metallic Substrates and Cu2O Single Crystals." Materials 16, no. 12 (June 13, 2023): 4349. http://dx.doi.org/10.3390/ma16124349.

Full text
Abstract:
The luminescent properties of epitaxial Cu2O thin films were studied in 10–300 K temperature range and compared with the luminescent properties of Cu2O single crystals. Cu2O thin films were deposited epitaxially via the electrodeposition method on either Cu or Ag substrates at different processing parameters, which determined the epitaxial orientation relationships. Cu2O (100) and (111) single crystal samples were cut from a crystal rod grown using the floating zone method. Luminescence spectra of thin films contain the same emission bands as single crystals around 720, 810 and 910 nm, characterizing VO2+, VO+ and VCu defects, correspondingly. Additional emission bands, whose origin is under discussion, are observed around 650–680 nm, while the exciton features are negligibly small. The relative mutual contribution of the emission bands varies depending on the thin film sample. The existence of the domains of crystallites with different orientations determines the polarization of luminescence. The PL of both Cu2O thin films and single crystals is characterized by negative thermal quenching in the low-temperature region; the reason of this phenomenon is discussed.
APA, Harvard, Vancouver, ISO, and other styles
9

Markworth, Paul R., R. P. H. Chang, Y. Sun, G. K. Wong, and J. B. Ketterson. "Epitaxial stabilization of orthorhombic cuprous oxide films on MgO(110)." Journal of Materials Research 16, no. 4 (April 2001): 914–21. http://dx.doi.org/10.1557/jmr.2001.0130.

Full text
Abstract:
Continuous epitaxial films of cuprous oxide (Cu2O) have been formed by the thermal oxidation of 1.5-μm-thick Cu metal films deposited on MgO(110) substrates. These films melted at 1118 °C in air, in agreement with equilibrium phase diagrams. Upon cooling from the liquid, a highly crystalline, epitaxial, 2.5-μm-thick Cu2O film was formed. X-ray diffraction spectroscopy revealed that the Cu2O film crystal structure was orthorhombically distorted from the bulk cubic crystal structure. High-resolution transmission electron microscopy showed that the film is coherent, and energy dispersive x-ray spectroscopy showed that interdiffusion is limited to the interface. These results suggest that a new epitaxially stabilized phase of Cu2O has been formed.
APA, Harvard, Vancouver, ISO, and other styles
10

Miller, Dean J., Jeffrey D. Hettinger, Ronald P. Chiarello, and Hyung K. Kim. "Epitaxial growth of Cu2O films on MgO by sputtering." Journal of Materials Research 7, no. 10 (October 1992): 2828–32. http://dx.doi.org/10.1557/jmr.1992.2828.

Full text
Abstract:
The epitaxial growth of Cu2O films is of significant interest for the unique potential they offer in the development of multilayer devices and superlattices. While fundamental studies may be carried out on epitaxial films prepared by any technique, the growth of artificially layered superlattices requires that films grow epitaxially during deposition. The present study examined the growth of Cu2O on MgO substrates directly during deposition by sputtering. Although epitaxial thin films of Cu2O could be produced, a mosaic structure was observed. The structure of the film may be related to the growth mechanism in which islands coalesce to form a continuous film.
APA, Harvard, Vancouver, ISO, and other styles
More sources

Dissertations / Theses on the topic "Cu2O Films"

1

Han, Sanggil. "Cu2O thin films for p-type metal oxide thin film transistors." Thesis, University of Cambridge, 2018. https://www.repository.cam.ac.uk/handle/1810/285099.

Full text
Abstract:
The rapid progress of n-type metal oxide thin film transistors (TFTs) has motivated research on p-type metal oxide TFTs in order to realise metal oxide-based CMOS circuits which enable low power consumption large-area electronics. Cuprous oxide (Cu2O) has previously been proposed as a suitable active layer for p-type metal oxide TFTs. The two most significant challenges for achieving good quality Cu2O TFTs are to overcome the low field-effect mobility and an unacceptably high off-state current that are a feature of devices that have been reported to date. This dissertation focuses on improving the carrier mobility, and identifying the main origins of the low field-effect mobility and high off-state current in Cu2O TFTs. This work has three major findings. The first major outcome is a demonstration that vacuum annealing can be used to improve the carrier mobility in Cu2O without phase conversion, such as oxidation (CuO) or oxide reduction (Cu). In order to allow an in-depth discussion on the main origins of the very low carrier mobility in as-deposited films and the mobility enhancement by annealing, a quantitative analysis of the relative dominance of the main conduction mechanisms (i.e. trap-limited and grain-boundary-limited conduction) is performed. This shows that the low carrier mobility of as-deposited Cu2O is due to significant grain-boundary-limited conduction. In contrast, after annealing, grain-boundary-limited conduction becomes insignificant due to a considerable reduction in the energy barrier height at grain boundaries, and therefore trap-limited conduction dominates. A further mobility improvement by an increase in annealing temperature is explained by a reduction in the effect of trap-limited conduction resulting from a decrease in tail state density. The second major outcome of this work is the observation that grain orientation ([111] or [100] direction) of sputter-deposited Cu2O can be varied by control of the incident ion-to-Cu flux ratio. Using this technique, a systematic investigation on the effect of grain orientation on carrier mobility in Cu2O thin films is presented, which shows that the [100] Cu2O grain orientation is more favourable for realising a high carrier mobility. In the third and final outcome of this thesis, the temperature dependence of the drain current as a function of gate voltage along with the C-V characteristics reveals that minority carriers (electrons) cause the high off-state current in Cu2O TFTs. In addition, it is observed that an abrupt lowering of the activation energy and pinning of the Fermi energy occur in the off-state, which is attributed to subgap states at 0.38 eV below the conduction band minimum. These findings provide readers with the understanding of the main origins of the low carrier mobility and high off-state current in Cu2O TFTs, and the future research direction for resolving these problems.
APA, Harvard, Vancouver, ISO, and other styles
2

Besharat, Zahra. "Adsorption of molecular thin films on metal and metal oxide surfaces." Doctoral thesis, KTH, Materialfysik, MF, 2016. http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-195613.

