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Journal articles on the topic 'Cathodic Arc'

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Author: Grafiati

Published: 4 June 2021

Last updated: 20 February 2023

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1

Brzezinka, Tomasz L., Jeff Rao, Jose M. Paiva, Ibon Azkona, Joern Kohlscheen, German S. Fox Rabinovich, Stephen C. Veldhuis, and Jose L. Endrino. "Facilitating TiB2 for Filtered Vacuum Cathodic Arc Evaporation." Coatings 10, no. 3 (March 6, 2020): 244. http://dx.doi.org/10.3390/coatings10030244.

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TiB2 is well established as a superhard coating with a high melting point and a low coefficient of friction. The brittle nature of borides means they cannot be utilised with arc evaporation, which is commonly used for the synthesis of hard coatings as it provides a high deposition rate, fully ionised plasma and good adhesion. In this work, TiB2 conical cathodes with non-standard sintering additives (carbon and TiSi2) were produced, and the properties of the base material, such as grain structure, hardness, electrical resistivity and composition, were compared to those of monolithic TiB2. The dependence of the produced cathodes’ electrical resistivity on temperature was evaluated in a furnace with an argon atmosphere. Their arc–evaporation suitability was assessed in terms of arc mobility and stability by visual inspection and by measurements of plasma electrical potential. In addition, shaping the cathode into a cone allowed investigation of the influence of an axial magnetic field on the arc spot. The produced cathodes have a bulk hardness of 23–24 GPa. It has been found that adding 1 wt% of C ensured exceptional arc-spot stability and mobility, and requires lower arc current compared to monolithic TiB2. However, poor cathode utilization has been achieved due to the steady generation of cathode flakes. The TiB2 cathode containing 5 wt% of TiSi2 provided the best balance between arc-spot behaviour and cathode utilisation. Preventing cathode overheating has been identified as a main factor to allow high deposition rate (±1.2 µm/h) from TiB2-C and TiB2-TiSi2 cathodes.

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2

Béger, Miroslav, Jozef Sondor, Martin Sahul, Paulína Zacková, Marián Haršáni, and Ľubomír Čaplovič. "Influence of Deposition Parameters on the Properties of Nanocomposite Coatings Prepared by Cathodic Arc Evaporation." Defect and Diffusion Forum 368 (July 2016): 77–81. http://dx.doi.org/10.4028/www.scientific.net/ddf.368.77.

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The article deals with the influence of different deposition parameters on the selected properties of AlCrN/Si3N4 nanocomposite coatings. Bias voltage, cathodes currents and working gas pressure were changed during the deposition process. All coatings were deposited using Lateral Rotating Cathodes (LARC®) process that belongs to the group of cathodic arc evaporation PVD technologies. In comparison with the typical cathodic arc evaporation process which usually uses planar targets the LARC® process utilizes rotational cathodes that are positioned close to each other. Nanohardness, Young's modulus, thickness and residual stresses were determinated in order to evaluate the influence of deposition parameters on these coatings properties

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3

Lindfors, Paul A., William M. Mularie, and Gottfried K. Wehner. "Cathodic arc deposition technology." Surface and Coatings Technology 29, no. 4 (December 1986): 275–90. http://dx.doi.org/10.1016/0257-8972(86)90001-0.

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4

Balzer, Martin, Herbert Kappl, Hermann A. Jehn, and Volker Güther. "Cathodic-arc deposition with boron-alloyed titanium cathodes." Surface and Coatings Technology 116-119 (September 1999): 766–71. http://dx.doi.org/10.1016/s0257-8972(99)00275-3.

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5

Brown, Ian G. "CATHODIC ARC DEPOSITION OF FILMS." Annual Review of Materials Science 28, no. 1 (August 1998): 243–69. http://dx.doi.org/10.1146/annurev.matsci.28.1.243.

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6

Randhawa, H. "Cathodic arc plasma deposition technology." Thin Solid Films 167, no. 1-2 (December 1988): 175–86. http://dx.doi.org/10.1016/0040-6090(88)90494-4.

