Relevant bibliographies by topics / Chemical patterning

Academic literature on the topic 'Chemical patterning'

Author: Grafiati
Published: 10 December 2022
Last updated: 28 January 2023

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Journal articles on the topic "Chemical patterning"

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Kuznetsov, A., K. Puchnin, and V. Grudtsov. "Methods of surface chemical patterning." Nanoindustry Russia 70, no. 8 (2016): 110–17. http://dx.doi.org/10.22184/1993-8578.2016.70.8.110.117.

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Guan, Yuduo, Bin Ai, Zengyao Wang, Chong Chen, Wei Zhang, Yu Wang, and Gang Zhang. "In Situ Chemical Patterning Technique." Advanced Functional Materials 32, no. 2 (October 7, 2021): 2107945. http://dx.doi.org/10.1002/adfm.202107945.

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Ogaki, Ryosuke, Morgan Alexander, and Peter Kingshott. "Chemical patterning in biointerface science." Materials Today 13, no. 4 (April 2010): 22–35. http://dx.doi.org/10.1016/s1369-7021(10)70057-2.

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JACOBY, MITCH. "NANOSCALE PATTERNING." Chemical & Engineering News 82, no. 46 (November 15, 2004): 8. http://dx.doi.org/10.1021/cen-v082n046.p008.

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Rodríguez González, Miriam C., Alessandra Leonhardt, Hartmut Stadler, Samuel Eyley, Wim Thielemans, Stefan De Gendt, Kunal S. Mali, and Steven De Feyter. "Multicomponent Covalent Chemical Patterning of Graphene." ACS Nano 15, no. 6 (May 28, 2021): 10618–27. http://dx.doi.org/10.1021/acsnano.1c03373.

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Dupuis, A., J. Léopoldès, D. G. Bucknall, and J. M. Yeomans. "Control of drop positioning using chemical patterning." Applied Physics Letters 87, no. 2 (July 11, 2005): 024103. http://dx.doi.org/10.1063/1.1984098.

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Liao, W. S., S. Cheunkar, H. H. Cao, H. R. Bednar, P. S. Weiss, and A. M. Andrews. "Subtractive Patterning via Chemical Lift-Off Lithography." Science 337, no. 6101 (September 20, 2012): 1517–21. http://dx.doi.org/10.1126/science.1221774.

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Schift, H., L. J. Heyderman, C. Padeste, and J. Gobrecht. "Chemical nano-patterning using hot embossing lithography." Microelectronic Engineering 61-62 (July 2002): 423–28. http://dx.doi.org/10.1016/s0167-9317(02)00513-0.

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Wosnick, Jordan H., and Molly S. Shoichet. "Three-dimensional Chemical Patterning of Transparent Hydrogels." Chemistry of Materials 20, no. 1 (January 2008): 55–60. http://dx.doi.org/10.1021/cm071158m.

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Mourzina, Yulia, Dmitry Kaliaguine, Petra Schulte, and Andreas Offenhäusser. "Patterning chemical stimulation of reconstructed neuronal networks." Analytica Chimica Acta 575, no. 2 (August 2006): 281–89. http://dx.doi.org/10.1016/j.aca.2006.06.010.

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Dissertations / Theses on the topic "Chemical patterning"

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Zhang, Feng. "Chemical Vapor Deposition of Silanes and Patterning on Silicon." BYU ScholarsArchive, 2010. https://scholarsarchive.byu.edu/etd/2902.