Full text
Abstract:
Metal and metal oxides are widely used in industry, and to optimize their performance their surfaces are commonly functionalized by the formation of thin films. Self-assembled monolayers (SAMs) are deposited on metals or metal oxides either from solution or by gas deposition. Thiols with polar terminal groups are utilized for creating the responsive surfaces which can interact electrostatically with other adsorbates. Surface charge effects wetting and adhesion, and many other surface properties. Polar terminal groups in thiols could be used to modify these factors. Mixed SAMs can provide more flexible surfaces, and could change the resulting surface properties under the influence of factors such as pH, temperature, and photo-illumination. Therefore, in order to control these phenomena by mixed polar-terminated thiols, it is necessary to understand the composition and conformation of the mixed SAMs and their response to these factors. In this work, mixtures of thiols with carboxylic and amino terminal groups were studied. Carboxylic and amino terminal groups of thiol interact with each other via hydrogen bonding in solution and form a complex. Complexes adsorb to the surface in non-conventional orientations. Unmixed SAMs from each type, either carboxylic terminated thiols or amino terminated thiols are in standing up orientation while SAMs from complexes are in an axially in-plane orientation. Selenol is an alternative to replace thiols for particular applications such as contact with biological matter which has a better compatibility with selenol than sulfur. However, the    Se-C bond is weaker than the S-C bond which limits the application of selenol. Understanding the selenol adsorption mechanism on gold surfaces could shed some light on Se-C cleavage and so is investigated in this work. Se-C cleavage happens in the low coverage areas on the step since atoms at steps have lower coordination making them more reactive than atoms on the terraces.  Another area where the self-assembly of molecules is of importance is for dye sensitized solar cells, which are based on the adsorption of the dye onto metal oxides surfaces such as TiO2.The interface between the SAM of dye and the substrate is an important factor to consider when designing dyes and surfaces in dye sensitized solar cells (DSSCs). The quality of the self-assembled monolayers of the dye on the TiO2 surface has a critical influence on the efficiency of the DSSCs.  Creation of just a monolayer of dye on the surface could lead to an efficient current of photo-excited electrons to the TiO2 and degeneration of the dye by redox. This work, T-PAC dye showed island growth with some ad-layer that is not in contact with the surface, whereas the MP13 dye adsorption is laminar growth.  Cuprite (Cu2O) is the initial and most common corrosion product for copper under atmospheric conditions. Copper could be a good replacement for noble metal as catalysts for methanol dehydrogenation. Knowledge about the structure of Cu2O(100) and Cu2O(111) surfaces could be used to obtain a deeper understanding of methanol dehydrogenation mechanisms with respect to adsorption sites on the surfaces. In this work, a detailed study was done of Cu2O(100) surface which revealed the possible surface structures as the result of different preparation conditions. Studies of the structure of Cu2O(100) and Cu2O(111) surfaces show that Cu2O(100) has a comparatively stable surface and reduces surface reactivity. As a consequence, dehydrogenation of methanol is more efficient on the Cu2O(111) surface. The hydrogen produced from methanol dehydrogenation is stored in oxygen adatom sites on both surfaces.

QC 20161107

APA, Harvard, Vancouver, ISO, and other styles
3

Qian, Weizhong, and 钱伟忠. "Microbial electrodes and Cu2O-based photoelectrodes for innovative electricity generation and pollutant degradation." Thesis, The University of Hong Kong (Pokfulam, Hong Kong), 2011. http://hub.hku.hk/bib/B47170281.

Full text
Abstract:
Photoelectrochemical cells (PEC) and microbial fuel cells (MFC) are two promising environmental technologies with the purposes of energy production and pollutant degradation. In this study, p-type Cu2O thin film electrodes were synthesized by electrodeposition on the ITO glass. The influences of various electrodeposition conditions, including the deposition potential, temperature, electrolyte pH, substrates and deposition duration on the morphology and the photoelectrochemical properties of the Cu2O films were investigated. The so-called p-type micro-crystal Cu2O thin film photocathodes were synthesized at -0.4 V, 70 °C and pH 10. An innovative composite Cu2O/TiO2 photoelectrode was developed by dip-coating TiO2 on the surface of the Cu2O film. The outer TiO2 layer would help reduce the electron-hole recombination and hence improve the catalyst stability. The photocatalyst was shown to be capable of photocatalytic degradation of model pollutants. Under simulated solar irradiation, methylene blue, acridine orange, and bromocresso brilliant blue G were effectively degraded in the Cu2O-based PEC. The composite Cu2O/TiO2 photoelectrode could further enhance the photodegradation of the dyes. For the study on MFC with the saline wastewater-inoculated MFCs, an electricity output of 581 mW/m2 could be achieved at a NaCl concentration of 200 mM. Based on the characterization of the bioande using the electrochemical impedance spectroscopy (EIS) technique, the R(QR)(QR) model, instead of the conventional R(QR) model, was found to fit well with the EIS data of the carbon cloth bioanode. The results support the two-interface-based physical model for the description of the bioanode, including an interface on the flat electrode and the other for the porous biofilm matrix. The new model was employed to monitor the biofilm formation and development on the carbon clothe anode during the MFC start-up. In addition, photocatalytic MFC was developed by using the Cu2O film as the photocathode for the MFC. With the simulated solar light illumination, the PMFC open circuit voltage could be increased by 200 mV comparing to the MFC test. Moreover, the cathode material (Cu2O) is much less expensive than Pt used by common MFCs.
published_or_final_version
Civil Engineering
Master
Master of Philosophy
APA, Harvard, Vancouver, ISO, and other styles
4

Dhakal, Dileep, Thomas Waechtler, Schulz Stefan E, Robert Mothes, Stefan Moeckel, Heinrich Lang, and Thomas Gessner. "In-situ XPS Investigation of ALD Cu2O and Cu Thin Films after Successive Reduction." Universitätsbibliothek Chemnitz, 2014. http://nbn-resolving.de/urn:nbn:de:bsz:ch1-qucosa-147043.

Full text
Abstract:
This talk was presented in the 14th International Conference on Atomic Layer Deposition (ALD 2014) in Kyoto, Japan on 18th June 2014. Abstract Atomic Layer Deposition (ALD) is emerging as a ubiquitous method for the deposition of conformal and homogeneous ultra-thin films on complex topographies and large substrates in microelectronics. Electrochemical deposition (ECD) is the first choice for the deposition of copper (Cu) into the trenches and vias of the interconnect system for ULSI circuits. The ECD of Cu necessitates an electrically conductive seed layer for filling the interconnect structures. ALD is now considered as a solution for conformal deposition of Cu seed layers on very high aspect ratio (AR) structures also for technology nodes below 20 nm, since physical vapor deposition is not applicable for structures with high AR. Cu seed layer deposition by the reduction of Cu2O, which has been deposited from the Cu(I) β-diketonate [(nBu3P)2Cu(acac)] (1) used as Cu precursor, has been successfully carried out on different substrates like Ta, TaN, SiO2, and Ru [1, 2]. It was found that the subsequent gas-phase reduction of the Cu2O films can be aided by introducing catalytic amounts of a Ru precursor into the Cu precursor, so that metallic copper films could potentially obtained also on non-catalytic substrates [3, 4]. In this work, in situ X-ray photoelectron spectroscopy (XPS) investigation of the surface chemistry during Cu2O ALD from the mixture of 99 mol % of 1 and 1 mol % of [Ru(η5 C5H4SiMe3)(η5-C7H11)] (2) as ruthenium precursor, and the reduction of Cu2O to metallic Cu by formic acid carried out on SiO2 substrate are demonstrated. Oxidation states of the Cu in the film are identified by comparing the Cu Auger parameter (α) [5] with literature data. α calculated after ALD equals 362.2 eV and after reduction equals 363.8 eV, comparable to the Cu2O and metallic Cu in thin-films [6] respectively. In addition, <10 % of Cu(I), Cu(II), and Cu(OH)2 species are identified from the Cu 2p3/2 and Cu L3VV Auger spectrum after reduction. Consequently, the ALD Cu2O is successfully reduced to metallic copper by in-situ thermal reduction using formic acid. [1] T. Waechtler et al., J. Electrochem. Soc., 156 (6), H453 (2009). [2] T. Waechtler et al., Microelectron. Eng., 88, 684 (2011). [3] S. Mueller et al., Conference Proceedings SCD 2011, Semiconductor Conference Dresden, pp. 1-4. [4] T. Waechtler et al., US Patent Application Publication, US 2013/0062768. [5] C. D. Wagner, Faraday Discuss. Chem. Soc., 60, 291 (1975). [6] J. P. Espinós et al., J. Phys. Chem. B, 106, 6921 (2002).
APA, Harvard, Vancouver, ISO, and other styles
5

Salek, Guillaume. "Élaboration et caractérisation de films minces absorbants de lumière à partir de dispersions colloïdales de nanoparticules d'oxydes Mn3-xCoxO4(0≤x≤3)et Cu2O." Toulouse 3, 2013. http://thesesups.ups-tlse.fr/2653/.