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7

Koinkar, V. N., and B. Bhushan. "Microtribological properties of hard amorphous carbon protective coatings for thin-film magnetic disks and heads." Proceedings of the Institution of Mechanical Engineers, Part J: Journal of Engineering Tribology 211, no. 4 (April 1, 1997): 365–72. http://dx.doi.org/10.1243/1350650971542552.

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For long durability of magnetic media and head sliders, protective overcoats of hydrogenated amorphous carbon (a-C:H) are generally used. In this study, microtribological studies of hydrogenated amorphous carbon coatings deposited on a single-crystal silicon using three different deposition techniques—sputtering, ion beam and cathodic arc—were studied using atomic force/friction force microscopy (AFM/FFM). Roughnesses of all coatings at two scan sizes of 1 μm × 1 μm and 10 μm × 10 μm are comparable. Surface topography of sputtered carbon coating shows some particulates on the surface. Cathodic arc carbon coating exhibits the lowest coefficient of friction value followed by ion beam and sputtered carbon coatings. Microscratch and wear resistance and nanohardness of cathodic arc carbon coating are superior to those of ion beam and sputtered carbon coatings. Cathodic arc deposited carbon coatings are potential candidates for magnetic disks and heads.

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8

Bhatia, C. Singh, S. Anders, I. G. Brown, K. Bobb, R. Hsiao, and D. B. Bogy. "Ultra-Thin Overcoats for the Head/Disk Interface Tribology." Journal of Tribology 120, no. 4 (October 1, 1998): 795–99. http://dx.doi.org/10.1115/1.2833781.

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Cathodic arc deposition forms ultra-thin amorphous hard carbon films of high sp3 content, high hardness, and low coefficient of friction. These properties make it of great interest for head/disk interface application, in particular for contact recording. In many cases, the tribological properties of the head disk interface could be improved by factors up to ten by applying cathodic arc overcoats to the slider or disk surface. This paper reviews the results of cathodic arc ultra-thin (2–10 nm) carbon overcoats for head/disk interface tribological applications.

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9

Kim, Wang Ryeol, Min Chul Kwon, Jung Hoon Lee, Uoo Chang Jung, and Won Sub Chung. "Mechanical and Structural Properties of Superhard TiAlSiN Coatings Deposited by Arc Ion Plating of Cylindrical Cathode." Materials Science Forum 783-786 (May 2014): 1426–31. http://dx.doi.org/10.4028/www.scientific.net/msf.783-786.1426.

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TiAlSiN coatings were deposited on WC-Co metal by using a cathodic arc ion deposition method of cylindrical cathode. We used Ti / Al (50 / 50 at.%) arc target and silicon sputter target. The influence of the nitrogen pressure, TiAl cathode arc current, bias voltage, and deposition temperature on the mechanical and the structural properties of the films were investigated. The structural features of the films were investigation in detail using X-ray diffraction. And coatings were characterized by means of FE-SEM, nanoindentation, Scratch tester, Tribology tester, XRD and XPS. The hardness of the film reached 43 GPa at the cathode arc current of 230 A and decreased with a further increase of the arc current. And the adhesion of the film reached 34 N. The results showed that the TiAlSiN coating exhibited an excellent mechanical properties which application for tools and molds.

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10

Tripathi, R. K., O. S. Panwar, A. K. Kesarwani, Ishpal Rawal, B. P. Singh, M. K. Dalai, and S. Chockalingam. "Investigations on phosphorous doped hydrogenated amorphous silicon carbide thin films deposited by a filtered cathodic vacuum arc technique for photo detecting applications." RSC Adv. 4, no. 97 (2014): 54388–97. http://dx.doi.org/10.1039/c4ra08343a.

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This paper reports the growth and properties of phosphorous doped hydrogenated amorphous silicon carbide thin films deposited by a filtered cathodic vacuum arc technique using P doped solid silicon target as a cathode in the presence of acetylene gas.

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11

Fu, Zhi Qiang, Cheng Biao Wang, Wen Yue, Zhi Jian Peng, Song Sheng Lin, and Ming Jiang Dai. "Influence of Vacuum Cathodic Arc Etching on Structure and Properties of W-Doped DLC Films." Advanced Materials Research 787 (September 2013): 296–300. http://dx.doi.org/10.4028/www.scientific.net/amr.787.296.