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Self assembled monolayers (SAMs) are widely used for surface modification. Alkylsilane monolayers are one of the most widely deposited and studied SAMs. My work focuses on the preparation, patterning, and application of alkysilane monolayers. 3-aminopropyltriethoxysilane (APTES) is one of the most popular silanes used to make active surfaces for surface modification. To possibly improve the surface physical properties and increase options for processing this material, I prepared and studied a series of amino silane surfaces on silicon/silicon dioxide from APTES and two other related silanes by chemical vapor deposition (CVD). I also explored CVD of 3-mercaptopropyltrimethoxysilane on silicon and quartz. Several deposition conditions were investigated. Results show that properties of silane monolayers are quite consistent under different conditions. For monolayer patterning, I developed a new and extremely rapid technique, which we termed laser activation modification of semiconductor surfaces or LAMSS. This method consists of wetting a semiconductor surface with a reactive compound and then firing a highly focused nanosecond pulse of laser light through the transparent liquid onto the surface. The high peak power of the pulse at the surface activates the surface so that it reacts with the liquid with which it is in contact. I also developed a new application for monolayer patterning. I built a technologically viable platform for producing protein arrays on silicon that appears to meet all requirements for industrial application including automation, low cost, and high throughput. This method used microlens array (MA) patterning with a laser to pattern the surface, which was followed by protein deposition. Stencil lithography is a good patterning technique compatible with monolayer modification. Here, I added a new patterning method and accordingly present a simple, straightforward procedure for patterning silicon based on plasma oxidation through a stencil mask. We termed this method subsurface oxidation for micropatterning silicon (SOMS).
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Nelson, Kyle A. "Chemical Templating by AFM Tip-Directed Nano-Electrochemical Patterning." BYU ScholarsArchive, 2011. https://scholarsarchive.byu.edu/etd/3188.

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This work has examines the creation and use of chemical templates for nanocircuit and other nanodevice fabrication. Chemical templating can be useful in attachment, orientation and wiring of molecularly templated circuits. DNA origami provides a suitable method for creating molecularly templated circuits as DNA can be folded into complex shapes and functionalized with active circuit elements, such as semiconducting nanomaterials. Surface attachment of DNA origami structures can be accomplished by hybridization of dangling single-stranded DNA (ssDNA) on the origami structures with complementary surface-bound strands. Chemical templating provides a pathway for placing the patterned surface-bound attachment points needed for surface alignment of the molecular templates. Chemical templates can also be used to connect circuit elements on the surface by selectively metallizing the templates to form local wiring. AFM tip-directed nano-oxidation was selected as the method for patterning to create chemical templates. This project demonstrates new techniques for creating, continuous metallization of, and DNA attachment to nanochemical templates. Selective-continuous metallization of nanochemical templates is needed for wiring of circuit templates. To improve the metallization density and enable the continuous nano-scale metallization of amine-coated surfaces, the treatment of amine-coated surfaces with a plating additive prior to metallization was studied. The additive treatment resulted in a 73% increase in seed material, enabling continuous nano-scale metallization. A new method was developed to create amine nanotemplates by selective attachment of a polymer to surface oxide patterns created by nano-oxidation. The treatment of the templates with the additive enabled a five-fold reduction in feasible width for continuous metallization. Nano-oxidation was also used in the nanometer-scale patterning of a thiol-coated surface. Metallization of the background thiols but not the oxidized patterns resulted in a metal film that was a negative of the patterns. The resulting metal film may be useful for nanometer-scale pattern transfer. DNA-coated gold nanoparticles (AuNPs) were selectively attached to amine templates by an ionic interaction between the template and ssDNA attached to the particles. Only the ssDNA on the bottom of the AuNPs interacted with the template, leaving the top strands free to bind with complementary ssDNA. Attempts to attach origami structures to these particles were only marginally successful, and may have been hindered by the presence of complementary ssDNA in solution but not attached to the origami, or the by the low density of DNA-AuNPs attached to the templates. The formation of patterned binding sites by direct, covalent attachment of ssDNA to chemical templates was also explored. Initial results indicated that ssDNA was chemically bound to the templates and able to selectively bind to complementary strands; however, the observed attachment density was low and further optimization is required. Methods such as these are needed to enable nano-scale, site-specific alignment of nanomaterials.
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Chen, Xiao Hua. "Patterning etch masks via the "Grafting-from polymerization." Diss., Georgia Institute of Technology, 2000. http://hdl.handle.net/1853/30768.

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Vuppalapati, Ragini. "Chemical Modification on Gold Slides to Gain Better Control of Patterning Techniques." TopSCHOLAR®, 2011. http://digitalcommons.wku.edu/theses/1129.