Full text
Abstract:
Ce travail de thèse a porté sur l'élaboration de nanoparticules d'oxydes de compositions variables, par précipitation à basse température qui, après mise en suspension sans dispersant ou surfactant, permet l'obtention de films minces par dip-coating. Ces oxydes de métaux de transition semi-conducteurs absorbants de lumière présentent un intérêt pour des applications dans les domaines de la (photo)-catalyse et du photovoltaïque. Après une revue détaillée des résultats bibliographiques et une seconde partie dédiée aux techniques de caractérisation utilisées, une étude spécifique et minutieuse a été menée sur l'influence des paramètres de précipitation (température, pH, etc) pour la formation de nanoparticules de Mn3O4. A partir des résultats obtenus, la synthèse des nanoparticules a été étendue aux composés issus de la solution solide Mn3-xCoxO4 (0
This thesis work focused on the low temperature precipitation of oxide nanoparticles of various compositions, which were then used for preparing colloidal suspensions without surfactant or dispersing agent and thin films by the dip-coating method. These transition metal oxides, that are semiconductors and light absorbers, are interesting for (photo)-catalysis and photovoltaics. After a detailed literature review and a second part dedicated to the characterisation techniques used for this work, a specific and meticulous study was carried out to understand and control the main precipitation parameters (temperature, pH,. . . Etc) for the formation of Mn3O4 nanoparticles. From these results, the synthesis of oxide nanoparticles was extended to the Mn3-xCoxO4 (0
APA, Harvard, Vancouver, ISO, and other styles
6

Dhakal, Dileep. "Growth Monitoring of Ultrathin Copper and Copper Oxide Films Deposited by Atomic Layer Deposition." Doctoral thesis, Universitätsbibliothek Chemnitz, 2017. http://nbn-resolving.de/urn:nbn:de:bsz:ch1-qucosa-229808.

Full text
Abstract:
Atomic layer deposition (ALD) of copper films is getting enormous interest. Ultrathin Cu films are applied as the seed layer for electrochemical deposition (ECD) of copper in interconnect circuits and as the non-magnetic material for the realization of giant magnetoresistance (GMR) sensors. Particularly, Co/Cu multi-layered structures require sub 4.0 nm copper film thickness for obtaining strong GMR effects. The physical vapor deposition process for the deposition of the copper seed layers are prone to non-conformal coating and poor step coverage on side-walls and bottoms of trenches and vias, and presence of overhanging structures. This may cause failure of interconnections due to formation of voids after copper ECD. ALD is the most suitable technology for the deposition of conformal seed layers for the subsequent ECD in very high aspect ratio structures, also for the technology nodes below 20 nm. Surface chemistry during the ALD of oxides is quite well studied. However, surface chemistry during the ALD of pure metal is rather immature. This knowledge is necessary to optimize the process parameters, synthesize better precursors systems, and enhance the knowledge of existing metal ALD processes. The major goal of this work is to understand the surface chemistry of the used precursor and study the growth of ultrathin copper films using in-situ X-ray photoelectron spectroscopy (XPS). Copper films are deposited by ALD using the precursor mixture consisting of 99 mol% [(nBu3P)2Cu(acac)], as copper precursor and 1 mol% of Ru(η5 C7H11)(η5 C5H4SiMe3), as ruthenium precursor. The purpose in having catalytic amount of ruthenium precursor is to obtain the Ru doped Cu2O layers for subsequent reduction with formic acid at temperatures below 150 °C on arbitrary substrates. Two different approaches for the growth of ultrathin copper films have been studied in this dissertation. In the first approach, direct thermal ALD of copper has been studied by using H2 as co-reactant on Co as catalytic substrate. In the second approach, Ru-doped Cu2O is deposited by ALD using wet-O2 as co-reactant on SiO2 as non-catalytic substrate. The Ru-doped Cu2O is successfully reduced by using either formic acid or carbon-monoxide on SiO2
Atomlagenabscheidung (ALD) von Kupfer steht im Fokus der ALD Gemeinschaft. Ultradünne Kupferschichten können als Keimschicht für die elektrochemische Abscheidung (ECD) von Kupfer in der Verbindungstechnologie eingesetzt werden. Sie können ebenfalls für Sensoren, welche auf den Effekt des Riesenmagnetowiderstandes (GMR) basieren, als nicht-ferromagnetische Zwischenschicht verwendet werden. Insbesondere Multischichtstrukturen aus ferromagnetische Kobalt und Kupfer erfordern Schichtdicken von weniger als 4,0 nm, um einen starken GMR-Effekt zu gewährleisten. Das derzeit verwendete physikalische Dampfabscheidungsverfahren für ultradünne Kupferschichten, ist besonders anfällig für eine nicht-konforme Abscheidung an den Seitenwänden und Böden von Strukturen mit hohem Aspektverhältnis. Des Weiteren kann es zur Bildung von Löchern und überhängenden Strukturen kommen, welche bei der anschließenden Kupfer ECD zu Kontaktlücken (Voids) führen können. Für die Abscheidung einer Kupfer-Keimschicht ist die ALD besonders gut geeignet, da sie es ermöglicht, ultradünne konforme Schichten auf strukturierten Oberflächen mit hohem Aspektverhältnis abzuscheiden. Dies macht sie zu einer der Schlüsseltechnologien für Struckturgrößen unter 20 nm. Im Gegensatz zur Oberflächenchemie rein metallischer ALD sind die Oberflächenreaktionen für oxidische ALD Schichten sehr gut untersucht. Die Kenntnis der Oberflächenchemie während eines ALD Prozesses ist essenziel für die Bestimmung von wichtigen Prozessparametern als auch für die Verbesserung der Präkursorsynthese ansich. Diese Arbeit beschäftigt sich mit der Untersuchung der Oberflächenchemie und Charakterisierung des Wachstums von ultradünnen Metall-Cu-Schichten mittels In-situ XPS, welche eines indirekten (Oxid) bzw. direkten Metall-ALD Prozesses abgeschieden werden, wobei die Kupfer-Oxidschichten im Anschluss einem Reduktionsprozess unterworfen werden. Hierfür wird eine Präkursormischung bestehend aus 99 mol% [(nBu3P)2Cu(acac)] und 1 mol% [Ru(η5 C7H11)(η5-C5H4SiMe3)] verwendet. Die katalytische Menge an Ru, welche in der entstehenden Cu2O Schicht verbleibt, erhöht den Effekt der Reduktion der Cu2O Schicht auf beliebigen Substraten mit Ameinsäure bei Wafertemperaturen unter 150 °C. In einem ersten Schritt wird ein direkter thermisches Kupfer ALD-Prozess, unter Verwendung von molekularem Wasserstoff als Coreaktant, auf einem Kobalt-Substrat untersucht. In einem zweiten Schritt wird ein indirekter thermischer Cu2O-ALD-Prozess, unter gleichzeitiger Verwendung von Sauerstoff und Wasserdampf als Coreaktant, mit anschließender Reduktion durch Ameinsäure oder Kohlenstoffmonoxid zu Kupfer auf den gleichen Substraten betrachtet. Die vorliegende Arbeit beschreibt das Wachstum von ultradünnen und kontinuierlichen Kupfer-Schichten mittels thermischer ALD auf inerten- SiO2 und reaktiven Kobalt-Substraten
APA, Harvard, Vancouver, ISO, and other styles
7