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In order to further improve the deposition process of the W-doped DLC films synthesized by a hybrid deposition method of vacuum cathodic arc, ion beam deposition, and magnetron sputtering, the paper studied the effect of vacuum cathodic arc etching prior to the deposition on the surface morphology, chemical bond status, hardness, elastic modulus, adhesion, friction, and wear of the films. It was found that the surface defects in the W-doped DLC films, which increase the average value and fluctuation of the friction coefficient of the W-doped DLC films, are mainly produced by vacuum cathodic arc etching. The adhesion and wear resistance of the W-doped DLC films can be obviously improved by arc etching while arc etching has an unobvious effect on the chemical bonding status, hardness, and elastic modulus of the W-doped DLC films.

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12

Chun, S. Y., Chung Hyo Lee, and Sang Jin Lee. "Properties of TiAl and TiAlN Thin Films by Pulsed Cathodic ARC." Materials Science Forum 534-536 (January 2007): 1413–16. http://dx.doi.org/10.4028/www.scientific.net/msf.534-536.1413.

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TiAl and TiAlN thin films are deposited on glassy carbon and Si substrates by the pulsed cathodic arc deposition process. In our pulsed cathodic arc system, because the spatial position of plasma on the surface of the evaporation source can be controlled by pulsed arc discharge, the thickness of the TiAl and TiAlN films can be controlled at nanometer scale. Amorphous stoichiometric Ti-Al films are synthesized from one Ti-Al alloy target at room temperature by changing the number of pulses of the arc discharge.

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13

Kim, Sun Kyu, and Vuong Hung Pham. "Cell Adhesion on Cathodic Arc Plasma Deposited ZrAlSiN Thin Films." Korean Journal Metals and Materials 51, no. 12 (December 5, 2013): 907–12. http://dx.doi.org/10.3365/kjmm.2013.51.12.907.

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14

Sanders, D. M., and E. A. Pyle. "Magnetic enhancement of cathodic arc deposition." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 5, no. 4 (July 1987): 2728–31. http://dx.doi.org/10.1116/1.574729.

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15

Yushkov, Georgy Yu, and Andr Anders. "Cathodic Vacuum Arc Plasma of Thallium." IEEE Transactions on Plasma Science 35, no. 2 (April 2007): 516–17. http://dx.doi.org/10.1109/tps.2007.893265.

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16

Kinrot, U., S. Goldsmith, and R. L. Boxman. "Monochromatic imaging of cathodic arc plasma." IEEE Transactions on Plasma Science 24, no. 1 (1996): 71–72. http://dx.doi.org/10.1109/27.491696.

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17

Fuentes, G. G., M. J. Díaz de Cerio, J. A. García, R. Martínez, R. Bueno, R. J. Rodríguez, M. Rico, F. Montalá, and Yi Qin. "Gradient CrCN cathodic arc PVD coatings." Thin Solid Films 517, no. 20 (August 2009): 5894–99. http://dx.doi.org/10.1016/j.tsf.2008.08.005.

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18

Takikawa, Hirofumi, Makoto Nagayama, Ryuichi Miyano, and Tateki Sakakibara. "Enhancement of shielded cathodic arc deposition." Surface and Coatings Technology 169-170 (June 2003): 49–52. http://dx.doi.org/10.1016/s0257-8972(03)00079-3.

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19

Karpov, D. A. "Cathodic arc sources and macroparticle filtering." Surface and Coatings Technology 96, no. 1 (November 1997): 22–33. http://dx.doi.org/10.1016/s0257-8972(98)80008-x.

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20

Fuentes, G. G., M. J. Díaz de Cerio, J. A. García, R. Martínez, R. Bueno, R. J. Rodríguez, M. Rico, F. Montalá, and Yi Qin. "Gradient CrCN cathodic arc PVD coatings." Surface and Coatings Technology 203, no. 5-7 (December 2008): 670–74. http://dx.doi.org/10.1016/j.surfcoat.2008.08.079.