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Nanolithography is a rapidly evolving field that requires new combinations of techniques to improve patterning and to assist in fabricating electromechanical devices. An increasing number of applications require surfaces with defined regions of different chemical functionality. In our previous project optimum conditions for lithographic patterning were determined and potential blockers were identified to reduce force on the tip. This work is focused on identifying good chemical modifications that will allow better control of basic patterning and to investigate the minimum force of patterning required while using each chemical system. The primary aim is to gain better control of basic pattern techniques in order to create more intricate patterns such as interdigitated arrays, which can subsequently be used in sensors. An atomic force microscope (AFM) is used to pattern the prepared colloid-coated glass slides. Several compounds were used in the investigation, including sodium sulphate, potassium sulphate, magnesium sulphate, sodium fluoride, sodium chloride, sodium bromide, and sodium iodide, potassium chloride, potassium bromide, potassium iodide, potassium dihydrogen phosphate, and potassium hydrogen phosphate. In Summary, the following were found as a result of this work:  The groups of sulphates were determined to require minimum patterning forces as indicated. Sodium sulphate took a force of 49 n Potassium sulphate took a force of 45 nN Magnesium sulphate took a force of 744.4 nN  The group of sodium and potassium halides were determined the minimum patterning forces as indicated. Sodium fluoride took a force of 8.42 nN Sodium chloride and potassium chloride took a force of 20.19 and 61.9nN Sodium bromide and potassium bromide took a force of 601.4 nN and 37.2 nN, respectively Sodium iodide and potassium iodide took a force of 953.7 nN and 47.2 nN, respectively  The phosphates were determined to require the minimum patterning forces as indicated. Potassium hydrogen phosphate took a force of 25nN Potassium dihydrogen phosphate took a force of 43 nN
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Charest, Joseph Leo. "Topographic and chemical patterning of cell-surface interfaces to influence cellular functions." Diss., Atlanta, Ga. : Georgia Institute of Technology, 2007. http://hdl.handle.net/1853/24621.

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Thesis (Ph. D.)--Mechanical Engineering, Georgia Institute of Technology, 2007.
Committee Chair: Dr. William P. King; Committee Member: Dr. Andres J. Garcia; Committee Member: Dr. F. Levent Degertekin; Committee Member: Dr. Hang Lu; Committee Member: Dr. Todd C. McDevitt.
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Sajid, N. "Chemical patterning and nano-mechanical measurements for understanding and controlling nerve growth." Thesis, University of Sheffield, 2014. http://etheses.whiterose.ac.uk/6976/.

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Hendricks, Troy Richard. "Polyelectrolyte multilayer coatings for conductive nanomaterials patterning and anti-wrinkling applications." Diss., Connect to online resource - MSU authorized users, 2008.

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Cai, Yangjun. "Simple Alternative Patterning Techniques for Selective Protein Adsorption." University of Akron / OhioLINK, 2009. http://rave.ohiolink.edu/etdc/view?acc_num=akron1257386752.

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Tuft, Bradley William. "Photopolymerized materials and patterning for improved performance of neural prosthetics." Diss., University of Iowa, 2014. https://ir.uiowa.edu/etd/1410.