Brandt, Iuri Stefani. "Eletrodeposição de filmes finos de Cu2O dopados com Co." reponame:Repositório Institucional da UFSC, 2012. http://repositorio.ufsc.br/xmlui/handle/123456789/93893.

Full text
Abstract:
Dissertação (mestrado) - Universidade Federal de Santa Catarina, Centro Tecnológico, Programa de Pós-Graduação em Engenharia Elétrica, Florianópolis, 2010
Made available in DSpace on 2012-10-25T04:25:43Z (GMT). No. of bitstreams: 1 284769.pdf: 982929 bytes, checksum: e6f628e30c0f2078abcef6ba2c4f3d36 (MD5)
Com o objetivo de se obter filmes finos do óxido de cobre (Cu2O) com comportamento ferromagnético a temperatura ambiente, este trabalho se concentrou na investigação das propriedades de filmes finos de Cu2O dopados com Co. Os filmes foram obtidos através da técnica de eletrodeposição, com o emprego de um eletrólito contendo 0,4 M CuSO4 (sulfato de cobre), 3,0 M C3H6O3 (ácido lático) e 0,004-0,016 M CoSO4 (sulfato de cobalto). Hidróxido de sódio numa concentração de 5,0 M foi adicionado ao eletrólito para se obter um valor de pH igual a 10. O substrato utilizado foi silício do tipo n (100), e a deposição foi realizada a temperatura ambiente aplicando um potencial constante de -0,5 V vs. SCE. A caracterização foi conduzida através de difratometria de raios X, espectroscopia óptica, microscopia eletrônica de transmissão e medidas de magnetometria utilizando um magnetômetro de amostra vibrante (MAV), um SQUID (superconducting quantum interference devices) e uma balança de Faraday. Os resultados obtidos por difratometria de raios X mostraram que os filmes finos de Cu2O eletrodepositados apresentam uma orientação preferencial na direção (200), seguindo a do substrato, e somente picos referentes ao substrato e ao Cu2O foram encontrados. Além disso, o parâmetro de rede apresenta uma dependência sutil com a quantidade de íons Co2+ incorporados. Foi também verificado que esta incorporação leva a um aumento da energia de gap do Cu2O, alcançado o valor de 2,27 eV. A caracterização magnética revelou que estes filmes apresentam comportamento ferromagnético, com temperatura de Curie de aproximadamente 555 K. Análise realizada por microscopia eletrônica de transmissão indicou a não existência de partículas de segunda fase, que poderiam ser as responsáveis por este sinal. Através destes resultados comprovamos que os filmes finos de Cu2O obtidos neste trabalho apresentam uma dopagem com átomos de Co e se caracterizam como um semicondutor ferromagnético diluído com comportamento ferromagnético a temperatura ambiente, alcançando assim o objetivo central deste trabalho.
APA, Harvard, Vancouver, ISO, and other styles
8

Pelegrini, Silvia. "Efeito do dopante cloro nas propriedades estruturais e ópticas de filmes finos de Cu2O." reponame:Repositório Institucional da UFSC, 2014. https://repositorio.ufsc.br/xmlui/handle/123456789/128607.

Full text
Abstract:
Tese (doutorado) - Universidade Federal de Santa Catarina, Centro de Ciências Físicas e Matemáticas, Programa de Pós-Graduação em Física, Florianópolis, 2014.
Made available in DSpace on 2015-02-05T20:10:13Z (GMT). No. of bitstreams: 1 327490.pdf: 2837442 bytes, checksum: dece4a8e4e597ed84af917aa96baa0da (MD5) Previous issue date: 2014
Esta tese se concentra em eletrodepositar filmes finos de óxido cuproso (Cu2O) dopado com cloro e estudar as características estruturais e ópticas desses filmes. Os filmes foram eletrodepositados potenciostaticamente com duas concentrações de cloreto de cobre (CuCl2) na solução de deposição (0,01 e 0,1 M). Para a caracterização estrutural dos filmes utilizou-se a técnica de difração de Raios-X (DRX), obtendo-se os valores dos parâmetros de rede e informações sobre textura dos filmes produzidos. Utilizou-se também Microscopia Eletrônica de Varredura (FEG ? MEV) e Transmissão (TEM) para investigar a morfologia de crescimento e a estrutura dos filmes. Para determinar as fases presente nos filmes foi utilizada a Espectroscopia Raman. As propriedades ópticas foram investigadas através de espectros de reflectância, o que possibilitou determinar os índices de refração (n) e o gap (Eg) dos filmes estudados. A cristalinidade do material sofreu influência da quantidade de cloro adicionada ao eletrólito, o que é importante, pois pode influenciar nas propriedades elétricas e catalíticas deste material. Para obter informações sobre a composição química e a incorporação do cloro nos filmes de Cu2O, foram utilizadas as técnicas de Espectroscopia por Dispersão de Energia (EDS) e Espectroscopia de Emissão Óptica pela Descarga Luminescente (GDOES). Medidas de capacitância (CxV) e curvas de diodo Schottky (IxV) foram realizadas para caracterizar o tipo de semicondutor, demonstrando que os filmes de Cu2O são semicondutores tipo n.

Abstract : This thesis focuses on the electrodeposition of thin films of cuprous oxide (Cu2O) doped with chlorine and to study the structural and optical properties. The films were electrodeposited potentiostatically with two concentrations of copper (CuCl2) chloride in the deposition solution (0.01 and 0.1 M). For structural characterization of the films was used the X-Ray diffraction (XRD), obtaining the values of lattice parameters and information about texture of the films. Scanning Electron Microscopy (FEG - SEM) and Transmission Electron Microscopy (TEM) were used to investigate the growth morphology of the films. To determine the phases present in the films was used Raman Spectroscopy. The optical properties were investigated by Reflectance Spectra, which made possible to determine the refractive index (n) and gap (Eg) of the films. The crystallinity of the material was influenced by the amount of chlorine added to the electrolyte, which is important as it can influence the electrical and catalytic properties of this material. For information about the chemical composition and the incorporation of chlorine in the films of Cu2O, were used Energy Dispersive Spectroscopy (EDS) and Optical Emission Spectroscopy by Luminescent Discharge (GDOES) techniques. Capacitance measurements (CxV) curves and Schottky diode (IxV) measurements were performed to characterize the type of semiconductor, demonstrating that the Cu2O films are n - type semiconductors.
APA, Harvard, Vancouver, ISO, and other styles
9

Cretu, V., V. Postica, N. Ababii, F. Schütt, M. Hoppe, D. Smazna, V. Trofim, V. Sontea, R. Adelung, and O. Lupan. "Ethanol Sensing Performances of Zinc-doped Copper Oxide Nano-crystallite Layers." Thesis, Sumy State University, 2015. http://essuir.sumdu.edu.ua/handle/123456789/42506.