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21

Veerasamy, V. S., G. A. J. Amaratunga, M. Weiler, J. S. Park, and W. I. Milne. "A distributed carbon cathodic vacuum arc." Surface and Coatings Technology 68-69 (December 1994): 301–8. http://dx.doi.org/10.1016/0257-8972(94)90177-5.

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22

Krysina, O. V., V. V. Shugurov, N. A. Prokopenko, E. A. Petrikova, O. S. Tolkachev, and Yu A. Denisova. "Cathodic Arc Deposition of ZrNbN Coating." Russian Physics Journal 62, no. 6 (October 2019): 956–61. http://dx.doi.org/10.1007/s11182-019-01801-0.

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23

Dukhopel’nikov, D. V., and D. V. Kirillov. "Cathodic Arc Evaporation of Polycrystalline Silicon." Russian Physics Journal 62, no. 11 (March 2020): 2033–40. http://dx.doi.org/10.1007/s11182-020-01941-8.

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24

Rother, B., J. Siegel, and J. Vetter. "Cathodic arc evaporation of graphite with controlled cathode spot position." Thin Solid Films 188, no. 2 (July 1990): 293–300. http://dx.doi.org/10.1016/0040-6090(90)90291-k.

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25

Kazakov, Andrey V., Alexander V. Medovnik, Viktor A. Burdovitsin, and Efim M. Oks. "Pulsed Cathodic Arc for Forevacuum-Pressure Plasma-Cathode Electron Sources." IEEE Transactions on Plasma Science 43, no. 8 (August 2015): 2345–48. http://dx.doi.org/10.1109/tps.2015.2404837.

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26

Wang, Xin Wu, Hao Bin Sun, Hua Zhang, Chang Ye Li, Cheng Liang Zhao, Shou Ji Si, Hai Bin Yao, Hui Jun Yu, and Chuan Zhong Chen. "Research Progress of Nitride Coating Process Prepared by Cathodic Arc Ion Plating." Solid State Phenomena 340 (December 23, 2022): 27–32. http://dx.doi.org/10.4028/p-08ojc3.

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As the main process of carbide tool coating fabrication, cathodic arc ion plating plays an important role in modern industrial production. This paper introduces the influence of process parameter selection on the coating properties of tools by cathodic arc ion plating. The process parameters mainly include nitrogen partial pressure, negative bias pressure and arc current, and the coating properties are mainly characterized by deposition rate, phase composition, coating hardness and surface quality. It can optimize the selection of process parameters on modern industrial production.

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27

BUJAK, Jan, and Zbigniew SŁOMKA. "CHARACTERIZATION OF MULTICOMPONENT, TRIBOLOGICAL AlCrTiN COATINGS, PRODUCED BY THE FILTERED CATHODIC VACUUM ARC METHOD." Tribologia 276, no. 6 (December 31, 2017): 5–11. http://dx.doi.org/10.5604/01.3001.0010.8052.

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In this paper, the AlCrTiN coatings deposited by the cathodic arc method using a plasma filtration system have been studied to determine the effect of the use of this technology on the structural, mechanical, and tribological properties of these coatings. The results of the studies have revealed that using a plasma filtering system in the cathodic arc evaporation process has a significant influence on smoothness, hardness, Young's modulus, and plasticity of the coatings. Compared to the AlTiCrN coatings that have been deposited by the standard arc cathodic process, the coatings produced by filtered method have very smooth surfaces as well as lowered values of hardness, less Young's modulus, and a lower plasticity index H3/E2. Presented properties make coatings of this type able to dissipate elastic energy that is accumulated in them during the abrasion process by plastic deformations, which in turn, results in the reduction of the tendency to create damage in the coatings and cause a limitation of wear rate. Improved tribological properties of the AlTiCrN coatings produced by filtered cathodic arc technology indicate a very promising solution for a wide range of tribological applications.

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28

Ben Jemaa, N., L. Morin, S. Benhenda, and L. Nedelec. "Anodic to cathodic arc transition according to break arc lengthening." IEEE Transactions on Components, Packaging, and Manufacturing Technology: Part A 21, no. 4 (December 1998): 599–603. http://dx.doi.org/10.1109/tcpma.1998.740053.