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Neural prosthetics are used to replace or substantially augment remaining motor and sensory functions of neural pathways that were lost or damaged due to physical trauma, disease, or genetics. However, due to poor spatial signal resolution, neural prostheses fail to recapitulate the intimate, precise interactions inherent to neural networks. Designing materials and interfaces that direct de novo nerve growth to spatially specific stimulating elements is, therefore, a promising method to enhance signal specificity and performance of prostheses such as the successful cochlear implant (CI) and the developing retinal implant. In this work, the spatial and temporal reaction control inherent to photopolymerization was used to develop methods to generate micro and nanopatterned materials that direct neurite growth from prosthesis relevant neurons. In particular, neurite growth and directionality has been investigated in response to physical, mechanical, and chemical cues on photopolymerized surfaces. Spiral ganglion neurons (SGNs) serve as the primary neuronal model as they are the principal target for CI stimulation. The objective of the research is to rationally design materials that spatially direct neurite growth and to translate fundamental understanding of nerve cell-material interactions into methods of nerve regeneration that improve neural prosthetic performance. A rapid, single-step photopolymerization method was developed to fabricate micro and nanopatterned physical cues on methacrylate surfaces by selectively blocking light with photomasks. Feature height is readily tuned by modulating parameters of the photopolymerizaiton including initiator concentration and species, light intensity, separation distance from the photomask, and radiation exposure time. Alignment of neural elements increases significantly with increasing feature amplitude and constant periodicity, as well as with decreasing periodicity and constant amplitude. SGN neurite alignment strongly correlates with the maximum feature slope. Neurite alignment is compared on unpatterned, unidirectional, and multidirectional photopolymerized micropatterns. The effect of substrate rigidity on neurite alignment to physical cues was determined by maintaining equivalent pattern microfeatures, afforded by the reaction control of photopolymerization, while concomitantly altering the composition of several copolymer platforms to tune matrix stiffness. For each platform, neurite alignment to unidirectional patterns increases with increasing substrate rigidity. Interestingly, SGN neurites respond to material stiffness cues that are orders of magnitude higher (GPa) than what is typically ascribed to neural environments (kPa). Finally, neurite behavior at bioactive borders of various adhesion modulating molecules was evaluated on micropatterned materials to determine which cues took precedence in establishing neurite directionality. At low microfeatures aspect ratios, neurites align to the pattern direction but are then caused to turn and repel from or turn and align to bioactive borders. Conversely, physical cues dominate neurite path-finding as pattern feature slope increases, i.e. aspect ratio of sloping photopolymerized features increases, causing neurites to readily cross bioactive borders. The photopolymerization method developed in this work to generate micro and nanopatterned materials serves as an additional surface engineering tool that enables investigation of cell-material interactions including directed de novo neurite growth. The results of this interdisciplinary effort contribute substantially to polymer neural regeneration technology and will lead to development of advanced biomaterials that improve neural prosthetic tissue integration and performance by spatially directing nerve growth.
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Parry, Kristina Louise. "A novel plasma source for surface chemical patterning and spatial control of cell adhesion." Thesis, University of Sheffield, 2004. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.408370.

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Books on the topic "Chemical patterning"

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Spruell, Jason M. The Power of Click Chemistry for Molecular Machines and Surface Patterning. New York, NY: Springer Science+Business Media, LLC, 2011.

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Yu, Shufang. Nanostructure fabrication and patterning for use in chemical separations and sensors. 2003.

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Spruell, Jason M. The Power of Click Chemistry for Molecular Machines and Surface Patterning. Springer, 2011.

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McGuiness, C. L., R. K. Smith, M. E. Anderson, P. S. Weiss, and D. L. Allara. Nanolithography using molecular films and processing. Edited by A. V. Narlikar and Y. Y. Fu. Oxford University Press, 2017. http://dx.doi.org/10.1093/oxfordhb/9780199533060.013.23.

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This article focuses on the use of molecular films as building blocks for nanolithography. More specifically, it reviews efforts aimed at utilizing organic molecular assemblies in overcoming the limitations of lithography, including self-patterning and directed patterning. It considers the methods of patterning self-assembled organic monolayer films through soft-lithographic methods such as microcontact printing and nanoimprint lithography, through direct ‘write’ or ‘machine’ processes with a nanometer-sized tip and through exposure to electron or photon beams. It also discusses efforts to pattern the organic assemblies via the physicochemical self-assembling interactions, including patterning via phase separation of chemically different molecules and insertion of guest adsorbates into host matrices. Furthermore, it examines the efforts that have been made to couple patterned molecular assemblies with inorganic thin-film growth methods to form spatially constrained, three-dimensional thin films. Finally, it describes a hybrid self-assembly/conventional lithography (i.e. molecular rulers) approach to forming nanostructures.
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Book chapters on the topic "Chemical patterning"

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Gölzhäuser, Armin. "Chemical Nanolithography: Patterning and Chemical Functionalization of Molecular Monolayers." In Functional Micro- and Nanosystems, 23–34. Berlin, Heidelberg: Springer Berlin Heidelberg, 2004. http://dx.doi.org/10.1007/978-3-662-07322-3_4.

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Curtis, Adam, and Stephen Britland. "Surface Modification of Biomaterials by Topographic and Chemical Patterning." In Advanced Biomaterials in Biomedical Engineering and Drug Delivery Systems, 158–62. Tokyo: Springer Japan, 1996. http://dx.doi.org/10.1007/978-4-431-65883-2_30.

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Tadanaga, Kiyoharu, and Mohammad S. M. Saifullah. "UV and E-Beam Direct Patterning of Photosensitive CSD Films." In Chemical Solution Deposition of Functional Oxide Thin Films, 483–515. Vienna: Springer Vienna, 2013. http://dx.doi.org/10.1007/978-3-211-99311-8_20.

