Books on the topic 'Chemical vapor deposition'

Sivaram, Srinivasan. Chemical Vapor Deposition. Boston, MA: Springer US, 1995. http://dx.doi.org/10.1007/978-1-4757-4751-5.

Fortin, Jeffrey B., and Toh-Ming Lu. Chemical Vapor Deposition Polymerization. Boston, MA: Springer US, 2004. http://dx.doi.org/10.1007/978-1-4757-3901-5.

Gesheva, K. A. Chemical vapor deposition (CVD) technology. Hauppauge, N.Y: Nova Science Publishers, 2008.

Dobkin, Daniel M., and Michael K. Zuraw. Principles of Chemical Vapor Deposition. Dordrecht: Springer Netherlands, 2003. http://dx.doi.org/10.1007/978-94-017-0369-7.

Dobkin, Daniel M. Principles of Chemical Vapor Deposition. Dordrecht: Springer Netherlands, 2003.

O, Pierson Hugh, ed. Handbook of chemical vapor deposition. 2nd ed. Norwich, NY: Noyes Publications, 1999.

K, Zuraw Michael, ed. Principles of chemical vapor deposition. Dordrecht: Kluwer Academic Publishers, 2003.

Sherman, Arthur. Chemical vapor deposition for microelectronics: Principles, technology, and applications. Park Ridge, N.J., U.S.A: Noyes Publications, 1987.

Moroșanu, C. E. Thin films by chemical vapour deposition. Amsterdam: Elsevier, 1990.

United States. National Aeronautics and Space Administration. Scientific and Technical Information Program., ed. Numerical modeling tools for chemical vapor deposition. [Washington, D.C.]: National Aeronautics and Space Administration, Office of Management, Scientific and Technical Information Program, 1992.

Miyoshi, Kazuhisa. Chemical-vapor-deposited diamond film. [Cleveland, Ohio]: National Aeronautics and Space Administration, Lewis Research Center, 1999.

Miyoshi, Kazuhisa. Chemical-vapor-deposited diamond film. [Cleveland, Ohio]: National Aeronautics and Space Administration, Lewis Research Center, 1999.

Miyoshi, Kazuhisa. Chemical-vapor-deposited diamond film. [Cleveland, Ohio]: National Aeronautics and Space Administration, Lewis Research Center, 1999.

Miyoshi, Kazuhisa. Chemical-vapor-deposited diamond film. [Cleveland, Ohio]: National Aeronautics and Space Administration, Lewis Research Center, 1999.

Symposium, on Atomic Layer Deposition Applications (3rd 2007 Washington D. C. ). Atomic layer deposition applications 3. Pennington, NJ: Electrochemical Society, 2007.

Symposium, on Atomic Layer Deposition Applications (2nd 2006 Cancun Mexico). Atomic layer deposition applications 2. Pennington, N.J: Electrochemical Society, 2007.

Symposium on Atomic Layer Deposition Applications (2nd 2006 Cancun, Mexico). Atomic layer deposition applications 2. Edited by Londergan A, Electrochemical Society Meeting, and Electrochemical Society. Dielectric Science and Technology Division. Pennington, N.J: Electrochemical Society, 2007.

Symposium on Atomic Layer Deposition Applications (3rd 2007 Washington, D.C.). Atomic layer deposition applications 3. Edited by Londergan A, Electrochemical Society Meeting, and Electrochemical Society. Dielectric Science and Technology Division. Pennington, NJ: Electrochemical Society, 2007.

Symposium on Atomic Layer Deposition Applications (2nd 2006 Cancun, Mexico). Atomic layer deposition applications 2. Edited by Electrochemical Society Meeting and Electrochemical Society. Dielectric Science and Technology Division. Pennington, N.J: Electrochemical Society, 2007.

Symposium on Atomic Layer Deposition Applications (3rd 2007 Washington, D.C.). Atomic layer deposition applications 3. Edited by Londergan A, Electrochemical Society Meeting, and Electrochemical Society. Dielectric Science and Technology Division. Pennington, NJ: Electrochemical Society, 2007.

Symposium on Atomic Layer Deposition Applications (2nd 2006 Cancun, Mexico). Atomic layer deposition applications 2. Edited by Londergan A, Electrochemical Society Meeting, and Electrochemical Society. Dielectric Science and Technology Division. Pennington, N.J: Electrochemical Society, 2007.

Symposium on Atomic Layer Deposition Applications (3rd 2007 Washington, D.C.). Atomic layer deposition applications 3. Edited by Londergan A, Electrochemical Society Meeting, and Electrochemical Society. Dielectric Science and Technology Division. Pennington, NJ: Electrochemical Society, 2007.