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29

Wu, W. B., H. J. Zhou, Q. H. Zhou, W. Yang, Y. Dong, and W. Y. Yang. "Numerical study on variable aperture extraction grids of a titanium hydride cathodic vacuum arc ion source." Journal of Instrumentation 17, no. 06 (June 1, 2022): P06005. http://dx.doi.org/10.1088/1748-0221/17/06/p06005.

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Abstract Titanium hydride cathodic vacuum arc ion sources are widely used in particle accelerators, neutron sources, etc. For the application in neutron sources, higher H+/D+ fraction and higher beam uniformity are preferred. In this work, to improve the beam uniformity of a miniature titanium hydride cathodic vacuum arc ion source, a new scheme of variable aperture extraction grids is proposed. A 2D numerical model is developed for the investigation of the variable aperture extraction grids. Numerical results indicate that the extraction grid plays important roles in the titanium hydride cathodic vacuum arc ion source that can improve the stability of ion source. Moreover, simulated results show that the designed variable aperture extraction grids can reduce the beam nonuniformity to less than ±10%, while the beam nonuniformity of the fixed aperture extraction grids are between ±22% and ±37%. Thus, the presented work can provide a potential reference for the improvement of beam uniformity of the vacuum arc ion sources.

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30

Vereschaka, Alexey A., Anatoly S. Vereschaka, Andre DL Batako, Boris J. Mokritskii, Anatoliy Y. Aksenenko, and Nikolay N. Sitnikov. "Improvement of structure and quality of nanoscale multilayered composite coatings, deposited by filtered cathodic vacuum arc deposition method." Nanomaterials and Nanotechnology 7 (January 17, 2016): 184798041668080. http://dx.doi.org/10.1177/1847980416680805.

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This article studies the specific features of cathode vacuum arc deposition of coatings used in the production of cutting tools. The detailed analysis of the major drawbacks of arc-Physical Vapour Deposition (PVD) methods has contributed to the development of the processes of filtered cathodic vacuum arc deposition to form nanoscale multilayered composite coatings of increased efficiency. This is achieved through the formation of nanostructure, increase in strength of adhesion of coating to substrate up to 20%, and reduction of such dangerous coating surface defects as macro- and microdroplets up to 80%. This article presents the results of the studies of various properties of developed nanoscale multilayered composite coating. The certification tests of carbide tool equipped with cutting inserts with developed nanoscale multilayered composite coating compositions in longitudinal turning (continuous cutting) and end symmetric milling, and intermittent cutting of steel C45 and hard-to-cut nickel alloy of NiCr20TiAl showed advantages of tool with nanoscale multilayered composite coating as compared to the tool without coating. The lifetime of the carbide inserts with developed NMCC based on the system of Ti–TiN–(NbZrTiCr)N (filtered cathodic vacuum arc deposition) was increased up to 5–6 times in comparison with the control tools without coatings and up to 1.5–2.0 times in comparison with nanoscale multilayered composite coating based on the system of Ti–TiN–(NbZrTiCr)N (standard arc-PVD technology).

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31

Savchuk, M. V., V. V. Denisov, Yu A. Denisova, A. O. Egorov, S. S. Kovalskiy, and V. V. Yakovlev. "Influence of the electric arc discharge burning on the size of the microdroplets in the nitride coating." Izvestiya vysshikh uchebnykh zavedenii. Fizika, no. 11 (2021): 158–63. http://dx.doi.org/10.17223/00213411/64/11/158.

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Investigates the influence of the conditions and parameters of the synthesis of nitride coatings on their properties, formed by low-pressure discharges in gas-metal beam-plasma formations. The effect of an increased concentration of a gas-metal plasma, the mode (stationary and pulse-periodic) of an arc discharge burning with a cathode spot and the effect of cooling conditions from the target cathode on the number of microdroplets in the TiN coatings on tool steel substrates was studied. The number of microdroplets in the coating is reduced by at least two times when depositing in a pulsed-periodic cathodic-arc discharge and when assisted by an additional gas plasma.