Full text
Abstract:
The synthesis via chemical solutions (aqueous) (SCS) wet route is a low-temperature and cost-effective growth technique of high crystalline quality oxide semiconductors films. Here we report on morphology, chemical composition, structure and ethanol sensing performances of a device prototype based on zincdoped copper oxide nanocrystallite layer. By thermal annealing in electrical furnace for 30 min at temperatures higher than 550 ˚C, as-deposited zinc doped Cu2O samples are converted to tenorite, ZnxCu1-xOy, (x=1.3wt%) that demonstrate higher ethanol response than sensor structures based on samples treated at 450 ˚C. In case of the specimens after post-growth treatment at 650 ˚C was found an ethanol gas response of about 79 % and 91 % to concentrations of 100 ppm and 500 ppm, respectively, at operating temperature of 400 ˚C in air.
APA, Harvard, Vancouver, ISO, and other styles
10

Erickson, Matthew. "Reaction Velocities in Free Standing Aluminum and Cooper Oxide This Films." Master's thesis, University of Central Florida, 2009. http://digital.library.ucf.edu/cdm/ref/collection/ETD/id/4274.

Full text
Abstract:
In this work we investigate the reaction propagation velocity of aluminum and copper oxide Metastable Intermolecular Composites (MIC's). All samples were deposited in a magnetron sputtering system using 2 aluminum targets and 2 copper targets. The copper is sputtered in an oxygen rich environment in order to obtain copper oxide rich films. Three different layer structures are used for various measurements that are composed of alternating 20 layer pairs, 30 layer pairs, and 40 layer pairs. All layer pairs maintain a constant total thickness of 3.2 microns. Each layer structure can be prepared independent of a substrate and is measured with the use of photodiodes or with direct device contact. Aluminum and copper oxide structures have potential use as propellants and additives to explosives, thus, accurate propagation velocity or burn rate measurements are important. The developed measurement system for burn rate measurements of Al/CuO MIC's can achieve and accuracy of 0.1 m/s. In order to determine the velocity limiting characteristics, MIC's on glass and silicon substrates were measured as well as free standing Al/CuO MIC's. Separate burn rate measurement devices were created in order to handle the variety of substrates. In addition, the ignition energy of the Al/CuO MIC was studied to further characterize the samples. This was done using both voltage and current probes of a reacting sample. Rutherford backscattering spectroscopy (RBS) was used for sample composition calibration. The pre- and post-reaction Al/CuO MIC's were also characterized by transmission electron microscopy (TEM).
M.S.E.E.
School of Electrical Engineering and Computer Science
Engineering and Computer Science
Electrical Engineering MSEE
APA, Harvard, Vancouver, ISO, and other styles
More sources

Books on the topic "Cu2O Films"

1

Thin Film Solar Cells from Earth Abundant Materials: Growth and Characterization of Cu24 Thin Films and Their Solar Cells. Elsevier, 2013.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
2

Kodigala, Subba Ramaiah. Thin Film Solar Cells from Earth Abundant Materials: Growth and Characterization of Cu24 Thin Films and Their Solar Cells. Elsevier, 2017.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
3

Markendorf, Marcio, Leonardo Ripoll, and Renata Santos da Silva. Mundos da animação. Biblioteca Universitária Publicações, 2020. http://dx.doi.org/10.5007/978-65-87206-36-3.

Full text
Abstract:
Quinto volume da Coleção Cadernos de Crítica, Mundos da animação é resultado da curadoria do Projeto Cinema Mundo no primeiro semestre de 2019, cujo objetivo foi discutir o gênero da animação em filmes que utilizam desta estética para explorar suas narrativas. O conjunto de textos reunidos nesta publicação discorre sobre os filmes exibidos na curadoria, considerando o cenário sociohistórico das produções e do gênero da animação enquanto fenômeno cinematográfico e cultural. Entre os filmes abordados nos capítulos, estão Perfect Blue, Ilha dos Cachorros, Mary & Max: Uma Amizade Diferente e Com Amor, Van Gogh.
APA, Harvard, Vancouver, ISO, and other styles
4

Ripoll, Leonardo, and Andrey Kolling Lehnemann. Violências várias: estudos da brutalidade no cinema. Biblioteca Universitária Publicações, 2022. http://dx.doi.org/10.5007/978-65-89363-03-3.

Full text
Abstract:
Sexto volume da Coleção Cadernos de Crítica, Violências várias: estudos da brutalidade no cinema é resultado da curadoria do Projeto Cinema Mundo no segundo semestre de 2019, cujo objetivo foi abordar a violência em diferentes facetas: simbólicas, materiais, emocionais, sexuais, sociais, políticas, ecológicas, culturais, religiosas. Com 14 artigos críticos e 1 prefácio teórico sobre o apelo estético da violência, o conjunto de textos reunidos nesta publicação discorre sobre filmes como Irreversível, Dançando no Escuro, Mãe!, Parasita, Relatos Selvagens, Grave, Tom na Fazenda, Caché e Midsommar.
APA, Harvard, Vancouver, ISO, and other styles
5

Mourão, Patrícia, ed. Jonas Mekas. Universidade de São Paulo. Escola de Comunicações e Artes, 2011. http://dx.doi.org/10.11606/9788562587085.

Full text
Abstract:
Este volume 3 da Coleção CINUSP remete ao início da programação de 2013, com a mostra de uma vasta seleção de filmes do cineasta lituano Jonas Mekas, radicado nos Estados Unidos. Jonas Mekas é figura central na história do que se convencionou denominar “cinema underground norte-americano”, além de ter sido roteirista, crítico, curador e um dos principais agitadores culturais de sua época. Este publicação relata a importância do cineasta que subverteu cânones da linguagem do cinema dito comercial ou industrial, em favor de uma abordagem extremamente pessoal e impressionista. Os filmes do diretor tendem a evocar recordações e experiências pessoais, momentos íntimos e da realidade cotidiana, como se fossem impulsionados pela necessidade de cicatrização de questões do passado do próprio cineasta. Esta obra reafirma o compromisso do CINUSP Paulo Emílio com a divulgação e o estudo de cinematografias e autores cujo desconhecimento por grande parte do público é incompatível com sua importância e relevância para o desenvolvimento das artes e técnicas do cinema.
APA, Harvard, Vancouver, ISO, and other styles
6

Fontán, Gustavo, and Gloria Peirano. El lago helado. Papel Cosido, 2018. http://dx.doi.org/10.35537/10915/149095.