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Minko, Sergiy, Marcus Müller, Valeriy Luchnikov, Mikhail Motomov, Denys Usov, Leonid Ionov, and Manfred Stamm. "Mixed Polymer Brushes: Switching of Surface Behavior and Chemical Patterning at the Nanoscale." In Polymer Brushes, 403–25. Weinheim, FRG: Wiley-VCH Verlag GmbH & Co. KGaA, 2005. http://dx.doi.org/10.1002/3527603824.ch20.

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"Chemical Patterning." In Encyclopedia of Microfluidics and Nanofluidics, 422. New York, NY: Springer New York, 2015. http://dx.doi.org/10.1007/978-1-4614-5491-5_200350.

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Venkata Satya Siva Srikanth, Vadali. "Unique Surface Modifications on Diamond Thin Films." In Engineering Applications of Diamond. IntechOpen, 2021. http://dx.doi.org/10.5772/intechopen.98186.

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Diamond thin films are touted to be excellent in surface-sensitive sensing, electro-mechanical systems, and electrochemical applications. However, these applications often entail patterned active surfaces and subtle chemical surface modifications. But due to diamond’s intrinsic hardness and chemical inertness, surface patterning (using micro-machining and ion etching) and chemical surface modifications, respectively, are very difficult. In the case of surface patterning, it is even more challenging to obtain patterns during synthesis. In this chapter, the direct patterning of sub-wavelength features on diamond thin film surface using a femtosecond laser, rapid thermal annealing as a means to prepare the diamond thin film surface as an efficient direct charge transfer SERS substrate (in metal/insulator/semiconductor (MIS) configuration), and implantation of 14N+ ions into the surface and sub-surface regions for enhancing the electrical conductivity of diamond thin film to a certain depth (in MIS configuration) will be discussed encompassing the processing strategies and different post-processing characteristics.
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Seo, Seung-Kwon, Du-Hyeon Cho, Youngsub Lim, and Chul-Jin Lee. "Application of Genetic Algorithm to Layer Patterning of Plate Fin Heat Exchanger." In Computer Aided Chemical Engineering, 2185–90. Elsevier, 2017. http://dx.doi.org/10.1016/b978-0-444-63965-3.50366-4.

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Sekiguchi, A., and H. Masuhara. "Micrometer patterning of organic materials by selective chemical vapor deposition." In Microchemistry, 147–58. Elsevier, 1994. http://dx.doi.org/10.1016/b978-0-444-81513-2.50016-8.

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Maji, Debashis, and Soumen Das. "Buckling-assisted thin-film deposition and lithographic strategies for flexible device patterning." In Chemical Solution Synthesis for Materials Design and Thin Film Device Applications, 309–47. Elsevier, 2021. http://dx.doi.org/10.1016/b978-0-12-819718-9.00001-7.

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Müller, F. J., J. C. Gallop, J. R. Laverty, M. A. Angadi, A. D. Caplin, S. Labdi, and H. Raffy. "Patterning of Bi-Sr-Ca-Cu-O thin films by wet chemical etching in EDTA." In High Tc Superconductor Thin Films, 587–91. Elsevier, 1992. http://dx.doi.org/10.1016/b978-0-444-89353-6.50095-6.

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Conference papers on the topic "Chemical patterning"

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Katakamsetty, Ushasree, Stefan Voykov, Sascha Bott, Sam Nakagawa, Tamba Gbondo-Tugbawa, Aaron Gower-Hall, Brian Lee, et al. "Wafer level analysis and simulation of back end of line chemical mechanical polishing processes." In DTCO and Computational Patterning, edited by Neal V. Lafferty and Ryoung-Han Kim. SPIE, 2022. http://dx.doi.org/10.1117/12.2616078.

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Chen, Lu, Nikolaos Bekiaris, Timothy Michaelson, and Glen Mori. "Improved CD uniformity for chemical shrink patterning." In SPIE Advanced Lithography, edited by Clifford L. Henderson. SPIE, 2009. http://dx.doi.org/10.1117/12.814359.

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Cheng, Q., and K. Komvopoulos. "Surface Chemical Patterning for Controlled Cell Adhesion." In ASME/STLE 2009 International Joint Tribology Conference. ASMEDC, 2009. http://dx.doi.org/10.1115/ijtc2009-15134.