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32

Yim, S. L., Kai Ming Yu, D. Kwok, and Tai Chiu Lee. "Taguchi Methods to Optimize TiN Coating Surface Roughness." Materials Science Forum 471-472 (December 2004): 891–94. http://dx.doi.org/10.4028/www.scientific.net/msf.471-472.891.

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Cathodic Arc Physical Vapor deposition (CAPVD) uses a high current, low and negative voltage arc to vaporize a cathodic electrode (cathodic arc) and deposit the vaporized material on a substrate. The vaporized material is ionized in a vacuum chamber and the substrates are usually biased so as to accelerate the ions to the substrate surface. CAPVD provides a very dense film with excellent adhesion to the substrates. Therefore, this technique is mainly used to deposit on cutting tools such as end mills, drills, inserts, plastics and metal molds and high wear resistance tribology components. However, this coating technique will produce unwanted micro particles (droplets) [1] which usually are the target materials that cannot be reacted in coating process. These particles will affect the coating roughness and the surface morphology. To optimize this condition, Taguchi method is introduced to obtain the best experimental parameter settings. In this study, Atomic Force Microscope (AFM) is used to analyze the roughness of the coating for the following factors: bias voltage, arc current, nitrogen pressure and coating thickness.

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33

Benti, Hailu Gemechu, Abraham Debebe Woldeyohannes, and Belete Sirahbizu Yigezu. "Improving the Efficiency of Cutting Tools through Application of Filtered Cathodic Vacuum Arc Deposition Coating Techniques: A Review." Advances in Materials Science and Engineering 2022 (May 28, 2022): 1–17. http://dx.doi.org/10.1155/2022/1450805.

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The challenge of enhancing cutting tool life has been dealt with by many research studies. However, this challenge seems endless with growing technological advancement which brings about incremental improvement in tool life. The objective of this review paper is focused at assessing filtered cathodic vacuum arc deposition techniques applied on cutting tools and their effect on tool efficiency. The paper particularly picks filtered cathodic vacuum arc deposition (FCVAD) among other well-identified methods of coating like the Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD). Filtered Cathodic Vacuum Arc Deposition is the state of art in the coating technology finding wide application in the electronics industry and medical industry in addition to the machining industry, which is the concern of this review paper. This review is made in order to summarize and present the various techniques of FCVAD coatings and their applications, as investigated by various researches in the area.

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34

Devia Narvaez, D. F., L. F. Alvarez, S. Ramirez Ramirez, and And E. Restrepo-Parra. "Numerical analysis of the cathodic material influence on the arc plasma jet." Revista Mexicana de Física 65, no. 3 (May 7, 2019): 291. http://dx.doi.org/10.31349/revmexfis.65.291.

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The cathodic arc discharge is a deposition technique widely used to synthesize hard coatings and thin films. The structure of the plasma generated by the electrical discharge and its interaction with neutral particles was studied using numerical simulations. Typical plasma parameters were characterized considering their spatial and temporal dependence, as well as several cathode materials that are commonly used in these systems. For the evolution of the ion density, it was observed the formation of Knudsen layer, and also a dependence of pressure gradients in the global behavior. With respect to the kinetic energy, it was found a deceleration of ions, which is represented by a shock front produced in the plasma−neutrals interaction. On the other hand, the energy releasing was generated due to the heat transference between electrons and ions. The plasma potential follows a behavior, which is similar to that of the ion density, and it is caused by the dynamics of charged particles which is directly affected by the concentration of neutrals and ions. In general, the physical quantities are directly affected by electrical and thermal conductivity of the cathode material. Our results can be applied to understand the plasma phenomena produced in a cathodic arc discharge

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35

Zhu, J. Q., A. O. Eriksson, N. Ghafoor, M. P. Johansson, G. Greczynski, L. Hultman, J. Rosén, and M. Odén. "Microstructure evolution of Ti3SiC2 compound cathodes during reactive cathodic arc evaporation." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 29, no. 3 (May 2011): 031601. http://dx.doi.org/10.1116/1.3569052.