Full text
Abstract:
Trilogía del Lago Helado es una película de Gustavo Fontán, de cuyo proceso de realización nació este libro. No se trata de un diario de filmación en el sentido estricto; no recorre los pasos del rodaje o de la postproducción ni relata aspectos técnicos. Expone, con el foco puesto en la poética que signa a la obra, impresiones, reflexiones, breves anécdotas que fueron dando origen al contenido y a la forma del film. Los textos de los autores, Gustavo Fontán (El lago helado) y Gloria Peirano (Manual para sonámbulos) están precedidos por dos estudios a cargo de Eduardo A. Russo y de Roger Koza, que se refieren a esta película en particular y a la estética fílmica de Fontán en general. En las páginas del libro, las palabras de Gustavo y de Gloria dialogan con algunas citas de autores diversos y con imágenes emanadas de la película, de modo tal que todo el conjunto sumerge sutilmente al lector en el mundo de ese lago helado, donde la cotidianeidad y los sueños se entretejen en el difuso límite entre la realidad y la ficción.
APA, Harvard, Vancouver, ISO, and other styles
7

Souza, Gustavo Henrique Silva de. Administração e empreendedorismo: temas emergentes e aplicações contemporânea. Editora Amplla, 2021. http://dx.doi.org/10.51859/amplla.aet474.1121-0.

Full text
Abstract:
Nos dias atuais, a administração (de empresas ou pública) tem assimilado conceitos e características de natureza empreendedora, que levam a mudanças de paradigmas dentro da própria área do conhecimento. Nesse limiar, a administração e o empreendedorismo se tornaram indissociáveis não apenas a nível acadêmico, mas na prática gerencial cotidiana. Com efeito, esse cenário chama a atenção dos pesquisadores e, cada vez mais, estudos são desenvolvidos com o foco em novas aplicações do conhecimento gerencial. É pensando nessa indissociabilidade, que este livro surge. Organizado em duas partes, o livro traz 15 capítulos que abordam temas extremamente atuais e emergentes que partem, ora de uma compreensão macro, ora de uma compreensão micro dos fenômenos que impactam diretamente as organizações, passando por temas, como: perfil empreendedor, liderança, pandemia, gestão estratégica, gestão de serviços, gestão de pessoas, gestão pública. A esse respeito, as implicações da pandemia da COVID-19 para as organizações e o mercado também ganham espaço contundente nesta obra, frente a uma série de rápidas mudanças que tornaram a gestão significativamente desafiadora neste ambiente complexo e instável. A obra foi concebida para ser utilizada, principalmente, por estudantes, professores, pesquisadores das subáreas ligadas às Ciências Sociais Aplicadas, mais enfaticamente a Administração. Apesar disso, empresários e gestores perceberão que podem se beneficiar de modo contundente desta obra, uma vez que são trazidas temáticas das mais diferentes ordens e cujo dimensionamento está na aplicabilidade prática da gestão empreendedora. Na primeira parte, “Discussões em Empreendedorismo”, abordam-se questões relacionadas conceitualmente e empiricamente ao empreendedorismo e à inovação, compreendendo o contexto empresarial e mercadológico em 7 capítulos. O Capítulo 1, “Barreiras e Facilitadores ao Empreendedorismo: Aspectos Teóricos e Instrumentação”, apresenta uma medida psicométrica inédita que mapeia a capacidade de desenvolvimento empreendedor individual a partir da identificação das principais barreiras (inibidores) e facilitadores (incentivadores). A ferramenta demonstra aplicabilidade para a realização de novas pesquisas e também fornece um mapeamento fidedigno do perfil empreendedor, considerando variáveis comportamentais e contextuais. O Capítulo 2, “Aversión Al Riesgo de Fracasar al Emprender un Negocio en México: Un Acercamiento con algunos Factores Educativos” (em tradução livre, Aversão ao Risco de Fracassar ao abrir um Negócio no México: Uma abordagem com alguns Fatores Educacionais), traz um estudo desenvolvido no México que relaciona a baixa escolaridade, a falta de acesso à educação e, consequentemente, a dificuldade de inserção no mercado de trabalho como condicionantes para a intenção de empreender. Trazendo dados demográficos e socioeconômicos, o estudo contribui com uma discussão extremamente pertinente para a compreensão do empreendedorismo por necessidade e seu impacto direto no desenvolvimento produtivo local – um cenário muito semelhante ao contexto brasileiro. O Capítulo 3, “A Importância da Gestão em Tempos de Crises: Uma Reflexão sobre a Pandemia da Covid-19”, trata de uma temática emergente e, por meio de uma interessante revisão de literatura, destaca práticas e ações a nível gerencial que impactam diretamente a vida nas organizações no momento pandêmico. Nos Capítulos 4 e 5, “Financiamento para Inovação: Pontos Positivos e Negativos do Crowdfunding” e “Financiamento da Inovação por Meio do Crowdfunding: Fatores de Sucesso”, descrevem os principais pontos (positivos e negativos) da prática de financiamentos coletivos ou crowdfunding, por meio de uma análise focada na inovação tecnológica. Os capítulos trazem contribuições principalmente para micro e pequenas empresas que atuam com inovação e necessitam superar dificuldades de acesso a recursos financeiros. No Capítulo 6, “Empresas Familiares: Gestão e Características Empreendedoras em Tempos de Pandemia da COVID-19”, tem-se um levantamento com gestores de empresas familiares, em que são discutidas as relações gerenciais e sociais com implicação direta no cotidiano organizacional, com um enfoque direto neste tipo de organização. Além disso, é um estudo extremamente atual, pois traz uma contextualização sobre os desafios e impactos da Pandemia da COVID-19 no mundo empresarial. O Capítulo 7, “A Liderança Feminina nas Organizações de Trabalho: Desafios e Construções Sociais”, traz uma importante discussão sobre a igualdade de gênero e os desafios que as mulheres enfrentam no mercado de trabalho e no mundo empresarial. Por meio de uma pesquisa empírica, o capítulo aponta para uma profunda reflexão sobre o enfrentamento à desigualdade que envolve, de maneira coletiva, diversas áreas do conhecimento, instâncias e organizações sociais e educacionais. Fechando a primeira parte do Livro, o Capítulo 8, “Emergencia de Nuevos Modelos de Gestión Estrategica” (em tradução livre, Surgimento de Novos Modelos de Gestão Estratégica), embarca em uma análise teórica visando responder à seguinte questão: quais novas perspectivas e modelos de gestão estratégica estão surgindo para dar suporte ao desenvolvimento das empresas na atualidade? Dentro dessa perspectiva, tem-se um estudo que discute e reflete sobre o dinamismo e a complexidade dos ambientes social, econômico, tecnológico e natural, compreendendo a influência destes ambientes nas formas de gestão e de empreendedorismo. Na segunda parte, “Processos Gerenciais e Administrativas em Foco”, este livro aborda questões relacionadas às técnicas e ferramentas gerenciais e administrativas que se aplicam às organizações privadas e públicas, compreendendo variadas áreas do ambiente organizacional em 8 capítulos. No Capítulo 8, “Abordagem de Servicescape: Análise e Influência da Experiência do Consumidor em um Ambiente de Serviço”, analisa-se a influência da servicescape (ambiente físico onde acontece o serviço) na experiência do consumidor no processo de aquisição do serviço. Por meio de um estudo bibliométrico, o capítulo aprofunda sobre o servicescape e sobre o experienscape, levando em consideração também o que tem sido produzido academicamente na temática. O Capítulo 9, “A Importância do Treinamento como Estratégia de Potencialização do Desempenho dos Colaboradores nas Organizações”, faz uma breve análise sobre Treinamento, Desenvolvimento & Educação (TD&E), identificando os fatores que tornam esse processo tão relevante para as organizações, especialmente como estratégia de potencialização do desempenho dos colaboradores. Trazendo alguns conceitos gerais sobre a temática, o capítulo traça uma relação entre o processo de treinamento a nível de gestão de pessoas e o aumento da produtividade e a redução de custos. O Capítulo 11, “Cultura Organizacional: Uma Revisão Narrativa acerca das Tipologias e Influências na Gestão”, analisa os eventuais impactos que a cultura organizacional perfaz na gestão das organizações. Compreendendo as diversas tipologias culturais existentes, o capítulo oferece uma visão da gestão da cultura organizacional em prol da eficiência e do aumento da produtividade. No Capítulo 12, intitulado “Aplicação da Teoria das Filas em uma Hamburgueria: Um Estudo de Caso”, descreve uma pesquisa empírica realizada em um restaurante, do tipo hamburgueria, abordando-se a concepção do sistema de filas. O capítulo traz resultados interessantes para a compreensão dos fatores que envolve a gestão de filas dentro um ramo de negócio em extrema expansão no Brasil, que é o mercado de hambúrgueres e lanches. A partir deste momento, o livro se foca em estudos relacionados à gestão pública, trazendo 3 estudos que, individualmente, abordam a administração a nível municipal, estadual e federal. No Capítulo 13, “A Maturidade da Gestão do Conhecimento na SEAPI – Secretaria da Agricultura, Pecuária e Irrigação do Rio Grande do Sul (RS)”, tem-se um estudo que analisa como a gestão do conhecimento está inserida no ambiente organizacional de uma secretaria de estado, fazendo um paralelo teórico-empírico com o nível de maturidade gerencial. Este capítulo contribui especialmente para o mapeamento da maturidade em gestão do conhecimento em organizações públicas, apresentando ferramentas e técnicas para este tipo de análise. No Capítulo 14, intitulado “Avaliação dos Processos Gerenciais da Prefeitura de Luis Gomes/RN à Luz do Modelo de Excelência em Gestão Pública”, abordam-se os processos administrativos e de prestação de serviços de uma prefeitura. Neste capítulo, é utilizado um modelo padrão de análise baseado em excelência, cuja principal contribuição está em propor pontos de correção nos processos gerenciais cotidianos e ações estratégicas a serem realizadas para a melhoria da prestação de serviços aos cidadãos. Dando continuidade aos estudos relacionados à gestão pública, tem-se, por fim, o Capítulo 15, “Pregão Eletrônico nas Aquisições Públicas Federais: Economia e Impactos a Luz da Normativa 03/2011”, que trata do impacto causado na economia creditada ao uso do Pregão Eletrônico, após a implementação da Instrução Normativa nº 3/2011 do Ministério do Planejamento, Orçamento e Gestão (MPOG). Nesse sentido, o capítulo traz uma análise sobre a teoria dos leilões e a dinâmica do Pregão Eletrônico, à luz das demandas e necessidades da administração pública federal. Cabe ressaltar que este livro é fruto do esforço de cooperação desenvolvido por pesquisadores de diversas Instituições nacionais e estrangeiras, em que cada estudo apresentado perfaz uma particular contribuição para a área do conhecimento. E embora não se pretenda responder a todas as questões relacionadas à Administração e ao Empreendedorismo, esta obra traz algumas reflexões e discussões atuais que podem, de algum modo, contribuir positivamente com o avanço do conhecimento e incrementar a literatura na área.
APA, Harvard, Vancouver, ISO, and other styles