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Thin films exhibiting nonfouling behavior toward protein and cell attachment were grafted onto different substrates by plasma polymerization and deposition. By combining nonfouling film grafting and partial film etching by Ar ion sputtering through the windows of a shadow mask (Si or PDMS), chemical patterns of different shapes and sizes were produced on polymer substrates. Results from cell culture studies illustrate the effectiveness of the present fabrication process to produce surface micropatterns for controlling the cell shape and morphology, with direct implications in vascular pathology.
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van Es, Maarten H., Mehmet Selman Tamer, Robbert Bloem, Elfi van Zeijl, Jacques C. J. Verdonck, Adam Chuang, and Diederik J. Maas. "Highly spatially resolved chemical metrology on latent resist images." In Advances in Patterning Materials and Processes XXXIX, edited by Douglas Guerrero and Daniel P. Sanders. SPIE, 2022. http://dx.doi.org/10.1117/12.2614293.

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Hou, Xisen, Cong Liu, Kevin Rowell, Irvinder Kaur, Mingqi Li, Paul Baranowski, Jong Park, and Cheng Bai Xu. "Chemical trimming overcoat: an advanced composition and process for photoresist enhancement in lithography." In Advances in Patterning Materials and Processes XXXV, edited by Christoph K. Hohle and Roel Gronheid. SPIE, 2018. http://dx.doi.org/10.1117/12.2307674.

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Vesters, Yannick, Atish Rathore, Pieter Vanelderen, John Petersen, Danilo De Simone, Geert Vandenberghe, and Ivan Pollentier. "Unraveling the role of photons and electrons upon their chemical interaction with photoresist during EUV exposure." In Advances in Patterning Materials and Processes XXXV, edited by Christoph K. Hohle and Roel Gronheid. SPIE, 2018. http://dx.doi.org/10.1117/12.2299593.

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Papis-Polakowska, Ewa, Anna Piotrowska, E. Kaminska, M. Guziewicz, Tadeusz T. Piotrowski, Andrzej Kudla, and A. Wawro. "Chemical processing of GaSb related to surface preparation and patterning." In International Conference on Solid State Crystals 2000, edited by Jaroslaw Rutkowski, Jakub Wenus, and Leszek Kubiak. SPIE, 2001. http://dx.doi.org/10.1117/12.425408.

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Fujimori, Toru. "Negative-tone imaging (NTI) process for ArF immersion and EUV lithography to improve ‘Chemical Stochastic’." In 2021 International Workshop on Advanced Patterning Solutions (IWAPS). IEEE, 2021. http://dx.doi.org/10.1109/iwaps54037.2021.9671060.

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Nagahara, Seiji, Cong Que Dinh, Keisuke Yoshida, Gosuke Shiraishi, Yoshihiro Kondo, Kosuke Yoshihara, Kathleen Nafus, et al. "EUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity and stochastic defectivity." In Advances in Patterning Materials and Processes XXXVII, edited by Roel Gronheid and Daniel P. Sanders. SPIE, 2020. http://dx.doi.org/10.1117/12.2552166.

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Mulholland, Matthew M., Shida Tan, Muhammad Usman Raza, Matthew Levesque, Jordan Furlong, Christopher G. L. Ferri, Robert Chivas, Michael DiBattista, and Scott Silverman. "Laser Chemical Etching Trench Refinements for Backside Debug Journey to the Circuit Layer." In ISTFA 2020. ASM International, 2020. http://dx.doi.org/10.31399/asm.cp.istfa2020p0357.

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Abstract The journey to the circuit layer will be described by first discussing baseline processes of laser assisted chemical etching (LACE) steps before the focused ion beam (FIB) workflow. These LACE processes take advantage of a dual 532 nm continuous wave (CW) and pulse laser system, however limitations and overhead that is transferred over to the FIB operator will be demonstrated. Experiments show an additional third 355 nm ultraviolet (UV) pulse laser process introduction into the workflow can further reduce the remaining silicon thickness (RST) relieving FIB overhead. In addition, complex pulse laser patterning techniques will show a refinement to nonuniform produced silicon. Finally, other pulse laser patterning techniques such as polygon etch capability will allow laser etching around and in-between features to enhance circuit layer accessibility for debug operations.
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