Kwatera, Andrzej. Modelowanie chemicznego procesu osadzania cienkich warstw z fazy gazowej w warunkach kontrolowanych dyfuzją reagentów do podłoża. Kraków: Akademia Górniczo-Hutnicza im. S. Staszica, 1991.

B, Kaplan Richard, and Lewis Research Center, eds. Lightweight solar concentrator structures: Phase II. [Cleveland, Ohio]: Lewis Research Center, 1993.

Moene, Robert. Application of chemical vapour deposition in catalyst design: Development of high surface area silicon carbide as catalyst support. The Netherlands: Delft University Press, 1995.

Bliznakovska, Blagica. CVD: Main concepts, applications and restrictions. Jülich: Forschungszentrum Jülich GmbH, Zentralbibliothek, 1993.

Zhao, Liuyan. Chemical Vapor Deposition Grown Pristine and Chemically Doped Monolayer Graphene. [New York, N.Y.?]: [publisher not identified], 2013.

Mazumder, Jyoti, and Aravinda Kar. Theory and Application of Laser Chemical Vapor Deposition. Boston, MA: Springer US, 1995. http://dx.doi.org/10.1007/978-1-4899-1430-9.

Kleijn, Chris R., and Christoph Werner. Modeling of Chemical Vapor Deposition of Tungsten Films. Basel: Birkhäuser Basel, 1993. http://dx.doi.org/10.1007/978-3-0348-7741-1.

Mazumder, J. Theory and application of laser chemical vapor deposition. New York: Plenum Press, 1995.

Center, Langley Research, ed. Chemical vapor deposition fluid flow simulation modelling tool. Hampton, Va: National Aeronautics and Space Administration, Langley Research Center, 1992.

1949-, Werner Christoph, ed. Modeling of chemical vapor deposition of tungsten films. Basel: Birkhäuser Verlag, 1993.

C, Jones Anthony, and Hitchman Michael L, eds. Chemical vapour deposition: Precursors, processes and applications. Cambridge, UK: Royal Society of Chemistry, 2009.

Rosner, Daniel E. Research on chemical vapor deposition processes for advanced ceramic coatings. New Haven, CT: Yale University, Dept. of Chemical Engineering, High Temperature Chemical Reaction Engineering Laboratory, 1993.

Rosner, Daniel E. Research on chemical vapor deposition processes for advanced ceramic coatings. New Haven, CT: Yale University, Dept. of Chemical Engineering, High Temperature Chemical Reaction Engineering Laboratory, 1993.

Yongdong, Xu. Chemical vapour deposition: An integrated engineering design for advanced materials. London: Springer, 2009.

Moran, Robert. Thin layer deposition: Highlighting CVD. Norwalk, CT: Business Communications Co., 2000.

Robert, Moran. Thin layer deposition: Highlighting CVD. Norwalk, CT: Business Communications Co., 1996.

Robert, Moran. Thin layer deposition: Highlighting PVD. Norwalk, CT: Business Communications Co., 1996.

Liu, Huimin. Diamond chemical vapor deposition: Nucleation and early growth stages. Park Ridge, N.J: Noyes Publications, 1995.

Konuma, Mitsuharu. Plasma techniques for film deposition. Harrow, U.K: Alpha Science International, 2005.

European, Conference on Chemical Vapour Deposition (7th 1989 Perpignan France). Actes de la 7ème Conférence européenne sur les dépôts chimiques en phase gazeuse: Perpignan, France, 19-23 juin 1989 = Proceedings of the Seventh European Conference on Chemical Vapour Deposition. Les Ulis, France: Editions de physique, 1989.

Chemical Vapor Deposition. TEEX/Technology and Economic Development, 1998.

Spear. Chemical Vapor Deposition. John Wiley & Sons Inc, 1998.

(Editor), Mark Donald Allendorf, and Michael L. Hitchman (Editor), eds. Chemical Vapor Deposition: Proceedings. Electrochemical Society, 2000.

Chemical vapor deposition: CVD. Weinheim, Germany: VCH Verlagsgesellschaft, 1995.

Park, Jong-Hee. Chemical Vapor Deposition (06682G). ASM International, 2001.

Service, Texas Engineering Extension. Chemical Vapor Deposition Overview. TEEX/Technology and Economic Development, 1997.

Yasuda, Hirotsugu. Magneto Luminous Chemical Vapor Deposition. Taylor & Francis Group, 2011.

Chemical Vapor Deposition [Working Title]. IntechOpen, 2021. http://dx.doi.org/10.5772/intechopen.92958.