Book chapters on the topic "Cu2O Films"

1

Conard, T., L. M. Yu, J. Ghijsen, and R. Caudano. "Electron spectroscopy characterization of CuO and Cu2O thin films on MgO (100)." In Advances in Superconductivity VIII, 1075–78. Tokyo: Springer Japan, 1996. http://dx.doi.org/10.1007/978-4-431-66871-8_243.

Full text
APA, Harvard, Vancouver, ISO, and other styles
2

Zhang, W. X., Z. H. Yang, S. X. Ding, and S. H. Yang. "Synthesis and Characterization of Nanostructured CuO Array Films." In Solid State Phenomena, 303–6. Stafa: Trans Tech Publications Ltd., 2007. http://dx.doi.org/10.4028/3-908451-30-2.303.

Full text
APA, Harvard, Vancouver, ISO, and other styles
3

Volobujeva, O., E. Mellikov, S. Bereznev, J. Raudoja, A. Öpik, and T. Raadik. "Cu2 ZnSnSe4 Thin Films Produced by Selenization of Cu-Zn-Sn Composition Precursor Films." In Ceramic Transactions Series, 257–63. Hoboken, NJ, USA: John Wiley & Sons, Inc., 2011. http://dx.doi.org/10.1002/9781118019467.ch26.

Full text
APA, Harvard, Vancouver, ISO, and other styles
4

Ghosh, Amrita, Bibhuti Bhusan Show, Nillohit Mukherjee, Swapan K. Datta, Gautam Bhattacharya, and Anup Mondal. "Electrochemical Synthesis of p-CuO Thin Films and Development of a p-CuO/n-ZnO Thin Film Hetero-Contact for Gas Sensing." In Physics of Semiconductor Devices, 433–36. Cham: Springer International Publishing, 2014. http://dx.doi.org/10.1007/978-3-319-03002-9_108.

Full text
APA, Harvard, Vancouver, ISO, and other styles
5

Gordillo, G. "Optical Studies of Cu2S Thin Films Topotaxially Grown on Evaporated Zn x Cd1−x S Thin Films." In Lectures on Surface Science, 69–73. Berlin, Heidelberg: Springer Berlin Heidelberg, 1987. http://dx.doi.org/10.1007/978-3-642-71723-9_10.

Full text
APA, Harvard, Vancouver, ISO, and other styles
6

Cretu, V., V. Postica, N. Ababii, N. Magariu, V. Sontea, F. Schütt, R. Adelung, and O. Lupan. "Effect of Dopant on Selectivity of CuO Nanostructured Films – Based Sensors." In 3rd International Conference on Nanotechnologies and Biomedical Engineering, 349–52. Singapore: Springer Singapore, 2016. http://dx.doi.org/10.1007/978-981-287-736-9_84.