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36

Richter, P., S. Peter, V. B. Filippov, G. Flemming, and M. Kuhn. "Characteristics of the cathodic arc discharge with a hot boron cathode." IEEE Transactions on Plasma Science 27, no. 4 (1999): 1079–83. http://dx.doi.org/10.1109/27.782285.

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37

Dukhopelnikov, D. V., and D. V. Kirillov. "Evaporation of polycrystalline silica-aluminium cathode in cathodic arc vacuum discharge." Izvestiya vysshikh uchebnykh zavedenii. Fizika, no. 11 (2019): 68–74. http://dx.doi.org/10.17223/00213411/62/11/68.

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38

Neumannn, P. R. C., M. M. M. Bilek, and D. R. McKenzie. "Fuel Selection for Pulsed Cathodic Arc Thrusters." Journal of Propulsion and Power 28, no. 1 (January 2012): 218–21. http://dx.doi.org/10.2514/1.b34336.

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39

McKenzie, D. R., Y. Yin, E. G. Gerstner, and M. M. M. Bilek. "New developments in processing cathodic arc plasmas." IEEE Transactions on Plasma Science 25, no. 4 (1997): 652–59. http://dx.doi.org/10.1109/27.640680.

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40

Kuhn, M., R. Pintaske, and F. Richter. "Optical emission spectroscopy in cathodic arc deposition." IEEE Transactions on Plasma Science 25, no. 4 (1997): 694–99. http://dx.doi.org/10.1109/27.640688.

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41

Anders, A. "Chopping effect observed at cathodic arc initiation." IEEE Transactions on Plasma Science 28, no. 4 (2000): 1303–4. http://dx.doi.org/10.1109/27.893320.

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42

Rother, B. "Cathodic Arc Evaporation as a Coating Technique." Surface Engineering 4, no. 4 (January 1988): 335–42. http://dx.doi.org/10.1179/sur.1988.4.4.335.

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43

Neumann, P. R. C., M. M. M. Bilek, R. N. Tarrant, and D. R. McKenzie. "A pulsed cathodic arc spacecraft propulsion system." Plasma Sources Science and Technology 18, no. 4 (July 31, 2009): 045005. http://dx.doi.org/10.1088/0963-0252/18/4/045005.

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44

Russo, R., L. Catani, A. Cianchi, D. DiGiovenale, J. Lorkiewicz, S. Tazzari, C. Granata, P. Ventrella, G. Lamura, and A. Andreone. "Niobium Coating of Cavities Using Cathodic Arc." IEEE Transactions on Applied Superconductivity 19, no. 3 (June 2009): 1394–98. http://dx.doi.org/10.1109/tasc.2009.2019205.

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45

Vyskočil, J., and J. Musil. "Cathodic arc evaporation in thin film technology." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 10, no. 4 (July 1992): 1740–48. http://dx.doi.org/10.1116/1.577741.

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Falabella, S., and D. M. Sanders. "Comparison of two filtered cathodic arc sources." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 10, no. 2 (March 1992): 394–97. http://dx.doi.org/10.1116/1.578062.

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Anders, Simone, Sébastien Raoux, Kannan Krishnan, Robert A. MacGill, and Ian G. Brown. "Plasma distribution of cathodic arc deposition systems." Journal of Applied Physics 79, no. 9 (May 1, 1996): 6785–90. http://dx.doi.org/10.1063/1.361523.

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Cooper, I. J., and D. R. McKenzie. "All particle simulations of cathodic arc plasmas." Journal of Applied Physics 99, no. 9 (May 2006): 093304. http://dx.doi.org/10.1063/1.2197032.

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Shi, X., B. K. Tay, D. I. Flynn, Q. Ye, and Z. Sun. "Characterization of filtered cathodic vacuum arc system." Surface and Coatings Technology 94-95 (October 1997): 195–200. http://dx.doi.org/10.1016/s0257-8972(97)00347-2.

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Vergara, Lucía, Olga Sánchez, and José María Albella. "TixSiyN nanocomposites by cathodic arc plasma deposition." Vacuum 83, no. 10 (June 2009): 1233–35. http://dx.doi.org/10.1016/j.vacuum.2009.03.013.

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