Full text
APA, Harvard, Vancouver, ISO, and other styles
7

Rai, S., and Pranab J. Dihingia. "Optoelectronics of Cu2+-Doped TiO2 Films Prepared by Sol–Gel Method." In Springer Proceedings in Physics, 581–89. New Delhi: Springer India, 2015. http://dx.doi.org/10.1007/978-81-322-2367-2_72.

Full text
APA, Harvard, Vancouver, ISO, and other styles
8

Yoon, Jang Hee, Yoon Bo Shim, Chae Ryong Cho, and Mi Sook Won. "Surface Characterization of Electrochemically Fabricated CuO Doped ZnO Thin Film." In Key Engineering Materials, 972–76. Stafa: Trans Tech Publications Ltd., 2005. http://dx.doi.org/10.4028/0-87849-958-x.972.

Full text
APA, Harvard, Vancouver, ISO, and other styles
9

Face, Dean W., Dennis J. Kountz, and Joseph P. Nestlerode. "In-Situ Growth and Properties of Epitaxial TlBa2(Ca1−xYx)Cu2O7 Films and Multilayers." In Advances in Superconductivity VI, 863–68. Tokyo: Springer Japan, 1994. http://dx.doi.org/10.1007/978-4-431-68266-0_195.

Full text
APA, Harvard, Vancouver, ISO, and other styles
10

Ushio, Yoshijiro, Masaru Miyayama, and Hiroaki Yanagida. "Gas Detection Utilizing the Interface of a CuO/ZnO Thin Film." In Grain Boundary Controlled Properties of Fine Ceramics, 40–49. Dordrecht: Springer Netherlands, 1992. http://dx.doi.org/10.1007/978-94-011-1878-1_6.

Full text
APA, Harvard, Vancouver, ISO, and other styles

Conference papers on the topic "Cu2O Films"

1

Vasilii, Cretu, Ababii Nicolai, Chistruga Alexandru, Magariu Nicolae, Postica Vasile, and Lupan Oleg. "CuO/Cu2O Nanostructured Films for Gas Sensors." In 2019 IEEE 9th International Conference Nanomaterials: Applications & Properties (NAP). IEEE, 2019. http://dx.doi.org/10.1109/nap47236.2019.216928.

Full text
APA, Harvard, Vancouver, ISO, and other styles
2

Wang, Cong, Fangfang Zhang, Jiushan Cheng, Yinfang Cui, and Sujuan Wu. "Synthesis and photocatalytic properties of Cu2O/BiOCl semiconductor films." In 2013 International Conference on Materials for Renewable Energy and Environment (ICMREE). IEEE, 2013. http://dx.doi.org/10.1109/icmree.2013.6893760.

Full text
APA, Harvard, Vancouver, ISO, and other styles
3

Babu, N. Sajid. "Size dependent optical properties of nanostructured Cu2O thin films." In 2ND INTERNATIONAL CONFERENCE ON MATERIALS FOR ENERGY AND ENVIRONMENT 2020. AIP Publishing, 2023. http://dx.doi.org/10.1063/5.0136672.

Full text
APA, Harvard, Vancouver, ISO, and other styles
4

Mohamed, Zainab Qassim, Abdulazeez O. Mousa Al-Ogaili, and Khalid Haneen Abass. "Morphology and optical properties of Cu2O-Doped CuO nano films prepared via thermal evaporation technique." In 2ND INTERNATIONAL CONFERENCE ON MATHEMATICAL TECHNIQUES AND APPLICATIONS: ICMTA2021. AIP Publishing, 2023. http://dx.doi.org/10.1063/5.0102570.

Full text
APA, Harvard, Vancouver, ISO, and other styles
5

Liau, Leo Chau-Kuang, Yong-Jie Peng, and Yu-Chieh Lin. "Characterization of Faceted nano-Cu2O Films Prepared by Electrodeposition Methods." In 14th Asia Pacific Confederation of Chemical Engineering Congress. Singapore: Research Publishing Services, 2012. http://dx.doi.org/10.3850/978-981-07-1445-1_257.

Full text
APA, Harvard, Vancouver, ISO, and other styles
6

Ishizuka, Shogo, Shinya Kato, Takahiro Maruyama, and Katsuhiro Akimoto. "Nitrogen Doping into Cu2O Thin Films Deposited by Reactive Sputtering Method." In 2000 International Conference on Solid State Devices and Materials. The Japan Society of Applied Physics, 2000. http://dx.doi.org/10.7567/ssdm.2000.d-7-5.

Full text
APA, Harvard, Vancouver, ISO, and other styles
7

Shaji, Manu, Saji K. J., and Jayaraj M. K. "Fabrication and characterization of p-type boron doped Cu2O thin film and Cu2O:B/n-Si heterojunction." In Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XVI, edited by André-Jean Attias and Balaji Panchapakesan. SPIE, 2019. http://dx.doi.org/10.1117/12.2529144.

Full text
APA, Harvard, Vancouver, ISO, and other styles
8

Majumder, Shanta, Nazmul Islam Tanvir, Bijoy Chandra Ghos, Md Abdul Majed Patwary, Mohammad Atiqur Rahman, Md Alauddin Hossain, and Syed Farid Uddin Farhad. "Optimization of the growth conditions of Cu2O thin films and subsequent fabrication of Cu2O/ZnO heterojunction by m-SILAR method." In 2020 IEEE International Women in Engineering (WIE) Conference on Electrical and Computer Engineering (WIECON-ECE). IEEE, 2020. http://dx.doi.org/10.1109/wiecon-ece52138.2020.9397989.

Full text
APA, Harvard, Vancouver, ISO, and other styles
9

Tuama, Alaa Nihad, Khalid Haneen Abass, Doaa Nihad Tuama, and Mohd Arif Bin Agam. "Surface morphological and elemental analysis of thermally evaporated Cu2O: Ag thin films." In 2ND INTERNATIONAL CONFERENCE ON MATHEMATICAL TECHNIQUES AND APPLICATIONS: ICMTA2021. AIP Publishing, 2023. http://dx.doi.org/10.1063/5.0103929.

Full text
APA, Harvard, Vancouver, ISO, and other styles
10

Aihara, Shingo, Akinobu Ota, Kazunori Iwamitsu, Tomoshige Shimamoto, and Ichiro Akai. "Thickness Dependence of Excitonic Spectra in Cu2O thin Films Sandwiched by MgO Plates." In Proceedings of the 12th Asia Pacific Physics Conference (APPC12). Journal of the Physical Society of Japan, 2014. http://dx.doi.org/10.7566/jpscp.1.012077.

Full text
APA, Harvard, Vancouver, ISO, and other styles

Reports on the topic "Cu2O Films"

1

Ayala, Alicia. Aspects of the SrO-CuO-TiO2 Ternary System Related to the Deposition of SrTiO3 and Copper-Doped SrTiO3 Thin-Film Buffer Layers. Office of Scientific and Technical Information (OSTI), December 2004. http://dx.doi.org/10.2172/836697.

Full text
APA, Harvard, Vancouver, ISO, and other styles
You might also be interested in the extended bibliographies on the topic 'Cu2O Films' for particular source types:
Journal articles Dissertations / Theses
We offer discounts on all premium plans for authors whose works are included in thematic literature selections. Contact us to get a unique promo code!

To the bibliography